WO2016174707A1 - Dispositif à faisceau de particules chargées et procédé d'observation d'échantillons à l'aide dudit dispositif - Google Patents

Dispositif à faisceau de particules chargées et procédé d'observation d'échantillons à l'aide dudit dispositif Download PDF

Info

Publication number
WO2016174707A1
WO2016174707A1 PCT/JP2015/062672 JP2015062672W WO2016174707A1 WO 2016174707 A1 WO2016174707 A1 WO 2016174707A1 JP 2015062672 W JP2015062672 W JP 2015062672W WO 2016174707 A1 WO2016174707 A1 WO 2016174707A1
Authority
WO
WIPO (PCT)
Prior art keywords
image
electron beam
charged particle
particle beam
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2015/062672
Other languages
English (en)
Japanese (ja)
Inventor
諒 小松崎
大海 三瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to PCT/JP2015/062672 priority Critical patent/WO2016174707A1/fr
Priority to JP2017515299A priority patent/JP6454414B2/ja
Publication of WO2016174707A1 publication Critical patent/WO2016174707A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295Electron or ion diffraction tubes

Definitions

  • the present invention relates to a charged particle beam apparatus, and more particularly to a technique that enables observation of a sample with a high dynamic range.
  • An electron microscope or an ion microscope is used to observe the microstructure of the sample.
  • a transmission electron microscope is used for the purpose of examining the internal form, crystal structure, composition, electronic state, etc. of the sample.
  • a transmission electron microscope acquires and displays an observation image by irradiating an electron beam to a thinned sample and selectively imaging the transmitted electrons and scattered electrons.
  • FIG. 1 shows a schematic diagram of an electron beam diffraction image (diffraction pattern) taken with a conventional apparatus.
  • FIG. 1 shows a state before adjusting the observation conditions of the electron diffraction image.
  • the electron diffraction image (upper diagram) has a one-dimensional distribution of electron beam intensity (lower diagram).
  • the distribution of the electron beam intensity on the fluorescent screen is a one-dimensional distribution 000.
  • the vertical axis in the lower diagram is the electron beam intensity, and the horizontal axis corresponds to the spot position in the upper diagram.
  • the electron beam intensity that can be acquired by the image detection device is determined by the dynamic range 107 of the image detection device.
  • the first diffracted wave spot 101, the second diffracted wave spot 102, and the transmitted wave spot 103 are photographed by the image detection apparatus.
  • the electron beam intensity near the peak of the transmitted wave spot 103 exceeds the dynamic range 107 of the image detection apparatus. Therefore, the electron beam intensity near the peak of the transmitted wave spot 103 is detected as the upper limit value of the dynamic range 107.
  • the center of gravity of the first diffracted wave spot 101 is obtained by a known method, and the first center of gravity line 104 passing through the center of gravity is drawn. Similarly, a second barycentric line 105 passing through the barycentric point of the second diffracted wave spot 102 is drawn. A third barycentric line 106 passing through the barycentric point of the transmitted wave spot 103 is drawn.
  • the peak position of the electron beam intensity of the first diffracted wave spot 101 may not match the first barycentric line 104. This is because the peak position of the first diffracted wave spot 101 cannot be correctly determined due to distortion of the electron beam intensity distribution or the like. Therefore, the distance 108 between the first diffracted wave spot 101 and the second diffracted wave spot 102 cannot be accurately measured in the electron beam diffraction image of FIG.
  • FIG. 2 shows a schematic diagram of an electron beam diffraction image taken after adjusting the observation conditions (with the exposure time shorter than that in FIG. 1). Also in the case of FIG. 2, the electron beam intensity distribution on the fluorescent screen is represented by a one-dimensional distribution 000. In FIG. 2, since the exposure time is relatively short, only a signal having a high electron beam intensity is captured. The dynamic range 115 in FIG. 2 is shifted to a signal portion having a higher electron beam intensity than the dynamic range 107 in FIG.
  • the first diffracted wave spot 109, the second diffracted wave spot 110, and the transmitted wave spot 111 are photographed by the image detection apparatus. Since the exposure time is short, the diameter of each spot is smaller than the diameter before adjustment. As a result, the distortion of the electron beam intensity distribution in the spot is smaller than in the case of FIG. However, there is little distribution information of the electron beam intensity corresponding to each peak, and it is easily affected by noise.
  • a first barycentric line 112 passing through the barycentric point of the first diffracted wave spot 109 is drawn
  • a second barycentric line 113 passing through the barycentric point of the second diffracted wave spot 110 is drawn
  • the transmitted wave spot 111 A third barycentric line 114 passing through the barycentric point is drawn.
  • the peak position of the electron beam intensity of the first diffracted wave spot 109 coincides with the first barycentric line 112. Therefore, in the case of FIG. 2, the distance 116 between the first diffracted wave spot 109 and the second diffracted wave spot 110 can be accurately measured from the electron beam diffraction image.
  • the present inventor provides a charged particle beam apparatus which does not require such adjustment work or has high workability associated with the adjustment work.
  • the present invention adopts the configuration described in the claims. That is, the present invention employs a technique that enables acquisition of an image having a wider dynamic range than individual electron diffraction images by acquiring and synthesizing a plurality of electron diffraction images having different exposure times. .
  • the charged particle beam apparatus of the present invention includes an irradiation unit that irradiates a sample with a charged particle beam, a detection unit that detects an electron from the sample and obtains an image, and a processing unit.
  • the detection unit obtains a first electron beam diffraction image by a first exposure time and a second electron beam diffraction image by a second exposure time different from the first exposure time, and the processing unit
