WO2016010295A1 - Dispositif de compensation d'erreur pour réseau de lentilles - Google Patents

Dispositif de compensation d'erreur pour réseau de lentilles Download PDF

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Publication number
WO2016010295A1
WO2016010295A1 PCT/KR2015/007066 KR2015007066W WO2016010295A1 WO 2016010295 A1 WO2016010295 A1 WO 2016010295A1 KR 2015007066 W KR2015007066 W KR 2015007066W WO 2016010295 A1 WO2016010295 A1 WO 2016010295A1
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WO
WIPO (PCT)
Prior art keywords
lens array
laser beam
lens
cylindrical
cylindrical lenses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2015/007066
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English (en)
Korean (ko)
Inventor
박홍진
최이호
송현준
이충헌
김향태
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LIS Co Ltd
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LIS Co Ltd
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Filing date
Publication date
Application filed by LIS Co Ltd filed Critical LIS Co Ltd
Publication of WO2016010295A1 publication Critical patent/WO2016010295A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms

Definitions

  • the present invention relates to a lens array error compensator, and more particularly, to a lens array error compensator for compensating for processing or assembly errors of a lens array composed of a plurality of cylindrical lenses.
  • the laser annealing process refers to a process of forming a polycrystalline silicon film by irradiating an amorphous silicon film on a substrate with a laser beam molded in a line shape to crystallize the amorphous silicon film.
  • the energy intensity distribution of the line-shaped laser beam must be uniform and there is no distortion in the shape.
  • the excimer laser beam which is a laser beam in the ultraviolet region.
  • the excimer laser beam is homogenized using a homogenizer, the cross-sectional shape of the beam is made into a line shape, and then irradiated onto a thin amorphous silicon film.
  • the laser beam may not be properly focused or synthesized due to the processing error or assembly error of the lens, resulting in uneven energy intensity distribution of the laser beam.
  • the conventional lens system includes a plurality of cylindrical lenses 11 having convex exit surfaces, a lens array 10 for dividing an incident laser beam L, and a lens array 10. It consists of a condensing lens 20 for combining a plurality of divided laser beams (L) into one.
  • the laser beam L Before entering the lens system, the laser beam L has a uniform energy intensity distribution in the direction A3 that intersects the direction A1 of the laser beam by the homogenizer, and has a relatively wide width w. The energy intensity is kept low.
  • the direction A3 where the divided laser beams L1, L2, L3 intersect. Are condensed and synthesized at the same time, and have a relatively narrow width w1 (see FIG. 1A).
  • the laser beam L has a narrow width w1 with respect to the crossing direction A3 and is formed long with respect to the paper direction A2 to have a line shape suitable for the laser annealing process.
  • the problem to be solved by the present invention is to solve such a conventional problem, it is possible to select a cylindrical lens having an error among a plurality of cylindrical lenses constituting the lens array, and another lens for error compensation
  • a lens array error compensation device capable of compensating for processing errors or assembly errors of the cylindrical lenses constituting the lens array, and forming a line-shaped laser beam having a uniform energy intensity distribution.
  • the lens array error compensating apparatus of the present invention comprises: a first lens array made up of a plurality of first cylindrical lenses having a convex exit surface and dividing an incident laser beam; A condenser lens for synthesizing the plurality of laser beams divided by the first lens array into one at a measurement surface; A sensor installed on the measurement surface and detecting whether the laser beam synthesized as one is synthesized at a preset reference position and at a preset reference size; The laser beam emitted from the first lens array includes a plurality of second cylindrical lenses disposed between the first lens array and the condenser lens based on a traveling direction of the laser beam, and having a convex exit surface.
  • a second lens array that corrects the path of the laser beam exiting the first lens array to be synthesized at a location and to the reference size; And an incident surface of the second cylindrical lens of the plurality of second cylindrical lenses of the second lens array disposed between the first lens array and the second lens array with respect to the traveling direction of the laser beam. It characterized in that it comprises a; mask having a through portion to make.
  • a mask transfer unit for linearly transferring the mask along the; may further include.
  • each of the plurality of first cylindrical lenses of the first lens array has the same radius of curvature, and the plurality of second cylindrical lenses of the second lens array are respectively The radius of curvature is made the same, and the radius of curvature of the first cylindrical lens and the second cylindrical lens may be different from each other.
  • the lens array error compensating apparatus of the present invention it is possible to compensate for processing or assembly errors of the cylindrical lens constituting the lens array, and to form a line-shaped laser beam having a uniform energy intensity distribution.
  • the lens array error compensation device of the present invention it is possible to significantly reduce the time required for error compensation of the cylindrical lens.
