WO2014196692A1 - 도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법 - Google Patents
도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법 Download PDFInfo
- Publication number
- WO2014196692A1 WO2014196692A1 PCT/KR2013/007624 KR2013007624W WO2014196692A1 WO 2014196692 A1 WO2014196692 A1 WO 2014196692A1 KR 2013007624 W KR2013007624 W KR 2013007624W WO 2014196692 A1 WO2014196692 A1 WO 2014196692A1
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- WIPO (PCT)
- Prior art keywords
- radiation pattern
- pattern portion
- antenna
- electroplating
- contact portion
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/38—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith formed by a conductive layer on an insulating support
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/24—Supports; Mounting means by structural association with other equipment or articles with receiving set
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/24—Supports; Mounting means by structural association with other equipment or articles with receiving set
- H01Q1/241—Supports; Mounting means by structural association with other equipment or articles with receiving set used in mobile communications, e.g. GSM
- H01Q1/242—Supports; Mounting means by structural association with other equipment or articles with receiving set used in mobile communications, e.g. GSM specially adapted for hand-held use
- H01Q1/243—Supports; Mounting means by structural association with other equipment or articles with receiving set used in mobile communications, e.g. GSM specially adapted for hand-held use with built-in antennas
Definitions
- the present invention relates to a method for manufacturing an internal antenna, and in particular, by applying a pretreatment paint on the surface of the resin molding to achieve smooth and solid plating on the resin molding, thereby improving the reliability of plating formed on the resin molding. It relates to a built-in antenna manufacturing method.
- a built-in antenna is formed inside a wireless communication device such as a mobile phone to facilitate wireless transmission and reception.
- wireless communication devices such as mobile phones are not only built-in parts for the convenience and miniaturization of the portable, but also the thickness of the outer case in which the built-in antenna is formed continues to be thinner, which is relatively vulnerable to external shocks. do.
- the case material of a wireless communication device such as a mobile phone is mainly a mixture of ABS resin (Arylonitrile Butadiene Styrene copolymer) and polycarbonate resin (PolyCarbonate), or polycarbonate resin, or ABS resin and polycarbonate resin to strengthen the strength It is made of a mixture of glass fiber and glass fiber, or polycarbonate and glass fiber, and the plating adhesion of the internal antenna manufactured by the plating method is decreased because plating is not performed smoothly on such resin material. Due to the lack of sufficient plating reliability there was a problem causing excessive defects and quality degradation of the antenna performance.
- an object of the present invention is to apply a coating material for the pre-treatment to the surface of the resin molding used as a case material of a wireless communication device such as a mobile phone to achieve improved reliability during plating It is to provide a built-in antenna manufacturing method.
- Another object of the present invention is to manufacture a built-in antenna to achieve a productivity improvement by remarkably shortening the working time while preventing quality degradation by compensating the damaged portion of the metal plating layer formed on the non-radiation pattern completely and at the same time.
- the present invention provides a method of manufacturing an embedded antenna using electroplating, comprising the steps of: (a) forming a coating layer with a pretreatment paint on a resin molding; (b) forming a metal plating layer on an upper surface of the paint layer; (c) etching the laser pattern so that the radiation pattern portion and the antenna contact portion are electrically separated from the non-radiation pattern portion on the metal plating layer; (d) immersing the laser-etched resin molding on a hanger so as to electrically separate the radiation pattern portion and the antenna contact portion from the non-radiation pattern portion, and immersing it in an electroplating bath; (e) forming a primary conductive layer on the radiation pattern portion and the antenna contact portion; (f) forcibly peeling the metal plating layer formed on the non-radiation pattern portion except for the radiation pattern portion and the antenna contact portion; (g) forming a secondary conductive layer on the radiation pattern portion and the antenna contact portion; (h) forming an electrolytic nickel plating layer on
- the paint is characterized by consisting of 30 to 40% by weight of acetone, 30 to 40% by weight of methyl ethyl ketone, 10 to 20% by weight of cyclohexanone, ABS resin or 10 to 20% by weight of LPC resin.
