WO2018108191A1 - Procédé de création de plasma dans une buse à plasma sous pression atmosphérique et régulation des intensités e et h du champ électromagnétique et transfert et régulation du flux de puissance active à partir d'une source haute fréquence dans le plasma du plasma de buse et son dispositif de mise en œuvre - Google Patents

Procédé de création de plasma dans une buse à plasma sous pression atmosphérique et régulation des intensités e et h du champ électromagnétique et transfert et régulation du flux de puissance active à partir d'une source haute fréquence dans le plasma du plasma de buse et son dispositif de mise en œuvre Download PDF

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WO2018108191A1
WO2018108191A1 PCT/CZ2017/050060 CZ2017050060W WO2018108191A1 WO 2018108191 A1 WO2018108191 A1 WO 2018108191A1 CZ 2017050060 W CZ2017050060 W CZ 2017050060W WO 2018108191 A1 WO2018108191 A1 WO 2018108191A1
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plasma
space
frequency
electromagnetic field
resonant
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Milos Klima
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Masarykova Univerzita
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Masarykova Univerzita
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/54—Plasma accelerators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the invention relates to a method of regulation of E and H intensities of electromagnetic field and transfer and regulation of active power flow from at least one high frequency source or 3-300 MHz periodic signal mixer into plasma, at a state of minimum magnitude of power reflected back to a high frequency source of at least one plasma nozzle, wherein a specific active power flow density is converted / consumed into desired physical and chemical processes, and a method of generating plasma under atmospheric pressure in said the plasma nozzle by mutual interacting of a high frequency electromagnetic field generated by elements of a resonant circuit with spaced parameters located on the body of the plasma nozzle.
  • the invention also relates to a device for regulating the E and H intensities of electromagnetic field and for transmitting and regulating the active power flow from at least one high frequency source or a 3-300 MHz periodic signal mixer into plasma, at a state of minimum size of power reflected back to a high frequency source, at least one plasma nozzle, and further a device for generating plasma under atmospheric pressure comprising at least one plasma nozzle formed by a hollow body and flowing through a working medium on which a resonant circuit with spaced parameters for achieving the minimum size of power reflected back to the high frequency source and for plasma forming is located, wherein the generated plasma is a spatial component of this resonant circuit.
  • Discharge plasma is very variable with respect to the way of technical acquisition (by an electromagnetic field with a frequency of the order of 0 Hz - 10 11 Hz), both in its characteristics and in the technical solution of its own plasma source. Further characterization of the formal plasma division can be based, for example, on the pressure conditions of a working gas from which the plasma is formed.
  • the plasma is divided into low-pressure (i.e., produced under a pressure lower than atmospheric pressure) and high-pressure (i.e., produced under a pressure higher or equal to atmospheric pressure).
  • the discharge plasma can be divided into direct current (DC), low frequency and high frequency plasma (which can be further divided into radiofrequency and microwave).
  • Some typological plasma divisions have been historically created during the study of DC discharge (e.g., corona, glow discharge, arc) and are accurately linked to a certain volt-amperage characteristics dependence of the discharge. These typological divisions are also often used for discharges obtained from alternating electromagnetic field plasma sources, where they are, however, similar only in visual manner and may sometimes have a similar volt-amperage characteristic of the discharge. In the given cases, the excitation of plasma (discharge) by the alternating electromagnetic field uses the attribute "low-frequency” or "high-frequency” (radiofrequency, microwave).
  • the first of the above mentioned uses a high-intensity electric field (at a minor magnetic field strength), moving in the plasma column, typically in the order of 10 4 V/m and more in air or nitrogen, and of the order of 1 0 3 V/m and more in argon (at the cathode surface near the surface of the electrode, the intensity of the electric field can reach values of up to 5.1 0 5 V/m for air or nitrogen) produced by at least one high-voltage high-frequency electrode with a characteristic electrical capacity relative to its environment (the so-called single-pole discharge - e.g.
  • Trunecek V. The Highfrequency Corona, The Torch Discharge and The Torch Arc, FOLIA Mathematica- Physica, 6, 2, University J.Ev.Purkyne Brno (CZ), 1965, p.1-29 or J. Janca, Czech J. Phys. B 17 (1967), p.761 or J.Janca, M. Klima, P. Slavicek, L Zajfckova: On the Hollow Electrode HF Plasma Pencil, In Proceedings of ICPIG XIV. Warszaw (Poland), 1999, 177-178 or Patent EP 1 077021 , from y.
  • Boisse-Laporte Study of Gas Heating by a Microwave Plasma Torch, Journal of Modern Physics, 2012, 3, 1603-1615 describing the microwave type of the single-pole discharge (harmonic signal at 2.45 GHz frequency) under atmospheric pressure and the creation of a spatial distribution model of the specific density of the active power flow (i.e., the time-mean values of the power flow density per area unit, i.e., the values of the real part of the complex Poynting vector) around the excitation electrode, its immediate surroundings and plasma.
  • the specific density of the active power flow i.e., the time-mean values of the power flow density per area unit, i.e., the values of the real part of the complex Poynting vector
  • the second generally known method of generating a discharge is based on a high-frequency electromagnetic field with a majority size of magnetic field intensity - typically in the range of 10 3 -10 4 A/m (at a minority size of electric field intensity that is typically only in the order of 1 0 2 V/m) which is most often formed by a solenoid-like spool whose axis passes through a discharge space separated from the coil through the axis of which passes the discharge space separated from the coil by a dielectric wall through which the working gas flows (most often argon, but possible are also other gases or mixtures thereof, or impurities of active substances).
  • ICP inductively coupling plasma
  • the E-mode is associated with low power generation plasma where the current in the coil reaches only 10° A and the plasma is generated by an electromagnetic field with a magnetic field intensity in the order of only 1 0 2 A/m, wherein the intensity of the electric field is comparable - also 10 2 V/m.
  • plasma is characterized in the concentration of free electrons of the order of 10 16 /m 3 .
  • the H-mode arises at higher powers from a high-frequency source where the current in the coil typically reaches more than 10 A (typically in the order of 1 0 1 -10 3 A), wherein the intensity of the magnetic field (in the order of 10 3 -10 4 A/m) significantly exceeds the magnitude of electric field intensity (still in the order of 1 0 2 V/m) and the plasma is characterized in a step-changing electron concentration in the order of up to 10 18 -1 0 19 /m 3 .
  • the publication also provides an example of a typical substitutional electrical circuit diagram of an impedance adaptation member including a simplified substitutional plasma scheme for both modes.
  • an E-mode When starting a discharge under the H-mode conditions, an E-mode always occurs first, which quickly passes into the H-mode, both under low pressures (e.g. Y. Miyoshi, Z. Lj. Petrovic ' , and T. Makabe: IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 30, NO. 1, 2002, 130-131), as well as under atmospheric pressure (e.g. M. Abdur Razzak, Kenji Kondo, Yoshihiko Uesugi, Noriyasu Ohno, and Shuichi Takamura: JOURNAL OF APPLIED PHYSICS, VOLUME 95, NUMBER 2, 2004, 427- 433).
  • low pressures e.g. Y. Miyoshi, Z. Lj. Petrovic ' , and T. Makabe: IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 30, NO. 1, 2002, 130-131
  • atmospheric pressure e.g. M. Abdur Razzak, Kenji K
  • the maximum amplitude of the magnetic field value reaches about 4.1 0 3 A/m for the given conditions, and the maximum electric field amplitude value is only 1 .10 3 V/m.
  • the authors did not model the electromagnetic field outside the plasma around the coil threads, and treat the plasma generated by them as isothermal (i.e. the neutral gas temperature in the discharge is the same as the free electron temperature - the maximum of more than 9000 K).
  • the W-mode In this type of discharge, an electromagnetic wave is generated in the discharge chamber under low pressure, the wave generates plasma in the so-called W-mode (the name is from the term "wave").
  • W-mode is characterized in a slightly lower or comparable intensity of the magnetic field (typically in the range of 10 3 to 1 .5.10 4 A/m), but with a comparable or higher concentration of free electrons - up to 10 19 /m 3 .
  • the helical resonator consists of a solenoid surrounded by a square or cylindrical conductive shield, wherein one end of the spiral being connected to the shield and the other end being left open.
  • a coaxial cable is connected to the bottom of the coil (typically the first thread above the conductive shield connection point) from a high frequency source (a harmonic signal at a frequency of 3-30 MHz, power up to 5 kW, output impedance 50 ⁇ ), wherein the connection point can tune the circuit impedance matching.
  • a high frequency source a harmonic signal at a frequency of 3-30 MHz, power up to 5 kW, output impedance 50 ⁇
  • the connection point can tune the circuit impedance matching.
  • the helical resonator is also well known from literature of the field of electrical circuit filters, where it is used for a harmonic signal from the frequencies of tens of MHz to more than 1 GHz and may have different configurations (e.g. Patent CZ 269246 from yr. 1990 or J.Danes et ai: Amaterska radiotechnika a elektronika, vol. n. 4, Nase vojsko, 1989, pp. 34-36, ISBN 80-206-0082-5 etc.).
  • the solenoid-shaped coil here also acts as a retardant structure of electromagnetic wave propagation by the resonator.
  • a solenoid-shaped coil as a retardant structure of electromagnetic wave propagation through space is also used in other cases such as, e.g., in the invention, CZ 1 68447 (1 977), where it is used as microwave delay structures to more efficient heating of the plasma in Tokamak (at low pressures), or, e.g., it constitutes the essence of a Permaktron device (vacuum tube) function.
  • CZ 1 68447 (1 977
  • Other types of retardant structures are known, e.g., from the Karcinotron device, planar and cylindrical Magnetron etc. In these cases, the retarded electromagnetic wave does not interact with the plasma but with the electron beam under vacuum (vacuum tubes).
  • the retardant structures enable the concentration of a high-frequency electromagnetic wave in the volume of space of up to hundreds of times smaller than is the wavelength in the open space.
  • These retardant structures are commonly generated in only one direction of propagation of the electromagnetic wave, which they transform into the so-called polyharmonic electromagnetic wave (i.e. an electromagnetic wave with spatial harmonics).
  • the periodicity of the boundary conditions on the periodic retardant structure leads to the deformation of the originally harmonic distribution of the electromagnetic field (typically in the longitudinal direction) and thus to the generation of spatial harmonic waves.
  • For partial progressive or backward harmonic wave applies, that with the increasing number of spatial harmonics the phase velocity decreases and at the same time the wavelength is reduced while maintaining the original frequency of the electromagnetic wave.
