ATE115645T1 - Verfahren zum aufdampfen eines diamantähnlichen films auf ein niedrig schmelzendes substrat. - Google Patents
Verfahren zum aufdampfen eines diamantähnlichen films auf ein niedrig schmelzendes substrat.Info
- Publication number
- ATE115645T1 ATE115645T1 AT91300010T AT91300010T ATE115645T1 AT E115645 T1 ATE115645 T1 AT E115645T1 AT 91300010 T AT91300010 T AT 91300010T AT 91300010 T AT91300010 T AT 91300010T AT E115645 T1 ATE115645 T1 AT E115645T1
- Authority
- AT
- Austria
- Prior art keywords
- substrate
- chamber
- diamond
- pressure
- differentially evacuated
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 9
- 230000008020 evaporation Effects 0.000 title 1
- 238000001704 evaporation Methods 0.000 title 1
- 230000008018 melting Effects 0.000 title 1
- 238000002844 melting Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 5
- 229910052799 carbon Inorganic materials 0.000 abstract 5
- 230000005684 electric field Effects 0.000 abstract 2
- 238000010894 electron beam technology Methods 0.000 abstract 2
- 239000007789 gas Substances 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 abstract 2
- 239000007787 solid Substances 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 238000009825 accumulation Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 230000008016 vaporization Effects 0.000 abstract 1
- 238000009834 vaporization Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41784990A | 1990-01-29 | 1990-01-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE115645T1 true ATE115645T1 (de) | 1994-12-15 |
Family
ID=23655625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT91300010T ATE115645T1 (de) | 1990-01-29 | 1991-01-02 | Verfahren zum aufdampfen eines diamantähnlichen films auf ein niedrig schmelzendes substrat. |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0440326B1 (de) |
| AT (1) | ATE115645T1 (de) |
| DE (1) | DE69105764T2 (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5401543A (en) * | 1993-11-09 | 1995-03-28 | Minnesota Mining And Manufacturing Company | Method for forming macroparticle-free DLC films by cathodic arc discharge |
| GB9405029D0 (en) * | 1994-03-15 | 1994-04-27 | Franks Joseph Dr | Improved catheters and other tubular inserts |
| US5569487A (en) * | 1995-01-23 | 1996-10-29 | General Electric Company | Capacitor dielectrics of silicon-doped amorphous hydrogenated carbon |
| GB9709071D0 (en) * | 1997-05-02 | 1997-06-25 | Howmedica | A process for improving start up and steady rate friction of soft/compliant polyurethanes |
| CN1049931C (zh) * | 1997-07-10 | 2000-03-01 | 北京理工大学 | 制备类金刚石薄膜的电化学沉积方法及其装置 |
| MY134338A (en) * | 2001-08-24 | 2007-12-31 | Asml Us Inc | Atmospheric pressure wafer processing reactor having an internal pressure control system and method |
| US7866342B2 (en) | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
| US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
| US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
| US8555921B2 (en) | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
| DE102013014147B4 (de) * | 2013-08-23 | 2017-02-16 | Centrotherm Photovoltaics Ag | Verfahren und vorrichtung zum detektieren einer plasmazündung |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3756193A (en) * | 1972-05-01 | 1973-09-04 | Battelle Memorial Institute | Coating apparatus |
| US4725345A (en) * | 1985-04-22 | 1988-02-16 | Kabushiki Kaisha Kenwood | Method for forming a hard carbon thin film on article and applications thereof |
| US4777090A (en) * | 1986-11-03 | 1988-10-11 | Ovonic Synthetic Materials Company | Coated article and method of manufacturing the article |
-
1991
- 1991-01-02 EP EP91300010A patent/EP0440326B1/de not_active Expired - Lifetime
- 1991-01-02 AT AT91300010T patent/ATE115645T1/de not_active IP Right Cessation
- 1991-01-02 DE DE69105764T patent/DE69105764T2/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE69105764D1 (de) | 1995-01-26 |
| EP0440326B1 (de) | 1994-12-14 |
| EP0440326A1 (de) | 1991-08-07 |
| DE69105764T2 (de) | 1995-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |