WO2014202157A1 - Dispositif et procédé de commande de processus de fusion non ferreux - Google Patents

Dispositif et procédé de commande de processus de fusion non ferreux Download PDF

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Publication number
WO2014202157A1
WO2014202157A1 PCT/EP2013/068282 EP2013068282W WO2014202157A1 WO 2014202157 A1 WO2014202157 A1 WO 2014202157A1 EP 2013068282 W EP2013068282 W EP 2013068282W WO 2014202157 A1 WO2014202157 A1 WO 2014202157A1
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WIPO (PCT)
Prior art keywords
furnace
fluid
passivation
wavelength
concentration
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Ceased
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PCT/EP2013/068282
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English (en)
Inventor
Axel Kramer
Thomas Alfred Paul
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ABB Research Ltd Switzerland
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ABB Research Ltd Switzerland
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Publication of WO2014202157A1 publication Critical patent/WO2014202157A1/fr
Anticipated expiration legal-status Critical
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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B26/00—Obtaining alkali, alkaline earth metals or magnesium
    • C22B26/20—Obtaining alkaline earth metals or magnesium
    • C22B26/22—Obtaining magnesium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/05—Refining by treating with gases, e.g. gas flushing also refining by means of a material generating gas in situ
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/02—Supplying steam, vapour, gases or liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
    • B22D21/00—Casting non-ferrous metals or metallic compounds so far as their metallurgical properties are of importance for the casting procedure; Selection of compositions therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • F27D2019/0006—Monitoring the characteristics (composition, quantities, temperature, pressure) of at least one of the gases of the kiln atmosphere and using it as a controlling value
    • F27D2019/0012—Monitoring the composition of the atmosphere or of one of their components

Definitions

  • the present invention relates to a device and a method for controlling melting processes for non-iron metals, particularly for controlling a gas passivation layer in a furnace for melting non-iron metals or alloys.
  • cover gas concen ⁇ tration at an optimum level, i.e. to provide enough to fulfill the requirements as cover gas (at conservative cover gas usage levels) , but as little as possible to protect the environment.
  • cover gas at conservative cover gas usage levels
  • the gas of the head space escapes quickly and the cover gas is diluted with incoming environmental air. If the con- centration of cover gas in the head space is too low, the protecting film is not homogeneously closed and violent reactions with oxygen can occur. If the concentration is too high, too much dross is produced and the process is not economical anymore.
  • concentration of cover gas in the head space above the molten metal must be monitored and readjusted to ensure optimum process conditions.
  • a method to indirectly measure the required amount of cover gas for sufficient protection is outlined in the European patent application EP 1 918 044 Al . Therein a concept is used that is based on the sensing of either moisture or oxygen content in the cover gas head space. This output is used subsequently for indirectly deducing the PFK concentration.
  • magnesium melt protection methods using CO 2 snow.
  • an oxygen analyzer is used as described for example in: "Magnesium alloy melt protection by high-efficiency phase transition of carbon dioxide", S. -C.Yang and Y.-C. Lin, Journal of Cleaner Production 41 (2013) p.74-78.
  • a furnace for melting non-iron metals or alloys thereof, particularly magnesium and/or aluminum and their alloys, with a monitoring system for monitoring in-situ the concentration of a passivation fluid within a cover gas, with the monitoring system including a sensor for determining a concentration- dependent electromagnetic property of the passivation fluid molecules at at least one wavelength or wavelength band of the electromagnetic wave spectrum.
  • the determining the concentration-dependent electromagnetic property comprises determining an emission and/or an absorption and/or a transmission and/or a scattering by the passivation fluid molecules .
  • the system thus monitors the concentration directly, i.e. based on the measurement of a response of the molecules of the passivation fluid to electromagnetic radiation, preferably in form of an attenuation or a transmission measurement.
  • the monitoring system is mounted stationary and monitors the concentration continuously, quasi-continuously, or at least at intervals of less than 1 hour, in particular at intervals of less than 10 minute or even less than 1 minute.
  • perfluorinated a partly fluori- nated or fully fluorinated compound of an define, alkane, ketone or polyketone, ether or poly- ether, and any mixtures thereof.
  • Most preferred embodi ⁇ ments are perfluoroketones having from 5 carbon atoms to 9 carbon atoms that shall be monitored.
  • perfluoroketones having from 5 carbon atoms to 9 carbon atoms include CF 3 CF 2 C (0) CF (CF 3 ) 2 , (CF 3 ) 2 CFC (0) CF (CF 3 ) 2 , CF 3 (CF 2 ) 2 C(0)CF(CF 3 )2, CF 3 (CF 2 ) 3 C (0) CF (CF 3 ) 2 ,
  • the at least one wavelength or wavelength band is in the range of 200 nm to 20000 nm, more preferably in the range of 200 nm to 400 nm and/or 1850 nm to 1950 nm and/or 5000 nm to 20000 nm.
  • the senor includes a radia ⁇ tion source and/or a spectral filter that is or are tuned each or both in combination to at least one wavelength or wavelength band in the spectral range of 200 nm to 20000 nm, for example in at least one of the spectral ranges of 200 nm to 400 nm, 1850 nm to 1950 nm and 5000 nm to 20000 nm.
  • hydrofluoroethers hydrofluoro monoethers, hydrofluoro monoethers containing at least 3 carbon at ⁇ oms, perfluoro monoethers, perfluoro monoethers contain ⁇ ing at least 4 carbon atoms, fluorooxiranes , perfluo- rooxiranes, hydrofluorooxiranes , perfluorooxiranes com- prising from three to fifteen carbon atoms, hydrofluo- rooxiranes comprising from three to fifteen carbon atoms, and mixtures thereof;
  • ketones in particular: hydrofluoro monoketones, perfluoro mono- ketones, perfluoro monoketones comprising at least 5 car ⁇ bon atoms, and mixtures thereof;
  • fluoroolefins in particular: perfluoroole- fines, hydrofluoroolefins (HFO) , hydrofluoroolefins (HFO) comprising at least three carbon atoms, hydrofluoro- olefins (HFO) comprising exactly three carbon atoms, trans-1, 3, 3, 3-tetrafluoro-l-propene (HFO-1234ze) ,
  • the senor includes a part extending into the furnace or a window for transmitting radiation into and/or receiving radiation out of the furnace.
  • the sensor can include a part ex ⁇ tending into a by-pass or extraction pipe being in a flu- id connection with the furnace or its head space, and/or the sensor can include a window for transmitting into and/or receiving radiation out of the by-pass or extraction pipe.
  • the by-pass or extrac ⁇ tion pipe can be temperature-controlled.
  • the by-pass or extraction pipe can further include a pressure reducer for reducing the pressure at a point where the sensor has an interface to the by-pass or pipe.
  • the monitoring system in particular the sensor, comprises an insulation-fluid- permeable and particle-impermeable protective cover, that separates the monitoring device, in particular an optical beam and/or optical components of the sensor, from a surrounding region inside the furnace or outside the fur ⁇ nace .
  • the monitoring system in particular the sensor, comprises an optical measurement channel or beam at a first wavelength (e.g. that is ab ⁇ sorbed by the first fluid component (A) ) , and an optical reference channel or beam at a second wavelength that is not modified, in particular not absorbed, by the pas ⁇ sivation fluid, in particular fluoroketone .
  • a first wavelength e.g. that is ab ⁇ sorbed by the first fluid component (A)
  • an optical reference channel or beam at a second wavelength that is not modified, in particular not absorbed, by the pas ⁇ sivation fluid, in particular fluoroketone .
  • the monitoring system is part of or is connected to a flow control system delivering a cover gas to the furnace and being connected to a supply of the pas ⁇ sivation fluid, in particular to a supply of passivation fluid mixed with a carrier gas, or being connected to separate supplies of both passivation fluid and a carrier gas.
  • the flow control system includes one or more nozzles for injecting the passivation fluid or the passivation fluid mixed with a carrier gas into the furnace and in particular into its head space.
  • the concentration of the passivation fluid in the cover gas mixture i.e. when mixed with the carrier gas, is typically in a range of 100 ppm to 2000 ppm.
  • the device is best combined with one or more further sensors monitoring for example an oxygen content, and/or a moisture level, and/or carrier gas concentration.
  • a method for controlling a fur ⁇ nace for melting non-iron metals and alloys, particularly magnesium or aluminum and their alloys the method in- eluding the step of monitoring in-situ a concentration of a passivation fluid in a cover gas by determining a concentration-dependent electromagnetic property of pas ⁇ sivation fluid molecules at at least one wavelength or wavelength band of the electromagnetic wave spectrum.