  • the group velocity of the electromagnetic wave is in the retarding structure identical for all partial spatial harmonics.
  • the phase velocity of the partial spatial harmonics may be in a conforming or non-conforming direction with respect to the group velocity; in case of the nonconforming direction, these are return electromagnetic waves.
  • AKacpbeea HempaduuuoHHoe npuMenenue 3aMednmouj,u cucmeM, >KypHan paduosneKmpoHUKu, N Q 6, 2013, 9) in detail describes, both in terms of theoretical and practical usage, multiple variants of retarding structures of the type of flat spirals, periodic structures of the meander or solenoid type and their coupling interconnections, the so-called coupled retarding structures (parallel or coaxial arrangements, "mirror” arrangements or phase or contra-phase connection) that allow for achieving a significantly higher electromagnetic wave retardation than would be achieved by only individual separate retarding structures.
  • connection of bonded retarding structures in phase or contra-phase allows for, among other things, regulation of intensity distribution of the electromagnetic field E and H components in the space bounded by the bonded retarding structures and in the space outside these retarding structures, where in one part of the space very significantly exceeds the propagation of the so-called E-waves above the so-called H-waves, and in the other part of the space contra wise, depending on whether it is phase or contra-phase.
  • the advantage of these arrangements is the possibility of using retarding structures in addition to microwaves even in the radio frequency domains with a harmonic signal frequency in the order of tens of MHz, wherein the electromagnetic wave retardation is for some types and connections of the bonded retarding structures even more pronounced (e.g.
  • the retarding structure can be induced to spatially localized radiation by placing a material/environment with higher permeability near the surface of the conductors of the retarding structure so that a small gap remains between them and the surface of the conductors of the retarding structure.
  • the plasma nozzle is formed by a cylindrical resonator, in the axis of which is located a moulded dielectric rod on which the solenoid retarding structure is wound (also possible is a variant with a bonded double solenoid with mutually opposite winding).
  • a working gas flows through the space between the threads of the solenoid and the conductive coating of the inner side of the cylindrical resonator.
  • the retarding structure of the solenoid is connected on one end to the coaxial high-frequency power supply cable and open on the other end, wherein its entire length is within the cylindrical resonator. The discharge is to occur in the space between the threading of the solenoid retarding structure and the cylindrical resonator shading coating.
  • the inner side of the cylindrical resonator coating can be covered with a dielectric for more stable plasma burning.
  • the publication presents a concrete example of the geometrical arrangement of the plasma nozzle and of the parameters of the retarding structure of the solenoid (length of the retarding structure 100 mm, solenoid winding diameter 8 mm, winding step 5 mm, i.e. 20 threads, inner diameter of the cylindrical resonator 10 mm, etc.), wherein for these values the author indicates a retardation of the electromagnetic wave 1 8times and a maximum suitable harmonic signal frequency of a high-frequency electromagnetic field, which is 150 MHz or lower (27 MHz for example) for the system given.
  • Another drawback in the publication of the proposed solution of the plasma nozzle design is that the device does not contain any control element of the impedance adaptation of the line from the high-frequency generator to the plasma in order to achieve the minimum amount of power reflected back to the high-frequency source, not even on the plasma nozzle, nor in its own line before the plasma nozzle, as the plasma impedance under atmospheric pressure is significantly different from the impedance of the high-frequency source output (standard 50 ⁇ ).
  • the possibility of controlling the impedance matching is also required for various conditions of discharge burning in a plasma nozzle, choice of working gas or admixtures, as well as plasma treatment of the surface of various materials (metal vs. dielectric) which may significantly influence the impedance of the discharge or of the whole electrical circuit.
  • the solution proposed in the said publication does not take this requirement into consideration, which is important from a practical point of view in the device application.
  • the solution of the plasma nozzle with a retarding structure proposed in the publication uses only the discharge space between the outer surface of the metallic threads of the retarding structure and the inner metal wall of the cylindrical resonator (which can be even with a dielectric) to burn the plasma.
  • the discharge burning in the narrow space between the high voltage metal threads and the metal wall of the grounded resonator shading i.e., associated with the relative reference electrical potential
  • Capacitance-induced discharges i.e., discharges generated at a high electric field intensity with a minor magnetic field intensity
  • inductively induced discharges i.e., discharges produced at a high magnetic field intensity with a minor electric field intensity
  • Both methods of creating plasma typically use a common configuration scheme of the route of conducting high-frequency electromagnetic energy from a high- frequency source to a plasma chamber for the harmonic signal at frequencies of 3- 300 MHz.
  • High-frequency sources of commercial production have standardized output of up to 50 ⁇ .
  • plasma typically has a very different impedance (some types of high-frequency discharges under atmospheric pressure have an impedance of the order of up to 10 3 -1 0 4 ⁇ ). For this reason, for the impedance adaptation of the whole route line between the high-frequency source and the plasma (i.e., to achieve the minimum amount of power reflected back to the high-frequency source), it is necessary to include an impedance matching member (i.e.
  • the impedance matching member consists of a tenable resonant circuit of different configurations, according to the need for transformation to the impedance of a particular high-frequency discharge and a type of plasma excitation.
  • the impedance matching member is always external relative to the discharge space, where plasma is created, and thus does not participate, with its resonant circuit elements, directly on plasma generation. Also in the given cases (with the exception of the creation of plasma using the so-called low-pressure helical resonator), these are always circuits with concentrated parameters.
  • the circuits include an element with distributed parameters, which is typically only a line, e.g., a coaxial cable of the corresponding length, i.e., an element not participating in plasma generation, but only feeding high-frequency electromagnetic energy from the high-frequency source to the impedance adaptation member, sometimes also from the output thereof to the electrodes.
  • a route line e.g. waveguide is a line with spread parameters and can be used directly as an element to generate electrode-free microwave plasma (typically under low pressures).
  • Application PV 2012-935 describes a method of creating plasma under atmospheric pressure in a slot nozzle in which a stream of working gas flowing through a slotted nozzle is acted upon by a high frequency electromagnetic field (i.e. at a harmonic signal frequency of 3-300 MHz) generated and formed by at least one high- voltage high-frequency electrode dielectrically separated from the cavity of the slot and at least by one ground electrode (i.e., electrically and high frequency connected to the reference electrical potential relative electrode).
  • the slot plasma nozzle creates a high frequency discharge under atmospheric pressure inside the nozzle through which atomic argon gas flows, either pure or enriched with at least one additive (gas, aerosol, dust particles, loose particles), at different geometry of the nozzle cavity.
  • the very principle of initialization and subsequent generation of the discharge within the slot nozzle is based on the use of the backward-binding behaviour of plasma after the primary discharge is created, which is achieved by pre-ionization of the environment at the mouth of the slot nozzle by means of a high-voltage discharge lighter with a short-term spark or arc.
  • the primary local discharge will extend into the full length of the slot from the point of origin thereof, depending on the power supplied and other conditions.
  • the discharge thus formed over the entire length of the slot is then conveyed from the slot to the outer environment by a stream of argon.
  • the discharge outside the slot is still briefly generated (on a path of about 10-15 mm) actively generated (binds to the characteristic electrical capacity of the environment) and further gradually dies down.
  • High-frequency plasma is in the case of a plasma nozzle a standard example of capacitance-induced discharges (i.e., discharges created at high-intensity of the electric field with minor magnetic field intensity).
  • the plasma was generated on a 13.56 MHz harmonic signal frequency.
  • the impedance matching member i.e., the element for achieving the minimum size of the power reflected back to the high-frequency source
  • the impedance matching member is made up of a ⁇ -element with tenable input capacitance, fixed output capacitance and tenable inductance.
  • a high- voltage high-frequency plasma electrode of the plasma nozzle is connected to the high-voltage coil output by a stripline.
  • the second, grounded electrode (i.e., electrically and high-frequency connected to the reference electrical potential) of the plasma nozzle is connected to grounded shield body (i.e., the relative reference electrical potential) of the impedance matching member.
  • This impedance matching member is always external to the discharge space where the plasma is generated, and therefore does not participate with its sub-components (i.e., coils and capacitors) directly on plasma generation (is not an electrode).
  • An object of the present invention is to improve the known solution, especially in terms of the possibility of machining large substrate areas with a single compact device of smaller dimensions capable of providing high efficiency and surface homogeneity of plasma while at the same time creating the possibility of targeted local regulation of the required physical and chemical processes in plasma inside and/or outside the plasma nozzle leading to the formation or modification of substances in a solid, liquid or gaseous state.
  • Another object of the present invention is to overcome the existing drawbacks of the state of the art plasma generation processes in plasma jets in terms of the principal limitation of individual discharge types in the transmission and control of the active power flow from the high-frequency 3-300 MHz harmonic signal source into plasma under the impedance adaptation state into a high-frequency source), both in capacitance-induced discharges (minimum volume of the power reflected back to the high-frequency source), both in capacitively excited discharges (i.e.
  • discharges created under a high intensity of the electric field with a minor magnitude of the magnetic field intensity as well as in inductively excited discharges (i.e., discharges created under a high intensity of the magnetic field with a minor magnitude of the electric field intensity), given by the existence of always minor values in the second component of the high-frequency electromagnetic field intensities and by the impossibility of targeted local regulation of the active power flow density into plasma and with that connected achieving the desired physical and chemical processes in plasma within and/or outside the plasma nozzle.
  • the object of the invention is achieved and said drawbacks are eliminated by a method of controlling E and H intensities of an electromagnetic field and by transferring and controlling an active power flow from at least one high-frequency source and/or a 3-300 MHz periodic signal mixer into plasma, with a minimum magnitude of power reflected back to the high-frequency source of at least one plasma nozzle through which a working medium flows, wherein the active power flow specific density is converted into/consumed by desired physical and chemical processes and reactions, wherein a formation or modification of solid, liquid or gaseous state substances occurs within the plasma inside and/or outside the plasma nozzle, the essence of which is that the transmission of high-frequency electromagnetic energy is generated and controlled by means of a spatially arranged set of distributed resonant circuitry with spread parameters in the presence of plasma, shaping space of which, or a portion of which, is located within a space geometrically defined by a complete set of resonant circuitry with spread parameters, wherein the transmission of high-frequency electromagnetic energy is also controlled by means of a spatial distribution control unit of the
  • the transmission of the high-frequency electromagnetic energy is generated and regulated by a spatially arranged resonant circuitry with spread parameters in the presence of plasma and further regulated by an electromagnetic field spatial distribution control element, wherein by regulation thereof, a state of a minimum amount of power reflected back to the high-frequency source as well as forming of distribution of the electromagnetic field components described by electrical and magnetic intensities E and H and form that resulting active power density flow in each part of the plasma volume are achieved.
