ATE121555T1 - Optische vorrichtungen und methoden für ihre herstellung. - Google Patents

Optische vorrichtungen und methoden für ihre herstellung.

Info

Publication number
ATE121555T1
ATE121555T1 AT89904172T AT89904172T ATE121555T1 AT E121555 T1 ATE121555 T1 AT E121555T1 AT 89904172 T AT89904172 T AT 89904172T AT 89904172 T AT89904172 T AT 89904172T AT E121555 T1 ATE121555 T1 AT E121555T1
Authority
AT
Austria
Prior art keywords
cylinder
production
methods
optical devices
section
Prior art date
Application number
AT89904172T
Other languages
English (en)
Inventor
Roy Jonathan Rosser
Original Assignee
Rosser Roy J
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB888805776A external-priority patent/GB8805776D0/en
Priority claimed from GB888816374A external-priority patent/GB8816374D0/en
Priority claimed from GB888830403A external-priority patent/GB8830403D0/en
Application filed by Rosser Roy J filed Critical Rosser Roy J
Application granted granted Critical
Publication of ATE121555T1 publication Critical patent/ATE121555T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Saccharide Compounds (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Optical Integrated Circuits (AREA)
  • Particle Accelerators (AREA)
  • Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
AT89904172T 1988-03-11 1989-03-13 Optische vorrichtungen und methoden für ihre herstellung. ATE121555T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB888805776A GB8805776D0 (en) 1988-03-11 1988-03-11 Grazing incidence reflecting optics for expanding & collamating synchrotron radiation
GB888816374A GB8816374D0 (en) 1988-07-08 1988-07-08 Mirror that expands collimates & homogenizes x-rays emmitted by synchrotron source for lithography
GB888830403A GB8830403D0 (en) 1988-12-30 1988-12-30 Optical devices and methods of fabrication thereof

Publications (1)

Publication Number Publication Date
ATE121555T1 true ATE121555T1 (de) 1995-05-15

Family

ID=27263818

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89904172T ATE121555T1 (de) 1988-03-11 1989-03-13 Optische vorrichtungen und methoden für ihre herstellung.

Country Status (6)

Country Link
EP (1) EP0403561B1 (de)
JP (1) JPH03504271A (de)
AT (1) ATE121555T1 (de)
DE (1) DE68922306T2 (de)
GB (1) GB2217036B (de)
WO (1) WO1989008920A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2302598B (en) * 1988-09-02 1997-08-13 Marconi Gec Ltd Reflective scatter detector
GB9006493D0 (en) * 1990-03-22 1990-05-23 Rosser Roy J Mirrors
US5394451A (en) * 1991-10-08 1995-02-28 Canon Kabushiki Kaisha Optical arrangement for exposure apparatus
DE9317031U1 (de) * 1993-11-08 1994-03-31 Installation Européenne de Rayonnement Synchrotron (European Synchrotron Radiation Facility) E.S.R.F., Grenoble Doppelkristall-Monochromator
DE19931848A1 (de) * 1999-07-09 2001-01-11 Zeiss Carl Fa Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen
DE50014428D1 (de) * 1999-07-30 2007-08-02 Zeiss Carl Smt Ag Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems
US6421417B1 (en) * 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
DE19954520A1 (de) * 1999-11-12 2001-05-17 Helmut Fischer Gmbh & Co Vorrichtung zur Führung von Röntgenstrahlen
ATE421152T1 (de) * 2002-06-19 2009-01-15 Xenocs Optische vorrichtung für röntgenstrahlungsanwendungen
JP2007114327A (ja) * 2005-10-19 2007-05-10 Matsushita Electric Ind Co Ltd 回転式反射鏡および回転表示装置
DE102014208770A1 (de) 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
KR102601220B1 (ko) 2015-03-02 2023-11-09 에이에스엠엘 네델란즈 비.브이. 방사선 시스템
CN107428587A (zh) * 2015-04-10 2017-12-01 旭硝子株式会社 玻璃板
KR101897869B1 (ko) * 2016-07-07 2018-10-04 고려대학교 산학협력단 비구면거울이 내장된 레이저수술장치
CN110133776A (zh) * 2019-05-23 2019-08-16 深圳市华讯方舟太赫兹科技有限公司 曲面反射镜及应用其的太赫兹成像检测装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB318147A (en) * 1928-08-28 1930-06-05 Zeiss Ikon Ag Improvements in reflectors for a punctiform source of light
GB512319A (en) * 1938-01-25 1939-09-01 Alfred Whitaker Improvements in or relating to apparatus adapted to radiate energy and reflectors therefor
US4028547A (en) * 1975-06-30 1977-06-07 Bell Telephone Laboratories, Incorporated X-ray photolithography
US4116540A (en) * 1976-06-25 1978-09-26 Thomas David E Non-perverting mirror
US4538886A (en) * 1983-04-19 1985-09-03 Stellar Energy Ststems, Inc. Circular arc solar concentrator

Also Published As

Publication number Publication date
DE68922306T2 (de) 1995-11-02
EP0403561B1 (de) 1995-04-19
WO1989008920A1 (en) 1989-09-21
GB2217036B (en) 1992-08-12
GB8905743D0 (en) 1989-04-26
EP0403561A1 (de) 1990-12-27
GB2217036A (en) 1989-10-18
DE68922306D1 (de) 1995-05-24
JPH03504271A (ja) 1991-09-19

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