WO2025207128A1 - Panneau isolé sous vide avec trou et joint d'étanchéité pour tube d'évacuation et procédé - Google Patents

Panneau isolé sous vide avec trou et joint d'étanchéité pour tube d'évacuation et procédé

Info

Publication number
WO2025207128A1
WO2025207128A1 PCT/US2024/030344 US2024030344W WO2025207128A1 WO 2025207128 A1 WO2025207128 A1 WO 2025207128A1 US 2024030344 W US2024030344 W US 2024030344W WO 2025207128 A1 WO2025207128 A1 WO 2025207128A1
Authority
WO
WIPO (PCT)
Prior art keywords
tube
seal
insulating panel
vacuum insulating
bore
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/US2024/030344
Other languages
English (en)
Inventor
Scott V. Thomsen
Christian Bischoff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Luxwall Inc
Original Assignee
Luxwall Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US18/617,736 external-priority patent/US20250297511A1/en
Application filed by Luxwall Inc filed Critical Luxwall Inc
Priority to DK24734515.0T priority Critical patent/DK4665936T3/da
Priority to PL24734515.0T priority patent/PL4665936T3/pl
Priority to EP24734515.0A priority patent/EP4665936B1/fr
Publication of WO2025207128A1 publication Critical patent/WO2025207128A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E06—DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
    • E06B—FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
    • E06B3/00—Window sashes, door leaves, or like elements for closing wall or like openings; Layout of fixed or moving closures, e.g. windows in wall or like openings; Features of rigidly-mounted outer frames relating to the mounting of wing frames
    • E06B3/66—Units comprising two or more parallel glass or like panes permanently secured together
    • E06B3/6612—Evacuated glazing units
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/06—Joining glass to glass by processes other than fusing
    • C03C27/10—Joining glass to glass by processes other than fusing with the aid of adhesive specially adapted for that purpose
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • E—FIXED CONSTRUCTIONS
    • E06—DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
    • E06B—FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
    • E06B3/00—Window sashes, door leaves, or like elements for closing wall or like openings; Layout of fixed or moving closures, e.g. windows in wall or like openings; Features of rigidly-mounted outer frames relating to the mounting of wing frames
    • E06B3/66—Units comprising two or more parallel glass or like panes permanently secured together
    • E06B3/677—Evacuating or filling the gap between the panes ; Equilibration of inside and outside pressure; Preventing condensation in the gap between the panes; Cleaning the gap between the panes
    • E06B3/6775—Evacuating or filling the gap during assembly