  • Dispersion characteristic may be normal (phase velocity decrease at increasing frequency - group speed will always be lower than phase velocity) or anomalous (increase in phase velocity at increasing frequency - group speed will always be higher phase velocity), wherein a transition between both types of dispersion characteristics can be achieved using the dispersion characteristics elements of regulation of the spatial distribution of the electromagnetic field.
  • elements of regulation of the spatial distribution of the electromagnetic field it is possible to regulate even the course of the dispersion characteristic and its slope. The steeper the dispersion characteristic of the retarding structure, the more distinct the differences in phase and group velocities between the individual harmonic periodic signals across the full range of its frequency spectrum.
  • processes can be considered for the case of a polyharmonic electromagnetic wave system, where fundamental and higher spatial harmonics are created on the periodic retarding structure for an individual harmonic periodic signal in the full range of its frequency spectrum.
  • fundamental and higher spatial harmonics are created on the periodic retarding structure for an individual harmonic periodic signal in the full range of its frequency spectrum.
  • higher concentrations of high-frequency energy are generated in the space defined by the retarding structure and in its vicinity.
  • the periodic signal it is generally possible for the periodic signal to expect different phase velocities of the harmonic components of the periodic signal in the full range of its frequency spectrum and a formation of different phase velocities of the partial spatial harmonics of the polyharmonic electromagnetic waves system, and thus a formation of conditions of a nonlinear environment, resp. physical instabilities in the environment that lead to the formation of local (distributed) resonant regions in the area of the spatially arranged resonant circuitry system of a with spread parameters in the presence of plasma.
  • the term "local/distributed resonance region system”, as used herein, includes generalized resonance phenomena - based on frequency electromagnetic resonance (between electrical elements or parts of resonant circuit elements including distributed spectra including plasma), and parametric electromagnetic resonance (phenomena arising on a periodic retarding structure), and further includes electromagnetic bonding based phenomena which cause an intense interaction between the partial slowed electromagnetic wave and the moving free electrons in plasma, which have a velocity near the phase velocity of the partial retarded electromagnetic wave.
  • the local/distributed resonance region system of a spatially arranged system of resonant circuitry with distributed parameters in the presence of plasma may be used to achieve spatial regulation and an increase in the active power density flow entering at least one portion of plasma and/or generated in at least one portion of the plasma volume.
  • the local/distributed resonance region system is created on the elements or parts thereof of a resonant circuitry system elements with spread parameters and in the volume of plasma to create conditions of different phase velocities of individual harmonics of the periodic signal over the full range of the frequency spectrum thereof (frequency resonance) and/or different phase velocities of the spatial harmonics formed on the spatial periodic retarding structure for individual harmonics of a periodic signal in the full range of the frequency spectrum thereof (parametric resonance).
  • the local/distributed resonance region system may be also preferably used to achieve regulation of the course of plasma and/or changes in plasma processes and reactions by altering plasma oscillations in the local and/or spatially distributed regions of plasma.
  • Oscillations in plasma are determined by the dielectric constant tensor of plasma and from that resulting dispersion relations.
  • plasma isotropic, without external magnetic field, cold
  • there may be two basic types of oscillations given by different dispersion relations - one of them corresponds to electromagnetic waves polarized in the perpendicular direction of their propagation (the so-called electromagnetic inherent oscillations of plasma) and the second dispersion relation corresponds to waves of potential electrical oscillations in which the electric field has a direction along the wave vector and does not produce a magnetic field (oscillations have the character of standing waves).
  • the plasma may be characterized in the so-called plasma frequency corresponding to the potential plasma inherent oscillations, which is characterized in a direct proportion to the square root of the free electron concentration in plasma.
  • the actually created discharge plasma e.g. in the plasma nozzle
  • it is possible to achieve an energy transfer between the external electromagnetic field and the oscillations of free electrons in the plasma by a suitably selected frequency of the external electromagnetic field and/or by a suitably selected phase velocity of the electromagnetic waves, or by a combination of both processes.
  • these "resonant electrons” will be subjected to the electric field of a partial slowed electromagnetic wave, and thus an effective energy exchange may occur.
  • Amplification of the intrinsic plasma oscillations (or amplification of the external electromagnetic wave) will be achieved if the phase velocity of the partial retarded electromagnetic wave is slightly lower than the speed of "resonant electrons" which pass part of their kinetic energy to the electromagnetic wave.
  • the object of the invention is also achieved by a method of creating plasma under atmospheric pressure in at least one plasma nozzle formed by a hollow body of general geometry, through which a working medium flows, and connected to at least one high-frequency source and/or a 3-300 MHz periodic signal mixer, the essence of which is that prior to plasma ignition, using the spatially arranged resonant circuitry system with distributed parameters and with a spatial distribution control member of the electromagnetic field and active power density flow in the shaping space, a spatial distribution of the electromagnetic field determined by the intensities of the electric field E and the magnetic field H is created, wherein in at least one part of at least one discharge space, at low active power flow density, local high energy density of the electromagnetic field is generated, which results in plasma ignition in at least one discharge space through which a working medium flows, and subsequent change in the spatial distribution of the electromagnetic field both in the shaping space, and in at least one discharge space at maximum density of the active power flow directed into plasma at a minimum power reflected back to the high-frequency source, whereupon the plasma is regulated by the action of
  • a higher retardation of the phase and group velocity of the periodic signal throughout the full range of its frequency spectrum to a spatial retarding structure with a fixed or variable dispersion characteristic, thereby creating an enhanced local increase in the energy density of the electromagnetic field in the shaping space which results in ignition of the plasma in at least one discharge space through which the working medium flows.
  • At least one additive in the form of a gas or aerosol or dust or finely divided particulate matter or solid, is introduced into the working medium and/or into the local portion of the high-frequency plasma stream inside and/or outside at least one discharge space.
  • atomic gas or atomic gas with an additive flows through the discharge space.
  • the object of the invention is also achieved by a device for carrying out a method the essence of which is characterized in that the resonant circuit with distributed parameters comprises at least one electromagnetic wave retarding structure and at least one resonant structure/system and a resonator formed by a shading shield of the space (x) geometrically defined by the resonant circuit system, wherein it further comprises at least one shaping space within the space (x), wherein the shaping space extends, in its entirety or partially, into at least one discharge space through which the working medium flows, and further comprises plasma, wherein the resonant circuit is provided with at least one element regulating the spatial distribution of the electromagnetic field and active power flow density, which is arranged on at least one plasma nozzle.
  • a preferred embodiment of the device for carrying out the method according to the paragraph above is further based on the fact that the electromagnetic wave retarding structure is located within the resonator and is formed by a coil or system of coils and/or control elements, wherein the retarding structure and the resonant structure may be mutually identical.
  • the spatial retarding structure comprises a system of at least two retarding structures that will be coupled into a parallel or coaxial arrangement or into a "mirror" arrangement in phase or contra-phase engagement, thereby allowing a significantly higher retardation of electromagnetic waves than would be achieved by individual separate retarding structures.
  • the shaping space extends with a part thereof into the space outside the plasma nozzle, to the places where the plasma treatment of materials occurs.
  • the moulding space extends with a part thereof into the space with additional devices, thereby regulating the dosing of additives into the working medium and/or plasma and their subsequent reactions in the plasma.
  • the object of the invention is also achieved by a preferred design of a device creating plasma under atmospheric pressure in at least one plasma nozzle formed by a hollow body based on the fact that a resonant circuit with spread parameters for achieving the minimum power reflected back to the high-frequency source is placed on the hollow body of the plasma nozzles and is constituted by a system comprising a resonant structure which is identical to the electromagnetic wave retarding structure consisting of a resonant coil or a coil system of a tenable inductance Li, in a mutual inductance bond Mi, with a tenable intermodal capacitance Cmi, a tenable lead capacitance Csi and a loss resistance Ri, further of a pair of a high-voltage high- frequency electrode and a low-voltage high-frequency electrode, wherein at least one portion of the winding, thread/half of the winding thread or the tapping of the resonant coil winding constitutes a high-voltage high-frequency electrode and/or a low-volt
  • the proposed solution has the advantage that it greatly simplifies the design of the plasma nozzle and reduces the overall dimensions and weight of the device by using directly the resonant circuit elements for achieving minimum magnitude of the power reflected back to the high-frequency source for generating plasma and therefore no separate external adaptation element to reduce the power reflected back to the high-frequency source and a separate plasma nozzle connected thereto is necessary.
  • the resonant coil according to the preceding paragraph is a spatial coil or planar coil or a combination thereof or it consists of several coils of at least one winding thread which are arranged serially or parallelly or in a combination of serial and in parallel arrangement and have a common inductive bond Mi.
  • the resonant coil winding threads are solid or flexible, formed by a strip or a knitted wire, or formed by a conductive layer applied on a dielectric carrier, wherein the threads are oriented flat or perpendicularly relative to the discharge space or are rotatable.
  • a preferred solution of the electrode arrangement is based on the fact, that at least one electrode of at least one pair of a high-voltage high-frequency electrode and a low-voltage high- frequency electrode is formed by at least one portion of winding, thread or half winding thread or tapping of the resonant coil winding and is part of its high-voltage portion, wherein the high-voltage high-frequency electrode is generally at a higher potential and the low-voltage high-frequency electrode is generally at a lower potential, or they have the same potential and are disposed in a proximity of the dielectric wall of the discharge space and have the orientation of the flat or perpendicular conductor or at an angle with respect to the discharge space and can be arranged only from one side of the discharge space, wherein they can be arranged only from one side of the discharge space, namely parallelly one after another or at an angle with respect to the working gas flow direction through the discharge space or may be arbitrari
  • the proposed solution has the advantage of simplifying the design of the plasma nozzle by using directly the threads or their parts of the resonant coil (resp. the retarding structure) to generate plasma, and the use of specially inserted separate electrodes is not required.
  • the main advantage is the fact that the proposed solution makes it possible to combine the shaping of the electromagnetic field in the shaping and discharge space simultaneously with the generation of plasma.
  • One of the specific solutions of the geometric arrangement of the electrodes according to the preceding paragraph is the use of only one pair of a high-voltage high- frequency electrode and a low-voltage high-frequency electrode which are at the same electrical potential and are simultaneously arranged over the discharge space.
  • the pair of electrodes opposite each other must be moved in the direction of the working gas flow through the discharge space to fulfil the condition of their appropriate spatial arrangement to ensure the direction of propagation/shaping of plasma during its formation and to maintain its stability in its continuous burning and movement (i.e. flow dynamics).