  • the determining the concentration-dependent electromagnetic property comprises de ⁇ termining an emission and/or an absorption and/or a transmission and/or a scattering by the passivation fluid molecules.
  • the method includes a further step of delivering a cover gas to the furnace by controlling a supply of the passivation fluid, in particular a supply of the passivation fluid mixed with a carrier gas or separate supplies of both the passivation fluid and a carrier gas.
  • one or more nozzles for injecting the passivation fluid or the passivation fluid mixed with a carrier gas into the furnace or the head space of the furnace are operated as a function of the in-situ measurements of the concentration of the pas ⁇ sivation fluid molecules, in particular as a function of a determined emission light power and/or absorption light power of the passivation fluid molecules at the at least one wavelength or wavelength band of the electromagnetic wave spectrum.
  • the method comprises the method elements of: measuring the concentration of the passivation fluid at a first wavelength, and correcting the measurement by using a second wavelength that is not absorbed by the passivation fluid, in particular fluoro- ketone .
  • FIG. 1A, IB, 1C are schematic diagrams of ex ⁇ emplary devices for controlling the cover gas in a furnace in accordance with three embodiments of the inven- tion;
  • FIG. 2 is a flow chart with method steps in accordance with an exemplary embodiments of the inven ⁇ tion.
  • Fig. 3 shows an optical sensor with an opti- cal measurement channel and an optical reference channel.
  • FIG. 1A shows a schematic diagram of a device for controlling the cover gas 136. Apart from the actual furnace part 10 the device includes a sensor part 12 and a flow control part 13.
  • the furnace 10 has the typical components of a melting furnace 10 for preparing a melt 11 of a non- iron metal or a non-iron metal alloy based for example on magnesium or on aluminum as main component.
  • the furnace wall 101 and the lid 102 house a crucible 103 which is heated using a heater 104. It can for example be part of an automated industrial robotic system supporting the process of die casting, lost foam, core handling and cleaning (not shown) .
  • the sensor part 12 can for example be located at least with one part or an extension close to the head space of the furnace 10.
  • it includes a temperature-controlled gas extraction tube 121.
  • the tube 121 forms a connection allowing a flow of fluid between the head space of the furnace 10 and the position of an optical sensor 122.
  • a pump (not shown) to drive a gas flow from the head space to the position of the sensor 122.
  • the sensor 122 can for example be a radiation source paired with a photo detector positioned across a measuring chamber or both positioned on one side of the measuring chamber with the juxtaposed side of the measuring chamber being covered with a mirror to reflect radiation from the source and hence doubling the optical path of the radiation through the sample of cover gas 136 in the measuring chamber.
  • the wavelength or wavelength band at which the sensor operates can be in the UV, in the near-IR or the mid-IR range or more specifically in at least one of the spectral ranges of 200 nm to 400 nm, 1850 nm to 1950 nm, and 5000 nm to 20000 nm, or any com ⁇ bination of those.
  • the UV band can be accessed using as light source 12 a gas discharge lamp, e.g. a deuterium lamp as commercially available (e.g. Ocean Optics DT-Mini-2-GS with appropriate filter) , or UV LEDs that emit in a narrow spectral region, as commercially available for example from Mightex, Toronto, Ontario Canada.
  • gas discharge lamp e.g. a deuterium lamp as commercially available (e.g. Ocean Optics DT-Mini-2-GS with appropriate filter)
  • UV LEDs that emit in a narrow spectral region, as commercially available for example from Mightex, Toronto, Ontario Canada.
  • Other UV light sources which can be used are excimer lamps (Xe) and NOx lamps (e.g. commercially available from Heraeus Noblelight or Analytical Control Instruments GmbH Berlin, Germany) .
  • the detector 13 for the UV band can be based on SiC photodiodes, as commercially available for example from Roithner Lasertechnik GmbH, Vienna, Austria.
  • the NIR band can be accessed using as light source 12 incandescent or quartz halogen light bulbs, NIR LEDs or VCSELs (vertical cavity surface emitting laser) , all of which are commercially available.
  • the detector 13 for the NIR band can be based on Si or InGaS photo- detectors that are also commercially available.
