WO2022185970A1 - 半導体レーザ装置 - Google Patents
半導体レーザ装置 Download PDFInfo
- Publication number
- WO2022185970A1 WO2022185970A1 PCT/JP2022/006960 JP2022006960W WO2022185970A1 WO 2022185970 A1 WO2022185970 A1 WO 2022185970A1 JP 2022006960 W JP2022006960 W JP 2022006960W WO 2022185970 A1 WO2022185970 A1 WO 2022185970A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor laser
- light
- reducing member
- reflection reducing
- package
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/02208—Mountings; Housings characterised by the shape of the housings
- H01S5/02216—Butterfly-type, i.e. with electrode pins extending horizontally from the housings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/031—Multipass arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
- H01S5/0064—Anti-reflection components, e.g. optical isolators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/02218—Material of the housings; Filling of the housings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
- G01N2201/06113—Coherent sources; lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/02—ASE (amplified spontaneous emission), noise; Reduction thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02415—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling by using a thermo-electric cooler [TEC], e.g. Peltier element
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/06804—Stabilisation of laser output parameters by monitoring an external parameter, e.g. temperature
Definitions
- the present invention relates to a semiconductor laser device.
- unnecessary light emitted from the rear facet of the semiconductor laser element is reflected inside the package and becomes stray light, and is emitted from the light exit surface of the semiconductor laser element, and is emitted outside the package together with light used for analysis. may appear in In such a case, interference occurs between the light emitted from the light exit surface and the stray light. Therefore, if the interference between these two types of light changes, the laser light output from the package to the outside is reduced. There is a problem that the intensity fluctuates.
- Patent Document 1 in the method of applying black resin to the inner surface of the package, it is difficult to apply the resin uniformly, and the thickness of the applied resin tends to be uneven. If the thickness of the resin becomes non-uniform, the amount of light absorbed by the resin varies, so the degree of stray light generation varies among semiconductor laser devices. Further, if the thickness of the resin varies, the amount of resin applied also varies. When the amount of resin applied changes, the total amount of resin placed in the package changes, so the heat capacity that affects the temperature inside the package and the amount of degassing generated from the resin change.
- the intensity and oscillation wavelength of the laser light output from the package to the outside vary depending on the temperature inside the package, etc., if the amount of resin applied varies as described above, the intensity of the laser light output from the semiconductor laser device will increase.
- the inventors of the present invention have noticed that there is a problem that individual differences in the oscillation wavelength of each semiconductor laser device become large. SUMMARY OF THE INVENTION The present invention has been made in view of such problems. The aim is to reduce as much as possible.
- a semiconductor laser device is a semiconductor laser device used for optical analysis, comprising: a package containing a semiconductor laser element; A light reflection reducing member for suppressing reflection is provided, and the light reflection reducing member is adhered to the inner surface of the package.
- the light reflection reducing member after molding is adhered to the inner surface of the package, it is easy to control the thickness of the light reflection reducing member.
- variations in the thickness or amount of the light reflection reducing member disposed in the package are suppressed among the semiconductor laser devices 100, and individual differences in the intensity and oscillation wavelength of the output laser light are reduced. It can be suppressed to a level that does not pose a problem even in applications that require high analytical accuracy.
- the semiconductor laser element has a light exit surface that emits light and a rear end surface that is an end surface opposite to the light exit surface, and the light reflection reducing member is the inner surface of the package. If the semiconductor laser device is arranged so as to cover the range irradiated with the light emitted from the rear facet of the semiconductor laser device, the light emitted from the rear facet of the semiconductor laser device may be reflected within the package and become stray light. can be effectively suppressed.
- the package includes a box with an open top and a lid that seals the opening, and the light reflection reducing member is provided on the inner surface of the lid and/or the inner surface of the box that faces the rear end surface. is preferably adhered to.
- the surface of the light reflection reduction member facing the rear end surface is arranged obliquely with respect to the light exit surface, the light is slightly reflected by the light reflection reduction member. Also, the reflected light can be prevented from going outside together with the light emitted from the light exit surface.
- a specific example of the light reflection reducing member is a black film-like member containing a light absorbing substance and a binder that binds the light absorbing substances together.
- the amount of light absorbed by the resin due to the presence of the light reflection reducing member in the package and the effect on the temperature are made uniform as much as possible, and individual differences in the intensity of the output laser light are eliminated for each semiconductor laser device.
- the difference between the maximum thickness and the minimum thickness of the film may be 10% or less of the average thickness of the film.
- the light reflection reducing member is adhered to the inner surface of the package, it is easy to control the thickness of the light reflection reducing member. As a result, variations in the thickness of the light reflection reducing member disposed in the package can be suppressed, so that individual differences in the intensity of the output laser light from one semiconductor laser device to another can be detected even in applications requiring high analysis accuracy. It can be kept as small as possible without causing a problem.
- FIG. 1 is an overall schematic diagram of a gas analyzer using a semiconductor laser device according to an embodiment of the present invention
- FIG. 1 is a plan view schematically showing the overall configuration of a semiconductor laser device according to an embodiment
- FIG. FIG. 2 is a perspective view schematically showing the overall configuration of the semiconductor laser device according to the present embodiment with the lid removed (wiring is omitted)
- 1 is a cross-sectional view schematically showing the overall configuration of a semiconductor laser device according to an embodiment
- FIG. 4 is a graph showing the spectrum of the semiconductor laser device according to the embodiment
- FIG. 5 is a plan view schematically showing the overall configuration of a semiconductor laser device according to another embodiment of the present invention
- FIG. 10 is a perspective view schematically showing the overall configuration of a semiconductor laser device according to another embodiment of the present invention with the lid removed (wiring is omitted);
- the semiconductor laser device 100 is capable of measuring, for example, a component to be measured in gas (for example, nitrides such as CO, CO 2 , H 2 O, NO, NO 2 , N 2 O, NH 3 , etc.). , CH 4 , C 2 H 6 and other hydrocarbon components and oxygen-containing hydrocarbon components such as HCHO) by optical analysis.
