WO2024215218A1 - Dispositif optique à base d'obscurité topologique et élément optique associé - Google Patents

Dispositif optique à base d'obscurité topologique et élément optique associé Download PDF

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Publication number
WO2024215218A1
WO2024215218A1 PCT/RU2023/050281 RU2023050281W WO2024215218A1 WO 2024215218 A1 WO2024215218 A1 WO 2024215218A1 RU 2023050281 W RU2023050281 W RU 2023050281W WO 2024215218 A1 WO2024215218 A1 WO 2024215218A1
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Prior art keywords
layer
optical element
optical
thickness
alc
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Inventor
Aleksey Vladimirovich ARSENIN
Valentin Sergeevich VOLKOV
Dmitrii Viktorovich GRUDININ
Georgii Alekseevich ERMOLAEV
Alexander Vyacheslavovich SYUY
Ilia Markovich FRADKIN
Gleb Igorevich TSELIKOV
Andrey Aleksandrovich VYSHNEVYY
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Xpanceo Research On Natural Science LLC
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Xpanceo Research On Natural Science LLC
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Priority claimed from RU2023109525A external-priority patent/RU2805376C1/ru
Application filed by Xpanceo Research On Natural Science LLC filed Critical Xpanceo Research On Natural Science LLC
Priority to EP23829148.8A priority Critical patent/EP4695193A1/fr
Priority to CN202380097123.9A priority patent/CN120936567A/zh
Publication of WO2024215218A1 publication Critical patent/WO2024215218A1/fr
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals

Definitions

  • the invention relates to the field of nanophotonics and specifically to the projecting optical device based on a flat diffractive optical element and can be used to create a virtual image of the objects in the field of view when forming virtual, augmented, or extended reality (VR/AR/XR), and also to form other optical elements, for example, optical differentiators, lenses, optical objectives, etc.
  • VR/AR/XR virtual, augmented, or extended reality
  • the prior art discloses an optical device for forming augmented reality (AR), comprising an optical element in the form of a transparent holographic screen (for example, a vehicle windscreen) and a projecting device that focuses the image from the emitter on a 3-D hologram (see publication US2015362734A1, cl. G02B27/01, G02B5/32, G02C7/04, G03H1/02, G03H1/04, G03H1/18, published 17.12.2015).
  • the disadvantages of the prior art design consist in manufacturing complexity, relatively low diffraction efficiency of the holographic display, impossibility to make a flexible device, and a large thickness of the holographic screen.
  • the prior art discloses a translucent construction optical element comprising a first optically transparent layer with a nanostructured glass surface for which a part of the nanoplanes makes the angle of 10-90 o with that layer’s plane, and a second interrupted metal layer with the thickness from 1 to 50 nm covering at least a part of said nanoplanes (see publication AU2014292323A1, cl. B82Y20/00, B82Y30/00, G02B5/18, G02B5/20, published 07.01.2016).
  • the second layer is produced by partial metallization of the nanostructured surface by vapor deposition, sputtering, printing, casting or stamping, whereas the full coverage of the surface by metal is prevented using a shadow mask or photoresist techniques.
  • Such element can be used to vary the sunlight transmission, for example, through a window while keeping it transparent.
  • the disadvantages of the prior art technology are the complexity of the process of producing the metal nanoplanes at an angle to the substrate (only the metal structures angled at 90 o are relatively easy to produce) and insufficient quality of periodicity of such nanostructures (for the deposited metal layer thickness of 1-75 nm, the roughness comprises 5-10 nm).
  • such optical element affects the transmittance spectrum at all the wavelengths, and the produced structure cannot be transferred to another surface.
  • the closest, in terms of technical substance, to the claimed invention is the flat optics based on two-dimensional planar materials, for example, atomically thin dichalcogenides of transition metals, which makes it possible to realize the effect of topological darkness (see Georgy Ermolaev, Kirill Voronin, Denis G. Baranov, Vasyl Kravets, Gleb Tselikov, Yury Stebunov, Dmitry Yakubovsky, Sergey Novikov, Andrey Vyshnevyy, Arslan Mazitov, Ivan Kruglov, Sergey Zhukov, Roman Romanov, Andrey M. Markeev, Aleksey Arsenin, Kostya S. Novoselov, Alexander N.
  • the technical problem is to eliminate said disadvantages and to create the technical solutions based on the effect of topological darkness, which can be used for virtual image projecting and processing.
  • the technical effect consists in expanding the flat optics functionality for ultra-thin structures.
  • the set problem has been solved and the technical effect has been achieved as related to the optical device by that it comprises an optical light source having the wavelength of ⁇ ls in its spectrum, implemented as an image projector, and an optical element that is planar in the (x,y) plane and whose normal makes the angle of ⁇ ls with the optical axis of said optical light source, wherein the optical element comprises at least the first layer of optically transparent dielectric with the thickness of d 1 and the dielectric permeability of ⁇ 1 , the second layer of absorbing two-dimensional material with the thickness of d 2 ⁇ 100 nm and the dielectric permeability of ⁇ 2 , and the optically transparent substrate with the dielectric permeability of ⁇ 3 , wherein said layers and the substrate are configured to form a point of topological darkness A( ⁇ 0 , ⁇ 0 ) for which the absolute value of the phase ⁇ integral of the complex scattering amplitude of the incident light onto said optical element at the angle of ⁇ with the wavelength of ⁇ over the closed contour L
  • the second layer is preferably made of gold, copper, silver, or aluminum with the thickness not exceeding 30 nm.
  • the second layer can be made of ZnO, TiO 2 , ZnS, MgO, BeO, PbF 2 , CsI, HfO 2 , Sc 2 O 3 , SiN, GaP, CsPbBr 3 , CsPbCl 3 , CsPbI 3 , GaN, YVO 4 , MgAlO, YAlO, LuAlO, AlSb, GaSb, InSb, AlAs, GaAs, InAs, BC, SiC, TiC, VC, CsCl, CuCl, BaF, CeF 3 , LaF 3 , LiF, SrF 2 , LiI, KI, RbI, CaMoO 4 , SrMoO 4 , PbMoO 4 , LiNbO 3 , KNbO 3 , VN, ZrO 2 , GeO 2 , TeO 2 , WO 3 , Fe 2 O 3 , Y 2 O
  • the optical light source is preferably made linearly polarized and monochromatic, with the central wavelength of ⁇ ls .
  • Said phase ⁇ can be the phase of the complex scattering amplitude of the light in the reflection channel, whereas the optical element is made in accordance with the condition:
  • ⁇ i is the dielectric permeability of the i -th layer
  • d i is the thickness of the i-th layer
  • ⁇ 0 is the dielectric permeability of the medium from which the light comes.
  • the phase ⁇ is the phase of the complex scattering amplitude of the light in the transmission channel
  • the optical element is made in accordance with the condition:
  • ⁇ i is the dielectric permeability of the i -th layer
  • d i is the thickness of the i-th layer
  • ⁇ 0 is the dielectric permeability of the medium from which the light comes.
  • 1-10.
  • the second layer is preferably made of gold, copper, silver, or aluminum, and made spatially modulated in thickness, for example, in the form of a diffraction grating.
  • phase distribution is an example of phase distribution around the point of topological darkness A( ⁇ 0 , ⁇ 0 ) within the wavelength ⁇ and angle of incidence ⁇ parameter space;
  • FIG. 1 is a diagram used to determine the phase distribution over the plane (x,y) of the optical element, using an ellipsometer.
  • the disclosed optical device represents the optical light source 1 and the optical element 2 that is planar in the (x,y) plane, which are rigidly fixed relative to each other.
  • the optical light source 1 can be represented, for example, by an RGB LED matrix-based wideband multicolor image projector or a laser image projector with a linearly polarized and monochromatic light having the central wavelength of ⁇ ls .
  • the optical light source 1 is installed so that its optical axis makes the angle of ⁇ ls with the normal n of the optical element 2.
  • the optical element 2 itself is made as a heterostructure comprising along the axis z at least the first layer 3 of optically transparent dielectric (in : with the thickness of d 1 and the dielectric permeability of ⁇ 1 ), the second layer 4 of absorbing two-dimensional material (in : with the thickness of d 2 ⁇ 100 nm and the dielectric permeability of ⁇ 2 ), and the optically transparent substrate 5 (with the dielectric permeability of ⁇ 3 ).
  • the thickness of the layer 4 of the absorbing two-dimensional material is limited from above by the value of 100 nm to ensure the condition of its transparency is fulfilled.
  • the heterostructure can comprise a larger number of layers arranged in various order: the outer layer can be represented by both the dielectric layer 3 and the absorbing layer 4 (i.e. as used herein, the terms ‘the first’ and ‘the second’ do not define the layer arrangement order).
  • the layers of heterostructure are prepared so that to form a point of topological darkness A( ⁇ 0 , ⁇ 0 ) that is close to ⁇ ls and ⁇ ls of the employed optical light source 1.
  • the optical element 2 has a zero amplitude in one of the dissipation channels, for example, in the reflection channel or transmission channel (the reflection and the transmission as the particular cases of dissipation are described, for example, in the publication ‘Temporal coupled-mode theory for the Fano resonance in optical resonators’, Shanhui Fan, Wonjoo Suh, and J. D. Joannopoulos, Journal of the Optical Society of America A Vol.
  • the point of topological darkness of the optical element 2 will be such point A( ⁇ 0 , ⁇ 0 ) for which the absolute value of the phase ⁇ integral of the complex scattering amplitude of the incident light onto said optical element at the angle of ⁇ with the wavelength of ⁇ over the closed contour L :
  • ds is the differential in space ⁇ , ⁇ ,
  • ⁇ ls and ⁇ ls for said light source lie within said contour L .
  • Said ellipse L defines the working range of the wavelengths and angles at which the disclosed optical device efficiently operates.
  • the numerical values for the ellipse L semiaxes are selected based on the results of simulation and experiments: the greater values of ⁇ L and ⁇ L (a softer match condition) result in a weaker topological darkness effect and significant drop in intensity of the light into the required dissipation channel (for example, when bending the light from the projector into the user’s eye), while the lower values of ⁇ L and ⁇ L (a stricter match condition) result in significantly increased working hours to adjust the device (to position the light source 1 relative to the optical element 2).
  • the topological darkness point ⁇ of the optical element 2 will be represented by such values of the wavelength ⁇ 0 and incidence angle ⁇ 0 near which the phase ⁇ of the scattered light is changing extremely fast, i.e. the phase difference between the opposite points of the ellipse L comprises not less than ⁇ /2.
  • the parameters of the optical element 2 can be calculated based on the following considerations.
  • phase ⁇ is a phase of the complex scattering amplitude of the light in the reflection channel
  • r ij . is the materials i and j interface reflection factor for s-polarization
  • r ij is the materials i and j interface reflection factor for p-polarization
  • i , j are the layer index numbers (in the outside-in direction, towards the substrate of the optical element 2)
  • ⁇ i is the dielectric permeability of the i -th layer
  • d i is the thickness of the i-th layer
  • ⁇ 0 is the dielectric permeability of the medium from which the light comes.
  • the optical element 2 must be implemented in accordance with the condition:
  • t 0123 is the transmittance of the optical element 2 as a whole
  • r ij is the materials i and j interface reflection factor for s-polarization
  • r ij is the materials i and j interface reflection factor for p-polarization
  • i , j are the layer index numbers (in the outside-in direction, towards the substrate of the optical element 2)
  • ⁇ i is the dielectric permeability of the i -th layer
  • d i is the thickness of the i-th layer
  • ⁇ 0 is the dielectric permeability of the medium from which the light comes.
  • the absorbing layer 4 with the thickness not exceeding 30 nm, for example, from a metal (gold, copper, silver, or aluminum) or another highly refractive material (ZnO, TiO 2 , ZnS, MgO, BeO, PbF 2 , CsI, HfO 2 , Sc 2 O 3 , SiN, GaP, CsPbBr 3 , CsPbCl 3 , CsPbI 3 , GaN, YVO 4 , MgAlO, YAlO, LuAlO, AlSb, GaSb, InSb, AlAs, GaAs, InAs, BC, SiC, TiC, VC, CsCl, CuCl, BaF, CeF 3 , LaF 3 , LiF, SrF 2 , LiI, KI, RbI, CaMoO 4 , SrMoO 4 , PbMoO 4 , LiN
  • the dielectric layer 3 can be produced using any available polymer, for example, polyvinyl alcohol, hydroxyethylmethacrylate, polydimethylsiloxane, polylactide, polymethylmethacrylate, polymethylpentene, polycarbonate, polyetherimide, etc.
