ATE113667T1 - Verfahren zur partikelentfernung von substratoberflächen. - Google Patents

Verfahren zur partikelentfernung von substratoberflächen.

Info

Publication number: ATE113667T1
Authority: AT; Austria
Prior art keywords: substrates; coating; coated; vacuum; pvd
Prior art date: 1989-02-01

Application number

AT90200193T

Other languages

English (en)

Inventor

Horst-Christian Langowski

Original Assignee

Philips & Du Pont Optical

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-02-01

Filing date

1990-01-29

Publication date

1994-11-15

1990-01-29 Application filed by Philips & Du Pont Optical filed Critical Philips & Du Pont Optical

1994-11-15 Application granted granted Critical

1994-11-15 Publication of ATE113667T1 publication Critical patent/ATE113667T1/de

Links

238000000034 method Methods 0.000 title abstract 4
239000002245 particle Substances 0.000 title abstract 4
239000000758 substrate Substances 0.000 abstract 6
238000005240 physical vapour deposition Methods 0.000 abstract 4
239000011248 coating agent Substances 0.000 abstract 3
238000000576 coating method Methods 0.000 abstract 3
238000001771 vacuum deposition Methods 0.000 abstract 2
230000007547 defect Effects 0.000 abstract 1
238000000151 deposition Methods 0.000 abstract 1
238000006073 displacement reaction Methods 0.000 abstract 1
239000011888 foil Substances 0.000 abstract 1
239000011521 glass Substances 0.000 abstract 1
230000003287 optical effect Effects 0.000 abstract 1
239000004033 plastic Substances 0.000 abstract 1
229920003023 plastic Polymers 0.000 abstract 1
238000004544 sputter deposition Methods 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Weting (AREA)

AT90200193T 1989-02-01 1990-01-29 Verfahren zur partikelentfernung von substratoberflächen. ATE113667T1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE3902862A DE3902862A1 (de)	1989-02-01	1989-02-01	Verfahren zur entfernung von partikeln auf substratoberflaechen

Publications (1)

Publication Number	Publication Date
ATE113667T1 true ATE113667T1 (de)	1994-11-15

Family

ID=6373166

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT90200193T ATE113667T1 (de)	1989-02-01	1990-01-29	Verfahren zur partikelentfernung von substratoberflächen.

Country Status (6)

Country	Link
US (1)	US4996078A (de)
EP (1)	EP0381278B1 (de)
JP (1)	JPH02240254A (de)
AT (1)	ATE113667T1 (de)
CA (1)	CA2008765A1 (de)
DE (2)	DE3902862A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH06349916A (ja) *	1993-04-30	1994-12-22	Applied Materials Inc	基板上の粒子検出方法及び装置
CA2130388A1 (en) *	1993-09-23	1995-03-24	Joel L. Williams	Process for barrier coating of plastic objects
EP0987700B1 (de) *	1997-05-08	2004-08-25	Matsushita Electric Industrial Co., Ltd.	Vorrichtung und verfahren zur herstellung eines aufzeichnungsträgers
US6080650A (en) *	1998-02-04	2000-06-27	Texas Instruments Incorporated	Method and apparatus for attaching particles to a substrate
FR2885995B1 (fr) *	2005-05-20	2007-07-06	Eurokera	Plaque vitroceramique et son procede de fabrication
KR101331213B1 (ko) *	2007-06-05	2013-11-20	삼성디스플레이 주식회사	기판 가공장치
US20170038658A1 (en)	2011-09-30	2017-02-09	View, Inc.	Particle removal during fabrication of electrochromic devices
US9186709B2 (en) *	2011-03-23	2015-11-17	Sri International	Active electroadhesive cleaning
US9358590B2 (en)	2011-03-23	2016-06-07	Sri International	Electroadhesive surface cleaner
CN110402301B (zh)	2016-11-10	2022-07-29	康宁公司	溅镀沉积期间的颗粒减少
US20230043866A1 (en) *	2021-08-06	2023-02-09	The Regents Of The University Of Colorado, A Body Corporate	Methods and devices for cleaning dust from a surface

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS60141869A (ja) *	1983-12-29	1985-07-26	Nissin Electric Co Ltd	膜形成方法および膜形成装置
DD263084A1 (de) *	1987-07-27	1988-12-21	Akad Wissenschaften Ddr	Verfahren zur herstellung homogener und haftfester metallschichten

1989
- 1989-02-01 DE DE3902862A patent/DE3902862A1/de not_active Withdrawn
1990
- 1990-01-26 US US07/471,184 patent/US4996078A/en not_active Expired - Fee Related
- 1990-01-29 EP EP90200193A patent/EP0381278B1/de not_active Expired - Lifetime
- 1990-01-29 CA CA002008765A patent/CA2008765A1/en not_active Abandoned
- 1990-01-29 AT AT90200193T patent/ATE113667T1/de not_active IP Right Cessation
- 1990-01-29 DE DE69013707T patent/DE69013707T2/de not_active Expired - Fee Related
- 1990-02-01 JP JP2020523A patent/JPH02240254A/ja active Pending

Also Published As

Publication number	Publication date
EP0381278B1 (de)	1994-11-02
DE69013707T2 (de)	1995-06-08
DE3902862A1 (de)	1990-08-02
US4996078A (en)	1991-02-26
EP0381278A1 (de)	1990-08-08
CA2008765A1 (en)	1990-08-01
DE69013707D1 (de)	1994-12-08
JPH02240254A (ja)	1990-09-25

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Legal Events

Date	Code	Title	Description
1995-05-15	RER	Ceased as to paragraph 5 lit. 3 law introducing patent treaties