WO2024251249A1 - Cleaning control method for cleaning system, and cleaning system - Google Patents

Abstract

A cleaning control method for a cleaning system, and a cleaning system. The cleaning control method comprises: controlling a cleaning device to move to a cleaning base station (100), wherein a mopping member (200) of the cleaning device is located in a cleaning tank (111); controlling a limiting member (3) to limit a cleaning member (2) to be in a first cleaning state such that the cleaning member (2) is fixed relative to a base station base (1), and the mopping member (200) of the cleaning device moves relative to the cleaning member (2) for cleaning; and controlling the limiting member (3) to separate from the cleaning member (2), wherein the cleaning member (2) is in a second cleaning state such that the cleaning member (2) can move, the cleaning member (2) moves so as to clean the cleaning tank (111), and dirt in the cleaning tank (111) is adapted to flow, under stirring of the cleaning member (2), into a filter tank (13) for filtering.

Description

Cleaning control method for cleaning system and cleaning system

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based on Chinese patent application with application number 202310685239.6 and application date June 9, 2023, Chinese patent application with application number 202321475097.2 and application date June 9, 2023, and Chinese patent application with application number 202310685183.4 and application date June 9, 2023, and claims the priority of the above-mentioned Chinese patent applications. The entire contents of the above-mentioned Chinese patent applications are hereby introduced into this application as a reference.

Technical Field

The present application relates to the technical field of cleaning appliances, and in particular to a cleaning control method and a cleaning system for a cleaning system.

Background Art

With the improvement of people's living standards, automatic cleaning equipment such as cleaning robots have gradually entered thousands of households, saving people a lot of energy in housework. In addition, with the rapid development of automatic cleaning equipment, cleaning robots with both sweeping and mopping functions are chosen by more and more users. During the working process of the cleaning robots with sweeping and mopping functions, they are usually equipped with a cleaning base station to mop the floor to improve the cleaning ability of the cleaning robot, and the cleaning base station needs to have a self-cleaning function at the same time. However, the self-cleaning effect of the cleaning base station in the related technology and the method of handling the dirt generated during the cleaning process are not good, resulting in a large amount of moist dirt accumulating in the cleaning base station, which is easy to breed mud and bacteria, and at the same time causes users to frequently clean the dirt, resulting in a poor experience.

Summary of the invention

The present application proposes a cleaning base station for cleaning equipment, which can clean a cleaning tank through a cleaning piece, and can better avoid the accumulation of solid dirt on the inner wall of the cleaning tank, which is beneficial to improving the cleanliness of the cleaning tank.

The present application also proposes a cleaning system having the above cleaning base station.

According to the cleaning control method for a cleaning system of an embodiment of the present application, the cleaning system includes a cleaning device and a cleaning base station, the cleaning base station includes a base station base, a cleaning member, a limiting member, a water supply component and a drainage component, the base station base is formed with a cleaning tank and a filter tank, the cleaning member is movably arranged in the cleaning tank, the water supply component is used to supply water to the cleaning tank, and the drainage component is used to discharge the sewage generated in the cleaning tank, the cleaning control method includes: controlling the cleaning device to move to the cleaning base station, the wiping member of the cleaning device is located in the cleaning tank; controlling the limiting member to limit the cleaning member to be in a first cleaning state so that the cleaning member is fixed relative to the base station base, and the wiping member of the cleaning device moves relative to the cleaning member for cleaning; controlling the limiting member to disengage from the cleaning member, the cleaning member is in a second cleaning state so that the cleaning member can move, the cleaning member moves to clean the cleaning tank, and the dirt in the cleaning tank is suitable for flowing into the filter tank for filtration under the stirring of the cleaning member.

According to the cleaning control method for a cleaning system in an embodiment of the present application, sewage and solid dirt can be better separated through the filter tank, which is convenient for classifying and treating different types of dirt, and can better avoid blockage of sewage pipes. By controlling the cleaning part to switch between the first cleaning state and the second cleaning state through the limit part, the cleaning base station can be switched between the two modes of cleaning the mopping part and cleaning the cleaning tank, which can improve the automation level of the cleaning system, thereby better reducing the user's operations during the use of the cleaning system, and is conducive to improving the user experience of the cleaning system.

According to some embodiments of the present application, controlling the cleaning device to move to the cleaning base station includes: the wiping member is located on the cleaning member and contacts the cleaning member; the wiping member of the cleaning device moves relative to the cleaning member to clean, including: controlling the wiping member to rotate and rub against the cleaning member to clean the wiping member; the cleaning member moves to clean the cleaning tank, including: controlling the wiping member to rotate to drive the cleaning member to rotate.

According to some embodiments of the present application, the rotation speed of the wiping member in the second cleaning state is smaller than the rotation speed of the wiping member in the first cleaning state.

According to some embodiments of the present application, after the cleaning member moves to clean the cleaning tank, the process further includes: controlling the wiping member to disengage from the cleaning member and controlling the wiping member to rotate; or controlling the wiping member to rotate and drive the cleaning member to rotate.

According to some embodiments of the present application, the cleaning element moves to clean the cleaning tank, including: controlling the cleaning element to rotate at a constant speed; or, controlling the cleaning element to rotate intermittently; or, controlling the cleaning element to rotate alternately along different rotation directions.

According to some embodiments of the present application, after the cleaning member moves to clean the cleaning tank, the process further includes: controlling the wiping member to rotate.

According to some embodiments of the present application, the cleaning system also includes a drying and collecting component, which is arranged on the base station base and includes a drying component and a collecting component. After the cleaning component moves to clean the cleaning tank, it also includes: controlling the drying component to dry the mopping component and the solid dirt in the filter tank; controlling the collecting component to collect the dried solid dirt in the filter tank.

According to some embodiments of the present application, the drying temperature of the drying component for drying the mopping member and the solid dirt in the filter tank is T, and the drying time is t. The value range of T is 40 to 80° C., and the value range of t is 1.5h to 2.5h.

According to some embodiments of the present application, the collecting component includes a suction nozzle, which is movably located in the filter tank, and the solid dirt in the filter tank is suitable for being sucked into the collecting component through the suction nozzle; the collecting component collects the solid dirt in the filter tank, including: starting the collection fan of the collecting component to form a negative pressure at the suction nozzle; controlling the movement of the suction nozzle so that the scraping wall of the suction nozzle scrapes the bottom wall of the filter tank, so as to separate the solid dirt from the bottom wall of the filter tank.

According to some embodiments of the present application, the suction nozzle is suitable for reciprocating along a suction direction parallel to the suction nozzle.

According to some embodiments of the present application, the suction nozzle constitutes the limiting member; controlling the cleaning device to move to the cleaning base station includes: the wiping member is located on the cleaning member and contacts the cleaning member; controlling the limiting member to limit the cleaning member includes: controlling the suction nozzle to be located at a limiting position and cooperating with the cleaning member so that the cleaning member is located in the first cleaning state, controlling the wiping member to rotate and rub against the cleaning member to clean the wiping member; controlling the limiting member to disengage from the cleaning member includes: controlling the suction nozzle to be located in a non-limiting position and disengaging from the cleaning member so that the cleaning member is located in the second cleaning state, and controlling the wiping member to rotate to drive the cleaning member to rotate.

According to some embodiments of the present application, the wiping member is controlled to rotate and rub against the cleaning member to clean the wiping member, including: an initial cleaning stage and a stable cleaning stage after the initial stage, and the rotation speed of the wiping member in the initial cleaning stage is lower than the rotation speed of the wiping member in the stable cleaning stage.

According to some embodiments of the present application, in the initial cleaning stage, the rotation speed of the mopping member gradually increases; and in the stable cleaning stage, the rotation speed of the mopping member remains unchanged.

According to some embodiments of the present application, the filter trough includes a filter area and a non-filter area, the bottom wall of the filter area is formed with a filter structure, at least a portion of the suction nozzle is located in the filter area in the limited position, and the suction nozzle is located in the non-filter area in the non-limited position; controlling the drying component to dry the mopping member and the solid dirt in the filter trough includes: controlling the suction nozzle to be located in the non-limited position.

According to some embodiments of the present application, the drying component includes a drying duct member and a drying fan, the drying duct member has a drying duct, the collecting component includes a collecting duct member and a collecting fan, the collecting duct member has a collecting duct, the drying collecting component includes a suction nozzle, the suction nozzle is located in the filter tank and is connected to the outlet end of the drying duct member and the inlet end of the collecting duct member, the suction nozzle can be selectively connected to the drying duct and the collecting duct; controlling the drying component to dry the solid dirt in the wiping member and the filter tank includes: controlling the suction nozzle to be connected to the drying duct, controlling the drying fan to be turned on and the collecting fan to be turned off; controlling the collecting component to collect the solid dirt in the filter tank includes: controlling the suction nozzle to be connected to the collecting duct, controlling the collecting fan to be turned on and the drying fan to be turned off.

According to some embodiments of the present application, the wiping member of the cleaning device moves relative to the cleaning member to clean, including: controlling the water supply component to supply water into the cleaning tank; after the cleaning member moves to clean the cleaning tank, including: controlling the water supply component to stop supplying water into the cleaning tank.

According to the embodiment of the present application, the cleaning system includes: a cleaning base station, including a first control module, the first control module is used to control the cleaning base station; a cleaning device, including a second control module, the second control module is used to control the cleaning device; wherein the cleaning device is suitable for cooperating with the cleaning base station, and the first control module is communicatively connected with the second control module, and is used to jointly control the cleaning system to operate according to the above-mentioned cleaning control method.

According to some embodiments of the present application, the bottom wall of the filtering tank is lower than the bottom wall of the cleaning tank.

According to some embodiments of the present application, the filter tank is located on the outer peripheral side of the cleaning tank.

According to some embodiments of the present application, a connecting gap is formed on the peripheral wall of the cleaning tank, and the connecting gap connects the filtering tank and the cleaning tank.

According to some embodiments of the present application, the cleaning member is rotatably disposed in the cleaning tank, and the rotation axis of the cleaning member extends in the up-down direction. During the rotation of the cleaning member, the cleaning member is suitable for passing over the filter tank.

According to some embodiments of the present application, at least a portion of the bottom wall of the cleaning tank is formed as a guide surface, and the guide surface extends obliquely downward in a direction from the cleaning tank to the filtering tank.

According to some embodiments of the present application, the cleaning piece is rotatably disposed in the cleaning tank, the cleaning piece includes a cleaning piece body and a rotating shaft, a rotating hole is formed on the bottom wall of the cleaning tank, the rotating shaft is rotatably engaged with the rotating hole, and the cleaning piece body is located in the cleaning tank; wherein, in the first cleaning state, in the rotation direction of the cleaning piece, the limiting piece abuts against the cleaning piece body to fix the cleaning piece relative to the base station base.

According to some embodiments of the present application, the rotating hole is a blind hole, which is formed by the downward depression of the bottom wall of the cleaning tank, the inner peripheral wall of the rotating hole is formed with a first limiting protrusion, and the outer peripheral wall of the rotating shaft is formed with a second limiting protrusion, and the second limiting protrusion is located at the lower side of the first limiting protrusion and abuts against the first limiting protrusion in the upper and lower directions.

According to some embodiments of the present application, a buffer structure is provided on one of the cleaning component body and the limiting component. In the first cleaning state, in the rotation direction of the cleaning component, the buffer structure is located between the limiting component and the cleaning component body.

According to some embodiments of the present application, the buffer structure includes a buffer layer. In the rotation direction of the cleaning piece, the cleaning piece body has a first side wall and a second side wall that are oppositely arranged. The buffer layer is provided on at least one of the first side wall and the second side wall, and the buffer layer is a rubber layer.

According to some embodiments of the present application, the area swept by the cleaning element during the rotation process is the cleaning area. In the first cleaning state, the portion of the limiting element located in the cleaning area is the limiting portion. In the rotation direction of the cleaning element, the limiting portion abuts against the cleaning element body, and the upper surface of at least the limiting portion of the limiting element is not higher than the upper surface of the cleaning element.

According to some embodiments of the present application, the cleaning piece includes a cleaning piece body and a first cleaning structure arranged on the bottom surface of the cleaning piece body. The cleaning piece body can be rotatably arranged in the cleaning tank. When the cleaning piece body rotates, it drives the first cleaning structure to stir the dirt in the cleaning tank and flow it into the filter tank.

According to some embodiments of the present application, the first cleaning structure is suitable for contacting with the bottom wall of the cleaning tank.

According to some embodiments of the present application, the first cleaning structure includes at least one of a flexible rubber strip and a brush.

According to some embodiments of the present application, the cleaning piece includes a cleaning piece body and a second cleaning structure arranged on the radial outer end surface of the cleaning piece body, the cleaning piece body is rotatably arranged in the cleaning tank, and the second cleaning structure is suitable for contacting the inner circumferential wall of the cleaning tank.

According to some embodiments of the present application, the limit member is movably provided on the base station base between a limit position and a non-limit position, and in the limit position, the limit member cooperates with the cleaning member to put the cleaning member in a first cleaning state; in the non-limit position, the limit member disengages from the cleaning member.

According to some embodiments of the present application, the cleaning member is rotatably disposed in the cleaning tank, and the area swept by the cleaning member during rotation is the cleaning area. In the limit position, at least a portion of the limit member is located in the cleaning area, and in the non-limit position, the limit member is located on the outer peripheral side of the cleaning area.

According to some embodiments of the present application, the cleaning element is rotatably provided in the cleaning tank, and the area swept by the cleaning element during the rotation is the cleaning area. The cleaning element can be raised and lowered between a first position and a second position, and the second position is located below the first position; wherein, in the first cleaning state, the cleaning element is located at the first position, and at least a part of the limiting element is located within the cleaning area; in the second cleaning state, the cleaning element is located at the second position, and the limiting element is located above the cleaning area.

According to some embodiments of the present application, a water supply hole is formed on the inner peripheral wall of the cleaning tank, and the water supply assembly is connected to the water supply hole through a water supply channel.

According to some embodiments of the present application, a water outlet groove is formed on the upper surface of the cleaning member, and the water of the water supply assembly is suitable for flowing into the water outlet groove, and the water in the water outlet groove is suitable for overflowing into the cleaning groove.

According to some embodiments of the present application, in the first cleaning state, the water outlet groove is adjacent to the water supply hole, and the water supply hole is suitable for supplying water into the water outlet groove.

According to some embodiments of the present application, the cleaning member is rotatably disposed in the cleaning tank, the rotation axis of the cleaning member extends in the up-and-down directions, a water supply gap is formed on the radial outer end surface of the cleaning member, and the water supply gap penetrates the side wall of the water outlet tank; wherein, in the first cleaning state, the water supply gap is opposite to the water supply hole.

According to some embodiments of the present application, the water outlet groove includes a first groove area and a second groove area, the first groove area is located radially outside the second groove area, and the water supply gap is formed on the side wall of the first groove area; wherein, in the first cleaning state, the mopping member covers the second groove area, and the first groove area is exposed to the outer peripheral side of the mopping member.

According to some embodiments of the present application, in the rotation direction of the cleaning element, the width of the first groove area is greater than the width of the second groove area.

According to some embodiments of the present application, the bottom wall of the second groove region is lower than the bottom wall of the first groove region.

According to some embodiments of the present application, a filtering structure is formed on the bottom wall of the filter tank, and a sewage cache cavity is also formed on the base station base. The sewage cache cavity is located below the filter tank and is connected to the filter tank through the filtering structure. The drainage component is used to discharge the sewage in the sewage cache cavity.

According to some embodiments of the present application, the drainage component includes a drain pipe, which is connected to the bottom wall of the filter tank and communicates with the sewage cache chamber, and the drain pipe is used to discharge the sewage in the sewage cache chamber.

According to some embodiments of the present application, the drainage assembly further includes a sewage tank, and the sewage tank is connected to the sewage buffer chamber through the sewage pipe.

According to some embodiments of the present application, there are two cleaning tanks arranged in the left-right direction, and the filter tank is located between the two cleaning tanks, and the dirt in the two cleaning tanks is suitable for flowing into the filter tank.

Additional aspects and advantages of the present application will be given in part in the description below, and in part will become apparent from the description below, or will be learned through the practice of the present application.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG1 is a schematic flow chart of a cleaning control method for a cleaning system according to an embodiment of the present application;

FIG2 is a detailed schematic diagram of a cleaning control method for a cleaning system according to an embodiment of the present application;

FIG3 is a schematic diagram of a part of a cleaning base station and a mopping member according to an embodiment of the present application;

FIG4 is a top view of a portion of a cleaning base station and a mopping member according to an embodiment of the present application;

FIG5 is a partial schematic diagram of a cleaning base station according to an embodiment of the present application;

FIG6 is a partial top view of a cleaning base station according to an embodiment of the present application;

FIG7 is a partial exploded view of a cleaning base station according to an embodiment of the present application;

8 is a cross-sectional view of a cleaning base station along the front-to-back direction through the center according to an embodiment of the present application;

FIG9 is an enlarged view of area A in FIG8 ;

FIG10 is a schematic diagram of a part of a cleaning base station from another perspective according to an embodiment of the present application;

FIG11 is an enlarged view of area B in FIG10 ;

FIG12 is a schematic diagram of a cleaning member of a cleaning base station according to an embodiment of the present application;

13 is a schematic diagram of a drying air duct member, a collecting air duct member, a connecting air duct member, a suction nozzle, a filtering component and a sewage discharge pipe of a cleaning base station according to an embodiment of the present application;

14 is a bottom side view of a drying air duct member, a collecting air duct member, a connecting air duct member and a suction nozzle of a cleaning base station according to an embodiment of the present application;

15 is a schematic diagram of a drying air duct member, a collecting air duct member, a connecting air duct member and a suction nozzle of a cleaning base station according to an embodiment of the present application;

16 is a schematic diagram of a drying air duct member, a collecting air duct member, and a connecting air duct member of a cleaning base station according to an embodiment of the present application;

FIG. 17 is a schematic diagram of a nozzle of a cleaning base station according to an embodiment of the present application.

Reference numerals:

Cleaning base station 100; base station base 1; base body 11; cleaning tank 111; rotating hole 112; connecting gap 113; water supply hole 114; filter component 12; filter hole 121; connecting branch pipe 122; filter tank 13; sewage buffer chamber 14; cleaning part 2; cleaning part body 21; first side wall 211; second side wall 212; first cleaning structure 213; rotating shaft 22; water outlet tank 23; first tank area 231; second tank area 232; water supply Water gap 24; cleaning protrusion 25; limit member 3; limit part 31; drain pipe 4; drying duct member 5; drying duct 51; collecting duct member 6; collecting duct 61; suction nozzle 7; suction part 71; suction port 711; scratch wall 712; guide wall 713; sliding part 72; first sliding part 721; second sliding part 722; connecting cavity 723; first connecting channel 7231; second connecting channel 7232; connecting duct member 8; first channel 81; second channel 82; sliding cavity 83; first sliding cavity 831; second sliding cavity 832; avoidance hole 84; driving mechanism 9; wiping member 200.

DETAILED DESCRIPTION

The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present application, and should not be construed as limiting the present application.

The disclosure below provides many different embodiments or examples to realize the different structures of the present application. In order to simplify the disclosure of the present application, the parts and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present application. In addition, the present application can repeat reference numbers and/or letters in different examples. This repetition is for the purpose of simplification and clarity, and does not indicate the relationship between the various embodiments and/or settings discussed in itself. In addition, the various specific processes and examples of materials provided by the present application, but those of ordinary skill in the art can appreciate the applicability of other processes and/or the use of other materials.

The following describes a cleaning control method for a cleaning system according to an embodiment of the present application with reference to the accompanying drawings.

Among them, the cleaning system includes a cleaning device and a cleaning base station 100. The cleaning base station 100 includes a base station base 1, a cleaning part 2, a limit part 3, a water supply component and a drainage component. The base station base 1 is formed with a cleaning tank 111 and a filter tank 13. The cleaning part 2 can be movably arranged in the cleaning tank 111. The water supply component is used to supply water to the cleaning tank 111. The drainage component is used to discharge the sewage in the cleaning tank 111 to avoid the accumulation of sewage in the cleaning tank 11 and the filter tank 13. As shown in Figures 1-17, the cleaning control method according to the embodiment of the present application includes: controlling the cleaning device to move to the cleaning base station 100, and the wiping part 200 of the cleaning device is located in the cleaning tank 111.

It can be understood that when the cleaning device is running to clean the ground, the mop 200 can be driven to contact the ground and move relative to the ground, so as to sweep and mop the ground through the mop 200, and at the same time, the dust and other dirt on the ground will adhere to the mop 200. Therefore, when there are many dirts adhering to the mop 200, which affects the sweeping and mopping effect of the mop 200, the cleaning device can move to the base station base 1 so that the mop 200 is located in the cleaning tank 111, so that the cleaning base station 100 can clean the mop 200 to restore the cleanliness of the mop 200, so that the cleaning device can carry the clean mop 200 to continue sweeping and mopping, which is conducive to improving the cleaning effect of the cleaning device. In addition, the mop 200 is located in the cleaning tank 111, so that the cleaning tank 111 can better collect and accommodate the dirt and sewage that fall off the mop 200 during the cleaning of the mop 200 by the cleaning base station 100, thereby better avoiding the pollution caused by the overflow of dirt.

After the cleaning device moves to the cleaning base station 100 and the mopping and wiping member 200 is located in the cleaning tank 111, the limiting member 3 is controlled to limit the cleaning member 2 to be located in the first cleaning state so that the cleaning member 2 is fixed relative to the base station base 1, and the mopping and wiping member 200 of the cleaning device moves relative to the cleaning member 2 for cleaning. That is, at this time, the cleaning base station is in the mopping and wiping member cleaning mode, so that the dirt adhered to the mopping and wiping member 200 can be better cleaned through the relative movement of the cleaning member 2 and the mopping and wiping member 200 to restore the cleanliness of the mopping and wiping member 200, and at the same time, it can better ensure that the cleaning member 2 cleans the mopping and wiping member 200 comprehensively.

Among them, the clean water injected into the cleaning tank 111 by the water supply component can better wet the mop 200 located in the cleaning tank 111, and the water can better absorb and dissolve dirt such as dust on the mop 200. At the same time, the dirt on the mop 200 can be separated from the mop 200 together with the water, which can better improve the cleaning effect of the cleaning base station 100 on the mop 200 to improve the cleanliness of the mop 200. In addition, by continuously injecting clean water into the cleaning tank 111 through the water supply component, the mop 200 can be repeatedly rinsed by dipping in the clean water in the cleaning tank 111, which is conducive to further improving the cleaning effect of the cleaning base station 100 on the mop 200.

It should be noted that here only one type of liquid stored in the water supply component is illustrated to facilitate understanding of the role of the water supply component in the cleaning process of the mop 200. Clean water can be stored in the water supply component. Of course, clean water mixed with detergent can also be added to the water supply component. Disinfectant can also be added to the water supply component, etc., to further enhance the cleaning effect of the liquid in the water supply component on the mop 200. There is no specific restriction on the type of liquid stored in the water supply component.

After the wiping member 200 has finished cleaning, the limiting member 3 is controlled to be separated from the cleaning member 2, and the cleaning member 2 is in the second cleaning state so that the cleaning member 2 can move. The cleaning member 2 moves to clean the cleaning tank 111, and the dirt in the cleaning tank 111 is suitable for flowing into the filter tank 13 for filtration under the stirring of the cleaning member 2. In other words, through the rotation of the cleaning tank 111 relative to the cleaning tank 111, the cleaning tank 111 can better clean the inner wall of the cleaning tank 111, such as the cleaning member 2 can scrape the solid dirt on the inner wall of the cleaning tank 111 to separate it from the inner wall of the cleaning tank 111, and at the same time, the movement of the cleaning member 2 can better stir the flow of sewage in the cleaning tank 111, so as to better accelerate the speed of sewage entering the filter tank 13.

In addition, the sewage flowing in the cleaning tank 111 can better drive the solid dirt attached to the cleaning tank 111 to flow together, so that the solid dirt can flow into the filter tank 13 along with the sewage, so as to avoid the solid dirt falling off the mopping member 200 when cleaning the mopping member 200. The accumulation on the inner wall of the cleaning tank 111 is conducive to ensuring the cleanliness of the cleaning tank 111, that is, the self-cleaning of the cleaning tank 111 by the cleaning base station 100 can be well realized through the movement of the cleaning member 2 relative to the cleaning tank 111, which can well reduce the frequency of the user cleaning the cleaning tank 111, which is conducive to improving the user experience. As a result, the cleaning base station 100 can simultaneously have the two functions of cleaning the mopping member 200 and self-cleaning the cleaning tank 111, which can improve the automation level of the cleaning system, thereby well reducing the user's operation during the use of the cleaning system, which is conducive to improving the user experience of the cleaning system.

Among them, the dirt in the cleaning tank 111 can flow into the filter tank 13 along with the sewage, so that the sewage in the cleaning tank 111 can be better prevented from overflowing the base station base 1 and polluting the environment. The filter tank 13 can better intercept solid particles, hair and other solid dirt carried in the sewage, that is, the filter tank 13 can better separate the sewage and solid dirt, which is convenient for classification and treatment of different types of dirt, so as to better improve the treatment effect of the cleaning base station 100 on the dirt in the cleaning tank 111. In addition, when the drainage component discharges the sewage in the filter tank 13, it can better prevent the solid dirt in the filter tank 13 from entering the drainage component and causing blockage, that is, ensure that the drainage component is unobstructed, and then ensure that the sewage can be discharged smoothly through the drainage component.

Moreover, during the cleaning process of the cleaning tank 111, the water supply component supplies water to the cleaning tank 111, which can effectively dilute the sewage concentration in the cleaning tank 111, and at the same time, the cleaning member 2 can stir the clean water to repeatedly rinse the inner wall of the cleaning tank 111, further improving the cleaning effect of the cleaning member 2 on the cleaning tank 111. Therefore, by controlling the cleaning member 2 to switch between the first cleaning state and the second cleaning state through the limit member 3, the cleaning base station 100 can switch between the two modes of cleaning the mopping member and cleaning the cleaning tank, which can effectively simplify the control of the cleaning base station 100. In some embodiments, the movement of the cleaning member 2 can be driven by the movement of the mopping member 200, that is, the mopping member 200 and the cleaning member 2 can be connected in transmission; in other embodiments, the cleaning base station 100 is provided with a driving motor connected in transmission with the cleaning member 2, so as to drive the cleaning member to rotate through the driving motor.

According to the cleaning control method of the embodiment of the present application, sewage and solid dirt can be better separated through the filter tank 13, which is convenient for classifying and treating different types of dirt, and can better avoid blockage of the sewage pipe. The cleaning part 2 is controlled to switch between the first cleaning state and the second cleaning state by the limiter 3, so that the cleaning base station 100 can be switched between the two modes of cleaning the mopping part and cleaning the cleaning tank, which can better improve the automation level of the cleaning system, thereby better reducing the user's operations during the use of the cleaning system, which is conducive to improving the user experience of the cleaning system.

Among them, the water supply component can be a water supply pipe, and the two ends of the water supply pipe are respectively connected to the cleaning tank 111 and an external water source such as a tap water pipe, so that the external water source can directly enter the cleaning tank 111 through the water supply pipe; the water supply component can also be a water supply tank arranged on the cleaning base station 100, the water supply tank is connected to the cleaning tank 111, and the user can manually add water to the water supply tank so that the water in the water supply tank can enter the cleaning tank 111; the water supply component can also include a water supply pipe and a water supply tank, the two ends of the water supply pipe are respectively connected to an external water source such as a tap water pipe and a water supply tank, and the water supply tank is connected to the cleaning tank 111, so that automatic addition of water from the external water source to the water supply tank can be realized.

Among them, the drainage component can be a drainage pipe, and the two ends of the drainage pipe are respectively connected to the cleaning tank 111 and the sewer pipe such as the sewer, so that the sewage in the cleaning tank 111 can be directly discharged into the sewer pipe through the drainage pipe; the drainage component can also be a sewage tank arranged at the cleaning base station 100, and the sewage tank can be connected with the cleaning tank 111 through the sewage pipe 4, and the sewage in the cleaning tank 111 can flow into the sewage tank, and the user can manually clean the sewage in the sewage tank; the drainage component can also include a sewage tank and a drainage pipe, and the two ends of the drainage pipe are respectively connected to the sewage tank and the sewer pipe such as the sewer, and the sewage tank can be connected with the cleaning tank 111 through the sewage pipe 4, so that the sewage in the sewage tank can be automatically discharged into the sewer through the drainage pipe.

In a specific example, the cleaning base station 100 includes a water supply component and a drainage component. The water supply component is used to supply water to the cleaning tank 111, and the drainage component is used to discharge the sewage generated in the cleaning tank 111. The water supply component and the drainage component together constitute a water supply and drainage module.

According to some embodiments of the present application, controlling the cleaning device to move to the cleaning base station 100 includes: the wiping member 200 is located on the cleaning member 2 and contacts the cleaning member 2, that is, when the wiping member 200 needs to be cleaned, after the cleaning device enters the cleaning base station 100, the wiping member 200 is pressed on the cleaning member 2. Wherein, the wiping member 200 of the cleaning device moves relative to the cleaning member 2 for cleaning, including: controlling the cleaning member 2 to be located in the first cleaning state so that the cleaning member 2 is fixed relative to the base station base 1, and controlling the wiping member 200 to rotate and rub against the cleaning member 2 to clean the wiping member 200.

That is, the cleaning member 2 has a first cleaning state fixed relative to the base station base 1, so when the mop wiping member 200 needs to be cleaned, the mop wiping member 200 can be rotated relative to the cleaning member 2 in the first cleaning state by controlling the mop wiping member 200 to rotate relative to the base station base 1, so that the rotating mop wiping member 200 and the fixed cleaning member 2 can rotate relative to each other. The mop wiping member 200 can be wetted by water injected into the cleaning tank 111 by the water supply component, so that the cleaning member 2 can scrape and remove dirt on the mop wiping member 200 through friction with the wetted mop wiping member 200 to achieve the cleaning operation of the mop wiping member 200.

In addition, the cleaning member 2 moves to clean the cleaning tank 111, including: controlling the cleaning member 2 to be in the second cleaning state so that the cleaning member 2 can move, and controlling the wiping member 200 to rotate to drive the cleaning member 2 to rotate. That is, the cleaning member 2 also has a second cleaning state in which it can move freely relative to the base station base 1. Therefore, when the cleaning tank 111 needs to be cleaned, the wiping member 200 is controlled to rotate relative to the base station base 1, so that the wiping member 200 can drive the cleaning member 2 to move synchronously with the wiping member 200 in the cleaning tank 111 through the friction between the wiping member 2 and the cleaning member 2, so that the cleaning tank 111 can be cleaned by the moving cleaning member 2 and the dirt in the cleaning tank 111 can be stirred and flowed into the filter tank 13 for filtration.

Thus, the cleaning base station 100 can control the cleaning member 2 to switch between the first cleaning state and the second cleaning state according to the needs of cleaning the mop 200 or the cleaning tank 111, which can effectively reduce the difficulty of the cleaning base station 100 switching between the two modes of cleaning the mop 200 and cleaning the cleaning tank 111, and at the same time, the coordination between the mop 200 and the cleaning member 2 is simple, which is conducive to simplifying the structure of the cleaning system. In addition, while the mop 200 drives the cleaning member 2 in the second cleaning state to move, it can also spin out the adsorbed liquid, so that the moisture content in the mop 200 can be reduced during the cleaning of the cleaning tank 111, so as to reduce the difficulty of subsequent drying of the mop 200.

According to some embodiments of the present application, the rotation speed of the mopping member 200 in the second cleaning state is less than the rotation speed of the mopping member 200 in the first cleaning state. That is, the rotation speed of the mopping member 200 driving the cleaning member 2 in the second cleaning state is less than the rotation speed of the mopping member 200 relative to the cleaning member 2 in the first cleaning state. It can be understood that the faster the rotation speed of the mopping member 200 relative to the cleaning member 2 in the first cleaning state, the more times the cleaning member 2 completely sweeps over the mopping member 200 in the same time, that is, the higher the cleaning frequency of the mopping member 200; the faster the rotation speed of the cleaning member 200 driving the cleaning member 2 in the second cleaning state, the greater the stirring and impact force of the cleaning member 2 on the sewage in the cleaning tank 111, and the easier it is to generate splashing sewage. Thus, it is possible to better avoid that the wiping member 200 rotates too slowly relative to the cleaning member 2 in the first cleaning state, resulting in too few times for the cleaning member 2 to sweep over the wiping member 200, that is, by increasing the rotation speed of the wiping member 200 relative to the cleaning member 2, the cleaning frequency of the wiping member 2 on the wiping member 200 can be better increased. At the same time, it is possible to better avoid that the wiping member 200 drives the cleaning member 2 in the second cleaning state to rotate too fast, causing the sewage in the cleaning tank 111 to cause secondary contamination to the wiping member 200, so as to ensure the cleaning effect of the cleaning base station 100 on the wiping member 200.

According to some embodiments of the present application, after the cleaning member 2 moves to clean the cleaning tank 111, the method further includes: controlling the wiping member 200 to be out of contact with the cleaning member 2, and controlling the wiping member 200 to rotate. That is, after the cleaning tank 111 is cleaned, the wiping member 200 is separated from the cleaning member 2 and the wiping member 200 rotates. Thus, the absorbed water can be thrown out better through the rotation of the wiping member 200 to improve the dryness of the wiping member 200.