- the gas analyzer 10 includes a multi-reflection type measurement cell 11 into which gas is introduced, a semiconductor laser device 100 that irradiates the measurement cell 11 with a laser beam X, and a laser beam X that has passed through the measurement cell 11.
- the measurement cell 11 is not limited to a multi-reflection type, and may be a single-reflection type or a one-pass type that does not use reflection.
- This gas analyzer can analyze various gases, and can also be used, for example, to analyze exhaust gas emitted from an internal combustion engine or a flue.
- the semiconductor laser device 100 emits a laser beam X having an oscillation wavelength including the absorption wavelength of the component to be measured.
- a temperature detection element 3 for detecting the temperature of the semiconductor laser element 2 and the temperature detection element 3;
- a cooling mechanism 4 for cooling the semiconductor laser element 2; 4, and
- a package 6 for accommodating them.
- the semiconductor laser element 2 is, for example, a distributed feedback laser (DFB laser) that emits a laser beam X having an infrared wavelength. It is a quantum cascade laser that emits light by optical transitions between subbands formed in wells.
- the semiconductor laser element 2 has, for example, a rectangular parallelepiped shape, and includes a light exit surface 21 for emitting light and a rear end surface 22 opposite to the light exit surface 21 .
- the temperature detection element 3 detects the temperature of the semiconductor laser element 2 by detecting the temperature of the submount 5 on which the semiconductor laser element 2 is mounted.
- the temperature detection element 3 of this embodiment is a thermistor, and is provided near the semiconductor laser element 2 in order to reduce the temperature difference with the semiconductor laser element 2 .
- the temperature detection element 3 in FIG. 2 is provided on the side of the semiconductor laser element 2, it may be provided at another position.
- the cooling mechanism 4 is configured using a Peltier element, and its upper surface is a heat absorbing surface. A submount 5 is provided in contact with the heat absorbing surface.
- This cooling mechanism 4 is controlled by a control unit COM that acquires the temperature detected by the temperature detection element 3 .
- the control unit COM uses the temperature detected by the temperature detection element 3 to control the power supplied to the Peltier element so that the temperature detected by the temperature detection element 3 becomes a desired temperature.
- the submount 5 is a ceramic substrate such as aluminum nitride (AlN) or silicon carbide (SiC).
- a semiconductor laser element 2 and a temperature detection element 3 are provided on the upper surface of the submount 5 .
- Metal layers 51 , 52 , 53 , 54 and 55 electrically connected to the elements 2 and 3 are formed on the upper surface of the submount 5 .
- the package 6 includes a bottom plate and side walls provided around the bottom plate, in which the semiconductor laser element 2 and the like are accommodated.
- a butterfly package is used as an example of the package 6, and the package 6 in this case comprises, for example, a box 61 with an open top and a lid 62 for sealing the opening.
- the box 61 has, for example, a square bottom plate and four side walls rising from the bottom plate to form a rectangular parallelepiped space in which the semiconductor laser element 2 and the like are accommodated.
- the lid body 62 is, for example, a plate-like body for sealing the opening formed in the box body 61 .
- a side wall of the package 6 facing the light exit surface 21 of the semiconductor laser element 2 is formed with a light lead-out portion 63 for leading the laser light X to the outside.
- An optical window member 64 is provided in the light lead-out portion 63, and the optical window member 64 is designed to prevent the laser beam X reflected by the optical window member 64 from returning to the semiconductor laser element 2 again. 2 degrees).
- a rectangular parallelepiped package has been described, but the package is not limited to this, and various shapes such as a cylindrical CAN type package can be used.
- the case where the light exit surface 21 of the semiconductor laser element 2 faces the side wall of the box 61 is described, but the light exit surface 21 is arranged so as to face the lid or the bottom plate. It is good also as what is arranged.
- the package 6 is provided with output terminals T1 and T2 for outputting the output of the temperature detection element 3 to the outside, and power supply terminals T3 and T4 for supplying power to the semiconductor laser element 2 .
- These output terminals T1, T2 and power supply terminals T3, T4 are arbitrarily determined depending on which of the temperature detection element 3 and the semiconductor laser element 2 is connected.
- the package 6 is also provided with power supply terminals T5 and T6 for supplying power to the Peltier elements of the cooling mechanism 4 .
- Wires L1 and L2 for temperature detection electrically connected to the temperature detection element 3 are connected to the output terminals T1 and T2. There are two output terminals T1 and T2. One output terminal T1 is connected to the wiring L1 connected to the metal layer 51 electrically connected to one electrode of the temperature detecting element 3, and the other output terminal is connected to the metal layer 51 electrically connected to one electrode. A wiring L2 electrically connected to the other electrode of the temperature detecting element 3 is connected to T2. These wirings L1 and L2 are gold wires, for example.
- Wirings L3 and L4 for the semiconductor laser element 2 electrically connected to the semiconductor laser element 2 are connected to the power supply terminals T3 and T4 of the semiconductor laser element 2 .
