WO2014104653A1 - Film de revêtement dur et procédé permettant de fabriquer ce dernier - Google Patents

Film de revêtement dur et procédé permettant de fabriquer ce dernier Download PDF

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Publication number
WO2014104653A1
WO2014104653A1 PCT/KR2013/011901 KR2013011901W WO2014104653A1 WO 2014104653 A1 WO2014104653 A1 WO 2014104653A1 KR 2013011901 W KR2013011901 W KR 2013011901W WO 2014104653 A1 WO2014104653 A1 WO 2014104653A1
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WIPO (PCT)
Prior art keywords
meth
acrylate
coating
film
hard coating
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Ceased
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PCT/KR2013/011901
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English (en)
Korean (ko)
Inventor
김병수
강세영
이대규
이은화
김성국
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Cheil Industries Inc
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Cheil Industries Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters
    • G02B1/105—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

Definitions

  • the present invention relates to a hard coat film and a method of manufacturing the same.
  • the polarizer is generally used in which a cellulose resin film is bonded to both surfaces of a polarizer on a film made of polyvinyl alcohol or the like.
  • a protective film is adhered to one base film for the purpose of preventing surface damage during transportation, and the other resin film has a multilayer structure in which an adhesive layer and a release film are laminated.
  • Such a polarizing plate is used as a major component of a liquid crystal display device. In order to exhibit high durability in using such a polarizing plate under various environments, there is an increasing demand for high hardness hard coating products during polarization surface treatment.
  • the coating thickness of the hard coating layer may be 10 ⁇ m or more to satisfy pencil hardness 3H or more.
  • the shrinkage during UV curing increases, which causes severe curling, which may cause breakage of the film in manufacturing the polarizer, and also has disadvantages in terms of manufacturing cost.
  • a polymer used as a hard coating agent is mainly an acrylic polymer, a urethane polymer, an epoxy polymer, a silicon polymer, or a silica compound.
  • These polymers exist in the form of monomers or oligomers, and are added to a photoinitiator by heat or UV. By forming a polymer by, it becomes hard-coating property.
  • Most of these coatings have increased wear resistance as the crosslinking density increases, but they may be bent due to the shrinkage of the coating layer or may cause cracks during transportation, which may cause deformation of the coating seam, thereby reducing adhesion to the material. It can easily come off on contact.
  • An object of the present invention relates to a hard coating film and a method for manufacturing the same, which can secure excellent surface hardness and scratch resistance even with a thin hard coating layer.
  • Another object of the present invention relates to a hard coat film capable of implementing low curl properties due to excellent warpage and a method of manufacturing the same.
  • Still another object of the present invention relates to a hard coat film having excellent dimensional safety and a method of manufacturing the same.
  • One aspect of the present invention is a base film; And a hard coating layer formed on one surface of the base film, wherein the hard coating layer comprises a (meth) acrylic resin, silica, and nitrogen.
  • Another aspect of the invention includes forming a coating layer on one surface of the base film, and drying the coating layer in the presence of ammonia gas to form an organic-inorganic hybrid layer comprising a (meth) acrylic resin, silica and nitrogen It relates to a method for producing a hard coat film.
  • the hard coat film of the present invention can secure excellent surface hardness and scratch resistance even as a thin hard coat layer, it is excellent in warpage, it is possible to implement a low curl (Low Curl) properties, excellent dimensional safety.
  • FIG. 1 is a cross-sectional view of a hard coating film according to an embodiment of the present invention.
  • FIG. 2 is a conceptual diagram of the warpage measurement of the hard coat film.
  • FIG 3 is a cross-sectional view of a hard coat film according to another embodiment of the present invention.
  • the hard coat film 100 may include a base film 110 and a hard coat layer 120.
  • the hard coating layer 120 may include an (meth) acrylic resin, silica, and nitrogen as an organic / inorganic mixed layer.
  • the nitrogen may be included in about 10 atomic% or less in the hard coat layer 120, for example, about 0.5 atomic% to about 8 atomic%. When nitrogen is included in the above range, it is possible to secure excellent surface hardness and scratch resistance even at a thin thickness.
  • the base film 110 is not particularly limited, but a high heat resistant plastic substrate having excellent heat resistance and low thermal expansion rate may be used.
