WO2017006673A1 - Dispositif de chauffage diélectrique à haute fréquence - Google Patents

Dispositif de chauffage diélectrique à haute fréquence Download PDF

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Publication number
WO2017006673A1
WO2017006673A1 PCT/JP2016/066624 JP2016066624W WO2017006673A1 WO 2017006673 A1 WO2017006673 A1 WO 2017006673A1 JP 2016066624 W JP2016066624 W JP 2016066624W WO 2017006673 A1 WO2017006673 A1 WO 2017006673A1
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WIPO (PCT)
Prior art keywords
capacitor
frequency
impedance
dielectric heating
power source
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Ceased
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PCT/JP2016/066624
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English (en)
Japanese (ja)
Inventor
友樹 丸山
真司 山田
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Toyo Seikan Group Holdings Ltd
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Toyo Seikan Group Holdings Ltd
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Application filed by Toyo Seikan Group Holdings Ltd filed Critical Toyo Seikan Group Holdings Ltd
Priority to KR1020237006581A priority Critical patent/KR20230035682A/ko
Priority to CN201680034699.0A priority patent/CN107710869B/zh
Priority to EP16821144.9A priority patent/EP3322258A4/fr
Priority to KR1020177036357A priority patent/KR20180023904A/ko
Priority claimed from JP2016111797A external-priority patent/JP6838290B2/ja
Priority claimed from JP2016111798A external-priority patent/JP6838291B2/ja
Publication of WO2017006673A1 publication Critical patent/WO2017006673A1/fr
Priority to US15/844,824 priority patent/US20180110098A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/46—Dielectric heating
    • H05B6/48—Circuits
    • H05B6/50—Circuits for monitoring or control
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B40/00—Technologies aiming at improving the efficiency of home appliances, e.g. induction cooking or efficient technologies for refrigerators, freezers or dish washers

Definitions

  • the present invention relates to a high-frequency dielectric heating device that heats an object to be heated disposed between opposing electrodes by high-frequency dielectric heating, and more particularly to a high-frequency dielectric heating device that defrosts frozen food by high-frequency dielectric heating.
  • High-frequency dielectric heating is caused by applying high-frequency voltage to the object to be heated (dielectric material), changing the polarity of each molecule constituting the object to be heated at high frequency, and accompanying rotation, collision, vibration, friction, etc. of the molecule. It is a heating method for heating an object to be heated by internal heat generation.
  • the electrode impedance of the object to be heated varies greatly depending on the shape, type, heating or thawing temperature of the object to be heated.
  • the impedance is not matched, reflected power is generated, the heating or thawing efficiency is lowered, the circuit element is destroyed or deteriorated May lead to.
  • a matching device is inserted between the high-frequency power source and the electrode, and impedance matching is maintained by providing, for example, a capacitor or a coil as its constituent elements.
  • the structure is simple, the heat resistance temperature of the circuit element is high, and the reflection A vacuum tube type high-frequency power source excellent in power resistance is used.
  • the vacuum tube type high frequency power supply has a high anode voltage, large size, low power supply efficiency, and high output power to compensate for this by increasing the output power. There is a problem that it takes time to start up the device, and there is a problem that the resonance frequency arbitrarily changes depending on the electrode impedance provided with the object to be heated.
  • the power frequency affects the uniformity (power half depth) when heating or thawing foods having various shapes, it is not preferable that the resonance frequency changes arbitrarily in each situation. Further, in order to comply with the frequency regulations in the Radio Law, it is preferable to keep within a predetermined frequency fluctuation range.
  • a semiconductor high-frequency power source that performs power amplification by controlling high-speed switching of a semiconductor is characterized by its small size and high efficiency as a system when combined with a high-resolution automatic matching unit, and has been used for applications such as plasma discharge.
  • the impedance matching state is maintained by sequentially changing the values of the variable capacitors and variable coils, which are the components of the matching unit, but the load is large like food, and its shape, type, and temperature
  • the electrode impedance changes greatly due to the above it is necessary to provide the capacitor or coil with a large impedance adjustment width in order to maintain the matching state. As a result, there arises a problem that the matching unit is large and the cost is high.