- the radiation pattern portion and the antenna contact portion may form a gap between the non-radiation pattern portion 100 ⁇ m to 200 ⁇ m to prevent a defect due to a short phenomenon during electroplating.
- Forcibly peeling the metal plating layer in the step (f) is characterized in that the chemical peeling including sulfuric acid and hydrogen peroxide solution, not electrolytic peeling.
- the present invention can achieve improved adhesion of plating with various resin materials when manufacturing an embedded antenna, thereby improving reliability in a uniform and solid plating state.
- the present invention has an effect that can significantly shorten the manufacturing time of the built-in antenna to improve productivity and reduce costs.
- the present invention can increase the distance between the radiation pattern portion, the antenna contact portion and the non-radiation pattern portion can achieve the effect of reliably preventing the short phenomenon occurring during electroplating.
- FIG. 1 is a flowchart illustrating a procedure of a method of manufacturing a built-in antenna according to a preferred embodiment of the present invention.
- FIG. 2 is a view schematically showing the overall configuration of the electroplating apparatus connected to the current integration regulator according to the built-in antenna manufacturing method of the present invention.
- 3 and 4 are schematic views illustrating a procedure of forming a radiation pattern portion and an antenna contact portion, which are built-in antennas, according to the present invention, in a resin molded product forming a case of a wireless communication device such as a mobile phone.
- FIG. 5 is a view schematically showing the antenna contact portion formed on the back (inner surface) of the resin molding according to the present invention.
- FIG. 6 is a view schematically showing an enlarged cross-sectional view of the A-A line of FIG. 3.
- FIG. 7 is a view schematically illustrating an enlarged cross-sectional view of the B-B line of FIG. 3.
- FIG. 8 is a view schematically showing an enlarged cross-sectional view of the C-C line of FIG. 3.
- FIG. 9 is a view schematically showing an enlarged cross-sectional view of the E-E line in FIG. 3.
- FIG. 10 is a view schematically showing an enlarged cross-sectional view taken along the line F-F of FIG. 4.
- FIG. 11 is a view schematically showing an enlarged cross-sectional view taken along the line G-G of FIG. 4.
- FIG. 12 is a view schematically showing an H-H enlarged cross-sectional state of FIG. 4.
- the present invention comprises the steps of (a) forming a paint layer (110); (b) forming a metal plating layer 120; (c) etching with a laser; (d) dipping in an electroplating bath; (e) forming a primary conductive layer; (f) forcibly peeling off the metal plating layer; (g) forming a secondary conductive layer; (h) forming a nickel plating layer; (i) sealing, washing and drying; This is done roughly.
- Forming the coating layer 110 by coating the pretreatment paint on the resin molding (a) may include smooth and solid plating when the metal plating layer 120 is formed on the upper surface of the coating layer 110. ) To achieve.
- the case material of a mobile phone or other wireless communication device mainly formed by injection molding is mainly a mixture of acrylonitrile butadiene styrene copolymer and polycarbonate resin, or polycarbonate or ABS resin and polycarbonate resin. Because it is made of glass fiber or polycarbonate and glass fiber, if you try to make the built-in antenna by electroplating method, plating is done except ABS resin or Liquid Crystal Polymer (LCP) resin. Since it is not formed smoothly and firmly to solve this problem is to form a paint layer 110 by applying a pre-treatment paint.
- LCP Liquid Crystal Polymer
- the paint is 30 to 40% by weight of acetone (acetone), 30 to 40% by weight of methyl ethyl ketone (MEK), 10 to 20% by weight of cyclohexanone, ABS resin or LCP resin 10 It consists of-20 weight%.
- ABS resin or LCP resin when the weight of ABS resin or LCP resin is more than 20%, the concentration is high, so the dissolution efficiency of ABS resin or LCP resin becomes higher than the limit point, and the spraying is not performed properly due to some undissolved resin grains. There is a problem that the formation of particles is difficult.
- coats the coating material comprised as mentioned above to a resin molding is preferable to form 6 micrometers-16 micrometers, it may be added or subtracted as needed.