  • the polyether sulfone, polycarbonate, polyimide, polyetherimide, polyacrylate, polyethylene naphthalate and polyester film may be one or more selected from the group consisting of, but not necessarily limited thereto. .
  • the base film 110 may have a thickness of about 10 ⁇ m to about 300 ⁇ m, and the hard coating layer 120 may have a thickness of about 0.1 ⁇ m to about 5 ⁇ m.
  • the hard coat film 100 may have a pencil hardness of about 3H or more, for example, about 3H to about 8H.
  • Pencil hardness can be measured after drawing with a Mitsubishi evaluation pencil (UNI) using a pencil hardness tester (Shinto Scientific, Heidon) at a speed of 500 kg / cm2 load, 0.5 mm / sec.
  • the hard coating film 100 may have a maximum height that is bent from the bottom of about 5 mm or less. This will be described in detail with reference to FIG. 2.
  • 2 is a conceptual diagram of the warpage measurement of the hard coat film.
  • the hard coat film 100 having the hard coat layer 120 formed on one surface of the base film 110 measures the maximum height C bent from the bottom 200 as a warpage value.
  • the hard coating film 100 measured after leaving the hard coating film 100 having a length, a length, and a thickness of 100 mm, 100 mm, and 1 ⁇ m at 85 ° C., a relative humidity of 85%, for 72 hours, respectively.
  • the maximum height C bent from the bottom can be from about 0.5 mm to about 5 mm.
  • the hard coat film 100 may further include a functional layer on the hard coat layer 120 to provide additional functions to the hard coat film.
  • the functional layer can include one or more of an antireflective layer, an antistatic layer, and an anti-fingerprint layer.
  • the coating liquid for forming the hard coating layer is (meth) acrylic copolymer resin (A); Hydrogenated polysiloxanes or hydrogenated polysilazanes (B); And a solvent (C); and each component constituting the coating solution will be described below.
  • the (meth) acrylic copolymer resin (A) is introduced to ensure compatibility with polysiloxane or polysilazane (B), and may be a copolymer of a (meth) acrylic monomer having an alkyl group having 1 to 20 carbon atoms. .
  • the (meth) acrylic monomers are methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, t-butyl (meth) acryl Rate, iso-butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, iso -Octyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate and dodecyl (meth) acrylate may mean one or more selected from the group consisting of, but is not limited to these . Specifically, it may be methyl (meth) acrylate.
  • the (meth) acrylic copolymer resin may be included in about 5% by weight to about 25% by weight based on the total content of the coating liquid. It has the advantage of maintaining high hardness, bending and cracking properties in the above range.
  • the hydrogenated polysiloxane includes a silicon-oxygen-silicon (Si-O-Si) bonding unit in addition to silicon-nitrogen (Si-N), silicon-hydrogen (Si-H), and nitrogen-hydrogen (NH) coupling units in the structure. do.
  • silicon-oxygen-silicon (Si-O-Si) bonding units can alleviate stress upon curing to reduce shrinkage.
  • the hydrogenated polysilazane has a basic skeleton in the structure including silicon-hydrogen (Si-H) and nitrogen-hydrogen (N-H) coupling units in addition to silicon-nitrogen (Si-N) coupling units.
  • the (Si-N) bond may be substituted with a (Si-O) bond.
  • the hydrogenated polysiloxane has a unit represented by the following Chemical Formula 1, and a terminal portion represented by the following Chemical Formula 2:
  • R 1 to R 3 are each independently hydrogen, substituted or unsubstituted C1 to C30 alkyl group, substituted or unsubstituted C3 to C30 cycloalkyl group, substituted or unsubstituted C3 to C30 aryl group , Substituted or unsubstituted C3 to C30 arylalkyl group, substituted or unsubstituted C3 to C30 heteroalkyl group, substituted or unsubstituted C3 to C30 heterocyclealkyl group, substituted or unsubstituted C3 to C30 alkenyl group, It may be a substituted or unsubstituted alkoxy group, a substituted or unsubstituted carbonyl group, a hydroxy group or a combination thereof.
  • substituted means hydrogen, halogen atom, hydroxy group, nitro group, cyano group, amino group, azido group, amidino group, hydrazino group, carbonyl group, carbamyl group, thiol group, ester group, Carboxyl groups or salts thereof, sulfonic acid groups or salts thereof, phosphate groups or salts thereof, alkyl groups having 1 to 20 carbon atoms, alkenyl groups having 2 to 20 carbon atoms, alkynyl groups having 2 to 20 carbon atoms, alkoxy groups having 1 to 20 carbon atoms, and carbon atoms
  • An aryl group having -30, an aryloxy group having 6-30 carbon atoms, a cycloalkyl group having 3-30 carbon atoms, a cycloalkenyl group having 3-30 carbon atoms, a cycloalkynyl group having 3-30 carbon atoms, or a combination thereof is meant.
  • the hydrogenated polysiloxane or hydrogenated polysilazane may have an oxygen content of about 0.2% to about 3% by weight.
  • the stress relaxation by the silicon-oxygen-silicon (Si-O-Si) bond in the structure is sufficient to prevent shrinkage during heat treatment, thereby preventing cracks in the formed gas barrier layer.
  • the oxygen content of the hydrogenated polysiloxane or hydrogenated polysilazane is about 0.4% to about 2.5% by weight, specifically about 0.5% to about 2% by weight.
  • the hydrogenated polysiloxane or hydrogenated polysilazane has a structure in which the terminal portion is capped with hydrogen, and the terminal group represented by Formula 3 is about about the total content of Si-H bond in the hydrogenated polysiloxane or hydrogenated polysilazane structure. 15 wt% to about 35 wt%.
  • the terminal group of Chemical Formula 3 may be included in an amount of about 20 wt% to about 30 wt% based on the total content of Si—H bonds in the hydrogenated polysiloxane or hydrogenated polysilazane structure.
  • the hydrogenated polysiloxane or hydrogenated polysilazane of the present invention may have a weight average molecular weight (Mw) of about 1000 g / mol to about 5000 g / mol. In the above range, it is possible to form a dense organic-inorganic mixed layer with a thin film coating while reducing components to evaporate during heat treatment. Specifically, the weight average molecular weight (Mw) may be about 1500 g / mol to about 3500 g / mol.
  • the hydrogenated polysiloxane, hydrogenated polysilazane or a mixture thereof may be included in an amount of about 1% by weight to about 30% by weight based on the total content of the coating solution. If included in the above range can maintain a suitable viscosity and can be formed flat and evenly without bubbles and voids (Void).
  • the solvent (C) may be used as long as it is a solvent capable of dissolving the hydrogenated polysiloxane, while not being reactive with hydrogenated polysiloxane or hydrogenated polysilazane.
  • a solvent containing no -OH group can be used because it is reactive with the siloxane compound.
  • ethers such as hydrocarbon solvents, such as aliphatic hydrocarbon, alicyclic hydrocarbon, and aromatic hydrocarbon, halogenated hydrocarbon solvent, aliphatic ether, alicyclic ether, can be used.
  • hydrocarbons such as pentane, hexane, cyclohexane, toluene, xylene, sorbetso, and taben
  • halogen hydrocarbons such as methylene chloride and tricholoethane, dibutyl ether, dioxane, tetra hybrido furan and the like Ryu.
  • the solubility of the siloxane compound or the evaporation rate of the solvent may be selected as appropriate, and a plurality of solvents may be mixed.
  • the solvent may be included in about 50% by weight to about 90% by weight relative to the total amount of the coating liquid.
  • the coating liquid of the present invention may further include a thermal acid generator (TAG).
  • TAG thermal acid generator
  • the thermal acid generator is an additive for improving the developability of the hydride polysiloxane and the contamination by uncuring, so that the hydride polysiloxane may be developed at a relatively low temperature.
  • the thermal acid generator is not particularly limited as long as it is a compound capable of being generated as an acid (H + ) by heat, but may be selected to have a low volatility by being activated at about 90 ° C. or more to generate sufficient acid.
  • Such thermal acid generators can be selected, for example, from nitrobenzyl tosylate, nitrobenzyl benzenesulfonate, phenol sulfonate and combinations thereof.
  • the thermal acid generator may be included in about 25% by weight or less, for example, about 0.01% to about 20% by weight based on the total content of the coating liquid.
  • the siloxane compound When included in the above range, the siloxane compound may be developed at a relatively low temperature. However, in order to have better gas barrier properties, organic components may not be included.
  • the coating solution of the present invention may further include a surfactant.
  • the said surfactant is not specifically limited, For example, polyoxyethylene alkyl ethers, such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene ether, polyoxyethylene rail ether, polyoxyethylene nonyl phenol ether, etc.
  • Polyoxyethylene sorbitan such as polyoxyethylene alkyl allyl ether, polyoxyethylene polyoxypropylene block copolymer, sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate
  • Nonionic surfactants such as fatty acid esters, F-top EF301, EF303, EF352 (manufactured by Tochem Products Co., Ltd.), Megapack F171, F173 (manufactured by Dainippon Ink, Inc.).
  • Fluorine-based surfactants such as Prorad FC430, FC431 (manufactured by Sumitomo 3M Co., Ltd.), Asahi Guard AG710, Saffron S-382, SC101, SC102, SC103, SC104, SC105, SC106 (manufactured by Asahi Glass Co., Ltd.) Kano siloxane polymer KP341 (made by Shin-Etsu Chemical Co., Ltd.), etc., etc. are mentioned.
  • the surfactant may be included in an amount of about 10 wt% or less, for example, about 0.001 wt% to about 5 wt%, based on the total content of the coating solution.
  • Hard coating film according to another embodiment of the present invention may be a polarizing film.
  • Figure 3 is a schematic cross-sectional view of a hard coat film according to another embodiment of the present invention.
  • base films 220a and 220b are adhered to both surfaces of the polarizer 210, and among the adhered base films 220a and 220b.
  • On the surface of one 220a is a hard coat layer 230 according to the present invention.
