AT503053A3 - Kombination aus einem träger und einem wafer - Google Patents
Kombination aus einem träger und einem wafer Download PDFInfo
- Publication number
- AT503053A3 AT503053A3 AT17812006A AT17812006A AT503053A3 AT 503053 A3 AT503053 A3 AT 503053A3 AT 17812006 A AT17812006 A AT 17812006A AT 17812006 A AT17812006 A AT 17812006A AT 503053 A3 AT503053 A3 AT 503053A3
- Authority
- AT
- Austria
- Prior art keywords
- wafer
- carrier
- combination
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7412—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7422—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
- H10P90/19—Preparing inhomogeneous wafers
- H10P90/1904—Preparing vertically inhomogeneous wafers
- H10P90/1906—Preparing SOI wafers
- H10P90/1914—Preparing SOI wafers using bonding
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/12—Surface bonding means and/or assembly means with cutting, punching, piercing, severing or tearing
- Y10T156/1348—Work traversing type
- Y10T156/1352—Work traversing type with liquid applying means
- Y10T156/1361—Cutting after bonding
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
- Y10T156/1798—Surface bonding means and/or assemblymeans with work feeding or handling means with liquid adhesive or adhesive activator applying means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
- Y10T428/24331—Composite web or sheet including nonapertured component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200610000687 DE102006000687B4 (de) | 2006-01-03 | 2006-01-03 | Kombination aus einem Träger und einem Wafer, Vorrichtung zum Trennen der Kombination und Verfahren zur Handhabung eines Trägers und eines Wafers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| AT503053A2 AT503053A2 (de) | 2007-07-15 |
| AT503053A3 true AT503053A3 (de) | 2008-04-15 |
| AT503053B1 AT503053B1 (de) | 2010-11-15 |
Family
ID=38169821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT0178106A AT503053B1 (de) | 2006-01-03 | 2006-10-24 | Kombination aus einem träger und einem wafer |
Country Status (3)
| Country | Link |
|---|---|
| US (7) | US7910454B2 (de) |
| AT (1) | AT503053B1 (de) |
| DE (1) | DE102006000687B4 (de) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006000687B4 (de) | 2006-01-03 | 2010-09-09 | Thallner, Erich, Dipl.-Ing. | Kombination aus einem Träger und einem Wafer, Vorrichtung zum Trennen der Kombination und Verfahren zur Handhabung eines Trägers und eines Wafers |
| WO2009094558A2 (en) | 2008-01-24 | 2009-07-30 | Brewer Science Inc. | Method for reversibly mounting a device wafer to a carrier substrate |
| EP2091071B1 (de) * | 2008-02-15 | 2012-12-12 | Soitec | Verfahren zum Bonden zweier Substrate |
| DE102008044200B4 (de) * | 2008-11-28 | 2012-08-23 | Thin Materials Ag | Bonding-Verfahren |
| EP2660851B1 (de) * | 2009-03-18 | 2020-10-14 | EV Group GmbH | Vorrichtung und Verfahren zum Ablösen eines Wafers von einem Träger |
| EP2706561B1 (de) * | 2009-09-01 | 2017-04-05 | EV Group GmbH | Verfahren zum konzentrischen Ablösen eines Produktsubstrats (z.B. eines Halbleiterwafers) von einem Trägersubstrat durch Verformung eines auf einem Filmrahmen montierten flexiblen Films |
| EP2299486B1 (de) * | 2009-09-18 | 2015-02-18 | EV Group E. Thallner GmbH | Verfahren zum Bonden von Chips auf Wafer |
| US8613996B2 (en) | 2009-10-21 | 2013-12-24 | International Business Machines Corporation | Polymeric edge seal for bonded substrates |
| US8287980B2 (en) * | 2009-10-29 | 2012-10-16 | International Business Machines Corporation | Edge protection seal for bonded substrates |
| US9018308B2 (en) * | 2009-12-01 | 2015-04-28 | Pbi Performance Products, Inc. | Polybenzimidazole/polyacrylate mixtures |
| EP2553719B1 (de) | 2010-03-31 | 2019-12-04 | Ev Group E. Thallner GmbH | Verfahren zur herstellung eines mit chips bestückten wafers mit hilfe von zwei selektiv abtrennbaren trägerwafern mit ringförmigen adhäsionsschichten mit unterschiedlichen ringbreiten |
| EP2523208B1 (de) | 2010-04-23 | 2013-06-12 | EV Group GmbH | Lösungsmittelbehälter und Verfahren zum Lösen einer Verbindungsschicht |
| FR2960340B1 (fr) * | 2010-05-21 | 2012-06-29 | Commissariat Energie Atomique | Procede de realisation d'un support de substrat |
| US8852391B2 (en) * | 2010-06-21 | 2014-10-07 | Brewer Science Inc. | Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate |
| US9263314B2 (en) | 2010-08-06 | 2016-02-16 | Brewer Science Inc. | Multiple bonding layers for thin-wafer handling |
| WO2012029843A1 (ja) * | 2010-09-01 | 2012-03-08 | 独立行政法人 科学技術振興機構 | 転写システムおよび転写方法 |
| US8753460B2 (en) * | 2011-01-28 | 2014-06-17 | International Business Machines Corporation | Reduction of edge chipping during wafer handling |
| CN103370780B (zh) | 2011-02-18 | 2016-01-20 | 应用材料公司 | 晶片级分割的方法和系统 |
| DE102011080653A1 (de) * | 2011-08-09 | 2013-02-14 | Osram Opto Semiconductors Gmbh | Trägerfolie für ein silikonelement und verfahren zum herstellen einer trägerfolie für ein silikonelement |
| US8975157B2 (en) | 2012-02-08 | 2015-03-10 | Advanced Semiconductor Engineering, Inc. | Carrier bonding and detaching processes for a semiconductor wafer |
| DE102012101237A1 (de) * | 2012-02-16 | 2013-08-22 | Ev Group E. Thallner Gmbh | Verfahren zum temporären Verbinden eines Produktsubstrats mit einem Trägersubstrat |
| JP6021431B2 (ja) * | 2012-05-22 | 2016-11-09 | 株式会社ディスコ | 表面保護テープの貼着方法 |
| DE112012006750B4 (de) * | 2012-07-30 | 2026-01-08 | Erich Thallner | Substratverbund, Verfahren und Vorrichtung zum Bonden von Substraten |
| DE102012220345B4 (de) | 2012-11-08 | 2023-02-02 | Disco Corporation | Verfahren zur Bearbeitung einer Wafereinrichtung |
| US8962449B1 (en) | 2013-07-30 | 2015-02-24 | Micron Technology, Inc. | Methods for processing semiconductor devices |
| JP2015217461A (ja) * | 2014-05-16 | 2015-12-07 | 株式会社ディスコ | ウェーハの加工方法 |
| US9475272B2 (en) * | 2014-10-09 | 2016-10-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | De-bonding and cleaning process and system |
| JP2018507539A (ja) * | 2015-01-14 | 2018-03-15 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板スタックから基板を剥離するための方法および装置 |
| JP2016146429A (ja) * | 2015-02-09 | 2016-08-12 | トヨタ自動車株式会社 | 半導体装置の製造方法 |
| NL2014625B1 (en) * | 2015-04-13 | 2017-01-06 | Suss Microtec Lithography Gmbh | Wafer treating device and sealing ring for a wafer treating device. |
| KR101630646B1 (ko) * | 2015-05-14 | 2016-06-15 | 주식회사 대화알로이테크 | 면상발열체를 이용한 반도체 진공라인의 히팅 장치 |
| US20180068843A1 (en) * | 2016-09-07 | 2018-03-08 | Raytheon Company | Wafer stacking to form a multi-wafer-bonded structure |
| DE102017205635A1 (de) * | 2017-04-03 | 2018-10-04 | 3D-Micromac Ag | Verfahren und Fertigungssystem zur Herstellung mikroelektronischer Komponenten mit Schichtaufbau |
| US10300649B2 (en) | 2017-08-29 | 2019-05-28 | Raytheon Company | Enhancing die flatness |
| US10497667B2 (en) * | 2017-09-26 | 2019-12-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for bond wave propagation control |
| US10847569B2 (en) | 2019-02-26 | 2020-11-24 | Raytheon Company | Wafer level shim processing |
| TWI869824B (zh) * | 2023-04-19 | 2025-01-11 | 力晶積成電子製造股份有限公司 | 晶圓的處理方法 |
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| US3988196A (en) | 1967-10-09 | 1976-10-26 | Western Electric Company, Inc. | Apparatus for transferring an oriented array of articles |
| US5273615A (en) | 1992-04-06 | 1993-12-28 | Motorola, Inc. | Apparatus and method for handling fragile semiconductor wafers |
| JPH06275717A (ja) | 1993-01-22 | 1994-09-30 | Mitsubishi Electric Corp | ウエハはがし方法 |
| JP4220580B2 (ja) | 1995-02-10 | 2009-02-04 | 三菱電機株式会社 | 半導体装置の製造装置 |
| JP3407835B2 (ja) | 1995-03-09 | 2003-05-19 | 東京応化工業株式会社 | 基板端縁部被膜の除去方法及び除去装置 |
| US6342434B1 (en) | 1995-12-04 | 2002-01-29 | Hitachi, Ltd. | Methods of processing semiconductor wafer, and producing IC card, and carrier |
| DE19734635A1 (de) | 1997-08-11 | 1999-02-18 | Gen Semiconductor Ireland Macr | Verfahren und Vorrichtung zum Ablösen von Bauelementen von einer Folie |
| KR100304197B1 (ko) | 1998-03-30 | 2001-11-30 | 윤종용 | 소이제조방법 |
| US6090687A (en) * | 1998-07-29 | 2000-07-18 | Agilent Technolgies, Inc. | System and method for bonding and sealing microfabricated wafers to form a single structure having a vacuum chamber therein |
| TW459225B (en) * | 1999-02-01 | 2001-10-11 | Origin Electric | Bonding system and method |
| JP2001196404A (ja) * | 2000-01-11 | 2001-07-19 | Fujitsu Ltd | 半導体装置及びその製造方法 |
| JP3768069B2 (ja) | 2000-05-16 | 2006-04-19 | 信越半導体株式会社 | 半導体ウエーハの薄型化方法 |
| DE10048881A1 (de) * | 2000-09-29 | 2002-03-07 | Infineon Technologies Ag | Vorrichtung und Verfahren zum planen Verbinden zweier Wafer für ein Dünnschleifen und ein Trennen eines Produkt-Wafers |
| US6713880B2 (en) * | 2001-02-07 | 2004-03-30 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method for producing the same, and method for mounting semiconductor device |
| JP2002237515A (ja) | 2001-02-07 | 2002-08-23 | Mitsubishi Gas Chem Co Inc | 薄葉化半導体基板の剥離装置および剥離法 |
| DE10108369A1 (de) | 2001-02-21 | 2002-08-29 | B L E Lab Equipment Gmbh | Verfahren und Vorrichtung zum Ablösen eines Halbleiterwafers von einem Träger |
| US6603072B1 (en) * | 2001-04-06 | 2003-08-05 | Amkor Technology, Inc. | Making leadframe semiconductor packages with stacked dies and interconnecting interposer |
| AT502233B1 (de) | 2001-06-07 | 2007-04-15 | Thallner Erich | Vorrichtung zum lösen eines trägers von einer halbleiterscheibe |
| US7497916B2 (en) * | 2002-03-27 | 2009-03-03 | Panasonic Corporation | Method of manufacturing multilayer optical information recording medium |
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| TWI258316B (en) * | 2002-10-25 | 2006-07-11 | Ritdisplay Corp | FPD encapsulation apparatus and method for encapsulating ehereof |
| JP2004193237A (ja) | 2002-12-10 | 2004-07-08 | Disco Abrasive Syst Ltd | 粘着シートを具備するウェハー保持部材,及び粘着シートの剥離方法 |
| DE10340409B4 (de) * | 2003-09-02 | 2007-05-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Trägerwafer und Verfahren zum Bearbeiten eines Halbleiterwafers unter Verwendung eines Trägerwafers |
| JP4447280B2 (ja) * | 2003-10-16 | 2010-04-07 | リンテック株式会社 | 表面保護用シートおよび半導体ウエハの研削方法 |
| JP2006135272A (ja) | 2003-12-01 | 2006-05-25 | Tokyo Ohka Kogyo Co Ltd | 基板のサポートプレート及びサポートプレートの剥離方法 |
| DE102004018250A1 (de) * | 2004-04-15 | 2005-11-03 | Infineon Technologies Ag | Wafer-Stabilisierungsvorrichtung und Verfahren zu dessen Herstellung |
| US7829152B2 (en) * | 2006-10-05 | 2010-11-09 | Lam Research Corporation | Electroless plating method and apparatus |
| JP2006032506A (ja) | 2004-07-14 | 2006-02-02 | Taiyo Yuden Co Ltd | 半導体ウェハの剥離方法および剥離装置 |
| KR100610676B1 (ko) * | 2004-08-11 | 2006-08-10 | 한국타이어 주식회사 | 3차원의 물결 및 직선홈을 가진 트레드 패턴 |
| JP2006059861A (ja) | 2004-08-17 | 2006-03-02 | Lintec Corp | 脆質部材の転着装置 |
| JP4679890B2 (ja) | 2004-11-29 | 2011-05-11 | 東京応化工業株式会社 | サポートプレートの貼り付け装置 |
| JP4848153B2 (ja) | 2005-08-10 | 2011-12-28 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
| JP4668052B2 (ja) | 2005-12-06 | 2011-04-13 | 東京応化工業株式会社 | 剥離装置 |
| DE102006000687B4 (de) | 2006-01-03 | 2010-09-09 | Thallner, Erich, Dipl.-Ing. | Kombination aus einem Träger und einem Wafer, Vorrichtung zum Trennen der Kombination und Verfahren zur Handhabung eines Trägers und eines Wafers |
| JP2008021929A (ja) | 2006-07-14 | 2008-01-31 | Tokyo Ohka Kogyo Co Ltd | サポートプレート、搬送装置、剥離装置及び剥離方法 |
| JP5074940B2 (ja) | 2008-01-30 | 2012-11-14 | 東京応化工業株式会社 | 基板の処理方法 |
| JP2009182256A (ja) | 2008-01-31 | 2009-08-13 | Tokyo Ohka Kogyo Co Ltd | 基板の処理装置および基板の処理方法 |
| EP2660851B1 (de) | 2009-03-18 | 2020-10-14 | EV Group GmbH | Vorrichtung und Verfahren zum Ablösen eines Wafers von einem Träger |
-
2006
- 2006-01-03 DE DE200610000687 patent/DE102006000687B4/de not_active Expired - Lifetime
- 2006-10-24 AT AT0178106A patent/AT503053B1/de active
- 2006-12-14 US US11/610,750 patent/US7910454B2/en active Active
-
2010
- 2010-11-01 US US12/916,734 patent/US8156981B2/en active Active
- 2010-11-01 US US12/916,751 patent/US8349701B2/en active Active
-
2012
- 2012-05-04 US US13/464,187 patent/US8536020B2/en active Active
- 2012-05-04 US US13/464,088 patent/US8293063B2/en active Active
-
2013
- 2013-06-12 US US13/915,908 patent/US8664082B2/en active Active
- 2013-07-22 US US13/947,265 patent/US8802542B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| AT503053B1 (de) | 2010-11-15 |
| US8536020B2 (en) | 2013-09-17 |
| US20130309840A1 (en) | 2013-11-21 |
| US8156981B2 (en) | 2012-04-17 |
| US20110045240A1 (en) | 2011-02-24 |
| US20130295746A1 (en) | 2013-11-07 |
| DE102006000687B4 (de) | 2010-09-09 |
| US8802542B2 (en) | 2014-08-12 |
| AT503053A2 (de) | 2007-07-15 |
| US20120216959A1 (en) | 2012-08-30 |
| US20120247640A1 (en) | 2012-10-04 |
| US8349701B2 (en) | 2013-01-08 |
| US7910454B2 (en) | 2011-03-22 |
| DE102006000687A1 (de) | 2007-07-12 |
| US8293063B2 (en) | 2012-10-23 |
| US20110042010A1 (en) | 2011-02-24 |
| US20070155129A1 (en) | 2007-07-05 |
| US8664082B2 (en) | 2014-03-04 |
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