- the coating layer 110 applied as described above is preferably forcibly dried at 60 °C to 80 °C.
- the paint is preferably used when the use temperature is less than 85 °C ABS resin that can be used at a relatively low temperature, and the use of LCP resin that can be used at a relatively high temperature when the use temperature is more than 85 °C ⁇ 240 °C.
- ABS resin when the internal antenna is formed on the surface of the resin molding 100 constituting the case of the wireless communication device such as a mobile phone and when the reliability test is performed at 85 ° C. or lower.
- the resin molding 100 constituting the case of a wireless communication device such as a mobile phone
- the resin is injected again thereon.
- LCP resin is also used in this case because the paint must withstand the injection temperature (approximately 220 °C ⁇ 240 °C) conditions and pressure because it must be formed in the form.
- the step (b) is to form a metal plating layer 120 on the coating layer 110 of the resin molding 100, electroless plating (electroless plating: metal ions in the metal salt aqueous solution without receiving electrical energy from the outside) Is a method of self-catalytic reduction of a metal on the surface of a workpiece by using a reducing agent.) Copper, nickel and nickel alloys are easily dissolved by an acidic plating solution or components during electroplating. Electric conduction using a plating agent such as electric charge (when an electric field is present in a conductor, electric charges are generated and electric current is generated. As an electric charge, electrons or ions, etc., are light and electrons have a great influence on electric conductivity.
- the metal plating layer 120 is formed on the entire surface of the resin molding 100 which is a non-conductor.
- the metal plating layer 120 may be formed to have a thickness of 0.1 ⁇ m to 0.5 ⁇ m suitable for laser etching the radiation pattern portion 121 and the antenna contact portion 122 for the antenna function.
- the radiation pattern portion 121 and the antenna contact portion for the antenna function are etched with a laser on the surface of the metal plating layer 120 formed by electroless plating on the front and back of the resin molding 100.
- 122 is formed to be electrically separated from the non-radiation pattern portion (all portions except the radiation pattern portion and the antenna contact portion) 123.
- the radiation pattern portion 121 and the antenna contact portion 122 are electrically separated from the non-radiation pattern portion 123 so that only the radiation pattern portion 121 and the antenna contact portion 122, which require plating, are electrically charged.
- the boundary is marked by etching (etching) with a laser beam so as to be supplied.
- the radiation pattern portion 121 and the antenna contact portion 122 is preferably such that the interval between the non-radiation pattern portion 123 to 100 ⁇ m ⁇ 200 ⁇ m to prevent defects due to short phenomenon during electroplating. .
- Such laser etching is a method of small size or surface processing that applies the corrosion effect of chemicals, and the metal plating layer 120 electrodeposited on the surface of the resin molding 100 is not separated and stably.
- the conductive layer formed by electroplating is formed in the radiation pattern portion 121 and the antenna contact portion 122 to a sufficient thickness, electrical conduction is performed even in various coarse thermal mechanical external conditions that may occur in a practical use environment of the antenna.
- the metal plating layer 120 for maintaining the antenna function stably without peeling.
- This laser etching operation is very important in keeping the antenna function smooth and good.
- the radiation pattern part 121 and the antenna contact part 122 are fixed to the contacts of the electroplating rack 210.
- a portion of the electroplating hanger 210 may be fixed to one or more points including one point of the conductive radiation pattern portion 121 and the antenna contact portion 122, but preferably
- the through hole 124 to electrically conduct between the conductive radiation pattern portion 121 located in the front portion of the resin molding 100 and the antenna contact portion 122 located in the rear portion secures about 0.5 ⁇ 2mm It is good to fit the battery contacts of the electroplating hanger 210 to the through-electric conduction path.
- step (d) the hanger 210 for electroplating the resin molding 100 having the laser-etched radiation pattern portion 121 and the antenna contact portion 122 so as to be electrically separated from the non-radiation pattern portion 123.
- the plating solution 230 of the electroplating device 200 is charged after connecting the current integration adjusting device 300 to a plurality of electroplating racks (210) It is immersed in the electroplating tank 240.
