WO2020091239A1 - Appareil de traitement de substrat - Google Patents

Appareil de traitement de substrat Download PDF

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Publication number
WO2020091239A1
WO2020091239A1 PCT/KR2019/012789 KR2019012789W WO2020091239A1 WO 2020091239 A1 WO2020091239 A1 WO 2020091239A1 KR 2019012789 W KR2019012789 W KR 2019012789W WO 2020091239 A1 WO2020091239 A1 WO 2020091239A1
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WO
WIPO (PCT)
Prior art keywords
bellows
chamber
susceptor
support bar
exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2019/012789
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English (en)
Korean (ko)
Inventor
한진수
김수천
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TES Co Ltd
Original Assignee
TES Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020180130385A external-priority patent/KR102119396B1/ko
Priority claimed from KR1020180146501A external-priority patent/KR102121799B1/ko
Application filed by TES Co Ltd filed Critical TES Co Ltd
Priority to CN201980060603.1A priority Critical patent/CN112740387A/zh
Publication of WO2020091239A1 publication Critical patent/WO2020091239A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L11/00—Hoses, i.e. flexible pipes
    • F16L11/04—Hoses, i.e. flexible pipes made of rubber or flexible plastics
    • F16L11/11—Hoses, i.e. flexible pipes made of rubber or flexible plastics with corrugated wall
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches

Definitions

  • the present invention relates to a substrate processing apparatus, and more specifically, a substrate that can reduce the adhesion of particles to the thin film by scattering powder when the susceptor moves up and down by accumulating powder or the like inside the bellows connected to the lower surface of the chamber. It's about the device.
  • a susceptor disposed inside the chamber and supporting the substrate and moving up and down, and a gas supply unit for supplying process gas and the like to the substrate are provided.
  • an exhaust unit for exhausting gas or powder in the chamber is provided.
  • some of the components inside the chamber or connected to the chamber may have a structure in which it is difficult to exhaust foreign substances such as powder using the exhaust portion.
  • powder or the like accumulates inside the bellows structure that is connected to the drive bar for moving the susceptor up and down, it is extremely difficult to remove powder and residual gas, etc. through an existing exhaust portion.
  • FIG. 18 corresponds to a cross-sectional view showing a bellows structure and an exhaust passage in a substrate processing apparatus according to the prior art.
  • the susceptor support bar 32 extending downward from the lower surface of the susceptor 10, and the bellows 33 and the exhaust flow path arranged to surround the susceptor support bar 32 and maintaining a vacuum state ( 40).
  • the susceptor support bar 32 protrudes downward through the through hole 24 of the chamber 12, and seals the through hole 24 by the bellows 33 to maintain an inside vacuum state. Is done.
  • powder or the like that may occur during the processing process for the substrate W may be introduced into the bellows 33 through the gap between the edge of the through hole 24 and the outer surface of the susceptor support bar 32. .
  • the exhaust passage 40 of the chamber 12 is connected to the one side rather than the central portion. Since the bellows 33 contracts and extends vertically, when the exhaust passage or the like is directly connected to the bellows 33, the bending flow is continuously applied to the exhaust passage, so that the exhaust passage can be easily damaged or damaged. to be. In addition, since the center portion of the base of the chamber 12 is connected to the susceptor support bar 32 of the susceptor 10, various fluid lines for controlling the temperature of the susceptor 10 and various electric wires such as power cables, etc. , It is difficult to connect the exhaust passage to the center of the base of the chamber 12.
  • powder or the like introduced into the chamber 12 acts as a particle on the thin film deposited on the substrate W, thereby deteriorating the quality of the thin film.
  • Figure 19 shows the structure of the lower chamber 12 including the susceptor 10 in the substrate processing apparatus in the prior art for processing a large area substrate (W).
  • a susceptor auxiliary support portion supporting the lower surface of the susceptor 10 may be provided.
  • the susceptor auxiliary support portion for example, a plurality of susceptor auxiliary support bars 40 and 42 supporting the lower surface of the susceptor 10 and the susceptor auxiliary support bars 40 and 42 are connected to lower ends It can be provided with an elevating plate 60 to move up and down.
  • the susceptor auxiliary support bars (40, 42) are provided with bellows (52, 54) on the outside to be sealed to maintain a vacuum inside the chamber (12).
  • an exhaust unit 50 for exhausting gas or powder in the chamber is provided.
  • some of the inside of the chamber 12 or the components connected to the chamber may have a structure in which it is difficult to exhaust foreign substances such as powder using the exhaust part 50.
  • powder or the like which may occur during the processing process for the substrate W, enters the bellows 52 and 54 through the gap between the edge of the through hole 16 and the outer surface of the susceptor auxiliary support bars 40 and 42. Can be introduced.
  • powder or the like introduced into the chamber 12 acts as a particle on the thin film deposited on the substrate W, thereby deteriorating the quality of the thin film.
  • the present invention provides a substrate processing apparatus capable of reducing particles from being attached to a thin film by scattering powder when the susceptor moves up and down by accumulating powder or the like inside the bellows connected to the lower surface of the chamber. It is aimed at providing.
  • An object of the present invention as described above is a chamber for receiving a substrate and providing a processing space for the substrate, at least one support bar penetrating at least one through hole formed in a lower surface of the chamber and moving up and down, the chamber It is achieved by a substrate processing apparatus characterized in that it comprises at least one bellows exhaust passage that surrounds the support bar and seals the chamber from the outside and at least one bellows exhaust passage connected to the bellows unit to exhaust gas.
  • the support bar penetrates the first through hole formed in the lower surface of the chamber, and the susceptor support bar connected to the susceptor supporting the substrate, penetrates the second through hole formed in the lower surface of the chamber, and passes the susceptor. It may be composed of at least one of a support bar supporting the susceptor, a mask mounted on the upper portion of the substrate, and a mask supporting bar passing through a third through hole formed in the lower surface of the chamber.
  • the bellows unit when the support bar is composed of the susceptor support bar, the bellows unit is configured as a first bellows unit that surrounds the susceptor support bar and seals the chamber, and the bellows exhaust flow path draws gas from the first bellows unit. It consists of a first bellows exhaust passage for exhausting, and the first bellows unit surrounds the susceptor support bar and seals the chamber, and a lower end of the first bellows and a lower end of the susceptor support bar are connected.
  • a first elevating plate that moves up and down may be provided.
  • the first bellows unit extends from the outside of the first through hole toward the bottom, and further includes a first fixing part to which the first bellows is connected to the lower end, and the first bellows exhaust passage is the first high It can connect with the government.
  • the first bellows unit includes a second bellows connected to a lower surface of the first elevating plate, and a first auxiliary plate connected to a lower end of the second bellows and supported by a first support bar connected to the lower portion of the chamber. It can be further provided.
  • the first bellows unit further includes a second fixing part connecting the lower end of the second bellows and the first auxiliary plate, and at least one second bellows exhaust passage connected to the second fixing part to exhaust gas.
  • a first communication hole communicating the first bellows and the second bellows may be formed on the first elevating plate.
  • the first bellows unit further includes a third bellows connecting the first elevating plate and the first auxiliary plate inside the second bellows, and at least one fluid for controlling the temperature of the susceptor.
  • a line or at least one electric wire may extend from the lower end of the susceptor support bar through the inside of the third bellows to penetrate the first auxiliary plate and extend downward.
  • the bellows unit is configured as a second bellows unit that surrounds the susceptor auxiliary support bar and seals the chamber, and the bellows exhaust flow path is gas from the second bellows unit. It is composed of a third bellows exhaust flow path for exhausting, and the second bellows unit surrounds the susceptor auxiliary support bar and seals the chamber, and a lower end of the fourth bellows and a lower end of the susceptor auxiliary support bar. Is connected and may have a second elevating plate that moves up and down and up and down.
  • the second bellows unit extends from the outside of the second through hole toward the bottom, and further includes a third fixing part to which the fourth bellows is connected to the lower end, and the third bellows exhaust flow passage is the third It can be connected to the fixing portion.
  • the second bellows unit includes a fifth bellows connected to a lower surface of the second elevating plate and a second auxiliary plate connected to a lower end of the fifth bellows and supported by a second support bar connected to the lower portion of the chamber. It can be further provided.