  • the optical element 2 can be manufactured and supplied in the form of a thin flexible film without the substrate 5. Then, to enable the usage, it is provided with the adhesive layer 6 that makes it possible to glue it onto any existing transparent substrate (glasses, a vehicle windscreen, a window, etc.).
  • 1-10.
  • the order of layers plays a significant part. These parameters ensure that the above conditions of topological darkness are fulfilled for almost any transparent surfaces that are currently known (made of glass, plastics, etc.).
  • the disclosed optical device and the respective optical element can be used as a basis to form ultra-thin virtual, augmented, or extended reality (VR/AR/XR) devices of the new generation.
  • VR/AR/XR extended reality
  • Changing the parameters of the disclosed optical element within the given limits it is possible to create, for example, an optical differentiator (i.e. a structure that only reflects the borders of the image elements), a lens or an optical objective (for example, by forming a Fresnel-zone plate with the thicknesses of the two-dimensional material above and below the topological point), and many other optical elements.
  • the optical element structure was obtained in the following fabrication cycle. Using the electron-beam deposition method, a 13 nm layer of gold was deposited onto the BK7 optical glass. Then, from above, a 100 nm layer of polymethylmethacrylate was deposited using the centrifugation process (spin coating).
  • This structure acts as an optical differentiator, wherein the ratio of the image elements border reflection intensity to the intensity of the image itself comprises approximately 100. It should be noted that the optical differentiator will only operate for polarizing the perpendicular light incidence plane, i.e. the disclosed optical element demonstrates polarization selectivity. Said projector will form on the optical element's screen a clear visible picture of the borders of the elements of the image formed by the projector.
  • This structure acts as an optical differentiator, i.e. the structure will reflect the image borders having the central wavelength of 655 nm and the half-width of 10 nm (i.e. the structure will also act as an optical filter for this wavelength range of 650-660 nm), wherein the ratio of the image elements border reflection intensity to the intensity of the image itself at these wavelengths comprises approximately 100. That is, said projector will form on the screen a clear visible picture of the borders of the elements of the image formed by the projector.
  • This structure acts as an optical differentiator, that is the structure will reflect the image borders, wherein the ratio of the image elements border reflection intensity to the intensity of the image itself at these wavelengths comprises approximately 100. That is, said projector forms on the screen a clear visible picture of the borders of the elements of the image formed by the projector, wherein, as opposed to Examples 1 and 2, this picture will not have any additional wavelengths and polarizations.
  • the optical element structure was obtained in the following fabrication cycle. Using the electron-beam deposition method, a 13 nm layer of gold was deposited onto the BK7 optical glass. Using the electron-beam lithography method, the layer of gold was patterned into a diffraction grating with the period of 648 nm. Then, from above, a 100 nm layer of polymethylmethacrylate was deposited using the centrifugation process (spin coating).
  • the diffraction efficiency of the obtained structure exceeds 4.5%, and the transparency exceeds 70%.
  • said projector forms on the screen a clear visible picture with the intensity approximately 4.5% of the projector light intensity (the intensity into the required diffraction channel is defined by the diffraction efficiency).
  • the optical element structure was obtained in the following fabrication cycle. Using the electron-beam deposition method, a 13 nm layer of gold was deposited onto the BK7 optical glass. Then, from above, a 100 nm layer of polymethylmethacrylate was deposited using the centrifugation process (spin coating). Using the electron-beam lithography method, the layer of polymethylmethacrylate was patterned into a diffraction grating with the period of 648 nm.
  • the diffraction efficiency of the obtained structure exceeds 4.3%, and the transparency exceeds 70%.
  • said projector forms on the screen a clear visible picture with the intensity approximately 4.3% of the projector light intensity.
  • the optical element structure was obtained in the following fabrication cycle. Using the electron-beam deposition method, a 4 nm layer of aluminum was deposited onto the BK7 optical glass. Then, from above, a 92 nm layer of polymethylmethacrylate was deposited using the centrifugation process (spin coating).
  • This structure acts as an optical differentiator, i.e. the structure will reflect the image borders having the central wavelength of 547 nm and the half-width of 10 nm (i.e. the structure will also act as an optical filter for this wavelength range of 542-552 nm), wherein the ratio of the image elements border reflection intensity to the intensity of the image itself at these wavelengths comprises approximately 100. That is, said projector will form on the screen a clear visible picture of the borders of the elements of the image formed by the projector.
  • Example 6 The same as Example 6, but with a projector based on a laser with the central wavelength of 530 nm polarized perpendicularly to the light incidence plane.
  • This structure acts as an optical differentiator, that is the structure will reflect the image borders, wherein the ratio of the image elements border reflection intensity to the intensity of the image itself at these wavelengths comprises approximately 100. That is, said projector forms on the screen a clear visible picture of the borders of the elements of the image formed by the projector, wherein, as opposed to Example 6, this picture will not have any additional wavelengths and polarizations.