- the current integration adjustment device 300 by electroplating the metal conductive radiation pattern portion 121 and the antenna contact portion 122 that is electrically energized with the contacts of the electroplating hanger 210 is fixed
- the supply time of the current supplied when increasing the thickness of the conductive layer is not set to a fixed value separately, but the integrated value multiplied by the current and the plating time is set to be proportional to the number of products for each electroplating hanger 210 and the set current integration value
- the electric power supply is stopped or alarmed when the plating thickness is reached, so that the deviation of current flowing for each part in the plating tank 240 and the excessive or insufficient plating caused by the variable electric condition during the plating is performed.
- Electroplating hanger without being influenced by ripple of supply current, installation interval of anode rod, slope, density of anode rod, change of resistance according to concentration and flow of plating solution 210 deviation between the coating thickness can be minimized.
- the electroplating apparatus 200 distributes a rectifier for supplying a DC current and a cathode rod (not shown) for distributing the DC current, a cathode rod, and a copper or nickel used as a conventional electroplating anode material and a cathode current.
- the cathode rod and the electroplating hanger 210 is stationary and comprises a hanger 220 that can supply electricity to it separately.
- the current integration adjustment device 300 the current sensing sensor for detecting the amount of current supplied to each of the electroplating hanger 210 in real time and the time of plating the current value sensed by the current sensing sensor It is configured to include an LCD display having a micro process and a peripheral circuit and a buzzer for indicating the current progress of the target plating thickness desired by the user through integration.
- the current integrating and adjusting device 300 is connected to each stool bed 220 of the electroplating device 200 and operated respectively.
- the step (e) is to form the primary conductive layer 130 on the radiation pattern portion 121 and the antenna contact portion 122, the plating solution 230 accommodated in the electroplating tank 240 Supplying current to each immersed electroplating hanger (210) to a thickness (approximately 15 ⁇ m) set to electrolytic copper plating on the radiation pattern portion 121 and the antenna contact portion 122 of the resin molding 100
- the primary conductive layer 130 is formed.
- the metal plating layer 120 formed on the non-radiation pattern portion 123 is partially peeled off.
- the step (f) is a step of completely forcibly peeling off the non-peeled metal plating layer 120 formed on the non-radiation pattern portion 123 except for the radiation pattern portion 121 and the antenna contact portion 122. 1 minute to 5 minutes of the resin molding 100 soaked in a stripping tank (not shown) in which sulfuric acid) and hydrogen peroxide (Hydrogen Peroxide) were mixed at a ratio of 1: 1.
- the metal plating layer 120 formed by electroless plating on the non-radiation pattern portion 123 except for 122 is chemically and completely peeled off.
- the secondary conductive layer 140 is formed on the radiation pattern portion 121 and the antenna contact portion 122 of the resin molding 100 in which the metal plating layer 120 of the non-radiation pattern portion 123 is peeled off.
- a step of forming by supplying a current to each electroplating hanger 210 immersed in the plating solution 230 of the electroplating tank 240 to the radiation pattern portion 121 and the antenna contact portion 122
- the secondary conductive layer 140 is formed to a thickness (approximately 0.5 ⁇ m to 2 ⁇ m) set by electrolytic copper plating.
- the metal plating layer 120 of the non-radiation pattern portion 123 formed by electroless plating is completely forcibly peeled off, and then the secondary conductive layer is again.
- the forming of 140 is performed by forcibly peeling the metal plating layer 120 and then performing electro-nickel plating, so that a film of a chemical formed during the peeling of the metal plating layer 120 interferes with the adhesion between the electro-nickel and the film between copper and nickel. Separation will appear.
- Secondary conductive layer 140 to eliminate the film separation between the copper and nickel, and to compensate for the copper plating of some damaged radiation pattern 121 when the metal plating layer 120 of the non-radiation pattern portion 123 is forcibly peeled off. To form.
