WO2025175331A1 - Dispositif de traitement thermique d'une substance - Google Patents

Dispositif de traitement thermique d'une substance

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Publication number
WO2025175331A1
WO2025175331A1 PCT/AT2025/060069 AT2025060069W WO2025175331A1 WO 2025175331 A1 WO2025175331 A1 WO 2025175331A1 AT 2025060069 W AT2025060069 W AT 2025060069W WO 2025175331 A1 WO2025175331 A1 WO 2025175331A1
Authority
WO
WIPO (PCT)
Prior art keywords
hot gas
treatment chamber
plasma
gas channel
outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/AT2025/060069
Other languages
German (de)
English (en)
Inventor
Werner Wiggen
Maximilian LINN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thermal Processing Solutions GmbH
Original Assignee
Thermal Processing Solutions GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermal Processing Solutions GmbH filed Critical Thermal Processing Solutions GmbH
Publication of WO2025175331A1 publication Critical patent/WO2025175331A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/34—Methods of heating
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21C—PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OF WROUGHT-IRON OR STEEL; TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS
    • C21C5/00—Manufacture of carbon-steel, e.g. plain mild steel, medium carbon steel or cast steel or stainless steel
    • C21C5/52—Manufacture of steel in electric furnaces
    • C21C5/5205—Manufacture of steel in electric furnaces in a plasma heated furnace
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/06—Crucible or pot furnaces heated electrically, e.g. induction crucible furnaces with or without any other source of heat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B3/00—Hearth-type furnaces, e.g. of reverberatory type; Electric arc furnaces ; Tank furnaces
    • F27B3/08—Hearth-type furnaces, e.g. of reverberatory type; Electric arc furnaces ; Tank furnaces heated electrically, with or without any other source of heat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0001—Heating elements or systems
    • F27D99/0006—Electric heating elements or system
    • F27D2099/0031—Plasma-torch heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the invention relates to a device for the thermal treatment of a substance, in particular a solid, comprising a treatment chamber, a device for providing a plasma, and a hot gas channel, wherein the hot gas channel is arranged between the device for providing a plasma and the treatment chamber, and has an inlet for a hot gas flow generated by the device for providing a plasma and an outlet for the hot gas flow into the treatment chamber.
  • the invention relates to a method for the thermal treatment of a substance, in particular a solid, in a treatment chamber with a hot gas stream which is generated in or with a device for providing a plasma and is introduced into the treatment chamber via a hot gas channel.
  • DE10 2020202 484 A1 describes a device for melting metals whose melting temperature is less than 1000 °C, in which a device for forming a plasma is arranged on a melting furnace, wherein the device is connected to an electrical voltage supply and to the device at least one first supply for a plasma gas with which the plasma can be formed, and the device is designed, dimensioned, arranged and/or aligned such that the formed plasma is arranged at a distance from the metal as melting material, and in this case a hot gas flow can be formed with the plasma, which is aligned in the direction of the melting material and a melting tank or crucible is arranged in the melting furnace to receive the molten metal.
  • US 2004/107796 A1 describes a plasma-assisted melting process comprising: forming a plasma in a cavity by exposing a first gas to electromagnetic radiation having a frequency of less than about 333 GHz in the presence of a plasma catalyst; heating a second gas with the plasma; adding a solid to a melting vessel; and directing the heated second gas toward the solid sufficient to at least melt the solid.
  • Induction plasma torches are known from EP 1 433 366 A1, DE 69216970 T2, EP 3 314 989 B1 and EP 2 671 430 B1.
  • the hot gas channel has at least one further outlet for the hot gas flow into the treatment chamber and/or that the hot gas channel and/or the device for providing a plasma has/have at least one further inlet for a further hot gas flow.
  • the object of the invention is achieved by the method mentioned at the outset, according to which the hot gas stream is introduced into the treatment chamber via several outlets.
  • the advantage here is that the at least one additional outlet allows the hot gas flow to be distributed across multiple sections of the treatment chamber. This makes it possible to operate the device for generating a plasma at a lower frequency, even though this involves higher power. Using a lower frequency, in turn, has the advantage that the power electronics used in the device for generating a plasma are cheaper and more efficient, which in turn can improve the efficiency of the device for thermally treating a substance. In addition, by distributing the power of the device for generating a plasma across multiple sections of the treatment chamber with just one device for generating a plasma or with a smaller number of devices for generating a plasma per treatment chamber, the installation and maintenance effort for the device for thermally treating a substance can be reduced.