  • FIG. 10A includes a first capacitor C1 connected in parallel with the high-frequency power source 20, a second capacitor C2 connected in series with the electrode 30, and a coil L.
  • the first capacitor C1 and the second capacitor This is a configuration that performs impedance matching by making C2 variable in capacity and sequentially changing the value in real time.
  • Z R / (1 + ⁇ 2 R 2 C 1 2) a + j ⁇ ( ⁇ L-1 / ⁇ C 2) - ⁇ R 2 C 1 / (1 + ⁇ 2 R 2 C 1 2) ⁇
  • the complex conjugate Z ′ is shown as an impedance matching range by the variable capacitance capacitors C1 and C2.
  • the resistance R / (1 + ⁇ 2 R 2 C 1 2 ) of Z ′ does not become larger than the output impedance R of the power supply, for example, it is an impedance for a load having a large resistance or impedance such as food. Alignment cannot be done properly.
  • each symbol in the above expression is ⁇ : angular frequency
  • R output impedance of the power supply
  • L reactance of the coil
  • C 1 capacitance of the variable capacitance first capacitor
  • C 2 capacitance of the variable capacitance second capacitor. It is.
  • FIG. 10B shows a first capacitor C1 connected in parallel with the high frequency power source 20, a third capacitor C3 connected in parallel with the electrode 30, and a series between the first capacitor C1 and the third capacitor C3.
  • the coil L is connected, the first capacitor C1 and the third capacitor C3 are variable in capacitance, and impedance matching is performed by changing the value in real time.
  • the electrode impedance is also sequentially changed accordingly, and in particular, the load between the electrodes 30 is a large capacity like food.
  • the electrode impedance changes greatly depending on the shape, type, heating or thawing temperature, the change is promoted, and it is difficult to keep impedance matching stably.
  • a high-frequency dielectric heating device that avoids the problem of an increase in the size of the matching device
  • a high-frequency dielectric heating device in which the matching circuit has a variable coil and a capacitor, and the capacity of the capacitor can be increased by switching means (for example, see Patent Document 2).
  • the power reflected by the high frequency power source is detected by the reflected power detection means, and the values of the variable coil and the capacitor are appropriately combined based on the detection signal of the reflected power detection means, and the impedance To maintain the reflected power to a minimum.
  • the high-frequency dielectric heating device described in Patent Document 2 is configured to adjust the impedance by changing the capacitance of the capacitor or the coil. Therefore, it is necessary to increase the impedance adjustment width by the coil or the capacitor, and the matching unit cannot be reduced in size.
  • the present invention solves these problems, and by performing sequential impedance matching according to changes in electrode impedance such as the shape, type of food, heating or thawing temperature, the oscillation efficiency of the high frequency power supply is improved. Improve and reduce the size of the power supply. Furthermore, by making the power supply frequency variable within a predetermined range, an impedance adjustment function is provided, and the matching unit is simplified and miniaturized. Thus, it is an object of the present invention to provide a high-frequency dielectric heating apparatus that is small and inexpensive and capable of high-quality heating or thawing with respect to various foods.
  • the present invention is intended for heating or thawing of foodstuffs using a small, high-efficiency semiconductor high-frequency power supply, and even if the electrode impedance is likely to change depending on the shape, type, heating or thawing temperature of the foodstuff, the change It is possible to satisfactorily perform impedance matching while simplifying and downsizing the matching device, and to provide a high-frequency dielectric heating device that can be heated or thawed in a small size and at low cost. To do.
  • One aspect of the present invention includes a high-frequency power source, a pair of electrodes arranged opposite to each other, and a reflected power detection unit that is connected between the electrodes and the high-frequency power source and detects reflected power generated by heating of an object to be heated.
  • a high-frequency dielectric heating device comprising an impedance matching unit for adjusting reflected power, wherein the matching unit includes a capacitor connected in parallel to the high-frequency power source, and a capacitor capable of at least reactance adjustment connected in series to the electrode.
  • the high-frequency power source is configured to have a variable frequency, thereby solving the problem.