  • a protective film 240 may be formed on the hard coating layer 230, and an adhesive layer 250 and a release film 260 may be formed on the other one of the adhered base films 220a and 220b. Can be.
  • polarizer 210 a urea-based polarizer, a dichroic dye-based polarizer, etc., which are usually formed of a film of polyvinyl alcohol-based resin, may be used, but are not limited thereto.
  • a coating layer is formed on one surface of a base film, and the coating layer is dried in the presence of ammonia gas to contain (meth) acrylic resin, silica, and nitrogen. It may include forming an inorganic hybrid layer.
  • a coating liquid containing a (meth) acrylate copolymer resin, a polysilazane or a polysiloxane compound, and a solvent is prepared.
  • the prepared coating solution is applied to one surface of the base film.
  • Methods of applying the coating solution include roll coating, spin coating, dip coating, flow coating, spray coating, and the like, but are not limited thereto.
  • the coating thickness of the coating solution may be about 0.1 ⁇ m to about 5 ⁇ m. Cracks do not occur in the above range, and sufficient surface hardness can be secured.
  • the coated hard coating layer may be modified by ultraviolet irradiation, plasma treatment, heat treatment or a combination thereof.
  • the "modification” process is a process in which hydrogenated polysiloxane, hydrogenated polysilazane or a mixture thereof is converted into silica and ceramicized.
  • the hard coat layer according to an embodiment of the present invention is modified with silica, and excellent in heat resistance, abrasion resistance, and insulation. Therefore, it can be widely used as a protective film of various substrates.
  • the method may further include ultraviolet irradiation, plasma treatment, drying at high humidity, or drying in the presence of ammonia gas. Specifically, it may be dried in the presence of ammonia gas.
  • the drying may be performed in the presence of ammonia gas to completely advance the ceramicization, that is, the modification, at a low temperature (for example, within a few minutes) at low temperature.
  • a process such as irradiation
  • the hard coat layer completely modified in this way has excellent hardness and no cracking.
  • drying in the presence of the ammonia gas may be performed at conditions of about 20 ° C. to about 90 ° C. and about 30% to about 90% relative humidity. In the above range, no cracking occurs and sufficient ceramicization can be obtained.
  • Base film Toyobo PET having a thickness of 100 ⁇ m was used.
  • Urethane acrylate resin UNIDIC RC27-947 from DIC Corporation was used.
  • Multifunctional acrylate monomer DPHA from SK Cytec was used.
  • Solvent 1 Xylene from Wako was used.
  • Solvent 2 Butyl acetate of Samjeon Pure Chemical Co., Ltd. was used.
  • Photo initiator Igacure-184 from Ciba was used.
  • Pencil hardness by using a pencil hardness tester (Shinto Scientific, Heidon) with a Mitsubishi evaluation pencil (UNI) at 500kg / cm2 load, 0.5mm / sec and then the pencil hardness was confirmed.
  • the coating solution having the composition shown in Table 1 was spin-coated to a base film upper surface with a thickness of 1 ⁇ m. Spin coating was applied for 20 seconds at 1000 rpm and dried in a convection oven at 80 ° C./3 minutes in the presence of ammonia gas. After measuring the physical properties of the hard coating layer according to the property evaluation method described in Table 1 together with the results.
  • the coating solution having the composition shown in Table 1 below was spin-coated to a base film upper surface with a thickness of 1 ⁇ m. Spin coating was applied for 20 seconds at 1000 rpm and dried in a convection oven at 80 ° C./3 minutes in the absence of ammonia gas. After measuring the physical properties of the hard coating layer according to the property evaluation method described in Table 1 together with the results.
  • the coating solution having the composition shown in Table 1 below was spin-coated to a base film upper surface with a thickness of 1 ⁇ m. Spin coating was applied for 20 seconds at 1000 rpm, dried in a convection oven at 80 ° C./3 minutes in the absence of ammonia gas, and cured by applying UV light at a light amount of 350 mJ / cm with a high pressure mercury lamp. After measuring the physical properties of the hard coating layer according to the property evaluation method described in Table 1 together with the results.
  • the hard coat films of Examples 1 to 3 have excellent surface hardness, no scratches, low warpage, and no cracks.
  • Comparative Example 1 without applying the (meth) acrylate copolymer resin it can be seen that a significant increase in the content of the inorganic substance, cracks, do not contain a coating liquid polysilazane, in the absence of ammonia gas
  • the nitrogen content in the coating layer exceeds 10 atomic%, it can be seen that the warpage significantly increased and cracks occurred.
  • Comparative Example 3 and Comparative Example 4 which used a coating solution containing no polysilazane and (meth) acrylate and were cured in the absence of ammonia gas, showed that the pencil hardness was lowered and the warpage property was significantly higher. have.