  • the hot gas channel and/or the device for providing a plasma has/have at least one further inlet for a further hot gas stream.
  • the corresponding embodiment of the method provides for this purpose that the hot gas stream is mixed with another hot gas stream before being introduced into the treatment chamber.
  • This provides for a further A reduction in the temperature level of the partial hot gas flows distributed to the individual outlets of the hot gas channel can be achieved if the additional hot gas flow has a temperature which is lower than that of the hot gas flow from the device for providing a plasma.
  • the temperature of the introduced hot gas can be further adjusted, for example by supplying a correspondingly higher volume flow of “cooler” additional hot gas.
  • the additional inlet for the additional hot gas stream can be fluidly connected to a further hot gas duct, wherein the additional hot gas duct is fluidly connected to an outlet from the treatment chamber.
  • a recirculating flow can be generated, allowing the waste heat from the device for the thermal treatment of a substance to be reused in the device. This can improve the energy balance of the device for the thermal treatment of a substance.
  • the hot gas channel is designed with a cross-sectional widening.
  • one embodiment may provide for the cross-sectional expansion to be fan-shaped.
  • the outlet and the at least one further outlet can have different cross-sections. This makes it possible to take pressure losses in the hot gas channel into account or to influence them, so that at least approximately equal volumetric partial flows of hot gas enter the treatment chamber through the outlets. This, in turn, enables a more homogeneous temperature distribution in the treatment chamber (relative to the introduced hot gas). Better mixing or better conduction of partial volumes to the outlets can be achieved if, according to an embodiment variant of the invention, at least one flow guide element is arranged in the hot gas channel.
  • At least one additional flow guide element is arranged in the treatment chamber, covering the outlet and/or the at least one additional outlet.
  • the hot gas channel can be formed in a refractory lining of the treatment chamber. This allows for a more homogeneous temperature distribution during continuous operation, since the walls of the treatment chamber can be maintained at a higher temperature over a larger volume.
  • the hot gas channel is arranged partially on an outer side of the treatment chamber, whereby the structural complexity of the device for the thermal treatment of a substance can be reduced.
  • At least one additional plasma generating device can be connected to the hot gas channel. This makes it possible, at high total power levels, to nest the outlets associated with one plasma generating device with the other plasma generating device in order to minimize the partial load range.
  • the two plasma generating devices can be alternately switched on and off. This allows a power reduction to be achieved without reducing the power of the plasma generating device.
  • the hot gas channel has at least one second inlet for a second hot gas stream, and that an adjusting element for interrupting the supply of the additional hot gas into the hot gas channel or into the device for generating a plasma is arranged in each of the additional and the second hot gas streams.
  • the two additional hot gas streams can be temporarily interrupted, so that the hot gas stream generated by the plasma generation device can be directed in one direction depending on the supply of one of the two additional hot gas streams. This also makes it possible to divide the hot gas stream into several sections of the treatment chamber.
  • the device for generating a plasma is arranged at an angle other than 90 ° to the wall of the treatment chamber.
  • the hot gas flow can thus be designed to run obliquely relative to the treatment chamber, thus allowing the size of the mixing zone for mixing with the additional hot gas flow to be varied.
  • the outlet of the hot gas stream into the treatment chamber can be slit-shaped in order to reach a wider section of the treatment chamber. This also reduces heat losses.
  • a wall of the treatment chamber which has the outlet for the hot gas flow, has a material with a lower thermal conductivity on an outer side than a material on an inner side.
  • one embodiment of the invention can provide for at least one heat exchanger to be arranged in the inlet for the additional hot gas flow to the hot gas channel and/or the device.
  • the heat exchanger can also be used to reuse the heat extracted from the additional hot gas flow for another process.
  • the hot gas duct can be lined at least in sections with a refractory material.
