ATE138049T1 - Oxidpulver, sinterkörper, verfahren zu dessen herstellung und daraus zusammengesetztes target - Google Patents

Oxidpulver, sinterkörper, verfahren zu dessen herstellung und daraus zusammengesetztes target

Info

Publication number
ATE138049T1
ATE138049T1 AT90302147T AT90302147T ATE138049T1 AT E138049 T1 ATE138049 T1 AT E138049T1 AT 90302147 T AT90302147 T AT 90302147T AT 90302147 T AT90302147 T AT 90302147T AT E138049 T1 ATE138049 T1 AT E138049T1
Authority
AT
Austria
Prior art keywords
oxide powder
indium
tin
sintered body
particle diameter
Prior art date
Application number
AT90302147T
Other languages
English (en)
Inventor
Tetsushi Iwamoto
Nobuhiro Ogawa
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Application granted granted Critical
Publication of ATE138049T1 publication Critical patent/ATE138049T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00—Compounds of gallium, indium or thallium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
AT90302147T 1989-02-28 1990-02-28 Oxidpulver, sinterkörper, verfahren zu dessen herstellung und daraus zusammengesetztes target ATE138049T1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP4545789 1989-02-28
JP4545889 1989-02-28
JP4545589 1989-02-28
JP4545689 1989-02-28

Publications (1)

Publication Number Publication Date
ATE138049T1 true ATE138049T1 (de) 1996-06-15

Family

ID=27461706

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90302147T ATE138049T1 (de) 1989-02-28 1990-02-28 Oxidpulver, sinterkörper, verfahren zu dessen herstellung und daraus zusammengesetztes target

Country Status (5)