- the step (h) is to form an electrolytic nickel plating layer 150 on the radiation pattern portion 121 and the antenna contact portion 122 on which the secondary conductive layer 140 is formed, and the electroplating tank 240 Supplying a current to each electroplating hanger 210 immersed in the plating solution 230 of the nickel plating layer 150 to a thickness set by electrolytic nickel plating on the radiation pattern portion 121 and the antenna contact portion 122 To form.
- the step (i) is a step of sealing, washing, and drying the resin molding 100 on which the nickel plating layer 150 is formed. Since there is a pinhole of plating, after plating, the anticorrosive effect is treated by using a sealing agent.
- drying at a temperature not too high is preferable, and preferably, moisture of the surface of the product by hot air drying or dehydration drying in a temperature range of about 40 to 60 ° C. Remove it.
- the formation of the radiation pattern portion 121 and the antenna contact portion 122 for electric conduction through electroless plating on the resin molding 100 for forming the built-in antenna is degreasing as in ordinary plastic decorative plating. -> Etching-> Neutralization-> Active 1-> Active 2-> Electroless Copper or Electroless Nickel etc.
- the resin molded product 100 which is a built-in antenna injection-molded with a mixed material, is degreased at 50 ° C. for 5 minutes with a conventional plastic degreasing solution to remove foreign substances on the surface, and is subjected to 72 ° C. with 500 g / l of chromic anhydride and 200 ml / l of sulfuric acid.
- the resin molding 110 on which the paint layer 110 was formed was forcibly dried at 60 ° C to 80 ° C.
- a neutralizing solution obtained by mixing the resin molding 110 having the paint layer 110 with 18% by weight of hydroxylamine sulfate and 82% by weight of distilled water, 10% by weight of 35% hydrochloric acid, and 8.7% by weight of water. The mixture was mixed with water at a temperature of about 60 ° C. for 5 minutes and then washed with water to neutralize the mixture.
- the neutralized resin molding 100 was converted into 100 cc / l and 100 cc / l of a catalyst addition solution containing 0.2 g / l and 520 g / l of palladium chloride (PdCl2) and stannous chloride (SnCl2), respectively.
- the first activity treatment was performed by 5% sulfuric acid at 40 ° C. for 2 minutes for 10 minutes, followed by 3 times of washing with water for 2nd activation treatment.
- the activated resin molding 100 was electroless plated for 3 minutes in a commercial chemical copper standard plating solution containing copper sulfate to form a metal plating layer 120 having a thickness of 0.1 ⁇ m to 0.5 ⁇ m.
- the through hole 124 for energizing the radiation pattern portion 121 and the antenna contact portion 122 is positioned inside the boundary line formed by laser etching.
- the radiation pattern portion 121 and the antenna contact portion 122 are inserted by inserting a contact point of the electroplating hanger 210 having a diameter of 0.6 mm into the through hole 124 etched (marked) by the laser.
- the resin moldings 100 were placed on a plurality of (5) electroplating hangers 210 by 48 lines at equal intervals, with 4 lines of 12 pieces each up and down between the electroplating hangers 210.
- a plurality of electroplating hangers 210 on which the resin molding 100 was left still were immersed in the hanging bed 220 of the electroplating bath 240 to be dipped.
- the electroplating bath 240 is dissolved in a concentration of copper sulfate 200g / L, sulfuric acid 60ml / L, which corresponds to the concentration range equivalent to the composition of a conventional copper sulfate electroplating solution.
- the resin molding 100 is immersed in a stripping tank (not shown) in which sulfuric acid and hydrogen peroxide are mixed at a ratio of 1: 1. ) And the metal plating layer 120 formed on the non-radiation pattern portion 123 except for the antenna contact portion 122 is chemically forcibly peeled off.
- the work time for peeling the metal plating layer 120 formed on the non-radiation pattern portion 123 may be significantly shortened to maximize productivity improvement.
- the resin molding 100 in which the metal plating layer 120 formed on the non-radiation pattern portion 123 is peeled off is left still on the electroplating rack 210, and then 60 Amin is used by using the current integration adjusting device 300.
- the film generated in the peeling tank is removed when the metal plating layer 120 is peeled off.