  • the second bellows unit further includes a fourth fixing part connecting the lower end of the fifth bellows and the second auxiliary plate, and at least one fourth bellows exhaust passage connected to the fourth fixing part to exhaust gas.
  • a second communication hole communicating the fourth bellows with the fifth bellows may be formed on the second elevating plate.
  • a third bellows unit surrounding the mask support bar outside the chamber and sealing the chamber, and at least one fifth exhaust gas connected to the third bellows unit A bellows exhaust passage may be further provided.
  • the present invention having the above-described configuration, it is possible to remove the powder inside the bellows connected to the lower surface of the chamber, thereby preventing particles from being attached to the thin film by scattering the powder when the susceptor or the mask moves up and down.
  • the bellows exhaust passage when connecting the bellows exhaust passage, it is formed on the lower surface of the chamber and connected to a fixed portion without movement, thereby extending the life of the bellows exhaust passage and reducing damage and damage.
  • FIG. 1 is a side cross-sectional view showing the internal configuration of a substrate processing apparatus according to an embodiment of the present invention
  • FIG. 2 is a perspective view showing the fixing portion and the bellows in Figure 1,
  • Figure 3 is a side cross-sectional view showing the exhaust flow inside the bellows in Figure 2
  • Figure 4 is a side cross-sectional view showing a substrate processing apparatus according to another embodiment
  • FIG. 5 is a perspective view showing the fixing part and the bellows in FIG. 4,
  • FIG. 6 is a plan view showing the elevating plate
  • Figure 7 is a side cross-sectional view showing the exhaust flow inside the bellows in the configuration according to Figure 4,
  • Figure 8 is a side cross-sectional view showing the exhaust flow inside the bellows in the substrate processing apparatus according to another embodiment
  • FIG. 9 is a side cross-sectional view showing the configuration of a substrate processing apparatus according to another embodiment.
  • FIG. 10 is a perspective view showing the fixing portion and the bellows in FIG. 9,
  • FIG. 11 is a side cross-sectional view showing the exhaust flow inside the bellows in FIG. 9,
  • FIG. 12 is a side sectional view showing a substrate processing apparatus according to another embodiment
  • FIG. 13 is a perspective view showing the fixing part and the bellows in FIG. 12,
  • FIG. 15 is a side cross-sectional view showing the exhaust flow inside the bellows in the configuration according to FIG. 13;
  • FIG. 16 is a side cross-sectional view showing the exhaust flow inside the bellows in the substrate processing apparatus according to another embodiment
  • 17 is a side cross-sectional view showing the configuration of a substrate processing apparatus according to another embodiment
  • FIG. 18 is a cross-sectional view showing a bellows structure and an exhaust passage in a substrate processing apparatus according to the prior art
  • 19 is a cross-sectional view showing a bellows structure of a substrate support in a substrate processing apparatus according to another prior art.
  • FIG. 1 is a side cross-sectional view showing an internal configuration of a substrate processing apparatus 1000 according to an embodiment of the present invention.
  • the substrate processing apparatus 1000 accommodates a substrate W and provides a chamber 100 that provides a processing space 123 for the substrate W, and at least one through hole formed on a lower surface of the chamber 100 At least one support bar (320; 3400A, 3400B; 5620A, 5620B) that penetrates (124, 127, 128) and moves up and down, and wraps the support bar 320 outside the chamber 100 and surrounds the chamber Bellows units 460 for sealing 100, 3410A, 3410B; 5410A, 5410B and at least one bellows exhaust passage 514, 516; 1710, 1720; 1750, connected to the bellows unit 460 to exhaust gas 1760).
  • the support bar 320 penetrates the first first through hole 124 formed in the lower surface of the chamber 100 and is connected to a susceptor 310 supporting the substrate W (susceptor support bar) 320), the second through-hole 127 (see FIG. 11) formed on the lower surface of the chamber 100 and the susceptor auxiliary support bar (3400A, 3400B) supporting the susceptor 310 (Fig. 9) Reference) and a mask 5600 (see FIG. 17) mounted on the upper portion of the substrate W, and penetrates through a third through hole 128 (see FIG. 17) formed on the lower surface of the chamber 100. It may be configured as at least one of the mask support bar (5620A, 5620B) (see Fig. 17).
  • the support bar 320 is composed of the susceptor support bar 320.
  • the bellows unit 460 (3410A, 3410B; 5410A, 5410B) is composed of a first bellows unit 460 surrounding the susceptor support bar 320 and sealing the chamber 100, the bellows exhaust
  • the flow paths 514, 516; 1710, 1720; 1750, 1760 may be composed of first bellows exhaust passages 514, 516 that exhaust gas from the first bellows unit 460.
  • the substrate processing apparatus 1000 may include a chamber 100 that provides a processing space 123 in which the substrate W is processed.
  • the chamber 100 may include a chamber body 120 and a chamber lid 110 that seals the opened upper portion of the chamber body 120.
  • the shower head 200 is provided on the inside of the chamber 100 to supply process gas or the like toward the substrate W.
  • the process gas supply source 500 that supplies the process gas supplies the process gas from the outside of the chamber 100 toward the shower head 200.
  • the shower head 200 is disposed substantially parallel to and parallel to the susceptor 310 loaded with the substrate W to maintain the uniformity of the deposited film deposited on the substrate W, and the susceptor ( The distance from 310) can also be appropriately adjusted.
  • a susceptor 310 supporting the substrate W may be provided below the processing space 123 inside the chamber 100.
  • the substrate W may be mounted on the upper surface of the susceptor 310.
  • a susceptor support bar 320 for moving the susceptor 310 up and down by a predetermined distance is connected to the lower center of the susceptor 310.
  • the susceptor support bar 320 is illustrated as a separate component from the susceptor 310, but is not limited thereto, and the susceptor support bar 320 is integral with the susceptor 310. It may be formed.
  • gas or powder may remain inside the chamber 100.
  • the powder when the powder remains inside the chamber 100, it may be attached to a thin film deposited on the substrate to become particles.
  • the substrate processing apparatus 1000 may include an exhaust unit 800 to exhaust such gas or powder to the outside of the chamber 100.
  • the exhaust unit 800 may include at least one chamber exhaust channel 810 and 820 and at least one pumping unit (not shown) connected to the chamber exhaust channel 810 and 820.
  • the chamber exhaust passages 810 and 820 are connected to the base 121 of the chamber 100 to exhaust gas or powder inside the chamber 100 to the outside of the chamber 100.
  • the chamber exhaust passages 810 and 820 are illustrated as two, but the present invention is not limited thereto, and may include one or more exhaust passages.
  • the chamber exhaust passages 810 and 820 are illustrated as being connected to the base 121 of the chamber 100, the chamber exhaust passages 810 and 820 are side walls of the chamber 100 or It is also possible to be connected to the chamber lead 110.
  • the chamber exhaust flow paths 810 and 820 are composed of two or more, if the pumping portion is arranged for each exhaust flow path, the configuration of the entire apparatus may be very complicated and difficult to control. Accordingly, the chamber exhaust passages 810 and 820 may be combined into an integrated exhaust passage 830 and a pumping portion may be disposed in the integrated exhaust passage 830.
  • the susceptor support bar 320 is formed to penetrate the first through hole 124 formed in the base 121 of the chamber 100 and protrude to the outside of the chamber 100.
  • the inside of the chamber 100 is maintained in a vacuum state during the process for the substrate W, so that the first bellows unit 460 is maintained to maintain the first through hole 124 in a sealing state. do.
  • the first bellows unit 460 surrounds the susceptor support bar 320 and seals the chamber 100 with a first bellows 410 and a lower end of the first bellows 410 and the susceptor.
  • the lower end of the support bar 320 is connected and may include a first elevating plate 700 that moves up and down.
  • the first bellows 410 maintains the sealing of the first through hole 124 while the susceptor 310 moves up and down from the outside of the susceptor support bar 320 under the chamber 100. do.
  • the first bellows through the gap between the outer surface of the susceptor support bar 320 and the edge of the first through-hole 124 gas or powder that may occur during the processing process for the substrate W 410 may be introduced inward.
  • the gap is formed to be substantially very small, but a sufficient gap is formed to allow the powder or the like to flow into the first bellows 410.
  • the gas introduced into the first bellows 410 may form foreign substances such as powder therein.
  • Powders introduced into the inside of the first bellows 410 or generated inside the first bellows 410 are accumulated under the inside of the first bellows 410.
