WO2015102142A1 - Procédé de traitement de surface de matériau métallique intérieur/extérieur et matériau métallique intérieur/extérieur à traitement de surface - Google Patents

Procédé de traitement de surface de matériau métallique intérieur/extérieur et matériau métallique intérieur/extérieur à traitement de surface Download PDF

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WO2015102142A1
WO2015102142A1 PCT/KR2014/000297 KR2014000297W WO2015102142A1 WO 2015102142 A1 WO2015102142 A1 WO 2015102142A1 KR 2014000297 W KR2014000297 W KR 2014000297W WO 2015102142 A1 WO2015102142 A1 WO 2015102142A1
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metal
exterior material
aluminum
interior
metal interior
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조상무
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • C25D11/243—Chemical after-treatment using organic dyestuffs
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • C25D11/246—Chemical after-treatment for sealing layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon

Definitions

  • the present invention relates to a method for surface treatment of metal interior and exterior materials and to a surface-treated metal interior and exterior material, and more particularly to forming a barrier layer made of a valve metal and a surface layer made of an aluminum-based metal on various metal interior and exterior materials.
  • the present invention relates to a surface treatment technology for metal interior and exterior materials that realizes an elegant and uniform surface color by applying anodization technology.
  • Anodizing is one of the electrochemical film forming methods, which uses an aqueous solution of sulfuric acid, hydroxyl, chromic acid, etc. as an electrolyte to form an anodized film on a metal surface, such as aluminum, to provide mechanical, electrical, and chemical properties.
  • the film formed by the anodic oxidation film treatment method is very hard, has high corrosion resistance, and can be dyed in various colors. Accordingly, the film is used in various industrial fields, and has been in the spotlight in product related industries such as mobile phone cases, which are recently in demand. It is a skill.
  • the machining method is applicable only to the simple form in consideration of the productivity, the complex form is difficult to apply by the economics according to the manufacturing price, and also a method that consumes a lot of effort and cost in the subsequent assembly process. Accordingly, a method of vacuum depositing aluminum and anodizing the deposited aluminum on aluminum die-casting products, which are easy to mass-produce complex shapes, has been recently developed, but there are problems such as thin film adhesion of vacuum deposition.
  • Korean Patent Laid-Open Publication No. 10-2012-0116558 high speed film forming apparatus and film forming method using the same, published on October 23, 2012
  • the method of solving the adhesion problem of the vacuum deposition method by combining the vacuum deposition method and the arc method has been proposed, the oxide below the stoichiometry in the Republic of Korea Patent Publication No. 10-2012-0116557 (Method of surface treatment of die-cast alloy and die-casting alloy material having a surface structure produced, published on October 23, 2012), Methods using nitrides or oxynitrides have also been suggested.
  • the surface of the metal interior and exterior materials other than the aluminum material can be stably anodized, and accordingly, there is a need for a technology for implementing various exterior colors on the surfaces of the metal interior and exterior materials.
  • the present invention was devised to solve the above problems, and an object of the present invention is to form a barrier layer made of a valve metal and a surface layer made of an aluminum-based metal on the surface of various metal interior and exterior materials, followed by anodizing. It is to provide a surface treatment technology of the metal interior and exterior materials that apply the technology to realize a beautiful and uniform surface color.
  • a valve metal Valve Metal
  • the valve metal is titanium (Ta), niobium (Nb), tantalum (Ta), zirconium (Zr), vanadium (V), tungsten (W), hafnium (Hf), aluminum (Al) and yttrium (Y). It may be one single metal or two or more alloys selected from the group consisting of, preferably the valve metal is an alloy of titanium (Ta), aluminum (Al) and vanadium (V) or titanium (Ta), aluminum (Al) And an alloy of niobium (Nb), more preferably the valve metal may be Ti6Al4V or Ti6Al7Nb.
  • the surface layer 20 is preferably a single layer formed of one selected from the group consisting of aluminum, an aluminum alloy, and an aluminum oxide, nitride, and oxynitride of less than the stoichiometric composition ratio, or a composite layer in which two or more are laminated.
