ZA846889B - Process for depositing metallic copper - Google Patents

Process for depositing metallic copper

Info

Publication number
ZA846889B
ZA846889B ZA846889A ZA846889A ZA846889B ZA 846889 B ZA846889 B ZA 846889B ZA 846889 A ZA846889 A ZA 846889A ZA 846889 A ZA846889 A ZA 846889A ZA 846889 B ZA846889 B ZA 846889B
Authority
ZA
South Africa
Prior art keywords
metallic copper
depositing metallic
depositing
copper
metallic
Prior art date
Application number
ZA846889A
Other languages
English (en)
Inventor
Thomas Hall Baum
Frances Anne Houle
Carol Ruth Jones
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of ZA846889B publication Critical patent/ZA846889B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/146—By vapour deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Manufacturing Of Printed Wiring (AREA)
ZA846889A 1983-09-16 1984-09-03 Process for depositing metallic copper ZA846889B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US53302183A 1983-09-16 1983-09-16

Publications (1)

Publication Number Publication Date
ZA846889B true ZA846889B (en) 1985-04-24

Family

ID=24124131

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA846889A ZA846889B (en) 1983-09-16 1984-09-03 Process for depositing metallic copper

Country Status (8)

Country Link
EP (1) EP0135179B1 (de)
JP (1) JPS6066896A (de)
AU (1) AU569753B2 (de)
BR (1) BR8404612A (de)
CA (1) CA1225363A (de)
DE (1) DE3473166D1 (de)
IE (1) IE55640B1 (de)
ZA (1) ZA846889B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4748045A (en) * 1986-04-09 1988-05-31 Massachusetts Institute Of Technology Method and apparatus for photodeposition of films on surfaces
JPH0627327B2 (ja) * 1987-06-30 1994-04-13 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Ｉｂ族金属の付着方法
FR2623820A1 (fr) * 1987-11-30 1989-06-02 Gen Electric Depot en phase gazeuse par procede chimique a laser avec utilisation d'un faisceau a fibre optique
US5019531A (en) * 1988-05-23 1991-05-28 Nippon Telegraph And Telephone Corporation Process for selectively growing thin metallic film of copper or gold
KR940002439B1 (ko) * 1990-03-09 1994-03-24 니뽄 덴신 덴와 가부시끼가이샤 금속 박막 성장방법 및 장치
US5346730A (en) * 1990-07-27 1994-09-13 Kali-Chemie Ag Process for depositing a copper containing layer I
DE4122449A1 (de) * 1990-07-27 1992-01-30 Kali Chemie Ag Verfahren zur abscheidung einer kupfer enthaltenden schicht i
JP2002057126A (ja) * 2000-08-10 2002-02-22 Fujitsu Ltd 半導体装置とその製造方法
CN117305839A (zh) * 2023-09-27 2023-12-29 江苏德一真空科技有限公司 一种复合膜层的制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3356527A (en) * 1964-04-23 1967-12-05 Ross W Moshier Vapor-plating metals from fluorocarbon keto metal compounds
IT1015238B (it) * 1973-06-22 1977-05-10 Gen Electric Materiali magnetici stabili all a ria e loro metodo di fabbricazione
US4226897A (en) * 1977-12-05 1980-10-07 Plasma Physics Corporation Method of forming semiconducting materials and barriers
CA1105093A (en) * 1977-12-21 1981-07-14 Roland F. Drew Laser deposition of metal upon transparent materials
JPS6021224B2 (ja) * 1980-10-08 1985-05-25 日本電気株式会社 レーザー薄膜形成装置

Also Published As

Publication number Publication date
EP0135179A1 (de) 1985-03-27
IE55640B1 (en) 1990-12-05
CA1225363A (en) 1987-08-11
DE3473166D1 (en) 1988-09-08
AU3266784A (en) 1985-03-21
IE842218L (en) 1985-03-16
JPS6066896A (ja) 1985-04-17
AU569753B2 (en) 1988-02-18
EP0135179B1 (de) 1988-08-03
BR8404612A (pt) 1985-08-06

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