  • Fig. 1 shows a plan view of an embodiment of a device for the thermal treatment of a material
  • Fig. 2 shows a section of a variant of a device for the thermal treatment of a material
  • Fig. 3 shows a section of a further embodiment of a device for the thermal treatment of a material
  • Fig. 4 is a diagram showing the nesting of two devices for providing a plasma
  • Fig. 5 shows a section of another embodiment of a device for the thermal treatment of a material
  • Fig. 6 shows a detail of an embodiment of a device for the thermal treatment of a material
  • Fig. 7 shows another detail of the variant embodiment of the device for the thermal treatment of a material according to Fig. 6;
  • Fig. 8 shows a detail of an embodiment of a device for the thermal treatment of a material
  • Fig. 9 shows another detail of the variant embodiment of the device for the thermal treatment of a material according to Fig. 8;
  • Fig. 10 shows a detail of an embodiment of a device for the thermal treatment of a material
  • Fig. 13 shows another detail of the variant embodiment of the device for the thermal treatment of a material according to Fig. 12
  • Fig. 14 shows another detail of the variant embodiment of the device for the thermal treatment of a material according to Fig. 12;
  • Fig. 15 shows a detail of an embodiment of a device for the thermal treatment of a material
  • the device 1 can also have more than one device 5.
  • the device 1 shown in Fig. 1 has two such devices 5, one device 5 each on one of two walls 4, which in particular form the longitudinal side walls of the device 1 when the device 5 is designed as a continuous device, such as a roller hearth furnace.
  • the embodiment of the device 1 shown in Fig. 1 has the devices 5 at one end of the device 1.
  • the devices 5 can also be arranged centrally, as indicated by the dashed lines.
  • the exact number of devices 5 depends on the length/size of the device 1 or the treatment chamber 2 and/or on the thermal energy requirement for treating the material in the device 1.
  • all devices 5 are preferably of the same design.
  • the devices 5 can also be arranged on the ceiling wall and/or the bottom wall of the housing 3 of the treatment chamber 2.
  • one hot gas channel 6 is arranged or formed for each device 5.
  • more than one device 5 it is also possible for more than one device 5 to be connected to a hot gas channel 6 or to be fluidly connected thereto.
  • the hot gas channel 6 can be formed with a mixing zone 14 in the area where the further hot gas stream is introduced, in which the hot gas channel 6 has a larger cross-section.
  • the additional hot gas supplied is preferably a gas that is also supplied to the plasma generation element 10 for generating the hot gas stream.
  • the gas can be, for example, an inert gas, such as argon or nitrogen, or a mixture thereof.
  • air for example, provided the oxidizing properties of the hot gas do not interfere with the process with the material to be treated.
  • the additional hot gas preferably has a temperature that is lower than the temperature of the hot gas generated by the plasma generation element 10.
  • the temperature of the additional hot gas is at most 80%, preferably at most 50%, for example, between 5% and 20%, of the temperature of the hot gas generated by the plasma generation element 10.
  • the hot gas can have a temperature between 7000°C and 10000°C.
  • the additional hot gas can, for example, have a temperature between 500°C and 2000°C.
  • the additional hot gas flow allows the hot gas flow generated by the plasma generation element 10 to be "cooled,” making the hot gas supplied to the treatment chamber 2 more adaptable to a wide variety of thermal treatments of materials. This makes it easier to achieve a "distribution of thermal power" at the desired temperature level among the multiple outlets 8. Furthermore, it makes it easier to operate a more powerful device 5 at a lower frequency, as already explained above.
  • the cooling of the hot gas from device 5 with the additional hot gas stream can be achieved by regulating the volume flows of hot gas and additional hot gas.
  • the additional hot gas stream has a larger volume flow than the hot gas stream in order to achieve a corresponding reduction in the temperature level, if this is necessary with regard to the thermal treatment of the material in the treatment chamber 2. is desired.
  • the specific volume flow rates used therefore primarily depend on the desired temperature level of the thermal treatment.
  • the temperature in the hot gas can be 7000 °C.
  • the temperature in the additional hot gas can be 1000 °C.
  • the desired mixing temperature e.g., 1400 °C
  • the additional hot gas can be generated in a separate device for generating a hot gas. According to a preferred embodiment, however, the additional hot gas flow originates from the process itself.
  • the treatment chamber 2 can have at least one outlet 15 (outlet opening), via which an exhaust gas from the treatment chamber 2 is fed back to the device 5 as additional hot gas, as shown schematically in Fig. 1.
  • the at least one additional inlet 7 for the additional hot gas is connected to the at least one outlet 15 from the treatment chamber 2 via an additional hot gas channel 16 flow s.
  • At least one further heat exchanger 16 can be arranged in the further hot gas channel 16, as can also be seen from Fig. 1.