  • step b) and step c) further comprising the step of sanding (sanding) the surface of the product, or at least one selected from the group consisting of chemical polishing, electropolishing and mechanical polishing It may further comprise a polishing step for performing the above.
  • the barrier layer 10 may have a thickness of 0.03 to 5 ⁇ m
  • the surface layer 20 may have a thickness of 5 to 100 ⁇ m
  • the barrier layer 10 and the surface layer 20 may have PVD (Physical Vapor Deposition). More preferably, at least one selected from the group consisting of evaporation, sputtering, and cathodic vacuum arc.
  • the method may further include a step of pretreating the surface of the metal interior and exterior materials (1) through ultrasonic cleaning or ion bombardment, and in the step d), the group consisting of organic material coloring, inorganic coloring and electrolytic coloring. It is preferable to color the dye to the anodized surface in at least one manner selected from among, and to seal the colored surface in at least one manner selected from the group consisting of hydration, metallic, organic and low temperature. .
  • a barrier layer 10 made of a valve metal is formed on the surface of the metal interior and exterior material 1, and made of aluminum (Al) -based metal.
  • a surface anodized surface layer 20 provides a surface treated metal interior and exterior material formed on the barrier layer 10.
  • the surface of the anodized surface layer 20 is preferably sealed after the dye is colored.
  • valve metal is titanium (Ta), niobium (Nb), tantalum (Ta), zirconium (Zr), vanadium (V), tungsten (W), hafnium (Hf), aluminum (Al) and yttrium (Y) It may be one single metal or two or more alloys selected from the group consisting of: Preferably the valve metal is an alloy of titanium (Ta), aluminum (Al) and vanadium (V) or titanium (Ta), aluminum (Al) ) And an alloy of niobium (Nb), and more preferably the valve metal may be Ti6Al4V or Ti6Al7Nb.
  • the surface layer 20 is preferably a single layer formed of one selected from the group consisting of aluminum, aluminum alloys, aluminum oxides, nitrides, and oxynitrides having a lower than stoichiometric composition ratio, or two or more laminated layers.
  • the barrier layer 10 may have a thickness of 0.03 to 5 ⁇ m
  • the surface layer 20 may have a thickness of 5 to 100 ⁇ m
  • the barrier layer 10 and the surface layer 20 may have PVD (Physical Vapor Deposition). It is formed in a) method, more preferably at least one selected from the group consisting of evaporation, sputtering and cathodic vacuum arc (Cathodic Vacuum Arc).
  • the surface treatment method of the metal interior and exterior materials and the surface-treated metal interior and exterior materials of the present invention apply anodic oxidation, coloring, and sealing treatment technology to the surfaces of various metal interior and exterior materials commonly used, such as zinc, stainless steel, and magnesium. There is an effect that can realize a variety of beautiful and uniform surface color of the metal interior and exterior materials.
  • FIG. 1 is a flowchart illustrating a method for treating a surface of a metal interior and exterior material according to an embodiment of the present invention.
  • Figure 2 is a schematic diagram showing a laminated structure of the surface-treated metal interior and exterior material according to another embodiment of the present invention.
  • the present invention provides a method for surface treatment of metal interior and exterior materials including a barrier layer forming step, a surface layer forming step, an anodizing step, and a dye coloring / sealing step according to a preferred embodiment.
  • a flow chart for this is shown in FIG. 1. Each time series step will be described in detail below.
  • Metal interior and exterior materials 1 to be processed are prepared.
  • Metal interior and exterior materials (1) means a metal that can be used as interior and exterior materials of the product, zinc, stainless steel, magnesium, aluminum alloy, die-casting alloy (silicon (Sa), iron (Fe), copper (Cu), manganese (Mn depending on the type) ), Metal (zn), nickel (Na), titanium (Ta), lead (Pb), tin (Sn), or chromium (Cr) components can be added).