Definitions

  • Certain example embodiments are generally related to vacuum insulated devices such as vacuum insulating panels that may be used for windows or the like, and/or methods of making same.
  • Vacuum insulated panels are known in the art.
  • vacuum insulating panels are disclosed in U.S. Patent Nos. 5,124,185, 5,657,607, 5,664,395, 7,045,181, 7,115,308, 8,821,999, 10,153,389, and 11,124,450, the disclosures of which are all hereby incorporated herein by reference in their entireties.
  • a vacuum insulating panel typically includes an outboard substrate, an inboard substrate, a hermetic edge seal, a sorption getter, a pump-out port, and spacers (e.g., pillars) sandwiched between at least the two substrates.
  • the gap between the substrates may be at a pressure less than atmospheric pressure to provide insulating properties. Providing a vacuum in the space between the substrates reduces conduction and convection heat transport, and thus provides insulating properties.
  • a vacuum insulating panel provides thermal insulation resistance by reducing convective energy between the two substrates, reducing conductive energy between the two transparent substrates, and reducing radiative energy with a low-emissivity (low-E) coating provided on one of the substrates.
  • Vacuum insulating panels may be used in window applications (e.g., for commercial and/or residential windows), and/or for other applications such as commercial refrigeration and consumer appliance applications.
  • structure(s) and/or method(s) is/are provided to improve evacuation structures such as tube(s), mounting aperture(s), and/or seal(s) therefor.
  • vacuum insulating panel comprising: a first glass substrate; a second glass substrate; a plurality of spacers provided in a gap between at least the first and second glass substrates, wherein the gap is at pressure less than atmospheric pressure; an upper bore, a central bore, and a lower bore defined in the first glass substrate, the upper bore being located further from the second glass substrate than is the lower bore, and wherein the central bore is located between at least the upper and lower bores, wherein at least one diameter and/or width DBI of the upper bore is greater than at least one diameter and/or width DB2 of the central bore, and the diameter and/or width DB2 of the central bore B2 is greater than at least one diameter and/or width DB3 of the lower bore, so that as viewed cross sectionally for at least one location DBI > DB2 > DB3; an evacuation tube provided in the upper bore and the central bore, and extending at least partly into a recess in the first glass substrate, the recess
  • a vacuum insulating panel comprising: a first substrate; a second substrate; a plurality of spacers provided in a gap between at least the first and second substrates, wherein the gap is at pressure less than atmospheric pressure; a first bore, a second bore, and a third bore defined in the first substrate, the bores being of any suitable shape as viewed from above, the first bore being located further from the second substrate than is the third bore, and wherein the second bore is located between at least the first and third bores, wherein the first, second, and third bores have different sizes ; an evacuation tube provided in the first bore and the second bore, and extending at least partly into a recess in the first substrate, the recess comprising a first support surface at a base of the first bore and a second support surface at a base of the second bore; wherein the second support surface, at the base of the second bore, is configured to support at least the evacuation tube; a tube seal supported on at least the first support surface of the first substrate
  • Technical advantage(s) include one or more of: improved evacuation tube seal adhesion, improved evacuation tube seal hermiticity, reduced seal and/or glass breakage, reduced crack formation and propagation between the tube seal and the glass tube and the substrate, improved moisture resistance, improved thermal stability during asymmetric thermal conditions, improved durability, faster manufacturing, and/or reduced tilting of evacuation tube.
  • Fig. 14 is a table/graph showing an elemental analysis (non-oxide analysis) of weight % and mol % of various elements in each of a main seal material (left side in the figure), a pump-out tube seal material (center in the figure), and a primer seal material (right side in the figure), according to an example embodiment(s) (measured via WDXRF), before and after laser treatment using an 808 or 810 nm continuous wave laser to fire/sinter the main seal layer for seal formation, which various seal materials may be used in combination with any embodiment herein including those of Figs. 1-16.
  • Fig. 14 is a table/graph showing an elemental analysis (non-oxide analysis) of weight % and mol % of various elements in each of a main seal material (left side in the figure), a pump-out tube seal material (center in the figure), and a primer seal material (right side in the figure), according to an example embodiment(s) (measured via WDXRF), before and after laser treatment using an 808
  • a low-E coating 7 typically includes at least one IR reflecting layer (e.g., of or including silver, gold, or the like) sandwiched between at least first and second dielectric layer(s) of or including materials such as silicon nitride, zinc oxide, zinc stannate, and/or the like.
  • the low-E coating 7, for example, may include one, two, or three of such IR reflecting layers in various example embodiments.
  • a low-E coating 7 may have one or more of: (i) a hemispherical emissivity/emittance of no greater than about 0.20, more preferably no greater than about 0.04, more preferably no greater than about 0.028, and most preferably no greater than about 0.015, and/or (ii) a sheet resistance (R s ) of no greater than about 15 ohms/square, more preferably no greater than about 2 ohms/square, and most preferably no greater than about 0.7 ohms/square, so as to provide for solar control.
  • the low-E coating 7 may be provided on the interior surface of the glass substrate to be closest to the building exterior, which is considered surface two (e.g., see Figs. 2-3), whereas in other example embodiments the low-E coating 7 may be provided on the interior surface of the glass substrate to be closest to the building interior, which is considered surface three (e.g., see Figs. 4-5).
  • Fig. 1 illustrates an embodiment where the edge seal 3 is provided in the vacuum insulated glass panel 100 at the absolute edge, the seal layers 30, 31 and 32 all have substantially the same width (e.g., between about 6 mm and 12 mm), and a thickness of the main seal layer 30 is less than a thickness of primer layer 31 but greater than a thickness of the other primer layer 32.
  • Fig. 2 illustrates an embodiment where the edge seal 3 is spaced inwardly from the absolute edge of the panel 100, the width of the main seal layer 30 is less than a width(s) of the primer layers 31 and 32, and a thickness of the main seal layer 30 is greater than a thickness of primer layer 31 but less than a thickness of the other primer layer 32.
  • Fig. 1 illustrates an embodiment where the edge seal 3 is provided in the vacuum insulated glass panel 100 at the absolute edge, the seal layers 30, 31 and 32 all have substantially the same width (e.g., between about 6 mm and 12 mm), and a thickness of the main seal layer 30 is less than a thickness of