  • the third electron beam diffraction image and the second electron beam diffraction image are combined, and a third dynamic range wider than the first electron beam diffraction image and the second electron beam diffraction image is obtained.
  • Adopt technology to obtain images.
  • FIG. 1 is a diagram illustrating a schematic configuration of a charged particle beam apparatus according to Embodiment 1.
  • FIG. 3 is a flowchart for explaining a processing procedure of the charged particle beam apparatus according to the first embodiment.
  • 10 is a flowchart for explaining a processing procedure of the charged particle beam apparatus according to the second embodiment. The figure explaining the method to produce
  • FIG. 10 is a diagram illustrating an example of a GUI used in the third embodiment. 10 is a flowchart for explaining a processing procedure of the charged particle beam apparatus according to the third embodiment. The figure explaining the method of calculating
  • Example 1 a method for solving the problems of the conventional method by applying an HDR imaging (HDR: High Dynamic Range imaging) technology to an apparatus (transmission electron microscope) that acquires an electron beam diffraction image will be described.
  • HDR imaging technique used in the first embodiment includes a synthesis process of two types of electron diffraction images having different exposure times and a non-linear tone mapping process.
  • Example 2 describes a method of observing gradation information of a high dynamic range image without being compressed.
  • the difference between the HDR imaging technique of the second embodiment and the HDR imaging technique of the first embodiment is that a color mapping process is used instead of the tone mapping process.
  • Example 3 describes an application example of the color mapping technology described in Example 2.
  • the center of gravity of each color image obtained by the color mapping process is displayed on the GUI, thereby making it possible to analyze the electron beam intensity distribution of a diffraction spot that has caused a positional shift (generated due to distortion). .
  • FIG. 3 shows the main configuration of the transmission electron microscope used in this embodiment.
  • the electron beam emitted from the electron gun 301 is accelerated by the acceleration tube 302.
  • the inside of the acceleration tube 302 is maintained in a vacuum state by the exhaust device 303.
  • the electron beam is focused by the focusing lens 304 and then irradiated to the sample 312.
  • the thickness of the sample 312 is thinly processed so that an electron beam can be transmitted.
  • the sample 312 is supported by the sample holder 305. Some of the electrons that have passed through the sample 312 are restricted from passing by a restriction hole 313 disposed below the sample 312.
  • the electron beam that has passed through the aperture 313 is imaged by the imaging lens 306 and collides with the fluorescent plate 307.
  • the fluorescent plate 307 emits light according to the intensity of the colliding electron beam.
  • An image detection device 308 is disposed below the fluorescent plate 307, and the light emission of the fluorescent plate 307 is photographed by the image detection device 308.
  • the captured image is processed by the computer 309 and displayed on the screen of the display device 310.
  • An input device 314 is connected to the computer 309 and is used to input instructions from the operator.
  • the processing procedure executed in this embodiment will be described with reference to FIG. Specifically, a processing procedure until an electron beam diffraction image having a wide dynamic range is taken and analyzed (for example, a distance between spots is measured) will be described. Each process is realized through a program executed by the computer 309. In addition to the image processing described above, the computer 309 executes control of each part constituting the transmission electron microscope.
  • Step 401 The computer 309 controls the focusing lens 304 and irradiates a range corresponding to the visual field region of the sample 312 with a uniform and parallel beam.
  • Step 402 The computer 309 adjusts the position of the aperture 313, restricts a part of the electron beam transmitted through the sample 312, and controls so that only the electron beam corresponding to the region designated by the operator reaches the fluorescent screen 307. .
  • Step 403 The electron beam that passes through the sample 312 is divided into a transmitted wave and a diffracted wave.
  • the imaging lens 306 focuses the transmitted wave and the diffracted wave so as to form a spot on the fluorescent plate 307. Thereby, an electron beam diffraction image (diffraction pattern) is formed on the fluorescent plate 307.
  • Step 404 From here, an automatically executed adjustment sequence is started.
  • the image detection device 308 takes a first electron diffraction image with a first exposure time.
  • the image detection device 308 captures the second electron beam diffraction image with the second exposure time.
  • the first exposure time is set longer than the second exposure time.
  • the first electron beam diffraction image acquired at the first exposure time includes a large amount of gradation information in a portion where the electron beam intensity is relatively low.
  • the gradation information in a portion where the electron beam intensity is relatively high is saturated.
  • the second electron beam diffraction image acquired at the second exposure time includes a large amount of gradation information in a portion where the electron beam intensity is relatively high. Note that there is little or no gradation information in a portion where the electron beam intensity is relatively low.
  • HDR imaging is composed of a synthesis process of two types of electron beam diffraction images having different exposure times and a tone mapping process.
  • the former is a process for generating an electron beam diffraction image with an expanded dynamic range (that is, a high dynamic range), and is executed in step 405.
  • the latter is a process for displaying a high dynamic range image on the monitor, and is executed in step 406.
  • the HDR imaging synthesis process includes this.
  • a one-dimensional distribution 501 indicated by a dotted line is an electron beam intensity distribution corresponding to the first electron beam diffraction image.
  • a one-dimensional distribution 502 indicated by a solid line is an electron beam intensity distribution corresponding to the second electron diffraction image.
