WO2018128236A1 - Dispositif d'alimentation électrique servant à la production de plasma - Google Patents

Dispositif d'alimentation électrique servant à la production de plasma Download PDF

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Publication number
WO2018128236A1
WO2018128236A1 PCT/KR2017/007908 KR2017007908W WO2018128236A1 WO 2018128236 A1 WO2018128236 A1 WO 2018128236A1 KR 2017007908 W KR2017007908 W KR 2017007908W WO 2018128236 A1 WO2018128236 A1 WO 2018128236A1
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WO
WIPO (PCT)
Prior art keywords
impedance
voltage
variable
high frequency
load
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2017/007908
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English (en)
Korean (ko)
Inventor
박승진
권순구
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Medipl Co Ltd
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Medipl Co Ltd
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Filing date
Publication date
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Publication of WO2018128236A1 publication Critical patent/WO2018128236A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
    • H03L7/00—Automatic control of frequency or phase; Synchronisation
    • H03L7/06—Automatic control of frequency or phase; Synchronisation using a reference signal applied to a frequency- or phase-locked loop
    • H03L7/08—Details of the phase-locked loop
    • H03L7/099—Details of the phase-locked loop concerning mainly the controlled oscillator of the loop

Definitions

  • the present invention relates to a power supply for generating a plasma, and more particularly, a power supply for generating a plasma that can provide maximum transmission power by removing reflected power through automatic impedance matching even when a load size is changed. Relates to a device.
  • the plasma is generated by operating under atmospheric pressure rather than under low pressure that can be realized in a vacuum chamber, such as plasma used in semiconductor processes.
  • a plasma generating device that can be requested.
  • the related art is KR 10-1012345 B.
  • Korean Patent No. 10-1012345 a low power portable microwave plasma generator capable of generating plasma by operating under atmospheric pressure has been introduced.
  • This prior document discloses an apparatus for generating a plasma using resonant energy of microwaves provided by a coaxial cable. That is, the plasma generating apparatus disclosed in the above-mentioned prior document is configured to inject gas into the space between two conductors constituting the coaxial cable and to inject the injected gas into a plasma state by the resonance energy of microwaves provided to the conductors of the coaxial cable. .
  • a power supply device In order to supply energy-containing microwaves to such a conventional plasma generating device, a power supply device is required.
  • a plasma generation power supply generates and outputs a microwave having a predetermined power, and the output terminal to which the microwave is output is designed to output desired power based on 50 ⁇ .
  • the load connected to the output stage is frequently generated according to various environmental conditions.
  • the delivered power varies depending on the size of the load. The fluctuations can cause problems that do not provide the desired power.
  • an object of the present invention is to provide a power supply device for generating a plasma capable of providing maximum transmission power by removing reflected power through automatic impedance matching even when the size of the bottom is changed.
  • the present invention as a means for solving the above technical problem
  • a power supply apparatus for generating plasma for supplying a high frequency signal amplified to have energy for generating plasma comprising:
  • a frequency generator for generating a signal having a frequency of said high frequency signal
  • a power amplifier for amplifying the power of the signal generated by the frequency generator and providing it to the output terminal of the power supply device
  • a voltage / current sensor for detecting a voltage, a current of a high frequency signal output from the power amplifier, and a phase difference between the voltage and the current;
  • variable impedance element unit connected between the power amplifier and the output terminal and including a plurality of variable passive elements
  • An impedance regulator for deriving an impedance of a load connected to the output terminal based on the voltage, the current, and the phase difference detected by the voltage / current sensor, and adjusting an impedance of the variable passive element based on the impedance of the load;
  • It provides a power supply for generating a plasma comprising a.
  • the frequency generator may include a crystal oscillator for outputting an oscillation signal and a phase-locked loop (PLL) for changing the frequency of the oscillation signal to the frequency of the high frequency signal.
  • PLL phase-locked loop
  • the frequency generator may include a voltage controlled oscillator for output frequency is adjusted by a control voltage to output the frequency of the high frequency signal.
  • the voltage / current sensor may be implemented as a voltage-current probe.
  • the impedance regulator In one embodiment of the invention, the impedance regulator, the impedance regulator, and
  • the impedance of the load can be determined by the current value, ⁇ : phase difference detected by the voltage / current sensor.
  • the impedance regulator may adjust the impedance of the variable passive element such that the combined impedance of the impedance of the load and the impedance of the plurality of variable passive elements is a preset reference impedance.
  • variable impedance element unit may include a variable capacitor that can change the capacitance value or a variable inductor that can change the inductance value.
  • variable capacitor or the variable inductor may be connected in series or in parallel between the power amplifier and the output terminal.
  • the power supply device for generating plasma having the above-described problem solving means, even if the load impedance of the power supply does not maintain the reference impedance 50 according to the operating state or the surrounding environment of the plasma generating device. Accordingly, the impedance matching is performed to reduce the power loss by removing the reflected power and to secure the reliability of the operation of the plasma generator.