  • FIG. 3 illustrates an embodiment where the edge seal 3 is spaced inwardly from the absolute edge of the panel 100, the seal layers 30, 31 and 32 all have substantially the same width (e.g., between about 6 mm and 12 mm), and the seal layers 30, 31 and 32 all have substantially the same thickness.
  • Fig. 4 illustrates an embodiment where the edge seal 3 is spaced inwardly from the absolute edge of the panel 100, the width of the main seal layer 30 is less than a width(s) of the primer layers 31 and 32, a thickness of the main seal layer 30 is greater than a thickness of primer layer 31 but less than a thickness of primer layer 32, and the low-E coating 7 is provided on substrate 1 (as opposed to the low-E coating being on substrate 2 in Figs. 1-3).
  • Fig. 5 illustrates an embodiment similar to Fig. 4, except that primer layer 31 is omitted in the Fig. 5 embodiment.
  • Fig. 6 provides an example where a laser beam 40 from laser 41 is being used to heat the edge seal structure for sintering/firing the main seal layer 30 to form the hermetic edge seal 3
  • Fig. 7 is a top view illustrating the laser beam 40 proceeding around the entire periphery of the panel along path 42 over the edge seal layers 30-32 to fire/sinter the main edge seal layer 30 in forming the hermetic edge seal 3.
  • the laser beam 40 performs localized heating of the edge seal area, so as to not unduly heat certain other areas of the panel thereby reducing chances of significant de-tempering of the glass substrates.
  • Each of these embodiments may be used in combination with any other embodiment described herein, in whole or in part.
  • seal layers 30-32, of the edge seal 3 may be of or include ceramic frit in certain example embodiments, and/or may be lead-free or substantially lead-free (e.g., no more than about 15 ppm Pb, more preferably no more than about 5 ppm Pb, even more preferably no more than about 2 ppm Pb) in certain example embodiments.
  • each primer layer 31 and 32 may be of a material having a coefficient of thermal expansion (CTE) that is between that of the main seal layer 30 and the closest glass substrate 1, 2.
  • a primer(s) 31 and/or 32 may be omitted in certain example embodiments.
  • primer layers 31 and 32 may be of or include different material(s) compared to the main seal layer 30.
  • primer layer 31 may also be provided in the evacuation tube sealing structure, so as to be located between glass substrate 1 and evacuation tube seal material 13.
  • the edge seal 3, in certain example embodiments, may be located at an edge- deleted area (where the solar control coating 7 has been removed) of the substrate as shown in Figs. 1-6, so as to reduce chances of corrosion. Thus, the edge seal 3 may be positioned so that it does not overlap the low-E coating 7 in certain example embodiments.
  • the edge seal 3 may be located at the absolute edge of the panel 100 (e.g., Fig. 1), or may be spaced inwardly from the absolute edge of the panel 100 as shown in Figs. 2-7 and 9, in different example embodiments.
  • An outer edge of the hermetic edge seal 3 may be located within about 50 mm, more preferably within about 25 mm, and more preferably within about 15 mm, of an outer edge of at least one of the substrates 1 and/or 2.
  • an “edge” seal does not necessarily mean that the edge seal 3 is located at the absolute edge or absolute periphery of a substrate(s) or overall panel 100.
  • the main seal layer 30 of the edge seal 3 may have an average thickness of from about 30-180 pm, more preferably from about 30-120 pm, more preferably from about 40-100 pm, and most preferably from about 50-85 pm, with an example main seal layer 30 average thickness being from about 60-80 pm.
  • the primer layer 31 of the edge seal 3 may have an average thickness of from about 10-100 pm, more preferably from about 10- 80 pm, more preferably from about 20-70 pm, and most preferably from about 20-55 pm, with an example primer layer 31 average thickness being about 45 pm.
  • the primer layer 32 (opposite the side from which the laser beam 40 is directed) of the edge seal 3 may have an average thickness of from about 80-240 pm, more preferably from about 100-220 pm, more preferably from about 120-200 pm, and most preferably from about 120-170 pm, with an example primer layer 32 average thickness being about 145 pm.
  • the respective thicknesses of each layer 30, 31, and 32 are substantially the same (the same plus/minus 10%, more preferably plus/minus 5%) along the length of the edge seal 3 around the periphery of the entire panel 100.
  • a vacuum insulating panel 100 having an improved multi-layer perimeter seal structure 3 provides for improved manufacturing of tempered units using localized laser firing and/or methods of making the same. Further details of the edge seal structure, dimensions of the edge seal and other components, characteristics of the edge seal and other components, materials, and the manufacture of the overall panel may be provided in one or more of U.S. Patent Application Serial Nos. 18/376,914, 18/376,473, 18/376,479, 18/376,483, 18/379,275, and 18/510,777, the disclosures of which are all hereby incorporated herein by reference in their entireties.
  • laser 41 and/or laser 51 may be selected to emit a laser beam 40 having a wavelength (X) of from about 380 nm to 1064 nm, more preferably from about 550 nm to 1064 nm, more preferably from about 780-1064 nm.
  • Laser 41 and/or laser 51 may be a near IR laser in certain example embodiments.
  • Laser 41 and/or 51 may be a continuous wave laser, a pulsed laser, and/or other suitable laser in various example embodiments.
  • the laser 41 and/or laser 51 may be a scanning laser system comprising diode laser, solid state laser (e.g., ND:YAG), gas laser (e.g., CO2 of 9.3-10.6 pm), and/or other laser devices/sources.
  • laser 41 and/or laser 51 may emit a laser beam 40 at or having a wavelength of about 800 nm, 808 nm, 810 nm, 940 nm, or 1090 nm (e.g., YVO4 laser).
  • more than one laser may be utilized to increase the sealing speed for seal material 30, lower effective laser power levels and/or reduce laser spot size.
  • Two lasers operating in a serial, overlapping manner can increase the effective irradiation spot time to achieve for example 0.5 seconds while achieving for example a 20 mm per second linear laser rate, as an example.
  • Two 9-mm laser diameter beams 40 for example, can operate in a serial fashion for a 0.5 second to 1.0 second irradiation time. Figs.
  • FIG. 11-12 and 14 illustrate an example material(s) that may be used for the main seal layer 30 in various example embodiments, including for example in any of the embodiments of Figs. 1-7.
  • suitable materials vanadium oxide based ceramic materials with little or no Te oxide, solder glass, or the like
  • Fig. 11 is a table/graph showing weight % and mol % of various compounds/elements in an example main seal 30 material, prior to sintering of layer 30, according to an example embodiment (measured via non-carbon detecting XRF); Fig.
  • FIG. 12 is a table/graph showing weight % and mol % of various compounds/elements in an example main seal 30 material according to an example embodiment (measured via carbon detecting XRF), before and after laser treatment/sintering of the main seal layer 30 for edge seal formation; and the left side of Fig. 14 sets forth a table/graph showing an elemental analysis (non-oxide analysis) of weight % and mol % of various elements in an example main seal 30 material, before and after laser treatment for edge seal formation.
  • Fig. 14 sets forth a table/graph showing an elemental analysis (non-oxide analysis) of weight % and mol % of various elements in an example main seal 30 material, before and after laser treatment for edge seal formation.
  • X-ray Fluorescence is a non-destructive technique that can identify and quantify the elemental constituents of a sample using the secondary fluorescence signal produced by irradiation with high energy x-rays
  • WDXRF wavelength dispersive spectrometer
  • This ceramic tellurium (Te) oxide based main seal material shown in Figs. 11-12 and 14, was used for main seal layer 30 in examples tested for obtaining data herein for various figures/tables unless otherwise specified.
  • This ceramic tellurium (Te) oxide based main seal material shown in Figs. 11-12 and 14, for example may be considered to have a melting point (Tm) of 390 or 395 degrees C, a softening point (Ts) of 320 degrees C, and a glass transition point (Tg) of 290 degrees C.
  • Tm melting point
  • Ts softening point
  • Tg glass transition point
  • This material shown in Figs. 11-12 and 14 and described below, used for the main seal layer 30, may also be used for evacuation tube seal material 13, with or without an underlying primer.
  • Table 1 A sets forth example ranges for various elements and/or compounds for this example tellurium (Te) oxide based main seal 30 material according to various example embodiments, for both mol % and weight %, prior to firing/sintering thereof and thus prior to hermetic edge seal 3 formation.
  • the main seal layer 30 may comprise mol% and/or wt.% of the following compounds in one or more of the following orders of magnitude: tellurium oxide > vanadium oxide > aluminum oxide, tellurium oxide > vanadium oxide > silicon oxide, tellurium oxide > vanadium oxide > aluminum oxide > magnesium oxide, and/or tellurium oxide > vanadium oxide > silicon oxide > magnesium oxide, before and/or after firing/sintering of the layer 30. It will be appreciated that other materials may be used together, or in place of, those shown below, and that the example percentages may be different in alternate embodiments.
  • Tellurium Vanadate based and/or inclusive glasses are ideally suited for seal functionality when utilizing laser irradiation for the firing/sintering of the main seal layer 30 and/or seal layer 13.
  • the base main seal material may comprise tellurium oxide (e.g., a combination of TeO 3 , TeCh+t, and TeCU) and vanadium oxide (e.g., a combination of V2O5, VO2, and V2O3) per the weight % and/or mol % described in Table 1 A.
  • the Te oxide e.g., one or more of TeCh, TeOs, TeCh+i, and/or other stoichiometry(ies) involving Te and O
  • V oxide e.g., one or more of VO2, V2O5, V2O3, and/or other stoichiometry(ies) involving V and O
  • the Te oxide e.g., one or more of TeCh, TeOs, TeCh+i, and/or other stoichiometry(ies) involving Te and O
  • V oxide e.g., one or more of VO2, V2O5, V2O3, and/or other stoichiometry(ies) involving V and O
  • Table IB tellurium oxide stoichiometries prior to firing/sintering
  • Table 1C tellurium oxide stoichiometries after firing/sintering
  • Table ID vanadium oxide stoichiometries prior to firing/sintering
  • the laser firing/sintering of the main seal layer 30 may cause much of the TeC to transform/convert into TeOa and TeCh+i, which is advantageous because it increases the material’s absorption in the near infrared (e.g., 808 or 810 nm for example, which may be used for the laser during sintering/firing) which provides for increased heating efficiency and reducing the chances of significantly detempering the glass substrate(s) due to improved heating efficiency during the firing/sintering.
  • the near infrared e.g., 808 or 810 nm for example, which may be used for the laser during sintering/firing
  • the filler may, for example, comprise one or more of zirconyl phosphates, dizirconium diorthophosphates, zirconium tungstates, zirconium vanadates, aluminum phosphate, cordierite, eucryptite, ekanite, alkaline earth zirconium phosphates such as (Mg, Ca, Ba, Sr) Zr4 P5O 24, either alone or in combination. Filler in a range of 20-25 wt. % may be used in layer 30 in certain example embodiments.
  • Main seal layer 30, and/or the primer layer(s) 31 and/or 32 is/are lead-free and/or substantially lead-free in certain example embodiments.
  • Bismuth based primers with little to no boron in terms of mol%, have been found to block large amounts of energy from the laser 41 so that it does not reach main seal layer 30 during firing/sintering of that layer. It has been found that by reducing Bi, and increasing B, in terms of mol%, the primer layer(s) 31 and/or 32 can be more transmissive of certain laser energy (e.g., from a near-IR laser, such as 808 or 810 nm) thereby allowing the main seal layer 30 to be more efficiently and quickly heated and sintered/fired without significantly de-tempering the glass substrate(s) 1 and/or 2.
  • primer layer(s) 31 and/or 32 may have a ratio B/Bi, of boron (B) to bismuth (Bi), of from about 1.1 to 10.0, more preferably from about 2.0 to 6.0, and most preferably from about 2.5 to 4.5 (with an example being about 3.7), after firing/sintering of the main seal layer 30 and/or primer(s).
  • primer layer(s) 31 and/or 32 may comprise at least two times as much B as Bi, more preferably at least about three times as much B as Bi, and/or may comprise at least about two time as much B oxide as Bi oxide, more preferably at least about three, four, or five times as much B oxide as Bi oxide.
  • a primer e.g., 31
  • Such a primer is thus able to allow sufficient near-IR energy from the laser (e.g., at 808 or 810 nm) to pass so that the main seal layer 30 can be efficiently and quickly fired/sintered, without significantly de-tempering glass and/or inducing significant transient thermal stress.
  • the preform 13 may be formed substantially in a shape of a donut or ringshaped, as viewed from above and/or below, prior to being inserted into the countersunk recess 15 (e.g., double countersunk drilled hole shown in Figs. 9-10) surrounding the pump-out tube 12, as shown in Figs. 1-7 and 9-10 for example.
  • the donut shape is advantageous in that it increases irradiation surface area at a given geometric configuration, allowing for the preform to be quickly sintered/fired without exposing the adjacent glass to significant de-tempering. As shown in Fig.
  • a sidewall 13a of the preform 13 may be angled to expose more surface area of the preform to impingement by a substantially donut-shaped (or substantially ring-shaped) laser beam 13b from above, generated by laser 51 (e.g., see Figs. 6, 8b, 8d).
  • Sidewall(s) 13a of the preform may or may not be angled relative to the vertical, in different example embodiments.
  • Fig. 8b shows an example embodiment where the sidewall 13a of the preform is so angled
  • Fig. 8c shows another example embodiment where the sidewall 13a of the preform is substantially vertically oriented (vertical +/- 10 degrees, more preferably +/- 5 degrees).
  • the acute angle which the sidewall 13a may form with the bottom surface 13c of the preform may be from about 10-85 degrees, more preferably from about 50-85 degrees, more preferably from about 50-70 degrees, with an example being 52.5 degrees as shown in Fig. 8b for example, to expose more seal material surface area to the laser beam 13b thereby allowing for the preform to be more quickly sintered/fired without exposing the surrounding glass to significant de-tempering. This allows heat from the laser to be more efficiently transferred to the interfaces between the tube and the preform, and between the preform and the substrate.