  • the source 12 can include a broad-band, incandescent light source (e.g. a radiating filament) with a notch filter permitting the transmission of only selected wavelengths that interrogate a narrow spectral region in which the re- spective molecules of the passivation fluid, such as for example a perfluoroketone, absorb.
  • a broad-band, incandescent light source e.g. a radiating filament
  • a notch filter permitting the transmission of only selected wavelengths that interrogate a narrow spectral region in which the re- spective molecules of the passivation fluid, such as for example a perfluoroketone, absorb.
  • Other sources can in ⁇ clude QCL (quantum cascade lasers) or lead salt diode la- sers, as are known per se and are commercially available.
  • the detector 13 for the MIR band can be based on PbS pho- todetectors, that are also commercially available.
  • An emission can be monitored for example by exciting the molecules of the passivation fluid, e.g. a perfluoroketone such as C5 (fluoroketone, in particular fluoromonoketone and/or perfluoroketone, comprising ex ⁇ actly 5 carbon atoms) or C6, at a wavelength around 300 nm and observing fluorescence in a band from 390 nm to 490 nm, particularly at around 420 nm.
  • a perfluoroketone such as C5 (fluoroketone, in particular fluoromonoketone and/or perfluoroketone, comprising ex ⁇ actly 5 carbon atoms) or C6, at a wavelength around 300 nm and observing fluorescence in a band from 390 nm to 490 nm, particularly at around 420 nm.
  • the sensor 12 is controlled by a sensor con ⁇ trol system 123.
  • the control system 123 is used to read out the sensor 122 and to convert the result of the opti ⁇ cal measurement into values for the flow control part 13.
  • the control system 123 can also be used for the general operation of the sensor 122, its calibration and other adjustments to it.
  • the flow control part 13 includes a flow con ⁇ troller 131 receiving input signals from the sensor con- troller 123.
  • the flow controller 131 controls the supply of the cover gas 136, which in the example shown is drawn from a reservoir 132 for the passivation fluid, e.g. a perfluoroketone such as C5, C6, or C7 (fluoroketone, in particular fluoromonoketone and/or perfluoroketone, com- prising exactly 7 carbon atoms) and a reservoir 133 for the carrier gas, e.g. CO 2 or pressurized air.
  • the flow controller 131 further includes a mixing chamber (not shown) connected to the two reservoirs 132, 133 and to one or more nozzles 135 used to spray the cover gas 136 over the surface of the melt 11 in the crucible 103.
  • the flow controller 131 can control the control valve 134 for the nozzle 135 and hence determine the amount of cover gas 136 to be sprayed onto the surface of the melt 11. By using additional valves (not shown) be- tween the mixing chamber (not shown) and the two reservoirs 132, 133, the flow controller 131 can further be used to change the concentration of the passivation fluid in the cover gas 136.
  • the above device 12, 13 can be operat ⁇ ed as a feedback control circuit, e.g. as a proportional- integral-derivative controller (PID controller) or the like. As illustrated in FIG.
  • PID controller proportional- integral-derivative controller
  • a desired concentration level of a perfluoroketone in the head space above the melt 11 or any equivalent of it can be set as reference value (step 21) .
  • the flow controller 131 calculates an "error" value as the difference between a directly or in- situ measured concentration of perfluoroketones (step 22) and the desired reference value or setpoint (step 23) and attempts to minimize the error by adjusting the flow through the nozzle 135 (step 24) .
  • NIR near-infrared
  • the spectra of CO 2 show a signif ⁇ icant band at 1960 nm and at 2000 nm, which however do not overlap with the above-mentioned fluoroketone bands.
  • Water absorption lines can interfere with the C5 absorption line, but this depends on the specific op ⁇ tical setup of the analyzer (e.g. the spectral width of detection) . Whether water interference causes a problem for the C5 detection of course depends on the relative absorption strength of the lines and the relative concentrations of C5 and water. However, according to this invention, water interference can be avoided completely by choosing appropriate sharp, narrow absorption features of for example C5 (or C6 or C7) that show no spectral over ⁇ lap with the absorption features of water.
  • a suitable wavelength or wave ⁇ length band for measuring the concentration of the passivation fluid directly or in-situ can be established by comparing the respective spectra of the passivation fluid molecules, of the carrier gas molecules and of any gase ⁇ ous reaction products of such molecules in the head space of the furnace 10.
  • FIG. IB A further example of the present invention is illustrated in FIG. IB.