- the electroplating hanger 210 which is washed with water after the electroplating, is introduced into the nickel electroplating tank 240 filled with the plating solution 230 in the same manner as the electroplating, and installed in the electroplating tank 240.
- a current integration control device 300 to supply electricity to each of the plurality of electroplating hanger 210 at an average of 2A at 15Amin, electro-nickel plating to a total of 10A by radiation pattern portion 121 and antenna contact portion 122
- the nickel plating layer 150 was formed in (h).
- the nickel electroplating tank 240 has a liquid composition having the same composition as the usual decorative electric nickel plating solution of nickel sulfate 260g / L, film nickel 50g / L, boric acid 50g / L, pH 4.0 ⁇ pH 5.0, temperature 52 °C to be.
- the oxidation of the radiation pattern portion 121 and the antenna contact portion 122 damaged in the stripping tank to remove the metal plating layer 120 can be compensated for and at the same time prevent scratches.
- the electroplating hanger 210 reaching the integrated current amount set as described above is sequentially removed from the electroplating tank 240 to seal the resin molding 100 having the nickel plating layer 150 formed thereon, water washing, Drying treatment (i)
- the productivity of the internal antenna can be increased by at least 2 to 3 times, as well as to form a uniform plating layer, improve the plating reliability, and improve the manufacturing quality of the internal antenna. It is also able to outperform price competitiveness.
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Abstract
Description
Claims (5)
- 전기도금을 이용한 내장형 안테나 제조방법에 있어서,(a) 수지 성형물에 전처리용 도료로 도료층을 형성하는 단계와;(b) 상기 도료층의 상면에 금속 도금층을 형성하는 단계와;(c) 상기 금속 도금층에 방사패턴부 및 안테나접점부가 비 방사패턴부와 전기적으로 분리 형성되도록 레이저로 식각하는 단계와;(d) 상기 방사패턴부 및 안테나접점부가 비 방사패턴부와 전기적으로 분리되도록 레이저 식각된 수지 성형물을 걸이대에 걸어 전기도금조에 침지시키는 단계와;(e) 상기 방사패턴부와 안테나접점부에 1차 전도층을 형성하는 단계와;(f) 상기 방사패턴부와 안테나접점부를 제외한 비 방사패턴부에 형성된 금속 도금층을 강제 박리하는 단계와;(g) 상기 방사패턴부와 안테나접점부에 2차 전도층을 형성하는 단계와;(h) 상기 2차 전도층이 형성된 방사패턴부와 안테나접점부에 전해 니켈 도금층을 형성하는 단계와;(i) 상기 니켈 도금 층이 형성된 수지 성형물을 봉공처리, 수세, 건조하는 단계; 를 포함하여 이루어지는 것을 특징으로 하는 도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법.
- 제1항에 있어서,상기 도료는 아세톤 30∼40 중량%, 메틸에틸케톤 30∼40 중량%, 시클로헥사논 10∼20 중량%, ABS수지 또는 LPC 수지 10∼20 중량%로 이루어지는 것을 특징으로 하는 도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법.
- 제1항에 있어서,상기 (c) 단계에서 방사패턴부 및 안테나접점부는 비 방사패턴부와의 간격을 100㎛∼200㎛를 이루도록 하여 전기 도금시 쇼트현상으로 인한 불량을 방지하도록 하는 것을 특징으로 하는 도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법.
- 제1항에 있어서,상기 (f) 단계에서 금속 도금층을 강제 박리하는 하는 것은 전해 박리가 아닌 황산, 과산화수소수를 포함하는 화학적 박리인 것을 특징으로 하는 도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법.