  • the invention can be applied.
  • the metal interior and exterior materials 1 in the present invention may be a metal that does not contain an aluminum component, and it is possible to stably perform the anodizing process by the process according to the present invention without including aluminum.
  • the barrier layer 10 is formed of a valve metal on the surface of the metal interior and exterior material 1 described above.
  • the valve metal refers to a metal that exhibits a valve effect.
  • the valve effect refers to a phenomenon in which a current flows in a solution-to-metal direction but almost does not flow in a metal-to-solution direction. .
  • valve metals titanium and niobium are used to produce various colors through the anodizing process in the decorative industry dealing with jewelry. More specifically, when anodizing these valve metals, interference colors such as blue, yellow, pink, or green appear depending on the applied voltage, and the anodizing depth is adjusted according to the magnitude of the applied voltage so that at most 1 ⁇ m or less. You will see various colors.
  • the barrier layer 10 may be formed of a single metal such as titanium, niobium, tantalum, vanadium, zirconium, tungsten, hafnium, yttrium, or an alloy of two or more of these metals.
  • it may be formed of an alloy in which aluminum is added to the single metal or the mutual alloy, and it is more preferable to form the barrier layer 10 from Ti 6 Al 4 V or Ti 6 Al 7 Nb, which is a titanium aluminum alloy currently supplied in various compositions.
  • Ti6Al4V refers to a titanium-aluminum-vanadium alloy containing 6 wt% of aluminum (Al) and 4 wt% of vanadium (V) based on the total weight, and in the case of "Ti6Al7Nb".
  • Ti6Al4V refers to a titanium-aluminum-vanadium alloy containing 6 wt% of aluminum (Al) and 4 wt% of vanadium (V) based on the total weight, and in the case of "Ti6Al7Nb”.
  • a titanium-aluminum-niobium alloy containing 6 wt% of aluminum (Al) and 7 wt% of niobium (Nb) by weight.
  • the barrier layer 10 When the barrier layer 10 is first formed on the surface of the metal interior and exterior material 1 using the valve metal, the surface rupture phenomenon is prevented as described above when the anodic oxidation process and the coloring / sealing process are performed on the metal interior and exterior material 1. can do.
  • the thick portion remains unoxidized while the thin portion is all anodized so that the barrier layer 10 is anodized.
  • the barrier layer 10 is composed of valve metals, such an effect can be obtained because the barrier layer 10 is oxidized only at a maximum of 1 ⁇ m or less. If the barrier layer 10 is not present, excessive current flows in the portion, causing the surface to burst.
  • the method of forming the barrier layer 10 is not appropriate because the process temperature is typically higher than 500 ° C. in the case of CVD (chemical vapor deposition) method, which may cause problems such as deformation of a material, and thus is not appropriate. It is preferable to adopt the Deposition method. More specifically, the barrier layer 10 may be formed on the surface by adopting at least one method selected from the group consisting of evaporation, sputtering, and cathodic vacuum arc. It is most preferable to use the sputtering or the cathode vacuum arc method in view of the adhesion of the formation and the like.
  • an ultrasonic cleaning process for removing oil components or foreign substances remaining on the surface of the metal interior and exterior materials 1 to be processed is performed, or argon gas ion collision or metal ions in a vacuum chamber. It is preferable to perform a process of removing surface impurities or oxides by the collision method.
  • the thickness of the barrier layer 10 may vary depending on the process conditions at the time of anodization and the thickness of the surface layer 20 to be described later, if the thickness of the surface layer 20 is sufficiently thick may be 0.03 ⁇ m or more.
  • forming all parts of the metal interior and exterior materials 1 with PVD coating uniformly and thickly takes a lot of time and cost and is not easy to process. Therefore, a problem may occur such that a certain portion is formed thinner than other portions, or is formed thinly in contact with a jig or the like, a rear portion, a hidden portion, or the like.
  • the portion is anodized not only to the outermost surface layer 20 but also to the barrier layer 10 in the anodic oxidation step. If there is no barrier layer 10 made of a valve metal under the surface layer 20 made of an aluminum-based metal, a problem occurs because the metal interior and exterior materials 1 directly react with the anodizing solution, but the barrier layer 10 ),
  • the barrier layer 10 is anodized to act as a barrier having a predetermined thickness. That is, when a known color of titanium or niobium is developed, a phenomenon occurs that the surface is colored according to an applied voltage. On the other hand, the lack of oxidative pore depth in this part does not show a uniform coloring effect, but this part does not detract from the value of the product because it is a problem-free part.
  • the anodization depth is about 30 to 300 nm and similar in the case of other metal layers. Therefore, the thickness of the barrier layer 10 may be 0.03 ⁇ m or more, preferably 0.1 ⁇ m or more, and more preferably 0.3 ⁇ m. If it is above, the surface of the metal interior / exterior material 1 can be fully protected.
  • tantalum is about 1.6 nm per 1V, and 100V anodization oxidizes about 160 nm, and niobium is anodic oxidation up to 300-400 nm, so that the barrier layer 10 may be subjected to anodization depending on the conditions of anodizing the surface layer 20.
  • the minimum thickness should be changed accordingly.
  • the upper limit of the thickness of the barrier layer 10 is not particularly limited, but 5 ⁇ m or less is preferable in consideration of the speed of formation of the barrier layer 10 and economical efficiency depending on the price.
  • the surface layer 20 forming step (b) is a step of forming the surface layer 20 of aluminum-based metal on the barrier layer 10 formed on the surface of the metal interior and exterior material 1 as described above.
  • the formation method it is most preferable to use the sputtering method or the cathode vacuum arc method similarly to the barrier layer 10 described above. Not appropriate
  • the surface layer 20 may be formed of various materials including aluminum components such as pure aluminum, aluminum alloy, and the like.
  • the surface layer 20 may be formed of an aluminum oxide, nitride, or oxynitride layer having a stoichiometric composition ratio.
  • the aluminum compound layer having less than the stoichiometric composition ratio is excellent in hardness and excellent adhesion and strong bonding strength compared to materials such as pure aluminum or aluminum alloy, so that the barrier layer (10) on the metal interior and exterior materials (1) and later It is because strong adhesive force and adhesive force can be provided between the anodic oxide film layers formed.
  • the anodic oxidation step of step c) is a process of oxidizing a part of the above-described surface layer 20 to an anodized film layer by anodizing treatment, in a range of 5 to 100 ⁇ m depending on the required thickness of the anodized film layer.
  • the surface layer 20 must be formed.
  • the thickness range is limited when the surface layer 20 is formed to be less than 5 ⁇ m. Since the depth of aging is too thin, there is a problem in that it is not possible to make a variety of colors in the subsequent coloration process, and if the surface layer 20 is formed in excess of 100 ⁇ m, the process time is excessively long, productivity not only decreases but also high process temperature This is because the workpiece is deformed or thickened, causing problems with assembly with other assemblies.
  • Anodizing treatment that is, anodizing treatment, is a process of forming a film such as aluminum oxide (Al 2 O 3 ) by polarizing a metal product such as aluminum as an anode in a predetermined electrolyte solution under appropriate conditions. Since this film is very hard and has a high corrosion resistance and a porous layer can be formed and dyed in various colors, it is a process that can enhance the commercial value by giving the surface a beautiful and profound color along with practicality such as corrosion resistance and abrasion resistance. to be.
  • the anodic oxidation may be any of sulfuric acid, hydroxyl, chromic acid, and the like, or a mixed acid thereof. Since the thickness of the film is adjusted according to the required color, the surface layer 20 is preferably prepared in advance as described above. It can be formed to ⁇ 100 ⁇ m.
  • the method may further include sanding the surface of the surface or performing a hair line treatment before c) anodizing the surface in order to improve the properties or the hall of the required product.
