ATE14145T1 - Verfahren zum ueberziehen eines substrates mit einem anorganischen oxid und vorrichtung zur anwendung dieses verfahrens. - Google Patents

Verfahren zum ueberziehen eines substrates mit einem anorganischen oxid und vorrichtung zur anwendung dieses verfahrens.

Info

Publication number
ATE14145T1
ATE14145T1 AT82810096T AT82810096T ATE14145T1 AT E14145 T1 ATE14145 T1 AT E14145T1 AT 82810096 T AT82810096 T AT 82810096T AT 82810096 T AT82810096 T AT 82810096T AT E14145 T1 ATE14145 T1 AT E14145T1
Authority
AT
Austria
Prior art keywords
pct
coating
substrate
gases
applying
Prior art date
Application number
AT82810096T
Other languages
English (en)
Inventor
Otto Baumberger
Reinhard Kalbskopf
Original Assignee
Battelle Memorial Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle Memorial Institute filed Critical Battelle Memorial Institute
Application granted granted Critical
Publication of ATE14145T1 publication Critical patent/ATE14145T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/10—Spray pistols; Apparatus for discharge producing a swirling discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
AT82810096T 1981-03-06 1982-03-04 Verfahren zum ueberziehen eines substrates mit einem anorganischen oxid und vorrichtung zur anwendung dieses verfahrens. ATE14145T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH152081A CH640571A5 (fr) 1981-03-06 1981-03-06 Procede et dispositif pour deposer sur un substrat une couche de matiere minerale.
EP82810096A EP0060221B1 (de) 1981-03-06 1982-03-04 Verfahren zum Überziehen eines Substrates mit einem anorganischen Oxid und Vorrichtung zur Anwendung dieses Verfahrens

Publications (1)

Publication Number Publication Date
ATE14145T1 true ATE14145T1 (de) 1985-07-15

Family

ID=4212358

Family Applications (1)

Application Number Title Priority Date Filing Date
AT82810096T ATE14145T1 (de) 1981-03-06 1982-03-04 Verfahren zum ueberziehen eines substrates mit einem anorganischen oxid und vorrichtung zur anwendung dieses verfahrens.

Country Status (7)

Country Link
US (2) US4476158A (de)
EP (1) EP0060221B1 (de)
JP (1) JPS58500173A (de)
AT (1) ATE14145T1 (de)
CH (1) CH640571A5 (de)
DE (1) DE3264486D1 (de)
WO (1) WO1982003093A1 (de)

