ZA793154B - Light-sensitive mixture - Google Patents

Light-sensitive mixture

Info

Publication number: ZA793154B
Authority: ZA; South Africa
Prior art keywords: carbon atoms; optionally substituted; naphthoquinone; group; atoms
Prior art date: 1978-06-26

Application number

ZA793154A

Other languages

English (en)

Inventor

H Ruckert

G Buhr

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1978-06-26

Filing date

1979-06-25

Publication date

1980-06-25

1979-06-25 Application filed by Hoechst Ag filed Critical Hoechst Ag

1980-06-25 Publication of ZA793154B publication Critical patent/ZA793154B/xx

Links

239000000203 mixture Substances 0.000 title abstract 2
125000004432 carbon atom Chemical group C* 0.000 abstract 5
125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 3
125000000217 alkyl group Chemical group 0.000 abstract 2
KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 abstract 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
125000003342 alkenyl group Chemical group 0.000 abstract 1
125000004183 alkoxy alkyl group Chemical group 0.000 abstract 1
125000003545 alkoxy group Chemical group 0.000 abstract 1
239000011230 binding agent Substances 0.000 abstract 1
125000001246 bromo group Chemical group Br* 0.000 abstract 1
239000000460 chlorine Substances 0.000 abstract 1
229910052801 chlorine Inorganic materials 0.000 abstract 1
FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 1
239000001257 hydrogen Substances 0.000 abstract 1
229910052739 hydrogen Inorganic materials 0.000 abstract 1
QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical class [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 abstract 1
229920003986 novolac Polymers 0.000 abstract 1
239000003960 organic solvent Substances 0.000 abstract 1
229920002120 photoresistant polymer Polymers 0.000 abstract 1
125000005017 substituted alkenyl group Chemical group 0.000 abstract 1
125000000547 substituted alkyl group Chemical group 0.000 abstract 1
125000005346 substituted cycloalkyl group Chemical group 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Luminescent Compositions (AREA)
Materials For Photolithography (AREA)
Compositions Of Macromolecular Compounds (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Photoreceptors In Electrophotography (AREA)
Electroluminescent Light Sources (AREA)
Manufacturing Of Printed Circuit Boards (AREA)
Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)

ZA793154A 1978-06-26 1979-06-25 Light-sensitive mixture ZA793154B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19782828037 DE2828037A1 (de)	1978-06-26	1978-06-26	Lichtempfindliches gemisch

Publications (1)

Publication Number	Publication Date
ZA793154B true ZA793154B (en)	1980-06-25

Family

ID=6042817

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ZA793154A ZA793154B (en)	1978-06-26	1979-06-25	Light-sensitive mixture

Country Status (12)