  • a high-frequency dielectric heating device including a semiconductor high-frequency power source, a pair of electrodes arranged opposite to each other, and an impedance matching device, wherein the matching device is in parallel with the high-frequency power source.
  • a first capacitor connected to the first capacitor; a third capacitor connected in parallel to the electrode; a coil and a second capacitor connected in series between the first capacitor and the third capacitor; Is a solution.
  • the reflected power generated by heating or thawing of the object to be heated is detected by the reflected power detection means, and the impedance matching is performed successively, thereby improving the oscillation efficiency of the high frequency power supply and reducing the size of the power supply.
  • the impedance matching unit includes at least one of a capacitor connected in parallel with the high-frequency power source and at least one of a capacitor or a coil connected in series with the electrode and capable of adjusting the reactance, and the high-frequency power source is configured to have a variable frequency.
  • the matching device includes variable means for switching or continuously changing the capacity of at least one of a capacitor connected in parallel with the high-frequency power source or a capacitor connected in series with the electrode.
  • the frequency variable width of the high frequency power supply can be set small, the heating and thawing quality of the food can always be kept good while simplifying and downsizing the matching unit.
  • the matching device since the matching device includes the capacitor connected in parallel with the electrode, it is possible to reduce the rate of change of the electrode impedance accompanying heating or thawing. As a result, since the frequency variable width of the high frequency power supply can be set small, the heating and thawing quality of the food can always be kept good while simplifying and downsizing the matching unit.
  • the heating or thawing of the food is stably performed while suppressing the change in the electrode impedance by the small capacitor with high efficiency and the third capacitor connected in parallel with the electrode. be able to.
  • the capacitance of the capacitor can be adjusted by the capacitance varying means provided in at least one of the first capacitor and the second capacitor. For various foods having different shapes, types, and electrical characteristics. Impedance matching can be performed satisfactorily.
  • At least the resistance of the impedance matching range formed by the output impedance of the high frequency power supply and the matching unit includes a portion larger than the output impedance, and the reactance range is larger than positive and negative. This can be easily realized by setting the third capacitor to a predetermined value.
  • the impedance matching range is specialized for the thawing of the food material, so that the matching unit can be simplified and downsized. Further, by shortening the impedance matching time, damage and deterioration of the device can be prevented from the reflected power, and reliability can be improved.
  • the eighth aspect of the present invention it is possible to easily obtain accurate information on the food impedance from the impedance information output unit of the matching unit, and set parameters of the matching unit narrowed down to the object to be heated. Or the matching unit can be simplified based on the result.
  • condenser The table
  • the high-frequency dielectric heating device 10 includes a high-frequency power source 20, a pair of electrodes 30, a matching unit 40 connected between the electrode 30 and the high-frequency power source 20 and impedance matching with the high-frequency power source 20, A reflected power detector (not shown) that detects power reflected to the high-frequency power source 20 and a controller (not shown) that controls each part, and a frozen food disposed between a pair of opposed electrodes 30 are provided. Thawing by high frequency dielectric heating.
  • the high frequency power supply 20 is configured as a variable frequency semiconductor type high frequency power supply having a variable frequency.
  • the high frequency power supply 20 is configured to suppress or stop the high frequency output by a protection function when the reflectance detected by the reflected power detection unit exceeds a predetermined threshold.
  • the matching unit 40 includes a reactance circuit 50 connected in series to the electrode 30, a first capacitor C ⁇ b> 1 connected in parallel with the electrode 30 between the reactance circuit 50 and the high-frequency power source 20, and A third capacitor C ⁇ b> 3 connected in parallel with the electrode 30 is included between the electrode 30 and the reactance circuit 50.
  • the reactance circuit 50 includes at least one reactance element connected in series to the electrode 30.
  • the second capacitor C2 connected in series to the high-frequency power source 20 is used.
  • a coil L is used.
  • FIG. 2 shows that the frequency of the high frequency power supply is 13.56 MHz, the capacitance of the first capacitor C1 is 1500 pF, the inductance of the coil L is 1.8 ⁇ H, various foods are thawed, and the reflected power by the reflected power detection unit is always minimized.
  • the value (capacity%) when the capacity of the second capacitor C2 is adjusted is shown.
  • the capacity% of the second capacitor C2 at the start of thawing differs depending on the type and number of ingredients, and further, the second capacitor C2 at the end of thawing. The capacity% is greatly decreasing.
  • the third capacitor C3 When the third capacitor C3 is disposed, the change in the capacitance% of the second capacitor C2 due to the type and number of ingredients at the start and end of thawing is small. From this result, by disposing the third capacitor C3, it is possible to reduce the rate of change of the electrode impedance accompanying the thawing of the ingredients, and the frequency variable width of the high frequency power source 20 can be set small.
  • the matching unit 40 includes variable means (not shown) including a contact means such as a relay, a variable condenser, or the like that switches or continuously changes the capacity of the first capacitor C1 connected in parallel with the high-frequency power source 20.
  • variable means including a contact means such as a relay, a variable condenser, or the like that switches or continuously changes the capacity of the first capacitor C1 connected in parallel with the high-frequency power source 20.
  • the specific mode of the variable means is not limited to the above, and any means may be used as long as the capacity of the first capacitor C1 is switched or continuously changed in multiple stages, and the variable means is connected in series with the electrode 30.
  • the capacitance of the connected capacitor may be switched in multiple stages or continuously changed.
  • the control unit Based on the reflectance detected by the reflected power detection unit, the control unit switches the capacity of the first capacitor C1 in a decreasing direction according to the thawing state of the object to be heated, and adjusts the frequency of the high-frequency power source 20, Designed for impedance matching.
  • the capacitance of the second capacitor C2 of the reactance circuit 50 was set to 93 pF
  • the inductance of the coil L was set to 1.8 ⁇ H
  • the impedance of the reactance circuit 50 was adjusted by adjusting the frequency of the high-frequency power supply 20.
  • the capacitance of the third capacitor C3 is 400 pF.
  • the high frequency power supply 20 is configured such that the high frequency output is stopped by the protection function when the reflectance detected by the reflected power detection unit exceeds 40%.
  • four freezers were used as the objects to be thawed (objects to be heated) disposed between the pair of electrodes 30, four freezers were used.
  • FIG. 3 shows the results of measuring the frequency and reflectance every minute after the start of thawing.
  • the matching adjustment is not performed in accordance with the decompression, when the capacitance of the first capacitor C1 is set to 1500 pF and the frequency of the high frequency power supply 20 is fixed to 13.56 MHz, the reflectivity reaches the threshold value in about 3 minutes. 40%), high-frequency oscillation of the high-frequency power source 20 was stopped, and thawing was interrupted.
  • the capacity of the first capacitor C1 is set to 1500 pF and defrosting is started. , It takes 7 minutes for the reflectivity to reach the threshold (40%) because the frequency changes with decompression (13.53 MHz ⁇ 13.48 MHz), and the time it takes for the reflection to reach the threshold compared to when the frequency is not adjusted. It was possible to lengthen.
  • the capacitance of the first capacitor C1 is switched to 1270 pF, so that the reflectivity is reduced to about 15%, and at the same time, the frequency changes (13.48 MHz ⁇ 13.55 MHz).
  • the frequency almost recovered to 13.53 MHz.
  • the capacitance of the first capacitor C1 to 1030 pF, 970 pF, and 880 pF as appropriate according to the reflectance, high-frequency application was possible while maintaining the reflectance below the threshold, and thawing was completed.
  • the high-frequency dielectric heating device 10 can achieve impedance matching at low cost by adjusting the impedance of the reactance circuit 50 by variably adjusting the frequency of the high-frequency power source 20 and switching the matching unit 40 with multiple stages such as relays. It was done. Furthermore, by using a variable capacitor for adjusting the capacitor capacity in the matching unit 40, it is possible to easily achieve more accurate impedance adjustment. Further, when the frequency of the high frequency power supply 20 is variably adjusted, the frequency variable width can be reduced by using the capacitor capacity adjustment in the matching unit 40 together.