  • the two heat exchangers 17 can have heat storage elements which are formed, for example, by a material based on or with aluminum oxide (Al2O3), silicon dioxide (SiCh), iron(III) oxide (Fe2O3), titanium dioxide (TiCh), potassium oxide (K2O), calcium oxide (CaO), sodium oxide (Na2O), etc.
  • Al2O3 aluminum oxide
  • SiCh silicon dioxide
  • Fe2O3 iron(III) oxide
  • TiCh titanium dioxide
  • K2O potassium oxide
  • CaO calcium oxide
  • Na2O sodium oxide
  • the heat storage elements serve to absorb heat from the exhaust gas from the treatment chamber 2, which is passed through the heat exchangers 17, and to store it for later use.
  • the two heat exchangers 17 can also be alternately supplied with the exhaust gas from the treatment chamber 2, whereby the heat storage elements of one heat exchanger 17 can be charged, while the heat storage elements of the other heat exchanger 17 can be used to generate the further hot gas flow.
  • gas conveying elements such as a fan, etc., are not shown in Fig. 1.
  • the additional hot gas is still too hot to be mixed with the hot gas generated by the plasma generation element 10, according to a variant of the device 1 it is possible to mix the additional hot gas with a cooler fresh gas before it is introduced into the device 5 or the hot gas channel 6.
  • the embodiment of the device 1 shown in Fig. 3 essentially corresponds to that of Fig. 2.
  • the hot gas channel 6 is formed with cross-sectional extensions 18 immediately upstream of the outlets 8. This also increases the cross-section of the outlets 8, so that the hot gas stream (mixed with the further hot gas stream) or the partial streams 9 are introduced into the treatment chamber 2 over a larger area. This, in turn, allows a more even distribution of the supplied thermal energy in the treatment chamber 2.
  • the cross-sectional extensions 18 are fan-shaped or trapezoidal in cross-section. However, the cross-sectional extensions 18 can also have a different shape.
  • the cross-sectional extensions 18 can be formed only immediately in front of the outlets 8, or they can be formed or arranged starting in deeper regions of the hot gas channel 6.
  • the cross-sectional extensions 18 can be formed starting in the areas where the hot gas channel 6 branches off to the outlets 8, as shown in Fig. 3.
  • the device 1 can have one or more devices 5, as already explained above.
  • the illustration in Fig. 4 is intended to clarify that it is possible to provide two devices 5 to increase performance.
  • the right device 5 is provided with a cross-hatching, while the left device 5 has only a simple hatching.
  • the two devices 5 are each provided with several additional inlets 7 for the additional hot gas. These additional inlets 7 are arranged in a nested manner, as illustrated by the smaller circles in Fig. 4. This makes it possible to minimize the partial load range.
  • the two devices 5 are switched on and off alternately, whereby a global power reduction can be achieved without reducing the power of the individual devices 5.
  • control elements 19 are provided in the supply of the additional hot gas, i.e., in the additional hot gas duct 16.
  • one control element 19 is provided for each inlet 7, with the additional hot gas duct 16 branching upstream of the control elements 19.
  • only one control element 19 can be used, which is arranged at the branching point.
  • the arrangement downstream of the branching has the advantage that, if necessary, both or more sections of the additional hot gas duct 16 downstream of the control elements 19 can be simultaneously supplied with the additional hot gas.
  • the adjusting element 19 or the adjusting elements 19 are designed in such a way that they set the subsequent section of the further hot gas channel 16 in the flow path to "open” or "closed", so that, depending on the position, the further hot gas can flow into this section or not.
  • An adjusting element 19 can, for example, be a simple flap that can be adjusted between a closed position and an open position. If only one adjusting element 19 is used, this can be designed as a three-way valve, for example. Designs are also possible in which the respective adjusting element 19, in an intermediate position between the closed and the open position, only allows a partial flow of further hot gas through.
  • the hot gas channel 6 is already formed from the beginning up to the outlet 8 with the cross-sectional extensions 18. This allows the The hot gas stream emerging from the plasma generation element 10 can be deflected with the other hot gas streams, so that the hot gas stream is directed, for example, to the left or right (indicated by arrows in Fig. 5). This allows the thermal energy to be distributed over a larger portion of the feed into the treatment chamber 2.
  • Fig. 5 only one outlet 8 is provided for introducing the hot gas into the treatment chamber 2.
  • This embodiment of the invention can be a stand-alone invention, since it enables distribution of the thermal power of the plasma generation element 10 over a larger section of the device 1 even without at least one additional outlet 8.