- One power supply terminal T3 is connected to a wiring L3 connected to a metal layer 52 electrically connected to one electrode of the semiconductor laser element 2, and the other power supply terminal is connected to the metal layer 52.
- a wiring L4 electrically connected to the other electrode of the semiconductor laser element 2 via the metal layer 53 is connected to T4.
- Peltier element wirings L5 and L6 electrically connected to the Peltier element are connected to power supply terminals T5 and T6 of the Peltier element.
- the semiconductor laser device 100 includes the light reflection reducing member 7 inside the package 6 that absorbs light and suppresses reflection of light.
- the light reflection reducing member 7 is adhered to the inner surface of the package 6 .
- the light reflection reducing member 7 absorbs light to reduce light reflection, and is in the form of a flat black film, for example.
- the light reflection reducing member 7 contains, for example, a light absorbing substance and a binder that binds the light absorbing substances together.
- light-absorbing substances include carbon black.
- binders include photosensitive materials composed of silicone resins, polyimides, and cyclized rubbers.
- the light-absorbing substance is not limited to organic substances such as carbon black, and may contain inorganic substances.
- the thickness of the light reflection reducing member 7 is preferably 0.5 ⁇ m or more from the viewpoint of sufficiently reducing light reflection, and preferably 5 ⁇ m or less from the viewpoint of reducing the manufacturing cost of the light reflection reducing member 7 .
- the thickness of the light reflection reducing member 7 is more preferably 1 ⁇ m or more and 4 ⁇ m or less.
- the thickness of the light reflection reducing member 7 is not limited to the range described above, and can be changed as appropriate depending on the application of the semiconductor laser device 100 and the intensity of light emitted from the rear facet 22 of the semiconductor laser element 2 .
- the thickness of the light reflection reducing member 7 is as uniform as possible. It is preferably 20% or less of the thickness, more preferably 10% or less.
- the light reflection reducing member 7 is, for example, as shown in FIG. Glued.
- This adhesive can be appropriately changed depending on the materials forming the light reflection reducing member 7 and the package 6, but in the case of the present embodiment, for example, a fluorine-containing adhesive or a silicon-containing It is preferable to use a silicon-based adhesive that
- the light reflection reducing member 7 is provided only in a range of the inner surface of the package 6 that receives the light emitted from the rear end surface 22 of the semiconductor laser element 2 .
- the range irradiated with the light emitted from the rear end face 22 of the semiconductor laser element 2 includes the range directly irradiated with the light emitted from the rear end face 22 of the semiconductor laser element 2 and the range irradiated with the light emitted from the rear end face 22 of the semiconductor laser element 2 . and the area illuminated after the light has been reflected.
- the package 6 of the present embodiment includes a box 61 for housing the semiconductor laser element 2 and the like, and a lid 62 capable of sealing an opening formed in the box 61 .
- the light reflection reducing member 7 is adhered to the surfaces of the box 61 and lid 62 that form the internal space (closed space) of the package 6 .
- the light emitted from the rear end face 22 of the semiconductor laser element 2 is irradiated to the inner side facing the rear end face 22 among the inner faces of the box 61 constituting the package 6.
- a light reflection reducing member 7 is adhered to the inner surface.
- the light reflection reducing member 7 absorbs the light emitted from the rear facet 22 of the semiconductor laser element 2, thereby suppressing the light from the rear facet 22 from being reflected within the package and becoming stray light. A part of the light irradiated to the reduction member 7 may be slightly reflected. Therefore, of the light reflection reducing member 7 , for example, the surface facing the rear end surface of the light reflection reducing member 7 provided on the inner side surface facing the rear end surface 22 of the semiconductor laser element 2 faces the light exit surface 21 . preferably obliquely arranged. In this embodiment, the flat film-like light reflection reducing member 7 is arranged to be inclined with respect to the light exit surface 21 of the semiconductor laser element 2 .
- the light reflection reducing member 7 irradiates the semiconductor laser element 2 and other sensors arranged in the package 6, it may affect the operation of the semiconductor laser element 2 and other sensors. There is Therefore, when arranging the light reflection reducing member 7 at an angle, for example, the light reflection reducing member should be arranged at an angle such that the reflected light is directed toward the other inner surface of the container constituting the package 6, the inner surface of the lid 62, or the like. 7 is preferred.
- a light reflection reducing member 7 arranged so as to face the rear end face of the semiconductor laser element 2 is attached so that the light reflected by the light reflection reducing member 7 is covered. It is arranged at an angle so as to face the inner surface of the body 62 .
- a portion (another inner side surface or the lid 62) irradiated with the reflected light reflected by the light reflection reducing member 7 It is preferable to dispose the light reflection reducing member 7 also on the inner surface).
- the inner surface of the lid 62 also reflects light so that it can receive the light reflected by the light reflection reducing member 7 arranged so as to face the rear end face 22 of the semiconductor laser element 2 .
- a reduction member 7 is arranged.
- These light reflection reducing members 7 are preferably formed separately and adhered to the inner surface of the box 61 and the inner surface of the lid 62, respectively.
- the semiconductor laser device 100 according to this embodiment can be manufactured, for example, by the following method and procedure.
- the light reflection reducing member 7 can be formed, for example, by spin-coating a resin material mixed with carbon black onto a silicon wafer and drying the resin material.