  • the elements of the device iden ⁇ tical or similar to those of FIG. 1A are denoted using the same reference numerals.
  • the sensor part 12 includes a radiation source 122-1 and a photo re ⁇ garagever 122-2 which are separated such that the optical path crosses the head space above the melt 11 through the cover gas 136.
  • the radiation passes through windows or filters 121-1, 121-2 within the wall 102 of the furnace 10.
  • FIG. 1C A further example of the present invention is illustrated in FIG. 1C.
  • the elements of the device iden ⁇ tical or similar to those of FIG. 1A are denoted using the same reference numerals.
  • the sensor part 12 includes a by-pass 124 through which a part of the cover gas 136 in the head space above the melt 11 is circulated.
  • the by-pass 124 includes an optical sensor 122 as described above.
  • the extraction tube 121 or a by ⁇ pass 124 can for example be provided with a heater and/or a cooler.
  • This or these heater and/or cooler can be devices known in the art, e.g. resistance heaters, peltier elements, coolant pipes, etc..
  • NIR near infrared
  • PFIB perfluoroisobutene
  • a small amount of oxygen is added to the CO 2 carrier gas stream to provide a sink for perfluoroalkyl-radicals .
  • This oxygen content can also be monitored optically using the near infrared line of molecular O2 around 760 nm. This line can be ac ⁇ Cleard for example by commercially available VCSELs (ver- tical cavity surface emitting lasers) . In this way, both the ketone and the oxygen content can be tracked by one measurement system using two light sources.
  • the monitoring sys ⁇ tem in particular the sensor, comprises an insulation- fluid-permeable and particle-impermeable protective cover (not specifically shown, but e.g. present in the optical path between 122-1 to 122-2 in Fig. IB), that separates the monitoring device 12, in particular an optical beam and/or optical components of the sensor 122, from a sur- rounding region of the furnace 10, might it be inside the furnace 10 or outside the furnace 10.
  • the protective cover is selected from at least one of the group consisting of:
  • a membrane in particular comprising a polymer material
  • the protective cover (not ex ⁇ plicitly shown) can be in the form of a protective cover plate, e.g. a plate separating the electromagnetic or op ⁇ tical sensor 122 or at least some of its optical elements and/or beam paths, in particular beam paths of a measurement channel and/or reference channel; or it can be in the form of a protective cover tube, e.g. a tube enclos- ing the optical sensor 122 or at least some of its opti ⁇ cal elements and/or beam paths, in particular beam paths of a measurement channel and/or reference channel. Any other form suitable to separate the optical sensor 122 fully or partly from particles in the furnace 10 is pos ⁇ sible, as well.
  • the optical sensor 122 can be cleaned or purged, e.g. intermittently, by using for ex ⁇ ample one of: a flow of nitrogen, fluid jets, wipers, vi ⁇ brating piezo-crystals , etc..
  • Fig. 3 shows an embodiment of a monitoring system 12, in particular electromagnetic or optical sensor 122, with an optical measurement channel or beam at a first wavelength (e.g. that is modified, in particular absorbed, by the passivation fluid) , and an optical ref ⁇ erence channel or beam at a second wavelength that is not modified, in particular not absorbed, by the passivation fluid, in particular fluoroketone .
  • a first wavelength e.g. that is modified, in particular absorbed, by the passivation fluid
  • an optical ref ⁇ erence channel or beam at a second wavelength that is not modified, in particular not absorbed, by the passivation fluid, in particular fluoroketone .
  • optical fiber transmission changes e.g. due to bending losses, physical movement of fibers, stress, temperature
  • optical detector instability e.g. due to ag- ing
  • analyzer electronics instabilities (e.g. af ⁇ fected by electromagnetic interference or e.g. due to ageing) .
  • the first five factors can be mitigated by using an optical reference channel integrated into the optical sensor 122.
  • the blue light source BS is directly mounted to an optical feedthrough direct ⁇ ing the light through the measurement path (e.g. 122-1, 122-2) in fluid communication with the furnace 10 (see above) .
  • part of the light from the blue light source BS Prior to being coupled into the optical fiber or the measurement path, part of the light from the blue light source BS is split off using an optical beam split ⁇ ter BSP1 and is send to a blue reference detector BRD which measures the stability of the emitted light inten- sity of the blue light source BS .
  • a reference channel is used.