  • Preform 13 and evacuation tube 12 are concentric, or substantially concentric, in certain example embodiments.
  • Example IDs for the hollow tube 12 are about 2.2 mm and 3.2 mm, and example ODs for the tube 12 are about 3 mm, about 4 mm, and about 5 mm (e.g., a hollow evacuation tube 12 with about an OD of about 3 mm and an ID of about 2.2 mm; or a hollow tube 12 with an OD of about 4 mm and an ID of about 3.2 mm).
  • Example thickness of the wall of glass/ceramic hollow tube 12 may be from about 0.2 to 0.8 mm, more preferably from about 0.3 to 0.6, more preferably from about 0.3 to 0.5, with an example being about 0.4 mm, in various example embodiments. While glass/ceramic tubes 12 are preferred in certain example embodiments, using hollow evacuation tubes 12 of other materials (e.g., metal(s), metal oxide(s), etc.) is also possible in certain example embodiments.
  • Evacuation tube seal preform 13 may be of or including the same material discussed herein used for main seal layer 30 in certain example embodiments, although it may be made of different materials (e.g., see example materials for preform seal 13 in Figs. 11, 12 and 14, and in Tables 1A-1E and Table 2 above).
  • the pumpout tube seal preform 13 may be of or include the material shown in Fig. 15 in other example embodiments, which is also based on tellurium oxide and vanadium oxide.
  • the main seal layer 30 may utilize at least polypropylene (PP) carbonate as a binder, whereas the perform 13 may instead utilize material such as ethyl cellulose as a binder due to its cold pressing and preform nature.
  • PP polypropylene
  • Perform 13 may be inserted into recess 15, with or without a previously inserted primer layer similar to 31 and/or 32, although in certain example embodiments no primer is used so that the preform 13 may directly contact the glass at the bottom of the recess 15.
  • the preform and resulting seal 13 may be made of other suitable materials in various example embodiments.
  • the material for the pump-out tube seal may be cold pressed to form the substantially disc-shaped preform 13, with the cold pressed preform 13 then being inserted into the recess 15 together with, before, or after, the evacuation/pump-out tube 12 (e.g., see Figs. 7-10).
  • Preform 13 may be partially melted to the adjacent glass substrate 1 in the countersunk recess/hole 15 during a main binder burnout and/or preglaze step. Thereafter, the main seal layer 13 may be fired/sintered. Before or after sintering/firing of main seal layer 30, preform 13 may be sintered/fired via laser sintering or other type(s) of heating. In certain example embodiments, the laser sintering/firing of the preform 13 may be done in multiple steps, such as a first step (e.g., 3.47A/power 26W) from about 20-40 seconds, and a second step (e.g., 3.65A/power 28W) for about 3- 10 seconds.
  • a first step e.g., 3.47A/power 26W
  • a second step e.g., 3.65A/power 28W
  • the preform 13 may be laser fired/sintered using an example lasing time (e.g., 53W at 5.98A) via a dwell time of from about 20-80 seconds, for an example preform thickness(es) of from about 1 to 2.5 mm, and/or shear strength test results were well above a threshold of 1.0 MPa for samples with no stressor and/or water immersion stressor.
  • an example lasing time e.g., 53W at 5.98A
  • a dwell time of from about 20-80 seconds
  • an example preform thickness(es) of from about 1 to 2.5 mm
  • shear strength test results were well above a threshold of 1.0 MPa for samples with no stressor and/or water immersion stressor.
  • Fig. 9 is a side cross-sectional view, e.g., taken along section line A-A in Fig. 7, of an evacuation tube structure according to an example embodiment, prior to laser sintering/sealing of the tube seal preform 13, which may be used in combination with any embodiment herein including those of Figs. 1-16.
  • Fig. 9 is a side cross-sectional view, e.g., taken along section line A-A in Fig. 7, of an evacuation tube structure according to an example embodiment, prior to laser sintering/sealing of the tube seal preform 13, which may be used in combination with any embodiment herein including those of Figs. 1-16.
  • TWO or all three of upper bore Bl, central bore B2, and/or lower bore B3 may be concentric, or substantially concentric, in certain example embodiments, as shown in the figures, with the central apertures of the respective bores Bl, B2, and B3 aligning or substantially aligning with each other.
  • the sidewalls of bores Bl, B2, and B3 may be substantially vertical (vertical plus/minus ten degrees, more preferably plus/minus five degrees) in certain example embodiments, or alternatively may be substantially angled in certain instances.
  • Tube shelf (TS) 52 which is a tube support surface/shelf and/or a support step, is formed the bottom of central bore B2, and is at the top of bottom bore B3 and is oriented so as to be substantially parallel to the major surfaces of substrate 1, as best shown in Figs. 9-10.
  • Tube supporting shelf 52 of bore B2 in certain example embodiments, has a width (WTS) of at least about 0.5 mm, more preferably at least about 0.6 mm, more preferably at least about 0.7 mm, and most preferably at least about 0.75 mm (e.g., 0.85 mm), which is technically advantageous with respect to supporting tube 12, allowing a gap G1 to be provided between the tube 12 and the sidewall of central bore B2, and being sufficiently sized to reduce tilting of tube 12.
  • support surface 52 is configured to support at least the evacuation tube 12, the tube may or may not be in contact with the support surface/shelf 52 depending on how far into recess 15 the tube 12 has been inserted.
  • shelf 53 of bore Bl which is a support surface/shelf for preform 13, is formed the bottom of upper bore Bl, and is at the top of central bore B2 and is oriented so as to support preform 13 and be substantially parallel to the major surfaces of substrate 1 and to shelf 52, as best shown in Figs. 9-10.
  • the upper, central, and lower bores Bl, B2 and B3 may be formed in substrate 1 in any suitable manner, such as via one or more of mechanical drilling (e.g., using diamond-tipped drill bits), waterjet, laser drilling, laser processing, punching, or the like.
  • the upper, central, and lower bores Bl, B2 and B3, respectively may be of any suitable shape, such as circular, oval, rectangular, or the like, in various example embodiments.
  • the diameter or width DBI of upper bore Bl is greater than the diameter or width DB2 of central bore B2, and the diameter or width DB2 of central bore B2 is greater than the diameter or width DBS of lower bore B3 (DBI > DB2 > DBS).
  • an average diameter or width DBI of upper bore Bl is at least about 1 mm greater (more preferably at least about 2 mm greater, and most preferably at least about 3 mm greater) than the diameter or width DB2 of central bore B2.
  • an average diameter or width DB2 of central bore B2 is at least about 0.5 mm greater (more preferably at least about 0.70 mm greater, and most preferably at least about 0.80 mm greater) than the diameter or width DB3 of lower bore B3.
  • DBI may be substantially the same size throughout upper bore Bl, or may vary in size at different locations in the bore Bl, depending upon the shape and formation of bore Bl.
  • DB2 may be substantially the same size throughout bore B2, or may vary in size at different locations in the bore B2, depending upon the shape and formation of bore B2; and DB3 may be substantially the same size throughout bore B3, or may vary in size at different locations in the bore B3, depending upon the shape and formation of bore B3.