- a resin material mixed with carbon black for example, a mixture of carbon black, which is a light-absorbing substance, and a resin containing silicon dioxide, which is a binder, is pressed to form a film, which is then cut using a cutter or the like. It can be manufactured by stamping into the required shape.
- the light reflection reducing member 7 can be manufactured by adhering the light reflection reducing member 7 to the inner surfaces of the box 61 and the lid 62 where the light emitted from the rear end surface of the semiconductor laser element 2 is irradiated with an adhesive or the like. More specifically, an adhesive is applied to the inner surface of the box 61 and the inner surface of the lid 62 that constitute the package, the light reflection reducing member 7 manufactured as described above is adhered thereto, and the adhesive is dried.
- the thickness of the adhesive layer 8 formed planarly between the inner surface of the package and the light reflection reducing member 7 is adjusted.
- a spacer may be placed between the light reflection reducing member 7 and the adhesive surface for tilting, and the inner surface of the package itself covered with the light reflection reducing member 7 may be slightly tilted.
- the light reflection reduction member 7 may be fixed by bonding the end portion of the light reflection reduction member 7 to the inner surface of the package while the light reflection reduction member 7 is arranged at an angle. is also possible.
- the thickness of the adhesive layer 8 applied at this time can be appropriately changed depending on the material and thickness of the light reflection reducing member 7 to be adhered. preferable.
- the thickness after coating and drying is preferably 10 ⁇ m or more and 50 ⁇ m or less, and particularly preferably 30 ⁇ m or more and 40 ⁇ m or less.
- the light reflection reducing member 7 is arranged so as to cover only the range irradiated with the light emitted from the rear end surface of the semiconductor laser element 2, the area where the light reflection reducing member 7 is adhered can be made smaller. As a result, the manufacturing cost of the semiconductor laser device 100 can be reduced as compared with the case where the entire inner surface is covered with a film.
- the light reflection reducing member 7 arranged to face the rear end face of the semiconductor laser element 2 is tilted so that the light reflected by the light reflection reducing member 7 is directed toward the inner surface of the lid 62 .
- the light reflection reducing member 7 is also arranged on the inner surface of the lid 62 so that the light reflected by the light reflection reducing member 7 can be received. Therefore, even if the light is slightly reflected by the light reflection reducing member 7 arranged so as to face the rear end face of the semiconductor laser element 2, the light reflection reducing member 7 arranged on the inner surface of the lid 62 will not be reflected. can receive light again, so stray light can be suppressed as small as possible.
- the adhesive When using a liquid or gel adhesive, the adhesive may deform when it hardens, resulting in random irregularities on the surface. In such a case, if a sufficiently thin film-like light reflection reducing member 7 is used, it is conceivable that the surface shape of the light reflection reducing member 7 will also randomly change along the surface shape of the adhesive layer 8. . As a result, even if the light is slightly reflected on the surface of the light reflection reducing member 7, the light is dispersed in random directions, so that the light reflected toward the light lead-out portion 63 is reduced as much as possible. be able to.
- FIG. 5 compares the laser light output values of these semiconductor laser devices when the temperature is changed.
- the semiconductor laser device 100 according to the present embodiment in which the light reflection reducing member is arranged in the package the laser beam is significantly more concentrated than in the semiconductor laser device in which the light reflection reducing member is not arranged. It can be seen that the noise in the output value of is reduced, and the change in the output value of the laser light due to the temperature change is reduced. This is believed to be due to the fact that stray light within the package is reduced by arranging the light reflection reducing member within the package.
- the indicated concentration fluctuates largely up and down as the temperature changes.
- the hydrocarbon concentration and the like were similarly measured using the semiconductor laser device 100, it was confirmed that fluctuations in the indicated concentration value due to temperature were clearly suppressed.
- the semiconductor laser device 100 according to the present embodiment it can be seen that the fluctuation of the indicated concentration value due to a change in temperature of 10°C is within ⁇ 1%, and this fluctuation value corresponds to the concentration of hydrocarbons in the exhaust gas. It fully satisfies the specifications of the analyzer used for measurement.
- the present invention is not limited to the above embodiments.
- at least a part of the members other than the semiconductor laser element (optical sensor, etc.) disposed inside the semiconductor laser element 2 is disposed between the rear end surface of the semiconductor laser element 2 and the inner surface of the package. It is good as it is.
- these sensors and the like function as the light shielding member 9 to form a portion on the inner surface of the package where the light from the rear end face of the semiconductor laser element does not hit. Therefore, for example, as shown in FIG. 7, it is possible to sufficiently suppress the generation of stray light even if the light reflection reducing member is arranged on the inner surface of the package while avoiding the area where the light is blocked by the light shielding member 9. be.
- a space for arranging solder, wiring, etc. may be secured on the surface facing the rear end surface of the semiconductor laser element or the inner surface of the lid by providing a range where the light reflection reducing member is not adhered.
- the degree of freedom in designing wiring and the like can be improved.
- the light reflection reducing member may be adhered only to the inner surface of the box, or may be adhered to the inner surface of the box and the inner surface of the lid. When the light reflection reducing member is adhered to two or more places on the inner surface of the package, it is formed as a single light reflection reducing member that covers two or more places depending on the ease of manufacturing and adhesion. may be used, or a plurality of separately molded light reflection reducing members may be used in combination.
- the package may have a space for housing the semiconductor laser element inside, and may have a light lead-out portion at one end thereof for leading light from the semiconductor laser element, and is not limited to the shape described above. Also, the package is not limited to a box and a lid.