  • foreign matters accumulated inside the first bellows 410 scatter and enter the interior of the chamber 100 through the first through hole 124. It can spread, and these foreign substances act as particles on the thin film deposited on the substrate W, thereby deteriorating the quality of the thin film.
  • the chamber exhaust passages 810 and 820 are disposed on one side rather than the central portion of the base 121 of the chamber 100, the gas inside the chamber 100 is generated by the chamber exhaust passages 810 and 820.
  • the likelihood of scattering of the powder inside the first bellows 410 increases.
  • the distance between the edge of the first through hole 124 and the outer surface of the susceptor support bar 320 is substantially very small, and the chamber exhaust passages 810 and 820 are the bases of the chamber 100 ( Since the center portion of 124) is disposed on one side, even when the exhaust portion 800 is provided, it is extremely difficult to pump and discharge powder or the like accumulated inside the first bellows 410.
  • the above-described first bellows 410 is contracted or extended up and down when the susceptor support bar 320 moves up and down, allowing the susceptor support bar 320 to move.
  • the sealing of the first through hole 124 is maintained by enclosing the support bar 320 and sealing it.
  • the exhaust flow path is connected to a fixed element rather than a moving component such as a bellows.
  • a first fixing part 510 is provided between the upper portion of the first bellows 410 and the lower surface of the chamber 100, and at least one gas is discharged by being connected to the first fixing part 510.
  • the first bellows exhaust passages 514 and 516 may be provided.
  • FIG. 2 is a perspective view showing the fixing part 2510 and the first bellows 410.
  • the upper end of the first fixing part 510 is connected to the lower surface of the chamber 100, and the lower end of the first fixing part 510 is of the first bellows 410. It is connected to the upper part. At this time, the lower end of the first bellows 410 is connected to the first elevating plate 700.
  • a driving means is connected to the first elevating plate 700 to vertically elevate the first elevating plate 700, wherein the susceptor support bar 320 and the susceptor 310 are vertically moved together. It goes up and down.
  • the first bellows 410 stretches and contracts, and the first fixing part 510 is positioned when the susceptor 310 moves up and down. It is fixed without variation or deformation.
  • At least one first bellows exhaust passage 514 and 516 is connected to the first fixing part 510.
  • first connection holes 512 and 513 are formed in the first fixing part 510, and the first bellows exhaust passages 514 and 516 can be connected to the first connection holes 512 and 513. have.
  • the first fixing part 510 can be easily connected when the first bellows exhaust passages 514 and 516 are connected to a fixed component rather than a moving component.
  • a bending load or the like does not act on the first bellows exhaust passages 514 and 516, thereby reducing the possibility of damage or damage to the central exhaust passages 2514 and 2516.
  • the susceptor 310 may be provided with a heat exchange device (not shown) for temperature control, various sensors (not shown), and the like, and connected to the heat exchange device to control the temperature of the susceptor 310.
  • a heat exchange device for temperature control
  • various sensors not shown
  • At least one fluid line 323 or at least one electric wire 324 for passing through the inside of the susceptor support bar 320 extends downward.
  • At least one fluid line 323 or at least one wire 324 for controlling the temperature of the susceptor 310 includes the susceptor support bar 320 and the first elevating plate. It may extend through the (700) to the lower portion of the first elevating plate (700).
  • the fluid line 323 and the electric wire 324 are surrounded by a protection part 322 or the like and penetrate the susceptor support bar 320 and the first elevating plate 700 to first elevate. It may extend to the bottom of the plate 700.
  • the first bellows exhaust passages 514 and 516 are connected to side surfaces of the first fixing part 510. Accordingly, it is possible to prevent the first bellows exhaust passages 514 and 516 from interfering with the above-described fluid lines and wires.
  • first bellows exhaust passages 514 and 516 are illustrated in the drawing as being connected to the first fixing part 510 and being symmetrically connected to the first fixing part 510, but are not limited thereto. Does not. That is, the number and connection positions of the first bellows exhaust passages 514 and 516 may be appropriately modified.
  • the exhaust flow paths constituting the first bellows exhaust flow paths 514 and 516 may be arranged to be staggered without being arranged in a straight line around the central portion of the first bellows 410.
  • first bellows exhaust passages 514 and 516 are disposed to be staggered with each other, when the exhaust is performed by the first bellows exhaust passages 514 and 516, the exhaust flow from inside the first bellows 410 By generating turbulence caused by can be exhausted more effectively.
  • the first bellows exhaust passages 514 and 516 may be connected to the chamber exhaust passages 810 and 820. Accordingly, when the gas or powder inside the chamber 100 is pumped through the chamber exhaust passages 810 and 820, the pumping force of the chamber exhaust passages 810 and 820 is the first bellows exhaust passage ( 514 and 516, the residual gas or powder inside the first bellows 410 may be pumped together to be exhausted.
  • first connection holes 512 and 513 are not shown in the drawing, they may be formed to be inclined toward the upper portion or toward the first through hole 124.
  • the gas or powder flowing into the inside of the first bellows 410 through the first through hole 124, the first connection hole ( 512, 513) and the first bellows exhaust passages 514, 516 can be more effectively evacuated and removed.
  • first bellows exhaust passages 514 and 516 are not connected to the chamber exhaust passages 810 and 820, and the first bellows exhaust passages 514 and 516 and the chamber exhaust passages 810 and 820 are respectively. It may be connected to a separate pumping part (not shown), in which case at least one of the separate pumping parts may have a different pumping pressure.
  • the pumping pressure of the bellows pumping part (not shown) connected to the first bellows exhaust passages 514, 516 and the chamber pumping part (not shown) connected to the chamber exhaust passages 810, 820 are different. Can be adjusted.
  • first bellows exhaust passages 514 and 516 may have a smaller cross-sectional area than the chamber exhaust passages 810 and 820.
  • the internal pressure of the first bellows exhaust passages 514 and 516 is lower than that of the chamber exhaust passages 810 and 820, thereby improving pumping efficiency. I can do it.
  • the configuration of the above-described chamber exhaust passages 810 and 820 may be omitted when the first bellows exhaust passages 514 and 516 are directly connected to the pumping unit. That is, when a large pumping capacity is not required when exhausting the internal gas or the like of the chamber 100, the gas inside the chamber 100 is exhausted using only the first bellows exhaust passages 514 and 516 Can be.
  • the space between the edge of the first through hole 124 and the outer surface of the susceptor support bar 320 is widened to increase the pumping efficiency by the first bellows exhaust passages 514 and 516 to increase the chamber 100 ) It is possible to allow the gas inside to be exhausted more smoothly.
  • Figure 4 shows a substrate processing apparatus 2000 according to another embodiment.
  • the same reference numerals are used for the same components.
  • the substrate processing apparatus 2000 includes a second bellows 420 connected to a lower end of the first elevating plate 700 ′, and a lower end of the second bellows 420.
  • a first auxiliary plate 630 connected to and supported by the first second support bar 4610 connected to the lower portion of the chamber 100 may be further provided.
  • first bellows 410 and the second bellows 420 may be sequentially arranged under the chamber 100 to be stretched and contracted in the vertical direction.
  • the upper end of the first bellows 410 may be connected to the lower surface of the chamber 100, and the lower end of the first bellows 410 may be connected to the upper surface of the first elevating plate 700 '. do.
  • the upper end of the second bellows 420 is connected to the lower surface of the first elevating plate 700 ', and the lower end of the second bellows 420 is connected to the first auxiliary plate 630.
  • the first auxiliary plate 630 is supported and fixed by a first second support bar 4610 extending downward from the lower surface of the chamber 100.
  • FIG. 5 is a perspective view showing the first bellows 410 and the second bellows 420
  • FIG. 6 is a plan view showing the first elevating plate 700 '.
  • the lower end of the susceptor support bar 320 of the susceptor 310 is connected to the first elevating plate 700 ', and the first elevating plate 700'
  • the extension portion 705 may be connected to a driving means (not shown).
  • the susceptor support bar 320 and the susceptor 310 move up and down together. Can be.
  • communication holes 710 and 720 communicating the inner space of the first bellows 410 with the inner space of the second bellows 420 may be formed in the first elevating plate 700 ′.
  • the communication holes 710 and 720 may be formed between the first bellows 410 and the susceptor support bar 320. Although two communication holes are illustrated in the drawing, the number and shape of the communication holes are shown. It can be modified appropriately.
  • the inner space of the first bellows 410 communicates with the inner space of the second bellows 420 by the communication holes 710 and 720. Therefore, as described later, when exhausting gas or powder or the like through the lower end of the second bellows 420, the inner space of the first bellows 410, the communication holes 710, 720, and the second bellows Gas or the like may be exhausted through the inner space of 420. This will be discussed later.
  • the first fixing part 510 and the second fixing part 520 may have a substantially cylindrical shape with the upper and lower parts open as illustrated in the drawing.
  • the upper end of the first fixing part 510 may be connected to the lower surface of the chamber 100, and more specifically, may be connected to the lower surface of the chamber 100 outside the first through hole 124.
  • the lower end of the first fixing part 510 is connected to the upper end of the first bellows 410.
  • the susceptor support bar 320 may be inserted into the first fixing part 510 and the first bellows 410 and connected to the first elevating plate 700 'described above.
  • the upper end of the second fixing part 520 is connected to the lower end of the second bellows 420, and the lower end of the second fixing part 520 is connected to the first auxiliary plate 630.
  • the first elevating plate 700 when the first elevating plate 700 'rises, the first bellows 410 contracts, and the second bellows 420 stretches.
  • the first elevating plate 700 'descends when the first elevating plate 700 'descends, the first bellows 410 stretches and the second bellows 420 contracts.
  • first fixing part 510 and the second fixing part 520 located at the upper end of the first bellows 410 and the lower end of the second bellows 420 are respectively the lower surface and the first auxiliary of the chamber 100. It is connected to the plate 630 to maintain a fixed position.
  • At least one second bellows exhaust passage 524 through which the gas is exhausted is connected to the second fixing part 520.
  • a first bellows exhaust passage 514 connected to the first fixing part 510 and a second bellows exhaust passage 524 connected to the second fixing part 520 are provided. can do.
  • the susceptor 310 may be provided with a heat exchange device (not shown) for temperature control, various sensors (not shown), and the like, and connected to the heat exchange device to control the temperature of the susceptor 310.
  • a heat exchange device for temperature control
  • various sensors not shown
  • At least one fluid line 323 or at least one electric wire 324 for passing through the inside of the susceptor support bar 320 extends downward.
  • the third bellows 430 connecting the first elevating plate 700 'and the first auxiliary plate 630 may be further provided inside the second bellows 420.
  • at least one fluid line 323 or at least one electric wire 324 for controlling the temperature of the susceptor 310 has the first elevating plate 700 at the lower end of the susceptor support bar 320. ') And may pass through the inside of the third bellows 430 and penetrate the first auxiliary plate 630 to extend downward.
  • the fluid line 323 and the electric wire 324 are surrounded by a protection part 322 or the like, passing through the susceptor support bar 320 and the third bellows 430, and the first auxiliary plate 630 ).
  • first bellows exhaust passage 514 is connected to the side of the first fixing part 510
  • second bellows exhaust passage 524 is connected to the side of the second fixing part 520. Accordingly, it is possible to prevent the first bellows exhaust passage 514 and the second bellows exhaust passage 524 from interfering with the above-described fluid lines and wires.
  • first fixing part 510 may be provided with a first connection hole 512 connected to the first bellows exhaust passage 514.
  • second fixing portion 520 may be provided with a second connection hole 522 connected to the second bellows exhaust passage 524.
  • first bellows exhaust passage 514 and the second bellows exhaust passage 524 may be symmetrically arranged in opposite directions with respect to the central portion of the first bellows 410 or the second bellows 420.
  • the present invention is not limited to this, and can be appropriately modified.
  • first bellows exhaust passage 514 and the second bellows exhaust passage 524 ' are not disposed on a straight line with respect to the central portion of the first bellows 410 or the second bellows 420. They can be staggered.
  • first bellows exhaust passage 514 and the second bellows exhaust passage 524 ' are arranged to be staggered with each other, the first bellows exhaust passage 514 and the second bellows exhaust passage 524' are exhausted. In this case, turbulence caused by exhaust flow may be generated inside the first bellows 410 and the second bellows 420 to exhaust more effectively.
  • first bellows exhaust passage 514 and the second bellows exhaust passage 524 may be connected to the aforementioned chamber exhaust passages 810 and 820.
  • the total number of the first bellows exhaust passage 514 and the second bellows exhaust passage 524 is provided to correspond to the number of the chamber exhaust passages 810 and 820, so that the first bellows exhaust passage ( 514) and a second bellows exhaust passage 524 may be connected to the chamber exhaust passages 810 and 820, respectively.
  • the first bellows exhaust passages 514 and the second bellows exhaust passages 524 may be appropriately connected to the chamber exhaust passages 810 and 820 disposed at a close position.
  • two or more central exhaust flow paths may be connected to one flow path of the chamber exhaust flow paths 810 and 820.
  • first bellows exhaust passage 514 and the second bellows exhaust passage 524 may have a smaller cross-sectional area than the chamber exhaust passages 810 and 820.
  • the internal pressures of the first bellows exhaust passage 514 and the second bellows exhaust passage 524 are reduced by reducing the cross-sectional areas of the first bellows exhaust passage 514 and the second bellows exhaust passage 524. 810, 820) to improve the pumping efficiency.
  • FIG. 4 illustrates an embodiment in which the first bellows exhaust passage 514 and the second bellows exhaust passage 524 are connected to the aforementioned chamber exhaust passages 810 and 820, but the present invention is not limited thereto. Does not.
  • first bellows exhaust passage 514 and the second bellows exhaust passage 524 are not connected to the chamber exhaust passages 810 and 820, and the first bellows exhaust passage 514 and the second bellows exhaust passage 524 and the chamber exhaust passages 810 and 820 may be respectively connected to separate pumping parts (not shown), in which case at least one of the separate pumping parts may have a different pumping pressure.
  • a bellows pumping part (not shown) connected to the first bellows exhaust passage 514 and a second bellows exhaust passage 524 and a chamber pumping part connected to the chamber exhaust passages 810 and 820 (not shown) Time) can be adjusted differently.
  • the configuration of the above-described chamber exhaust passages 810 and 820 is omitted.
  • the chamber 100 is used using only the first bellows exhaust passage 514 and the second bellows exhaust passage 524. It can be configured to exhaust the gas inside.
  • the pumping efficiency of the first bellows exhaust passage 514 and the second bellows exhaust passage 524 is increased by increasing the distance between the edge of the first through hole 124 and the outer surface of the susceptor support bar 320. By increasing, it is possible to more smoothly exhaust gas or the like inside the chamber 100.
  • FIG. 7 is a side cross-sectional view illustrating an exhaust flow inside the first bellows 410 and the second bellows 420 when the first bellows exhaust passage 514 and the second bellows exhaust passage 524 are provided.
  • gas or powder introduced into the first bellows 410 through the first through hole 124 inside the chamber 100 is connected to the first fixing part 510. 1 may be exhausted through the bellows exhaust passage (514).
  • powder or the like may be exhausted and removed by the second bellows exhaust passage 524 connected to the second fixing part 520.
  • FIG. 8 shows an exhaust flow inside the first bellows 410 and the second bellows 420 when the first bellows exhaust passage 514 and the second bellows exhaust passage 524 are provided according to another embodiment. It is a side sectional view showing.
  • the same reference numerals are used for the same components as in FIG. 7.
  • the third connection hole 517 to which the first bellows exhaust passage 514 and the first fixing part 510 are connected is formed by being inclined at a predetermined angle ⁇ 1 You can.
  • connection hole 517 may be formed to be inclined toward the top or toward the first through hole 124 as shown in the drawing.
  • the gas or powder flowing into the inside of the first bellows 410 through the first through hole 124 is the third connection hole 517 And the first bellows exhaust passage 514 to more effectively exhaust and remove.
  • connection hole 526 to which the second bellows exhaust passage 524 and the second fixing part 520 are connected may also be formed by being inclined at a predetermined angle ⁇ 2 .
  • connection hole 526 may be formed to be inclined toward the bottom or toward the first auxiliary plate 630 as illustrated in the drawing.
  • the fourth connection hole 526 When the fourth connection hole 526 has the above-described configuration, it flows into the inside of the second bellows 420 through the communication holes 710 and 720 and accumulates on the upper surface of the first auxiliary plate 630. The powder or the like can be more effectively exhausted and removed by the fourth connection hole 526 and the second bellows exhaust passage 524.
  • the fourth connection hole 526 may be formed by being inclined toward the upper portion. In this case, gas or powder flowing into the inside of the second bellows 420 through the communication holes 710 and 720 is connected to the fourth connecting hole 526 and the second bellows exhaust passage 524. Exhaust can be removed immediately.
  • Figure 9 shows a substrate processing apparatus 3000 according to another embodiment.
  • the gas supply unit 3200 is provided under the backing plate 3210 and the backing plate 3210 provided inside the chamber 100 to support the substrate W.
  • a shower head 3220 may be provided to supply process gas or the like.
  • plasma of the external high-frequency power source 950 is used to deposit process gas, which is a deposition material having high energy, on the substrate. .
  • the high-frequency power source 950 is connected to the above-described shower head 3220 to serve as an upper electrode, and the susceptor 310 described later may be grounded to serve as a lower electrode.
  • LCD Liquid Crystal Display
  • PDP Plasma Display Panel
  • OLED Organic Light Emitting Diodes
  • the backing plate 3210 may be connected to and supported by the inner wall of the chamber body 120.
  • the edge of the backing plate 3210 is supported by the protrusion 122 formed to protrude from the inner wall of the chamber body 120, and the shower head 3220 is previously provided on the lower surface of the backing plate 3210. It can be connected to be spaced apart by a determined distance.
  • a space 3230 is formed between the shower head 3220 and the backing plate 3210.
  • the process gas supplied from the process gas supply source 500 is supplied to the separation space part 3230 and is supplied toward the substrate W through the shower head 3220.
  • a plurality of through holes 3222 having a fine size may be formed in the shower head 3220.
  • the process gas supplied to the separation space part 3230 is supplied toward the substrate W through the through hole 3222.
  • susceptor auxiliary support bars 3400A and 3400B for supporting the susceptor 320 may be provided.
  • the susceptor support bar 320 extends through the first through hole 124 of the base 121 of the chamber 100, and the susceptor bellows 330 at the bottom of the chamber 100. It is sealed by.
  • the lower end of the susceptor support bar 320 and the lower end of the susceptor bellows 330 may be connected to the first elevating plate 700, thereby maintaining a vacuum state inside the chamber 100 Can be.
  • the first elevating plate 700 connected to the lower end of the susceptor support bar 320 is connected to a driving source (not shown) such as a motor to move up and down, and accordingly, the susceptor 310 also moves up and down. Will move.
  • a driving source such as a motor to move up and down, and accordingly, the susceptor 310 also moves up and down. Will move.
  • the susceptor 310 Prior to performing a processing process on the substrate W, such as a deposition process, the susceptor 310 rises toward the shower head 3220 described above. At this time, the distance between the susceptor 310 and the above-described shower head 3220 may be determined in advance, and accordingly, the elevation height of the susceptor 310 is determined.
  • the size of the susceptor 310 may also be enlarged or enlarged according to the enlargement and large area of the flat panel display, thereby increasing the load.
  • the susceptor support bar 320 located on the lower surface of the central portion of the susceptor 310, a region or edge spaced apart from the central portion of the susceptor 310 The area may sag downward. In this case, a distance between the substrate W seated on the susceptor 310 and the shower head 3220 may be changed, thereby deteriorating the quality of the thin film deposited on the substrate W.
  • susceptor auxiliary support bars 3400A and 3400B supporting the lower surface of the susceptor 310 may be provided.
  • the lower end of the susceptor auxiliary support bars 3400A and 3400B may be connected to a second elevating plate 3440 moving up and down.
  • the plurality of susceptor auxiliary support bars 3400A and 3400B support the lower surface of the susceptor 310, wherein the susceptor support bar 320 is spaced apart by a predetermined distance from the susceptor 310, It supports the lower surface.
  • the plurality of susceptor auxiliary support bars 3400A and 3400B are symmetrically arranged around the susceptor support bar 320 to prevent the susceptor 310 from being inclined in either direction. It is preferable to support the susceptor 310.
  • the lower ends of the plurality of susceptor auxiliary support bars 3400A and 3400B extend through the second through hole 127 (see FIG. 11) of the base 121 of the chamber 100, and the It is sealed by the second bellows units 3410A and 3410B outside the chamber 100.
  • the second bellows units 3410A, 3410B surround the susceptor auxiliary support bars 3400A, 3400B, and the fourth bellows 3420A, 3420B sealing the chamber 100, and the fourth bellows ( 3420A, 3420B) and the lower end of the susceptor auxiliary support bars 3400A, 3400B are connected, and may include a second elevating plate 3440 that moves up and down.
  • the lower end of the susceptor auxiliary support bars 3400A, 3400B and the lower end of the fourth bellows 3420A, 3420B may be connected to the second elevating plate 3440, whereby inside the chamber 100 It can maintain the vacuum state.
  • first elevating plate 700 and the second elevating plate 3440 are illustrated as separate members, but may be integrally formed.
  • the susceptor support bar 320 and the susceptor auxiliary support bars 3400A and 3400B are raised and lowered together. can do.
  • the second elevating plate 3440 is connected to a driving source (not shown) such as a motor and moves up and down, and accordingly, the susceptor auxiliary support bars 3400A and 3400B also move up and down.
  • a driving source such as a motor and moves up and down, and accordingly, the susceptor auxiliary support bars 3400A and 3400B also move up and down.
  • gas or powder may remain inside the chamber 100.
  • the powder when the powder remains inside the chamber 100, it may be attached to a thin film deposited on the substrate to become particles.
  • the substrate processing apparatus 3000 according to the present invention may include an exhaust unit 800 to exhaust such gas or powder to the outside of the chamber 100.
  • the exhaust unit 800 may include at least one chamber exhaust channel 810 and 820 and at least one pumping unit (not shown) connected to the chamber exhaust channel 810 and 820. Description of the exhaust unit 800 is similar to the above-described embodiment, so repeated description is omitted.
  • gas or powder, etc. which may be generated during the processing process for the substrate W, is provided through a gap between the edge of the second through hole 127 and the outer surfaces of the susceptor auxiliary support bars 3400A and 3400B.
  • the fourth bellows 3420A and 3420B may be introduced inside.
  • the gap is not substantially large, but a sufficient gap is formed for the powder or the like to flow into the fourth bellows 3420A and 3420B.
  • the gas introduced into the fourth bellows 3420A and 3420B may form foreign substances such as powder therein.
  • Powder or the like introduced into the fourth bellows 3420A, 3420B or generated inside the fourth bellows 3420A, 3420B is accumulated under the inner side of the fourth bellows 3420A, 3420B.
  • the fourth bellows 3420A and 3420B may be bent due to vertical stretching or contraction of the fourth bellows 3420A and 3420B.
  • Foreign matter accumulated in the region or foreign matter accumulated on the bottom of the fourth bellows 3420A and 3420B may be scattered and spread through the second through hole 127 into the chamber 100. These foreign substances act as particles on the thin film deposited on the substrate W, thereby deteriorating the quality of the thin film.
  • the distance between the edge of the second through hole 127 and the outer surfaces of the susceptor auxiliary support bars 3400A and 3400B is not substantially large, and the chamber exhaust passages 810 and 820 are the chamber 100. Since it is disposed biased on one side of the base 121, even when the exhaust unit 800 is provided, it is extremely difficult to pump and discharge the powder accumulated inside the fourth bellows 3420A, 3420B.
  • At least one third bellows exhaust passage 1710, 1720 connected to the above-described second bellows units 3410A, 3410B is provided to exhaust gas through the second through hole 127.
  • powder or the like is prevented from accumulating inside the fourth bellows 3420A and 3420B.
  • the above-mentioned fourth bellows 3420A, 3420B are contracted or extended up and down when the susceptor auxiliary support bars 3400A, 3400B move up and down, and the susceptor auxiliary support bars 3400A, 3400B While allowing the movement of the susceptor auxiliary support bar (3400A, 3400B) surrounding the sealing to maintain the sealing state of the second through hole (127).
  • the exhaust flow path is connected to a fixed element rather than a moving component such as a bellows.
  • a third fixing portion 1210, 1220 is provided between the upper portion of the fourth bellows 3420A, 3420B and the lower surface of the chamber 100, and is connected to the third fixing portion 1210, 1220.
  • At least one third bellows exhaust passage 1710 and 1720 through which gas is discharged may be provided.
  • FIG. 10 is a perspective view showing the third fixing part 1210 and the fourth bellows 3420A.
  • the upper ends of the third fixing parts 1210 and 1220 are connected to the lower surface of the chamber 100, and the lower ends of the third fixing parts 1210 and 1220 are the fourth bellows. It is connected to the upper ends of (3420A, 3420B). At this time, the lower ends of the fourth bellows 3420A and 3420B are connected to the second elevating plate 3440.
  • a driving means is connected to the second elevating plate 3440 to move the second elevating plate 3440 up and down, and the susceptor auxiliary support bars 3400A and 3400B move up and down together. do.
  • the susceptor auxiliary support bars 3400A and 3400B move up and down
  • the fourth bellows 3420A and 3420B stretch and contract
  • the third fixing parts 1210 and 1220 are the susceptor.
  • the auxiliary support bars 3400A and 3400B move up and down, they are fixed without positional changes or deformations.
  • a fifth connection hole 1216 may be formed in the third fixing parts 1210 and 1220, and the third bellows exhaust passages 1710 and 1720 may be connected to the fifth connection hole 1216.
  • the third fixing parts 1210 and 1220 may be easily connected when the third bellows exhaust flow paths 1710 and 1720 correspond to fixed components that are not moving components. Furthermore, a bending load or the like does not act on the third bellows exhaust passages 1710 and 1720, thereby reducing the possibility of damage or damage to the third bellows exhaust passages 1710 and 1720.
  • the third bellows exhaust passages 1710 and 1720 may be connected to side surfaces of the third fixing parts 1210 and 1220.
  • the third bellows exhaust passages 1710 and 1720 are illustrated as being connected to the third fixing parts 1210 and 1220, respectively, but are not limited thereto. That is, the number and connection positions of the third bellows exhaust passages 1710 and 1720 may be appropriately modified.
  • the third bellows exhaust passages 1710 and 1720 may be connected to the chamber exhaust passages 810 and 820. Accordingly, when the gas or powder inside the chamber 100 is pumped through the chamber exhaust passages 810 and 820, the pumping force of the chamber exhaust passages 810 and 820 is the third bellows exhaust passage ( 1710, 1720), the residual gas or powder inside the fourth bellows 3420A, 3420B may be pumped together to be exhausted.
  • connection hole 1216 is not illustrated in FIG. 11, it may be formed to be inclined toward the upper portion or toward the second through hole 127.
  • the third bellows exhaust passages 1710 and 1720 are not connected to the chamber exhaust passages 810 and 820, and the third bellows exhaust passages 1710 and 1720 and the chamber exhaust passages 810 and 820 are respectively. It may be connected to a separate pumping unit (not shown). In this case, at least one of the separate pumping parts may have a different pumping force compared to other pumping parts.
  • the pumping force of the bellows pumping part (not shown) connected to the third bellows exhaust passages 1710 and 1720 and the chamber pumping part (not shown) connected to the chamber exhaust passages 810 and 820 are different. Can be adjusted.
  • the pumping force of the gas exhausted toward the lower portion of the chamber 100 is strengthened by the bellows pumping unit to prevent back flow of powder or the like inside the bellows back into the chamber 100.
  • the third bellows exhaust passages 1710 and 1720 may have a smaller cross-sectional area than the chamber exhaust passages 810 and 820. By reducing the cross-sectional area of the third bellows exhaust passages 1710 and 1720, the internal pressure of the third bellows exhaust passages 1710 and 1720 is lower than that of the chamber exhaust passages 810 and 820, thereby improving pumping efficiency. I can do it.
  • the configuration of the above-described chamber exhaust passages 810 and 820 may be omitted when the third bellows exhaust passages 1710 and 1720 are directly connected to the pumping unit. That is, when a large pumping capacity is not required when exhausting the internal gas or the like of the chamber 100, the gas inside the chamber 100 is exhausted using only the third bellows exhaust passages 1710 and 1720. Can be.
  • the gap between the edge of the second through hole 127 and the outer surfaces of the susceptor auxiliary support bars 3400A and 3400B is widened to increase pumping efficiency by the third bellows exhaust passages 1710 and 1720. Gas or the like inside the chamber 100 may be more smoothly exhausted.
  • Figure 12 shows a substrate processing apparatus 4000 according to another embodiment.
  • the same reference numerals are used for the same components.
  • the second bellows units 3410A and 3410B are fifth bellows connected to the lower surfaces of the second elevating plates 3440A 'and 3440B' ( 4430A, 4430B), and a second auxiliary plate 4440 connected to a lower end of the fifth bellows 4430A, 4430B and supported by a second support bar 4610 connected to the lower portion of the chamber 100. can do.
  • the fourth bellows 3420A, 3420B and the fifth bellows 4430A, 4430B may be sequentially arranged under the chamber 100 to be stretched and contracted in the vertical direction.
  • the upper end of the fourth bellows 3420A, 3420B may be connected to the lower surface of the chamber 100, respectively, and the lower end of the fourth bellows 3420A, 3420B may include the second elevating plate 3440A ', 3440B ').
  • upper ends of the fifth bellows 4430A and 4430B are respectively connected to lower surfaces of the second elevating plates 3440A 'and 3440B', and lower ends of the fifth bellows 4430A and 4430B are the second auxiliary plates. (4440) respectively.
  • the second auxiliary plate 4440 is supported and fixed by a second support bar 4610 extending downward from the lower surface of the chamber 100.
  • FIG. 13 is a perspective view showing the fourth bellows 3420A and the fifth bellows 4430A
  • FIG. 14 is a plan view showing the second elevating plate 3440A '.
  • the second elevating plates 3440A 'and 3440B' are illustrated as separate members, but are not limited thereto, and may be formed as one member.
  • the second elevating plate is formed of a single member, only one driving means for elevating and descending the second elevating plate may be provided.
  • lower ends of the susceptor auxiliary support bars 3400A and 3400B are respectively connected to the second elevating plates 3440A 'and 3440B', and on one side of the second elevating plates 3440A 'and 3440B'.
  • An extension portion 4705 may be provided to connect the extension portion 4705 to a driving means (not shown).
  • the susceptor auxiliary support bars 3400A and 3400B can move up and down together. have.
  • the second elevating plate (3440A ', 3440B') is a communication hole (4710, 4720) communicating the inner space of the fourth bellows (3420A, 3420B) and the inner space of the fifth bellows (4430A, 4430B). ) May be formed.
  • the communication holes 4710 and 4720 may be formed between the fourth bellows 3420A and 3420B and the susceptor auxiliary support bars 3400A and 3400B, although two communication holes are illustrated in the drawing. The number and shape of holes can be appropriately modified.
  • the inner spaces of the fourth bellows 3420A, 3420B and the inner spaces of the fifth bellows 4430A, 4430B are communicated by the communication holes 4710, 4720. Therefore, as described later, when exhausting gas or powder or the like through the lower ends of the fifth bellows 4430A, 4430B, the inner space of the fourth bellows 3420A, 3420B, the communication holes 4710, 4720, and Gas or the like may be exhausted through the inner space of the fifth bellows 4430A and 4430B. This will be discussed later.
  • the fifth bellows 4430A together with the third fixing parts 1210 and 1220 connecting the upper ends of the fourth bellows 3420A and 3420B and the lower surface of the chamber 100. , 4430B) may further include fourth fixing parts 1230 and 1240 connecting the lower part and the second auxiliary plate 4440.
  • the third fixing portion 1210, 1220 and the fourth fixing portion 1230, 1240 may have a substantially cylindrical shape with the upper and lower portions open as illustrated in the drawing.
  • the upper ends of the third fixing parts 1210 and 1220 are connected to the lower surface of the chamber 100, and more specifically, the lower surface of the chamber 100 outside the second through hole 127 (see FIG. 15). Can be connected to.
  • the lower ends of the third fixing parts 1210 and 1220 are connected to the upper ends of the fourth bellows 3420A and 3420B.
  • the susceptor auxiliary support bars 3400A, 3400B are inserted into the third fixing parts 1210, 1220 and the fourth bellows 3420A, 3420B, and the second lifting plate 3440A 'described above. , 3440B ').
  • the upper end of the fourth fixing part 1230 and 1240 is connected to the lower end of the fifth bellows 4430A and 4430B, and the lower end of the fourth fixing part 1230 and 1240 is the second auxiliary plate 4440 ).
  • the fourth elevating plate (3440A ', 3440B') for the elevating movement of the susceptor auxiliary support bars (3400A, 3400B) moves up and down.
  • Bellows (3420A, 3420B) and fifth bellows (4430A, 4430B) are contracted and stretched, and the third fixing part (1210, 1220) and the fourth fixing part (1230, 1240) described above are shifted or deformed. Can be fixed without.
  • the third fixing parts 1210 and 1220 and the fourth fixing parts 1230 and 1240 located at the upper end of the fourth bellows 3420A and 3420B and the lower end of the fifth bellows 4430A and 4430B respectively include chambers ( 100) is connected to the lower surface and the second auxiliary plate 4440 to maintain a fixed position.
  • At least one fourth bellows exhaust passage 1730 and 1740 through which the gas is exhausted may be further connected to the fourth fixing parts 1230 and 1240.
  • the third bellows exhaust passages 1710, 1720 connected to the third fixing parts 1210, 1220, and the fourth bellows exhaust passages connected to the fourth fixing parts 1230, 1240 (1730, 1740) may be provided.
  • the third bellows exhaust passages 1710 and 1720 are connected to side surfaces of the third fixing parts 1210 and 1220, and the fourth bellows exhaust passages 1730 and 1740 are the fourth fixing parts 1230 , 1240).
  • the third fixing portion 1210, 1220 is omitted, it is also possible to have a configuration having only the fourth fixing portion 1230, 1240. In this case, only the fourth bellows exhaust passages 1730 and 1740 connected to the side surfaces of the fourth fixing parts 1230 and 1240 are provided.
  • a description will be given assuming that both the third fixing parts 1210 and 1220 and the fourth fixing parts 1230 and 1240 are provided.
  • a fifth connection hole 1216 connected to the third bellows exhaust passages 1710 and 1720 may be provided at the third fixing parts 1210 and 1220.
  • a sixth connection hole 1218 (see FIG. 15) connected to the fourth bellows exhaust passages 1730 and 1740 may be provided at the fourth fixing parts 1230 and 1240.
  • the third bellows exhaust passages 1710 and 1720 and the fourth bellows exhaust passages 1730 and 1740 are opposite to each other centering on the central portion of the fourth bellows 3420A and 3420B or the fifth bellows 4430A and 4430B. It may be arranged symmetrically in the direction, the present invention is not limited to this and can be appropriately modified.
  • the third bellows exhaust passage 1710 and the second bellows exhaust passage 1730 ′ are in a straight line around the center of the fourth bellows 3420A, 3420B or the fifth bellows 4430A, 4430B. It can be arranged in a staggered manner without being arranged.
  • the third bellows exhaust passages 1710 and 1720 and the fourth bellows exhaust passages 1730 and 1740 may be connected to the aforementioned chamber exhaust passages 810 and 820.
  • the total number of the third bellows exhaust passages 1710 and 1720 and the fourth bellows exhaust passages 1730 and 1740 is provided to correspond to the number of the chamber exhaust passages 810 and 820, so that the third Bellows exhaust passages 1710 and 1720 and fourth bellows exhaust passages 1730 and 1740 may be connected to the chamber exhaust passages 810 and 820, respectively.
  • the third bellows exhaust passages (1710, 1720) and the fourth bellows exhaust passages (1730, 1740) may be appropriately connected to the chamber exhaust passages (810, 820) disposed in close positions.
  • two or more bellows exhaust flow paths may be connected to one flow path of the chamber exhaust flow paths 810 and 820.
  • the third bellows exhaust passages 1710 and 1720 and the fourth bellows exhaust passages 1730 and 1740 may have a smaller cross-sectional area than the chamber exhaust passages 810 and 820.
  • the third bellows exhaust passages 1710, 1720 and the fourth bellows exhaust passages 1730, 1740 Pumping efficiency can be improved by making the internal pressure lower than the chamber exhaust passages 810 and 820.
  • FIG. 12 shows an embodiment in which the third bellows exhaust passages 1710 and 1720 and the fourth bellows exhaust passages 1730 and 1740 are connected to the aforementioned chamber exhaust passages 810 and 820, but the present invention It is not limited to this.
  • the third bellows exhaust passages 1710 and 1720 and the fourth bellows exhaust passages 1730 and 1740 are not connected to the chamber exhaust passages 810 and 820, and the third bellows exhaust passages 1710 and 1720 And the fourth bellows exhaust passages 1730 and 1740 and the chamber exhaust passages 810 and 820 may be respectively connected to separate pumping parts (not shown), in which case at least one of the separate pumping parts has a different pumping force.
  • a bellows pumping part (not shown) connected to the third bellows exhaust passages 1710 and 1720 and a fourth bellows exhaust passage 1730 and 1740 and a chamber connected to the chamber exhaust passages 810 and 820
  • the pumping force of the pumping unit can be adjusted differently.
  • the aforementioned chamber exhaust passages 810 and 820 The configuration can be omitted. That is, when a large pumping capacity is not required when exhausting the internal gas or the like of the chamber 100, only the third bellows exhaust passages 1710 and 1720 and the fourth bellows exhaust passages 1730 and 1740 are used. It may be configured to exhaust the gas inside the chamber 100.
  • the distance between the edge of the second through hole 127 and the outer surfaces of the susceptor auxiliary support bars 3400A and 3400B is widened to thereby reduce the third bellows exhaust passages 1710 and 1720 and the fourth bellows exhaust passage (
  • the pumping efficiency of 1730 and 1740 may be increased to allow gas and the like inside the chamber 100 to be more smoothly exhausted.
  • the bellows exhaust flow path for exhausting gas inside the fourth bellows 3420A, 3420B and the fifth bellows 4430A, 4430B penetrates through the second auxiliary plate 4440 to It may be connected directly to the lower portion of the fifth bellows 4430A, 4430B. Even in this case, the bellows exhaust flow path is fixed and connected through the second auxiliary plate 4440, which does not move.
  • the gas or the like inside the chamber 100 includes the above-described second through holes 127, fourth bellows 3420A, 3420B, communication holes 4710, 4720, and fifth bellows 4430A, 4430B. Through the second auxiliary plate 4440 may be exhausted through the bellows exhaust passage connected to.
  • 15 is a side cross-sectional view showing the exhaust flow inside the fourth bellows 3420A and the fifth bellows 4430A when the third bellows exhaust passage 1710 and the fourth bellows exhaust passage 1730 are provided.
  • gas or powder introduced into the fourth bellows 3420A through the second through hole 127 inside the chamber 100 is connected to the third fixing part 1210. 3 may be exhausted through the bellows exhaust passage 1710.
  • the powder or the like may be exhausted and removed by the fourth bellows exhaust passage 1730 connected to the second fixing part 1230.
  • FIG. 16 illustrates an exhaust flow inside the fourth bellows 3420A and the fifth bellows 4430A when the third bellows exhaust passage 1710 and the fourth bellows exhaust passage 1730 are provided according to another embodiment. It is a side sectional view showing.
  • the same reference numerals are used for the same components as in FIG.
  • the sixth connection hole 1316 to which the third bellows exhaust flow path 1710 and the third fixing part 1210 are connected is formed to be inclined at a predetermined angle ⁇ 3 You can.
  • the sixth connection hole 1316 may be formed to be inclined toward the upper portion or toward the second through hole 127 as illustrated in the drawing.
  • the gas or powder flowing into the inside of the fourth bellows 3420A through the second through hole 127 is connected to the sixth connection hole 1316.
  • the third bellows exhaust passage 1710 can be more effectively evacuated and removed.
  • connection hole 1318 to which the fourth bellows exhaust passage 1730 and the second fixing part 1230 are connected may also be formed by being inclined at a predetermined angle ⁇ 4 .
  • the seventh connection hole 1318 may be formed to be inclined toward the bottom or toward the second auxiliary plate 4440 as illustrated in the drawing.
  • the seventh connection hole 1318 When the seventh connection hole 1318 has the above-described configuration, it flows into the inside of the fifth bellows 4430A through the communication holes 4710 and 4720 and accumulates on the upper surface of the second auxiliary plate 4440. The powder, etc., can be more effectively exhausted and removed by the seventh connection hole 1318 and the fourth bellows exhaust passage 1730.
  • the seventh connection hole 1318 may be formed by being inclined toward the top. In this case, gas or powder flowing into the inside of the fifth bellows 4430A through the communication holes 4710 and 4720 is connected to the seventh connecting hole 1318 and the fourth bellows exhaust passage 1730. Exhaust can be removed immediately.
  • FIG. 17 is a side cross-sectional view illustrating a substrate processing apparatus 5000 according to another embodiment.
  • the same reference numerals were used for the same components as compared with FIG. 9.
  • the substrate processing apparatus 5000 penetrates a mask 5600 mounted on an upper portion of the substrate W and a through hole formed in a lower surface of the chamber 100, and the mask 5600.
  • a substrate is deposited in order to deposit a material deposited on the substrate W in a predetermined pattern.
  • a mask 5600 positioned at the top may be used.
  • the mask support bars 5620A and 5620B that move up and down through the third through hole 128 formed in the lower surface of the chamber 100, and the mask support A third elevating plate 5490 connected to the lower end of the bars 5620A and 5620B and moving up and down may be provided.
  • the plurality of mask support bars 5620A and 5620B support the lower surface of the mask 5600. At this time, the lower end of the plurality of mask support bars 5620A, 5620B extends through the third through hole 128 of the base 121 of the chamber 100, and the third from the outside of the chamber 100. It is sealed by the bellows units 5410A, 5410B.
  • the third bellows units 5410A, 5410B surround the mask support bars 5620A, 5620B, and seal the sixth bellows 5480A, 5480B, and the sixth bellows 5480A, 5480B) and a lower end of the mask support bars 5620A and 5620B are connected, and a third elevating plate 5490 moving up and down may be provided.
  • the lower end of the mask support bar 5620A, 5620B and the lower end of the sixth bellows 5480A, 5480B can be connected to the third elevating plate 5490, thereby vacuuming the chamber 100. You can keep it.
  • it may be provided with at least one fifth bellows exhaust passages 1750 and 1760 connected to the third bellows units 5410A and 5410B to exhaust gas.
  • a fifth fixing portion 1260A, 1260B is provided between the upper portion of the sixth bellows 5480A, 5480B and the lower surface of the chamber 100, and is connected to the fifth fixing portion 1260A, 1260B At least one fifth bellows exhaust passage 1750 and 1760 through which gas is discharged may be provided.
  • the upper end of the fifth fixing unit (1260A, 1260B) is connected to the lower surface of the chamber 100
  • the lower end of the fifth fixing unit (1260A, 1260B) is the upper end of the sixth bellows (5480A, 5480B) It is connected with.
  • the lower ends of the sixth bellows 5480A, 5480B are connected to the third elevating plate 5490.
  • a fifth fixing part 1260A, 1260B is connected to an upper end of the sixth bellows 5480A, 5480B, and the fifth bellows exhaust passage 1750 is connected to the fifth fixing part 1260A, 1260B. 1760), but is not limited thereto.
  • the third bellows unit 5410A, 5410B has a sixth bellows exhaust flow path connected to a sixth fixed part (not shown) and a separate sixth fixed part (not shown) similar to the embodiment of FIG. 12. (Not shown) may be further provided.
  • the third bellows unit 5410A, 5410B omits the fifth fixing part, and a sixth bellows exhaust passage (not shown) connected to a sixth fixing part (not shown) and a sixth fixing part at the bottom. City).
  • the susceptor 310 is configured to move up and down by a susceptor support bar 320.
  • the susceptor support bar 320 extends through the first through hole 124 of the base 121 of the chamber 100 by the susceptor bellows 330 at the bottom of the chamber 100. It is sealed.
  • a bellows exhaust flow path (not shown) that exhausts through the first through hole 124 through which the susceptor support bar 320 passes may be further provided.
  • the bellows exhaust flow path may be configured to exhaust gas, for example, through the first through hole 124 and the susceptor bellows 330. That is, it is also possible to add the configuration of the first bellows unit 460 described in the embodiment of FIG. 1 to the embodiments of FIGS. 9 and 17.
  • the substrate processing apparatus is a gas through other holes (not shown) formed in the base 121 of the chamber 100 in addition to the holes through which the susceptor support bar, the susceptor auxiliary support bar and the mask support bar pass through. It may be further provided with an exhaust flow path for exhausting.
  • the exhaust passage may be connected by having fixing parts (not shown) on at least one of the upper and lower portions of the bellows unit.
  • the powder inside the bellows connected to the lower surface of the chamber can be removed, thereby preventing particles from adhering to the thin film due to powder scattering when the susceptor or the mask moves up and down.
  • the bellows exhaust passage when connecting the bellows exhaust passage, it is formed on the lower surface of the chamber and connected to a fixed portion without movement, thereby extending the life of the bellows exhaust passage and reducing damage and damage.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

La présente invention concerne un appareil de traitement de substrat, et plus particulièrement un appareil de traitement de substrat qui est susceptible de réduire l'adhérence de particules à un film mince en raison de la dispersion, lorsqu'un suscepteur se déplace vers le haut et vers le bas, d'une poudre, etc., accumulée à l'intérieur d'un soufflet relié à une surface inférieure d'une chambre.
PCT/KR2019/012789 2018-10-30 2019-10-01 Appareil de traitement de substrat Ceased WO2020091239A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201980060603.1A CN112740387A (zh) 2018-10-30 2019-10-01 基板处理装置

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KR1020180130385A KR102119396B1 (ko) 2018-10-30 2018-10-30 기판처리장치
KR10-2018-0130385 2018-10-30
KR10-2018-0146501 2018-11-23
KR1020180146501A KR102121799B1 (ko) 2018-11-23 2018-11-23 기판처리장치

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WO2020091239A1 true WO2020091239A1 (fr) 2020-05-07

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Cited By (1)

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CN118231330A (zh) * 2024-05-24 2024-06-21 上海陛通半导体能源科技股份有限公司 具有气动式升降机构的半导体设备

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JPH11302829A (ja) * 1998-04-16 1999-11-02 Ebara Corp 真空装置の真空室汚染防止装置
KR20040085983A (ko) * 2003-04-02 2004-10-08 (주)네스디스플레이 마스크 얼라인 챔버
KR20070080536A (ko) * 2006-02-07 2007-08-10 주식회사 에스에프에이 평면디스플레이용 화학 기상 증착장치
JP2010245564A (ja) * 2002-01-10 2010-10-28 Tokyo Electron Ltd 処理装置
US20180305816A1 (en) * 2015-04-28 2018-10-25 Hitachi Kokusai Electric Inc. Substrate processing apparatus

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JP2677913B2 (ja) * 1991-05-13 1997-11-17 三菱電機株式会社 半導体製造装置のシール機構および半導体装置の製造方法
JP3350278B2 (ja) * 1995-03-06 2002-11-25 大日本スクリーン製造株式会社 基板処理装置
KR100422199B1 (ko) * 2001-05-04 2004-03-12 주성엔지니어링(주) 반도체 소자 제조장치
CN100409424C (zh) * 2005-04-26 2008-08-06 大日本网目版制造株式会社 基板处理装置
KR101104064B1 (ko) * 2009-08-13 2012-01-12 주식회사 테스 기판 처리 장치

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Publication number Priority date Publication date Assignee Title
JPH11302829A (ja) * 1998-04-16 1999-11-02 Ebara Corp 真空装置の真空室汚染防止装置
JP2010245564A (ja) * 2002-01-10 2010-10-28 Tokyo Electron Ltd 処理装置
KR20040085983A (ko) * 2003-04-02 2004-10-08 (주)네스디스플레이 마스크 얼라인 챔버
KR20070080536A (ko) * 2006-02-07 2007-08-10 주식회사 에스에프에이 평면디스플레이용 화학 기상 증착장치
US20180305816A1 (en) * 2015-04-28 2018-10-25 Hitachi Kokusai Electric Inc. Substrate processing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118231330A (zh) * 2024-05-24 2024-06-21 上海陛通半导体能源科技股份有限公司 具有气动式升降机构的半导体设备

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