  • the hot gas channel 6 has a plurality of outlets 8, and that the hot gas flow is distributed alternately among the plurality of outlets 8 by means of the additional hot gas flows, in accordance with the above explanations.
  • FIG. 6 and 7 show sections of an embodiment of the device 1, which has two further embodiments.
  • Fig. 6 which shows a section through the wall 4 of the housing 3 of the treatment chamber 2, on the outside of which the device 5 is arranged, the device 5 is arranged at an angle 20 of other than 90 ° to the wall 4 of the treatment chamber 2.
  • the path of the hot gas in the hot gas channel 6 can be extended, whereby an enlargement of the mixing zone 14 for mixing the hot gas from the device 5 or the plasma generation element 10 and the additional hot gas and thus a better mixing of the hot gases can be achieved.
  • the angle 20 is measured between the longitudinal central axis 12 through the plasma generation element 10 and the wall.
  • the device 5 is arranged with the plasma outlet extending obliquely downwards, since hot gas is known to rise.
  • the oblique downward exit also has the advantage of delaying the direct impact of the hot gas stream on a wall 4.
  • the device 5 can be arranged on the wall 4 with the plasma outlet extending obliquely upwards.
  • the angle 20 can, for example, be between 10 0 and 80 °, in particular between 20 0 and 60 °.
  • Fig. 7 which shows a view of the inner surface of the wall 4, shows that the outlet 8 and the at least one further outlet 8 (four further outlets 8 are shown in Fig. 7, although this number is not intended to be limiting) can have different cross-sections.
  • the central outlet 8 can have the smallest cross-section, while the two outer outlets 8 can each have the largest cross-section.
  • the shape of the outlets can also be different.
  • the central outlet 8 can be circular, while the two outer outlets 8 can each have an oval or elongated shape.
  • the different pressure losses in the hot gas channel 6 can be taken into account, so that essentially the same volume flows of hot gas (and thus essentially the same thermal energy) emerge from the outlets 8 and can be introduced into the treatment chamber 2.
  • the shape and/or size of the at least two outlets 8 of the device 1 can also be different from those shown in Fig. 7.
  • the at least one device 5 is arranged on a rear side of the wall 4.
  • the device 5 can also be arranged on an upper, lower, or lateral end face 21 of the wall 4. In the specific illustration, it is the upper end face 21.
  • Fig. 8 also shows a longitudinal section through the wall 4. As can be seen from the illustration, the hot gas duct 6 is again formed with the cross-sectional extension 18. One or more flow guide elements 22 are arranged in this cross-sectional extension 18. In general, at least one flow guide element 22 can be arranged in the hot gas duct 6. The arrangement of the flow guide element 22 is therefore not limited to the specific embodiment shown in Fig. 8.
  • the flow guide elements 22 can, for example, be baffles or have a web-shaped design. They can be formed integrally with the wall 4 or inserted into the hot gas duct 6 as separate components. In the specific embodiment shown, the flow guide elements 22 are divided or arranged in an approximately fan-shaped manner. In addition, the flow guide elements 22 are of different lengths. In this embodiment, too, the specific design of the flow guide elements 22 depends on the specific design of the hot gas duct 6 or the outlets 8. In the embodiment shown, the multiple outlets 8 are "merged" into a single slot-shaped outlet 8, as shown in the view of the inside of the wall 4 in Fig. 9. To prevent an exclusive central flow from being created with this embodiment of the outlet 8, the flow guide elements 22 are arranged in the hot gas duct 6.
  • the flow guide elements 22 can be used to direct the hot gas flow and/or divide the hot gas flow into several partial flows 9 (see, for example, Fig. 1). This simplifies the design of the hot gas channel 6, since a physical division of the hot gas channel 6 into several channel sections, as shown, for example, in the embodiments according to Figs. 2 and 3, is not necessary.
  • Fig. 9 shows a further embodiment of the device 1 in dashed lines.
  • at least one further flow guide element 23 is arranged in the treatment chamber 2, covering the outlet 8 and/or the at least one further outlet 8 and spaced from the outlet 8 and/or the at least one further outlet 8.
  • This flow guide element 23 can, for example, be a baffle plate which prevents the hot gas flow from immediately or directly impacting the material to be thermally treated which is located in the treatment chamber 2.
  • the further flow guide element 23 can, for example, be a type of “baffle plate” which forces the hot gas flow emerging from the outlet 8 or the outlets 8 to change its flow direction.
  • FIG. 10 A similar embodiment to the embodiment of the device 1 according to Figs. 8 and 9 is shown in Figs. 10 and 11.
  • a further device 5 is arranged, so that two devices 5 feed the hot gas generated by them into the hot gas channel 6.
  • the outlet 8 is again slit-shaped (but can, as with all embodiments, also have a different shape).
  • several flow guide elements 22 are arranged in the cross-sectional expansion 18. The hot gas can be flowed through the hot gas channel with the hot gas either simultaneously with both devices 5 or alternately with the devices 5. If necessary, the embodiment described in Fig. 4 can also be used here.
  • the hot gas channel 6 or the hot gas channels 6 are formed in the wall 4.
  • the wall 4 is preferably made of a refractory material or has at least one refractory lining.
  • the hot gas channel 6 or the hot gas channels 6 are arranged partially on an outer side of the wall 4 of the housing 3 of the treatment chamber 2.
  • the outer part of the hot gas channel 6 can be arranged covering these bores or openings to the outlets 8 on the inner side of the wall (Fig. 13) (Fig. 14).
  • the device 5 or the devices 5 are not connected directly to the wall 4, but via the outer part of the hot gas channel 6.
  • Fig. 14 also shows that the multiple outlets 8 can all be designed the same.
  • FIG. 15 and 16 A different embodiment, similar to the embodiments shown in Figs. 8 to 11, is shown in Figs. 15 and 16.
  • the hot gas duct 6 has the two devices 5 arranged at the top of the wall 4, although this is only an example. There may be only one device 5 or more than two devices 5.
  • the hot gas duct 6 also has the cross-sectional expansion 18. However, this expansion does not contain any flow guide elements 22.
  • the inner side of the wall 4 facing the treatment chamber 2 is designed as a perforated plate with several outlets 8 arranged offset from one another. These outlets can again be designed with different sizes and/or shapes to account for the pressure loss in the hot gas duct 6.
  • the pattern of the arrangement of the outlets 8 is also not limited to the illustration in Fig. 16. This can depend, among other things, on the specific arrangement or design of the at least one device 5.
  • the wall 4 of the treatment chamber 2, which has the outlet 8 or outlets 8 for the hot gas flow can have a material with a lower thermal conductivity on an outer side than a material on an inner side.
  • the wall 4 can consist of, for example, lightweight refractory bricks, insulating bricks, fibers, lightweight refractory concrete, mats, panels, and vacuum-formed parts made of mineral wool, alkaline earth silicate fibers, aluminum silicate fibers, zirconium-reinforced silicate fibers, aluminum oxide fibers, and on the inside of, for example, fireclay, SiC ceramic, graphite, aluminum oxide, or high-temperature steel, or can comprise these materials.
  • the hot gas duct(s) 6 conducting the flow can be made of the same material as the walls 4. According to a further embodiment, the hot gas duct(s) 6 conducting the flow can be made of a different material than the wall material.
  • the wall(s) 4 of the treatment chamber can comprise or consist of fiber materials that have a very good insulating effect.
  • a (channel-shaped, e.g., tubular) flow guide element can be inserted into the respective wall 4.
  • This flow guide element with the thinnest possible wall, can withstand the high temperatures of the hot gas flow introduced into the treatment chamber 2.
  • this flow guide element, designed as the lining of the hot gas duct 6, can be made of (fiber-reinforced) aluminum oxide, SiC, etc.
  • the hot gas channel 6 can also have a spiral shape, at least partially or in sections, in order to achieve a better mixing of the hot gas with the other hot gas. Furthermore, it can be provided that the device 1 has more than one treatment chamber 2 and that the device(s) 5 is/are assigned to more than one treatment chamber 2.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Furnace Details (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne un dispositif (1) de traitement thermique d'une substance, comprenant une chambre de traitement (2), au moins un dispositif (5) de fourniture d'un plasma, et un canal de gaz chaud (6), le canal de gaz chaud (6) étant disposé ou formé entre le dispositif (5) de fourniture d'un plasma et la chambre de traitement (2), et une entrée (7) pour un flux de gaz chaud produit par le dispositif (5) de fourniture d'un plasma et une sortie (8) dans la chambre de traitement (2). Le canal de gaz chaud (6) présente au moins une autre sortie (8) pour le flux de gaz chaud dans la chambre de traitement (2). Le canal de gaz chaud (6) et/ou le dispositif (5) de fourniture d'un plasma peuvent présenter au moins une autre entrée (7) pour un autre flux de gaz chaud.