- the light reflection reducing member is described as being black containing a light absorbing substance such as carbon black, it does not have to be black, and any material that can reduce light reflection may be used.
- the light reflection reducing member has been described as being a film, it may be a plate-like member having a greater thickness than the film.
- the light reflection reducing member does not necessarily have to be flat.
- the light reflection reducing member may have unevenness formed on its surface.
- the adhesive for adhering the light reflection reducing member to the inner surface of the package an example in which a liquid or gel is applied to the inner surface of the package has been described, but an adhesive previously molded into a plate-like or film-like shape may also be used. may be used. Any adhesive can be used as long as it can fix the light reflection reducing member to the inner surface of the package, and the adhesive can be changed as appropriate depending on the materials forming the light reflection reducing member and the inner surface of the package. Further, the method of adhering the light reflection reducing member to the inner surface of the package is not limited to the method using an adhesive agent, and may be brazing or welding (for example, soldering).
- the present invention it is possible to minimize individual differences in the intensity and oscillation wavelength of output laser light from semiconductor laser device to semiconductor laser device while suppressing the generation of stray light within the package of the semiconductor laser device.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
このような場合には、前記光射出面から射出される光と前記迷光との間に干渉が起こるので、これら2種類の光の間の干渉が変化するとパッケージから外部に出力されるレーザ光の強度が変動してしまうという問題がある。
パッケージから外部に出力されるレーザ光の強度や発振波長はパッケージ内の温度等によって変動してしまうので、前述したように樹脂の塗布量がばらつくと、半導体レーザ装置から出力されるレーザ光の強度や発振波長における半導体レーザ装置毎の個体差が大きくなってしまうという問題があることに本発明者は気が付いた。
本発明は、このような課題に鑑みてなされたものであり、半導体レーザ装置のパッケージ内での迷光の発生を抑えながら、出力されるレーザ光の強度や発振波長における半導体レーザ装置毎の個体差をできるだけ抑えることを目的とする。
2 ・・・半導体レーザ素子
21 ・・・光射出面
22 ・・・後端面
6 ・・・パッケージ
7 ・・・光反射低減部材
10 ・・・ガス分析装置
11 ・・・測定セル
12 ・・・光検出器
13 ・・・分析部
本実施形態の半導体レーザ装置100は、図1に示すように、例えばガス中の測定対象成分(例えばCO、CO2、H2OやNO、NO2、N2O、NH3等の窒化物、CH4、C2H6等の炭化水素成分およびHCHO等の酸素を含む炭化水素成分)を光学分析によって分析するガス分析装置10に用いられるものである。ここで、ガス分析装置10は、ガスが導入される多重反射型の測定セル11と、測定セル11にレーザ光Xを照射する半導体レーザ装置100と、測定セル11を通過したレーザ光Xを検出する光検出器12と、光検出器12によって得た検出信号を用いて測定対象成分を分析する分析部13と、この分析部13によって分析された結果を表示する表示部14とを有している。なお、測定セル11は、多重反射型のものに限られず、単反射型のものであってもよいし、反射を用いない1パス型のものであっても良い。このガス分析装置は、様々なガスを分析することが可能であるが、例えば、内燃機関又は煙道等から排出される排ガスなどを分析する際にも使用することができるものである。
この半導体レーザ素子2は、例えば、直方体状のものであり、光を射出する光射出面21と、この光射出面21とは反対側の端面である後端面22とを備えるものである。
箱体61は、例えば、四角形状の底板と、該底板から起立する4つの側壁を備えてその内部に半導体レーザ素子2などを収容する直方体状の空間を形成するものである。
蓋体62は、例えば、前記箱体61に形成された開口を封止するための板状のものである。
パッケージ6の半導体レーザ素子2の光射出面21に対向する側壁には、レーザ光Xを外部に導出するための光導出部63が形成されている。当該光導出部63には、光学窓部材64が設けられており、当該光学窓部材64は、光学窓部材64で反射したレーザ光Xが再度半導体レーザ素子2に戻らないように、若干(例えば2度)傾斜している。ここではパッケージの一例として、直方体を採用しているものについて説明したが、これに限らず、例えば、円柱状のCANタイプのパッケージ等様々な形状のものを使用することが可能である。また、本実施形態では、箱体61が有する側壁に対して半導体レーザ素子2の光射出面21が対向するものについて説明しているが、光射出面21が蓋体又は底板に対向するように配置されているものとしても良い。
しかして、本実施形態に係る半導体レーザ装置100は、光を吸収して光の反射を抑える光反射低減部材7をパッケージ6の内部に備えるものである。光反射低減部材7は、パッケージ6の内面に接着されている。
光反射低減部材7は、例えば、光吸収物質と、光吸収物質同士を結着させる結着剤とを含有するものである。
光吸収物質としては、例えば、カーボンブラックなどを挙げることができる。
結着剤としては、シリコーン樹脂、ポリイミドや環化ゴムから構成される感光性材料などを挙げることができる。なお、光吸収物質は、カーボンブラック等の有機物に限らず、無機物を含有するものとしても良い。
この接着剤は、光反射低減部材7やパッケージ6を形成する素材によって適宜変更することが可能であるが、本実施形態の場合には、例えば、フッ素を含有するフッ素系接着剤やケイ素を含有するケイ素系接着剤を用いることが好ましい。