  • a ratio DBI/DB2 of the diameter or width DBI of upper bore Bl/ the diameter or width DB2 of central bore B2 may be from about 1.2 to 5.0, more preferably from about 1.5 to 4.0, more preferably from about 1.7 to 2.6, more preferably from about 1.9 to 2.3, with an example being about 2.2 (e.g., if DBI is about 6.7 mm, and DB2 is about 3.1 mm).
  • ratio DBI/DB2 of the diameter or width DBI of upper bore Bl/the diameter or width DB2 of central bore B2 may be at least about 1.8, more preferably at least about 2.0, and more preferably at least about 2.1.
  • Such ratios, and a large size (DBI) of the upper bore Bl are technically advantageous at least because, in certain example embodiments, this allows the preform 13 to be supported in the bore in a manner where the preform 13, before and after laser sintering/firing, does not contact the sidewall 61 (e.g., vertical or angled sidewall) of the bore B 1 which has surprisingly and unexpectedly been found to improve durability and reduce tube 12 breakage and seal failures.
  • a ratio DB2/DB3 of the diameter or width DB2 of central bore B2/ the diameter or width DB3 of lower bore B3, may be from about 1.1 to 3.0, more preferably from about 1.2 to 2.3, more preferably from about 1.3 to 2.0, more preferably from about 1.3 to 1.6, with an example being about 1.4 (e.g., if DB2 is about 3.1 mm, and DB3 is about 2.2 mm).
  • (DB2 - ODT)/HB2 is 0.44 when DB2 is 3.1 mm, ODT is 3.0 mm, and HB2 is 2.25 mm.
  • tube tilting can be reduced by configuring the bores and tube so that a ratio HB2/T L is at least 0.30, more preferably at least 0.35, more preferably at least 0.37, where HB2 is the height of central bore B2 and TL is the length of tube 12 (e.g., see Figs. 9-10).
  • the higher this ratio HB2/TL the less tube tilting.
  • HB2/TL would be 0.375 when HB2 is 2.25 mm and TL is 6.0 mm.
  • Fig. 9 illustrates, according to an example embodiment, the evacuation tube 12 and seal preform 13 in the recess 15, prior to laser sintering/sealing of the tube seal preform 13.
  • Tube 12 is supported by both tube shelf/step 52 at the bottom of the tube, and by perform 13 around the periphery of the tube 12.
  • Preform 13 is resting on and supported by (e.g., directly on, or indirectly on) shelf/step 53 which is the base of the upper bore Bl.
  • Shelves 52 and 53 are substantially parallel to each other in certain example embodiments, and may be concentric as viewed from above.
  • Upper bore Bl is sufficiently sized so that the preform 13 does not contact the sidewall 61 of the upper bore Bl.
  • Gap G2 between the peripheral edge 13a of the preform 13 and the side wall 61 of the upper bore Bl may be at least about 0.10 mm, more preferably at least about 0.15 mm, more preferably at least about 0.20 mm, in order to reduce chances of seal and/or tube failures/breakage.
  • Preform 13 may be partially melted to the adjacent glass substrate 1 on shelf 53 in bore Bl and/or to the tube 12 during a main binder burnout and/or preglaze heating step, prior to laser firing/sintering.
  • the preform and laser processing are designed so that the laser beam 13b from laser 51 impinging upon the preform 13 (e.g., see the laser 51 and donut-shaped/ring- shaped laser beam 13b in Figs. 6 and 8d) causes the seal material of the preform when laser heated to wick upwardly along the outer periphery of tube 12 and form a desirable shape and hermetic seal 13, such as via a capillary effect.
  • a spot laser may be manipulated/moved to circle the tube 12 to sinter the tube seal material and form the tube seal 13.
  • Figs. lOe-lOf illustrate an example of the preform 13 (black ion color in Figs. lOe-lOf) prior to laser sintering/firing (Fig. lOe) compared to after laser sintering/firing thereof (Fig. 1 Of), with the height difference of the black seal material between Figs. lOe and lOf being the hike/wick amount HI. It can be seen in Figs.
  • the preform 13 may be substantially disc-shaped with substantially parallel upper and lower surfaces prior to laser sintering/firing (e.g., see Figs. 9 and lOe), and substantially bubble-shaped after the laser sintering/firing with an outer surface that is at least partially convex and is upward sloping toward an upper portion of the tube 12 (e.g., see Figs. 10a- lOd and lOf-lOj).
  • the hike/wick amount HI in certain example embodiments, may be from about 0.35 to 2.20 mm, more preferably from about 0.4 to 2.0 mm, more preferably from about 0.45 to 1.6 mm, more preferably from about 0.75 to 1.25 mm, with example hike amounts being about 0.45, 0.58, 0.66, 0.81, 1.34, and 1.44 mm at various locations around the periphery of the tube.
  • post evacuation the tube height above the glass substrate 1 may be from about 1.5 to 5.0 mm, more preferably from about 2.0 to 4.0 mm, and most preferably from about 2.2 to 2.8 mm.
  • the laser sintering/firing of the seal material 13 causes the seal material to bond more completely to the glass substrate 1 and the glass tube 12, to form the hermetic seal 13 around the periphery of the evacuation tube 12 and with the recess 15 in the glass substrate 1. It can be seen in Figs. lOa-lOd, for example, that the evacuation tube 12 has a first end and a second end opposite the first end, and that the tube seal 13 is spaced apart from and does not contact each of the first end and the second end of the evacuation tube.
  • the top of the seal material 13 does not reach the top of evacuation tube 12, and may be spaced away from the top of the tube 12 by at least about 0.3 mm, more preferably by at least about 0.5 mm, and possibly by at least about 1.0 mm (e.g., see Figs. 10a- lOd and lOf-lOj).
  • the bottom of the seal material 13 does not reach the bottom end of evacuation tube 12, and may be spaced away from the bottom end of the tube 12 by at least about 0.5 mm, more preferably by at least about 1.0 mm, and possibly by at least about 1.5 mm (e.g., see Figs. 10a- 10b). It has been found that tube and/or seal failures can be reduced by spacing the tube seal 13 away from both ends of the tube 12.
  • Tube seal 13 may be tellurium oxide based, vanadium oxide based, or may be of any other suitable material.
  • Example materials for tube seal 13 are provided herein, both in tables above and in Figs. 11-12 and 14-15.
  • the preform 13 is substantially disc-shaped, with a hole through it, prior to laser sintering/firing as shown in Figs. 8a-8c, 9, lOe, after the laser sintering/firing the seal is/becomes substantially bubble-shaped as shown in Figs. lOa-lOd and lOf-lOj.
  • the laser heating of the seal material 13, in certain example embodiments, may cause some bubble-like features (e.g., voids) to form in the seal material 13, which may have a bearing on the hiking/wicking distance up the tube.
  • the bubble-shaped nature of the seal 13 following laser firing/sintering of the seal material e.g., see Figs.
  • Figs. lOa-lOd and lOf-lOj illustrate that the seal material 13, after the laser sintering/firing which caused the material 13 to wick/hike up the tube by an amount HI, comprises an outer peripheral sidewall/surface 65 that is at least partially convex and at least part of which is upward sloping toward an upper portion of the tube 12 (e.g., see Figs. 10a- lOd and lOf-lOj).
  • Example hike/wick amounts HI in certain example embodiments, may be about 0.45, 0.58, 0.66, 0.81, 1.34, and 1.44 mm at various locations around the periphery of the tube.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Joining Of Glass To Other Materials (AREA)