  • Example 7 The same as Example 7, but, using the electron-beam lithography method, the layer of aluminum was patterned into a diffraction grating with the period of 1274 nm.
  • the diffraction efficiency of the obtained structure exceeds 3.8%, and the transparency exceeds 70%.
  • said projector forms on the screen a clear visible picture, formed by the projector, with the intensity approximately 3.8% of the projector light intensity.
  • the optical element structure was obtained in the following fabrication cycle.
  • the optical glass was coated with a 30 nm layer of polydimethylsiloxane using the centrifugation process (spin coating), then this layer was coated with a 15 nm layer of gold using the electron-beam deposition method, and thereafter a 100 nm layer of polymethylmethacrylate was deposited using the centrifugation process (spin coating).
  • This structure acts as an optical differentiator, i.e. the structure will reflect the image borders having the central wavelength of 615 nm and the half-width of 10 nm (i.e. the structure will also act as an optical filter for this wavelength range of 610-620 nm), wherein the ratio of the image elements border reflection intensity to the intensity of the image itself at these wavelengths comprises approximately 100. That is, said projector will form on the screen a clear visible picture of the borders of the elements of the image formed by the projector.
  • the optical element structure was obtained in the following fabrication cycle.
  • the optical glass was coated with a 50 nm layer of polydimethylsiloxane using the centrifugation process (spin coating), then this layer was coated with a 14 nm layer of gold using the electron-beam deposition method, and thereafter a 67 nm layer of polymethylmethacrylate was deposited using the centrifugation process (spin coating).
  • This structure acts as an optical differentiator, i.e. the structure will reflect the image borders having the central wavelength of 420 nm and the half-width of 10 nm (i.e. the structure will also act as an optical filter for this wavelength range of 415-425 nm), wherein the ratio of the image elements border reflection intensity to the intensity of the image itself at these wavelengths comprises approximately 100. That is, said projector will form on the screen a clear visible picture of the borders of the elements of the image formed by the projector. This example is different from the others in that the range of the projector working wavelengths and angles is increased owing to the three topological points.
  • the optical element structure was obtained in the following fabrication cycle. Using the centrifugation process (spin coating), a 300 nm layer of polymethylmethacrylate was deposited onto a sapphire substrate. Then, this layer was coated with a 3 nm layer of gold using the electron-beam deposition method.
  • This structure acts as an optical differentiator, i.e. the structure will reflect the image borders having the central wavelength of 450 nm and the half-width of 10 nm (i.e. the structure will also act as an optical filter for this wavelength range of 445-455 nm), wherein the ratio of the image elements border reflection intensity to the intensity of the image itself at these wavelengths comprises approximately 100. That is, said projector will form on the screen a clear visible picture of the borders of the elements of the image formed by the projector.
  • the diffraction efficiency of the obtained structure exceeds 4.7%, and the transparency exceeds 70% (for the wavelengths of 645-655 nm).
  • said projector forms on the screen a clear visible picture, formed by the projector, with the intensity approximately 4.7% of the projector light intensity.
  • the optical element is made in the form of a polymer film of polymethylmethacrylate having the dielectric permeability of 2.25 and the thickness of 80 nm which is coated with a film of gold with the thickness of 18 nm and the dielectric permeability of 2.25 using the electron-beam deposition method.
  • the adhesive layer in the form of graphene was deposited onto the gold side using the liquid transfer method. The diffraction efficiency of the obtained structure exceeds 2%, and the transparency exceeds 80%.
  • Such optical element may be installed onto any firm surface and can act as an optical differentiator (depending on the deposited surface, the working range of the wavelengths and angles will slightly vary), wherein the ratio of the image border reflection intensity to the intensity of the image comprises approximately 100. That is, said projector will form on the screen a clear visible picture of the borders of the elements of the image formed by the projector.
  • the optical element is made in the form of a polymer film of polymethylmethacrylate having the dielectric permeability of 2.25 and the thickness of 80 nm which is coated with a film of gold with the thickness of 18 nm and the dielectric permeability of 2.25 using the electron-beam deposition method. Then, using the electron-beam lithography method, the film is patterned into a diffraction grating with the period of 648 nm. The adhesive layer in the form of graphene was deposited onto the gold side using the liquid transfer method. The diffraction efficiency of the obtained structure exceeds 3.8%, and the transparency exceeds 70%.
  • Such optical element can be installed onto any firm surface and provides a 65 schreib bending of a 630 nm wavelength light from a source disposed at the angle of 65 schreib (for the case when the structure is deposited onto the BK7 optical glass; for other surfaces, the values of the working wavelengths and angles will be different, but insignificantly, within ⁇ 20 nm and ⁇ 10 schau ).