半導体レーザ素子2の後端面22から出る光が照射される範囲とは、半導体レーザ素子2の後端面22から出た光が直接照射される範囲と、半導体レーザ素子2の後端面22から出た光が反射した後に照射される範囲とを含むものである。
光反射低減部材7は、これら箱体61及び蓋体62の表面のうちパッケージ6の内部空間(密閉空間)を形成する面に接着されるものである。
本実施形態の場合には、半導体レーザ素子2の後端面22から出た光は、パッケージ6を構成する箱体61の内面のうち、後端面22と対向する内側面に照射されるので、この内側面に、光反射低減部材7が接着されている。
そこで、光反射低減部材7を傾けて配置する際には、例えば、パッケージ6を構成する容器の他の内側面、又は蓋体62の内面等に反射光が向かうような角度で光反射低減部材7を配置することが好ましい。
この場合には、光反射低減部材7によって反射された光のさらなる反射を低減するために、光反射低減部材7によって反射された反射光が照射される部分(他の内側面又は蓋体62の内面)にも光反射低減部材7を配置しておくことが好ましい。本実施形態の場合には、半導体レーザ素子2の後端面22に対向するように配置された光反射低減部材7によって反射された光を受けることができるように蓋体62の内面にも光反射低減部材7を配置している。これら光反射低減部材7は、それぞれ別々に形成されて、それぞれ箱体61の内側面及び蓋体62の内面に接着されていることが好ましい。
本実施形態に係る半導体レーザ装置100は、例えば、以下のような方法及び手順で製造することができる。
光反射低減部材7は、例えば、シリコンウエハ上にカーボンブラックを混ぜた樹脂材料をスピンコートによって塗布し、乾燥させることによって形成することができる。
他にも、例えば、光吸収物質であるカーボンブラックと、結着剤である二酸化ケイ素を含有する樹脂とを混ぜたものをプレスして膜状に成形したものを、例えば、カッターなどを用いて必要な形状に打ち抜くことによって製造することができる。
箱体61及び蓋体62の内面であって、半導体レーザ素子2の後端面から出る光が照射される部分に光反射低減部材7を、接着剤などによって接着することによって製造することができる。
より具体的には、パッケージを構成する箱体61の内面及び蓋体62の内面に接着剤を塗布し、そこに前述したようにして製造した光反射低減部材7を貼り付けて接着剤を乾燥させる。
このようにして、光反射低減部材7を接着した後に、剥離試験などを行って、光反射低減部材7がすぐに剥がれてしまわないことを確認した後、箱体61内に冷却機構、マウント、半導体レーザ素子2、温度検出素子などを配置する。その後、蓋体62を箱体61の開口を塞ぐように配置して封止する。
このように構成した半導体レーザ装置100によれば、予め形成した光反射低減部材7をパッケージ6の内面に接着しているので、光反射低減部材7を形成する材料を直接塗布する場合に比べて、光反射低減部材7の厚みをより制御しやすい。
その結果、半導体レーザ装置100毎のパッケージ6内に配置される光反射低減部材7の質量をできるだけ均一にして、半導体レーザ装置100毎のレーザ光の出力値のばらつきをできるだけ小さく抑えることができる。
以下に、本実施形態に係る半導体レーザ装置100を実際に使用して、迷光が低減されているかどうかを調べた結果を開示する。
本実験例では、従来例として、パッケージ内に光反射低減部材を配置していない以外は、本実施形態に係る半導体レーザ装置100と全く同じ構成の半導体レーザ装置を対照として使用した。
図5の結果から分かるように、パッケージ内に光反射低減部材を配置した本実施形態に係る半導体レーザ装置100においては、光反射低減部材を配置していない半導体レーザ装置に比べて明らかにレーザ光の出力値におけるノイズが低減され、さらに温度変化によるレーザ光の出力値の変化が小さくなっていることが分かる。これは、パッケージ内に光反射低減部材を配置したことによって、パッケージ内の迷光が低減したことによる効果であると考えられる。
さらに、本実施形態に係る半導体レーザ装置100によれば、温度が10度変化することよる濃度指示値の変動が±1%以内であることが分かり、この変動値は排ガス中の炭化水素濃度を測定する際に用いる分析装置の規格を十分に満たすものである。
本発明は前記実施形態に限られるものではない。
例えば、図6に示すように、前記の内部に配置されている半導体レーザ素子以外の部材(光センサなど)の少なくとも一部が、半導体レーザ素子2の後端面とパッケージの内面との間に配置されているものとしても良い。
この場合には、これらセンサ等が遮光部材9として機能して、パッケージの内面に半導体レーザ素子の後端面からの光が当たらない部分が形成されることになる。そのため、例えば、図7に示すように、光反射低減部材をこの遮光部材9によって光が遮られている範囲を避けてパッケージの内面に配置しても迷光の発生を十分に抑えることが可能である。
パッケージは内部に半導体レーザ素子を収容する空間を有し、その一端に半導体レーザ素子からの光を導出する光導出部を備えていれば良く、前述したような形状のものに限られない。また、パッケージは箱体及び蓋体からなるものに限られない。
光反射低減部材は、膜であるものを説明したが、膜よりも厚みが大きい板状のものとしても良い。
光反射低減部材は、必ずしも平坦なものでなくてもよく、例えば、その表面に凹凸が形成されているものであっても良い。
接着剤は、光反射低減部材をパッケージの内面に固定できる物であればよく、光反射低減部材やパッケージの内面を形成する素材によって適宜変更することが可能である。
また、光反射低減部材をパッケージの内面に接着させる方法としては、接着剤を用いる方法に限られず、例えば、ロウ付け又は溶接(例えば、はんだ付け)等によるものでも良い。
Claims (9)
- 光学分析に用いられる半導体レーザ装置であって、
半導体レーザ素子を内部に収容するパッケージと、
前記パッケージの内部に設けられて、前記半導体レーザ素子から出る光の反射を抑える光反射低減部材とを備え、
前記光反射低減部材が前記パッケージの内面に接着されていることを特徴とする半導体レーザ装置。 - 前記半導体レーザ素子が、光を射出する光射出面と、該光射出面とは反対側の端面である後端面とを備え、
前記光反射低減部材が、前記パッケージの内面のうち、前記半導体レーザ素子の前記後端面から出る光があたる範囲を覆うように配置されている、請求項1に記載の半導体レーザ装置。 - 前記パッケージが、上面が開口した箱体と、前記開口を封止する蓋体とを備え、
前記光反射低減部材が、前記蓋体の内面及び/又は前記後端面と対向する前記箱体の内面に接着されている、請求項2に記載の半導体レーザ装置。 - 前記光反射低減部材の前記後端面と対向する面が、前記光射出面に対して斜めに配置されている、請求項2又は3に記載の半導体レーザ装置。
- 前記光反射低減部材が、光吸収物質と結着剤とを含有するものである、請求項1乃至4の何れか一項に記載の半導体レーザ装置。
- 前記光反射低減部材が、黒色の膜である、請求項1乃至5の何れか一項に記載の半導体レーザ装置。
- 前記光反射低減部材が膜であり、該膜の最大厚みと最小厚みとの差が、前記膜の平均厚みの1割以下である、請求項1乃至6の何れか一項に記載の半導体レーザ装置。
- 請求項1乃至7の何れか一項に記載の半導体レーザ装置を用いた光源と、
ガスが導入される測定セルと、
前記光源から射出されて前記測定セルを通過したレーザ光を検出する検出器と
光検出器によって得た検出信号を用いて測定対象成分を分析する分析部とを備えたガス分析装置。 - 半導体レーザ素子を内部に収容するパッケージと、
前記パッケージの内部に設けられた光反射低減部材とを備える光学分析用半導体レーザ装置の製造方法であって、
前記光反射低減部材を前記パッケージの内部に接着することを特徴とする半導体レーザ装置の製造方法。