  • the high-frequency dielectric heating device 10 includes a semiconductor-type high-frequency power source 20, a pair of electrodes 30, a matching unit 40 connected between the electrode 30 and the high-frequency power source 20, and impedance matching, and a high-frequency power source. 20 and a coaxial cable (not shown) for connecting the matching unit 40, a reflected power detection unit (not shown) for detecting the power reflected to the high frequency power source 20, and a control unit (not shown) for controlling each unit, A frozen food disposed between a pair of opposed electrodes 30 is thawed by high frequency dielectric heating.
  • the high frequency power supply 20 is configured to suppress or stop the high frequency output by the protection function when the reflectance detected by the reflected power detection unit exceeds a predetermined threshold.
  • the matching unit 40 includes a first capacitor C1 connected in parallel with the high-frequency power supply 20, a third capacitor C3 connected in parallel with the electrode 30, and a first capacitor C1 and a third capacitor C3.
  • a circuit configuration that includes a coil L and a second capacitor C2 connected in series between the two and a third capacitor C3 connected in parallel to the electrode 30 inside the matching unit 40, thereby suppressing a change in electrode impedance. It has become.
  • At least one of the first capacitor C1 or the second capacitor C2 is provided with a capacity varying means (not shown), and the capacity can be adjusted so as to suppress the reflected power detected by the reflected power detection unit during thawing.
  • the capacitance adjustment of the capacitor may be a continuous adjustment type by variable capacitor driving of FIG. 4A or a multistage switching type by a relay of FIG. 4B.
  • the third capacitor C3 does not variably adjust the capacity during the thawing, but may be provided with a simple capacity variable mechanism in order to set the optimum value according to the load in advance.
  • the combined impedance Z is expressed by the following equation.
  • Z 1 / [ ⁇ (1 / R + j ⁇ C 1 ) ⁇ 1 + j ( ⁇ L ⁇ 1 / ⁇ C 2 ) ⁇ ⁇ 1 + j ⁇ C 3 ]
  • ⁇ angular frequency
  • R output impedance of the power source (coaxial cable resistance)
  • L reactance of the coil
  • C 1 capacitance of the first capacitor with variable capacitance
  • C 2 variable capacitance.
  • C 3 the capacity of the third capacitor.
  • the range of Z ′ obtained by the variable capacitance width of the first capacitor C1 or the second capacitor C2 is the impedance matching range, and ⁇ , R, L, C It can be set freely according to the values of 1 , C 2 , and C 3 .
  • the third capacitor C3 by setting the third capacitor C3 to a predetermined value, at least the resistance of the impedance matching range formed by the output impedance of the high frequency power supply 20 and the matching unit 40 is larger than the output impedance (a portion larger than the output impedance).
  • the reactance range is more negative than positive.
  • the control unit Based on the reflectance detected by the reflected power detection unit, the control unit switches the capacitance of at least one of the first capacitor C1 or the second capacitor C2 in a decreasing direction according to the thawing state of the object to be heated. Designed for impedance matching. The control unit does not variably adjust the capacity of the third capacitor C3 during thawing.
  • the C2 capacity% at the start of thawing varies depending on the type and number of ingredients, and the C2 capacity% at the end of thawing varies greatly in the decreasing direction. That is, unless the capacitance variable width of the second capacitor C2 is increased, it is difficult to perform impedance matching, and the matching unit 40 cannot be simplified and downsized.
  • FIG. 2B in addition to the circuit configuration described above, a third capacitor C3 having a capacity of 400 pF is connected in parallel with the electrode 30, and various foods are thawed so that the reflected power by the reflected power detector is always minimized. The values (capacity%) when the capacity of the second capacitor C2 is adjusted are shown. Various ingredients can be thawed without greatly changing the capacitance% of the second capacitor C2, and the matching unit 40 having a small capacitance variable width of the second capacitor C2 can be simplified and downsized.
  • the capacity of the first capacitor C1 is set such that the capacity C 1 of C1 is 150 to 1500 pF, the capacity C 3 of the third capacitor C3 is 400 pF, and various ingredients are thawed so that the reflected power by the reflected power detection unit is always minimized.
  • the value (capacity%) of C1 when adjustment is performed is shown.