When the mop and wiping member 200 is out of contact with the cleaning member 2 and the mop and wiping member 200 rotates to throw off the water, the mop and wiping member 200 and the solid dirt in the filter tank 13 can be dried by the drying assembly. That is, when the mop and wiping member 200 is dried by the drying assembly, the mop and wiping member 200 is separated from the cleaning member 2 and the mop and wiping member 200 rotates by itself. Therefore, the absorbed water can be thrown out well by the rotation of the mop and wiping member 200, so that the drying time of the mop and wiping member 200 by the drying assembly can be shortened, and the friction resistance generated by the contact between the mop and wiping member 200 and the cleaning member 2 can be avoided, so that the rotation speed of the mop and wiping member 200 can be improved and the energy consumption of driving the mop and wiping member 200 to rotate can be saved, and at the same time, the drying of different areas on the mop and wiping member 200 by the drying assembly can be ensured well. In a specific example, the air outlet of the drying component is located on the inner wall of the cleaning tank 111. Therefore, by rotating the mopping member 200, each circumferential portion of the mopping member 200 can circulate through the outlet of the drying component, thereby better ensuring that the drying component dries the mopping member 200 evenly.

According to some embodiments of the present application, after the cleaning member 2 moves to clean the cleaning tank 111, the method further includes: controlling the wiping member 200 to rotate and driving the cleaning member 2 to rotate. That is, after the cleaning tank 111 is cleaned, the wiping member 200 continues to rotate. Thus, the absorbed water can be thrown out better through the rotation of the wiping member 200 to improve the dryness of the wiping member 200.

When the wiping member 200 rotates and drives the cleaning member 2 to rotate and throw away water, the drying component can dry the wiping member 200 and the solid dirt in the filter tank 13. Therefore, the rotation of the wiping member 200 can better throw out the adsorbed water, and at the same time, it can better ensure that the drying component evenly dries different areas on the wiping member 200. In addition, the cleaning member 2 can scrub the cleaning tank 111 by rotating synchronously with the wiping member 200, which is conducive to further improving the cleanliness of the cleaning tank 111.

According to some embodiments of the present application, the movement of the cleaning member 2 to clean the cleaning tank 111 includes: controlling the cleaning member 2 to rotate at a constant speed. That is, when the cleaning tank 111 is cleaned by the cleaning member 2, the rotation speed of the cleaning member 2 relative to the cleaning tank 111 is kept constant, so that the cleaning member 2 can clean the cleaning tank 111 at a constant speed and stir the dirt in the cleaning tank 111 at a constant speed to flow into the filter tank 13, which can better improve the stability of the rotation of the cleaning member 2, and the control logic is simple.

According to some embodiments of the present application, the cleaning member 2 moves to clean the cleaning tank 111, including: controlling the intermittent rotation of the cleaning member 2. That is, when the cleaning tank 111 is cleaned by the cleaning member 2, the cleaning member 2 has two states: moving relative to the cleaning tank 111 and being fixed relative to the cleaning tank 111. The cleaning member 2 rotates relative to the cleaning tank 111 for a certain period of time and then stops rotating for a certain period of time. Thus, while ensuring that the cleaning member 2 can clean the cleaning tank 111 and stir the dirt in the cleaning tank 111 to enter the filter tank 13 when it moves relative to the cleaning tank 111, stopping the rotation of the cleaning member 2 can better avoid the cleaning member 2 from continuously rotating to entrain the dirt, resulting in the dirt being unable to enter the filter tank 13, which is beneficial to improving the efficiency of the dirt in the cleaning tank 111 flowing into the filter tank 13, and at the same time can better save the energy consumption of the movement of the cleaning member 2.

According to some embodiments of the present application, the cleaning member 2 moves to clean the cleaning tank 111, including: controlling the cleaning member 2 to rotate alternately along different rotation directions. That is, when the cleaning tank 111 is cleaned by the cleaning member 2, the cleaning member 2 has two rotation states: rotating in a clockwise direction relative to the cleaning tank 111 or rotating in a counterclockwise direction relative to the cleaning tank 111. The cleaning member 2 rotates in a clockwise direction relative to the cleaning tank 111 for a certain period of time and then adjusts to rotate in a counterclockwise direction relative to the cleaning tank 111, and rotates in a counterclockwise direction relative to the cleaning tank 111 for a certain period of time and then adjusts to rotate in a clockwise direction relative to the cleaning tank 111. As a result, the cleaning member 2 can clean the cleaning tank 111 in a clockwise and counterclockwise direction and stir the dirt in the cleaning tank 111 to enter the filter tank 13, so as to ensure that the cleaning member 2 fully scrubs the cleaning tank 111, and can better improve the stirring effect of the cleaning member 2 on the dirt in the cleaning tank 111, which is beneficial to improving the cleaning effect of the cleaning member 2 on the cleaning tank 111. 111 cleaning effect.

According to some embodiments of the present application, after the cleaning member 2 moves to clean the cleaning tank 111, the method further includes: controlling the mopping member 200 to rotate. That is, after the cleaning tank 111 is cleaned, the mopping member 200 continues to rotate. Thus, the absorbed water can be thrown out better through the rotation of the mopping member 200 to improve the dryness of the mopping member 200.

When the mop 200 rotates to throw off the water, the drying component dries the mop 200 and the solid dirt in the filter tank 13. Therefore, the rotation of the mop 200 can effectively throw out the adsorbed water, thereby effectively shortening the drying time of the mop 200 by the drying component, so as to improve the drying efficiency of the cleaning base station 100 for the mop 200, and better ensure that the drying component dries different areas on the mop 200. In a specific example, the air outlet of the drying component is located on the inner peripheral wall of the cleaning tank 111, so that the rotation of the mop 200 can make every part of the mop 200 in the circumferential direction circulate through the outlet of the drying component, thereby effectively ensuring that the drying component dries the mop 200 evenly.

According to some embodiments of the present application, the cleaning system further includes a drying and collecting component, which is disposed on the base station base 1 and includes a drying component and a collecting component. After the cleaning member 2 moves to clean the cleaning tank 111, it further includes: controlling the drying component to dry the solid dirt in the mopping member 200 and the filter tank 13. That is, after the cleaning tank 111 is cleaned, the mopping member 200 and the solid dirt drying mode is entered, and before the drying component dries the solid dirt in the mopping member 200 and the filter tank 13, the dirt in the cleaning tank 111 has completely flowed into the filter tank 13 and has been filtered.

Thus, by drying the mop and wipe member 200, it is possible to better avoid the mop and wipe member 200 being in a wet state to generate odor or breed bacteria, and at the same time, the cleaning device can drive the dried mop and wipe member 200 to sweep and absorb moisture on the ground to prevent the ground from being slippery; by drying the solid dirt in the filter tank 13, the dried solid dirt is easy to separate from the filter tank 13, thereby better avoiding the wet solid dirt from adhering to the filter tank 13 and being difficult to clean. In addition, when the drying component dries the mop and wipe member 200 and the solid dirt in the filter tank 13, such as by hot air drying, the hot air can be better dissipated into the cleaning tank 111 and the filter tank 13 at the same time, which can better ensure that the cleaning tank 111 and the filter tank 13 are in a dry state, thereby better avoiding the cleaning tank 111 and the filter tank 13 from being in a wet environment for a long time to breed mud or bacteria.

After the solid dirt is dried, the collection component is controlled to collect the dried solid dirt in the filter tank 13. That is to say, the collection component is used to collect and store the solid dirt that has been dried in the filter tank 13, that is, in a dry state, which can reduce the frequency of the user cleaning the dirt in the cleaning base station to improve the user's experience. At the same time, it can better avoid the accumulation of solid dirt in the filter tank 13, and the space in the cleaning filter tank 13 is convenient for receiving the dirt generated in the next cleaning process, and can better prevent the solid dirt from clogging the filter tank 13. In addition, it can better avoid the collection component directly collecting wet solid dirt, causing the collection component to be in a humid environment for a long time to breed mud or bacteria, which is conducive to improving the cleanliness of the internal environment of the collection component. As a result, the cleaning base station 100 can automatically filter, dry and collect the solid dirt generated during the cleaning process, which can better avoid the accumulation of solid dirt in the cleaning base station 100 and improve the cleanliness of the cleaning base station 100.

According to some embodiments of the present application, the drying temperature of the drying component for drying the solid dirt in the mop 200 and the filter tank 13 is T, and the drying time is t, the value range of T is 40-80°C, and the value range of t is 1.5h-2.5h. That is, the temperature of the drying component for drying the solid dirt in the mop 200 and the filter tank 13 is controlled within the range of 40°C to 80°C, and the time of the drying component for drying the solid dirt in the mop 200 and the filter tank 13 is controlled within the range of 1.5h to 2.5h. For example, the temperature of the drying component for drying the solid dirt in the mop 200 and the filter tank 13 can be 40°C, or 45°C, or 55°C, or 67°C, or 80°C, etc., and the time of the drying component for drying the solid dirt in the mop 200 and the filter tank 13 can be 1.5h, or 1.8h, or 2h, or 2.3h, or 2.5h, etc., and no specific restrictions are made here.

It can be understood that the higher the drying temperature and the longer the drying time, the better the drying effect of the drying component on the mop 200 and the solid dirt in the filter tank 13, but at the same time the energy consumption of the drying component is higher, and the excessively high temperature may cause damage to the cleaning device or the cleaning base station 100; conversely, the lower the drying temperature and the shorter the drying time, the lower the energy consumption of the drying component and the greater the impact on the cleaning device or the cleaning base station 100, but the solid dirt in the mop 200 and the filter tank 13 may not be dried thoroughly.

Therefore, by controlling the temperature and time of the drying component drying the mop 200 and the solid dirt in the filter tank 13 within a reasonable range, it is possible to better avoid excessive energy consumption of the drying component or adverse effects on the cleaning base station 100 and the cleaning equipment due to excessively high drying temperature and excessively long drying time. At the same time, it is possible to better avoid the inability to completely dry the solid dirt in the mop 200 and the filter tank 13 due to excessively low drying temperature and excessively short drying time. Therefore, the energy consumption of the drying component can be controlled while ensuring the drying effect of the drying component on the solid dirt in the mop 200 and the filter tank 13.

According to some embodiments of the present application, the collecting component includes a suction nozzle 7, which is movably located in the filter tank 13, and the solid dirt in the filter tank 13 is suitable for being sucked into the collecting component through the suction nozzle 7, wherein the collecting component collects the solid dirt in the filter tank 13, including: starting the collecting fan of the collecting component to form a negative pressure at the suction nozzle 7. In other words, the suction nozzle 7 is movable relative to the filter tank 13, and a communicating channel is formed between the suction nozzle 7 and the collecting component. Therefore, the position of the suction nozzle 7 in the filter tank 13 can be adjusted by driving the suction nozzle 7 to move, so that the collecting component can collect solid dirt located at different positions in the filter tank 13 through the suction nozzle 7. In addition, the suction nozzle 7 is arranged in the filter tank 13, which can better shorten the distance between the suction nozzle 7 and the solid dirt in the filter tank 13, thereby better lifting the collecting component. The suction force on the solid dirt in the filter tank 13 can better improve the collection effect of the collection component on the solid dirt in the filter tank 13, which is beneficial to improving the cleanliness of the filter tank 13.

After the collecting fan is started, the suction nozzle 7 is controlled to move so that the scraping wall of the suction nozzle 7 scrapes the bottom wall of the filter tank 13 to separate the solid dirt from the bottom wall of the filter tank 13. Thus, the adhesion between the solid dirt and the bottom wall of the filter tank 13 can be better eliminated by the moving suction nozzle 7, so that the difficulty of the collecting component to collect the solid dirt in the filter tank 13 can be better reduced, and the accumulation of solid dirt in the filter tank 13 can be better avoided to improve the cleanliness of the filter tank 13.

According to some embodiments of the present application, the suction nozzle 7 is adapted to reciprocate along a suction direction parallel to the suction direction of the suction nozzle 7. That is, the suction nozzle 7 can move relative to the bottom wall of the filter tank 13 along the suction direction of the suction port, and the suction nozzle 7 can also move relative to the bottom wall in the filter tank 13 in a direction opposite to the suction direction of the suction port, so that the suction nozzle 7 can reciprocate relative to the bottom wall of the filter tank 13 in a suction direction parallel to the suction direction of the suction nozzle 7. Thus, in the process of the suction nozzle 7 reciprocating relative to the bottom wall of the filter tank 13, the collection component can collect solid dirt on the bottom wall of the filter tank 13 through the suction nozzle 7 for multiple times, and at the same time, the suction nozzle 7 can scrape the solid dirt on the bottom wall of the filter tank 13 for multiple times, which is conducive to improving the collection effect of the collection component on the dirt in the filter tank 13 through the suction nozzle 7, so as to ensure the cleanliness of the filter tank 13.

According to some embodiments of the present application, the suction nozzle 7 constitutes a limiting member 3, and the cleaning member 2 has a first cleaning state and a second cleaning state. In the first cleaning state, the cleaning member 2 is fixed relative to the base station base 1, and in the second cleaning state, the cleaning member 2 is movable, that is, the cleaning member 2 has a first cleaning state fixed relative to the base station base 1 and a second cleaning state movable relative to the base station base 1. Controlling the cleaning device to move to the cleaning base station 100 includes: the wiping member 200 is located on the cleaning member 2 and contacts the cleaning member 2, that is, when the wiping member 200 needs to be cleaned, the cleaning device enters the cleaning base station 100, and the wiping member 200 is pressed on the cleaning member 2; in addition, controlling the limiting member 3 to limit the cleaning member 2 includes: controlling the suction nozzle 7 to be located at the limiting position and cooperate with the cleaning member 2 so that the cleaning member 2 is located in the first cleaning state, and controlling the wiping member 200 to rotate and rub against the cleaning member 2 to clean the wiping member 200.

That is to say, the suction nozzle 7 located at the limit position is used to limit the movement of the cleaning member 2 relative to the base station base 1 so as to keep the cleaning member 2 in the first cleaning state fixed relative to the base station base 1. Therefore, by controlling the wiping member 200 to rotate relative to the base station base 1, the wiping member 200 can rotate relative to the cleaning member 2 in the first cleaning state, thereby causing relative rotational friction between the rotating wiping member 200 and the fixed cleaning member 2, wherein the wiping member 200 can be wetted by water injected into the cleaning tank 111 by the water supply component, so that the cleaning member 2 can scrape and remove dirt on the wiping member 200 through friction with the wetted wiping member 200 to achieve the cleaning operation of the wiping member 200.

In addition, controlling the limiter 3 to disengage from the cleaning member 2 includes: controlling the suction nozzle 7 to be located at a non-limiting position and disengaging from the cleaning member 2, so that the cleaning member 2 is located in the second cleaning state, and controlling the wiping member 200 to rotate, so as to drive the cleaning member 2 to rotate. That is, after the suction nozzle 7 moves to the non-limiting position, the limiter on the cleaning member 2 is released, so that the cleaning member 2 is restored to the second cleaning state where it can move relative to the cleaning tank 111. Therefore, by controlling the wiping member 200 to rotate relative to the base station base 1, the wiping member 200 can drive the cleaning member 2 to move synchronously with the wiping member 200 in the cleaning tank 111 through the friction between the wiping member 200 and the cleaning member 2, so that the cleaning tank 111 can be cleaned by the moving cleaning member 2 and the dirt in the agitated cleaning tank 111 can flow into the filter tank 13 for filtration.

Thus, the suction nozzle 7 can cooperate with the collection component to collect the solid dirt in the filter tank 13, and at the same time, it can serve as a limiter 3 to limit the movement of the cleaning member 2 relative to the cleaning tank 111, that is, the suction nozzle 7 has both the functions of sucking solid dirt and limiting, and has a high degree of integration, so that the number of parts of the cleaning base station 100 can be reduced, which is conducive to simplifying the structure of the cleaning base station 100. In addition, by controlling the suction nozzle 7 to switch between the limit position and the non-limit position, the switching of the cleaning member 2 between the first cleaning state and the second cleaning state can be achieved, which can effectively reduce the difficulty of the cleaning member 2 switching between the first cleaning state and the second cleaning state. At the same time, when the cleaning member 2 switches between the first cleaning state and the second cleaning state, it is not necessary to rely on changing the rotation direction of the wiping member 200, so that the requirements of the cleaning base station 100 for the cleaning equipment can be reduced, which is conducive to improving the scope of application of the cleaning base station 100.

Therefore, when the cleaning member 2 is in the first cleaning state, the cleaning device can drive the wiping member 200 to rotate forward or reverse, so that the cleaning member 2 can clean the wiping member 200 in a clockwise or counterclockwise direction. When the cleaning member 2 is in the second cleaning state, the cleaning device can drive the wiping member 200 to rotate forward or reverse to drive the cleaning member 2 to rotate forward or reverse, so that the cleaning member 2 can clean the cleaning tank 111 in a clockwise or counterclockwise direction, which is beneficial to improve the cleaning effect of the cleaning member 2 on the wiping member 200 and the cleaning tank 111.

The control of the wiping member 200 to rotate and rub against the cleaning member 2 to clean the wiping member 200 includes: an initial cleaning stage and a stable cleaning stage located after the initial stage, and the rotation speed of the wiping member 200 in the initial cleaning stage is less than the rotation speed of the wiping member 200 in the stable cleaning stage. It can be understood that when the suction nozzle 7 is in the non-limiting position, the cleaning member 2 can rotate freely relative to the cleaning tank 111, so when the suction nozzle 7 moves to the limiting position, the cleaning member 2 may be spaced apart from the suction nozzle 7. Therefore, after the suction nozzle 7 moves to the limiting position, the wiping member 200 needs to be rotated to drive the cleaning member 2 to rotate until the cleaning member 2 and the suction nozzle 7 are against each other so as to limit the cleaning member 2 to the first cleaning state through the suction nozzle 7.

