WO2016150612A3 - Dilatateur de faisceau de rayonnement - Google Patents

Dilatateur de faisceau de rayonnement Download PDF

Info

Publication number
WO2016150612A3
WO2016150612A3 PCT/EP2016/052818 EP2016052818W WO2016150612A3 WO 2016150612 A3 WO2016150612 A3 WO 2016150612A3 EP 2016052818 W EP2016052818 W EP 2016052818W WO 2016150612 A3 WO2016150612 A3 WO 2016150612A3
Authority
WO
WIPO (PCT)
Prior art keywords
radiation beam
optic
diverging
converging
mirrors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2016/052818
Other languages
English (en)
Other versions
WO2016150612A2 (fr
Inventor
Han-Kwang Nienhuys
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of WO2016150612A2 publication Critical patent/WO2016150612A2/fr
Publication of WO2016150612A3 publication Critical patent/WO2016150612A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Radiation-Therapy Devices (AREA)

Abstract

L'invention concerne un dilatateur de faisceau de rayonnement qui comprend une optique divergente et une optique convergente. L'optique divergente comprend un ou plusieurs miroirs pour recevoir un faisceau de rayonnement et augmenter une divergence du faisceau de rayonnement. L'optique convergente comprend un ou plusieurs miroirs disposés de manière à recevoir le faisceau de rayonnement et à réduire la divergence du faisceau de rayonnement. Au moins l'un des un ou plusieurs miroirs de l'optique divergente et/ou l'optique convergente est pourvu d'un actionneur agencé pour commander une courbure du miroir. Cela permet à la puissance optique de l'optique divergente et/ou l'optique convergente d'être commandée indépendamment de l'angle auquel un faisceau de rayonnement est incident sur les miroirs de ladite optique divergente ou optique convergente. Cela permet au dilatateur de faisceau de rayonnement de commander la divergence du faisceau de rayonnement après l'optique convergente et l'optique divergente indépendamment des orientations et des positions relatives des miroirs de l'optique convergente et de l'optique divergente.
PCT/EP2016/052818 2015-03-23 2016-02-10 Dilatateur de faisceau de rayonnement Ceased WO2016150612A2 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP15160280 2015-03-23
EP15160280.2 2015-03-23
EP15168168.1 2015-05-19
EP15168168 2015-05-19

Publications (2)

Publication Number Publication Date
WO2016150612A2 WO2016150612A2 (fr) 2016-09-29
WO2016150612A3 true WO2016150612A3 (fr) 2016-10-27

Family

ID=55345827

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2016/052818 Ceased WO2016150612A2 (fr) 2015-03-23 2016-02-10 Dilatateur de faisceau de rayonnement

Country Status (3)

Country Link
NL (1) NL2016248A (fr)
TW (1) TW201636684A (fr)
WO (1) WO2016150612A2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017205548A1 (de) * 2017-03-31 2018-10-04 Carl Zeiss Smt Gmbh Optische Baugruppe zum Führen eines Ausgabestrahls eines Freie-Elektronen-Lasers
JP7329422B2 (ja) * 2019-11-18 2023-08-18 ギガフォトン株式会社 ビームデリバリシステム、焦点距離選定方法及び電子デバイスの製造方法
JP7637879B2 (ja) * 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7637878B2 (ja) * 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JPWO2024252498A1 (fr) * 2023-06-05 2024-12-12
CN118068390B (zh) * 2023-06-15 2024-10-15 凯瑟斯技术(杭州)有限公司 探测原子束流的装置和方法
TWI905063B (zh) * 2025-06-04 2025-11-11 優立測科技股份有限公司 高速光學元件對位系統與方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
EP1170635A2 (fr) * 2000-07-05 2002-01-09 Asm Lithography B.V. Appareil lithographique, méthode de fabrication d'un dispositif et dispositif fabriqué par cette méthode
US20050128483A1 (en) * 2003-12-15 2005-06-16 Alois Herkommer Method and optical arrangement for beam guiding of a light beam with beam delay
US20060092393A1 (en) * 2004-10-28 2006-05-04 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
US20080170216A1 (en) * 2007-01-17 2008-07-17 Carl Zeiss Smt Ag Projection optics for microlithography
US20130037693A1 (en) * 2011-02-02 2013-02-14 Gigaphoton Inc. Optical system and extreme ultraviolet (euv) light generation system including the optical system
US20150022799A1 (en) * 2008-09-10 2015-01-22 Carl Zeiss Smt Gmbh Microlithographic imaging optical system including multiple mirrors

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10244303B4 (de) 2002-09-23 2004-12-30 Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Arbeit, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt Verfahren und Monitordetektor zur Bestimmung der Intensität von gepulster VUV- oder EUV-Strahlung sowie Verwendung eines derartigen Monitordetektors

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
EP1170635A2 (fr) * 2000-07-05 2002-01-09 Asm Lithography B.V. Appareil lithographique, méthode de fabrication d'un dispositif et dispositif fabriqué par cette méthode
US20050128483A1 (en) * 2003-12-15 2005-06-16 Alois Herkommer Method and optical arrangement for beam guiding of a light beam with beam delay
US20060092393A1 (en) * 2004-10-28 2006-05-04 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
US20080170216A1 (en) * 2007-01-17 2008-07-17 Carl Zeiss Smt Ag Projection optics for microlithography
US20150022799A1 (en) * 2008-09-10 2015-01-22 Carl Zeiss Smt Gmbh Microlithographic imaging optical system including multiple mirrors
US20130037693A1 (en) * 2011-02-02 2013-02-14 Gigaphoton Inc. Optical system and extreme ultraviolet (euv) light generation system including the optical system

Also Published As

Publication number Publication date
WO2016150612A2 (fr) 2016-09-29
NL2016248A (en) 2016-09-30
TW201636684A (zh) 2016-10-16

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