Country	Link
US (1)	US4266001A (2)
EP (1)	EP0006561B1 (2)
JP (1)	JPS556397A (2)
AT (1)	ATE2581T1 (2)
AU (1)	AU521070B2 (2)
BR (1)	BR7904034A (2)
CA (1)	CA1113108A (2)
DE (2)	DE2828037A1 (2)
IE (1)	IE48185B1 (2)
IL (1)	IL57623A (2)
PT (1)	PT69817A (2)
ZA (1)	ZA793154B (2)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6026550B2 (ja) *	1976-07-31	1985-06-24	一郎高木	バリカン用定規
DE3039926A1 (de) *	1980-10-23	1982-05-27	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3040156A1 (de) *	1980-10-24	1982-06-03	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3100856A1 (de) *	1981-01-14	1982-08-12	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3124936A1 (de) *	1981-06-25	1983-01-20	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3127754A1 (de) *	1981-07-14	1983-02-03	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4526856A (en) *	1983-05-23	1985-07-02	Allied Corporation	Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents
JPS59187340A (ja) *	1983-08-01	1984-10-24	Kimoto & Co Ltd	感光性組成物
EP0147596A3 (en) *	1983-12-30	1987-03-04	International Business Machines Corporation	A positive lithographic resist composition
EP0164083B1 (de) *	1984-06-07	1991-05-02	Hoechst Aktiengesellschaft	Positiv arbeitende strahlungsempfindliche Beschichtungslösung
US5066561A (en) *	1984-06-11	1991-11-19	Hoechst Celanese Corporation	Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US5143814A (en) *	1984-06-11	1992-09-01	Hoechst Celanese Corporation	Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
GB8430377D0 (en) *	1984-12-01	1985-01-09	Ciba Geigy Ag	Modified phenolic resins
DE3445276A1 (de) *	1984-12-12	1986-06-19	Hoechst Ag, 6230 Frankfurt	Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
GB8505402D0 (en) *	1985-03-02	1985-04-03	Ciba Geigy Ag	Modified phenolic resins
DE3629122A1 (de) *	1986-08-27	1988-03-10	Hoechst Ag	Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch
DE3718416A1 (de) *	1987-06-02	1988-12-15	Hoechst Ag	Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
DE3729035A1 (de) *	1987-08-31	1989-03-09	Hoechst Ag	Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
JP2552900B2 (ja) *	1988-06-07	1996-11-13	富士写真フイルム株式会社	ポジ型フオトレジスト組成物
US5238775A (en) *	1990-02-20	1993-08-24	Japan Synthetic Rubber Co., Ltd.	Radiation-sensitive resin composition
DE4126836A1 (de) *	1991-08-14	1993-02-18	Hoechst Ag	Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche
DE4335425A1 (de) *	1993-10-18	1995-04-20	Hoechst Ag	Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial
JP2002278056A (ja) *	2001-03-16	2002-09-27	Sumitomo Chem Co Ltd	着色感光性樹脂組成物
US20040038152A1 (en) *	2002-07-15	2004-02-26	Goodin Jonathan W.	Method for making printing plate by inkjet deposition on positive-working media
WO2004058696A1 (ja) *	2002-12-26	2004-07-15	Ube Industries, Ltd.	ビスフェノール化合物および芳香族ポリアリールエーテル
DE602006009919D1 (de) *	2006-08-03	2009-12-03	Agfa Graphics Nv	Flachdruckplattenträger
ES2344668T3 (es)	2007-11-30	2010-09-02	Agfa Graphics N.V.	Metodo para tratar una plancha de impresion litografica.
ES2430562T3 (es)	2008-03-04	2013-11-21	Agfa Graphics N.V.	Método para la fabricación de un soporte de una plancha de impresión litográfica
ES2365885T3 (es) *	2008-03-31	2011-10-13	Agfa Graphics N.V.	Un método para tratar una plancha de impresión litográfica.
KR101146622B1 (ko) *	2009-08-31	2012-05-16	금호석유화학 주식회사	감광성 화합물 및 이를 포함하는 감광성 조성물
ES2655798T3 (es)	2014-12-08	2018-02-21	Agfa Nv	Sistema para reducir los residuos de ablación
EP3430474A1 (en)	2016-03-16	2019-01-23	Agfa Nv	Method and apparatus for processing a lithographic printing plate
EP3637188A1 (en)	2018-10-08	2020-04-15	Agfa Nv	An effervescent developer precursor for processing a lithographic printing plate precursor

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
BE508815A (2) *	1949-07-23
DE872154C (de) *	1950-12-23	1953-03-30	Kalle & Co Ag	Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen
NL130248C (2) *	1959-01-21
DE1114705C2 (de) *	1959-04-16	1962-04-12	Kalle Ag	Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
DE1543721A1 (de) *	1966-07-27	1969-09-11	Kalle Ag	Naphthochinondiazidsulfosaeureester und Verfahren zu seiner Herstellung und Verfahren zur Herstellung eines den Ester enthaltenden lagerfaehigen lichtempfindlichen Materials
US3669658A (en) *	1969-06-11	1972-06-13	Fuji Photo Film Co Ltd	Photosensitive printing plate
US3785825A (en) *	1971-07-19	1974-01-15	Polychrome Corp	Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
CS160784B1 (2)	1971-09-09	1975-05-04
CS160783B1 (2)	1971-09-09	1975-05-04
US4005437A (en) *	1975-04-18	1977-01-25	Rca Corporation	Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil
DE2742631A1 (de)	1977-09-22	1979-04-05	Hoechst Ag	Lichtempfindliche kopiermasse
US4157918A (en) *	1977-09-26	1979-06-12	American Hoechst Corporation	Light sensitive film composition