  • FIG. 1 is a diagram schematically illustrating a plasma generation system to which a power supply device for plasma generation according to an embodiment of the present invention is applied.
  • FIG. 2 is a block diagram illustrating a power supply device for generating plasma according to an embodiment of the present invention.
  • FIG. 3 is a diagram illustrating in more detail an example of an impedance regulator and a variable impedance element of a power supply device for generating plasma according to an embodiment of the present invention.
  • FIG. 4 is a Smith chart illustrating a process of impedance matching according to an example of an impedance regulator and a variable impedance element of a power supply device for generating plasma according to an embodiment of the present invention illustrated in FIG. 3.
  • FIG. 1 is a diagram schematically illustrating a plasma generation system to which a power supply device for plasma generation according to an embodiment of the present invention is applied.
  • a plasma generation system to which a power supply device for plasma generation according to an embodiment of the present invention is applied includes a power supply device 10 and a gas supplying gas, according to an embodiment of the present invention. It may be configured to include a resonator 30 for generating a plasma by discharging the gas supplied from the gas supply device 20 with the resonance energy of the high frequency signal supplied from the supply device 20 and the power supply device 10.
  • Prior art document 10-1012345 discloses a configuration of the resonator 30 in such a plasma generation system, and thus a detailed description of the resonator 30 will be omitted.
  • the power supply device 10 is provided to provide a high frequency signal of a predetermined power to the resonator 30 that generates plasma through discharge of gas, and has a predetermined high frequency having a predetermined constant power for stable plasma generation. It should be configured to provide a signal to the resonator 30.
  • the signal output terminal of the power supply device 10 is designed to output transmission power based on a predetermined impedance (for example, 50 ⁇ ) in advance, when the impedance of the output terminal is changed, the reflection is reflected and input back to the output terminal. As power is generated, it becomes impossible to provide a high frequency signal of sufficient power required by the resonator 30.
  • the electrical equivalent impedance is changed when the plasma itself generated in the resonator 30 directly touches the processing unit, or before and after ignition of the plasma in the resonator 30 There may be a case where the difference in the reflection characteristic is very severe, or the cable length between the power supply device 10 and the resonator 30 is changed.
  • the power supply device 10 should be configured to output the power required by the resonator 30 to the output terminal by suppressing the reflected power even when the load impedance is changed.
  • the power supply device for plasma generation to output the high frequency signal of the preset power (required in the resonator 30) by removing the reflected power is shown in FIG. Have the same configuration.
  • FIG. 2 is a block diagram illustrating a power supply device for plasma generation according to an embodiment of the present invention
  • FIG. 3 is an impedance regulator and a variable impedance of the power supply device for plasma generation according to an embodiment of the present invention. An example of the device is shown in more detail.
  • a power supply apparatus for generating plasma includes a frequency generator 11, a power amplifier 12, a voltage / current sensor 13, and an impedance. It may be configured to include a regulator 14 and the variable impedance element unit 15.
  • the frequency generator 11 is an element for generating and outputting a signal of a desired frequency.
  • the frequency of the signal generated in the frequency generator 11 can be set in various ways as needed, the signal of the millimeter wave band of approximately several hundred kHz to several GHz can be generated that can be applied to the system for low temperature plasma generation.
  • the frequency generator 11 may be applied to various frequency generators known in the art.
  • the frequency generator 11 includes a crystal oscillator having an oscillation circuit and outputting an oscillation signal for inputting a PLL, and a signal having a frequency required for a microwave plasma generation system by receiving a frequency signal generated by the oscillation circuit. It can be implemented as a phase-locked loop (PLL) that changes frequency.
  • the voltage controlled oscillator (VCO) may be implemented to adjust the frequency of the output signal according to the magnitude of the input control voltage.
  • the crystal oscillator and the PLL may be manufactured in the form of one chip, and the voltage controlled oscillator may also be manufactured in the form of one chip.
  • the power amplifier 12 receives a signal of a predetermined frequency generated by the frequency generator 11 and amplifies its power.
  • the power amplifier 12 may employ a variable gain power amplifier in which a separate control signal is input and the gain (amplification factor) can be adjusted according to the control signal.
  • the voltage / current sensor 13 detects the voltage, current and phase difference between the voltage and the current of the high frequency signal transmitted from the power amplifier 12 to the load side.
  • the voltage / current sensor 13 is a voltage-current probe (VI probe) which is a device capable of detecting the phase difference between voltage, current and voltage-current of a high frequency signal known in the art. Can be implemented.
  • VI probe voltage-current probe
  • the impedance regulator 14 calculates an impedance value of the load connected to the output of the power supply based on the voltage, current, and phase difference detected by the voltage / current sensor 13, and based on the calculated impedance value of the power
  • the impedance value of the variable impedance element unit 15 may be determined such that the impedance value viewed from the output terminal of the amplifier 12 toward the load side becomes a preset reference impedance value.