  • Another specific solution of the geometric arrangement of the electrodes is based on the fact, that at least one pair of a high-voltage high-frequency electrode and a low-voltage high-frequency electrode consists of at least two consecutive threads or half of threads or their parts constituting a resonant coil winding and/or consists of two different parts of the resonant coil winding system with significantly different electrical potential.
  • the advantage of the proposed solution is that the consecutive coils of the resonant coil windings have a different electrical potential and thus provide a suitable spatial arrangement of the electrodes to ensure the direction of propagation/shaping of plasma during its formation and to maintain its stability during its continuous burning and movement (flow dynamics).
  • the electromagnetic wave in the shaping and discharge space allows the electromagnetic wave in the shaping and discharge space to slow down in order to achieve active power transfer regulation in each part of plasma and thus to effect plasma processes (e.g. increasing the absorption of the high-frequency electromagnetic energy in a volume unit, increasing the concentration of charged particles in the volume unit, achieving a higher kinetic energy/temperature of free electrons resulting in highlighting the non-isothermic character of plasma, etc.).
  • the low-voltage high-frequency electrode is grounded (i.e. electrically and high-frequency connected to the relative electrode of the reference electrical potential) and is formed by a fixed or flexible conductor or conductors oriented at an angle with respect to the discharge space, or the low-voltage high- frequency electrode consists of at least one circular conductor or consists of at least one portion of a grounded shield (connected with the reference electrical potential) of the plasma nozzle shield, wherein the shading shield member has a fixed or variable distance and/or inclination with respect the discharge space.
  • Another specific solution of the geometric arrangement of the electrodes is based on the fact, that the high-voltage high-frequency electrode or low-voltage high- frequency electrode are placed - arranged in their entirety or at least partially within the discharge space and are in contact with plasma.
  • the advantage of this solution is the ability to sputter the electrode material in contact with plasma for the purpose of deposition of metallic nanolayers on the surface of the materials or in connection with the purpose of obtaining special products of plasma-chemical processes.
  • Transmission of high-frequency electromagnetic energy is also controlled by means of the spatial distribution of the electromagnetic field control element, when the regulation thereof causes the state of minimum power reflected back to the high- frequency source as well as forming the distribution of the electromagnetic field components described by the electrical and magnetic intensities E and H and the active power density flow in each part of the plasma volume.
  • This element of the electromagnetic field spatial distribution in the space (x) can preferably consist of its own fixed spatial geometry arrangement and of the arrangement of the threads or parts of the winding threads of the resonant coil with respect to the at least one shaping space and the discharge space.
  • the fixed setting method determines the subsequent parameters of the electromagnetic field and the plasma parameters and is therefore the simplest type of the control element.
  • the element regulating the spatial distribution of the electromagnetic field in the space (x) consists of at least one element (f) for tilting or rotating all or a selected number of conductors constituting individual winding threads and/or a half of the winding threads or a portion thereof and/or consist of an element (f) for unidirectional or bi-directional bending of all or a selected number of conductors constituting individual winding threads and/or a half of the of the winding threads or a portion thereof and/or consists of an element (f) for varying the distance between the wires of all or a selected number of individual winding threads and/or a half of the winding threads or a portion thereof.
  • the element regulating the spatial distribution of the electromagnetic field in the space (x) is formed by at least one element (k) of controlling the distance between at least one resonant coil winding thread and/or a half of the resonant coil winding thread or a part of the resonant coil winding thread and at least one discharge space.
  • Another possible advantageous embodiment of the regulation of the spatial distribution of the electromagnetic field in the space (x) and the function thereof is based on the fact that it consists of at least one element (g) regulating the mutual inductive bonds between the coils forming the resonant coil, comprising two different elements (ga) and (gb) which are mutually dependent or independent, wherein the element (ga) determines the mutual position of the coils while the element (gb) is formed by the magnetic circuit common to the electrical coils forming the resonant coil, the individual parts and/or magnetic circuit in its entirety of which alters its spatial position relative to these coils.
  • the element (g) regulating the mutual inductive bonds can be further comprised of at least one part of the resonant coil which is insertable and/or pivoted by the winding threads into at least one of the spaces (xa, xb, xc), wherein at least one thread, and/or a half of the threads and/or a portion thereof is surface-treated with at least one layer of material having a different permeability than the resonant coil winding and/or a different permittivity than the space environment (xa, xb, xc).
  • the element regulating the spatial distribution of the electromagnetic field in the space (x) may also be formed by at least one part of the shading shield portion or by the whole shield, which is movable arranged relative to the winding threads, half of the winding threads or only part of the resonant coil and/or from at least one high-voltage high-frequency electrode, low-voltage high-frequency electrode and/or from the discharge space.
  • the element regulating the spatial distribution of the electromagnetic field in the space (x) may also be placed or inserted or rotated in the space (xa) between the winding threads of the resonant coil and the grounded shading shield (connected to the reference electrical potential) or in the space (xb) delimited by a resonant coil winding threads, or in the space (xc) between at least one pair of adjacent threads or halves of threads or winding parts thereof of a resonant coil, wherein the regulating element has a periodic or aperiodic shape according to mathematical functions or is formed according to the resonant coil geometric arrangement or other resonant circuit elements with spread parameters.
  • the element regulating the spatial distribution of the electromagnetic field in the space (x) may also be formed by a metal or a system comprising layers or spatially delimited portions of the metal layers and/or of a high permeability and/or high permittivity material, or the element may be formed by a high permittivity and/or permeability material, may be formed by a thin layer of a material or only by the material itself of high permittivity and/or permeability of various thicknesses varying according to any mathematical function, may be formed by a thin layer of material or only by the material itself having a spatially different permittivity and/or permeability value which can be changed on the area or in the volume of the element generally according to any mathematical function.
  • the element regulating the spatial distribution of the electromagnetic field in the space (x) may also be formed by a metal material of different electrical potential relative to the individual resonant circuit elements with spread parameters. Then, the spatial positioning of the control element within the space (x) allows the spatial distribution of the electromagnetic field to be altered both in the shaping and discharge space.
  • the element regulating the spatial distribution of the electromagnetic field in the space (x) comprises at least one other element (h), wherein the element (h) is formed by apertures and/or slots and/or grooves or projections of geometry and spatial distribution, according to any mathematical function, wherein the element (h) is of variable geometry and variable spatial layout.
  • the element (h) preferably comprises at least one element (ha) and/or (hb), wherein the element (ha) is formed by or comprises at least one material/layer with different permeability, and the element (hb) is formed by a conductive coating of different conductivity with respect to the regulation element.
  • the eddy current regulation retroactively regulates spatial distribution of the electromagnetic field in the shaping and discharge space and consequently influences processes in plasma (e.g. the kinetic energy of free electrons and consequently precipitation processes in plasma associated therewith, the concentration of free charge carriers in the volume unit, the amount of the radio frequency electromagnetic energy absorption in volume unit, etc.).
  • the element regulating the spatial distribution of the electromagnetic field in the space (x) may be a retarding structure of the electromagnetic wave, in the sense that a high permittivity and/or permeability material is used or in the sense of a spatial periodic conductive structure such as, e.g., the resonant coil, the shading shield (resonator walls), etc. From the very nature of the principle of the retarding structure, it is clear that the retarding structure regulates the spatial distribution of the electromagnetic field in the space (x).
  • a handle or a corresponding mechanical element for mechanical connection of the chamber and the supporting element of the robotic mechanism may advantageously be assigned to at least one plasma nozzle.
  • the solution according to the present invention allows to achieve the desired physical and chemical processes and reactions in the plasma and to regulate them spatially, thereby achieving more efficient course thereof and, consequently, more efficient plasma effects in the synthesis or modification of substances in solid, liquid or gaseous state.
  • Increased efficiency effects of plasma, e.g., on the material surface is particularly useful for surface treatments in the industry prior to coating application or modification.
  • Increased spatial regulation of processes in plasma and their "spatial accuracy" is reflected in the quality of plasmachemical depositions of various types of nanomaterials and thin functional layers.
  • the invention also provides for an easy creation of plasma in a plasma nozzle under atmospheric pressure and to achieve in the shaping space and discharge space simultaneous high intensities of the electric E of the magnetic H field, comparable to the values generated by existing plasma devices only for one of the components of the electromagnetic field.
  • This advantage is reflected in changes in plasma properties (concentration of charged particles, temperature distribution of individual plasma components, etc.) and the possibility of their easy regulation within wider ranges than is common with known plasma devices.
  • Plasma generated by the plasma nozzle according to the invention is significantly non-isothermic.
  • Fig. 1 shows a substitution scheme of a real coil for circuits with concentrated parameters
  • Fig. 2 shows a resonant coil in an embodiment of a space coil including the electrodes
  • Fig. 3 shows a resonant coil in an embodiment of a spatial combination of planar coils including electrodes
  • Fig. 4 shows a resonant coil in an embodiment of a combination of a spatial and planar coil including electrodes
  • 5a shows an example of the easiest spatial arrangement of the resonant coil, with all windings being electrodes
  • Fig. 1 shows a substitution scheme of a real coil for circuits with concentrated parameters
  • Fig. 2 shows a resonant coil in an embodiment of a space coil including the electrodes
  • Fig. 3 shows a resonant coil in an embodiment of a spatial combination of planar coils including electrodes
  • Fig. 4 shows a resonant coil in an embodiment of a combination of a spatial and planar coil including electrodes
  • 5a shows an example of
  • 5b shows an example of the spatial arrangement of the resonant coil and the electrodes, wherein the windings threads are electrodes only in the lower high voltage portion of the coil geometry
  • 5c shows a cross-sectional view of the plasma nozzle body as an example of a possible spatial arrangement of resonant circuit elements with spread parameters where the resonant coil of Fig. 5b is used
  • Fig. 6 is a cross-sectional view of the plasma nozzle body as an example of a possible spatial layout of resonant circuit elements with spread parameters where a resonant coil of the embodiment of Fig. 2 is used
  • Fig. 7 illustrates an exemplary arrangement of plasma nozzles within the resonator together with the spatial arrangement of the resonant circuit elements with spread parameters and the electromagnetic field spatial distribution regulation elements and the additional devices for dosing additives.
  • the invention will be further described on several principles and examples of a device for implementing a method of regulating the intensity of the E and H of an electromagnetic field and the transmission and regulation of the active power flow from a high-frequency source of the 3-300 MHz periodic signal to plasma at a minimum state of power reflected back to the high-frequency source of at least a plasma nozzle 1 formed by a hollow body 24 of general geometry and through which a working medium flows, as well as a plasma-forming method under atmospheric pressure in at least one plasma nozzle 1 formed by a hollow body 24 of general geometry through which a working medium flows, and connected to a high-frequency source of the 3- 300MHz periodic signal.
  • the principle and essence of the invention are based on the specific application of the electromagnetic field power equilibrium equation (sometimes referred to as the Poynting theorem) using the processes in the resonant circuit 15 with the spread parameters and processes in plasma 10 of the plasma nozzle 1 which are an integral, spatial component of this resonant circuit 15.
  • the electromagnetic field power equilibrium equation sometimes referred to as the Poynting theorem
  • the energy density (both instant and medium) in the magnetic and electric fields is determined only by the intensities E of the electric and H of the magnetic fields and by the material parameters ⁇ of e permittivity and ⁇ of permeability (generally tensor quantities).
  • Active power flow density is the real part of the complex Poynting vector (i.e. the mean time value of the power flow density per area unit).
  • the active power flow is transmitted from the high-frequency source, at the minimum level of the power reflected back to the high-frequency source.
  • Plasma 10 is an environment with freely moving charges that respond to the electromagnetic field and create it themselves.
  • Distribution and consumption (absorption) of the active power transmitted by the electromagnetic field occurs in plasma 10 mainly through charged particles and their further interactions. This leads to maintaining and/or changing the plasma 10 parameters. Of course, actual losses also occur in the material of the individual design components of the plasma nozzle 1 and the resonant circuit 1 with spread parameters.
  • the components of the electric E and magnetic H field intensities and the resulting instantaneous power ⁇ flow density in each point of the space, resp., the density of the active power flow, can be targeted or controlled by various "inhomogeneous environments" characterized in permittivity ⁇ , permeability ⁇ and conductivity a (generally tensor quantities). This is achieved by using materials of different parameters and geometries and their spatial arrangement in the space (x) geometrically defined by the resonant circuit 15 system with distributed parameters.
  • the resonant circuit 15 system with distributed parameters contains at least one so called retarding structure 19, the phase velocity of the propagation of the high-frequency electromagnetic waves in the selected direction of the space is reduced. This makes it possible to concentrate the energy of high-frequency electromagnetic waves in the volume of space with dimensions of up to hundreds of times smaller than the wavelength in the open space.
  • the duration of the interaction of the high-frequency electromagnetic waves with plasma 10 may be prolonged if the plasma 10 is located in the space defined by the retarding structure 19, which in combination with the concentration of the high-frequency energy in the small volume of the shaping space leads to a more efficient transmission of the high- frequency electromagnetic energy into the plasma 10, while, at the same time, a substantial increase in the spatial resolution of the regulation of the formation of the electromagnetic field components described by the electrical and magnetic intensities E and H and the resulting regulation of the active power density flow in each part of the plasma 10 volume is achieved.
  • the retarding structure 19 may consist either of a high permittivity and/or high permeability material, or of a spatially periodic retarding structure 19, or a combination thereof.
  • the retardation of the high-frequency electromagnetic wave is given only by material parameters value.
  • a so-called polyharmonic electromagnetic wave i.e. electromagnetic wave with spatial harmonics
  • a so-called polyharmonic electromagnetic wave is created in the resonator for the harmonic signal from the high-frequency source.
  • microwaves 300 MHz - 300 GHz
  • phase velocity of the partial spatial harmonic wave may, for some variants of the arrangement of resonant circuit 15 elements, result in having spread parameters up to e.g. in the order of 10 2 - 10 3 or higher for basic spatial harmonics (multiple-times more for higher harmonics) and thus for corresponding wavelength shortening also in the order of 10 2 -1 0 3 or higher (for a commonly used 13.56 MHz industrial frequency, which corresponds to a wavelength of about 22 m, this would correspondingly reduce the wavelength below 220-22 mm).
  • Reducing the phase velocity of the electromagnetic wave is dependent on the spatial geometry of the particular retarding structure 19 and also derives from the dimensions of the customized plasma nozzle 1.
  • the periodic signal can be decomposed to the fundamental and higher harmonics.
  • identical processes take place on the retarding structure as in the case of a direct harmonic signal from a high-frequency source of a given frequency.
  • the complexity of the resulting effect of the retarding structure will develop (a dispersive characteristic of the retarding structure will also be applied), on the other hand, a more pronounced spatial effect of the retarding structure will be achieved in the regulation and formation of the electromagnetic field components described by the electrical and magnetic intensities E and H, than using only the harmonic signal from the high-frequency source and consequently more precise spatial regulation of the active power density flow in each part of the plasma 10 volume as with the simultaneous distribution of the total power of the periodic signal over its entire frequency spectrum, the distribution thereof to the corresponding polyharmonic electromagnetic waves will then take place, which then interact with the free charge carriers in plasma 10 and thereby pass on the necessary active power for the course and/or changes of processes and reactions in each part of plasma 10.
  • a method is solved of controlling the E and H intensities of the electromagnetic field and transmitting and controlling the active power flow from at least one high-frequency source or a 3-300 MHz periodic signal mixer into plasma 10 of plasma nozzle 1 at the state of minimum power reflected back to the high-frequency source by directly locating the spread spectrum resonant circuit 15 on the hollow body 24 of the plasma nozzle 1 , which circuit consists of a very variable set of elements comprising a differently arranged real coil or coil 13 system, a system of variable high-voltage high-frequency electrodes 7 and low-voltage high- frequency electrodes 8, wherein at least one part of the winding, the thread/half of the winding thread or the tapping of the resonant coil 13 winding is at least one of the high- voltage high-frequency electrode 7 and the low-voltage high-frequency electrode 8, further containing a shading shield 6 joined into a single point with reference potential ("ground”) of the plasma nozzle 1 and at least one element 18 regulating the spatial distribution of the electromagnetic field in the space (x
  • the spread spectrum resonant circuit 15 further includes all other processes associated with electromagnetic phenomena in substances of various states such as e.g. with eddy currents in the conductive parts of the system and plasma 10, polarization in dielectric materials, or magnetization in the ferro-/ferri- magnetic materials used to construct individual plasma nozzle structural elements or individual elements of the resonant circuit 15 with distributed parameters, etc. Therefore, spatial change any of the variable array elements of the resonant circuit 15 with the spread parameters carries a spatial change in the intensity of the electric field E and the magnetic field H intensity and/or a change in the specific active power flow density in the local region or the entire volume of at least one shaping space 16 including plasma 10 and its immediate surroundings. If this change is targeted, we talk about a regulation.
  • the invention also provides a method for generating plasma 10 under atmospheric pressure in at least one plasma nozzle 1 formed by a hollow body 24 of general geometry through which a working medium flows and connected to at least one high-frequency source or a 3-300 MHz periodic signal mixer by applying said resonant circuit 15 with spread parameters not only on the regulation of plasma parameters but also on the active formation thereof.
  • Fig. 1 shows a substitution scheme of a real coil for circuits with concentrated parameters.
  • this diagram only represents an approximation for a small portion of the coil wire thread, wherein the whole is then given by the sum of all these parts (if the coil does not contain any nonlinear elements/materials where the superposition principle no longer applies).
  • some of the electromagnetic field spatial distribution regulation elements 18 used contain non-linear elements (e.g., ferro-/ ferri- magnetic materials), the superposition principle will not apply in some cases.
  • the figures do not include any drawings of substitution schemes of the individual electrical circuit designs, but the description of the variations of the solutions according to the invention is given on the basis of examples of possible design variants and relative arrangements of individual construction components thereof.
  • a space coil can be used as the resonant coil 13.
  • a planar coil see Fig. 3, which may form a spatial structure in further mutual combinations.
  • a spiral coil structure or meander coil structure may also be used as the planar coil.
  • a resonant coil 13 can be used, which will be a combination of both of the above-mentioned embodiments of the resonant coils 13, as can be seen from Fig. 4.
  • resonant coil 13 can be formed by means of multiple coils with at least one winding thread, see Fig. 2 and Fig.
  • the threads of the resonant coil 13 winding are fixed or consist of a flexible tape-shaped conductor or a knitted conductive rope of a general shape which are oriented towards the discharge space 17 either flat or round, as can be seen from Fig. 5b, c or can be rotated to any position as shown in Fig. 7 or are formed as a conductive layer of general geometry on a dielectric carrier of general shape.
  • Variants of the winding system arrangement comprising the high-voltage high- frequency electrode 7 and the low-voltage high-frequency electrode 8 are shown in the following examples.
  • One of the exemplary embodiments of the winding system comprises at least one electrode comprising at least one pair of high-voltage high- frequency electrode 7 and low voltage high-frequency electrode 8, wherein said electrodes are formed by at least one portion of winding, thread or half of the winding threads or winding tapping of the resonant coil 13 and form a part of the high-voltage portion thereof, wherein the high-voltage high-frequency electrode 7 is generally at a higher potential, and the low-voltage high-frequency electrode 8 is at a lower potential or the electrodes have the same potential and are disposed near the dielectric plate 9 of the discharge space 17 so that the conductor orientation is flat or oblique or at an angle from 0 ° to 90 ° relative to the discharge space 17.
  • the high-voltage high- frequency electrode 7 and the low-voltage high-frequency electrode 8 may also be arranged only from one side of the discharge space 17 in parallel or at an angle of 0 ° to 90 ° relative to the direction of flow of the working gas through the discharge space 17.
  • the high-voltage high-frequency electrode 7 and the low-voltage high-frequency electrode 8 may also be arbitrarily arranged opposite each other through the discharge space 17 or in both of the combinations described above. It is also possible to use only one electrode which is formed by a pair of a high-voltage high-frequency electrodes and a low-voltage high-frequency electrodes 8 which would be at the same potential and would simultaneously intersect through the discharge space 17.
  • these electrodes 7 and 8 are displaced relative to each other in the direction of flow of the working gas through the discharge space 17 so as to fulfil the condition of their suitable spatial arrangement to ensure the direction of propagation/shaping of plasma 10 during its formation and to maintain its stability in its permanent burning and movement (flow dynamics). For this reason, it is not possible to use e.g. only one circular thread the half of the winding thread thereof would be directly opposite one another through the discharge space 17.
  • the winding system comprises at least one electrode comprising at least one pair of a high-voltage high-frequency electrode 7 and a low- voltage high-frequency electrode 8, wherein this pair of electrodes may consist of at least two consecutive threads of the resonant coil 13 or halves of the threads of the resonant coil 13 or winding parts of the resonant coil 13 as shown e.g. on Fig. 5b.
  • the winding system electrode may be formed by two different parts of the resonant coil 13 winding system with a markedly different potential, as shown in Fig. 2, or e.g. by a continuation of the ends of the resonant coil 13 or of the tapping of the resonant coil 13 threads where these ends may form direct conductors or conductors closed into a ring.
  • a further advantageous variant of the winding system is the arrangement where the low potential low-voltage high-frequency electrode 8 is connected to the reference electrical potential ("ground”) and has the form of a fixed or flexible conductor or is made as a bundle of wires oriented at an angle of 0 ° to 90 ° relative to the direction of flow of the working gas through the discharge space 17 or to the discharge space 17 itself.
  • the low-voltage high-frequency electrode 8 may also be formed into a closed ring having at least one conductor or is formed by at least one part of a shading shield 6 portion associated with the reference electric potential (“ground”) of the plasma nozzle 1 which is fixedly fixed or can vary its distance and/or slope from the discharge space 17, as shown in Fig. 5c.
  • Elements 18 regulating the spatial distribution of the electromagnetic field can be formed, e.g. by adjusting the spatial geometry and by arranging the threads or parts of the resonant coil 13 winding threads with respect to at least one shaping space 16 and the discharge space 17 characterized in their own inductances Li, inherent intermodal capacities Cmi and their own leakage capacities Csi. Further, this particular element 18 regulating the spatial distribution of the electromagnetic field in space x may be formed by at least one element f regulating the resonant coil 13 geometry that controls the geometry of the entire resonant coil 13 or the geometry of at least one of its winding threads and/or half of the winding threads or parts thereof.
  • the regulation itself consists in that the element f regulating the resonant coil 13 geometry tilts or rotates all or a selected number of tape conductors constituting individual threads of the winding and/or half of the winding threads or parts thereof of the resonant coil 13.
  • the element f regulating the resonant coil 13 geometry unidirectionally or bidirectionally deflects all or a selected number of conductors constituting the individual threads of the windings and/or a half of the winding threads or parts thereof of the resonant coil 13 or the element f regulating the resonant coil 13 geometry modifies the distance between the conductors of all or a selected number of individual winding threads and/or a half of the winding threads or parts thereof of the resonant coil 13.
  • the element 18 regulating the spatial distribution of the electromagnetic field may consist of at least one other element k regulating the winding distance.
  • This element k regulates the distance between at least one resonant coil 13 winding thread and/or a half of the resonant coil 13 winding threads or resonant coil 13 parts and at least one discharge space 17.
  • the winding distance regulation thus effected changes the mutual inductive and capacitive binding to the plasma.
  • the element 18 regulating the spatial distribution of the electromagnetic field may consist of at least one element g regulating mutual inductive coupling between the coils described above, constituting the resonant coil 13.
  • This regulation element g may comprise two differently designed regulation elements ga and gb which may be mutually dependent or independent, wherein the regulation element ga changes the mutual position of the said coils while the regulation element gb is formed by a magnetic circuit common, in mutual inductive coupling, to at least two coils constituting the resonant coil 13, wherein the individual parts of the regulation element gb and/or the magnetic circuit of the regulation element gb as a whole change their spatial position relative to the said coils.
  • the regulation element g is formed by at least one of the coils of the resonant coil 13.
  • the resonant coil 13 is inserted and/or rotated by the winding threads thereof, by their limited number or only parts of the winding threads into at least one of the spaces xa, xb and xc.
  • the surface of the resonant coil 13 winding threads and/or of halves of the resonant coil 13 winding threads and/or portions thereof are provided with at least one layer or system of layers of materials of different permeability, than has the resonant coil 13 winding wire material and/or with at least one layer or system of material layers of different permittivity than the space environment (xa, xb, xc) or a mutual combination thereof.
  • Elements 18 regulating the spatial distribution of the electromagnetic field may be formed by a targeted use of materials with different permeability values in the fixed shading shield 6 associated with the reference electrical potential ("ground”) and/or selected regulation elements 18 and/or the targeted use of materials with different permeability values for the structural elements of the plasma nozzle 1 and/or selected regulation elements 18 (e.g. using them to fill the space (xc) between threads or only portions of this space between high-voltage high-frequency electrodes 7 or a low- voltage high-frequency electrode 8, etc.).
  • ground reference electrical potential
  • the element 18 regulating the spatial distribution of the electromagnetic field in the space x may be formed by at least one portion of the shading shield 6 or by the shield 5 in its entirety, which change their distance relative to the winding threads of the resonant coil 13, halves of the winding threads of the resonant coil 13 or just some parts thereof of the resonant coil 13 and/or change their distance relative to at least one electrode from at least one pair of a high-voltage high-frequency electrode 7 and a low-voltage high-frequency electrode 8 and/or change their distance relative to the discharge space 17.
  • the element 18 regulating the spatial distribution of the electromagnetic field in the space x may be formed by different types of materials of different geometry, conductivity, permittivity and/or permeability of the material used.
  • the regulation element 18 is placed, inserted or rotated into/in the space xa between the t resonant coil 13 winding threads and the shading shield 6 (connected with the reference electrical potential).
  • the regulation element 18 is placed, inserted or rotated into/in the space xb defined by the resonant coil 13 winding threads.
  • the regulation element 18 is placed, inserted or rotated into/in the space xc between at least one pair of adjacent threads of the resonant coil 13 or a half of the resonant coil 13 winding threads or portions thereof of a resonant coil 13 winding, wherein the regulation element 18 may have a general shape or a suitably chosen shape according to the geometric arrangement of the resonant coil 13 or other resonant circuitry elements with spread parameters 15, e.g. planar, cylindrical, rod, comb, etc.
  • the element 18 regulating the spatial distribution of the electromagnetic field in the space x may be formed a system comprising layers or spatially delimited portions of metal layers and/or high permittivity and/or permeability material, or only by a high permittivity and/or permeability material, or the regulation element 18 is formed by a layer of material or only by a material of high permittivity and/or permeability of different thickness, or the regulation element 18 is formed by a layer of material or only by a material of having a spatially different permittivity and/or permeability value that can vary on the surface or In the volume of the element 18 generally according to any mathematical function.
  • the element 18 regulating the spatial distribution of the electromagnetic field in the space x comprises a metal material which may be at ground potential (connected to the reference electric potential) or floating potential or at the potential of any of the threads of the resonant coil 13 or generally at a potential different from the individual elements of the resonant circuit 15 with spread parameters.
  • elements 18 regulating the spatial distribution of the electromagnetic field may be formed by means of the eddy current regulation elements h, characterized in inductances Lvl and loss resistors Rvi, in the grounded shading shield 6 (connected to the reference electrical potential), and in the elements 18 regulating the spatial distribution of the electromagnetic field in the shaping space 16.
  • the eddy current regulation element h is formed by openings and/or gaps (slots) and/or grooves/projections of a general geometry and spatial distribution causing interruption of the continuous surface area of the shading shield 6 and/or of the surface of the metal parts of the elements 18 regulating the spatial distribution of the electromagnetic field in the space x.
  • the eddy current regulation element h can change its geometry, i.e. the shape and/or dimensions and/or the size of the surface and/or the mutual spacing of individual elements from which the element h is constructed.
  • the eddy current regulation element h may further comprise at least one further eddy current regulation element ha, wherein it is formed by or contains at least one material/layer with a different permeability from the permeability of the material of these elements and/or the layer on the control elements 18.
  • the eddy current regulation element h may further comprise at least one further eddy current regulation element hb, wherein it is formed by a coating with a conductivity different from the conductivity of the material of the elements and/or the layer on these elements.
  • the eddy current regulation element h is arranged on the surface of the shading shield 6 and/or is arranged on the surface of the metal parts of element 18 regulating the spatial distribution of the electromagnetic field in the space x.
  • the device for creating plasma under atmospheric pressure may be assigned a handle 3 or a corresponding holder for manual or robotic use of the plasma nozzle 1.
  • the plasma nozzles 1 according to the present invention can also be assembled in various ways, as shown in Fig. 7 to obtain multislot systems or combined with additional devices for dispensing additives (gases, aerosols, aerosol suspensions, dust particles, etc.) in various configurations. Then, the shaping space 16 may extend even to these additional devices, and preferably control processes, e.g. during transport or selection of additives, etc.
  • the total power absorbed in the plasma may range from 10 1 -10 4 W/cm 3 , the concentration of free electrons in the range of 1 0 12 -10 15 particles/cm 3 .
  • the specific electrical conductivity ⁇ of plasma will usually be less than 100 S/m.
  • the impedance of the discharge can range from 10 2 to 10 4 ⁇ .
  • the thermal effects of plasma on the surface of the materials can range, under usual laboratory conditions, between approx. 30 - 1 000 °C while maintaining a significantly non-isothermal nature of the discharge (various high energy particles with a temperature in the order of 2-1 0 thousand K).
  • the device is designed to generate plasma 10 under atmospheric pressure and comprises a plasma nozzle 1 which is formed by a longitudinal hollow body 24 with a working gas inlet 4 which is terminated by a plasma
  • the hollow body 24 includes a working gas distributor and homogenizer
  • a slot such as A hollow space, is formed between a pair of parallel dielectric plates 9, which is followed by spacing strips 32 of dielectric material.
  • the slot length is 20 to 500 mm and the width thereof is usually 1 to 3 mm, which defines the spacing between the dielectric plates 9 of the dielectric material at the location of the exit port 2.
  • a resonant coil 13 in the spatial arrangement of the winding threads is arranged on the hollow body 24, as shown in Fig. 2.
  • the discharge space 17 forms the "core" of the resonant coil 13.
  • the actual conductor of the resonant coil 13 is formed by a flexible (braided) flat Cu rope having a cross-section of 2 mm 2 and an external dimension of about 5 x 1 mm.
  • the total length of the resonant coil 13 conductor is chosen with respect to its function and ranges from around 5 m to 5.5 m according to the slot length used, wherein the spacing between the threads of the coil is in this particular case selected in the range of 3-5 mm.
  • the resonant coil 13 comprises two parts, namely the low-voltage portion La, which is formed by the low-voltage high-frequency coil 8 and the high- voltage part Lb, which is formed by the high-voltage high-frequency coil 7, which are connected in series and have a common inductive coupling.
  • a coaxial cable 5 (50 ⁇ ) is connected to the low-voltage portion La of the resonant coil 13 by means of which a low-voltage high-frequency signal is supplied from the generator.
  • the low-voltage portion La is formed by a single rectangular thread the plane of which is parallel to the plane of the dielectric plates 9 forming the slot-like discharge space 17, wherein the rectangular-shaped thread encircles the hollow body 24 of the plasma nozzle 1 virtually over all of its outer circumference.
  • the low-voltage portion La thread is nested by its two opposing lateral sides of the rectangle between a pair of parallel dielectric plates 9 along their outer sides, between it and the discharge space 17 of the plasma nozzle 1 is a separating seal strip of a dielectric material.
  • the third side of the rectangular thread of the low-voltage portion La at the outlet hole 2 of the plasma nozzle 1 is biased into two parallel conductors which are rotated by the edge of the flat conductor to the dielectric plates 9 of the dielectric material (i.e., by the conductor surface perpendicularly to the dielectric plates 9) and which dielectric plates 9 in the contact area are about 5 mm away from the outlet hole 2 and form a thus form a low-voltage high-frequency electrode 8.
  • the high voltage portion Lb of the resonant coil 13 forms a larger portion of the resonant coil 13 and has the shape of a flat solenoid which is wound on a pair of parallel dielectric plates 9 such that the discharge space 17 forms the "core" of this portion of the resonant coil 13. Thus, it is simultaneously “wounded” over the first portion La.
  • the second portion Lb is wound with a conductor surface perpendicular to the dielectric plates 9. The threads of this second portion Lb of the resonant coil 13 are spaced about 5 mm from the surface of the dielectric plates 9.
  • the three last threads of the second portion Lb of the resonant coil 13 are wound in direct contact with a pair of parallel dielectric plates 9 and form a high-voltage high-frequency electrode 7 system, wherein the last thread of the high-voltage high-frequency electrode 7 is closed in a circle.
  • the high-voltage high-frequency electrode 7 and/or the low-voltage high-frequency electrode 8 are slightly distant from the surface of the dielectric plates 9 (up to about 1 mm, usually in tenths of a mm).
  • the high frequency discharge occurs between the selected parts of the resonant coil 13, the high voltage portion Lb (i.e. the high-voltage high-frequency electrode 7 system) and the low-voltage portion La (i.e. the low-voltage high-frequency electrode 8 system), but also between the individual high-voltage portion Lb halves, which constitute the system of high-voltage high-frequency electrode 7 system.
  • the plasma nozzle 1 further contains a pair of elements 18 regulating the spatial distribution of the electromagnetic field.
  • the regulation elements 18 constitute independent interchangeable conductive plates 22 designed for tuning the resonant circuit with spread parameters 15. Aluminium plates of 2mm thickness are used as conductive plates 22 in this particular embodiment. Another preferred solution may be the use of other metals with different permeability relative to aluminium such as, e.g., Al alloys, copper, and the like, or may be provided with a layer of material having a high relative permeability in the range of e.g. 1 0 1 -10 9 .
  • Conductive plates 22 are arranged one at a time on each side of the resonant coil 13.
  • the plates 22 for tuning the resonant circuitry with spread parameters 15 may be of different geometries and move in the grooves formed in the beams 29 of the lateral shield structure of the plasma nozzle 1. They are fixed (at a particular location corresponding to the resonant circuit tuning) by tightening a fixing screw 23 with a dielectric head that at the same time (when released) acts as a handle for moving the conductive plates 22 for tuning during the operation of the plasma nozzle 1 .
  • the conductive plates 22 for tuning are removable/replaceable after removing the fixing screw 23 from the plasma nozzle 1 - can be ejected/inserted through the front portion of the plasma nozzle 1 through the opening in the mouth of the plasma nozzle 1.
  • the shield 6 is made of sheet metal of 2 mm thickness, where Al or its Al alloy were used as the material.
  • the shield 6 is provided on both sides of the plasma nozzle 1 with a set of openings for the natural discharge of hot air heated from the discharge space 17 and the resonant coil 13 conductor.
  • a handle 3 is attached to the lower rear portion of the plastic part 25, which consists of an 30mm Al alloy tube wound with a suitable elastic dielectric material for holding in hands.
  • the handle 3 is guided both by the coaxial power cable 5 from the high frequency generator and from the supply of the working gas 4.
  • a high frequency generator for feeding the plasma nozzle 1 , e.g., a high frequency generator at an industrial frequency of 1 3.56 MHz can be used, and can be in different power ranges - 0-300 W, 0-500 W, 0-600 W, 0-1000W etc.
  • a high-frequency generator impedance 50 ⁇
  • a high-frequency sinusoidal a signal characterized in the voltage URF and the current iRFflow
  • the resonant circuit 15 with spread parameters on the plasma nozzle 1 allows to adapt the 50 ⁇ impedance of the high-frequency source to the impedance of the discharge (in the order of 10 2 -10 4 ⁇ ).
  • the resonant circuit 15 Individual elements of the resonant circuit 15 with spread parameters are constructively pre-set to such values as to allow ignition and burning of the discharge in pure argon with optimal adaptation of the resonant circuit 15 for the plasma nozzle 1 generating plasma 10 in the free space in the air.
  • the resonant circuit 15 may be slightly untuned, which may fine-tuned by the elements 18 regulating the spatial distribution of the electromagnetic field.
  • the burning plasma state is characterized in multiple times higher intensity of the magnetic field H in the area of the discharge space 17 than in the state before the ignition of the plasma but a much lower value of the electric field E which has a completely different spatial distribution.
  • the maximum intensity of the electric field E is not between the high-frequency electrodes 7 and 8, as in the state before plasma ignition, but between these high-frequency electrodes and the plasma 10.
  • This also corresponds to the spatial distribution of the instantaneous values of the Poynting vector ⁇ when the state of the plasma nozzle with the burning plasma is the magnitude of the instantaneous values of the Poynting vector ⁇ in the area of the discharge space 17 up to the order of magnitude higher than for the state before the ignition of the plasma, wherein the perpendicular component of the instantaneous values of the Poynting vector ⁇ pointing into plasma, characterizing the subsequent active plasma losses, is several orders of magnitude higher for the case given and is spatially variable.
  • This example demonstrates the possibility of achieving a new method of creating plasma 10 in a plasma nozzle 1 by means of a spatially arranged set of a resonant circuit 15 with spread parameters and elements 18 regulating the spatial distribution of the electromagnetic field in the shaping space 16 and the discharge space 17, thus achieving regulation of the active power flow density in each portion of the plasma 10 volume.
  • Plasma nozzle 1 - Fig. 5c - contains, as in the previous case, a hollow body 24 on which only one resonant coil 13 is wound, which has the shape of a spatially elliptical helix (solenoid) so that the hollow body 24 again passes through the centre of the resonant coil 13.
  • This resonant coil 13 can have different spatial solutions, as shown in the examples of Fig. 5a and Fig. 5b.
  • the resonant coil 13 represents the easiest spatial arrangement of the resonant coil 13 where the winding of all threads is perpendicular to the discharge space 17, wherein the mutual distance of the individual winding threads of the resonant coil 13 is constant.
  • the resonant coil 13 is of a variable pitch of the individual threads/halves of the threads between each other.
  • the actual conductor of the resonant coil 13 is formed e.g. by flexible (braided) Flat Cu wire with a conductor cross-section of 2 mm 2 and external dimensions of 5x1 mm.
  • the low-voltage high-frequency signal from the high-frequency generator is fed by the coaxial cable 5 on the first (low-voltage) thread of the resonant coil 13.
  • the second high-voltage end of the resonant coil 13 is "open" (i.e., without galvanic connection with another electrical element or conductor). With this geometric arrangement of the resonant coil 13, all halves of the coil windings are used as electrodes.
  • Fig. 5b represents another spatial arrangement of the resonant coil 13 where winding of a portion of threads of the resonant coil 13 is perpendicular to the discharge space 17, wherein the other portion of the resonant coil 13 threads is wound flat.
  • the last high-voltage thread may be "open" or circular.
  • the resonant coil 13 can again be of varying pitch between the individual threads/halves of the threads of the coil.
  • part of the coil 13 threads e.g., its low-voltage portion
  • the basic system of the above described resonant coil electrodes 13 can in this case be supplemented by an electrode coupled to the reference electric potential ("ground”) in the form of a tilting Al plate 36 which is in the horizontal position to the discharge chamber 17 and is a part/continuation of the shield 6 metal sheet of the plasma nozzle shading shield (i.e., distant from the discharge space).
  • This Al- plate/electrode 36 may be tilted (a hinge) and fixed in any position towards the discharge space 17, until it reaches the other extreme position - with the edge touching the dielectric plates 9 defining the discharge space 17, thereby acquiring the function of the high-voltage high-frequency electrode 7 with the reference electrical potential ("ground").
  • the discharge then occurs both between the individual halves of the winding threads of the resonant coil 13 as well as between the last high-voltage thread/half of the coil threads and the Al-plate/electrode 36.
  • the Al plate 36 can be fixed in any position towards the discharge chamber 17, thereby tuning the resonant circuit 15 with the spread parameters, i.e.
  • the Al plate/electrode 36 i.e., in the collapsed state
  • the Al plate/electrode 36 may sometimes be advantageous for the Al plate/electrode 36 (i.e., in the collapsed state) to remain slightly distant from the surface of the dielectric plates 9 (up to about 1 mm, however, usually in tenths of mm).
  • the tuning system of the resonant circuit 15 with spread parameters of the plasma nozzle 1 further comprises on each side of the plasma nozzle 1 a pair of independent interchangeable conductive tuning plates 22.
  • the pair of tuning plates 22 can be tucked underneath each other and therefore change not only the position of the tuning plate 22 relative to the resonant coil 13 and one another but also its surface (at different heights).
  • On both beams 29 of the lateral structure of the plasma nozzle 1 two pairs of height- adjustable and partially angularly-adjustable side panels 35 with a pair of grooves for driving the tuning plates 22 are arranged, so that the tuning plates 22 can be set in 3D dimensions (height and tilt at an angle).
  • the metal tuning plates 22 may be of different geometries and are conductively coupled to the adjustable side panels 35. They are fixed (in a particular location corresponding to the tuning of the resonant circuit 15) by tightening the fixing screw 23 with a dielectric nut which at the same time (after its loosening) serves as a handle for advancing the tuning plates 22 during the operation of the plasma nozzle 1. Due to the relatively small thickness of the metal tuning plates (e.g., 2 mm thick Al sheet) and their sufficient flexibility, the fine tuning of the resonant circuit 15 can also be affected by a stronger tightening/loosening of the dielectric nut on the fixing screw 23, thereby regulating the fine deflection of the metal tuning plates 22.