  • Sanding is an operation for polishing the surface of the undercoat with a prescribed sand paper in order to achieve the desired surface treatment purpose, and is for removing surface defects and improving smoothness and adhesion.
  • Hairline is a work used for the purpose of improving product quality by giving hair-like lines to the surface.
  • the final product is matte, it may be anodized as it is, but in the case of manufacturing a glossy product, as the thickness of the thin film increases, the glossiness of the thin film decreases, so that the surface of the product is not immediately anodized c).
  • a polishing step more specifically, chemical polishing, electropolishing or mechanical polishing, before the step.
  • Chemical polishing refers to a process of chemically smoothing the surface of a metal by a polishing process without using an external current.
  • the main raw material of chemical polishing is phosphoric acid, which performs a process of forming a phosphate film.
  • Electropolishing refers to a polishing method that overcomes the limitations of the surface gloss formation generated by chemical polishing and requires more high gloss, to produce a smooth surface by electrolysis under predetermined conditions.
  • the dye coloring and sealing treatment step (d) when the porous coating layer is formed through anodization, the dye is colored on the anodized surface by dye coloring such as organic coloring, inorganic coloring or electrolytic coloring. And finally, performing a sealing process for blocking the pores of the anodized film by a method such as hydration sealing, metallic sealing, organic sealing, and low temperature sealing.
  • the dye coloring process can enhance the product value by adding aesthetics to the surface of the product, and can improve the weatherability and durability of the coloring and the corrosion resistance of the coating through the sealing process.
  • the surface of the material is washed through an organic solvent and an ultrasonic cleaning device. After the material is mounted in a vacuum furnace, argon gas ion collision or metal ion collision is performed.
  • the barrier layer 10 is formed using a Ti 6 Al 4 V alloy so as to have a minimum thin film thickness of 1 ⁇ m by sputtering. After that, the surface layer 20 was formed in the form of an aluminum thin film of 30 ⁇ m. After that, anodization was carried out by sulfuric acid method, and after sealing, sealing was performed.
  • the metal interior and exterior materials (1) to be treated by the above-described method were in good condition in the top, bottom, left and right front surface anodization.
  • the stepped portion of the rear part was somewhat dark in color due to the thickness variation of the aluminum film, but there was no problem in use because it was not visible after assembly.
  • Various colors such as black, red, gold, green, blue and pink are beautifully implemented.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

La présente invention concerne un procédé de traitement de surface de matériau métallique intérieur/extérieur et un matériau métallique intérieur/extérieur à traitement de surface. Plus spécifiquement, l'invention concerne un procédé de traitement de surface d'un matériau métallique intérieur/extérieur, comprenant les étapes consistant à : former, à partir d'un métal pour vannes, une couche barrière sur une surface du matériau métallique intérieur/extérieur ; former, à partir d'un métal à base d'aluminium, une couche de surface sur ladite couche barrière ; et anodiser ladite surface puis colorer par colorant et sceller la surface anodisée. Les techniques d'anodisation, de coloration par colorant et de scellement selon l'invention sont appliquées à des surfaces de divers matériaux métalliques intérieurs/extérieurs tels que le zinc, l'acier inoxydable, le magnésium et similaires, ce qui permet de conférer à la couleur de surface des matériaux métalliques intérieurs/extérieurs une diversité, une homogénéité et un aspect attrayant.
PCT/KR2014/000297 2014-01-03 2014-01-10 Procédé de traitement de surface de matériau métallique intérieur/extérieur et matériau métallique intérieur/extérieur à traitement de surface Ceased WO2015102142A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2014-0000554 2014-01-03
KR1020140000554A KR101545127B1 (ko) 2014-01-03 2014-01-03 금속 내외장재의 표면처리 방법 및 표면 처리된 금속 내외장재

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KR102382082B1 (ko) 2021-11-12 2022-04-04 (주)코미코 알루미늄이 포함된 부재의 산화피막 형성방법 및 이에 의해 형성된 반도체 제조 장치의 알루미늄이 포함된 부재

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