Country Link
US (1) US5071800A (de)
EP (1) EP0386932B1 (de)
KR (1) KR950010806B1 (de)
AT (1) ATE138049T1 (de)
DE (1) DE69026973T2 (de)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4124471C1 (en) * 1991-07-24 1992-06-11 Degussa Ag, 6000 Frankfurt, De Target for cathodic sputtering - produced from partially reduced mixtures of indium oxide and tin oxide by hot pressing in inert protective gas
US5480531A (en) * 1991-07-24 1996-01-02 Degussa Aktiengesellschaft Target for cathode sputtering and method of its production
FR2685011B1 (fr) * 1991-12-13 1994-02-04 Elf Aquitaine Ste Nale Procede de preparation d'un element de cible pour pulverisation cathodique et cibles, notamment de grande surface, realisees a partir de cet element.
DE69303126T2 (de) * 1992-08-19 1996-11-28 Tosoh Corp Verfahren zur Herstellung eines Indiumoxidpulvers verwendbar für einen ITO-Sinterkörper mit hoher Dichte
JPH06158308A (ja) * 1992-11-24 1994-06-07 Hitachi Metals Ltd インジウム・スズ酸化物膜用スパッタリング用ターゲットおよびその製造方法
US5417816A (en) * 1992-12-09 1995-05-23 Nikko Kyodo, Ltd. Process for preparation of indium oxide-tin oxide powder
US5433901A (en) * 1993-02-11 1995-07-18 Vesuvius Crucible Company Method of manufacturing an ITO sintered body
US5580496A (en) * 1993-04-05 1996-12-03 Sumitomo Metal Mining Company Limited Raw material for producing powder of indium-tin oxide aciculae and method of producing the raw material, powder of indium-tin oxide aciculae and method of producing the powder, electroconductive paste and light-transmitting
DE4407774C1 (de) * 1994-03-09 1995-04-20 Leybold Materials Gmbh Target für die Kathodenzerstäubung zur Herstellung transparenter, leitfähiger Schichten und Verfahren zu seiner Herstellung
DE4413344A1 (de) * 1994-04-18 1995-10-19 Leybold Materials Gmbh Verfahren zur Herstellung teilreduzierter Indiumoxid-Zinnoxid Targets
DE4427060C1 (de) * 1994-07-29 1995-11-30 Heraeus Gmbh W C Bauteil aus Indium-Zinn-Oxid und Verfahren für seine Herstellung
DE4438323C1 (de) * 1994-10-27 1995-07-27 Leybold Materials Gmbh Verfahren zum Recyceln von abgesputterten Indiumoxid-Zinnoxid-Targets
DE19508898A1 (de) 1995-03-11 1996-09-12 Leybold Materials Gmbh Indiumoxid/Zinnoxid Sputtertarget für die Kathodenzerstäubung
US6033620A (en) * 1995-04-18 2000-03-07 Tosoh Corporation Process of preparing high-density sintered ITO compact and sputtering target
US6027673A (en) * 1995-11-21 2000-02-22 The Aerospace Corporation Method of making indium oxide microspheres for antistatic coatings
US5866493A (en) * 1995-11-30 1999-02-02 Korea Academy Of Industrial Technology Method of manufacturing a sintered body of indium tin oxide
NL1004635C2 (nl) * 1995-12-06 1999-01-12 Sumitomo Chemical Co Indiumoxyde-tinoxydepoeders en werkwijze voor het voortbrengen daarvan.
CA2241286A1 (en) * 1995-12-26 1997-07-03 Monsanto Company Electrochromic tin oxide
US5876633A (en) * 1995-12-26 1999-03-02 Monsanto Company Electrochromic metal oxides
JPH10133216A (ja) * 1996-11-01 1998-05-22 Hitachi Ltd アクティブマトリクス型液晶表示装置
JP3781878B2 (ja) * 1996-10-04 2006-05-31 同和鉱業株式会社 Ｉｔｏ焼結体およびｉｔｏスパッタリングターゲット
JP3862385B2 (ja) * 1996-11-08 2006-12-27 Ｄｏｗａホールディングス株式会社 酸化スズ含有酸化インジウム粉及び焼結体の製造方法
JP3931363B2 (ja) * 1996-12-20 2007-06-13 東ソー株式会社 Ｉｔｏ焼結体の製造法
DE19721649C2 (de) * 1997-05-23 2003-02-20 Heraeus Gmbh W C Verfahren zur Herstellung eines Mischkristallpulvers mit geringem spezifischen elektrischen Widerstand
JP2972996B2 (ja) * 1997-12-02 1999-11-08 三井金属鉱業株式会社 Ｉｔｏ微粉末及びその製造方法
US6500225B2 (en) * 1998-12-03 2002-12-31 Sumitomo Chemical Company, Limited Method for producing high density indium-tin-oxide sintered body
JP3585033B2 (ja) * 2000-04-29 2004-11-04 喜萬 中山 カーボンナノコイル生成用のインジウム・スズ・鉄系触媒の製造方法
US6929772B2 (en) * 2001-03-28 2005-08-16 Nikko Materials Co., Ltd. Manufacturing method of ito powder with tin dissolved in indium oxide, and manufacturing method of ito target
DE10129376A1 (de) * 2001-06-20 2003-01-09 Degussa Indium-Zinn-Oxide
TW570909B (en) * 2001-06-26 2004-01-11 Mitsui Mining & Smelting Co Sputtering target for forming transparent conductive film of high electric resistance and method for producing transparent conductive film of high electric resistance
CN100513316C (zh) * 2003-12-25 2009-07-15 三井金属矿业株式会社 氧化铟-氧化锡粉体和利用该粉体的溅射靶
GB0411945D0 (en) * 2004-05-28 2004-06-30 Ici Plc Mixed metal oxides
DE102004037210A1 (de) * 2004-07-30 2006-03-23 Nanogate Advanced Materials Gmbh Multifunktionsadditiv
DE102004039358A1 (de) * 2004-08-12 2006-02-23 Merck Patent Gmbh Härtungsbeschleuniger
EP3360855B1 (de) 2006-05-18 2020-03-18 Hydro-Quebec Herstellungsverfahren von keramiken, so erhaltene keramiken und ihre verwendung als zielscheibe für kathodenzerstäubung
CA2547091A1 (fr) * 2006-05-18 2007-11-18 Hydro Quebec Procede de preparation de ceramiques, ceramiques ainsi obtenues et leurs utilisations notamment comme cible pour pulverisation cathodique
WO2008134516A2 (en) * 2007-04-27 2008-11-06 Honeywell International Inc. Novel manufacturing design and processing methods and apparatus for sputtering targets
CA2688335C (en) 2007-05-29 2015-07-21 Innova Materials, Llc Surfaces having particles and related methods
GB2459917B (en) * 2008-05-12 2013-02-27 Sinito Shenzhen Optoelectrical Advanced Materials Company Ltd A process for the manufacture of a high density ITO sputtering target
JP5122527B2 (ja) * 2008-06-18 2013-01-16 住友化学株式会社 チタン酸アルミニウムマグネシウムの製造方法
WO2010022353A1 (en) 2008-08-21 2010-02-25 Innova Meterials, Llc Enhanced surfaces, coatings, and related methods
JP5988974B2 (ja) 2010-08-07 2016-09-07 ティーピーケイ ホールディング カンパニー リミテッド 表面埋込添加物を有する素子構成要素および関連製造方法
WO2013003638A2 (en) * 2011-06-28 2013-01-03 Arjun Daniel Srinivas Transparent conductors incorporating additives and related manufacturing methods
KR101297581B1 (ko) * 2011-08-17 2013-08-19 전북대학교산학협력단 Ｉｚｔｏ 미세분말 및 이의 제조방법
US9981900B2 (en) 2014-04-12 2018-05-29 Cn Innovations Methods of metal oxide nanocrystals preparation

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3300525A1 (de) * 1983-01-10 1984-07-12 Merck Patent Gmbh, 6100 Darmstadt Targets fuer die kathodenzerstaeubung
JPS63199862A (ja) * 1987-02-17 1988-08-18 Asahi Glass Co Ltd 錫を含む物理蒸着用酸化インジウム焼結体
DE68924095T2 (de) * 1988-05-16 1996-04-04 Tosoh Corp Verfahren zur Herstellung eines Sputtertargets zur Erzeugung einer elektrisch leitenden, durchsichtigen Schicht.

Also Published As

Publication number Publication date
KR950010806B1 (ko) 1995-09-23
US5071800A (en) 1991-12-10
DE69026973D1 (de) 1996-06-20
EP0386932B1 (de) 1996-05-15
DE69026973T2 (de) 1996-10-02
EP0386932A1 (de) 1990-09-12
KR910015498A (ko) 1991-09-30

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee