WO2026100697A1 - Composition d'épisulfure photodurcissable, produit durci, stratifié et procédé de production d'un produit durci - Google Patents

Composition d'épisulfure photodurcissable, produit durci, stratifié et procédé de production d'un produit durci

Info

Publication number
WO2026100697A1
WO2026100697A1 PCT/JP2025/039160 JP2025039160W WO2026100697A1 WO 2026100697 A1 WO2026100697 A1 WO 2026100697A1 JP 2025039160 W JP2025039160 W JP 2025039160W WO 2026100697 A1 WO2026100697 A1 WO 2026100697A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
episulfide
photocurable
compound
cured product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2025/039160
Other languages
English (en)
Japanese (ja)
Inventor
ニジェール リベイロ
祐熙 杉元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of WO2026100697A1 publication Critical patent/WO2026100697A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62—Quaternary ammonium compounds
    • C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C279/00—Derivatives of guanidine, i.e. compounds containing the group, the singly-bound nitrogen atoms not being part of nitro or nitroso groups
    • C07C279/04—Derivatives of guanidine, i.e. compounds containing the group, the singly-bound nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of guanidine groups bound to acyclic carbon atoms of a carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C321/00—Thiols, sulfides, hydropolysulfides or polysulfides
    • C07C321/24—Thiols, sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
    • C07C321/28—Sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40—Unsaturated compounds
    • C07C59/76—Unsaturated compounds containing keto groups
    • C07C59/84—Unsaturated compounds containing keto groups containing six membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40—Unsaturated compounds
    • C07C59/76—Unsaturated compounds containing keto groups
    • C07C59/90—Unsaturated compounds containing keto groups containing singly bound oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/06—Polythioethers from cyclic thioethers
    • C08G75/08—Polythioethers from cyclic thioethers from thiiranes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

L'invention concerne une composition d'épisulfure photodurcissable contenant un générateur de photobase (a) et un composé épisulfure (b), le générateur de photobase (a) étant un composé représenté par la formule (1) ou la formule (2). R représente un substituant, X+ représente un cation, A1 et A2 représentent des structures cycliques à 5 à 8 chaînons, et L et R1 à R4 représentent des substituants.
PCT/JP2025/039160 2024-11-11 2025-11-07 Composition d'épisulfure photodurcissable, produit durci, stratifié et procédé de production d'un produit durci Pending WO2026100697A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2024196497 2024-11-11
JP2024-196497 2024-11-11

Publications (1)

Publication Number Publication Date
WO2026100697A1 true WO2026100697A1 (fr) 2026-05-15

Family

ID=99766702

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2025/039160 Pending WO2026100697A1 (fr) 2024-11-11 2025-11-07 Composition d'épisulfure photodurcissable, produit durci, stratifié et procédé de production d'un produit durci

Country Status (2)

Country Link
TW (1) TW202620015A (fr)
WO (1) WO2026100697A1 (fr)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005264156A (ja) * 2004-02-16 2005-09-29 Mitsubishi Gas Chem Co Inc 光塩基発生剤
WO2009122664A1 (fr) * 2008-03-31 2009-10-08 サンアプロ株式会社 Générateur de photobases
JP2014062246A (ja) * 2012-08-31 2014-04-10 Sanyo Chem Ind Ltd 樹脂組成物及び高屈折率樹脂
JP2014133875A (ja) * 2012-12-13 2014-07-24 Three Bond Co Ltd 硬化性組成物
WO2014155960A1 (fr) * 2013-03-28 2014-10-02 サンアプロ株式会社 Générateur de photobase
WO2015083331A1 (fr) * 2013-12-04 2015-06-11 サンアプロ株式会社 Générateur de photobase
JP2015117262A (ja) * 2013-12-17 2015-06-25 スリーボンドファインケミカル株式会社 一液硬化性組成物
WO2021043875A1 (fr) * 2019-09-04 2021-03-11 Henkel Ag & Co. Kgaa Formulations thiol-isocyanate-époxyde pour fabrication additive
WO2023063398A1 (fr) * 2021-10-15 2023-04-20 三井化学株式会社 Composition photodurcissable, article durci, corps stratifié, procédé de production d'article durci et procédé de production de lentille
WO2025197516A1 (fr) * 2024-03-18 2025-09-25 三井化学株式会社 Composition, produit durci, procédé de production de produit durci, composé et générateur de base

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005264156A (ja) * 2004-02-16 2005-09-29 Mitsubishi Gas Chem Co Inc 光塩基発生剤
WO2009122664A1 (fr) * 2008-03-31 2009-10-08 サンアプロ株式会社 Générateur de photobases
JP2014062246A (ja) * 2012-08-31 2014-04-10 Sanyo Chem Ind Ltd 樹脂組成物及び高屈折率樹脂
JP2014133875A (ja) * 2012-12-13 2014-07-24 Three Bond Co Ltd 硬化性組成物
WO2014155960A1 (fr) * 2013-03-28 2014-10-02 サンアプロ株式会社 Générateur de photobase
WO2015083331A1 (fr) * 2013-12-04 2015-06-11 サンアプロ株式会社 Générateur de photobase
JP2015117262A (ja) * 2013-12-17 2015-06-25 スリーボンドファインケミカル株式会社 一液硬化性組成物
WO2021043875A1 (fr) * 2019-09-04 2021-03-11 Henkel Ag & Co. Kgaa Formulations thiol-isocyanate-époxyde pour fabrication additive
WO2023063398A1 (fr) * 2021-10-15 2023-04-20 三井化学株式会社 Composition photodurcissable, article durci, corps stratifié, procédé de production d'article durci et procédé de production de lentille
WO2025197516A1 (fr) * 2024-03-18 2025-09-25 三井化学株式会社 Composition, produit durci, procédé de production de produit durci, composé et générateur de base

Also Published As

Publication number Publication date
TW202620015A (zh) 2026-05-16

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