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP22763026.6A EP4303564A4 (en) | 2021-03-05 | 2022-02-21 | SEMICONDUCTOR LASER DEVICE |
| JP2023503721A JPWO2022185970A1 (ja) | 2021-03-05 | 2022-02-21 | |
| CN202280018268.0A CN116918197A (zh) | 2021-03-05 | 2022-02-21 | 半导体激光装置 |
| US18/280,195 US12542415B2 (en) | 2021-03-05 | 2022-02-21 | Semiconductor laser device |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021035268 | 2021-03-05 | ||
| JP2021-035268 | 2021-03-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2022185970A1 true WO2022185970A1 (ja) | 2022-09-09 |
Family
ID=83154157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2022/006960 Ceased WO2022185970A1 (ja) | 2021-03-05 | 2022-02-21 | 半導体レーザ装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12542415B2 (ja) |
| EP (1) | EP4303564A4 (ja) |
| JP (1) | JPWO2022185970A1 (ja) |
| CN (1) | CN116918197A (ja) |
| WO (1) | WO2022185970A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024201074A1 (en) * | 2023-03-31 | 2024-10-03 | Servomex Group Limited | Method and apparatus for use in optical gas absorption measurements |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04360593A (ja) | 1991-06-07 | 1992-12-14 | Nec Corp | 半導体レーザ装置 |
| JP2005019746A (ja) * | 2003-06-26 | 2005-01-20 | Sumitomo Electric Ind Ltd | 半導体レーザ装置およびそれに使用される半導体パッケージ |
| JP2008153639A (ja) * | 2006-11-21 | 2008-07-03 | Furukawa Electric Co Ltd:The | 光モジュール |
| US20100091804A1 (en) * | 2006-12-22 | 2010-04-15 | Pgt Photonics S.P.A. | Phase control by active thermal adjustments in an external cavity laser |
| JP2015148810A (ja) * | 2015-03-17 | 2015-08-20 | 株式会社フジクラ | 合波装置、合波方法、及び、ldモジュール |
| WO2017073538A1 (ja) * | 2015-10-30 | 2017-05-04 | 京セラ株式会社 | 光半導体素子パッケージおよび光半導体装置 |
| JP2019192915A (ja) * | 2018-04-28 | 2019-10-31 | エスゼット ディージェイアイ テクノロジー カンパニー リミテッドSz Dji Technology Co.,Ltd | 半導体装置 |
| JP2019201189A (ja) * | 2018-05-18 | 2019-11-21 | 株式会社堀場製作所 | 半導体レーザ素子の製造方法及びその半導体レーザ装置並びにガス分析装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57148385A (en) * | 1981-03-09 | 1982-09-13 | Nec Corp | Coupling device for optical filter and semiconductor element |
| US6520652B1 (en) | 2001-09-20 | 2003-02-18 | Nortel Networks Limited | Method and apparatus for reducing undesirable reflected light in integrated opto-electronic modules |
| JP2003318478A (ja) * | 2002-04-26 | 2003-11-07 | Sumitomo Electric Ind Ltd | 光通信装置 |
| JP4097552B2 (ja) * | 2003-03-27 | 2008-06-11 | 三菱電機株式会社 | 半導体レーザ装置 |
| JP2009201189A (ja) * | 2008-02-19 | 2009-09-03 | Toyota Motor Corp | 電気システムの制御装置 |
| DE102009028909A1 (de) | 2009-08-26 | 2011-03-17 | Nanoplus Gmbh Nanosystems And Technologies | Halbleiterlaser mit auf einem Laserspiegel angebrachtem Absorber |
| JP6895763B2 (ja) * | 2017-02-14 | 2021-06-30 | 古河電気工業株式会社 | 光モジュール |
| JP7428867B2 (ja) * | 2019-07-29 | 2024-02-07 | 日亜化学工業株式会社 | レーザ光源、光学デバイス、およびレーザ光源の製造方法 |
-
2022
- 2022-02-21 WO PCT/JP2022/006960 patent/WO2022185970A1/ja not_active Ceased
- 2022-02-21 CN CN202280018268.0A patent/CN116918197A/zh active Pending
- 2022-02-21 US US18/280,195 patent/US12542415B2/en active Active
- 2022-02-21 EP EP22763026.6A patent/EP4303564A4/en active Pending
- 2022-02-21 JP JP2023503721A patent/JPWO2022185970A1/ja active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04360593A (ja) | 1991-06-07 | 1992-12-14 | Nec Corp | 半導体レーザ装置 |
| JP2005019746A (ja) * | 2003-06-26 | 2005-01-20 | Sumitomo Electric Ind Ltd | 半導体レーザ装置およびそれに使用される半導体パッケージ |