  • the angular frequency ⁇ 13.56 MHz
  • the output impedance R 50 ⁇ of the high-frequency power supply 20
  • the reactance L of the coil L 1.8 ⁇ H
  • the capacitance C 1 of the variable capacitance first capacitor C 1 150 to 1500 pF
  • the variable capacitance of the first The capacitance C 2 of the two capacitors C2 25 to 250 pF.
  • the angular frequency ⁇ 13.56 MHz
  • the output impedance R of the power supply R 50 ⁇
  • the reactance L of the coil L 1.8 ⁇ H
  • the capacitance C 1 of the variable capacitance first capacitor C 1 150 to 1500 pF
  • the variable capacitance second capacitor capacity C2 C 2 25 ⁇ 250pF
  • third capacitance C 3 50 pF capacitor C3, 200pF, 400pF, and 600 pF.
  • the high-frequency dielectric heating device 10 connects the third capacitor C3 in parallel with the electrode 30 to the matching unit 40, thereby suppressing the change in electrode impedance due to the thawing of the ingredients, and simplification and miniaturization of the matching unit 40.
  • impedance matching was possible.
  • the larger capacitor value of the third capacitor C3 is more effective in suppressing the change in electrode impedance.
  • the high-frequency dielectric heating device has been described as thawing frozen food by high-frequency dielectric heating, but the same effect can be obtained even when thawing a living body such as blood, animals and plants in addition to food.
  • the application of the high-frequency dielectric heating device is not limited to thawing frozen foods as long as it heats an object to be heated.
  • an impedance information output unit that outputs impedance information (for example, the state of the first capacitor) of the matching unit to a monitor monitor or the like may be provided.
  • impedance information for example, the state of the first capacitor
  • a monitor monitor or the like may be provided.
  • impedance information output unit of the matcher it is possible to easily obtain accurate information on food impedance from the impedance information output unit of the matcher, and set the matcher parameters narrowed down to the object to be heated and match based on the result.
  • the device can be simplified.
  • the semiconductor type high frequency dielectric heating device of the present invention is not only suitable for rapid thawing of frozen foods etc., but can also be widely applied as an industrial dielectric heating device. Industrial applicability is high, for example, it can be incorporated into a microwave oven or refrigerator.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Control Of High-Frequency Heating Circuits (AREA)
  • Freezing, Cooling And Drying Of Foods (AREA)
  • Constitution Of High-Frequency Heating (AREA)

Abstract

La présente invention concerne un dispositif de chauffage diélectrique à haute fréquence pour lequel un réglage précis de l'inductance est accompli facilement et avec une grande précision tout en réduisant le coût du dispositif et en simplifiant la structure du dispositif. Le dispositif de chauffage diélectrique à haute fréquence (10) comprend une source d'énergie à haute fréquence (20), une paire d'électrodes (30) disposées en face l'une de l'autre, un moyen de détection d'énergie réfléchie pour détecter l'énergie réfléchie survenant en raison du chauffage d'une substance à chauffer, le moyen de détection d'énergie réfléchie étant connecté entre les électrodes (30) et la source d'énergie à haute fréquence (20), et un dispositif d'adaptation d'inductance (40) pour ajuster l'énergie réfléchie, le dispositif d'adaptation (40) étant équipé d'un condensateur (C1), connecté en parallèle à la source d'énergie à haute fréquence (20), et d'un condensateur (C2) et/ou d'une bobine (L) avec lesquels il est possible d'ajuster au moins une réactance, le condensateur (C2) et/ou la bobine (L) étant connectés en série avec les électrodes (30), la source d'énergie à haute fréquence (20) étant configurée de sorte que la fréquence peut être modifiée.