Abstract

Un panneau isolant sous vide peut comprendre : un premier substrat ; un second substrat ; une pluralité d'éléments d'espacement disposée dans un espace entre au moins les premier et second substrats, l'espace étant à une pression inférieure à la pression atmosphérique ; un tube d'évacuation s'étendant au moins partiellement dans une ouverture dans l'un des substrats ; et un joint d'étanchéité de tube d'évacuation entourant au moins partiellement le tube. Un faisceau laser (par exemple, un faisceau laser à point ou un faisceau laser en forme d'anneau) peut être utilisé pour chauffer le matériau de joint d'étanchéité de tube pour former un joint d'étanchéité hermétique autour du tube. Un espace (par exemple, G1) peut être disposé entre le joint d'étanchéité de tube et une surface de support de tube, et une quantité significative de volume de l'espace peut être exempte et/ou non remplie de matériau de joint d'étanchéité du joint d'étanchéité de tube, ce qui s'est avéré avantageux pour réduire les défaillances de joint d'étanchéité et les défaillances de rupture de tube.
PCT/US2024/030344 2024-03-25 2024-05-21 Panneau isolé sous vide avec trou et joint d'étanchéité pour tube d'évacuation et procédé Pending WO2025207128A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DK24734515.0T DK4665936T3 (da) 2024-03-25 2024-05-21 Vakuumisoleret panel med hul og tætning til evakueringsrør og fremgangsmåde
PL24734515.0T PL4665936T3 (pl) 2024-03-25 2024-05-21 Próżniowy panel izolacyjny z otworem i uszczelnieniem dla rury ewakuacyjnej oraz sposób
EP24734515.0A EP4665936B1 (fr) 2024-03-25 2024-05-21 Panneau isolé sous vide avec trou et joint d'étanchéité pour tube d'évacuation et procédé

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US202463569240P 2024-03-25 2024-03-25
US63/569,240 2024-03-25
US18/617,736 2024-03-27
US18/617,736 US20250297511A1 (en) 2024-03-25 2024-03-27 Vacuum insulated panel with hole and seal for evacuation tube and method

Publications (1)

Publication Number Publication Date
WO2025207128A1 true WO2025207128A1 (fr) 2025-10-02

Family

ID=91586282

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2024/030344 Pending WO2025207128A1 (fr) 2024-03-25 2024-05-21 Panneau isolé sous vide avec trou et joint d'étanchéité pour tube d'évacuation et procédé

Country Status (1)

Country Link
WO (1) WO2025207128A1 (fr)

Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124185A (en) 1989-10-03 1992-06-23 Ppg Industries, Inc. Vacuum insulating unit
US5657607A (en) 1989-08-23 1997-08-19 University Of Sydney Thermally insulating glass panel and method of construction
US5664395A (en) 1992-01-31 1997-09-09 The University Of Sydney Thermally insulating glass panels
US5935702A (en) 1994-12-23 1999-08-10 Saint-Gobain Vitrage Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
US6042934A (en) 1993-08-12 2000-03-28 Saint-Gobain Vitrage Transparent substrate provided with a stack of thin layers
US6322881B1 (en) 1996-12-12 2001-11-27 Saint-Gobain Vitrage Glazing assembly comprising a substrate provided with a stack of thin layers for solar protection and/or thermal insulation
US7045181B2 (en) 2001-12-25 2006-05-16 Nippon Sheet Glass Co., Ltd. Double glazing
US7115308B2 (en) 2001-10-25 2006-10-03 Nippon Sheet Glass Co., Ltd. Glass panel and method of manufacturing the glass panel
US7314668B2 (en) 2000-07-10 2008-01-01 Guardian Industries Corp. Low-E coated articles having zirconium inclusive dielectric layer
US7342716B2 (en) 2005-10-11 2008-03-11 Cardinal Cg Company Multiple cavity low-emissivity coatings
CN201068427Y (zh) * 2006-12-20 2008-06-04 董镛 以微珠为支撑物抽气口多层密封的真空玻璃
US7632571B2 (en) 2005-03-31 2009-12-15 Cardinal Cg Company Haze-resistant low-emissivity coatings
US7858193B2 (en) 2005-08-23 2010-12-28 Saint Gobain Glass France Low emissivity (low-E) thin coating stacks with intermediate antidiffusion layers
US7910229B2 (en) 2002-05-03 2011-03-22 Ppg Industries Ohio, Inc. Substrate having thermal management coating for an insulating glass unit
KR20110077893A (ko) * 2009-12-30 2011-07-07 (주)엘지하우시스 유리 패널의 배기구 형성 방법 및 이를 이용하여 제조한 유리 패널 제품
US8821999B2 (en) 2008-11-05 2014-09-02 Corning Incorporated Vacuum-insulated glass windows with glass-bump spacers
US8951617B2 (en) 2008-12-22 2015-02-10 Saint-Gobain Glass France Substrate provided with a multilayer coating having thermal properties and absorbent layers
US9215760B2 (en) 2012-01-10 2015-12-15 Saint-Gobain Glass France Transparent pane with electrically conductive coating
US10153389B2 (en) 2014-10-01 2018-12-11 Ferro Gmbh Tellurate joining glass having processing temperatures less than or equal to 420° C
WO2020141007A1 (fr) * 2019-01-02 2020-07-09 Vkr Holding A/S Joint dans une unité de vitrage isolé sous vide
US10759693B2 (en) 2018-07-16 2020-09-01 Guardian Glass, LLC Low-E matchable coated articles having absorber film and corresponding methods
US11124450B2 (en) 2017-11-10 2021-09-21 Nippon Sheet Glass Company, Limited Glass panel and glass window