Therefore, the rotation speed of the mopping member 200 in the initial cleaning stage is lower than the rotation speed of the mopping member 200 in the stable cleaning stage, which can effectively reduce the speed at which the mopping member 200 drives the cleaning member 2 to move toward the suction nozzle 7, thereby effectively reducing the impact force between the cleaning member 2 and the suction nozzle 7, thereby effectively avoiding the impact damage between the cleaning member 2 and the suction nozzle 7, and effectively reducing the impact noise between the cleaning member 2 and the suction nozzle 7. In addition, the faster the rotation speed of the mopping member 200, the more times the cleaning member 2 completely sweeps over the mopping member 200 in the same time. That is, the higher the cleaning frequency of the cleaning member 2 on the wiping member 200, the higher the cleaning frequency of the cleaning member 2 on the wiping member 200. Therefore, after entering the stable cleaning stage, the wiping member 200 rotates at a higher speed relative to the cleaning member 2 to increase the cleaning force of the cleaning member 2 on the wiping member 200. That is, while ensuring the cleaning force of the wiping member 200 in the stable cleaning stage, the impact force and impact noise between the cleaning member 2 and the suction nozzle 7 can be reduced.

In the initial cleaning stage, the rotation speed of the wiping member 200 gradually increases; in the stable cleaning stage, the rotation speed of the wiping member 200 remains unchanged. That is, in the process of cleaning the wiping member 200 by the cleaning member 2, the rotation speed of the wiping member 200 gradually increases, and remains unchanged after reaching a certain speed. In this way, the stability of the speed increase process of the wiping member 200 can be improved. In the initial cleaning stage, the rotation speed of the wiping member 200 can be gradually increased after the cleaning member 2 and the suction nozzle 7 are abutted and matched, so as to reduce the impact force and impact noise between the cleaning member 2 and the suction nozzle 7.

In a specific example, a sewage buffer chamber 14 is also formed in the base station base 1. The sewage buffer chamber 14 is located below the filter tank 13. A filter structure is formed on the bottom wall of the filter tank 13. The filter tank 13 is connected to the sewage buffer chamber 14 through the filter structure. Therefore, after the dirt in the cleaning tank 111 enters the filter tank 13, the sewage therein can pass through the filter tank 13 and enter the sewage buffer chamber 14 for temporary storage. That is, the sewage generated during the cleaning of the mopping member 200 or the cleaning tank 111 by the cleaning base station 100 can be well contained through the sewage buffer chamber 14, and the sewage exceeding the upper limit of the capacity of the cleaning tank 111 can be well prevented from overflowing. The solid dirt therein is intercepted in the filter tank 13. Therefore, the filter tank 13 can be used to better separate the sewage and the solid dirt, so as to facilitate the classification and treatment of different types of dirt, and at the same time, it can better prevent the solid dirt from entering the sewage buffer chamber 14 and accumulating. In addition, the drainage component can be connected to the sewage buffer chamber 14 to discharge the sewage in the sewage buffer chamber 14 in time through the drainage component.

According to some embodiments of the present application, the filter tank 13 includes a filter area and a non-filter area, and the bottom wall of the filter area is formed with a filter structure, that is, the sewage buffer chamber 14 is connected to the filter tank 13 through the filter structure, so that the sewage entering the filter tank 13 can flow downward into the sewage buffer chamber 14 through the filter structure, and the solid dirt is intercepted on the bottom wall of the filter area. At least part of the suction nozzle 7 is located in the filter area in the limited position, and the suction nozzle 7 is located in the non-filter area in the non-limited position. That is, the suction nozzle 7 located in the non-limited position is spaced apart from the filter structure. Among them, controlling the drying component to dry the mopping member 200 and the solid dirt in the filter tank 13 includes: controlling the suction nozzle 7 to be located in the non-limited position.

That is to say, when drying the solid dirt in the filter tank 13, the suction nozzle 7 is spaced apart from the filter structure on the bottom wall of the filter area in the direction of movement. It can be understood that the solid dirt entering the filter tank 13 is accumulated on the filter structure. Therefore, it is possible to better avoid the suction nozzle 7 from blocking the solid dirt on the filter structure, so as to better ensure the drying effect of the drying component on the solid dirt on the filter structure. Moreover, after the solid dirt on the filter structure is dried, the suction nozzle 7 can be driven to move from the non-filter area to the filter area, and the bottom wall of the filter area can be scraped during the movement of the suction nozzle 7, so that the solid dirt attached to the bottom wall of the filter area is separated from the bottom wall of the filter area, which is convenient for the collection component to collect and process.

In a specific example, the filter area and the non-filter area are arranged and connected along the front-to-back direction, a plurality of filter holes 121 are formed on the filter area, and the plurality of filter holes 121 together constitute a filter structure. The front end of the filter area extends into the cleaning tank 111. When the suction nozzle 7 moves forward to the limit position, the front end of the suction nozzle 7 is located in the cleaning tank 111, so as to limit the rotation of the cleaning part 2 by the part of the suction nozzle 7 located in the cleaning tank 111. When the suction nozzle 7 moves backward to the non-filter area, it is located on the rear side of the filter hole 121.

According to some embodiments of the present application, the drying component includes a drying duct member 5 and a drying fan, the drying duct member 5 has a drying air duct 51, the collecting component includes a collecting duct member 6 and a collecting fan, the collecting duct member 6 has a collecting air duct 61, the drying collecting component includes a suction nozzle 7, the suction nozzle 7 is located in the filter tank 13 and is connected to the outlet end of the drying duct member 5 and the inlet end of the collecting duct member 6, and the suction nozzle 7 can be selectively connected to one of the drying duct 51 and the collecting duct 61.

That is to say, the suction nozzle 7 can be controlled to be connected with the drying air duct 51, so that the drying fan can convey hot air to the filter tank 13 through the drying air duct 51 and the suction nozzle 7, so as to achieve drying treatment of the solid dirt in the filter tank 13. The suction nozzle 7 is arranged in the filter tank 13, so that the distance between the suction nozzle 7 and the solid dirt in the filter tank 13 is close, so that the drying component can convey hot air to the surrounding of the solid dirt through the suction nozzle 7, so as to better improve the drying effect of the drying component on the solid dirt in the filter tank 13; the suction nozzle 7 can also be controlled to be connected with the collecting air duct 61, so that the collecting fan can collect the solid dirt in the filter tank 13 through the suction nozzle 7 and the collecting air duct 61. The suction nozzle 7 is arranged in the filter tank 13, so that the distance between the suction nozzle 7 and the solid dirt in the filter tank 13 is close, so as to better improve the suction force of the collecting fan on the solid dirt in the filter tank 13. That is, the suction nozzle 7 can improve the drying effect of the drying component on solid dirt when the drying component is working, and can improve the collection effect of the collecting component on solid dirt when the collecting component is working. At the same time, the drying component and the collecting component can share the suction nozzle 7, which can effectively save the number of suction nozzles 7 and simplify the structure of the cleaning base station 100.

Among them, controlling the drying component to dry the solid dirt in the mopping member 200 and the filter tank 13 includes: controlling the suction nozzle 7 to communicate with the drying air duct 51, controlling the drying fan to turn on and the collecting fan to turn off. Therefore, when the drying component dries the solid dirt in the mopping member 200 and the filter tank 13, the drying fan can deliver hot air to the filter tank 13 through the drying air duct 51 and the suction nozzle 7 to achieve drying of the solid dirt in the filter tank 13, and at the same time, it can better prevent the collecting fan from sucking away the hot air delivered by the drying component to the filter tank 13. In a specific example, the drying component also includes a heating element, which is used to heat the gas in the drying air duct 51 to ensure that the drying component supplies hot air to the filter tank 13.

In addition, controlling the collecting component to collect the solid dirt in the filter tank 13 includes: controlling the suction nozzle 7 to communicate with the collecting air duct 61, controlling the collecting fan to turn on and the drying fan to turn off. The solid dirt in the filter tank 13 is collected by the suction nozzle 7 and the collection air duct 61. In addition, when the collection component collects the solid dirt in the filter tank 13, the solid dirt has been dried, so turning off the drying fan can better reduce the operating energy consumption, and at the same time can better avoid the air outlet of the drying fan disturbing the suction airflow of the collection component. In a specific example, the collection component also includes a dust collection component, and a dust collection chamber connected to the outlet end of the collection air duct component 6 is formed in the dust collection component to store the solid dirt collected by the collection component through the dust collection chamber.

It should be noted that the solid dirt in the filter tank 13 can be collected by the collecting component after the solid dirt in the filter tank 13 is dried and before the mopping member 200 is dried. The solid dirt in the filter tank 13 can also be collected by the collecting component after the mopping member 200 is dried. That is, the operating timing of the collecting component can be flexibly adjusted according to design requirements, and no specific restrictions are made here.

According to some embodiments of the present application, the mop 200 of the cleaning device moves relative to the cleaning member 2 for cleaning, including: controlling the water supply component to supply water into the cleaning tank 111. That is, in the process of the cleaning base station 100 cleaning the mop 200, the cleaning tank 111 contains clean water injected by the water supply component. The clean water injected into the cleaning tank 111 by the water supply component can better wet the mop 200 located in the cleaning tank 111, and the dust and other dirt on the mop 200 can be better absorbed and dissolved by the water. At the same time, the dirt on the mop 200 can be separated from the mop 200 together with the water, which can better improve the cleaning effect of the cleaning base station 100 on the mop 200 to improve the cleanliness of the mop 200. In addition, by continuously injecting clean water into the cleaning tank 111 through the water supply component, the mop 200 can be repeatedly rinsed by dipping the clean water in the cleaning tank 111, which is conducive to further improving the cleaning effect of the cleaning base station 100 on the mop 200.

In addition, after the cleaning member 2 moves to clean the cleaning tank 111, it includes: controlling the water supply component to stop supplying water to the cleaning tank 111. That is, when the drying component dries the solid dirt, the water supply component stops supplying water to the cleaning tank 111, which can better avoid the water from wetting the mopping member 200 and the solid dirt again when the drying component dries the mopping member 200 and the solid dirt, so as to improve the drying efficiency of the drying component for the solid dirt.

The cleaning control method for a cleaning system according to a specific embodiment of the present application is described below with reference to Figures 1 to 17. It is worth noting that the following description is merely exemplary and intended to be used to explain the present application, and cannot be construed as limiting the present application.

The cleaning device can be separated from the cleaning base station 100 to drive the mopping and wiping member 200 to perform floor cleaning operations. When the mopping and wiping member 200 needs to be cleaned, the cleaning device moves to the cleaning base station 100, so that the two mopping and wiping members 200 of the cleaning device are respectively located in the two cleaning grooves 111 and are respectively covered on the two cleaning members 2, and then the suction nozzle 7 is driven forward to move toward the limit position by the driving mechanism 9. When the suction nozzle 7 moves to the limit position, the left and right sides of the front end of the suction nozzle 7 are respectively located in the two cleaning grooves 111 to form a limit portion, and the water supply assembly is used to supply water to the cleaning member 2. Water is poured into the tank 111, and the two wiping members 200 are controlled to rotate by the cleaning device. At this time, it is in the initial cleaning stage. The rotation of the wiping member 200 drives the cleaning member 2 to rotate until the cleaning member 2 abuts against the limiting portion to limit the rotation of the two cleaning members 2 relative to the cleaning wipe. At this time, it enters the stable cleaning stage. The friction between the wiping member 200 and the cleaning member 2 causes the dirt on the wiping member 200 to fall off and fall into the cleaning tank 111. The sewage in the cleaning tank 111 can flow into the filter tank 13 for filtration and intercept the solid dirt on the bottom wall of the filter tank 13.

After the mopping member 200 is cleaned, the driving mechanism 9 drives the suction nozzle 7 to move backward to a non-limiting position, so that the cleaning member 2 can rotate freely relative to the bottom wall of the cleaning tank 111. At this time, the mopping member 200 keeps rotating to drive the cleaning member 2 to scrub the inner wall of the cleaning tank 111, and stirs the dirt in the cleaning tank 111 to flow into the filter tank 13 for filtration and intercepts the solid dirt on the bottom wall of the filter tank 13. After the cleaning of the cleaning tank 111 is completed, the suction nozzle 7 moves to the non-filtering area and turns on the drying fan. At this time, the collection fan is in a closed state. The drying fan transports hot air to the filter tank 13 and the cleaning tank 111 through the drying air duct member 5 and the suction nozzle 7, and dries the mopping member 200 and the solid dirt in the filter tank 13 by the hot air. After drying is completed, the drying fan is turned off and the collecting fan is turned on. At the same time, the driving mechanism 9 drives the suction nozzle 7 to move forward and scrapes the bottom wall of the filtering area through the suction nozzle 7, so that the solid dirt attached to the bottom wall of the filtering area is separated from the bottom wall of the filtering area. The collecting fan collects the solid dirt in the filtering tank 13 through the suction nozzle 7 and the collecting air duct member 6. The cleaning device can be separated from the cleaning device and the mopping member 200 after cleaning is carried out to continue the floor cleaning operation.

The cleaning system according to an embodiment of the present application is described below with reference to the accompanying drawings.

According to the cleaning system of the embodiment of the present application, it includes: a cleaning base station 100 and a cleaning device, the cleaning base station 100 includes a first control module, the first control module is used to control the cleaning base station 100, the cleaning device includes a second control module, the second control module is used to control the cleaning device, wherein the cleaning device is suitable for cooperating with the cleaning base station 100, the first control module is connected to the second control module in communication, and is used to jointly control the cleaning system to work according to the above-mentioned cleaning control method. In this way, the automation level of the cleaning system can be well improved, and the user operation can be well reduced to improve the user experience.

According to the cleaning system of the embodiment of the present application, sewage and solid dirt can be better separated through the filter tank 13, which is convenient for classifying and treating different types of dirt, and can better avoid blockage of the sewage pipe. The cleaning base station 100 can be switched between the two modes of cleaning the mopping part and cleaning the cleaning tank by controlling the cleaning part 2 to switch between the first cleaning state and the second cleaning state through the limiter 3, which can better improve the automation level of the cleaning system, thereby better reducing the user's operations during the use of the cleaning system, which is conducive to improving the user experience of the cleaning system.

According to some embodiments of the present application, the bottom wall of the filter tank 13 is lower than the bottom wall of the cleaning tank 111. Therefore, the sewage in the cleaning tank 111 can flow toward the filter tank 13 under the action of gravity, that is, it is ensured that the sewage in the cleaning tank 111 can flow smoothly into the filter tank 13. At the same time, it is possible to better avoid the sewage from remaining in the cleaning tank 111. It should be noted that when the bottom wall of the cleaning tank 111 is non-planar, such as when the bottom wall of the cleaning tank 111 has a certain slope, the bottom wall of the filter tank 13 is lower than the lowest point of the bottom wall of the cleaning tank 111 to avoid the sewage from remaining in the cleaning tank 111.

According to some embodiments of the present application, the filter tank 13 is located on the outer peripheral side of the cleaning tank 111. As a result, the filter tank 13 and the cleaning tank 111 can make full use of the space of the base station base 1 in the horizontal direction, so that the space occupied by the filter tank 13 and the cleaning tank 111 in the vertical direction can be reduced, which is conducive to controlling the thickness of the base station base 1 in the vertical direction and making the layout reasonable. In addition, the filter structure and the sewage cache chamber 14 are both located on the outer peripheral side of the cleaning tank 111, so that the cleaning parts 2 and other structures in the cleaning tank 111 can be prevented from being blocked above the filter tank 13, which is conducive to reducing the difficulty of cleaning the filter structure and the sewage cache chamber 14.

According to some embodiments of the present application, a connecting notch 113 is formed on the peripheral wall of the cleaning tank 111, and the connecting notch 113 connects the filter tank 13 and the cleaning tank 111. In other words, the connecting notch 113 is located between the cleaning tank 111 and the filter tank 13 and penetrates the peripheral wall of the cleaning tank 111 in the horizontal direction, so that a connecting water flow channel can be formed between the cleaning tank 111 and the filter tank 13, so that the dirt in the cleaning tank 111 can smoothly enter the filter tank 13 through the connecting notch 113 to separate the sewage and solid dirt.

According to some embodiments of the present application, the cleaning member 2 is rotatably disposed in the cleaning tank 111, and the rotation axis of the cleaning member 2 extends in the up-down direction. As a result, the area swept by the cleaning member 2 in the horizontal direction can be increased, so that the stirring effect of the cleaning member 2 on the dirt in the cleaning tank 111 can be improved, which is conducive to further accelerating the speed at which the dirt in the cleaning tank 111 enters the filter tank 13 and preventing solid dirt from accumulating on the inner wall of the cleaning tank 111. In the process of the rotation of the cleaning member 2, the cleaning member 2 is suitable for passing above the filter tank 13. As a result, the dirt in the cleaning tank 111 can be pushed into the filter tank 13 by the part of the cleaning member 2 passing above the filter tank 13, so as to accelerate the speed at which the dirt in the cleaning tank 111 enters the filter tank 13.