PCT/JP2016/066624 2015-07-03 2016-06-03 Dispositif de chauffage diélectrique à haute fréquence Ceased WO2017006673A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020237006581A KR20230035682A (ko) 2015-07-03 2016-06-03 고주파 유전 가열 장치
CN201680034699.0A CN107710869B (zh) 2015-07-03 2016-06-03 高频感应加热装置
EP16821144.9A EP3322258A4 (fr) 2015-07-03 2016-06-03 Dispositif de chauffage diélectrique à haute fréquence
KR1020177036357A KR20180023904A (ko) 2015-07-03 2016-06-03 고주파 유전 가열 장치
US15/844,824 US20180110098A1 (en) 2015-07-03 2017-12-18 High-frequency dielectric heating device

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JP2015-134647 2015-07-03
JP2015-134646 2015-07-03
JP2015134646 2015-07-03
JP2015134647 2015-07-03
JP2016-111798 2016-06-03
JP2016111797A JP6838290B2 (ja) 2015-07-03 2016-06-03 高周波誘電加熱装置
JP2016-111797 2016-06-03
JP2016111798A JP6838291B2 (ja) 2015-07-03 2016-06-03 半導体式高周波誘電加熱装置

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JP2019032963A (ja) * 2017-08-07 2019-02-28 シャープ株式会社 高周波解凍装置
JP2019046727A (ja) * 2017-09-06 2019-03-22 シャープ株式会社 高周波加熱システム
WO2019077858A1 (fr) * 2017-10-18 2019-04-25 東洋製罐グループホールディングス株式会社 Dispositif de chauffage par induction à haute fréquence
JP2019075363A (ja) * 2017-10-18 2019-05-16 東洋製罐グループホールディングス株式会社 高周波誘電加熱装置
JP2021022432A (ja) * 2019-07-24 2021-02-18 シャープ福山セミコンダクター株式会社 高周波加熱装置
JP2022516295A (ja) * 2019-01-04 2022-02-25 海尓智家股▲フン▼有限公司 電磁波生成システム及び電磁波生成システムを有する加熱装置
CN115996494A (zh) * 2021-10-18 2023-04-21 青岛海尔电冰箱有限公司 用于加热装置的控制方法及加热装置
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TWI893854B (zh) * 2024-06-20 2025-08-11 國立虎尾科技大學 一種具高週波電流同調裝置的控制熱加工系統及該裝置

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JP2019032963A (ja) * 2017-08-07 2019-02-28 シャープ株式会社 高周波解凍装置
JP2019046727A (ja) * 2017-09-06 2019-03-22 シャープ株式会社 高周波加熱システム
WO2019077858A1 (fr) * 2017-10-18 2019-04-25 東洋製罐グループホールディングス株式会社 Dispositif de chauffage par induction à haute fréquence
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EP3908082A4 (fr) * 2019-01-04 2022-03-09 Haier Smart Home Co., Ltd. Système de génération d'ondes électromagnétiques et appareil de chauffage le comprenant
JP2022516295A (ja) * 2019-01-04 2022-02-25 海尓智家股▲フン▼有限公司 電磁波生成システム及び電磁波生成システムを有する加熱装置
US11889610B2 (en) 2019-01-04 2024-01-30 Haier Smart Home Co., Ltd. Electromagnetic wave generating system and heating device with electromagnetic wave generating system
JP2021022432A (ja) * 2019-07-24 2021-02-18 シャープ福山セミコンダクター株式会社 高周波加熱装置
JP7248532B2 (ja) 2019-07-24 2023-03-29 シャープセミコンダクターイノベーション株式会社 高周波加熱装置
CN115996494A (zh) * 2021-10-18 2023-04-21 青岛海尔电冰箱有限公司 用于加热装置的控制方法及加热装置
WO2023166594A1 (fr) * 2022-03-02 2023-09-07 三菱電機株式会社 Dispositif de chauffage diélectrique haute fréquence
JP7415101B1 (ja) * 2022-03-02 2024-01-16 三菱電機株式会社 高周波誘電加熱装置
JP2025508636A (ja) * 2022-03-17 2025-04-04 湖北中烟工業有限責任公司 高周波加熱喫煙具のインピーダンスマッチング方法、装置及び電子機器
JP7774157B2 (ja) 2022-03-17 2025-11-20 湖北中烟工業有限責任公司 高周波加熱喫煙具のインピーダンスマッチング方法、装置及び電子機器
TWI893854B (zh) * 2024-06-20 2025-08-11 國立虎尾科技大學 一種具高週波電流同調裝置的控制熱加工系統及該裝置

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