Patent Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5657607A (en) 1989-08-23 1997-08-19 University Of Sydney Thermally insulating glass panel and method of construction
US5124185A (en) 1989-10-03 1992-06-23 Ppg Industries, Inc. Vacuum insulating unit
US5664395A (en) 1992-01-31 1997-09-09 The University Of Sydney Thermally insulating glass panels
US6042934A (en) 1993-08-12 2000-03-28 Saint-Gobain Vitrage Transparent substrate provided with a stack of thin layers
US5935702A (en) 1994-12-23 1999-08-10 Saint-Gobain Vitrage Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
US6322881B1 (en) 1996-12-12 2001-11-27 Saint-Gobain Vitrage Glazing assembly comprising a substrate provided with a stack of thin layers for solar protection and/or thermal insulation
US7314668B2 (en) 2000-07-10 2008-01-01 Guardian Industries Corp. Low-E coated articles having zirconium inclusive dielectric layer
US7115308B2 (en) 2001-10-25 2006-10-03 Nippon Sheet Glass Co., Ltd. Glass panel and method of manufacturing the glass panel
US7045181B2 (en) 2001-12-25 2006-05-16 Nippon Sheet Glass Co., Ltd. Double glazing
US7910229B2 (en) 2002-05-03 2011-03-22 Ppg Industries Ohio, Inc. Substrate having thermal management coating for an insulating glass unit
US7632571B2 (en) 2005-03-31 2009-12-15 Cardinal Cg Company Haze-resistant low-emissivity coatings
US7858193B2 (en) 2005-08-23 2010-12-28 Saint Gobain Glass France Low emissivity (low-E) thin coating stacks with intermediate antidiffusion layers
US7342716B2 (en) 2005-10-11 2008-03-11 Cardinal Cg Company Multiple cavity low-emissivity coatings
CN201068427Y (zh) * 2006-12-20 2008-06-04 董镛 以微珠为支撑物抽气口多层密封的真空玻璃
US8821999B2 (en) 2008-11-05 2014-09-02 Corning Incorporated Vacuum-insulated glass windows with glass-bump spacers
US8951617B2 (en) 2008-12-22 2015-02-10 Saint-Gobain Glass France Substrate provided with a multilayer coating having thermal properties and absorbent layers
KR20110077893A (ko) * 2009-12-30 2011-07-07 (주)엘지하우시스 유리 패널의 배기구 형성 방법 및 이를 이용하여 제조한 유리 패널 제품
US9215760B2 (en) 2012-01-10 2015-12-15 Saint-Gobain Glass France Transparent pane with electrically conductive coating
US10153389B2 (en) 2014-10-01 2018-12-11 Ferro Gmbh Tellurate joining glass having processing temperatures less than or equal to 420° C
US11124450B2 (en) 2017-11-10 2021-09-21 Nippon Sheet Glass Company, Limited Glass panel and glass window
US10759693B2 (en) 2018-07-16 2020-09-01 Guardian Glass, LLC Low-E matchable coated articles having absorber film and corresponding methods
WO2020141007A1 (fr) * 2019-01-02 2020-07-09 Vkr Holding A/S Joint dans une unité de vitrage isolé sous vide

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
HONG LI ET AL: "Glass forming region and bonding mechanism of low-melting V2O5-TeO2-Bi2O3 glass applied in vacuum glazing sealing", JOURNAL OF THE AMERICAN CERAMIC SOCIETY, BLACKWELL PUBLISHING, MALDEN, MA, US, vol. 104, no. 10, 3 June 2021 (2021-06-03), pages 5050 - 5066, XP071168508, ISSN: 0002-7820, DOI: 10.1111/JACE.17917 *

Similar Documents

Publication Publication Date Title
US12391026B2 (en) Vacuum insulated panel with CTE optimized edge seal
US20250353281A1 (en) Vacuum insulated panel with cte optimized edge seal
EP4665936A1 (fr) Panneau isolé sous vide avec trou et joint d'étanchéité pour tube d'évacuation et procédé
WO2025207128A1 (fr) Panneau isolé sous vide avec trou et joint d'étanchéité pour tube d'évacuation et procédé
EP4421284A2 (fr) Panneau isolé sous vide avec un joint comprenant de l'oxyde de tellure et/ou du bore et de l'oxyde de bismuth
WO2025207148A1 (fr) Panneau isolé sous vide avec structure de montage de tube d'évacuation et procédé
WO2025207127A1 (fr) Panneau isolé sous vide avec joint d'étanchéité pour tube d'évacuation et procédé
WO2025207159A1 (fr) Panneau isolé sous vide avec structure de montage de tube d'évacuation et rugosité de surface pour joint de tube
US12612821B2 (en) Vacuum insulated panel with improved thermal performance proximate edge of glass during asymmetric thermal conditions
US20250320767A1 (en) Vacuum insulated panel with improved thermal performance proximate edge of glass during asymmetric thermal conditions
WO2024112514A1 (fr) Procédé de fabrication d'un panneau isolé sous vide à taille de faisceau laser optimisée
WO2024112483A1 (fr) Panneau isolé sous vide avec joint d'étanchéité comprenant de l'oxyde de tellure et/ou de l'oxyde de vanadium
WO2025212132A1 (fr) Panneau isolé sous vide avec tube d'évacuation de verre et procédé
US20250320768A1 (en) Vacuum insulated panel with high condensation resistance factor (crf)
US20250320769A1 (en) Vacuum insulated panel with glass removal proximate edge seal
WO2025212134A1 (fr) Panneau isolé sous vide avec joint d'extrémité de tube d'évacuation de verre et procédé
US20250333998A1 (en) Vacuum insulated panel with low temperature seal having low carbon content
WO2025230565A1 (fr) Panneau isolé sous vide doté de substrats en verre ayant un ou plusieurs bords présentant une rugosité de surface réduite et/ou un joint d'étanchéité conçus pour réduire la contrainte
WO2024112407A1 (fr) Panneau isolé sous vide avec getter allongé
WO2024112494A1 (fr) Panneau isolant sous vide avec piège à gaz ayant une phase cristalline ti-al-v et son procédé de fabrication
EP4490382A1 (fr) Panneau isolant sous vide avec joint pour tube de pompage et/ou son procédé de fabrication
WO2024112493A1 (fr) Panneau isolant sous vide avec joint stratifié et/ou son procédé de fabrication
WO2024112487A1 (fr) Panneau isolé sous vide à contrainte de compression et/ou de traction optimisée dans le verre
WO2025259257A1 (fr) Panneau isolé sous vide avec un ou plusieurs additifs de conductivité/diffusivité thermique pour un matériau d'étanchéité
WO2024112482A1 (fr) Panneau isolant sous vide avec joint stratifié comprenant de l'oxyde de tellure et/ou de l'oxyde de vanadium

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 2024734515

Country of ref document: EP

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 24734515

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2024734515

Country of ref document: EP

Effective date: 20250915

WWP Wipo information: published in national office

Ref document number: 2024734515

Country of ref document: EP

WWG Wipo information: grant in national office

Ref document number: 2024734515

Country of ref document: EP