  • the variable impedance element unit 15 may include a plurality of passive elements whose impedance value may be appropriately changed.
  • the variable impedance element unit 15 is implemented by two variable capacitors connected in a series-parallel relationship, but the present invention is not limited thereto.
  • the variable impedance element unit 15 may include a variable capacitor whose capacitance can be changed and / or a variable inductor which can be changed in inductance.
  • passive elements included in the variable impedance element unit 15 may be connected in series or / and in parallel between the power amplifier 12 and the output terminal.
  • the frequency generator 11 outputs a high frequency signal of a predetermined frequency, and the high frequency signal output from the frequency generator 11 is input to the power amplifier 12 to amplify and output power with a predetermined gain.
  • the gain of power amplification in the power amplifier 12 may be set according to the resonance energy required by the resonator ('30' of FIG. 1) that receives the high frequency signal and generates plasma.
  • the power amplified high frequency signal output from the power amplifier 12 is provided to the load through an output stage.
  • the voltage / current sensor 13 receives the voltage, current and the frequency of the high frequency signal provided from the power amplifier 12 to the load.
  • the voltage-current phase difference is detected and provided to the impedance regulator 14.
  • the impedance regulator 14 first calculates the impedance of the current load by using the values of the voltage, current, and voltage-current phase difference of the high frequency signal provided from the power amplifier 12 to the load by the power amplifier 12. do.
  • Impedance calculation performed by the impedance regulator 14 may be performed through the following Equation 1.
  • Equation 1 Z L represents the impedance of the load, X represents the real part of the impedance of the load, Y represents the imaginary part of the impedance of the load, and V represents the voltage value of the high frequency signal detected by the voltage / current sensor 13. Is a current value of the high frequency signal detected by the voltage / current sensor 13, and ⁇ represents a phase difference between the voltage and the current of the high frequency signal.
  • the impedance regulator 14 determines impedance values of the variable passive elements provided in the variable impedance element unit 15 using the impedance of the load derived by Equation 1 above.
  • variable impedance element unit includes a first capacitor C1 connected in parallel between the power amplifier 12 and the output terminal and a second capacitor C2 connected in series between the power amplifier 12 and the output terminal.
  • first capacitor C1 connected in parallel between the power amplifier 12 and the output terminal
  • second capacitor C2 connected in series between the power amplifier 12 and the output terminal.
  • Reference numerals 'C1' and 'C2' may refer to capacitors included in the variable impedance element unit 15, and will be described as meaning capacitance of each capacitor.
  • the impedance regulator 14 determines the capacitance of each of the variable capacitors C1 and C2 such that the impedance viewed from the power amplifier 12 to the output terminal of the power supply becomes a predetermined reference impedance (for example, 50 ⁇ ). That is, the impedance regulator 14 may determine the capacitor
  • the impedances Zc1 and Zc2 of each capacitor may be determined as shown in Equation 2 below when the frequency of the high frequency signal is 'f'.
  • the combined impedance of the impedances of the two capacitors and the load is equal to that of the second capacitor C2 and the load impedance Z L connected in series with the first capacitor C1 in parallel, and the synthesized impedance is the reference impedance (50).
  • ⁇ should be determined as in Equation 3 below.
  • Equation 4 the capacitances of the variable capacitors C1 and C2 of the variable impedance element unit 15 may be determined. This process is shown in Equation 4 below.
  • Equation 4 Xc1 is '2 ⁇ * f * C1' and Xc2 is '2 ⁇ * f * C2'.
  • the power supply for generating a plasma the impedance value of the variable impedance element included in the variable impedance element unit 15, the voltage / current sensor 13 It can be expressed using X and Y determined by the voltage, current, and phase difference of the detected amplified high frequency signal. That is, the power supply apparatus for generating plasma according to the embodiment of the present invention measures the impedance value of the variable impedance element of the variable impedance element unit 15 by using the voltage, current, and phase difference of the amplified high frequency signal detected in real time. It can be calculated and applied immediately, minimizing the loss of power delivery by quickly performing impedance matching in response to varying load impedances.
  • FIG. 4 is a Smith chart illustrating a process of impedance matching according to an example of an impedance regulator and a variable impedance element of a power supply device for generating plasma according to an embodiment of the present invention illustrated in FIG. 3.
  • the impedance regulator 14 determines the capacitance of the second capacitor C2 of the variable impedance element unit 15
  • the impedance viewed from the power amplifier 12 to the output terminal is shown in FIG. 4 at the load impedance (X + jY).
  • the arrow moves to the center point of the Smith chart to move to the desired reference impedance (50 ⁇ ).
  • the impedance regulator 14, the voltage / current sensor 13 derives the impedance of the load based on the detected value of the voltage, current and voltage-current phase difference of the amplified high frequency signal, and the load impedance and variable Impedance matching is performed by adjusting the impedance of the variable impedance element unit 15 so that the synthesized impedance of the impedance element becomes a desired reference impedance (50 ⁇ ).
  • the load impedance of the power supply apparatus does not maintain the reference impedance 50 depending on the operating state of the plasma generating apparatus or the surrounding environment. Even if changed, impedance matching may be performed accordingly to remove reflected power to reduce power loss and to ensure reliability in the operation of the plasma generator.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