According to some embodiments of the present application, at least part of the bottom wall of the cleaning tank 111 is formed as a guide surface, wherein the entire bottom wall of the cleaning tank 111 may be formed as a guide surface, or part of the bottom wall of the cleaning tank 111 may be formed as a guide surface. The guide surface may be flexibly set according to actual needs, and no specific restrictions are made here. Among them, the guide surface extends downwardly at an angle from the cleaning tank 111 to the filter tank 13. That is to say, under the action of gravity, the dirt in the cleaning tank 111 has a tendency to flow along the guide surface toward the filter tank 13, so that the guide surface can better drain the dirt in the cleaning tank 111, thereby better avoiding the accumulation of dirt in the cleaning tank 111, which is conducive to improving the cleanliness of the cleaning tank 111. At the same time, the structure for driving the dirt into the filter tank 13 can be better omitted, which is conducive to simplifying the structure of the cleaning base station 100 and having low investment and use costs.

According to some embodiments of the present application, the cleaning member 2 is rotatably disposed in the cleaning tank 111, and the cleaning member 2 includes a cleaning member body 21 and a rotating shaft 22. The bottom wall of the cleaning tank 111 is formed with a rotating hole 112, and the rotating shaft 22 is rotatably matched with the rotating hole 112, and the cleaning member body 21 is located in the cleaning tank 111. In other words, the cleaning member body 21 is rotatable relative to the cleaning tank 111 through the matching of the rotating shaft 22 and the rotating hole 112, and the stability of the cleaning member 2 when rotating relative to the cleaning tank 111 can be better guaranteed. In addition, when the cleaning member 2 rotates relative to the cleaning tank 111, the dirt in the cleaning tank 111 can be better cleaned by the cleaning member body 21, and in the rotation direction of the cleaning member 2, the area swept by the cleaning member body 21 during the rotation process can be better improved, which is conducive to improving the cleaning effect of the cleaning member 2 on the cleaning tank 111.

Among them, in the first cleaning state, in the rotation direction of the cleaning member 2, the stopper 3 abuts against the cleaning member body 21, so that the cleaning member 2 is fixed relative to the base station base 1. That is to say, when the cleaning member 2 is in the first cleaning state, at least part of the stopper 3 is located on one side of the cleaning member 2 in the rotation direction or within the coverage range, so that the rotation of the cleaning member 2 is blocked by the part of the stopper 3 located on one side of the cleaning member 2 in the rotation direction, that is, the position of the cleaning member 2 relative to the base station base 1 is fixed, and then the cleaning device can drive the mopping member 200 to move relative to the cleaning member 2, so as to realize the cleaning operation of the mopping member 200 by the cleaning member 2; when the cleaning member 2 is in the second cleaning state, the part of the stopper 3 located on one side of the cleaning member 2 in the rotation direction or withdrawn from the coverage range, so as to release the restriction of the stopper 3 on the rotation of the cleaning member 2, that is, the cleaning member 2 can rotate freely relative to the cleaning tank 111, so that the cleaning member 2 can clean the cleaning tank 111 during the rotation.

In a specific example, the cleaning device can drive the wiping member 200 to rotate, and the rotation axis of the wiping member 200 extends in the up-down direction. The cleaning device drives the wiping member 200 to rotate relative to the cleaning member 2 fixed by the limit member 3, that is, in the first cleaning state, so that the cleaning member 2 can remove the dirt on the wiping member 200 through relative movement friction with the wiping member 200; when the cleaning member 2 is in the second cleaning state, the cleaning member 2 can rotate freely relative to the base station base 1. Since the wiping member 200 is pressed on the cleaning member 2, the cleaning device can drive the wiping member 200 and drive the cleaning member 2 to rotate in the cleaning tank 111 through the friction between the wiping member 200 and the cleaning member 2, thereby realizing the cleaning operation of the cleaning member 2 on the cleaning tank 111, so that the coordination mode of the wiping member 200 and the cleaning member 2 is simple, which is conducive to simplifying the structure of the wiping member 200 and the cleaning member 2. In addition, when the cleaning member 2 is in the first cleaning state, the cleaning device can drive the wiping member 200 to rotate forward or reverse, so that the cleaning member 2 can clean the wiping member 200 in a clockwise or counterclockwise direction. When the cleaning member 2 is in the second cleaning state, the cleaning device can drive the wiping member 200 to rotate forward or reverse to drive the cleaning member 2 to rotate forward or reverse, so that the cleaning member 2 can clean the cleaning tank 111 in a clockwise or counterclockwise direction, which is beneficial to improve the cleaning effect of the cleaning member 2 on the wiping member 200 and the cleaning tank 111.

According to some embodiments of the present application, the rotating hole 112 is a blind hole. That is, the rotating hole 112 only has an upward opening and does not pass through the base station base 1, so that the rotating hole 112 can ensure the rotational cooperation with the rotating shaft 22 while preventing the liquid in the cleaning tank 111 from passing through the rotating hole 112. Leaking to the outside of the base station base 1 can better prevent the leaked sewage from polluting the cleaning base station 100 and the environment near the cleaning base station 100, which is beneficial to ensure the cleanliness of the cleaning base station 100 and improve the user experience of the cleaning base station 100.

According to some embodiments of the present application, the rotating hole 112 is formed by the bottom wall of the cleaning tank 111 being recessed downward. That is to say, the opening of the rotating hole 112 is located on the bottom wall of the cleaning tank 111, which can effectively reduce the difficulty of processing and forming the rotating hole 112. At the same time, the rotating hole 112 can make full use of the space of the base station base 1 located at the lower side of the cleaning tank 111, which is conducive to controlling the thickness of the base station base 1, and can effectively save the space in the cleaning tank 111 occupied by the rotating hole 112 when it cooperates with the rotating shaft 22, and the structure is compact and the layout is reasonable. In a specific example, the bottom surface of the cleaning component body 21 is in contact with the bottom wall of the cleaning tank 111. Therefore, by forming the rotating hole 112 by recessing the bottom wall of the cleaning tank 111 downward, after the rotating shaft 22 is inserted into the rotating hole 112, it can be better ensured that the bottom surface of the cleaning component body 21 is in contact with the bottom wall of the cleaning tank 111. Therefore, during the rotation of the cleaning component 2 relative to the cleaning tank 111, the bottom wall of the cleaning tank 111 can be scraped by the bottom surface of the cleaning component body 21, which is beneficial to improving the cleaning effect of the cleaning component 2 on the cleaning tank 111.

According to some embodiments of the present application, the inner peripheral wall of the rotating hole 112 is formed with a first limiting protrusion, and the outer peripheral wall of the rotating shaft 22 is formed with a second limiting protrusion, and the second limiting protrusion is located at the lower side of the first limiting protrusion and abuts against the first limiting protrusion in the up-down direction. In other words, the first limiting protrusion is located at the upper side of the second limiting protrusion, and the projections of the first limiting protrusion and the second limiting protrusion on the horizontal plane at least partially overlap, so that the first limiting protrusion can better block the second limiting protrusion from moving upward, thereby better preventing the rotating shaft 22 from moving upward relative to the rotating hole 112, and further better preventing the rotating shaft 22 from escaping from the rotating hole 112, and the second limiting protrusion can rotate relative to the first limiting protrusion to ensure that the rotating shaft 22 can rotate around the up-down direction in the rotating hole 112. Therefore, through the cooperation of the first limiting protrusion and the second limiting protrusion, while ensuring that the cleaning member 2 can rotate relative to the cleaning tank 111, the cleaning member 2 is prevented from escaping from the base station base 1, so as to ensure the stability of the rotation of the cleaning member 2 relative to the cleaning tank 111. In addition, through the cooperation of the first limiting protrusion and the second limiting protrusion, the rotating shaft 22 and the rotating hole 112 form a snap fit, and the matching structure of the cleaning part 2 and the base station base 1 is simple, which can effectively reduce the difficulty of assembling the cleaning part 2 and disassembling and cleaning it later.

According to some embodiments of the present application, a buffer structure is provided on one of the cleaning member body 21 and the stopper 3. In the first cleaning state, in the rotation direction of the cleaning member 2, the buffer structure is located between the stopper 3 and the cleaning member body 21. Thus, the buffer structure can better buffer the collision between the stopper 3 and the cleaning member body 21, thereby better avoiding the collision damage between the stopper 3 and the cleaning member body 21, so as to improve the reliability and stability of the cleaning base station 100. At the same time, the buffer structure can better prevent the collision noise generated when the stopper 3 and the cleaning member body 21 are in contact with each other, which is conducive to improving the quietness of the operation of the cleaning base station 100.

According to some embodiments of the present application, the buffer structure includes a buffer layer. In the rotation direction of the cleaning element 2, the cleaning element body 21 has a first side wall 211 and a second side wall 212 that are arranged opposite to each other, and a buffer layer is provided on at least one of the first side wall 211 and the second side wall 212. That is to say, the first side wall 211 is located on one side of the cleaning element body 21 in the rotation direction, and the second side wall 21 is located on the other side of the cleaning element body 21 in the rotation direction away from the first side wall 211. The buffer layer may be provided only on the first side wall 211, so that when the limiting element 3 cooperates with the first side wall 211 to limit the rotation of the cleaning element 2 in the first direction, the impact between the limiting element 3 and the first side wall 211 can be buffered by the buffer layer; the buffer layer may be provided only on the second side wall 212, so that the limiting element 3 cooperates with the second side wall 212 to limit the rotation of the cleaning element 2 in the first direction. When the cleaning part 2 is rotated in the second direction, the impact between the stopper 3 and the second side wall 212 is buffered by the buffer layer, wherein the second direction is opposite to the first direction; or the first side wall 211 and the second side wall 212 may be both provided with a buffer layer, so that the buffer layer on the first side wall 211 can buffer the impact between the stopper 3 and the first side wall 211 when the stopper 3 limits the rotation of the cleaning part 2 in the first direction, and at the same time, the buffer layer on the second side wall 212 can buffer the impact between the stopper 3 and the second side wall 212 when the stopper 3 limits the rotation of the cleaning part 2 in the second direction. The position and number of the buffer layer can be flexibly set according to design requirements, and no specific restrictions are made here.

The buffer layer is a rubber layer. The rubber material is light in weight, has excellent elasticity and low investment cost. Therefore, the energy absorption effect of the buffer layer can be improved to improve the buffering effect of the buffer layer between the cleaning part body 21 and the stopper 3. At the same time, the influence of the buffer layer on the overall weight of the cleaning part 2 can be reduced, and the cost investment of the buffer layer can be reduced.

According to some embodiments of the present application, the area swept by the cleaning member 2 during the rotation process is the cleaning area. In the first cleaning state, the portion of the stopper 3 located in the cleaning area is the stopper 31. In the rotation direction of the cleaning member 2, the stopper 31 abuts against the cleaning member body 21. In other words, the dirt in the cleaning area can be cleaned by the cleaning member 2. In the first cleaning state, the stopper 31 is located on one side or within the coverage of the cleaning member body 21 in the rotation direction, so that the abutment of the stopper 31 with the cleaning member body 21 can better block the rotation of the cleaning member 2 relative to the cleaning tank 111. Further, at least the upper surface of the stopper 31 of the stopper 3 is not higher than the upper surface of the cleaning member 2. That is, in the first cleaning state, at least the upper surface of the stopper 31 on the stopper 3 is not higher than the upper surface of the cleaning member 2, such as, the upper plane of the stopper 31 can be flush with the upper surface of the cleaning member 2, or the upper surface of the stopper 31 can be lower than the upper surface of the cleaning member 2. Therefore, when the wiping member 200 rotates relative to the cleaning member 2 in the first cleaning state, the limiting portion 31 can be prevented from blocking the rotation of the wiping member 200, thereby reducing the rotational resistance of the wiping member 200, which is beneficial to increasing the rotation speed of the wiping member 200 and improving the cleaning efficiency of the cleaning member 2 on the wiping member 200.

According to some embodiments of the present application, the cleaning member 2 includes a cleaning member body 21 and a first cleaning structure 213 disposed on the bottom surface of the cleaning member body 21. The cleaning member body 21 is rotatably disposed in the cleaning tank 111. When the cleaning member body 21 rotates, the first cleaning structure 213 is driven to stir the dirt in the cleaning tank and flow into the filter tank 13. In other words, the cleaning member body 21 drives the first cleaning structure 213 to move, so that the dirt in the cleaning tank can flow into the filter tank 13. The sewage in the cleaning tank 111 is stirred to flow better, thereby accelerating the speed at which the sewage enters the filter tank 13. In addition, the flowing sewage can better drive the solid dirt attached to the inner wall of the cleaning tank 111 to flow together, so that the solid dirt can flow into the filter tank 13 along with the sewage.

According to some embodiments of the present application, the first cleaning structure 213 is adapted to contact the bottom wall of the cleaning tank 111. Thus, during the rotation of the cleaning member 2 relative to the cleaning tank 111, the first cleaning structure 213 can generate friction with the bottom wall of the cleaning tank 111, so that the dirt on the bottom wall of the cleaning tank 111 can be scraped by the first cleaning structure 213, which can better prevent the dirt from adhering to and accumulating on the bottom wall of the cleaning tank 111, thereby improving the cleaning effect of the cleaning member 2 on the cleaning tank 111 and improving the cleanliness of the cleaning tank 111.

According to some embodiments of the present application, the first cleaning structure 213 includes at least one of a flexible rubber strip, a brush, a cotton cloth, a sponge, and the like. In some embodiments, the first cleaning structure 213 may be a flexible rubber strip, so that the first cleaning structure 213 may be well fitted on the bottom wall of the cleaning tank 111, that is, the first cleaning structure 213 may be more closely abutted against the bottom wall of the cleaning tank 111, so that during the rotation of the cleaning member 2 relative to the cleaning tank 111, the first cleaning structure 213 may more comprehensively and thoroughly scrape the dirt on the bottom wall of the cleaning tank 111, which is conducive to improving the cleaning effect of the first cleaning structure 213 on the bottom wall of the cleaning tank 111; the first cleaning structure 213 may also be a brush, so that during the rotation of the cleaning member 2 relative to the cleaning tank 111, the dirt on the bottom wall of the cleaning tank 111 may be well scrubbed by the brush, and the sewage may flow through the gap of the brush to reduce the resistance to the sewage in the cleaning tank 111; of course, the first cleaning structure 213 may also be composed of a flexible rubber strip and a brush, that is, a part of the first cleaning structure 213 is a flexible rubber strip, and the other part is a brush, and the specific composition of the first cleaning structure 213 may be flexibly adjusted according to design requirements.

According to some embodiments of the present application, the cleaning member 2 includes a cleaning member body 21 and a second cleaning structure arranged on the radial outer end surface of the cleaning member body 21, the cleaning member body 21 is rotatably arranged in the cleaning tank 111, and the second cleaning structure is suitable for contacting the inner peripheral wall of the cleaning tank 111. The radial outer end surface of the cleaning member body 21 here refers to the side of the cleaning member body 21 opposite to the inner peripheral wall of the cleaning tank 111 in the length direction of the cleaning member 2. Thus, during the rotation of the cleaning member 2 relative to the cleaning tank 111, friction can be generated with the inner peripheral wall of the cleaning tank 111 through the second cleaning structure, so that the dirt on the inner peripheral wall of the cleaning tank 111 can be scraped by the second cleaning structure, which can better prevent the dirt from adhering to and accumulating on the inner peripheral wall of the cleaning tank 111, which is conducive to improving the cleaning effect of the cleaning member 2 on the cleaning tank 111 to improve the cleanliness of the cleaning tank 111. Wherein, the second cleaning structure can include at least one of a flexible rubber strip, a brush, a cotton cloth, a sponge, etc.

It should be noted that the above is only an example of some specific structures of the first cleaning structure 213 and the second cleaning structure to facilitate understanding of the cleaning method of the first cleaning structure 213 and the second cleaning structure for the cleaning tank 111. The first cleaning structure 213 and the second cleaning structure can be any cleaning parts with cleaning ability, such as those that can scrape the inner wall of the cleaning tank 111. There is no specific limitation on the specific structure and material of the first cleaning structure 213 and the second cleaning structure.

According to some embodiments of the present application, the limiting member 3 is movably disposed on the base station base 1 between a limiting position and a non-limiting position. In the limiting position, the limiting member 3 cooperates with the cleaning member 2; in the non-limiting position, the limiting member 3 is disengaged from the cleaning member 2. That is, when the limiting member 3 moves to the limiting position, the limiting member 3 can limit the rotation of the cleaning member 2 relative to the cleaning tank 111 so that the cleaning member 2 is fixed relative to the base station base 1, and the cleaning member 2 is in the first cleaning state; when the limiting member 3 moves to the non-limiting position, the limiting effect of the limiting member 3 on the cleaning member 2 is released, so that the cleaning member 2 can move relative to the cleaning tank 111 so as to clean the cleaning tank 111 through the cleaning member 2, and the cleaning member 2 is in the second cleaning state. That is, the switching of the cleaning member 2 between the first cleaning state and the second cleaning state can be realized by moving the limiting member 3 between the limiting position and the non-limiting position, which can effectively reduce the difficulty of switching the cleaning member 2 between the first cleaning state and the second cleaning state. At the same time, there is no need to rely on changing the movement direction of the wiping member 200 to achieve this, thereby effectively reducing the requirements of the cleaning base station 100 for the cleaning equipment, which is beneficial to improving the scope of application of the cleaning base station 100.