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Abstract

La présente invention se rapporte à un film de revêtement dur qui comprend un film de base et une couche de revêtement dur formée sur un côté dudit film de base, ainsi qu'à un procédé permettant de fabriquer ce film de revêtement dur. La couche de revêtement dur est caractérisée en ce qu'elle comprend une résine à base de (méth)acryle, de la silice et de l'azote. Le film de revêtement dur qui comporte la couche de revêtement dur présente d'excellentes propriétés de dureté superficielle, de résistance à la rayure et de flexion, des propriétés de faible enroulement et une excellente stabilité dimensionnelle.
PCT/KR2013/011901 2012-12-27 2013-12-19 Film de revêtement dur et procédé permettant de fabriquer ce dernier Ceased WO2014104653A1 (fr)

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US10020185B2 (en) 2014-10-07 2018-07-10 Samsung Sdi Co., Ltd. Composition for forming silica layer, silica layer, and electronic device
KR101837971B1 (ko) 2014-12-19 2018-03-13 삼성에스디아이 주식회사 실리카계 막 형성용　조성물, 실리카계 막, 및 전자 디바이스
KR101833800B1 (ko) 2014-12-19 2018-03-02 삼성에스디아이 주식회사 실리카계 막 형성용 조성물, 실리카계 막의 제조방법 및 상기 실리카계 막을 포함하는 전자 소자
KR20170014946A (ko) 2015-07-31 2017-02-08 삼성에스디아이 주식회사 실리카 막 형성용 조성물, 실리카 막의 제조방법 및 실리카 막
KR102590498B1 (ko) 2016-02-19 2023-10-19 삼성디스플레이 주식회사 플렉서블 표시장치, 윈도우 부재의 제조방법 및 하드 코팅 조성물
KR102036858B1 (ko) 2017-12-07 2019-10-25 건양대학교 산학협력단 폴리실라잔을 이용한 uv 경화형 하드 코팅액 및 도막 제조방법
JP7387361B2 (ja) * 2019-09-27 2023-11-28 日東電工株式会社 光学積層体および画像表示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007171887A (ja) * 2005-12-22 2007-07-05 Jsr Corp 偏光板およびその製造方法
JP2010059114A (ja) * 2008-09-05 2010-03-18 Shin-Etsu Chemical Co Ltd 有機ケイ素化合物、その製造方法、該有機ケイ素化合物を含む粘着剤組成物、粘着偏光板及び液晶表示装置
KR20110079522A (ko) * 2009-12-31 2011-07-07 제일모직주식회사 하드코팅필름
KR20110084623A (ko) * 2010-01-18 2011-07-26 동우 화인켐 주식회사 태양전지 모듈용 반사방지필름의 저굴절층 형성용 조성물, 이를 이용한 반사방지필름 및 태양전지 모듈
KR20120077915A (ko) * 2010-12-31 2012-07-10 제일모직주식회사 하드코팅필름

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002053688A (ja) * 2000-08-10 2002-02-19 Asahi Glass Co Ltd ハードコート層を有する芳香族ポリエステル樹脂成形体およびその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007171887A (ja) * 2005-12-22 2007-07-05 Jsr Corp 偏光板およびその製造方法
JP2010059114A (ja) * 2008-09-05 2010-03-18 Shin-Etsu Chemical Co Ltd 有機ケイ素化合物、その製造方法、該有機ケイ素化合物を含む粘着剤組成物、粘着偏光板及び液晶表示装置
KR20110079522A (ko) * 2009-12-31 2011-07-07 제일모직주식회사 하드코팅필름
KR20110084623A (ko) * 2010-01-18 2011-07-26 동우 화인켐 주식회사 태양전지 모듈용 반사방지필름의 저굴절층 형성용 조성물, 이를 이용한 반사방지필름 및 태양전지 모듈
KR20120077915A (ko) * 2010-12-31 2012-07-10 제일모직주식회사 하드코팅필름

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