WO2014126143A1 - Alliage de système cofe pour des couches de film à aimantation temporaire dans des supports magnétiques perpendiculaires et matière de cible de pulvérisation - Google Patents

Alliage de système cofe pour des couches de film à aimantation temporaire dans des supports magnétiques perpendiculaires et matière de cible de pulvérisation Download PDF

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WO2014126143A1
WO2014126143A1 PCT/JP2014/053312 JP2014053312W WO2014126143A1 WO 2014126143 A1 WO2014126143 A1 WO 2014126143A1 JP 2014053312 W JP2014053312 W JP 2014053312W WO 2014126143 A1 WO2014126143 A1 WO 2014126143A1
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WIPO (PCT)
Prior art keywords
alloy
tcr
tam
soft magnetic
magnetic recording
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Ceased
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PCT/JP2014/053312
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English (en)
Japanese (ja)
Inventor
澤田　俊之
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Sanyo Special Steel Co Ltd
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Sanyo Special Steel Co Ltd
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Priority to MYPI2015702518A priority Critical patent/MY180011A/en
Priority to SG11201505980UA priority patent/SG11201505980UA/en
Priority to CN201480009279.8A priority patent/CN105074041B/zh
Publication of WO2014126143A1 publication Critical patent/WO2014126143A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/003—Making ferrous alloys making amorphous alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/02—Amorphous alloys with iron as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Definitions