According to some embodiments of the present application, the cleaning member 2 is rotatably arranged in the cleaning tank 111, and the area swept by the cleaning member 2 during the rotation process is the cleaning area. In the limit position, at least part of the limit member 3 is located in the cleaning area. Thus, the rotation of the cleaning member 2 relative to the cleaning tank 111 can be blocked by the part of the limit member 3 located in the cleaning area, so as to keep the cleaning member 2 in the first cleaning state. In the non-limiting position, the limit member 3 is located on the outer peripheral side of the cleaning area. Thus, the interference between the limit member 3 in the non-limiting position and the cleaning member 2 can be better avoided, so that the limit member 3 in the non-limiting position can be better avoided to block the rotation of the cleaning member 2, so that the cleaning member 2 can be maintained in the second cleaning state that can rotate relative to the cleaning tank 111.

In a specific example, the cleaning tank 111 is roughly circular, and the rotation axis of the cleaning member 2 extends in the up-down direction, so that the cleaning member 2 can form a circular cleaning area during the rotation. Therefore, the cleaning member 2 can be in the shape of a strip with the same length as the diameter of the cleaning tank 111, and the center position in the length direction can be rotatably arranged at the center position of the cleaning tank 111, or it can be in the shape of a strip with the same length as the radius of the cleaning tank 111, and one end in the length direction can be rotatably arranged at the center position of the cleaning tank 111, or it can be in the shape of a sector with the same radius as the radius of the cleaning tank 111, and the axis position can be rotatably arranged at the center position of the cleaning tank 111, and so on. The cleaning member 2 can form a circular cleaning area during the rotation to ensure that the cleaning area can cover any place in the cleaning tank 111, thereby effectively reducing the requirements on the shape and size of the cleaning member 2, and has a wide range of applications.

According to some embodiments of the present application, the cleaning member 2 is rotatably disposed in the cleaning tank 111, and the area swept by the cleaning member 2 during the rotation process is the cleaning area. The cleaning member 2 can be raised and lowered between a first position and a second position, and the second position is located below the first position. In the first cleaning state, the cleaning member 2 is located in the first position, and at least part of the stop member 3 is located in the cleaning area. That is, when cleaning is required, When the cleaning member 2 is in the first cleaning state, the cleaning member 2 is controlled to rise until at least part of the limiting member 3 is located on one side of the cleaning member 2 in the rotation direction or in the coverage range. At this time, the cleaning member 2 is in the first position, and the rotation of the cleaning member 2 relative to the cleaning tank 111 is limited by the part of the limiting member 3 located in the cleaning area. In addition, the wiping member 200 covers the cleaning member 2, so that when the cleaning member 2 rises and moves toward the first position, it also moves upward relative to the wiping member 200. Therefore, when the cleaning member 2 is in the first position, the cleaning member 2 can be more closely attached to the wiping member 200, thereby increasing the friction resistance between the wiping member 200 and the cleaning member 2, and further increasing the cleaning force of the cleaning member 2 on the wiping member 200 when the wiping member 200 rotates relative to the cleaning member 2, which is conducive to improving the cleaning effect of the cleaning member 2 on the wiping member 200.

In the second cleaning state, the cleaning member 2 is located in the second position, and the limit member 3 is located above the cleaning area, that is, the limit member 3 is arranged above the bottom wall of the cleaning tank 111. By lifting and lowering the cleaning member 2 between the first position and the second position, the positional relationship between the cleaning member 2 and the limit member 3 in the up and down directions can be better adjusted to achieve the switching of the cleaning member 2 between the first cleaning state and the second cleaning state. When the cleaning member 2 is in the second position, it is spaced apart from the limit member 3 in the up and down directions, thereby better avoiding the limit member 3 from interfering with the rotation of the cleaning member 2 relative to the cleaning tank 111, so that the cleaning member 2 can be maintained in the second cleaning state where it can rotate relative to the cleaning tank 111. In addition, when the cleaning member 2 needs to switch to the second cleaning state to clean the cleaning tank 111, the cleaning member 2 gradually moves away from the limiting member 3 when it descends, and at the same time, the distance between the cleaning member 2 and the bottom wall of the cleaning tank 111 can be shortened. For example, when the cleaning member 2 is in the second position, the bottom surface of the cleaning member 2 can abut against the bottom wall of the cleaning tank 111, thereby better ensuring the cleaning effect of the cleaning member 2 on the bottom wall of the cleaning tank 111 when it rotates relative to the cleaning tank 111.

According to some embodiments of the present application, a water supply hole 114 is formed on the inner peripheral wall of the cleaning tank 111, and the water supply assembly is connected to the water supply hole 114 through a water supply channel. That is, a water flow channel connected between the water supply assembly and the cleaning tank 111 can be formed through the water supply channel and the water supply hole 114, so that the water in the water supply assembly can be discharged into the cleaning tank 111 through the water supply channel and the water supply hole 114. When the cleaning member 2 is in the first cleaning state, water is injected into the cleaning tank 111, so that the water in the cleaning tank 111 can better wet the mopping member 200, and the water can better absorb and dissolve dirt such as dust on the mopping member 200, so that the dirt on the mopping member 200 can be separated from the mopping member 200 together with the water, which is conducive to improving the cleaning effect of the mopping member 200. In addition, when the cleaning member 2 is in the second cleaning state, by injecting water into the cleaning tank 111, the cleaning member 2 can better stir the water in the cleaning tank 111 to drive the dirt in the cleaning tank 111 to flow, which is beneficial to improving the cleaning effect of the cleaning member 2 on the cleaning tank 111. In addition, by arranging the water supply hole 114 on the inner peripheral wall of the cleaning tank 111, the space in the cleaning tank 111 can be fully utilized, and the water supply channel can be hidden outside the inner peripheral wall of the cleaning tank 111, and the layout is ingenious and reasonable.

In some embodiments, the water supply assembly includes a water supply tank connected to the water supply hole 114. When clean water is contained in the water supply tank, clean water can be continuously injected into the cleaning tank 111, so that the inner wall of the cleaning tank 111 can be flushed by clean water under the drive of the cleaning member 2, which is conducive to further improving the cleanliness of the cleaning tank 111. Among them, clean water can be stored in the water supply tank, and of course, clean water mixed with detergent can be added to the water supply tank, and disinfectant can also be added to the water supply tank, etc., to enhance the cleaning power of the liquid in the water supply tank on the cleaning tank 111, which is conducive to ensuring the cleanliness of the cleaning tank 111. There is no specific restriction on the type of liquid stored in the water supply tank.

According to some embodiments of the present application, a water outlet groove 23 is formed on the upper surface of the cleaning element 2, and the water in the water supply tank is suitable for flowing into the water outlet groove 23, and the water in the water outlet groove 23 is suitable for overflowing into the cleaning groove 111. That is to say, a certain amount of water can be stored in the water outlet 23. Therefore, when the cleaning member 2 is in the first cleaning state, the mop 200 is pressed on the cleaning member 2 and can sweep across the water outlet 23 when rotating relative to the cleaning member 2, so that the mop 200 can be wetted by the water in the water outlet 23. The water can better absorb and dissolve dirt such as dust on the mop 200, so that the dirt on the mop 200 can be separated from the mop 200 together with the water. In addition, clean water can be continuously injected into the water outlet 23 from the water supply tank, that is, the mop 200 can be repeatedly cleaned by dipping it in the clean water in the water outlet 23, which can better avoid the sewage in the cleaning tank 111 from causing secondary pollution to the mop 200, which is beneficial to improving the cleaning effect of the cleaning base station 100 on the mop 200.

According to some embodiments of the present application, in the first cleaning state, the water outlet groove 23 is adjacent to the water supply hole 114, and the water supply hole 114 is suitable for supplying water into the water outlet groove 23. That is to say, when the cleaning member 2 is in the first cleaning state, the water in the water supply tank can flow into the water outlet groove 23 through the water supply channel and the water supply hole 114, so as to ensure that the mopping and wiping member 200 is continuously wetted with the clean water in the water outlet groove 23 during the cleaning process of the mopping and wiping member 200, so as to improve the cleaning efficiency and cleaning effect of the mopping and wiping member 200; when the cleaning member 2 is in the second cleaning state, the water in the water supply tank can flow directly into the cleaning groove 111 through the water supply hole 114 to clean the cleaning groove 111, so as to improve the cleaning effect of the cleaning member 2 on the cleaning groove 111.

According to some embodiments of the present application, the cleaning member 2 is rotatably disposed in the cleaning tank 111, and the rotation axis of the cleaning member 2 extends in the up-down direction. As a result, the area swept by the cleaning member 2 in the horizontal direction can be increased, so that the stirring effect of the cleaning member 2 on the dirt in the cleaning tank 111 can be improved, which is beneficial to further prevent the accumulation of solid dirt on the inner wall of the cleaning tank 111, and at the same time, the cleaning area of the cleaning member 2 on the cleaning tank 111 can be increased, which is beneficial to improve the cleaning effect of the cleaning member 2 on the cleaning tank 111. Among them, the radial outer end surface of the cleaning member 2 is formed with a water supply gap 24, and the radial outer end surface of the cleaning member 2 refers to the side wall of the cleaning member 2 facing the inner peripheral wall of the cleaning tank 111 in the length direction. The water supply gap 24 penetrates the side wall of the water outlet tank 23, and in the first cleaning state, the water supply gap 24 is opposite to the water supply hole 114. That is, when the cleaning member 2 is in the first cleaning state, the water supply gap 24 and the water supply hole 114 are arranged relative to each other in the radial direction of the cleaning tank 111, so that the water flowing out of the water supply hole 114 can enter the water outlet tank 23 through the water supply gap 24, so as to realize the water supply tank adding water to the water outlet tank 23. Therefore, by providing the water supply gap 24, the cleaning member 2 can rotate relative to the cleaning tank 111 to clean the cleaning tank 111, and the difficulty of the water supply hole 114 adding water to the water outlet tank 23 is reduced, and the structure is simple.

In addition, the water outlet groove 23 includes a first groove area 231 and a second groove area 232, the first groove area 231 is located radially outside the second groove area 232, and the water supply gap 24 is formed on the side wall of the first groove area 231. That is to say, when the cleaning element 2 is in the first cleaning state, the first groove area 231 is located between the water supply hole 114 and the second groove area 232 and is connected to the second groove area 232. The first groove area 231 is arranged adjacent to the water supply hole 114 compared to the second groove area 232, and the water supply gap 24 is formed on the side wall of the first groove area 231 facing the water supply hole 114, i.e. radially outside. The water flowing out of the water supply hole 114 enters the first groove area 231 through the water supply gap 24, and flows along the first groove area 231 to the second groove area 232, thereby ensuring that the water outlet groove 23 can be filled with water, so as to realize the water supply tank to add water to the water outlet groove 23.

In the first cleaning state, the wiping member 200 covers the second groove area 232, and the first groove area 231 is exposed to the outer peripheral side of the wiping member 200. That is, when the cleaning member 2 is in the first cleaning state and the wiping member 200 rotates relative to the cleaning member 2, the outer peripheral edge of the wiping member 200 does not exceed the radial outer end edge of the second groove area 232, that is, the wiping member 200 is wetted by the water in the second groove area 232. Therefore, it is better to avoid that the wiping member 200 covers the first groove area 231 to block the water supply hole 114 and the water supply gap 24, which affects the water supply hole 114 to add water to the water outlet groove 23, thereby ensuring that the water flowing out of the water supply hole 114 can stably enter the first groove area 231 through the water supply gap 24 and flow into the second groove area 232 to wet the wiping member 200.

According to some embodiments of the present application, in the rotation direction of the cleaning member 2, the width of the first slot area 231 is greater than the width of the second slot area 232. Thus, the size of the first slot area 231 in the rotation direction of the cleaning member 2 can be increased, so as to reserve a larger setting space for the water supply gap 24, that is, a water supply gap 24 with a larger width can be set on the first slot area 231, so as to reduce the difficulty of aligning the water supply hole 114 with the water supply gap 24, and at the same time, the water storage capacity of the first slot area 231 can be increased, so as to better ensure the water supply capacity from the first slot area 231 to the second slot area 232, and prevent the second slot area 232 from being cut off and affecting the cleaning effect of the mopping member 200.

According to some embodiments of the present application, the bottom wall of the second trough area 232 is lower than the bottom wall of the first trough area 231. That is, the bottom wall of the water outlet trough 23 extends downward from the first trough area 231 toward the second trough area 232. As a result, the water in the first trough area 231 can automatically flow into the second trough area 232 along the bottom wall of the water outlet trough 23 under the action of gravity, so as to ensure the supply of water in the second trough area 232.

According to some embodiments of the present application, a filter structure is formed on the bottom wall of the filter tank 13, and a sewage cache chamber 14 is also formed in the base station base. The sewage cache chamber 14 is located below the filter tank 13 and is connected to the filter tank 13 through the filter structure. The drainage component is used to discharge the sewage in the sewage cache chamber. In other words, the sewage flowing downward through the filter structure in the filter tank 13 can flow into the sewage cache chamber 14 for temporary storage. At the same time, the filter structure can better prevent solid particles, hair and other solid dirt from entering the sewage cache chamber 14 and being difficult to clean. The solid dirt accumulates on the filter structure located on the sewage cache chamber 14, which can better reduce the difficulty of cleaning the solid dirt on the filter structure. It should be noted that the sewage in the filter tank 13 can also be directly discharged through the sewage discharge channel after passing through the filter structure, thereby reducing the retention time of the sewage in the cleaning base station 100. No specific restrictions are made on the discharge method of the sewage here.

According to some embodiments of the present application, the drainage assembly includes a drain pipe 4, which is connected to the bottom wall of the filter tank 13 and communicated with the sewage buffer chamber 14, and the drain pipe 4 is used to discharge the sewage in the sewage buffer chamber 14. Therefore, the sewage in the sewage buffer chamber 14 can be discharged in time through the drain pipe 4, so that the sewage buffer chamber 14 can continuously receive the sewage flowing into the filter tank 13 from the cleaning tank 111, and the sewage in the cleaning tank 111 can be better prevented from exceeding the capacity limit and overflowing the base station base 1, so as to prevent the dirt from contaminating the space where the cleaning base station 100 is located.

In addition, the connection position between the sewage pipe 4 and the bottom wall of the filter tank 13 is located above the sewage buffer chamber 14, so that the difficulty of inspection and maintenance of the sewage pipe 4 can be reduced. In a specific example, a connecting branch pipe 122 is provided on the bottom wall of the filter tank 13. In the direction from bottom to top, the connecting branch pipe 122 extends backward and tilts. The lower end of the connecting branch pipe 122 forms a sewage outlet, which is opposite to and connected to the sewage buffer chamber 14. The sewage pipe 4 is sleeved on the upper end of the connecting branch pipe 122.

The drainage component further includes a sewage tank, and the sewage tank is connected to the sewage buffer chamber 14 through the sewage pipe 4. That is, the sewage in the sewage buffer chamber 14 can flow into the sewage tank through the sewage pipe 4, that is, the sewage generated during the operation of the cleaning base station 100 is temporarily stored in the sewage tank, so that the user can clean the sewage tank according to the amount of sewage stored in the sewage tank, so that the cleaning base station 100 can simultaneously realize the functions of cleaning the mopping member 200, self-cleaning, and sewage recycling, which can better improve the automation level of the cleaning base station 100 to reduce the user's operation, which is conducive to improving the user's experience.

According to some embodiments of the present application, there are two cleaning tanks 111 arranged in the left-right direction, and the filter tank 13 is located between the two cleaning tanks 111, and the dirt in the two cleaning tanks 111 is suitable for flowing into the filter tank 13. In other words, the filter tank 13 can accept the dirt in the two cleaning tanks 111 at the same time, that is, the two cleaning tanks 111 can share one filter tank 13, so that the number of filter tanks 13 can be reduced to save the installation space occupied by the filter tank 13, which is conducive to controlling the overall size of the cleaning base station 100. In addition, the two cleaning tanks 111 can respectively clean the two mopping and wiping parts 200 on the cleaning device, which is conducive to improving the cleaning efficiency of the cleaning base station 100 on the mopping and wiping parts 200.