| JP2008153639A (ja) * | 2006-11-21 | 2008-07-03 | Furukawa Electric Co Ltd:The | 光モジュール |
| US20100091804A1 (en) * | 2006-12-22 | 2010-04-15 | Pgt Photonics S.P.A. | Phase control by active thermal adjustments in an external cavity laser |
| JP2015148810A (ja) * | 2015-03-17 | 2015-08-20 | 株式会社フジクラ | 合波装置、合波方法、及び、ldモジュール |
| WO2017073538A1 (ja) * | 2015-10-30 | 2017-05-04 | 京セラ株式会社 | 光半導体素子パッケージおよび光半導体装置 |
| JP2019192915A (ja) * | 2018-04-28 | 2019-10-31 | エスゼット ディージェイアイ テクノロジー カンパニー リミテッドSz Dji Technology Co.,Ltd | 半導体装置 |
| JP2019201189A (ja) * | 2018-05-18 | 2019-11-21 | 株式会社堀場製作所 | 半導体レーザ素子の製造方法及びその半導体レーザ装置並びにガス分析装置 |
Non-Patent Citations (1)
| Title |
|---|
| See also references of EP4303564A4 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024201074A1 (en) * | 2023-03-31 | 2024-10-03 | Servomex Group Limited | Method and apparatus for use in optical gas absorption measurements |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2022185970A1 (ja) | 2022-09-09 |
| US12542415B2 (en) | 2026-02-03 |
| CN116918197A (zh) | 2023-10-20 |
| EP4303564A1 (en) | 2024-01-10 |
| US20240146020A1 (en) | 2024-05-02 |
| EP4303564A4 (en) | 2025-02-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20210293620A1 (en) | Spectrometer and Method for Calibrating the Spectrometer | |
| CN106233123B (zh) | 光学传感器系统、光学气体传感器系统、微粒传感器系统、发光装置及图像打印装置 | |
| WO2022185970A1 (ja) | 半導体レーザ装置 | |
| US20180337165A1 (en) | Optical module, detecting apparatus | |
| US10333279B2 (en) | Quantum cascade laser device | |
| CN111668695B (zh) | 半导体激光装置以及分析装置 | |
| US12066377B2 (en) | Device for emitting and controlling infrared light and gas sensor using such a device | |
| JP7165144B2 (ja) | 半導体レーザ装置、半導体レーザ装置の駆動方法及び駆動プログラム | |
| JP7128733B2 (ja) | 吸光分析装置 | |
| US20240344977A1 (en) | Method, apparatus and system for compact optical gas absorption measurements | |
| US11143626B2 (en) | Photo-acoustic gas sensor with optimal reference path length | |
| CN121079588A (zh) | 用于光学气体吸收测量的装置、系统和方法 | |
| CN115112592B (zh) | 集成传感器 | |
| US20240328933A1 (en) | Method and apparatus for use in optical gas absorption measurements | |
| US20060180763A1 (en) | Gas detector that uses infrared light and method of detecting gas concentration | |
| EP4191231B1 (en) | Particle sensor | |
| JP3559998B2 (ja) | 化学発光分析計 | |
| WO2024201074A1 (en) | Method and apparatus for use in optical gas absorption measurements | |
| US12099004B2 (en) | Gas detection device | |
| US20240178628A1 (en) | Photoacoustic system and associated method | |
| TW202507259A (zh) | 一種使用光學測量原理分析氣體之氣體感測器 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 22763026 Country of ref document: EP Kind code of ref document: A1 |
|
| ENP | Entry into the national phase |
Ref document number: 2023503721 Country of ref document: JP Kind code of ref document: A |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 202280018268.0 Country of ref document: CN |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 18280195 Country of ref document: US |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 202317061580 Country of ref document: IN |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2022763026 Country of ref document: EP |
|
| ENP | Entry into the national phase |
Ref document number: 2022763026 Country of ref document: EP Effective date: 20231005 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| WWG | Wipo information: grant in national office |
Ref document number: 18280195 Country of ref document: US |