  • the present invention relates to a CoFe-based alloy for a soft magnetic thin film layer and a sputtering target material in a perpendicular magnetic recording medium.
  • the perpendicular magnetic recording system is a method suitable for high recording density, in which the easy magnetization axis is oriented in the perpendicular direction with respect to the medium surface in the magnetic film of the perpendicular magnetic recording medium.
  • a two-layer recording medium having a magnetic recording film layer and a soft magnetic film layer with improved recording sensitivity has been developed.
  • a CoCrPt—SiO 2 alloy is used for the magnetic recording film layer.
  • thermal assist and microwave assist type perpendicular magnetic recording media capable of realizing higher recording density have been studied.
  • a conventional soft magnetic film layer needs to have a high saturation magnetic flux density (hereinafter referred to as Bs) and an amorphous property. Further, depending on the application and use environment of the perpendicular magnetic recording medium, it has high corrosion resistance and high hardness. Various characteristics have been additionally required. For example, as proposed in Japanese Patent Application Laid-Open No. 2008-299905 (Patent Document 1), high Bs is obtained by adding Fe, and high hardness is obtained by adding B. Further, as proposed in Japanese Patent Laid-Open No. 2011-68985 (Patent Document 2), the corrosion resistance (weather resistance) is improved by the addition of Y and Ti.
  • the recording magnetization in the soft magnetic film does not excessively affect the surroundings, and as a result, recording can be performed in a small space. Become. This phenomenon is considered to improve the apparent recording density by reducing the “writing blur”. However, it is still necessary to secure the minimum Bs. From these, it appears that the one having a saturation magnetic flux density of about 0.95 to 1.35 T is good.
  • the soft magnetic film has the lowest corrosion resistance in the multilayer structure in the disk. Therefore, protecting this layer is a rate-determining factor, and the necessary thickness of the carbon protective film is determined. Therefore, if the corrosion resistance of the soft magnetic film can be made higher than before, the carbon protective film can be made thinner, and as a result, the distance between the recording layer and the head can be reduced, leading to an improvement in recording capacity. I can do it.
  • the soft magnetic layer should have remarkably excellent corrosion resistance that does not generate even in a harsh environment. Has become important. Therefore, in order to obtain such a remarkably high corrosion resistance, the use of a corrosion resistance improving element that has been studied in the past increases the amount of addition, and as a result, it becomes difficult to ensure the minimum Bs. From such a background, the inventor has studied a new additive element that has a small decrease in Bs and has a large effect of improving corrosion resistance.
  • Patent Document 1 high Bs is obtained by adding Fe to the alloy, and it is excellent in that high hardness is obtained by adding B.
  • these methods are insufficient for obtaining a soft magnetic alloy for perpendicular magnetic recording media that does not generate even in a harsh environment and has excellent corrosion resistance.
  • the corrosion resistance (weather resistance) of the alloy is improved by adding Y or Ti.
  • these additive elements have a large decrease in Bs and are not sufficient for obtaining a large effect of improving corrosion resistance.
  • an object of the present invention is to provide a soft magnetic alloy for perpendicular magnetic recording media having excellent corrosion resistance, and to provide a sputtering target material for producing a thin film of this alloy.
  • Atomic% One or more of Ge, Ru, Rh, Pd, Re, Os, Ir, and Pt, Sc, Y, lanthanoid (atomic number 57 to 71), Ti, Zr, Hf, V, Nb, Ta, Mo, W, B
  • an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium characterized by comprising at least one of the above, the balance Co, Fe, and inevitable impurities, and satisfying all of the following formulas (1) to (4): .
  • TCR Ge% + Ru% + Rh% + Pd% + Re% + Os% + Ir% + Pt%
  • TAM Sc% + Y% + Total of lanthanoid + Ti% + Zr% + Hf% + V% + Nb% + Ta% + Mo% + W% + B% / 2 B is treated as 1/2 because the amorphous promoting effect is about twice that of other elements.
  • TNM C% + Al% + Si% + P% + Cr% + Mn% + Ni% / 3 + Cu% / 3 + Zn% + Ga% + Sn% Ni and Cu are handled as 1/3 because the decrease in saturation magnetic flux density is about 1/3 of other elements.
  • the above alloy further containing at least one selected from C, Al, Si, P, Cr, Mn, Ni, Cu, Zn, Ga and Sn.
  • a sputtering target material comprising the above alloy is provided.
  • the present invention has an extremely excellent effect that it is possible to provide a soft magnetic alloy for a perpendicular magnetic recording medium excellent in corrosion resistance and a sputtering target material for producing a thin film of this alloy. Is.
  • the alloy for the soft magnetic film layer in the perpendicular magnetic recording medium according to the present invention includes at least one selected from Ge, Ru, Rh, Pd, Re, Os, Ir, and Pt, Sc, Y, lanthanoid (atomic number 57 to 71), consisting of one or more selected from Ti, Zr, Hf, V, Nb, Ta, Mo, W and B, the balance Co and Fe and inevitable impurities (comprising), preferably these elements and inevitable Consisted essentially of essential impurities, more preferably consisted of only these elements and inevitable impurities.
  • TCR Ge% + Ru% + Rh% + Pd% + Re% + Os% + Ir% + Pt%.
  • One or more selected from Ge, Ru, Rh, Pd, Re, Os, Ir, and Pt in the present invention is an essential element that significantly increases corrosion resistance without significantly reducing Bs. If the total amount is less than 0.1%, the effect of improving the corrosion resistance is not seen, and if it exceeds 10%, Bs is unnecessarily lowered. In addition, the cost becomes high.
  • the addition amount of these elements is preferably 0.5 to 7%, more preferably 1 to 5%.
  • elements other than Ge are preferable, and Ru, Rh, and Pt are more preferable.
  • TAM Sc% + Y% + Total lanthanoid% + Ti% + Zr% + Hf% + V% + Nb% + Ta% + Mo% + W% + B% / 2.
  • B is treated as 1/2 because the amorphous promoting effect is about twice that of other elements.
  • at least one selected from Sc, Y, lanthanoid (atomic number 57 to 71), Ti, Zr, Hf, V, Nb, Ta, Mo, W and B is essential for enhancing the amorphousness. If the total addition amount is less than 5%, sufficient amorphousness cannot be obtained, and if it exceeds 25%, Bs is unnecessarily lowered.
  • the amount of these elements added is preferably 10 to 23%, more preferably 15 to 20%.
  • TNM C% + Al% + Si% + P% + Cr% + Mn% + Ni% / 3 + Cu% / 3 + Zn% + Ga% + Sn%.
  • Ni and Cu are treated as 1/3 because the decrease in saturation magnetic flux density is about 1/3 of other elements. All elements belonging to TCR, TAM, and TNM are elements that lower Bs. Therefore, it is necessary to define the total amount. If TCR / 2 + TAM + TNM is less than 13%, Bs is too high, and becomes larger than Bs of a soft magnetic film required for recent disks. If it exceeds 25%, sufficient Bs cannot be obtained.
  • the amount of these elements added is preferably 15 to 23%, more preferably 17 to 20%.
  • Co and Fe in the present invention are essential elements for imparting ferromagnetism, but when Fe% / (Fe% + Co%) exceeds 0.80, the Curie point is remarkably lowered, and sufficient Bs is obtained at room temperature. I can't. This ratio is preferably 0.30 to 0.70, more preferably 0.40 to 0.65.
  • a soft magnetic film layer in a perpendicular magnetic recording medium can be formed on a glass substrate or the like by sputtering a sputtering target material having the same component.
  • the thin film formed by sputtering is rapidly cooled.
  • a quenching ribbon manufactured by a single roll type liquid quenching apparatus is used as a test material. This is a simple evaluation of the influence of the components on various properties of a thin film formed by quenching by sputtering in a simple manner using a liquid quenching ribbon.
  • the conditions for preparation of the quenching ribbon are a single roll method, this molten base material is set in a quartz tube having a diameter of 15 mm, the diameter of the tap nozzle is 1 mm, the atmospheric pressure is 61 kPa, the spray differential pressure is 69 kPa, and the copper roll is 300 mm
  • the hot water was discharged at a rotation speed of 3000 rpm and a gap between the copper roll and the hot water nozzle of 0.3 mm.
  • the hot water temperature was set immediately after each molten base material was melted.
  • the quenched ribbon thus produced was used as a test material, and the saturation magnetic flux density (hereinafter referred to as Bs) and amorphousness were evaluated.
  • the volume of the sample at the time of calculating Bs was calculated from the average specific gravity calculated from the weight measured with the electronic balance and the composition ratio.
  • the average specific gravity is obtained by averaging the specific gravity of the elements constituting the sample as a pure substance by the composition ratio.
  • the test material was attached to a glass plate with a double-sided tape, and a diffraction pattern was obtained with an X-ray diffractometer. At this time, the test material was affixed on the glass plate so that the measurement surface was a copper roll contact surface of a quenched ribbon.
  • the X-ray source was Cu—K ⁇ ray, and measurement was performed at a scan speed of 4 ° / min. In this diffraction pattern, the evaluation of the amorphous property was evaluated as ⁇ when the halo pattern could be confirmed, and x when no halo pattern was observed.
  • the composition of the additive-free material is (Co 50 Fe 50 ) 86 —Zr 8 —B 6 , and the Fe% / (Fe% + Co%) of the components in Table 1 are all 0.50.
  • FIG. 1 shows the influence of Bs and the kind of additive element on the elution amount (Experiment A). From FIG. 1, among the additive elements having a low elution amount and high corrosion resistance, Ru, Rh, Pd, Re, Os, Ir, and Pt are able to secure a relatively high Bs. Ge also shows the same effect as Ti and Hf. On the other hand, V, Nb, Ta, Cr, Mo, and W have a small amount of elution but a large decrease in Bs. Further, other additive elements have a small effect of improving the corrosion resistance.
  • Table 2 shows various characteristics of the quenched ribbon with the addition amount of the additive element changed.
  • the composition of the additive-free material is (Co 35 Fe 65 ) 76 —Ta 8 —B 8 —Mn 8 .
  • FIG. Ge The relationship between the amount of each element added and the amount eluted in Table 2 is shown in FIG. Ge, Ru and Pt belonging to TCR have a high effect of improving corrosion resistance even with a slight addition amount. On the other hand, it can be seen that Ti, Hf, and W, which do not belong to this, improve the corrosion resistance with the addition amount, but a relatively large amount of addition is necessary. Further, FIG. 3 shows a plot of Bs and elution amount of the results in Table 2. As shown in FIG. 3, the composition to which Ge, Ru, and Pt are added has higher Bs and lower elution amount than the other additive elements.
  • Experiment C evaluated Bs, corrosion resistance, and amorphousness using a sputtered film in order to evaluate the influence of various elements. As shown in Table 3, various properties of the sputtered film having various compositions are shown. No. Nos. 1 to 8 are examples of the present invention. Reference numerals 9 to 14 are comparative examples. Comparative Example No. No. 9 has a low value of TAM and TCR / 2 + TAM + TNM, so Bs is excessively high, inferior in amorphousness, and poor in corrosion resistance. Comparative Example No. No. 10 has a low Bs because the values of TAM and TCR / 2 + TAM + TNM are high.
  • Comparative Example No. 11 has an excessively high Bs because TCR / 2 + TAM + TNM is low. Comparative Example No. Since 12 and 13 have high Fe content, Bs is low. Comparative Example No. 14 shows that the corrosion resistance is inferior because it does not contain TCR. On the other hand, the present invention example No. It can be seen that 1 to 8 all satisfy the conditions and are excellent in Bs and corrosion resistance.
  • an alloy for a soft magnetic film layer in an extremely excellent perpendicular magnetic recording medium capable of significantly improving the corrosion resistance at a low cost and reducing the decrease in Bs, and A sputtering target material for producing a thin film of this alloy is provided.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

