ATA219387A - Stabfoermige magnetron- bzw. sputterkathodenanordnung, sputterverfahren, vorrichtung zur durchfuehrung des verfahrens und rohrfoermiges target - Google Patents

Stabfoermige magnetron- bzw. sputterkathodenanordnung, sputterverfahren, vorrichtung zur durchfuehrung des verfahrens und rohrfoermiges target

Info

Publication number
ATA219387A
ATA219387A AT0219387A AT219387A ATA219387A AT A219387 A ATA219387 A AT A219387A AT 0219387 A AT0219387 A AT 0219387A AT 219387 A AT219387 A AT 219387A AT A219387 A ATA219387 A AT A219387A
Authority
AT
Austria
Prior art keywords
sputter
implementing
rod
cathode arrangement
tubular target
Prior art date
Application number
AT0219387A
Other languages
English (en)
Other versions
AT392291B (de
Inventor
Walter Dipl Ing Gaertner
Franz Dipl Ing Dr Koroschetz
Alfred Dipl Ing D Wagendristel
Herwig Dipl Ing Dr Bangert
Original Assignee
Miba Gleitlager Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Miba Gleitlager Ag filed Critical Miba Gleitlager Ag
Priority to AT2193/87A priority Critical patent/AT392291B/de
Priority to US07/221,383 priority patent/US4904362A/en
Priority to EP88890192A priority patent/EP0300995B1/de
Priority to DE3852976T priority patent/DE3852976D1/de
Priority to JP63184442A priority patent/JPH01104770A/ja
Publication of ATA219387A publication Critical patent/ATA219387A/de
Application granted granted Critical
Publication of AT392291B publication Critical patent/AT392291B/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/02—Parts of sliding-contact bearings
    • F16C33/04—Brasses; Bushes; Linings
    • F16C33/06—Sliding surface mainly made of metal
    • F16C33/12—Structural composition; Use of special materials or surface treatments, e.g. for rust-proofing
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/02—Parts of sliding-contact bearings
    • F16C33/04—Brasses; Bushes; Linings
    • F16C33/06—Sliding surface mainly made of metal
    • F16C33/12—Structural composition; Use of special materials or surface treatments, e.g. for rust-proofing
    • F16C33/122—Multilayer structures of sleeves, washers or liners
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2204/00—Metallic materials; Alloys
    • F16C2204/20—Alloys based on aluminium
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2204/00—Metallic materials; Alloys
    • F16C2204/20—Alloys based on aluminium
    • F16C2204/24—Alloys based on aluminium with lead as the next major constituent
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2204/00—Metallic materials; Alloys
    • F16C2204/60—Ferrous alloys, e.g. steel alloys

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AT2193/87A 1987-07-24 1987-09-01 Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens AT392291B (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AT2193/87A AT392291B (de) 1987-09-01 1987-09-01 Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens
US07/221,383 US4904362A (en) 1987-07-24 1988-07-19 Bar-shaped magnetron or sputter cathode arrangement
EP88890192A EP0300995B1 (de) 1987-07-24 1988-07-20 Stabförmige Magnetron- bzw. Sputterkathodenanordnung, Sputterverfahren, Vorrichtung zur Durchführung des Verfahrens und rohrförmiges Target
DE3852976T DE3852976D1 (de) 1987-07-24 1988-07-20 Stabförmige Magnetron- bzw. Sputterkathodenanordnung, Sputterverfahren, Vorrichtung zur Durchführung des Verfahrens und rohrförmiges Target.
JP63184442A JPH01104770A (ja) 1987-07-24 1988-07-22 棒状の磁電管またはスパッタ陰極の配置、スパッタ方法、この方法を実施するための装置並びに管状のターゲット

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT2193/87A AT392291B (de) 1987-09-01 1987-09-01 Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens

Publications (2)

Publication Number Publication Date
ATA219387A true ATA219387A (de) 1988-09-15
AT392291B AT392291B (de) 1991-02-25

Family

ID=3529710

Family Applications (1)

Application Number Title Priority Date Filing Date
AT2193/87A AT392291B (de) 1987-07-24 1987-09-01 Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens

Country Status (1)

Country Link
AT (1) AT392291B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19514835C1 (de) * 1995-04-21 1997-01-23 Fraunhofer Ges Forschung Verfahren zur Herstellung gleitflächenseitig konkav gekrümmter Gleitelemente
DE19753656C1 (de) 1997-12-03 1998-12-03 Fraunhofer Ges Forschung Einrichtung zur Vakuumbeschichtung von Gleitlagern
US10900117B2 (en) * 2018-10-24 2021-01-26 Vapor Technologies, Inc. Plasma corridor for high volume PE-CVD processing
US10900116B2 (en) * 2018-10-24 2021-01-26 Vapor Technologies, Inc. PVD system with remote arc discharge plasma assisted process

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2707144A1 (de) * 1976-02-19 1977-08-25 Sloan Technology Corp Kathodenzerstaeubungsvorrichtung
NL7607473A (nl) * 1976-07-07 1978-01-10 Philips Nv Verstuifinrichting en werkwijze voor het ver- stuiven met een dergelijke inrichting.
DE2923174A1 (de) * 1979-06-08 1980-12-11 Demetron Sputtertarget auf traegerplatte
EP0045822B1 (de) * 1980-08-08 1985-05-29 Battelle Development Corporation Zylindrische Magnetron-Zerstäuberkathode
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4525264A (en) * 1981-12-07 1985-06-25 Ford Motor Company Cylindrical post magnetron sputtering system
US4521286A (en) * 1983-03-09 1985-06-04 Unisearch Limited Hollow cathode sputter etcher
US4519885A (en) * 1983-12-27 1985-05-28 Shatterproof Glass Corp. Method and apparatus for changing sputtering targets in a magnetron sputtering system

Also Published As

Publication number Publication date
AT392291B (de) 1991-02-25

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties