ZA903559B - Method for preparing lithographically sensitive branched novolaks - Google Patents

Method for preparing lithographically sensitive branched novolaks

Info

Publication number: ZA903559B
Authority: ZA; South Africa
Prior art keywords: preparing; novolaks; lithographically sensitive; lithographically; branched novolaks
Prior art date: 1989-05-12

Application number

ZA903559A

Other languages

English (en)

Inventor

Leonard Edward Bogan Jr

Edward Bogan Leonard Jr

Original Assignee

Rohm & Haas

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-05-12

Filing date

1990-05-10

Publication date

1991-01-30

1990-05-10 Application filed by Rohm & Haas filed Critical Rohm & Haas

1991-01-30 Publication of ZA903559B publication Critical patent/ZA903559B/xx

Links

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ

Landscapes

Chemical & Material Sciences (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Phenolic Resins Or Amino Resins (AREA)
Materials For Photolithography (AREA)

ZA903559A 1989-05-12 1990-05-10 Method for preparing lithographically sensitive branched novolaks ZA903559B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US07/351,154 US4939229A (en)	1989-05-12	1989-05-12	Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate

Publications (1)

Publication Number	Publication Date
ZA903559B true ZA903559B (en)	1991-01-30

Family

ID=23379799

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ZA903559A ZA903559B (en)	1989-05-12	1990-05-10	Method for preparing lithographically sensitive branched novolaks

Country Status (14)

Country	Link
US (1)	US4939229A (no)
EP (1)	EP0399691A3 (no)
JP (1)	JPH0347820A (no)
KR (1)	KR900018187A (no)
CN (1)	CN1022690C (no)
AU (1)	AU635929B2 (no)
BR (1)	BR9001952A (no)
CA (1)	CA2014644A1 (no)
FI (1)	FI902376A7 (no)
IL (1)	IL94352A0 (no)
MY (1)	MY105698A (no)
NO (1)	NO902062L (no)
PH (1)	PH26861A (no)
ZA (1)	ZA903559B (no)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5091282A (en) *	1989-04-03	1992-02-25	Kabushiki Kaisha Toshiba	Alkali soluble phenol polymer photosensitive composition
CA2015721A1 (en) *	1989-05-12	1990-11-12	Karen Ann Graziano	Method of using highly branched novolaks in photoresists
EP1035438A3 (en) *	1999-03-12	2000-09-20	Shipley Company LLC	Phenolic resins and photoresist compositions comprising same
US6455223B1 (en) *	1999-03-26	2002-09-24	Shin-Etsu Chemical Co., Ltd.	Resist compositions and patterning process
US7211365B2 (en) *	2002-03-04	2007-05-01	Shipley Company, L.L.C.	Negative photoresists for short wavelength imaging
US6828383B2 (en) *	2002-12-13	2004-12-07	Occidental Petroleum	Phenolic modified resorcinolic resins for rubber compounding
US7425402B2 (en) *	2003-08-13	2008-09-16	Agfa Graphics, N.V.	Heat-sensitive lithographic printing plate precursor
US7205084B2 (en) *	2003-12-18	2007-04-17	Agfa-Gevaert	Heat-sensitive lithographic printing plate precursor
US11650505B2 (en) *	2014-08-08	2023-05-16	Nissan Chemical Industries, Ltd.	Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2147789A (en) *	1936-05-29	1939-02-21	Du Pont	Resins from aminophenols and formaldehyde
US2431011A (en) *	1941-01-29	1947-11-18	Standard Oil Dev Co	Corrosive inhibited additive for mineral lubricating oil composition
US2636019A (en) *	1951-06-26	1953-04-21	Research Corp	Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine
JPS57102960A (en) *	1972-09-14	1982-06-26	Yoshizaki Kozo	Production of thermosetting resin paint
EP0070624B1 (en) *	1981-06-22	1986-11-20	Philip A. Hunt Chemical Corporation	Novolak resin and a positive photoresist composition containing the same
JPS58101108A (ja) *	1981-12-11	1983-06-16	Unitika Ltd	キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法
US4500691A (en) *	1983-01-13	1985-02-19	Ciba-Geigy Corporation	Phenol-novolaks containing amino groups
US4474929A (en) *	1983-09-30	1984-10-02	The Dow Chemical Company	Polyglycidyl ethers of branched novolacs
US4468507A (en) *	1983-11-21	1984-08-28	The Dow Chemical Company	Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations
SU1154297A1 (ru) *	1984-01-04	1985-05-07	Предприятие П/Я В-2304	Герметизирующа порошкова композици
US4571374A (en) *	1984-12-27	1986-02-18	Minnesota Mining And Manufacturing Company	Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
EP0662636A3 (en) *	1986-10-23	1995-11-22	Ciba Geigy Ag	Imaging processes.
CA2015721A1 (en) *	1989-05-12	1990-11-12	Karen Ann Graziano	Method of using highly branched novolaks in photoresists

1989
- 1989-05-12 US US07/351,154 patent/US4939229A/en not_active Expired - Fee Related
1990
- 1990-04-17 CA CA002014644A patent/CA2014644A1/en not_active Abandoned
- 1990-04-17 PH PH40380A patent/PH26861A/en unknown
- 1990-04-26 BR BR909001952A patent/BR9001952A/pt not_active Application Discontinuation
- 1990-05-07 JP JP2117295A patent/JPH0347820A/ja active Pending
- 1990-05-09 EP EP19900304969 patent/EP0399691A3/en not_active Withdrawn
- 1990-05-10 NO NO90902062A patent/NO902062L/no unknown
- 1990-05-10 AU AU54884/90A patent/AU635929B2/en not_active Ceased
- 1990-05-10 ZA ZA903559A patent/ZA903559B/xx unknown
- 1990-05-10 MY MYPI90000741A patent/MY105698A/en unknown
- 1990-05-10 IL IL94352A patent/IL94352A0/xx not_active IP Right Cessation
- 1990-05-11 FI FI902376A patent/FI902376A7/fi not_active Application Discontinuation
- 1990-05-11 KR KR1019900006667A patent/KR900018187A/ko not_active Ceased
- 1990-05-12 CN CN90102765A patent/CN1022690C/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
IL94352A0 (en)	1991-03-10
BR9001952A (pt)	1991-07-30
CN1047309A (zh)	1990-11-28
FI902376A7 (fi)	1990-11-13
CN1022690C (zh)	1993-11-10
PH26861A (en)	1992-11-16
EP0399691A3 (en)	1991-04-03
MY105698A (en)	1994-11-30
NO902062D0 (no)	1990-05-10
KR900018187A (ko)	1990-12-20
CA2014644A1 (en)	1990-11-12
AU5488490A (en)	1990-11-15
EP0399691A2 (en)	1990-11-28
JPH0347820A (ja)	1991-02-28
US4939229A (en)	1990-07-03
FI902376A0 (fi)	1990-05-11
NO902062L (no)	1990-11-13
AU635929B2 (en)	1993-04-08

Publication	Publication Date	Title
EP0426420A3 (en)	1991-07-31	Development apparatus
EP0430695A3 (en)	1991-11-13	Weighing apparatus
EP0407029A3 (en)	1991-09-11	Method for a below a minute burn-in
EP0427130A3 (en)	1992-01-22	Support for an apparatus
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GR900100165A (en)	1990-07-31	Method for preparing sulfo-triazolo-diazepino-derivatives
GB8902533D0 (en)	1989-03-22	Method for the manufacture of an electro-optic device
ZA903559B (en)	1991-01-30	Method for preparing lithographically sensitive branched novolaks
EP0430128A3 (en)	1992-05-06	Circuit for testability
GB8707422D0 (en)	1987-04-29	Apparatus for mounting on trip sewing-machine
EP0418823A3 (en)	1991-07-17	Developing apparatus
EP0408399A3 (en)	1991-01-30	Carrier for developer
GR900100167A (en)	1990-07-31	Method for preparining sulfo-triazolo-diazepines sulfonylic derivatives
GB9005249D0 (en)	1990-05-02	Apparatus for measuring biopermeability
EP0489061A4 (en)	1992-10-14	Radio-labelled antibodies for imaging
EP0430666A3 (en)	1992-02-26	Multicolor developing device
HU9200498D0 (en)	1992-04-28	Process for adjusting positioning devices
CS45589A1 (en)	1990-09-12	Carrier for staking device
EP0405522A3 (en)	1991-08-07	Developing apparatus
EP0415194A3 (en)	1991-10-23	Indicating device for vehicle
EP0382706A3 (en)	1990-12-12	System for measuring length
SU1727544A3 (ru)	1992-04-15	Уctpoйctbo для фиkcaции c'emhыx зубhыx пpoteзob
IE891576L (en)	1990-11-16	Electronic test system
PL282409A1 (en)	1991-06-03	Apparatus for entering inforations