L'invention concerne : un alliage de système CoFe pour des couches de film minces à aimantation temporaire dans des supports magnétiques perpendiculaires ; et une matière de cible de pulvérisation. Cet alliage est un alliage pour des couches de film à aimantation temporaire dans des supports magnétiques perpendiculaires, et est formé d'un ou plusieurs éléments choisis parmi Ge, Ru, Rh, Pd, Re, Os, Ir et Pt, et d'un ou plusieurs éléments choisis parmi Sc, Y, les lanthanides (numéros atomiques 57-71), Ti, Zr, Hf, V, Nb, Ta, Mo, W et B, avec le reste étant Co, Fe et des impuretés inévitables. Cet alliage satisfait, en % atomique, toutes les formules suivantes (a)-(d) : (a) 0,1 % ≤ TCR ≤ 10 % ; (b) 5 % ≤ TAM ≤ 25 % ; (c) 13 % ≤ TCR/2 + TAM + TNM ≤ 25 % ; et (d) 0 ≤ % Fe/(% Fe + % Co) ≤ 0,80.
PCT/JP2014/053312 2013-02-18 2014-02-13 Alliage de système cofe pour des couches de film à aimantation temporaire dans des supports magnétiques perpendiculaires et matière de cible de pulvérisation Ceased WO2014126143A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
MYPI2015702518A MY180011A (en) 2013-02-18 2014-02-13 Cofe-based alloy for soft magnetic film layer in perpendicular magnetic recording medium and sputtering target material
SG11201505980UA SG11201505980UA (en) 2013-02-18 2014-02-13 Cofe-based alloy for soft magnetic film layer in perpendicular magnetic recording medium and sputtering target material
CN201480009279.8A CN105074041B (zh) 2013-02-18 2014-02-13 用于垂直磁性记录介质中的软磁性膜层的CoFe系合金和溅射靶材