  • the detected value of the electron beam intensity is saturated when the upper limit or lower limit of the dynamic range 503 of the image detection device 308 is exceeded. Therefore, the second exposure time needs to be determined so that the peak point of the peak waveform to be measured is included in the one-dimensional distribution 502.
  • the one-dimensional distribution 501 of the electron beam intensity corresponding to the first electron beam diffraction image is overlapped with the one-dimensional distribution 502 of the electron beam intensity corresponding to the second electron beam diffraction image.
  • the portion be the first overlap 505.
  • a portion overlapping the one-dimensional distribution 501 of the electron beam intensity corresponding to the first electron beam diffraction image The overlap 506.
  • the magnification of the second overlap 506 with respect to the first overlap 505 is set as a shift magnification 507.
  • the shift magnification 507 is a movement amount for connecting a portion of the two one-dimensional distributions that is saturated with one one-dimensional distribution to a portion that is not saturated with the other one-dimensional distribution.
  • the shift magnification 507 is calculated from the first electron beam diffraction image and the second electron beam diffraction image.
  • the computer 309 calculates the one-dimensional distribution 502 of the electron beam intensity of the second electron beam diffraction image based on the calculated shift magnification 507, and the electron beam intensity of the first electron beam diffraction image. Shift over the one-dimensional distribution 501.
  • the computer 309 calculates a one-dimensional distribution in which the one-dimensional distribution 502 of the electron beam intensity of the second electron beam diffraction image is superimposed on the one-dimensional distribution 501 of the electron beam intensity of the first electron beam diffraction image. To do.
  • a high dynamic range image detection device 308 given by the pixel value of the first electron beam diffraction image and the pixel value of the shifted second electron beam diffraction image as shown in FIG. Electron diffraction image having a dynamic range wider than the dynamic range of 508) is generated.
  • the calculated one-dimensional distribution includes all peak waveforms.
  • Step 406 the second process of HDR imaging is executed. That is, tone mapping processing is executed.
  • the computer 309 performs tone mapping processing on the high dynamic range electron diffraction image calculated in step 405. That is, the computer 309 nonlinearly compresses the signal intensity once expanded, and calculates a tone mapping image having a standard dynamic range.
  • the nonlinear processing here is determined so that the compression rate of the one-dimensional distribution corresponding to the diffraction spot is smaller than the compression rate of the one-dimensional distribution corresponding to the transmission spot.
  • Step 407 The computer 309 displays the tone mapping image generated in the previous step on the display device 310. Through the processing of the adjustment sequence described above, the computer 309 can omit complicated adjustment work that needs to be performed prior to the analysis processing.
  • Step 408 the same electron beam diffraction image analysis processing as in the conventional method is executed. For example, main spot detection, binarization threshold determination, spot-to-spot distance measurement based on spot centroid information, crystal lattice spacing and scattering angle calculation for the obtained electron diffraction pattern Is done.
  • the transmission electron microscope according to the present embodiment generates an electron diffraction image having a wider dynamic range (higher dynamic range) than that of the dynamic range 508 of the image detection device 308, and then generates the intermediate result.
  • the obtained electron diffraction image is nonlinearly compressed to obtain an image for analysis.
  • the distribution of the electron beam intensity of each spot appearing in the generated electron beam diffraction image contains more information than in the conventional method. For this reason, it is possible to accurately determine the center of gravity of each spot without being affected by noise or the like, and the distance between spots can be measured more accurately than in the conventional method.
  • ⁇ Step 601 The computer 309 expands the high dynamic range image created in the previous step into a color space, and creates a color mapping image.
  • a color mapping image is generated by the method shown in FIG. More specifically, combinations of primary colors (red, green, and blue) that are associated with the high dynamic range image gradation (input gradation 705) are assigned as shown in FIG. That is, at the time of image display of a color mapping image, the input gradation is converted so that the display color is switched gradationally between the primary colors (red, green, and blue) according to each input gradation value.
  • the gradation value of the high dynamic range image is input.
  • the input gradation 705 is 1024 gradations.
  • the tone conversion characteristics for the input tone 705 are given by a red tone curve 701, a green tone curve 702, and a blue tone curve 703.
  • the output gradation 704 of each tone curve is 8 bits (256 gradations).
  • the combination of the red tone curve 701, the green tone curve 702, and the blue tone curve 703 is set so that the same combination does not occur more than once with respect to the input gradation 705, and no information is lost. Like that.
  • the tone curves 701 to 703 illustrated in FIG. 7 are used, the display color of the color mapping image changes from blue to green and from green to red as the input gradation 705 of the high dynamic range image increases. . That is, a color mapping image having a tone curve of 1024 gradations can be obtained, and a high dynamic range image can be displayed without gradation compression.
  • Step 602 The computer 309 displays the color mapping image generated in the previous step on the display device 310.
  • FIG. 8 is a schematic diagram of an electron beam diffraction image with a high dynamic range. This figure is common to the first and second embodiments.
  • the upper part of the figure is an electron beam diffraction image, and the lower part is a one-dimensional distribution of electron beam intensity.