According to some embodiments of the present application, the base station base 1 is formed with a sewage cache chamber 14, and the water in the cleaning tank 111 is suitable for flowing into the sewage cache chamber 14. The drainage component includes a sewage pipe 4 and a sewage tank, and the sewage tank and the sewage cache chamber 14 are connected through the sewage pipe 4. In other words, the sewage in the sewage cache chamber 14 can flow into the sewage tank through the sewage pipe 4, so that the water in the cleaning tank 111 can continue to flow into the sewage cache chamber 14, which can better avoid the overflow of the water in the cleaning tank 111 exceeding the upper capacity of the cleaning tank 111. In addition, the sewage generated during the operation of the cleaning base station 100 is temporarily stored in the sewage tank, so that the user can clean the sewage tank according to the amount of sewage stored in the sewage tank, so that the cleaning base station 100 can simultaneously realize the functions of cleaning the mopping part 200, self-cleaning and sewage recycling, which can be more efficient. The automation level of the cleaning base station 100 is improved to reduce the user's operation, which is beneficial to improving the user's experience.

In a specific example, the base station base 1 includes a base body 11 and a filter component 12. Two cleaning grooves 111 arranged in the left and right directions are formed on the base body 11. The cleaning grooves 111 are circular. The filter groove 13 is arranged between the two cleaning grooves 111 and the bottom wall of the filter groove 13 is lower than the bottom wall of the cleaning groove 111. A through communication notch 113 is provided on the inner peripheral wall of the cleaning groove 111. The cleaning groove 111 is connected with the filter groove 13 through the communication notch 113. The cleaning part 2 is in the shape of a long strip extending in the radial direction of the cleaning groove 111. The center of the cleaning part 2 in the length direction is The cleaning member 2 is rotatably arranged at the center of the cleaning tank 111 so that the cleaning member 2 can be rotatably arranged in the cleaning tank 111 around the center of the cleaning tank 111. A first cleaning structure is arranged on the bottom surface of the cleaning member 2, and the first cleaning structure contacts the bottom wall of the cleaning tank 111. A second cleaning structure is arranged on the radial outer end surface of the cleaning member 2, and the second cleaning structure contacts the inner circumferential wall of the cleaning tank 111. During the rotation of the cleaning member 2 relative to the cleaning tank 111, the bottom wall of the cleaning tank 111 is brushed by the first cleaning structure, and the inner circumferential wall of the cleaning tank 111 is brushed by the second cleaning structure. Among them, the base body 11 and the filter component 12 jointly define a filter tank 13 and a sewage cache chamber 14 arranged in the up and down directions. The sewage cache chamber 14 is located below the filter tank 13 and is connected to the filter tank 13 through a filter structure. The drainage component is connected to the sewage cache chamber 14 through a sewage pipe 4. A plurality of filter holes 121 are formed on the bottom wall of the filter tank 13. The plurality of filter holes 121 together constitute a filter structure. The filter structure can better prevent solid particles, hair and other solid dirt from entering the sewage cache chamber 14 and being difficult to clean. The solid dirt accumulates on the filter structure located on the sewage cache chamber 14, which can better reduce the difficulty of cleaning the solid dirt on the filter structure.

In addition, the cleaning base station 100 also includes a connecting duct member 8, which is arranged on the upper side of the filter tank 13, and a first channel 81 of the drying duct 51 and a second channel 82 connected to the collecting duct 61 are formed in the connecting duct member 8. The drying duct member 5 and the collecting duct member 6 are both arranged at the rear end of the connecting duct member 8 and arranged along the left and right directions. The drying duct member 5 is provided with a first control valve for controlling the on and off of the drying duct 51, and the collecting duct member 6 is provided with a second control valve for controlling the on and off of the collecting duct 61. A sliding cavity 83 extending along the front-to-back direction and opening forward is also formed in the connecting duct member 8, and the suction nozzle 7 is slidably arranged in the sliding cavity 83 along the front-to-back direction, and the first channel 81 and the second channel 82 are connected to the sliding cavity 83. A driving mechanism 9 is provided on the outside of the base station base 1, and the driving mechanism 9 is connected to the suction nozzle 7 to drive the suction nozzle 7 to move between the limit position and the non-limit position.

The cleaning base station 100 for cleaning equipment according to a specific embodiment of the present application is described below with reference to Figures 1 to 17. It should be noted that the following description is only exemplary and is intended to be used to explain the present application, and cannot be understood as limiting the present application.

The cleaning base station 100 includes a base station base 1, a cleaning component 2, a limiting component 3, a sewage pipe 4, a sewage tank, a drying and collecting component, a connecting air duct component 8, a driving mechanism 9 and a water supply tank.

The base station base 1 includes a base body 11 and a filter component 12. Two cleaning grooves 111 arranged in the left and right directions are formed on the base body 11. Each cleaning groove 111 is circular or approximately circular. The cleaning member 2 is in the shape of a long strip extending in the radial direction of the cleaning groove 111. The cleaning member 2 is rotatable around the center of the cleaning groove 111 and is arranged in the cleaning groove 111. A rotating hole 112 is formed on the bottom wall of each cleaning groove 111. The rotating hole 112 is a blind hole with an opening upward. The opening of the rotating hole 112 is located on the bottom wall of the cleaning groove 111. The cleaning member 2 includes a cleaning member The main body 21 and the rotating shaft 22 are arranged on the bottom surface of the cleaning component body 21. The rotating shaft 22 is arranged near the center position of the cleaning component body 21 in the length direction. The rotating shaft 22 is rotatably arranged in the rotating hole 112 along the circumference of the cleaning groove 111. A first limiting protrusion is arranged on the inner peripheral wall of the rotating hole 112, and a second limiting protrusion is arranged on the outer peripheral wall of the rotating shaft 22. After the cleaning component 2 is assembled on the base body 11, the second limiting protrusion is located at the lower side of the first limiting protrusion, so as to limit the cleaning component 2 from moving upward and leaving the rotating hole 112 through the cooperation of the first limiting protrusion and the second limiting protrusion. In addition, a first cleaning structure 213 is provided on the bottom surface of the cleaning element body 21, and the first cleaning structure 213 contacts the bottom wall of the cleaning tank 111. A second cleaning structure is provided on the radial outer end surface of the cleaning element body 21, and the second cleaning structure contacts the inner circumferential wall of the cleaning tank 111. When the cleaning element 2 rotates relative to the cleaning tank 111, the bottom wall of the cleaning tank 111 is brushed by the first cleaning structure 213, and the inner circumferential wall of the cleaning tank 111 is brushed by the second cleaning structure.

Among them, the base body 11 and the filter component 12 jointly define a filter tank 13 and a sewage cache chamber 14 arranged in the up-down direction. A connecting branch pipe 122 is provided on the filter component 12. The connecting branch pipe 122 passes through the filter component 12 in the up-down direction. The connecting branch pipe 122 is arranged at the rear end of the filter component 12. The lower end of the connecting branch pipe 122 protrudes from the lower surface of the filter component 12 and is spaced apart from the bottom wall of the sewage cache chamber 14. In the direction from front to rear, the bottom wall of the sewage cache chamber 14 extends downwardly at an angle. The upper end of the connecting branch pipe 122 protrudes from the upper surface of the filter component 12 and is connected to the sewage pipe 4. The end of the sewage pipe 4 away from the connecting branch pipe 122 is connected to the sewage tank.

In addition, the upper surface of the filter component 12 constitutes the bottom wall of the filter tank 13, and the bottom wall of the filter tank 13 is lower than the bottom wall of the cleaning tank 111. A plurality of filter holes 121 penetrating from top to bottom are formed on the filter component 12, and the plurality of filter holes 121 together constitute a filter structure on the bottom wall of the filter tank 13. The filter tank 13 is located between the two cleaning tanks 111, and the side walls of the two cleaning tanks 111 adjacent to the filter tank 13 are both formed with a through-connecting notch 113. The cleaning tank 111 is connected to the filter tank 13 through the connecting notch 113, and the bottom wall of the connecting notch 113 is flush with the bottom wall of the cleaning tank 111. The left and right ends of the front side of the filter tank 13 extend into the two cleaning tanks 111 respectively, and in the direction from the cleaning tank 111 toward the filter tank 13, the bottom wall of the cleaning tank 111 extends downwardly to form a guide surface.

The drying and collecting component includes a drying component, a collecting component, a suction nozzle 7 and a connecting air duct component 8. The drying component includes a drying air duct component 5, a heating component and a drying fan. A drying air duct 51 is formed in the drying air duct component 5. The drying fan and the heating component are arranged in the drying air duct 51. The collecting component includes a collecting air duct component 6, a collecting fan and a dust collecting component. The collecting air duct component 6 and the drying air duct component 5 are arranged at intervals in the left and right directions. The sewage pipe 4 is located between the collecting air duct component 6 and the drying air duct component 5. A collecting air duct 61 is formed in the collecting air duct component 6. A collecting fan is arranged in the collecting air duct 61. A dust collecting chamber is formed in the dust collecting component. The suction nozzle 7 is slidably arranged in the connecting air duct component 8 along the front-to-back direction. In the direction from bottom to top, the drying air duct 51 and the collecting air duct 61 extend obliquely in the direction away from each other, and the cross-sectional areas of the drying air duct 51 and the collecting air duct 61 gradually increase.

Among them, the connecting duct member 8 forms a first channel 81 connected to the drying duct 51, a second channel 82 connected to the collecting duct 61, a sliding cavity 83 and an avoidance hole 84 connected to the first channel 81 and the second channel 82. The first channel 81 and the second channel 82 extend in the up and down directions, and the first channel 81 and the second channel 82 are also connected through the sliding cavity 83. Among them, the sliding chamber 83 includes a first sliding chamber 831 and a second sliding chamber 832 extending in the front-to-back direction and arranged in the left-to-right direction. The rear end of the first sliding chamber 831 is connected to the lower end of the first channel 81, and the end of the first channel 81 away from the first sliding chamber 831, that is, the upper end, is connected to the outlet end of the drying air duct 51. A first control valve is provided near the outlet end of the drying air duct 51, and the first control valve is used to control the connection and disconnection of the drying air duct 51 and the first channel 81; the rear end of the second sliding chamber 832 is connected to the rear end of the first sliding chamber 831 and the second channel 82, and the end of the second channel 82 away from the second sliding chamber 832, that is, the upper end, is connected to the inlet end of the collecting air duct 61. A second control valve is provided near the inlet end of the collecting air duct 61, and the second control valve is used to control the connection and disconnection of the collecting air duct 61 and the second channel 82. In addition, the avoidance hole 84 is located between the first sliding cavity 831 and the second sliding cavity 832 and penetrates the connecting air duct member 8 in the up and down direction. The avoidance hole 84 is located above the connecting branch pipe 122. The sewage pipe 4 is passed through the avoidance hole 84, and in the direction from front to rear, the sewage pipe 4 extends upward at an angle.

In addition, the suction nozzle 7 constitutes the stopper 3, and the suction nozzle 7 includes a suction portion 71 and a sliding portion 72. The suction portion 71 is arranged at the front end of the sliding portion 72, and the suction portion 71 is located in the filter tank 13. A suction port 711 is formed in the suction portion 71. In the direction from back to front, the suction port 711 extends downwardly and obliquely. The suction port 711 is in a flat shape extending in the left and right directions. The upper side wall of the suction port 711 is formed as a guide wall 713. The guide wall 713 extends from back to front. The suction port 711 extends downwardly and obliquely, and the lower side wall of the suction port 711 is formed as a scratch wall 712. The front end edge of the guide wall 713 extends out of the front end edge of the scratch wall 712. The thickness of the scratch wall 712 gradually increases from front to back, and the front end edge of the scratch wall 712 abuts against the bottom wall of the filter tank 13. The driving mechanism 9 is arranged on the outer peripheral side of the base body 11 and is connected to the suction nozzle 7 to drive the suction nozzle 7 to reciprocate along the front and rear directions relative to the connecting air duct member 8.

Secondly, a connecting cavity 723 connected to the suction port 711 is formed in the sliding portion 72. The sliding portion 72 includes a first sliding portion 721 and a second sliding portion 722 arranged in the left-right direction. The connecting branch pipe 122 and the drain pipe 4 are both located between the first sliding portion 721 and the second sliding portion 722. The front ends of the first sliding portion 721 and the second sliding portion 722 are both connected to the rear end of the suction portion 71. A first connecting channel 7231 is formed in the first sliding portion 721. The front end of the first connecting channel 7231 is connected to the suction port 711. The second sliding portion 722 is provided with a first connecting channel 7231. A second connecting channel 7232 is formed, a front end of the second connecting channel 7232 is connected to the suction port 711, the first sliding portion 721 is slidably disposed in the first sliding cavity 831 along the front-to-back direction, the second sliding portion 722 is slidably disposed in the second sliding cavity 832 along the front-to-back direction, the suction port 711 is connected to the drying air duct 51 through the first connecting channel 7231, the first sliding cavity 831 and the first channel 81, and the suction port 711 is also connected to the collecting air duct 61 through the second connecting channel 7232, the second sliding cavity 832 and the second channel 82.

The area swept by the cleaning member 2 when rotating relative to the cleaning tank 111 constitutes the cleaning area, and the suction nozzle 7 has a limiting position and a non-limiting position. In the limiting position, the suction part 71 moves forward relative to the filter connecting air duct member 8 until at least part of the suction part 71 extends into the cleaning area, and the part of the suction part 71 located in the cleaning area is formed as a limiting part 31, and the rotation of the cleaning member 2 is blocked by the limiting part 31 so that the cleaning member 2 is in the first cleaning state, and the upper surface of the limiting part 31 is not higher than the upper surface of the cleaning member 2; in the non-limiting position, the suction part 71 moves backward relative to the filter connecting air duct member 8 until the suction part 71 is located at the outer peripheral side of the cleaning area, so as to release the restriction of the suction nozzle 7 on the cleaning member 2, so that the cleaning member 2 can rotate relative to the cleaning tank 111, and the cleaning member 2 is in the second cleaning state. Secondly, a buffer structure is provided in the area where the cleaning body 21 abuts against the suction nozzle 7. The side walls of the cleaning body 21 opposite to each other in the circumferential direction of the cleaning body 2 are respectively the first side wall 211 and the second side wall 212, and a buffer layer is provided on both the first side wall 211 and the second side wall 212.

In addition, a water outlet groove 23 and a cleaning protrusion 25 arranged along the length direction of the cleaning member 2 are formed on the upper surface of the cleaning member body 21. The water outlet groove 23 and the cleaning protrusion 25 are respectively located on both sides of the rotating shaft 22. The water outlet groove 23 includes a first groove area 231 and a second groove area 232 arranged along the length direction of the cleaning member 2. The first groove area 231 is located between the inner peripheral wall of the cleaning tank 111 and the second groove area 232. In the circumferential direction of the cleaning tank 111, the width of the first groove area 231 is greater than the width of the second groove area 232. The first groove area 231 is located on the side of the second groove area 232 away from the rotating shaft 22, and the bottom wall of the second groove area 232 is lower than the bottom wall of the first groove area 231. The mopping member 200 of the cleaning device covers the second groove area 232, and at least a part of the first groove area 231 is located on the outer peripheral side of the mopping member 200. Secondly, a water supply gap 24 is formed on the radial outer wall of the first groove area 231, and a water supply hole 114 is formed on the inner wall of the cleaning groove 111. The water supply box is connected to the water inlet end of the water supply hole 114 through a water supply channel. The water supply hole 114 is arranged adjacent to the filter groove 13. When the cleaning part 2 is in the first cleaning state, the water supply hole 114 and the water supply gap 24 are arranged relative to each other in the radial direction of the cleaning groove 111.

Specifically, when the wiping member 200 of the cleaning device needs to be cleaned, the cleaning device moves to the cleaning base station 100 and cooperates with the cleaning base station 100, such as locking, to ensure the stability of the wiping member 200 during the cleaning process. At this time, the two wiping members 200 of the cleaning device are respectively located in the two cleaning grooves 111 and are respectively pressed on the two cleaning members 2. First, the driving mechanism 9 drives the suction nozzle 7 to move forward to the limit position. Therefore, when the cleaning device drives the two wiping members 200 to rotate, the friction between the cleaning member 2 and the cleaning member 2 drives the cleaning member 2 to rotate. When the cleaning member 2 rotates to the position against the suction nozzle 7 located at the limit position, the cleaning member 2 is fixed relative to the cleaning groove 111, and the cleaning member 2 is in the first position. In the first cleaning state, the impact between the suction nozzle 7 and the cleaning member 2 can be better buffered by the buffer layer on the cleaning member 2. The wiping member 200 on the left is suitable for rotating in a clockwise direction so that the cleaning member 2 on the left abuts against the left side wall of the suction nozzle 7, and the wiping member 200 on the right is suitable for rotating in a counterclockwise direction so that the cleaning member 2 on the right abuts against the right side wall of the suction nozzle 7, so as to prevent the cleaning member 2 in the first cleaning state from blocking the filter tank 13.

After the cleaning member 2 is fixed in the first cleaning state by the suction nozzle 7, the water supply tank injects water into the first tank area 231 through the water supply channel, the water supply hole 114 and the water supply gap 24, and the water entering the first tank area 231 continues to flow into the second tank area 232. The cleaning device continues to drive the mop 200 to rotate relative to the cleaning member 2, so that the part of the mop 200 that sweeps the water outlet tank 23 is wetted, and the dirt on the mop 200 can be cleaned by the mutual friction between the cleaning protrusion 25 on the upper surface of the cleaning member body 21 and the mop 200, so that the dirt on the mop 200 can enter the cleaning tank 111 with the water flow, thereby completing the cleaning operation of the mop 200. In this process, the generated sewage can enter the filter tank 13 through the connecting gap 113.