1978
- 1978-06-26 DE DE19782828037 patent/DE2828037A1/de not_active Withdrawn
1979
- 1979-06-18 EP EP79101994A patent/EP0006561B1/de not_active Expired
- 1979-06-18 AT AT79101994T patent/ATE2581T1/de not_active IP Right Cessation
- 1979-06-18 DE DE7979101994T patent/DE2964798D1/de not_active Expired
- 1979-06-21 AU AU48268/79A patent/AU521070B2/en not_active Ceased
- 1979-06-22 IL IL57623A patent/IL57623A/xx unknown
- 1979-06-22 CA CA330,337A patent/CA1113108A/en not_active Expired
- 1979-06-25 PT PT69817A patent/PT69817A/pt unknown
- 1979-06-25 US US06/051,908 patent/US4266001A/en not_active Expired - Lifetime
- 1979-06-25 ZA ZA793154A patent/ZA793154B/xx unknown
- 1979-06-26 JP JP7977379A patent/JPS556397A/ja active Granted
- 1979-06-26 BR BR7904034A patent/BR7904034A/pt not_active IP Right Cessation
- 1979-08-08 IE IE1175/79A patent/IE48185B1/en unknown

Also Published As

Publication number	Publication date
EP0006561B1 (de)	1983-02-16
PT69817A (de)	1979-07-01
BR7904034A (pt)	1980-03-11
IE48185B1 (en)	1984-10-17
DE2964798D1 (en)	1983-03-24
JPS623411B2 (2)	1987-01-24
AU521070B2 (en)	1982-03-11
EP0006561A1 (de)	1980-01-09
AU4826879A (en)	1980-01-03
US4266001A (en)	1981-05-05
CA1113108A (en)	1981-11-24
DE2828037A1 (de)	1980-01-10
IE791175L (en)	1979-12-26
ATE2581T1 (de)	1983-03-15
JPS556397A (en)	1980-01-17
IL57623A0 (en)	1979-10-31
IL57623A (en)	1983-05-15

Publication	Publication Date	Title
DE2964798D1 (en)	1983-03-24	Light-sensitive composition
ES533562A0 (es)	1986-01-16	Procedimiento para la obtencion deuna plancha de impresion planografica.
JPS56153341A (en)	1981-11-27	Developer for developing exposed photosensitive copying layer and method of developing copying layer acting on negative
IL74073A0 (en)	1985-04-30	Negative photoresist systems
AU542387B2 (en)	1985-02-21	Naphthoquinone diazide sulfonic ester
DE3165432D1 (en)	1984-09-13	Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom
DE3261128D1 (en)	1984-12-06	Photosensitive mixture on the basis of o-naphthoquinone diazides, and photosensitive copying material produced therefrom
SE7514477L (sv)	1976-06-22	Forfarande for framstellning och anvendning av nya xantinderivat
FI813304L (fi)	1982-04-25	Ljuskaenslig blandning och av denna framstaellt ljuskaensligt kopieringsmaterial
KR960024674A (ko)	1996-07-20	방사선-민감성 조성물에 사용되는 광산 생성 조성물
ES8200648A2 (es)	1981-12-01	Procedimiento de preparacion de compuestos opacificantes para radiografia y similares
JPS55140844A (en)	1980-11-04	Presensitized plate for offset printing
KR950012153A (ko)	1995-05-16	포지티브형 단편 조성물 및 패턴형성방법
JPS5559459A (en)	1980-05-02	Resist developing solution and developing method
JPS5627143A (en)	1981-03-16	Polymer type photoresist developing method
JPS6462647A (en)	1989-03-09	Planographic printing master plate without using water
GB2022583A (en)	1979-12-19	New ionic polyiodo benzene derivatives useful as X-ray contrast media
JPS6421440A (en)	1989-01-24	Photosensitive planographic printing plate
JPS57118238A (en)	1982-07-23	Positive type photosensitive composition