  • the vertical axis in the lower diagram is the electron beam intensity, and the horizontal axis corresponds to the spot position in the upper diagram.
  • a one-dimensional distribution 000 is a distribution of electron beam intensity on the fluorescent screen 307.
  • the one-dimensional distribution 000 of the high dynamic range electron beam diffraction image is within the high dynamic range 807. That is, all of the electron beam intensity distribution information corresponding to the first diffracted wave spot 801, the second diffracted wave spot 802, and the transmitted wave spot 803 belong to the high dynamic range 807.
  • the center of gravity of the first diffracted wave spot 801 is obtained by a known method (for example, a method having the position of the maximum intensity as the center of gravity), and the first center of gravity line 804 passing through the center of gravity is drawn.
  • a second barycentric line 805 passing through the barycentric point of the second diffracted wave spot 802 is drawn.
  • a third barycentric line 806 passing through the barycentric point of the transmitted wave spot 803 is drawn.
  • the peak position of the electron beam intensity of the first diffracted wave spot 801 and the first barycentric line 804 coincide. For this reason, in the present embodiment, even if the barycentric point of the spot is handled as the peak position as in the conventional method, the peak position can be accurately specified, and the problems due to the conventional method can be solved.
  • the high dynamic range electron beam diffraction image obtained in this example is compressed into a gray scale space of 8 bits (256 gradations) by general tone mapping (clipping, scaling, etc.).
  • An electron beam diffraction image and a one-dimensional distribution 001 of electron beam intensity obtained in this case are shown.
  • the distribution information of the diffraction peak appearing in the one-dimensional distribution 001 is small and the intensity change is small (because the contrast is low), it is vulnerable to noise.
  • FIG. 10 shows an electron beam diffraction image obtained when a color mapping technique is applied to an electron beam diffraction image with a high dynamic range as in this embodiment, and the distribution of the electron beam intensity.
  • a color mapping image is created by developing an electron beam diffraction image with a high dynamic range into a color space without being compressed in gray scale (see FIG. 7).
  • the tone curves 701 to 703 illustrated in FIG. 7 are set, and the input gradation 705 is set to 10 bits (1024 gradations).
  • the created color mapping image is red 8 bits (256 gradations), green 8 bits (256 gradations), blue 8 bits (256 gradations), and in the color space Input gradation 705 can be set up to a maximum of 24 bits (16.77 million gradations).
  • the gradation information of the high dynamic range electron beam diffraction image can be displayed on the display device 310 without being compressed.
  • the first diffracted wave spot 801, the second diffracted wave spot 802, and the transmitted wave spot 803 are represented by gradations of primary colors (red, green, and blue).
  • the red and green boundary 809 and the green and blue boundary 810 are indicated by different line types.
  • the peak position of each spot is indicated by the color contrast. Accurate measurement is possible.
  • the color mapping image has a two-dimensional distribution of electron beam intensity, the effect of adjusting the viewing conditions can be confirmed from the color contrast of the color mapping image. For this reason, even when the observation conditions are adjusted before analysis, the operator can grasp the effect of the adjustment intuitively and in real time, and improvement in workability is expected.
  • Example 3 [Equipment configuration] Also in this embodiment, the transmission electron microscope (FIG. 3) having the configuration described in the first embodiment is used. The difference between the present embodiment and the first embodiment is the processing contents of the computer 309. More specifically, a function for analyzing the electron beam intensity of a diffraction spot that has caused a positional shift (generated due to distortion) in a high dynamic range electron beam diffraction image will be described.
  • the GUI shown in FIG. 11 is used. The GUI is displayed on the display device 310 and operated through the input device 314.
  • Step 1201 the operator determines an analysis position in the sample 312 through observation of a transmission image photographed through a transmission electron microscope (visual field search).
  • Step 1202 The operator switches the observation target from a transmission image to an electron beam diffraction image.
  • the computer 309 generates a high dynamic range electron beam diffraction image shown in FIG.
  • the computer 309 has a memory for storing information and a CPU for processing information.
  • the computer 309 expands a high dynamic range electron diffraction image as image data in a memory.
  • the computer 309 displays the viewer 1101 (FIG. 11) on the screen of the display device 310 and draws an electron beam diffraction image 1102 with a high dynamic range on the viewer 1101.
  • the computer 309 determines the main spot using the technique described in Patent Document 1.
  • a group in which pixels brighter than the brightness threshold are adjacent to each other in the electron beam diffraction image 1102 is determined as a diffraction spot. Further, the area of each spot is calculated, and the diffraction spot having the maximum area is determined as the main spot.
  • the main spot 1103 is determined from the diffraction spots of the electron diffraction image 1102 having a high dynamic range. The GUI at this time is as shown in FIG.
  • the computer 309 obtains observation conditions for the electron diffraction image 1102 displayed on the GUI. For example, the computer 309 acquires a voltage (hereinafter referred to as “acceleration voltage”) V for accelerating the electron beam by the acceleration tube 302. In addition, the computer 309 obtains a distance L (hereinafter referred to as “camera length”) L from the sample 312 to the fluorescent screen 307 that is the image plane. Further, the computer 309 acquires a distance (hereinafter, referred to as “lattice plane spacing”) d between atoms constituting the crystal formed by the sample 312. Note that the lattice plane spacing d is held in a database in the computer 309, and a value selected by the operator from the database is given to the computer 309.