L'invention concerne un dispositif d'alimentation électrique servant à la production de plasma, qui fournit un signal haute fréquence amplifié afin de disposer d'énergie en vue de la production de plasma, le dispositif d'alimentation électrique comprenant : un générateur de fréquence servant à générer un signal d'une fréquence du signal haute fréquence ; un amplificateur de puissance servant à amplifier la puissance du signal généré par le générateur de fréquence, et à fournir ledit signal à une borne de sortie du dispositif d'alimentation électrique ; un capteur de tension/courant électrique servant à détecter une tension et un courant électrique du signal haute fréquence émis par l'amplificateur de puissance, ainsi qu'une différence de phase entre la tension et le courant électrique ; une unité d'éléments à impédance variable connectés entre l'amplificateur de puissance et la borne de sortie et comprenant une pluralité d'éléments passifs variables ; et un dispositif de réglage d'impédance servant à dériver l'impédance d'une charge connectée à la borne de sortie, en fonction de la tension, le courant électrique et la différence de phase détectés par le capteur de tension/courant électrique, et à régler l'impédance des éléments passifs variables en fonction de l'impédance de la charge.
PCT/KR2017/007908 2017-01-04 2017-07-21 Dispositif d'alimentation électrique servant à la production de plasma Ceased WO2018128236A1 (fr)

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KR1020170001554A KR101930440B1 (ko) 2017-01-04 2017-01-04 플라즈마 생성을 위한 전력 공급 장치
KR10-2017-0001554 2017-01-04

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KR102763163B1 (ko) 2019-04-29 2025-02-07 삼성전자주식회사 Rf 파워 모니터링 장치, 및 그 장치를 포함하는 pe 시스템
KR102785088B1 (ko) * 2021-11-19 2025-03-26 주식회사 뉴파워 프라즈마 앰프 보호 기능을 구비한 고주파 전력 공급 시스템
KR102746005B1 (ko) * 2023-11-08 2024-12-23 주식회사 경신 임피던스 조정장치 및 그 방법
US20250299921A1 (en) * 2024-03-21 2025-09-25 Applied Materials, Inc. Impedance tuning for plasma processing

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KR20160044428A (ko) * 2015-10-23 2016-04-25 주식회사 영신알에프 매칭부 및 분석센서를 가지는 일체형 고주파 상압 플라즈마 발생장치

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KR101930440B1 (ko) 2018-12-18

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