AR032993A1 - Metodo para controlar la formacion de incrustaciones y deposiciones en sistemas acuosos - Google Patents

Metodo para controlar la formacion de incrustaciones y deposiciones en sistemas acuosos

Info

Publication number
AR032993A1
AR032993A1 ARP020100918A ARP020100918A AR032993A1 AR 032993 A1 AR032993 A1 AR 032993A1 AR P020100918 A ARP020100918 A AR P020100918A AR P020100918 A ARP020100918 A AR P020100918A AR 032993 A1 AR032993 A1 AR 032993A1
Authority
AR
Argentina
Prior art keywords
formula
formation
chch3
approximately
lower alkyl
Prior art date
Application number
ARP020100918A
Other languages
English (en)
Original Assignee
Betzdearborn Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/808,679 external-priority patent/US6444747B1/en
Application filed by Betzdearborn Inc filed Critical Betzdearborn Inc
Publication of AR032993A1 publication Critical patent/AR032993A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F216/12—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F216/14—Monomers containing only one unsaturated aliphatic radical
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
    • C02F5/12—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/10—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances
    • C02F5/14—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents using organic substances containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/173—Macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F14/00—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes
    • C23F14/02—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes by chemical means
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/16—Nature of the water, waste water, sewage or sludge to be treated from metallurgical processes, i.e. from the production, refining or treatment of metals, e.g. galvanic wastes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/26—Nature of the water, waste water, sewage or sludge to be treated from the processing of plants or parts thereof
    • C02F2103/28—Nature of the water, waste water, sewage or sludge to be treated from the processing of plants or parts thereof from the paper or cellulose industry

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Lubricants (AREA)

Abstract

Los novedosos polímeros solubles o dispersables en agua utiles para la inhibicion de la formacion y deposicion de porciones formadoras de incrustaciones en sistemas acuosos que comprenden unidades de repeticion caracterizadas por la formula (1), en la cual E es la unidad de repeticion remanente después de la polimerizacion de un compuesto etilénicamente insaturado; preferentemente, un ácido carboxílico, ácido sulfonico, ácido fosfonico, o forma de amida de los mismos o mezclas de los mismos. R1 es H o alquilo C1-4 inferior. G es -CH2- o -CHCH3-; R2 es (-CH2-CH2-O-)n o (-CH2-CHCH3-O)m donde n y m oscilan entre aproximadamente 1 y 100, preferentemente n es superior a 10 y m oscila entre aproximadamente 1 y 20. X es un radical anionico seleccionado entre el grupo que consiste en SO3, PO3 o COO; Z es H o hidrogenos o cualquier porcion cationica hidrosoluble la cual compensa la valencia del radical anionico X, incluyendo aunque sin limitarse a Na, K, Ca o NH4.F, cuando está presente, es una unidad de repeticion que tiene la estructura de formula (2), en la cual X y Z son iguales que en la formula (1). R4 es H o alquilo C1-4 inferior. R5 es alquilo o alquileno sustituido con hidroxi que tiene entre aproximadamente C1-6.
ARP020100918A 2001-03-15 2002-03-14 Metodo para controlar la formacion de incrustaciones y deposiciones en sistemas acuosos AR032993A1 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/808,679 US6444747B1 (en) 2001-03-15 2001-03-15 Water soluble copolymers
US09/878,646 US6641754B2 (en) 2001-03-15 2001-06-11 Method for controlling scale formation and deposition in aqueous systems

Publications (1)

Publication Number Publication Date
AR032993A1 true AR032993A1 (es) 2003-12-03

Family

ID=27123156

Family Applications (1)

Application Number Title Priority Date Filing Date
ARP020100918A AR032993A1 (es) 2001-03-15 2002-03-14 Metodo para controlar la formacion de incrustaciones y deposiciones en sistemas acuosos

Country Status (21)

Country Link
US (2) US6641754B2 (es)
EP (1) EP1379475B1 (es)
JP (1) JP2004528439A (es)
KR (1) KR100904789B1 (es)
CN (1) CN1262489C (es)
AR (1) AR032993A1 (es)
AT (1) ATE435839T1 (es)
AU (2) AU2002314719B2 (es)
BR (1) BR0208127B1 (es)
CA (1) CA2440435C (es)
DE (1) DE60232866D1 (es)
ES (1) ES2326960T3 (es)
HU (1) HU229585B1 (es)
MX (1) MX244755B (es)
MY (1) MY128613A (es)
NO (1) NO20034049L (es)
NZ (1) NZ528038A (es)
PL (1) PL204918B1 (es)
PT (1) PT1379475E (es)
TW (1) TWI300060B (es)
WO (1) WO2002079106A1 (es)

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US6641754B2 (en) 2003-11-04
PL363968A1 (en) 2004-11-29
PL204918B1 (pl) 2010-02-26
MX244755B (es) 2007-04-03
CA2440435A1 (en) 2002-10-10
TWI300060B (en) 2008-08-21
CA2440435C (en) 2010-06-08
KR100904789B1 (ko) 2009-06-25
US7094852B2 (en) 2006-08-22
ES2326960T3 (es) 2009-10-22
NZ528038A (en) 2005-05-27
HUP0303535A2 (hu) 2004-01-28
KR20030083733A (ko) 2003-10-30
AU2007202743A1 (en) 2007-07-05
AU2002314719B2 (en) 2007-04-26
BR0208127A (pt) 2004-03-23
DE60232866D1 (de) 2009-08-20
US20040039144A1 (en) 2004-02-26
PT1379475E (pt) 2009-09-01
ATE435839T1 (de) 2009-07-15
AU2007202743B2 (en) 2008-11-20
MY128613A (en) 2007-02-28
HU229585B1 (hu) 2014-02-28
HUP0303535A3 (en) 2008-03-28
CN1262489C (zh) 2006-07-05
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US20030052303A1 (en) 2003-03-20
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BR0208127B1 (pt) 2012-11-27
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