  • Step 1205 The computer 309 calculates a distance (hereinafter referred to as “spot distance”) R between the main spot 1103 and a diffraction spot adjacent to the main spot 1103 based on the acceleration voltage V, the camera length L, and the lattice spacing d.
  • spot distance a distance between the main spot 1103 and a diffraction spot adjacent to the main spot 1103 based on the acceleration voltage V, the camera length L, and the lattice spacing d.
  • the following formula is used to calculate the inter-spot distance R.
  • R ⁇ L / d (Formula 1)
  • (1.504 / V) ⁇ 1/2 .
  • Step 1206 The computer 309 generates grid lines 1105 arranged in a grid pattern with a distance 1104 between the spots. The calculation is performed on the memory. An image of the generated grid line 1105 is shown in FIG.
  • Step 1207 The computer 309 draws the image on the viewer 1101 so that the center of the main spot 1103 and the intersection of the grid lines 1105 coincide with each other.
  • the GUI at this time is as shown in FIG.
  • Step 1208 In the computer 309, the operator drags the mouse of the input device 314 so that the diffraction spots are arranged on the grid line. Along with this operation, the computer 309 rotates all grid lines 1105 displayed on the screen around the main spot 1103.
  • FIG. 11D shows a state in which the grid line 1105 is rotated 1106 by 45 ° in the clockwise direction. Since the angle of the rotation 1106 differs depending on the apparatus and the sample, it is adjusted by the operator.
  • Step 1209 Here, if the intersection of the grid lines 1105 coincides with all the diffraction spots, it can be understood that there is no positional deviation of the diffraction spots at the analysis position designated by the operator. In this case, the computer 309 returns to step 1201. On the other hand, if there are one or more diffraction spots that do not coincide with the intersection of the grid lines 1105, it can be understood that there is a diffraction spot whose position is shifted at the analysis position designated by the operator. In this case, the computer 309 executes an analysis process for the diffraction spot.
  • Step 1210 In order to specify the analysis target, the operator clicks one of the diffraction spots whose positions are shifted using the mouse of the input device 314. The GUI at this time is as shown in FIG. A mouse pointer 1107 and a target rectangle 1108 are drawn on the viewer 1101.
  • Step 1211 The computer 309 displays an analyzer 1109 (FIG. 11F), which is a window different from the viewer 1101, on the screen of the display device 310.
  • the analyzer 1109 includes a diffraction spot whose position is shifted, a radar chart, and an RGB slider.
  • the analyzer 1109 pops up at every step 1210.
  • the computer 309 uses the electron beam intensity of the spot image clipped by the target rectangle 1108 to obtain the maximum brightness and the minimum brightness of the clipped spot image.
  • FIG. 13 shows a method for obtaining the maximum brightness and the minimum brightness of the spot image.
  • the computer 309 divides the range of the maximum luminance 1301 to the minimum luminance 1304 of the spot image into three equal parts, and sets the respective boundaries as a first threshold 1302 and a second threshold 1303.
  • the computer 309 applies the method of the second embodiment, the maximum luminance 1301 to the first threshold 1302 is red gradation, the first threshold 1302 to the second threshold 1303 is green gradation, the second threshold 1303
  • the minimum luminance 1304 is expressed with a blue gradation.
  • the computer 309 calculates the centroid 1305 of the spot area expressed by the red gradation, the centroid 1306 of the spot area expressed by the green gradation, and the centroid 1307 of the spot area expressed by the blue gradation.
  • the computer 309 displays on the analyzer 1109 a spot area 1110 expressed by a red gradation and its center of gravity position 1113, a spot area 1111 expressed by a green gradation and its center of gravity position 1114, and a blue gradation.
  • the spot area 1112 and its center of gravity position 1115 are drawn.
  • Step 1212 The computer 309 graphs the shift of the center of gravity position in the spot area displayed in RGB colors.
  • the deviation is the distance between the peak position of the diffraction spot and the barycentric position of the spot area displayed in RGB colors (FIG. 13B).
  • the spot peak position 1308 is the position of the maximum luminance of the spot image cut out, and the distance from the center of gravity 1305 of the spot area expressed by the red gradation is the deviation 1309 of the center of gravity position in the red spot area.
  • the distance between the spot peak position 1308 and the center of gravity 1306 of the spot area expressed in green gradation is the deviation 1310 of the center of gravity position in the green spot area.
  • the distance between the peak position 1308 of the spot and the centroid 1307 of the spot area represented by the blue gradation is the deviation 1311 of the centroid position in the blue spot area.
  • the shift is calculated by the computer 309 and drawn on the radar chart 1116 in the analyzer 1109 (FIG. 13C).
  • the computer 309 changes the bands displayed in RGB colors in response to an operation input through the mouse of the input device 314 to the RGB slider 1117 displayed on the analyzer 1109.
  • the display band is changed by the operator, the region range and the center of gravity of the diffraction spots displayed in RGB colors change, and the radar chart 1116 also changes.
  • the computer 309 analyzes the electron beam intensity of the diffraction spot that has caused a positional shift (generated due to distortion).
  • the center of gravity of the image for each color obtained by the color mapping process can be displayed on the GUI, causing positional deviation (generated due to distortion). Analysis of the electron beam intensity distribution of the diffraction spot can be realized.
  • the present invention is not limited to the above-described embodiments, and includes various modifications.
  • the above-described embodiments have been described in detail for easy understanding of the present invention, and it is not necessary to provide all the configurations described.
  • a part of one embodiment can be replaced with the configuration of another embodiment.
  • the structure of another Example can also be added to the structure of a certain Example.
  • a part of the configuration of another embodiment can be added, deleted, or replaced.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