After the mopping member 200 has finished cleaning, the driving mechanism 9 drives the suction nozzle 7 to move backward to the non-limiting position to release the limiting effect of the suction nozzle 7 on the cleaning member 2, so that under the action of the friction between the mopping member 200 and the cleaning member 2, the mopping member 200 can drive the cleaning member 2 to rotate relative to the cleaning tank 111, and brush the bottom wall of the cleaning tank 111 through the first cleaning structure 213, and brush the inner peripheral wall of the cleaning tank 111 through the second cleaning structure. The water supply tank can inject water into the cleaning tank 111 through the water supply channel and the water supply hole 114 to rinse the inner wall of the cleaning tank 111 under the stirring of the cleaning member 2. When the cleaning member 2 rotates relative to the cleaning tank 111, the cleaning member 2 sweeps over the part of the filter tank 13 located in the cleaning tank 111, and the stirring of the cleaning member 2 can drive the dirt in the cleaning tank 111 into the filter tank 13. During the cleaning process of the mopping member 200 and the cleaning tank 111 , the drying air duct 51 can be closed by the first control valve, and the collecting air duct 61 can be closed by the second control valve to prevent water vapor from entering the drying air duct 51 and the collecting air duct 61 .

The sewage in the dirt entering the filter tank 13 can flow downward into the sewage buffer chamber 14 through the multiple filter holes 121 on the bottom wall of the filter tank 13, and flow in the direction close to the connecting branch pipe 122, and then discharge the sewage into the sewage tank through the sewage pipe 4 for storage. The filtering structure can intercept solid dirt on the filter component 12. After the cleaning of the cleaning tank 111 is completed, it enters the drying mode. In the drying mode, the first control valve is controlled to open the drying air duct 51, and the second control valve is controlled to close the collecting air duct 61, so that the drying air duct 51 is connected with the first channel 81. Driven by the drying fan, the hot air in the drying air duct 51 is discharged into the filter tank 13 through the first channel 81, the sliding cavity 83, the first connecting channel 7231, the second connecting channel 7232 and the suction port 711, and further escapes into the cleaning tank 111 through the connecting gap 113, so that the drying component can dry the dirt in the filter tank 13 and the mopping member 200 in the cleaning tank 111. Before the solid dirt in the filter tank 13 is dried, the suction nozzle 7 is located at the rear end of the filter hole 121. After the dirt in the filter tank 13 is dried, the solid dirt collection mode is entered. In the solid dirt collection mode, the first control valve is controlled to close the drying air duct 51, and the second control valve is controlled to open the collecting air duct 61, so that the collecting air duct 61 is connected to the second channel 82, and the driving mechanism 9 drives the suction nozzle 7 to move forward to scrape the solid dirt on the filter structure through the scratch wall 712 so that the solid dirt can be separated from the filter structure, and under the action of the collecting fan, the solid dirt in the filter tank 13 enters the dust collecting chamber through the suction port 711, the first connecting channel 7231, the second connecting channel 7232, the sliding cavity 83, the second channel 82 and the collecting air duct 61 until the solid dirt in the filter tank 13 is completely collected.

In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present application, and that the scope of the present application is defined by the claims and their equivalents.

Claims (45)

A cleaning control method for a cleaning system, wherein the cleaning system comprises a cleaning device and a cleaning base station, the cleaning base station comprises a base station base, a cleaning member, a stopper, a water supply assembly and a drainage assembly, the base station base is formed with a cleaning tank and a filter tank, the cleaning member is movably arranged in the cleaning tank, the water supply assembly is used to supply water to the cleaning tank, and the drainage assembly is used to discharge sewage generated in the cleaning tank, the cleaning control method comprises: Controlling the cleaning device to move to the cleaning base station, wherein the wiping member of the cleaning device is located in the cleaning tank; Controlling the limiting member to limit the cleaning member to a first cleaning state so that the cleaning member is fixed relative to the base station base, and the wiping member of the cleaning device moves relative to the cleaning member to clean; The limiting member is controlled to be disengaged from the cleaning member, and the cleaning member is located in the second cleaning state so that the cleaning member can move. The cleaning member moves to clean the cleaning tank, and the dirt in the cleaning tank is suitable for flowing into the filter tank for filtration under the stirring of the cleaning member. The cleaning control method according to claim 1, wherein: Controlling the cleaning device to move to the cleaning base station includes: the wiping member is located on the cleaning member and contacts the cleaning member; The wiping member of the cleaning device moves relative to the cleaning member to clean, including: controlling the wiping member to rotate and rub against the cleaning member to clean the wiping member; The cleaning member moves to clean the cleaning tank, including: controlling the wiping member to rotate to drive the cleaning member to rotate. The cleaning control method according to claim 2, wherein the rotation speed of the wiping member in the second cleaning state is smaller than the rotation speed of the wiping member in the first cleaning state. The cleaning control method according to claim 2, wherein after the cleaning member moves to clean the cleaning tank, the method further comprises: Controlling the wiping member to be out of contact with the cleaning member, and controlling the wiping member to rotate; Alternatively, the wiping member is controlled to rotate and drive the cleaning member to rotate. The cleaning control method according to any one of claims 1 to 4, wherein the cleaning element moves to clean the cleaning tank, comprising: Controlling the cleaning element to rotate at a uniform speed; Alternatively, the cleaning element is controlled to rotate intermittently; Alternatively, the cleaning element is controlled to rotate alternately along different rotation directions. The cleaning control method according to any one of claims 1 to 4, wherein after the cleaning element moves to clean the cleaning tank, the method further comprises: The wiping member is controlled to rotate. The cleaning control method according to any one of claims 1 to 6, wherein the cleaning system further comprises a drying and collecting assembly, the drying and collecting assembly being arranged on the base of the base station and comprising a drying assembly and a collecting assembly, and after the cleaning member moves to clean the cleaning tank, further comprising: Controlling the drying component to dry the solid dirt in the wiping member and the filter tank; The collecting component is controlled to collect the dried solid dirt in the filter tank. According to the cleaning control method of claim 7, wherein the drying temperature of the drying component for drying the mopping member and the solid dirt in the filter tank is T, and the drying time is t, the value range of T is 40 to 80°C, and the value range of t is 1.5h to 2.5h. The cleaning control method according to claim 7, wherein the collection assembly comprises a suction nozzle, the suction nozzle is movably located in the filter tank, and the solid dirt in the filter tank is suitable for being sucked into the collection assembly through the suction nozzle; The collecting component collects the solid dirt in the filter tank, including: Starting the collection fan of the collection assembly to form a negative pressure at the suction nozzle; The suction nozzle is controlled to move so that the scraping wall of the suction nozzle scrapes the bottom wall of the filter tank, so as to separate the solid dirt from the bottom wall of the filter tank. The cleaning control method according to claim 9, wherein the suction nozzle is adapted to reciprocate along a suction direction parallel to the suction nozzle. The cleaning control method according to claim 9, wherein the suction nozzle constitutes the limiting member; Controlling the cleaning device to move to the cleaning base station includes: the wiping member is located on the cleaning member and contacts the cleaning member; Controlling the limiting member to limit the cleaning member includes: controlling the suction nozzle to be located at the limiting position and to cooperate with the cleaning member so that the cleaning member is located in the first cleaning state, and controlling the wiping member to rotate and rub against the cleaning member so as to clean the wiping member; Controlling the limiting member to disengage from the cleaning member includes: controlling the suction nozzle to be located at a non-limiting position and disengaging from the cleaning member so that the cleaning member is located at the second cleaning state, and controlling the wiping member to rotate to drive the cleaning member to rotate. The cleaning control method according to claim 11, wherein controlling the wiping member to rotate and rub against the cleaning member to clean the wiping member comprises: An initial cleaning stage and a stable cleaning stage located after the initial cleaning stage, the rotation speed of the wiping member in the initial cleaning stage is lower than the rotation speed of the wiping member in the stable cleaning stage. The cleaning control method according to claim 12, wherein in the initial cleaning stage, the rotation speed of the wiping member gradually increases; and in the stable cleaning stage, the rotation speed of the wiping member remains unchanged. The cleaning control method according to claim 11, wherein the filter tank comprises a filter area and a non-filter area, a filter structure is formed on the bottom wall of the filter area, at least a portion of the suction nozzle is located in the filter area in the limit position, and the suction nozzle is located in the non-filter area in the non-limit position; Controlling the drying component to dry the mopping member and the solid dirt in the filter tank includes: controlling the suction nozzle to be located at the non-limiting position. The cleaning control method according to claim 7, wherein the drying component comprises a drying duct member and a drying fan, the drying duct member has a drying duct, the collecting component comprises a collecting duct member and a collecting fan, the collecting duct member has a collecting duct, the drying collecting component comprises a suction nozzle, the suction nozzle is located in the filter tank and connected to the outlet end of the drying duct member and the inlet end of the collecting duct member, and the suction nozzle can be selectively connected to one of the drying duct and the collecting duct; Controlling the drying component to dry the mopping member and the solid dirt in the filter tank includes: controlling the suction nozzle to communicate with the drying air duct, controlling the drying fan to turn on and the collecting fan to turn off; Controlling the collecting component to collect the solid dirt in the filter tank includes: controlling the suction nozzle to communicate with the collecting air duct, controlling the collecting fan to turn on and the drying fan to turn off. The cleaning control method according to any one of claims 1 to 15, wherein the wiping member of the cleaning device moves relative to the cleaning member to clean, comprising: controlling a water supply component to supply water into the cleaning tank; After the cleaning member moves to clean the cleaning tank, the method includes: controlling the water supply component to stop supplying water to the cleaning tank. A cleaning system, comprising: A cleaning base station, comprising a first control module, wherein the first control module is used to control the cleaning base station; A cleaning device, comprising a second control module, wherein the second control module is used to control the cleaning device; Wherein, the cleaning device is suitable for cooperating with the cleaning base station, and the first control module is communicatively connected with the second control module for jointly controlling the cleaning system to operate according to the cleaning control method according to any one of claims 1-16. The cleaning system according to claim 17, wherein a bottom wall of the filter tank is lower than a bottom wall of the cleaning tank. The cleaning system according to claim 17 or 18, wherein the filter tank is located on the outer peripheral side of the cleaning tank. The cleaning system according to claim 19, wherein a connecting gap is formed on a peripheral wall of the cleaning tank, and the connecting gap connects the filter tank and the cleaning tank. The cleaning system according to claim 20, wherein the cleaning member is rotatably disposed in the cleaning tank, the rotation axis of the cleaning member extends in the up-and-down direction, and during the rotation of the cleaning member, the cleaning member is suitable for passing above the filter tank. The cleaning system according to any one of claims 17 to 21, wherein at least a portion of the bottom wall of the cleaning tank is formed as a guide surface, and the guide surface extends obliquely downward in a direction from the cleaning tank to the filter tank. The cleaning system according to any one of claims 17 to 22, wherein the cleaning member is rotatably disposed in the cleaning tank, the cleaning member comprises a cleaning member body and a rotating shaft, a rotating hole is formed on the bottom wall of the cleaning tank, the rotating shaft is rotatably engaged with the rotating hole, and the cleaning member body is located in the cleaning tank; Wherein, in the first cleaning state, in the rotation direction of the cleaning element, the limiting element abuts against the cleaning element body to The cleaning member is fixed relative to the base station base. The cleaning system according to claim 23, wherein the rotating hole is a blind hole, the rotating hole is formed by the bottom wall of the cleaning tank being recessed downward, the inner peripheral wall of the rotating hole is formed with a first limiting protrusion, the outer peripheral wall of the rotating shaft is formed with a second limiting protrusion, the second limiting protrusion is located at the lower side of the first limiting protrusion and abuts against the first limiting protrusion in the upper and lower directions. The cleaning system according to claim 23, wherein a buffer structure is provided on one of the cleaning component body and the limiting component, and in the first cleaning state, in the rotation direction of the cleaning component, the buffer structure is located between the limiting component and the cleaning component body. The cleaning system according to claim 25, wherein the buffer structure includes a buffer layer, and in the rotation direction of the cleaning component, the cleaning component body has a first side wall and a second side wall that are oppositely arranged, and the buffer layer is provided on at least one of the first side wall and the second side wall, and the buffer layer is a rubber layer. The cleaning system according to claim 23, wherein the area swept by the cleaning element during the rotation process is the cleaning area, and in the first cleaning state, the portion of the limiting element located in the cleaning area is the limiting portion, and in the rotation direction of the cleaning element, the limiting portion abuts against the cleaning element body, and the upper surface of at least the limiting portion of the limiting element is not higher than the upper surface of the cleaning element. A cleaning system according to any one of claims 17-27, wherein the cleaning component comprises a cleaning component body and a first cleaning structure arranged on the bottom surface of the cleaning component body, and the cleaning component body is rotatably arranged in the cleaning tank, and when the cleaning component body rotates, it drives the first cleaning structure to stir the dirt in the cleaning tank and flow it into the filter tank. The cleaning system of claim 28, wherein the first cleaning structure is adapted to contact a bottom wall of the cleaning tank. The cleaning system according to claim 28, wherein the first cleaning structure comprises at least one of a flexible rubber strip and a brush. A cleaning system according to any one of claims 17-30, wherein the cleaning element comprises a cleaning element body and a second cleaning structure arranged on the radial outer end surface of the cleaning element body, the cleaning element body is rotatably arranged in the cleaning tank, and the second cleaning structure is suitable for contacting the inner circumferential wall of the cleaning tank. A cleaning system according to any one of claims 17-31, wherein the limit member is movably provided on the base station base between a limit position and a non-limit position, and in the limit position, the limit member cooperates with the cleaning member to put the cleaning member in a first cleaning state; in the non-limit position, the limit member is disengaged from the cleaning member. The cleaning system according to claim 32, wherein the cleaning element is rotatably disposed in the cleaning tank, and the area swept by the cleaning element during rotation is the cleaning area, and in the limit position, at least a portion of the limit element is located in the cleaning area, and in the non-limit position, the limit element is located on the outer peripheral side of the cleaning area. The cleaning system according to any one of claims 17 to 33, wherein the cleaning member is rotatably disposed in the cleaning tank, the area swept by the cleaning member during the rotation is the cleaning area, the cleaning member can be raised and lowered between a first position and a second position, and the second position is located below the first position; Wherein, in the first cleaning state, the cleaning element is located at the first position, and at least a portion of the limiting element is located in the cleaning area; in the second cleaning state, the cleaning element is located at the second position, and the limiting element is located above the cleaning area. The cleaning system according to any one of claims 17-34, wherein a water supply hole is formed on the inner peripheral wall of the cleaning tank, and the water supply assembly is connected to the water supply hole through a water supply channel. The cleaning system according to claim 35, wherein a water outlet groove is formed on the upper surface of the cleaning member, the water of the water supply assembly is suitable for flowing into the water outlet groove, and the water in the water outlet groove is suitable for overflowing into the cleaning groove. The cleaning system according to claim 36, wherein, in the first cleaning state, the water outlet groove is adjacent to the water supply hole, and the water supply hole is suitable for supplying water into the water outlet groove. The cleaning system according to claim 36, wherein the cleaning member is rotatably disposed in the cleaning tank, the rotation axis of the cleaning member extends in the up-down direction, a water supply gap is formed on the radial outer end surface of the cleaning member, and the water supply gap penetrates the side wall of the water outlet tank; Wherein, in the first cleaning state, the water supply gap is opposite to the water supply hole. The cleaning system according to claim 38, wherein the water outlet trough comprises a first trough area and a second trough area, the first trough area is located radially outside the second trough area, and the water supply gap is formed on a side wall of the first trough area; Wherein, in the first cleaning state, the wiping member covers the second groove area, and the first groove area is exposed to the outer peripheral side of the wiping member. The cleaning system according to claim 39, wherein, in the rotation direction of the cleaning element, the width of the first groove area is greater than the width of the second groove area. The cleaning system of claim 39, wherein a bottom wall of the second trough section is lower than a bottom wall of the first trough section. A cleaning system according to any one of claims 17-41, wherein a filtering structure is formed on the bottom wall of the filter tank, and a sewage cache chamber is also formed on the base station base, the sewage cache chamber is located below the filter tank and is connected to the filter tank through the filtering structure, and the drainage component is used to discharge the sewage in the sewage cache chamber. According to the cleaning system of claim 42, the drainage component includes a drain pipe, which is connected to the bottom wall of the filter tank and communicates with the sewage cache chamber, and the drain pipe is used to discharge the sewage in the sewage cache chamber. The cleaning system according to claim 43, wherein the drainage assembly further comprises a sewage tank, and the sewage tank is connected to the sewage buffer chamber through the sewage pipe. A cleaning system according to any one of claims 17-44, wherein the number of the cleaning tanks is two and they are arranged in the left-right direction, the filter tank is located between the two cleaning tanks, and the dirt in the two cleaning tanks is suitable for flowing into the filter tank.