PCT/AT2025/060069 2024-02-21 2025-02-20 Dispositif de traitement thermique d'une substance Pending WO2025175331A1 (fr)

Applications Claiming Priority (2)

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ATA50140/2024A AT528041B1 (de) 2024-02-21 2024-02-21 Einrichtung zur thermischen Behandlung eines Stoffes
ATA50140/2024 2024-02-21

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WO2025175331A1 true WO2025175331A1 (fr) 2025-08-28

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DE69216970T2 (de) 1991-04-12 1997-07-31 Universite De Sherbrooke, Sherbrooke, Quebec Hochleistungsfähiger induktionsplasmabrenner mit einem wassergekühlten keramischen abschlussrohr
US20030080097A1 (en) * 2001-10-05 2003-05-01 Maher Boulos Multi-coil induction plasma torch for solid state power supply
US20040107796A1 (en) 2002-12-04 2004-06-10 Satyendra Kumar Plasma-assisted melting
EP1433366A1 (fr) 2001-10-05 2004-06-30 Université de Sherbrooke Chalumeau a plasma par induction multi-bobine pour alimentation de puissance integree
EP2671430B1 (fr) 2011-02-03 2018-05-16 Tekna Plasma Systems Inc. Torche à plasma inductif à hautes performances
EP3314989B1 (fr) 2015-06-29 2020-05-27 Tekna Plasma Systems Inc. Torche à plasma à induction avec une plus grande densité d'énergie du plasma et procédé de remplacement d' un composant
DE102020202484A1 (de) 2020-02-26 2021-08-26 Technische Universität Bergakademie Freiberg Vorrichtung zum Schmelzen von Metallen
WO2024031119A1 (fr) * 2022-08-09 2024-02-15 Thermal Processing Solutions GmbH Appareil de traitement thermique d'une substance
WO2024031117A2 (fr) * 2022-08-09 2024-02-15 Thermal Processing Solutions GmbH Dispositif de préparation d'un plasma

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JP2007115618A (ja) * 2005-10-24 2007-05-10 Sekisui Chem Co Ltd １ヘッド複数吹出口によるプラズマ処理装置
US8528498B2 (en) * 2007-06-29 2013-09-10 Lam Research Corporation Integrated steerability array arrangement for minimizing non-uniformity
KR101971312B1 (ko) * 2011-11-23 2019-04-22 램 리써치 코포레이션 다중 존 가스 주입 상부 전극 시스템
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69216970T2 (de) 1991-04-12 1997-07-31 Universite De Sherbrooke, Sherbrooke, Quebec Hochleistungsfähiger induktionsplasmabrenner mit einem wassergekühlten keramischen abschlussrohr
JPH05135896A (ja) * 1991-11-11 1993-06-01 Sansha Electric Mfg Co Ltd インダクシヨンプラズマトーチ
US20030080097A1 (en) * 2001-10-05 2003-05-01 Maher Boulos Multi-coil induction plasma torch for solid state power supply
EP1433366A1 (fr) 2001-10-05 2004-06-30 Université de Sherbrooke Chalumeau a plasma par induction multi-bobine pour alimentation de puissance integree
US20040107796A1 (en) 2002-12-04 2004-06-10 Satyendra Kumar Plasma-assisted melting
EP2671430B1 (fr) 2011-02-03 2018-05-16 Tekna Plasma Systems Inc. Torche à plasma inductif à hautes performances
EP3314989B1 (fr) 2015-06-29 2020-05-27 Tekna Plasma Systems Inc. Torche à plasma à induction avec une plus grande densité d'énergie du plasma et procédé de remplacement d' un composant
DE102020202484A1 (de) 2020-02-26 2021-08-26 Technische Universität Bergakademie Freiberg Vorrichtung zum Schmelzen von Metallen
WO2021170652A1 (fr) 2020-02-26 2021-09-02 Technische Universität Bergakademie Freiberg Dispositif de fusion de métaux
WO2024031119A1 (fr) * 2022-08-09 2024-02-15 Thermal Processing Solutions GmbH Appareil de traitement thermique d'une substance
WO2024031117A2 (fr) * 2022-08-09 2024-02-15 Thermal Processing Solutions GmbH Dispositif de préparation d'un plasma

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