Cette invention adopte une caractéristique dans laquelle une pluralité d'images de diffraction de faisceau d'électrons de différents temps d'exposition sont acquises et combinées afin d'acquérir une image à grande gamme dynamique par rapport à des images de diffraction de faisceau d'électrons individuelles. Plus précisément, un dispositif à faisceau de particules chargées comprend : une unité d'exposition pour exposer un échantillon à un faisceau de particules chargées ; une unité de détection pour détecter des électrons provenant de l'échantillon et obtenir une image ; et une unité de traitement. L'unité de détection obtient une première image de diffraction de faisceau d'électrons pendant un premier temps d'exposition et une deuxième image de diffraction de faisceau d'électrons pendant un deuxième temps d'exposition qui est différent du premier temps d'exposition (404). L'unité de traitement combine la première image de diffraction de faisceau d'électrons et la deuxième image de diffraction de faisceau d'électrons, et obtient une troisième image ayant une plus grande gamme dynamique que la première image de diffraction de faisceau d'électrons et la deuxième image de diffraction de faisceau d'électrons (405).
PCT/JP2015/062672 2015-04-27 2015-04-27 Dispositif à faisceau de particules chargées et procédé d'observation d'échantillons à l'aide dudit dispositif Ceased WO2016174707A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/JP2015/062672 WO2016174707A1 (fr) 2015-04-27 2015-04-27 Dispositif à faisceau de particules chargées et procédé d'observation d'échantillons à l'aide dudit dispositif
JP2017515299A JP6454414B2 (ja) 2015-04-27 2015-04-27 荷電粒子線装置及び当該装置を用いた試料の観察方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2015/062672 WO2016174707A1 (fr) 2015-04-27 2015-04-27 Dispositif à faisceau de particules chargées et procédé d'observation d'échantillons à l'aide dudit dispositif