  • red light source RS (black beams) which is not absorbed by e.g. C5 as pas ⁇ sivation fluid, i.e. at wavelengths ⁇ > 360 nm, emitted by a red light source RS is used to interrogate the opti ⁇ cal path for optical transmission changes.
  • the emission stability of RS is recorded by a red reference detector RRD using a second beam splitter BSP2.
  • the red and blue light is combined (e.g. by a first dichroic mirror DM1) .
  • the red light traverses the same optical path (hatched beams) as the blue light, but is not absorbed by the passivation fluid (e.g. C5) .
  • the passivation fluid e.g. C5
  • the red light returns from the sensor head, it is split off using a second dichroic mirror DM2 to the red light detector RD.
  • a short pass filter FSP is arranged in front of the blue light detector BD and a long pass filter FLP is arranged in front of the red light detector RD.
  • the number density of the passivation fluid e.g. C5 can be obtained from the transmitted intensi ⁇ ties, and at the same time losses introduced in the opti ⁇ cal paths and variations in the intensity of the light sources can be corrected for.
  • the following formula can be used: with
  • t DM ⁇ b transmissivity of dichroic mirror DM1, DM2 for blue light
  • tf3S transmissivity of beam splitter BSP1 for refer ⁇ ence blue light (to blue reference detector BRD)
  • I re f (k) reference blue light intensity (falling onto blue reference detector BRD)
  • ⁇ ] _ 033 (b) blue light intensity losses on forward optical path to the gas (i.e. reduction of blue light inten- sity after BSP1 and DM1 by losses up to gas) and on the backward optical path from the gas to the detector BD (i.e. reduction of sensor return blue light intensity by losses) and
  • t-BS ⁇ transmissivity of beam splitter BSP2 for refer ⁇ ence red light (to red reference detector RRD)
  • Iref ⁇ reference red light intensity (falling onto red reference detector RRD)
  • 0 absorption cross section of dielectric insulation fluid component A (e.g. C5)
  • N number density of dielectric insulation fluid compo ⁇ nent A (e.g. C5 ) .
  • a periodic measurement e.g. a pulsed measure ⁇ ment
  • a pulsed measure ⁇ ment is preferable to minimize temperature-induced drift effects on the light sources.
  • time-gated detection e.g. via a lock-in amplifier
  • the red light detector RD, one dichroic mirror and the filters FLP and FSP can be omitted using just one common detector for both beams, given that detector sensitivity at the different wavelengths is sufficient or similar and the ratio of those sensitivities is known.
  • Electronics i.e. light source 122-1 and detec ⁇ tor 122-2, can be arranged at the optical components.
  • proper shielding from the furnace 10 is neces ⁇ sary, for example from heat and/or electromagnetic inter ⁇ ference present in the furnace 10 or in the neighbourhood of the furnace 10.
  • a fiber optic link can be used.
  • the reference channel setup is particularly useful, if the fibers cannot be held rigidly in place.
  • the fibers can be immobilized in a duct. In any case, whether the system requires fiber op ⁇ tic links depends on whether heat and/or electromagnetic interference is critical or not or can be shielded or not .
  • dis ⁇ closed device features herewith also disclose the corre ⁇ sponding method features
  • disclosed method features herewith also disclose the corresponding device features.

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Abstract

L'invention concerne un four (10) pour métaux non ferreux et un procédé de fonctionnement de celui-ci, ayant un système de surveillance (12) pour surveillance in situ de la concentration d'un fluide de passivation, tel que des perfluorocétones dans un gaz de couverture (136). Le système de surveillance (12) comprend un capteur (122) pour déterminer une émission et/ou une absorption du fluide de passivation à au moins une longueur d'onde ou bande de longueur d'onde du spectre des ondes électromagnétiques, la concentration mesurée étant utilisée en tant qu'entrée de commande pour un système de commande de débit (13) qui commande l'alimentation du gaz de couverture (136) dans le four (10).
PCT/EP2013/068282 2013-06-19 2013-09-04 Dispositif et procédé de commande de processus de fusion non ferreux Ceased WO2014202157A1 (fr)

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EPPCT/EP2013/062682 2013-06-19
EP2013062682 2013-06-19

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022502635A (ja) * 2018-09-21 2022-01-11 テノヴァ・グッドフェロー・インコーポレイテッド 炉の排ガス成分および流速測定のための原位置装置

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