ATE111676T1 - Vorrichtung zum behandeln von plattenförmigen gegenständen, insbesondere leiterplatten. - Google Patents
Vorrichtung zum behandeln von plattenförmigen gegenständen, insbesondere leiterplatten.Info
- Publication number
- ATE111676T1 ATE111676T1 AT92110315T AT92110315T ATE111676T1 AT E111676 T1 ATE111676 T1 AT E111676T1 AT 92110315 T AT92110315 T AT 92110315T AT 92110315 T AT92110315 T AT 92110315T AT E111676 T1 ATE111676 T1 AT E111676T1
- Authority
- AT
- Austria
- Prior art keywords
- treatment
- circuit boards
- plate
- particular circuit
- surge
- Prior art date
Links
- 239000007921 spray Substances 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000012530 fluid Substances 0.000 abstract 1
- 238000011010 flushing procedure Methods 0.000 abstract 1
- 238000001465 metallisation Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0621—In horizontal cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
- B05B14/30—Arrangements for collecting, re-using or eliminating excess spraying material comprising enclosures close to, or in contact with, the object to be sprayed and surrounding or confining the discharged spray or jet but not the object to be sprayed
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0685—Spraying of electrolyte
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Sustainable Development (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Chemically Coating (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4121032A DE4121032A1 (de) | 1991-06-26 | 1991-06-26 | Vorrichtung zum behandeln von plattenfoermigen gegenstaenden, insbesondere leiterplatten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE111676T1 true ATE111676T1 (de) | 1994-09-15 |
Family
ID=6434742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT92110315T ATE111676T1 (de) | 1991-06-26 | 1992-06-18 | Vorrichtung zum behandeln von plattenförmigen gegenständen, insbesondere leiterplatten. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5335681A (de) |
| EP (1) | EP0520324B1 (de) |
| AT (1) | ATE111676T1 (de) |
| DE (2) | DE4121032A1 (de) |
| ES (1) | ES2060437T3 (de) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5483984A (en) * | 1992-07-10 | 1996-01-16 | Donlan, Jr.; Fraser P. | Fluid treatment apparatus and method |
| SE500772C2 (sv) * | 1992-11-25 | 1994-08-29 | Staffan Sjoeberg | Anordning för rengöring av föremål i rörelse |
| US5660642A (en) * | 1995-05-26 | 1997-08-26 | The Regents Of The University Of California | Moving zone Marangoni drying of wet objects using naturally evaporated solvent vapor |
| US5720813A (en) | 1995-06-07 | 1998-02-24 | Eamon P. McDonald | Thin sheet handling system |
| US5837067A (en) * | 1995-06-07 | 1998-11-17 | International Business Machines Corporation | Precision fluid head transport |
| DE19605602C1 (de) * | 1996-02-15 | 1997-11-20 | Singulus Technologies Gmbh | Vorrichtung zur Oberflächenbeschichtung bzw. zum Lackieren von Substraten |
| US5759427A (en) * | 1996-08-28 | 1998-06-02 | International Business Machines Corporation | Method and apparatus for polishing metal surfaces |
| US5893983A (en) * | 1996-08-28 | 1999-04-13 | International Business Machines Corporation | Technique for removing defects from a layer of metal |
| JP3317477B2 (ja) * | 1996-09-27 | 2002-08-26 | 本田技研工業株式会社 | ブランク材洗浄ブース及びブランク材洗浄装置 |
| DE29617525U1 (de) * | 1996-10-11 | 1996-12-12 | Josef Schiele oHG, 56651 Niederzissen | Lackierkopf |
| JP3245813B2 (ja) * | 1996-11-27 | 2002-01-15 | 東京エレクトロン株式会社 | 塗布膜形成装置 |
| US6258167B1 (en) | 1996-11-27 | 2001-07-10 | Tokyo Electron Limited | Process liquid film forming apparatus |
| JPH1133506A (ja) * | 1997-07-24 | 1999-02-09 | Tadahiro Omi | 流体処理装置及び洗浄処理システム |
| DE69803138T2 (de) | 1997-04-10 | 2002-11-14 | Hotani Co., Ltd. | Verfahren und Vorrichtung zur Reinigung von Metallbändern |
| US5954888A (en) * | 1998-02-09 | 1999-09-21 | Speedfam Corporation | Post-CMP wet-HF cleaning station |
| DE19827529A1 (de) * | 1998-06-22 | 1999-12-23 | Schmid Gmbh & Co Geb | Einrichtung zur Behandlung von Gegenständen, insbesondere Leiterplatten |
| US7136173B2 (en) * | 1998-07-09 | 2006-11-14 | Acm Research, Inc. | Method and apparatus for end-point detection |
| US6395152B1 (en) * | 1998-07-09 | 2002-05-28 | Acm Research, Inc. | Methods and apparatus for electropolishing metal interconnections on semiconductor devices |
| DE59810471D1 (de) * | 1998-08-07 | 2004-01-29 | Fritz-Herbert Frembgen | Verfahren und Vorrichtung zum elektrochemischen Bearbeiten von Werkstücken |
| EP0989790A1 (de) * | 1998-09-22 | 2000-03-29 | Agfa-Gevaert N.V. | Vorrichtung und Verfahren zur Behandlung von Substraten mit einer Ätzflüssigkeit |
| TW464970B (en) * | 1999-04-21 | 2001-11-21 | Sharp Kk | Ultrasonic cleaning device and resist-stripping device |
| DE19934300C2 (de) * | 1999-07-21 | 2002-02-07 | Steag Micro Tech Gmbh | Vorrichtung zum Behandeln von Substraten |
| US6270620B1 (en) * | 1999-09-14 | 2001-08-07 | World Wiser Electronics Inc. | Etching device |
| JP2003536270A (ja) | 2000-06-16 | 2003-12-02 | アプライド マテリアルズ インコーポレイテッド | 単一基板ウェット−ドライ一体型クラスター洗浄機 |
| CN1162718C (zh) * | 2000-07-11 | 2004-08-18 | 奥普逖娃公司 | 用于偏振镜生产的工艺装置 |
| RU2226285C2 (ru) * | 2000-07-11 | 2004-03-27 | ОПТИВА, Инк. | Устройство формирования поляризатора, устройство локального удаления материала пленки поляризатора и технологическая линия формирования поляризаторов |
| DE10039558B4 (de) * | 2000-08-12 | 2005-09-08 | Pill E.K. | Vorrichtung zur Sprühbehandlung von Leiterplatten |
| JP2002075947A (ja) * | 2000-08-30 | 2002-03-15 | Alps Electric Co Ltd | ウェット処理装置 |
| US6899111B2 (en) * | 2001-06-15 | 2005-05-31 | Applied Materials, Inc. | Configurable single substrate wet-dry integrated cluster cleaner |
| US6398875B1 (en) | 2001-06-27 | 2002-06-04 | International Business Machines Corporation | Process of drying semiconductor wafers using liquid or supercritical carbon dioxide |
| EP1446514A4 (de) * | 2001-11-13 | 2007-11-28 | Acm Res Inc | Elektropolieranordnung und verfahren zum elektropolieren von leitfähigen schichten |
| US20040031167A1 (en) | 2002-06-13 | 2004-02-19 | Stein Nathan D. | Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knife |
| US7389783B2 (en) * | 2002-09-30 | 2008-06-24 | Lam Research Corporation | Proximity meniscus manifold |
| KR100834827B1 (ko) * | 2006-11-16 | 2008-06-04 | 삼성전자주식회사 | 포토 마스크 세정장치 및 그의 세정방법 |
| DE102007028096B3 (de) * | 2007-06-19 | 2008-12-11 | Amtec Kistler Gmbh | Vorrichtung zum Auftragen eines Auftragmittels auf ein Substrat |
| US9377239B2 (en) * | 2007-11-15 | 2016-06-28 | Conocophillips Company | Dual-refluxed heavies removal column in an LNG facility |
| DE102009013180B3 (de) * | 2009-03-14 | 2010-07-01 | Fette Gmbh | Verfahren und Vorrichtung zur Abreinigung eines Absaugsystems für eine Rundläuferpresse |
| DE102009023766A1 (de) | 2009-05-22 | 2010-11-25 | Hübel, Egon, Dipl.-Ing. (FH) | Verfahren und Vorrichtung zur Nassbehandlung von ebenem Gut |
| CN101985752B (zh) * | 2009-07-28 | 2013-01-09 | 富葵精密组件(深圳)有限公司 | 喷蚀装置 |
| DE102010006126B4 (de) * | 2010-01-29 | 2012-08-02 | Düspohl Maschinenbau Gmbh | Vorrichtung zur Unterdruckapplikation von Primer |
| US20120064225A1 (en) * | 2010-09-13 | 2012-03-15 | Applied Materials, Inc. | Spray deposition module for an in-line processing system |
| CN102453915B (zh) * | 2010-10-27 | 2014-03-12 | 富葵精密组件(深圳)有限公司 | 蚀刻装置及使用该蚀刻装置蚀刻基板的方法 |
| US9393759B2 (en) * | 2013-10-24 | 2016-07-19 | General Electric Company | Metal laminate structures with systems and methods for treating |
| CN103639089A (zh) * | 2013-11-14 | 2014-03-19 | 上海和辉光电有限公司 | 显影剂喷涂装置及方法 |
| EP3072994B1 (de) * | 2015-03-27 | 2018-08-08 | ATOTECH Deutschland GmbH | Überflutungsvorrichtung für eine horizontale galvanische oder nasschemische prozesslinie zur metallabscheidung auf einem substrat |
| CN104741333B (zh) * | 2015-04-07 | 2017-04-05 | 合肥鑫晟光电科技有限公司 | 一种气流控制装置及其调节方法、基板清洗设备 |
| DE102015221646A1 (de) | 2015-11-04 | 2017-05-04 | Gebr. Schmid Gmbh | Behandlungsfluid-Absaugvorrichtung und diese enthaltende Ätzvorrichtung |
| TR201611090A2 (tr) * | 2016-08-08 | 2018-02-21 | Bora Saman | Çi̇ft katli ve bakir kapli boru üreti̇mi̇nde kullanilan sac levhalar i̇çi̇n bi̇r yikama düzeneği̇ |
| DE102017111173B4 (de) * | 2017-05-22 | 2019-10-17 | Dieffenbacher GmbH Maschinen- und Anlagenbau | Vorrichtung zum kontinuierlichen Aufbringen eines Trennmittels auf ein umlaufendes Band |
| CN108811350A (zh) * | 2018-07-04 | 2018-11-13 | 肇庆市创业帮信息技术有限公司 | 一种pcb蚀刻机 |
| CN115449799B (zh) * | 2022-08-12 | 2023-06-23 | 信丰正天伟电子科技有限公司 | 一种用于电镀后铜板的保护剂溶液浸入结构 |
| CN120885399B (zh) * | 2025-10-10 | 2025-12-30 | 江苏荣进电子有限公司 | 一种卧式铜箔涂胶干燥生产线的涂布结构 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3172780A (en) * | 1965-03-09 | Apparatus for treating textile filaments | ||
| US1576163A (en) * | 1924-12-05 | 1926-03-09 | George W Voelker | Vacuum seal for vacuum cloth hydroextractors |
| US1789132A (en) * | 1930-05-31 | 1931-01-13 | Birch Albert | Machine for extracting fluid from cloth or other material |
| US2164174A (en) * | 1935-09-14 | 1939-06-27 | Lamson Co | Hydroextractor |
| US2499572A (en) * | 1947-02-14 | 1950-03-07 | Paul H Dunakin | Ink drier for printing presses |
| US2471330A (en) * | 1947-02-17 | 1949-05-24 | Paper Chemistry Inst | Method of continuously coating porous sheets |
| US3045273A (en) * | 1956-12-27 | 1962-07-24 | Oxy Dry Sprayer Corp | Cleaning and tension control systems for paper and other products |
| SE304576B (de) * | 1965-04-26 | 1968-09-30 | Tepar Ag | |
| US3956790A (en) * | 1969-11-18 | 1976-05-18 | Fuji Photo Film Co., Ltd. | Method of apparatus for removing dust from the surface of a moving web |
| US3749053A (en) * | 1971-11-01 | 1973-07-31 | Polaroid Corp | Coating apparatus |
| GB1444138A (en) * | 1973-09-08 | 1976-07-28 | Coriarii Est | Device for use in removing cust from dressed skins or hides |
| SE419946B (sv) * | 1974-10-16 | 1981-09-07 | Inventing Ab | Sett och anordning for bestrykning av en lopande bana |
| US4173945A (en) * | 1975-02-27 | 1979-11-13 | Xerox Corporation | Electrostatic printing machine with improved web-developing system |
| DE2619821A1 (de) * | 1976-05-05 | 1977-11-17 | Hoechst Ag | Verfahren und vorrichtung zur kontinuierlichen elektrolytischen behandlung eines metallbandes |
| US4044716A (en) * | 1976-05-06 | 1977-08-30 | Milliken Research Corporation | Vacuum slot coating apparatus |
| US4288475A (en) * | 1979-10-22 | 1981-09-08 | Meeker Brian L | Method and apparatus for impregnating a fibrous web |
| US4773110A (en) * | 1982-09-13 | 1988-09-27 | Dexter Chemical Corporation | Foam finishing apparatus and method |
| US4736221A (en) * | 1985-10-18 | 1988-04-05 | Fuji Photo Film Co., Ltd. | Method and device for processing photographic film using atomized liquid processing agents |
| US4926520A (en) * | 1987-07-31 | 1990-05-22 | Watson Claude F | Method and apparatus for cleaning carpet tiles |
| BE1001295A6 (fr) * | 1987-12-11 | 1989-09-19 | Centre Rech Metallurgique | Dispositif pour le depot electrolytique d'un metal et son procede d'utilisation. |
| DE3813518A1 (de) * | 1988-04-22 | 1989-11-02 | Hoellmueller Maschbau H | Maschine zum reinigen und/oder spuelen von bohrungen in leiterplatten |
| US4968534A (en) * | 1989-01-17 | 1990-11-06 | Npd Corp. | Method and apparatus for pattern impregnation of a porous web |
-
1991
- 1991-06-26 DE DE4121032A patent/DE4121032A1/de not_active Withdrawn
-
1992
- 1992-06-18 EP EP92110315A patent/EP0520324B1/de not_active Expired - Lifetime
- 1992-06-18 ES ES92110315T patent/ES2060437T3/es not_active Expired - Lifetime
- 1992-06-18 DE DE59200493T patent/DE59200493D1/de not_active Expired - Fee Related
- 1992-06-18 AT AT92110315T patent/ATE111676T1/de active
- 1992-06-22 US US07/902,320 patent/US5335681A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE59200493D1 (de) | 1994-10-20 |
| EP0520324A1 (de) | 1992-12-30 |
| US5335681A (en) | 1994-08-09 |
| DE4121032A1 (de) | 1993-01-07 |
| ES2060437T3 (es) | 1994-11-16 |
| EP0520324B1 (de) | 1994-09-14 |
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