Publications (1)

Publication Number Publication Date
WO2016174707A1 true WO2016174707A1 (fr) 2016-11-03

Family

ID=57199045

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2015/062672 Ceased WO2016174707A1 (fr) 2015-04-27 2015-04-27 Dispositif à faisceau de particules chargées et procédé d'observation d'échantillons à l'aide dudit dispositif

Country Status (2)

Country Link
JP (1) JP6454414B2 (fr)
WO (1) WO2016174707A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022159158A (ja) * 2021-03-31 2022-10-17 エフ イー アイ カンパニ 結晶構造を決定する方法およびシステム

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03269680A (ja) * 1990-03-19 1991-12-02 Nippon Telegr & Teleph Corp <Ntt> 立体表示処理方法
JPH04308640A (ja) * 1991-04-08 1992-10-30 Jeol Ltd 電子顕微鏡用画像表示装置
JPH09213253A (ja) * 1996-01-31 1997-08-15 Ricoh Co Ltd 電子線回折による非晶質材料の構造解析方法
JP2001241932A (ja) * 2000-03-02 2001-09-07 Matsushita Electric Ind Co Ltd 接合検査装置、方法、及び接合検査方法を実行するプログラムを記録した記録媒体
JP2001281172A (ja) * 2000-03-31 2001-10-10 Nagoya Electric Works Co Ltd X線撮影方法
JP2003202382A (ja) * 2001-12-28 2003-07-18 Toshiba Corp 撮像装置および撮像方法
JP2007242366A (ja) * 2006-03-07 2007-09-20 Hitachi High-Technologies Corp 透過電子顕微鏡
JP2013251724A (ja) * 2012-05-31 2013-12-12 Olympus Imaging Corp 撮影機器
WO2013186806A1 (fr) * 2012-06-11 2013-12-19 株式会社ソニー・コンピュータエンタテインメント Dispositif de capture d'image et procédé de capture d'image

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4891788B2 (ja) * 2007-01-15 2012-03-07 日本電子株式会社 電子顕微鏡像の歪み補正方法及び輝度補正方法
JP5317556B2 (ja) * 2008-07-03 2013-10-16 株式会社日立ハイテクノロジーズ 電子線回折像の解析方法及び透過型電子顕微鏡
KR101999988B1 (ko) * 2012-03-08 2019-07-15 앱파이브 엘엘씨 고 공간 분해능에서 물질의 스트레인을 측정하기 위한 시스템 및 공정

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03269680A (ja) * 1990-03-19 1991-12-02 Nippon Telegr & Teleph Corp <Ntt> 立体表示処理方法
JPH04308640A (ja) * 1991-04-08 1992-10-30 Jeol Ltd 電子顕微鏡用画像表示装置
JPH09213253A (ja) * 1996-01-31 1997-08-15 Ricoh Co Ltd 電子線回折による非晶質材料の構造解析方法
JP2001241932A (ja) * 2000-03-02 2001-09-07 Matsushita Electric Ind Co Ltd 接合検査装置、方法、及び接合検査方法を実行するプログラムを記録した記録媒体
JP2001281172A (ja) * 2000-03-31 2001-10-10 Nagoya Electric Works Co Ltd X線撮影方法
JP2003202382A (ja) * 2001-12-28 2003-07-18 Toshiba Corp 撮像装置および撮像方法
JP2007242366A (ja) * 2006-03-07 2007-09-20 Hitachi High-Technologies Corp 透過電子顕微鏡
JP2013251724A (ja) * 2012-05-31 2013-12-12 Olympus Imaging Corp 撮影機器
WO2013186806A1 (fr) * 2012-06-11 2013-12-19 株式会社ソニー・コンピュータエンタテインメント Dispositif de capture d'image et procédé de capture d'image

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022159158A (ja) * 2021-03-31 2022-10-17 エフ イー アイ カンパニ 結晶構造を決定する方法およびシステム
US11988618B2 (en) 2021-03-31 2024-05-21 Fei Company Method and system to determine crystal structure

Also Published As

Publication number Publication date
JPWO2016174707A1 (ja) 2018-01-11
JP6454414B2 (ja) 2019-01-16

Similar Documents

Publication Publication Date Title
JP7311487B2 (ja) 電子顕微鏡のための改良されたナビゲーション
KR101624445B1 (ko) 화상 형성 장치 및 치수 측정 장치
US8450683B2 (en) Image processing apparatus, an image generating method, and a system
US8669524B2 (en) Scanning incremental focus microscopy
JP2021097039A (ja) 透過菊池回折パターンの改良方法
WO2016143467A1 (fr) Dispositif à faisceau de particules chargées et procédé de formation d&#39;image l&#39;utilisant
JP2003098123A (ja) 電子顕微鏡における分析方法
JP7018365B2 (ja) 荷電粒子線装置および分析方法
JP6454414B2 (ja) 荷電粒子線装置及び当該装置を用いた試料の観察方法
WO2022092077A1 (fr) Dispositif à faisceau de particules chargées et procédé d&#39;observation d&#39;échantillon
US9627175B2 (en) Electron microscope and elemental mapping image generation method
JP7105321B2 (ja) 荷電粒子線装置
WO2018037570A1 (fr) Dispositif de traitement de données d&#39;imagerie par spectrométrie de masse
US10482579B2 (en) Image processing apparatus, image processing method, and analyzer
JP6770482B2 (ja) 荷電粒子線装置および走査像の歪み補正方法
JP2016170015A (ja) 電子分光装置および測定方法
US20240085357A1 (en) Scanning Electron Microscope and Map Display Method for Absorption Edge Structure
JP2010272398A (ja) 荷電粒子線応用装置
JP2016033857A (ja) 走査荷電粒子顕微鏡画像の高画質化方法およびその装置
US10886099B2 (en) Method of aberration measurement and electron microscope
CN111146062B (zh) 电子显微镜和图像处理方法
JP6334243B2 (ja) 荷電粒子線装置
JP6078356B2 (ja) テンプレートマッチング条件設定装置、及び荷電粒子線装置
JP3932880B2 (ja) 電子線分析装置
JP2011022059A (ja) 荷電粒子顕微鏡及び解析方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15890691

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2017515299

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 15890691

Country of ref document: EP

Kind code of ref document: A1