  • 1 is a view schematically showing a conventional lens system for synthesizing a split laser beam
  • FIG. 2 is a view schematically showing a lens array error compensator according to an embodiment of the present invention
  • FIG. 3 is a view showing a state in which a laser beam deviates from a reference position or a reference size due to a machining error or an assembly error of a cylindrical lens
  • FIG. 4 is a view illustrating a state in which a mask of the lens array error compensator of FIG. 2 is transferred.
  • FIG. 5 is a view illustrating a state in which a laser beam split by the lens array error compensator of FIG. 2 is synthesized with a reference position or a reference size.
  • FIG. 2 is a view schematically showing a lens array error compensator according to an embodiment of the present invention
  • Figure 3 shows a state in which the laser beam is out of the reference position or the reference size due to machining or assembly error of the cylindrical lens
  • 4 is a view illustrating a state in which a mask of the lens array error compensator of FIG. 2 is transferred
  • FIG. 5 is a reference position or a reference size of a laser beam divided by the lens array error compensator of FIG. Is a view showing a state synthesized by.
  • the lens array error compensator is to compensate for a processing error or assembly error of a lens array including a plurality of cylindrical lenses, and the first lens array 110. And a condenser lens 120, a sensor 130, a second lens array 140, a mask 150, and a mask transfer unit.
  • the first lens array 110 divides the incident laser beam L into a plurality of laser beams and includes a plurality of first cylindrical lenses 111.
  • the incident surface of the first cylindrical lens 111 is formed in a planar shape, and the exit surface is formed in a convex shape.
  • the first cylindrical lens 111 has a cross-sectional shape as shown in FIG. 2 with respect to a plane formed by the advancing direction A1 of the laser beam and the direction A3 intersecting with the advancing direction of the laser beam.
  • the cross section shown in FIG. 2 along the direction A2 is formed in the shape extended long.
  • the plurality of first cylindrical lenses 111 constituting the first lens array 110 may be kept in close contact with each other by receiving a compressive force parallel to the crossing direction A3.
  • each of the plurality of first cylindrical lenses 111 of the first lens array 110 have the same radius of curvature.
  • the condensing lens 120 combines the plurality of laser beams L split by the first lens array 110 into one in a measuring plane.
  • the laser beam L incident on the first lens array 110 exhibits a distribution of energy intensity having a relatively wide width w with respect to the crossing direction A3, which is divided and collected by the first lens array 110.
  • the laser beam synthesized by the lens 120 exhibits a distribution of energy intensity having a relatively narrow width w 'with respect to the crossing direction A3.
  • the sensor 130 detects whether the laser beam L synthesized as one is synthesized at a preset reference position and to a preset reference size, and is installed on the measurement surface.
  • the sensor 130 includes a reference detector 131 having a central portion intersecting the optical axis LA of the laser beam and having a predetermined width S1, and a deviation detector 132 disposed outside the reference detector 131.
  • the reference position and the reference size may be defined by the position and width of the reference sensing unit 131 of the sensor 130. That is, if the laser beam L via the condenser lens 120 is detected only in the reference detecting unit 131, the laser beam L may be defined as being irradiated at the reference position and at the reference size.
  • the laser beam passing through the condenser lens 120 is detected not only by the reference detecting unit 131 but also by the deviation detecting unit 132, the laser beam L is irradiated in a state out of a reference position or a reference size. Can be defined.
  • the laser beam L passing through the condenser lens 120 may not be properly focused and may have a width LW1 larger than the width S1 of the reference detection unit 131.
  • both the reference detector 131 and the departure detector 132 may be detected.
  • the laser beam L is focused as described above, the laser beam L is irradiated in a state out of a reference position or a reference size, and a machining error or an assembly error is applied to the first cylindrical lens 111 corresponding to the laser beam. It can be seen that there is.
  • the width LW2 of the laser beam passing through the condensing lens 120 is smaller than the width S1 of the reference detecting unit 131, but a part of the light condensing position is wrong.
  • the rest of the reference detector 131 may be detected by the deviation detector 132.
  • the second lens array 140 includes the laser beam L emitted from the first lens array 110 such that the laser beam L emitted from the first lens array 110 is synthesized at a reference position and to a reference size. Correct the path.
  • the second lens array 140 is disposed between the first lens array 110 and the condenser lens 120 based on the advancing direction A1 of the laser beam and includes a plurality of second cylindrical lenses 141.
  • the incident surface of the second cylindrical lens 141 is formed in a planar shape, and the exit surface is formed in a convex shape.
  • the second cylindrical lens 141 has a cross-sectional shape as shown in FIG. 2 with respect to a plane formed by the advancing direction A1 of the laser beam and the direction A3 intersecting with the advancing direction of the laser beam.
  • the cross section shown in FIG. 2 along the direction A2 is formed in the shape extended long.