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)

Abstract

L'invention se rapporte au domaine de la nanophotonique et concerne un dispositif optique. Le dispositif optique comprend une source de lumière optique ayant la longueur d'onde de λls dans son spectre, ladite source étant mise en œuvre en tant que projecteur d'image, et un élément optique qui est plan dans le plan (x,y) et dont la normale rend l'angle de θls avec l'axe optique de ladite source de lumière optique. L'élément optique comprend au moins la première couche de diélectrique optiquement transparent présentant l'épaisseur de d1et la perméabilité diélectrique de ε1, la seconde couche d'absorption de matériau bidimensionnel ayant l'épaisseur de d2 ≤ 100 nm et la perméabilité diélectrique de ε2, et le substrat optiquement transparent ayant la perméabilité diélectrique de ε3. Lesdites couches et le substrat sont conçus pour former un point d'obscurité topologique. L'effet technique consiste en la possibilité de créer une optique plate pour des structures ultra-minces avec une qualité élevée des images obtenues.
PCT/RU2023/050281 2023-04-13 2023-12-01 Dispositif optique à base d'obscurité topologique et élément optique associé Ceased WO2024215218A1 (fr)

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Application Number Priority Date Filing Date Title
EP23829148.8A EP4695193A1 (fr) 2023-04-13 2023-12-01 Dispositif optique à base d'obscurité topologique et élément optique associé
CN202380097123.9A CN120936567A (zh) 2023-04-13 2023-12-01 基于拓扑暗态的光学装置和用于它的光学元件

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RU2023109525A RU2805376C1 (ru) 2023-04-13 Оптическое устройство на базе топологической темноты и оптический элемент для него
RU2023109525 2023-04-13

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CN121416967B (zh) * 2025-12-29 2026-03-20 中国科学院微电子研究所 一种中红外拓扑偏振奇点激光器及其制备方法

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