- 제2항에 있어서,상기 도료는 사용온도가 85℃ 이하일 경우 ABS수지를 사용하고, 사용온도가 85℃ 이상∼240℃이하일 경우 LCP수지를 사용하는 것을 특징으로 하는 도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201380078709.7A CN105453337B (zh) | 2013-06-03 | 2013-08-26 | 具有提高镀层可靠性的能力的内置天线制造方法 |
| JP2016518249A JP6123025B2 (ja) | 2013-06-03 | 2013-08-26 | 内蔵型アンテナの製造方法 |
| EP13886382.4A EP3007271B1 (en) | 2013-06-03 | 2013-08-26 | Internal antenna manufacturing method having capability to improve plating reliability |
| US14/895,491 US9819076B2 (en) | 2013-06-03 | 2013-08-26 | Intenna manufacturing method having capability to improve plating reliability |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020130063464A KR101290670B1 (ko) | 2013-06-03 | 2013-06-03 | 도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법 |
| KR10-2013-0063464 | 2013-06-03 |
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| Publication Number | Publication Date |
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| WO2014196692A1 true WO2014196692A1 (ko) | 2014-12-11 |
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| PCT/KR2013/007624 Ceased WO2014196692A1 (ko) | 2013-06-03 | 2013-08-26 | 도금 신뢰성 향상 기능을 갖는 내장형 안테나 제조방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9819076B2 (ko) |
| EP (1) | EP3007271B1 (ko) |
| JP (1) | JP6123025B2 (ko) |
| KR (1) | KR101290670B1 (ko) |
| CN (1) | CN105453337B (ko) |
| WO (1) | WO2014196692A1 (ko) |
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| KR101537466B1 (ko) * | 2014-01-13 | 2015-07-16 | 하명석 | 인테나 특성 및 성능향상을 위한 핸드폰 체결형 금속 테두리 케이스 제조 방법 |
| KR101392881B1 (ko) | 2014-02-12 | 2014-05-08 | 주식회사 유텍솔루션 | 휴대단말기용 nfc 안테나 제조방법 |
| CN104168730B (zh) * | 2014-02-26 | 2019-06-11 | 深圳富泰宏精密工业有限公司 | 壳体、应用该壳体的电子装置及其制作方法 |
| DE202016008419U1 (de) * | 2015-12-23 | 2017-12-20 | Apple Inc. | Gehäuse mit metallischer lnnenflächenschicht |
| US10447834B2 (en) | 2016-09-21 | 2019-10-15 | Apple Inc. | Electronic device having a composite structure |
| CN106532240B (zh) * | 2016-12-26 | 2023-09-26 | 青岛伟林电子有限公司 | 一种手机天线及其化镀工艺 |
| CN106935965B (zh) * | 2017-03-24 | 2024-03-19 | 苏州胜利精密制造科技股份有限公司 | 一种具有天线装饰功能的壳体及制备工艺 |
| KR102011405B1 (ko) * | 2017-12-19 | 2019-10-21 | (주)드림텍 | Led 램프 제조 방법 및 그 램프 |
| CN108382719B (zh) * | 2018-01-31 | 2019-11-12 | 成都优印佳科技有限公司 | 一体式rfid防伪瓶盖生产方法及系统 |
| US11241386B2 (en) * | 2019-02-13 | 2022-02-08 | Biolife, L.L.C. | Wound sealing powder |
| WO2024168499A1 (en) * | 2023-02-14 | 2024-08-22 | Goertek Inc. | Molded article for lds antenna, antenna assembly, mobile device, method for manufacturing the antenna, and molding tool for the article |
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- 2013-08-26 WO PCT/KR2013/007624 patent/WO2014196692A1/ko not_active Ceased
- 2013-08-26 EP EP13886382.4A patent/EP3007271B1/en active Active
- 2013-08-26 US US14/895,491 patent/US9819076B2/en not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| CN105453337A (zh) | 2016-03-30 |
| US20160149294A1 (en) | 2016-05-26 |
| JP2016526107A (ja) | 2016-09-01 |
| US9819076B2 (en) | 2017-11-14 |
| EP3007271A4 (en) | 2017-02-08 |
| KR101290670B1 (ko) | 2013-07-29 |
| CN105453337B (zh) | 2017-11-17 |
| EP3007271B1 (en) | 2020-02-19 |
| EP3007271A1 (en) | 2016-04-13 |
| JP6123025B2 (ja) | 2017-04-26 |
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