  • the plurality of second cylindrical lenses 141 constituting the second lens array 140 may be kept in close contact with each other by receiving a compressive force parallel to the crossing direction A3.
  • each of the plurality of second cylindrical lenses 141 of the second lens array 140 has the same radius of curvature.
  • the first cylindrical lens 111 and the second cylindrical lens 141 is preferably made of a different radius of curvature.
  • the mask 150 includes a through part 151 for opening an incident surface of one second cylindrical lens 141 of the plurality of second cylindrical lenses 141 of the second lens array 140, and a laser beam.
  • the first lens array 110 is disposed between the second lens array 140 and the second lens array 140 based on the advancing direction A1.
  • the laser beam L is divided into a plurality of laser beams L by the plurality of first cylindrical lenses 111 of the first lens array 110, all the divided laser beams L may be synthesized in the measurement surface. At this time, it is difficult to determine which of the plurality of first cylindrical lenses 111 has a problem of processing error or assembly error. Therefore, when only one laser beam L of the plurality of laser beams L divided by the mask 150 is passed through, it is possible to specify a cylindrical lens in which a problem occurs.
  • One second cylindrical lens L may be incident and the other laser beam L may be blocked by the mask 150.
  • the mask transfer unit (not shown) is a direction in which the laser beam travels such that an incident surface of one second cylindrical lens 141 of the plurality of second cylindrical lenses 141 of the second lens array 140 is selectively opened.
  • the mask 150 is linearly moved along the direction A3 that intersects with.
  • one first cylindrical lens 111 and one second cylindrical lens 141 may be moved while moving along a direction A3 that intersects the mask 150 using the mask transfer unit. In the combined state, it is possible to check whether the laser beam L is focused and synthesized on the measurement surface.
  • the mask transfer unit may be implemented by a linear drive unit, such as a linear motor configuration, a combination of a rotary motor and a ball screw, such a configuration will be apparent to those skilled in the art, detailed description thereof will be omitted.
  • a linear drive unit such as a linear motor configuration, a combination of a rotary motor and a ball screw, such a configuration will be apparent to those skilled in the art, detailed description thereof will be omitted.
  • the first lens array ( The second lens array 140 is disposed between the 110 and the condenser lens 120.
  • the processing error or assembly error of the first lens array 110 is a minute error that is inevitably generated that cannot be controlled by a user substantially in an actual processing and assembly environment, the new first lens array 110 may be used. Even if it is replaced by, there will be machining error or assembly error again. Therefore, by arranging the second lens array 140 processed in a direction to attenuate or compensate the error of the first lens array 110, the processing error or the assembly error of the first lens array 110 may be compensated for.
  • the first cylindrical lens 111 is disposed in parallel in the direction of the optical axis LA of the laser beam.
  • the condensing state of the laser beam L passing through the second cylindrical lens 141 may be confirmed. In this state, if the laser beam L detected by the sensor 130 is not detected at the reference position or the reference size, the light condensing state of the laser beam L is replaced after the replacement with the new second cylindrical lens 141. You can check. The replacement of the second cylindrical lens 141 may be repeated until the laser beam L detected by the sensor 130 is detected at the reference position or the reference size.
  • the mask 150 is transferred to the next cylindrical lens using the mask transfer unit to the optical axis LA of the laser beam.
  • the condensing state of the laser beam L passing through the other first cylindrical lens 111 and the second cylindrical lens 141 arranged in parallel can be confirmed.
  • the laser beams L1, L2, and L3 detected by the sensor 130 are detected at the reference position and the reference size. Can be. Substantially all of the laser beams L1, L2, L3 may be arranged to overlap, but are shown apart from each other in the drawings for the sake of distinction.
  • the laser beam PL which is narrowly formed in the crossing direction A3 and long in the ground direction A2, and is formed in a line shape as a whole, has a uniform energy intensity distribution in the cross section, which is an amorphous silicon film on the substrate 1. Irradiation to (2) can be carried out a laser annealing process.
  • the lens array error compensating apparatus of the present invention configured as described above, by using a mask to select the error of the cylindrical lens of the plurality of cylindrical lenses constituting the lens array, processing error or assembly of the cylindrical lens constituting the lens array The effect of compensating for the error and forming a line-shaped laser beam with a uniform energy intensity distribution can be obtained.
  • the lens array error compensator of the present invention configured as described above, by separately detecting the laser beam divided using a mask, it is possible to obtain an effect that can significantly reduce the time required for error compensation of the cylindrical lens. have.
  • the present invention can be used in a lens array error compensator for compensating for processing or assembly errors of a lens array composed of a plurality of cylindrical lenses.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)

Abstract

La présente invention concerne un dispositif de compensation d'erreur, pour un réseau de lentilles, qui comporte un premier réseau de lentilles, une lentille de condenseur, un capteur, un second réseau de lentilles et un masque. Le premier réseau de lentilles comporte une pluralité de premières lentilles cylindrique, ayant une surface d'émission convexe, et divise un faisceau laser qui est incident. La lentille de condenseur combine, sur une surface de mesure, une pluralité de faisceaux laser, qui ont été séparés sur le premier réseau de lentilles, en un seul. Le capteur est disposé sur la surface de mesure et détecte si le faisceau laser, qui a été combiné en un seul, est combiné ou non à un emplacement de référence prédéterminé et dans une dimension de référence prédéterminée. Le second réseau de lentilles est placé entre le premier réseau de lentilles et la lentille de condenseur par rapport à la direction de déplacement du faisceau laser, comporte une pluralité de secondes lentilles cylindriques ayant une surface d'émission convexe, et corrige le trajet d'un faisceau laser, qui est émis par le premier réseau de lentilles, de telle sorte que le faisceau laser émis par le premier réseau de lentilles est combiné à l'emplacement de référence et dans la dimension de référence. Le masque est placé entre le premier réseau de lentilles et le second réseau de lentilles, par rapport à la direction de déplacement du faisceau laser, et comprend une partie de pénétration pour ouvrir une surface incidente de l'une de la pluralité de secondes lentilles cylindriques du second réseau de lentilles.
PCT/KR2015/007066 2014-07-17 2015-07-08 Dispositif de compensation d'erreur pour réseau de lentilles Ceased WO2016010295A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140090251A KR101531817B1 (ko) 2014-07-17 2014-07-17 렌즈 어레이 오차 보상장치
KR10-2014-0090251 2014-07-17

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WO2016010295A1 true WO2016010295A1 (fr) 2016-01-21

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0866781A (ja) * 1994-08-30 1996-03-12 Mitsubishi Electric Corp エキシマレーザビーム照射装置
KR20050014766A (ko) * 2003-07-31 2005-02-07 후지 샤신 필름 가부시기가이샤 노광헤드
KR20120135511A (ko) * 2010-02-26 2012-12-14 엑시코 프랑스 레이저 에너지를 반도체 재료 표면에 조사하는 방법 및 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0866781A (ja) * 1994-08-30 1996-03-12 Mitsubishi Electric Corp エキシマレーザビーム照射装置
KR20050014766A (ko) * 2003-07-31 2005-02-07 후지 샤신 필름 가부시기가이샤 노광헤드
KR20120135511A (ko) * 2010-02-26 2012-12-14 엑시코 프랑스 레이저 에너지를 반도체 재료 표면에 조사하는 방법 및 장치

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