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Application Number Priority Date Filing Date Title
JP2013-028726 2013-02-18
JP2013028726A JP6116928B2 (ja) 2013-02-18 2013-02-18 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅ系合金およびスパッタリングターゲット材

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JP (1) JP6116928B2 (fr)
CN (1) CN105074041B (fr)
MY (1) MY180011A (fr)
SG (1) SG11201505980UA (fr)
TW (1) TWI627286B (fr)
WO (1) WO2014126143A1 (fr)

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CN107924689A (zh) * 2015-08-24 2018-04-17 山阳特殊制钢株式会社 非磁性且非晶质的合金、以及利用该合金的溅射靶材和磁记录介质

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JP6442460B2 (ja) * 2016-10-27 2018-12-19 山陽特殊製鋼株式会社 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅ系合金およびスパッタリングターゲット材
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JP2020135907A (ja) * 2019-02-18 2020-08-31 山陽特殊製鋼株式会社 垂直磁気記録媒体の軟磁性層形成用スパッタリングターゲット、並びに、垂直磁気記録媒体及びその軟磁性層
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CN112080709A (zh) * 2020-09-27 2020-12-15 浙江大学台州研究院 非晶合金剃须刀片及其制造方法
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CN115125428B (zh) * 2022-08-09 2023-03-10 杭州电子科技大学 一种宽温区跨室温磁斯格明子材料及其制备方法与应用

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CN107924689A (zh) * 2015-08-24 2018-04-17 山阳特殊制钢株式会社 非磁性且非晶质的合金、以及利用该合金的溅射靶材和磁记录介质
CN107675079A (zh) * 2017-09-30 2018-02-09 邓宏运 煤矿破碎机锤体多元微合金化高强韧耐磨钢配方及工艺

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