  • the tuning plates 22 may be of different materials or geometries and are removable/replaceable after unscrewing the fixing screw 23 from the plasma nozzle 1 - can be ejected/inserted through the front portion of the plasma nozzle 1.
  • All of the aforementioned specific elements 18 regulating the spatial distribution of the electromagnetic field can be, according to the present invention, of different geometries, materials or surface treatments and participate in other ways on controlling the spatial distribution of the electromagnetic field and the density of the active power flow in the shaping space 16 and/or in the discharge space 17, including plasma 10.
  • the plasma nozzle 1 is constructed in the same way as in the prior art, which is shown in "Examples 1 and 2", only except that the resonant coil 13 as described in Fig. 3 is wound on both sides of the plasma nozzle 1 on the hollow body 24.
  • the resonant coil 13 is spatially arranged in two planar coils which are connected in series and which are arranged at an angle of from 0 ° to 180 ° relative to each other.
  • this angle can be varied, thereby influencing with the mutual coupling, both between the planar coils with one another and between the planar coils and other elements of the resonant circuit 15 with spread parameters.
  • the actual conductor of the resonant coil 13 is formed by a flexible (braided) flat Cu wire having a cross-section of 2 mm 2 and an external dimension of 5 x 1 mm.
  • the resonant coil 13 consists of two portions, a the low-voltage portion La and a high-voltage portion Lb, which are connected in series and have a common inductive binding.
  • the low- voltage portion La is formed by a low-voltage high-frequency electrode 8 to which a coaxial cable 5 is connected through which a low-voltage high-frequency signal is fed from the generator.
  • Both portions La and Lb are wound on a pair of parallel dielectric plates 9 such that the discharge space 17 is inserted into the space between the low- voltage portion La and the high-voltage portion Lb of the resonant coil 13 by the area of the conductor perpendicular to the dielectric plates 9.
  • the threads of both portions are in the upper parts of the threads about 5 mm away from the surface of the dielectric plates 9.
  • the lower part of the threads consists of high-voltage high-frequency electrodes 7 and low-voltage high-frequency electrodes 8 and are in contact with a pair of parallel dielectric plates 9 defining a discharge space 17. All the winding threads of both portions La and Lb of the resonant coil 13 are used as electrodes, but always only by means of the bottom wall of the resonant coil 13.
  • the high voltage electrode 7 and the low voltage high-frequency electrode 8 are arranged in succession on each of the two sides of the plasma nozzle 1 , part of the thread of the resonant coil 13 forming the electrode is a high-frequency electrode 7 (i.e., at a higher electrical potential) to the previous portion of the thread, thereby forming a longitudinal electromagnetic field in the direction of the flow of the working gas.
  • the high-voltage high-frequency electrode 7 and the low voltage high-frequency electrode 8 are arranged in succession on each of the two sides of the plasma nozzle
  • each following portion of the thread of the resonant coil 13 forming the electrode is a high-frequency high-voltage electrode 7 (i.e., at higher electrical potential) relative to the preceding portion of the thread, thereby forming a longitudinal electromagnetic field in the direction of the working gas flow.
  • the electrical potential of the high-frequency electrodes 7 and 8 increases with a growing row of numbers indicating individual high-frequency electrodes (i.e. with a growing row of numbers 1 ,
  • the system of electrodes 7 and 8 on both sides of the plasma nozzle creates, opposite each other, a system of high-voltage high-frequency electrodes 7 (i.e., coil Lb) and low-voltage high-frequency electrodes 8 (i.e., coil La) which create, opposite each other, in the shaping space 16 and in the discharge space 17 a transverse electromagnetic field (all electrodes arranged opposite each other are at different potentials).
  • This composite transverse-longitudinal (crossed) electromagnetic field allows for self-ignition of plasma 10 without any need for an external source of pre-ionization of the working medium.
  • plasma nozzle 1 allows to achieve different types of plasmas 10 on one type of a device - homogeneous "glow” discharge or spatially “channel” type of discharge.
  • a device - homogeneous "glow” discharge or spatially “channel” type of discharge In the case of the "channel" discharge, which is typical of the other examples of plasma nozzles, an increase in the spatial homogeneity in the direction of the length of the plasma nozzle 1 slot occurs.
  • a similar example of a particular design of the device according to the invention is a plasma nozzle 1 of the same design as described in the previous examples.
  • a resonant coil 13 which is described in Fig. 4 and which is spatially arranged in a single "composite spatial-planar coil” is wound on both sides of the plasma nozzle 1 on the hollow body 24. is spatially arranged in a single "composite spatial-planar coil”.
  • the composite spatial-planar coil is wound in such a way that each of its threads gradually passes from one side of the discharge space 17 (marked with the letter A on Fig. 4) to the other side of the discharge space 17 (marked with the letter B Fig.
  • each half of the resonant coil 13 threads forms a system of a high-frequency high-voltage electrode 7 and a high- frequency low-voltage electrode 8 at different potentials and with a different pitch of the winding conductor relative to other portions of each half of the resonant coil 13 threads.
  • the upper part of each half of the resonant coil 13 threads is remote from the discharge space 17 (not constituting electrodes).
  • the "composite spatial-planar coil” is wound such that each half of a thread is co-operating in the direction of the passage of the electric current and thus forms a coherent magnetic field.
  • the actual conductor of the resonant coil 13 can again be formed e.g.
  • the resonant coil 13 is wound by the conductor surface perpendicularly to the dielectric plates 9.
  • the high frequency-electrode 7 and 8 system is arranged in a "zigzag" manner on both sides of the discharge chamber 17 so that the high-frequency high- voltage electrodes 7 and the high-frequency low-voltage electrodes 8 of the odd halves of the resonant coil 13 threads are located on one side A of the plasma nozzle 13 and high-frequency high-voltage electrodes 7 and the high-frequency low-voltage electrodes 8 of the even halves of the resonant coil 13 threads are located on the opposite side B of the plasma nozzle 13, always at a 1 ⁇ 2 distance between the high- frequency electrodes 7 and 8 of even/odd thread halves.
  • the electrical potential of electrodes increases with a growing row of numbers indicating the individual high- frequency electrodes (i.e., with a rising row of numbers 1 , 2, 3, ...) so that in the shaping space 16 and in the discharge space 17, especially before the ignition of the plasma, unlike in "Example 3", preferably a longitudinal electromagnetic field relative to the direction of flow of the working gas, but having also a cross-sectional component, but less than that of "Example 3", is created.
  • the invention is applicable for the surface treatment or pretreatment with plasma for producing thin functional coatings, or for their curing with subsequent achievement of higher utility value of surface protection, further e.g. for the realization of plasma reactions and polyreactions etc. in practically all industrial areas. It is also applicable particularly in the areas of nanotechnology and nanomaterials, e.g. in their synthesis or modification.
  • the new solution makes it possible to use a linear plasma plasma nozzle with linear plasma in a very easy and safe manner not only in industrial lines, but also preferably for manual applications, such as tools or for robotic applications.
  • an element regulating eddy currents comprising a conductive coating with a conductivity different from the conductivity of conductive plates 22 material
  • Vf phase velocity of the propagating electromagnetic wave in the direction of the axis of the retarding structure c propagation velocity of electromagnetic wave in vacuum n retardation coefficient

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Abstract

L'invention concerne un procédé de régulation des intensités E et H d'un champ électromagnétique et de transfert et de régulation d'un flux de puissance active à partir d'au moins une source haute fréquence et/ou d'un mélangeur de signaux périodiques de 3 à 300 MHz dans un plasma, à un état d'amplitude minimale de puissance réfléchie en retour vers une source haute fréquence d'au moins une buse à plasma à travers laquelle s'écoule un milieu actif, une densité de flux de puissance active spécifique étant convertie/consommée en/dans des processus et des réactions physiques et chimiques souhaités, la formation ou la modification de substances dans un état solide, liquide ou gazeux dans le plasma à l'intérieur et/ou à l'extérieur de la buse à plasma, la transmission d'énergie électromagnétique haute fréquence étant générée et commandée au moyen d'un ensemble spatialement agencé de circuits résonants à paramètres d'étalement en présence de plasma, dont l'espace de mise en forme ou une partie de celui-ci est situé à l'intérieur d'un espace défini géométriquement par un ensemble complet du circuit résonant à paramètres d'étalement, la transmission de l'énergie électromagnétique haute fréquence étant également régulée au moyen d'un élément de régulation de la distribution spatiale du champ électromagnétique, au moyen de sa régulation, un état de puissance minimale réfléchie en retour vers la source haute fréquence étant obtenu ainsi que la formation de composants du champ électromagnétique décrit par les intensités électriques et magnétiques E et H et le flux de la densité de puissance active dans chaque partie du volume de plasma. L'invention concerne également un dispositif pour mettre en œuvre le procédé, un circuit résonant (15) à paramètres distribués comprenant au moins une structure retardatrice d'onde électromagnétique (19) et au moins une structure/un système résonant (14) et un résonateur constitué d'un écran d'ombrage (6) de l'espace (x) défini géométriquement par le système de circuit résonant (15), comprenant en outre au moins un espace de mise en forme (16) à l'intérieur de l'espace (x), l'espace de mise en forme (16) s'étendant, dans sa totalité ou en partie, dans au moins un espace de décharge (17) à travers lequel s'écoule le milieu actif, et comprenant en outre un plasma, le circuit résonant (15) étant pourvu d'au moins un élément (18) qui régule la distribution spatiale du champ électromagnétique et de la densité d'écoulement de puissance active, qui est disposé sur au moins une buse à plasma (1).
PCT/CZ2017/050060 2016-12-14 2017-12-11 Procédé de création de plasma dans une buse à plasma sous pression atmosphérique et régulation des intensités e et h du champ électromagnétique et transfert et régulation du flux de puissance active à partir d'une source haute fréquence dans le plasma du plasma de buse et son dispositif de mise en œuvre Ceased WO2018108191A1 (fr)

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CZ2016-790A CZ2016790A3 (cs) 2016-12-14 2016-12-14 Způsob vytváření plazmatu v plazmové trysce za atmosférického tlaku a regulace intenzit E a H elektromagnetického pole a přenosu a regulace toku činného výkonu z vysokofrekvenčního zdroje do plazmatu plazmové trysky a zařízení k jeho provádění
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CN112613245A (zh) * 2020-12-18 2021-04-06 中国人民解放军91550部队 一种激光预电离的感应等离子体推力器设计方法
CN115226284A (zh) * 2021-05-27 2022-10-21 长江师范学院 一种电极缠绕设备
US12537167B2 (en) * 2023-07-07 2026-01-27 Tokyo Electron Limited Plasma processing apparatus

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