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4524718A (en) * 1982-11-22 1985-06-25 Gordon Roy G Reactor for continuous coating of glass
WO1985003460A1 (en) * 1984-02-13 1985-08-15 Schmitt Jerome J Iii Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby
US4696837A (en) * 1985-06-25 1987-09-29 M&T Chemicals Inc. Chemical vapor deposition method of producing fluorine-doped tin oxide coatings
US5391232A (en) * 1985-12-26 1995-02-21 Canon Kabushiki Kaisha Device for forming a deposited film
US4747367A (en) * 1986-06-12 1988-05-31 Crystal Specialties, Inc. Method and apparatus for producing a constant flow, constant pressure chemical vapor deposition
US4761269A (en) * 1986-06-12 1988-08-02 Crystal Specialties, Inc. Apparatus for depositing material on a substrate
EP0254651B1 (de) * 1986-06-28 1991-09-04 Nihon Shinku Gijutsu Kabushiki Kaisha Verfahren und Vorrichtung zum Beschichten unter Anwendung einer CVD-Beschichtungstechnik
US4775203A (en) * 1987-02-13 1988-10-04 General Electric Company Optical scattering free metal oxide films and methods of making the same
US4880664A (en) * 1987-08-31 1989-11-14 Solarex Corporation Method of depositing textured tin oxide
US4853257A (en) * 1987-09-30 1989-08-01 Ppg Industries, Inc. Chemical vapor deposition of tin oxide on float glass in the tin bath
US4980204A (en) * 1987-11-27 1990-12-25 Fujitsu Limited Metal organic chemical vapor deposition method with controlled gas flow rate
US5167718A (en) * 1988-06-23 1992-12-01 Jeffrey Stewart Parylene deposition chamber and method of use
US6406544B1 (en) 1988-06-23 2002-06-18 Jeffrey Stewart Parylene deposition chamber and method of use
US4945856A (en) * 1988-06-23 1990-08-07 Jeffrey Stewart Parylene deposition chamber
US5078091A (en) * 1988-06-23 1992-01-07 Jeffrey Stewart Parylene deposition chamber and method of use
US4951603A (en) * 1988-09-12 1990-08-28 Daidousanso Co., Ltd. Apparatus for producing semiconductors
US4979465A (en) * 1989-04-03 1990-12-25 Daidousanso Co., Ltd. Apparatus for producing semiconductors
US5090985A (en) * 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
JP2860505B2 (ja) * 1991-02-25 1999-02-24 シメトリックス コーポレーション 材料蒸着装置
US5124180A (en) * 1991-03-11 1992-06-23 Btu Engineering Corporation Method for the formation of fluorine doped metal oxide films
US5268033A (en) * 1991-07-01 1993-12-07 Jeffrey Stewart Table top parylene deposition chamber
US5422534A (en) * 1992-11-18 1995-06-06 General Electric Company Tantala-silica interference filters and lamps using same
US5488833A (en) * 1994-09-26 1996-02-06 Stewart; Jeffrey Tangential flow cold trap
US5741363A (en) * 1996-03-22 1998-04-21 Advanced Technology Materials, Inc. Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition
US5698262A (en) * 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
US6039812A (en) * 1996-10-21 2000-03-21 Abb Research Ltd. Device for epitaxially growing objects and method for such a growth
US5888303A (en) * 1997-04-07 1999-03-30 R.E. Dixon Inc. Gas inlet apparatus and method for chemical vapor deposition reactors
US5882725A (en) * 1997-07-01 1999-03-16 Para Tech Coating, Inc. Parylene deposition chamber including eccentric part tumbler
US6527865B1 (en) 1997-09-11 2003-03-04 Applied Materials, Inc. Temperature controlled gas feedthrough
US6258170B1 (en) * 1997-09-11 2001-07-10 Applied Materials, Inc. Vaporization and deposition apparatus
DE19923591A1 (de) * 1999-05-21 2000-11-23 Fleissner Maschf Gmbh Co Vorrichtung mit einem Düsenbalken zur Erzeugung von Flüssigkeitsstrahlen zur Strahlbeaufschlagung der Fasern einer Warenbahn
US7513815B2 (en) * 1999-12-23 2009-04-07 General Electric Company Optimal silicon dioxide protection layer thickness for silver lamp reflector
US6382816B1 (en) 1999-12-23 2002-05-07 General Eectric Company Protected coating for energy efficient lamp
US6544339B1 (en) 2000-03-22 2003-04-08 Micro C Technologies, Inc. Rectilinear wedge geometry for optimal process control in chemical vapor deposition and rapid thermal processing
US6737224B2 (en) 2001-04-17 2004-05-18 Jeffrey Stewart Method of preparing thin supported films by vacuum deposition
US6797108B2 (en) * 2001-10-05 2004-09-28 Applied Materials, Inc. Apparatus and method for evenly flowing processing gas onto a semiconductor wafer
US7017514B1 (en) * 2001-12-03 2006-03-28 Novellus Systems, Inc. Method and apparatus for plasma optimization in water processing
US7279432B2 (en) * 2002-04-16 2007-10-09 Applied Materials, Inc. System and method for forming an integrated barrier layer
JP4338355B2 (ja) * 2002-05-10 2009-10-07 東京エレクトロン株式会社 プラズマ処理装置
DE10239083B4 (de) * 2002-08-26 2009-09-03 Schott Ag Vorrichtung zum Versorgen einer Prozesskammer mit fluiden Medien und deren Verwendung
US20050023983A1 (en) * 2003-08-01 2005-02-03 Rajasingh Israel Optimal silicon dioxide protection layer thickness for silver lamp reflector
US7112541B2 (en) * 2004-05-06 2006-09-26 Applied Materials, Inc. In-situ oxide capping after CVD low k deposition
TWI267405B (en) * 2004-07-20 2006-12-01 Sez Ag Fluid discharging device
JP2006057173A (ja) * 2004-08-24 2006-03-02 Tohoku Pioneer Corp 成膜源、真空成膜装置、有機ｅｌパネルの製造方法
US7273823B2 (en) * 2005-06-03 2007-09-25 Applied Materials, Inc. Situ oxide cap layer development
DE102005056322A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag VPE-Reaktor mit koaxial zueinander angeordneten Quellgasrohren
JP4767000B2 (ja) * 2005-11-28 2011-09-07 日立造船株式会社 真空蒸着装置
US20070227659A1 (en) * 2006-03-31 2007-10-04 Tokyo Electron Limited Plasma etching apparatus
JP2008047869A (ja) * 2006-06-13 2008-02-28 Hokuriku Seikei Kogyo Kk シャワープレート及びその製造方法、並びにそのシャワープレートを用いたプラズマ処理装置、プラズマ処理方法及び電子装置の製造方法
JP5463536B2 (ja) * 2006-07-20 2014-04-09 北陸成型工業株式会社 シャワープレート及びその製造方法、並びにそのシャワープレートを用いたプラズマ処理装置、プラズマ処理方法及び電子装置の製造方法
BRPI0716387A2 (pt) * 2006-08-29 2013-01-01 Pilkington Group Ltd E Arkema Inc método de deposição de vapor quìmico para depositar um revestimento de óxido de zinco sobre um substrato
CN101547873A (zh) * 2006-08-29 2009-09-30 皮尔金顿集团有限公司 制备低电阻率掺杂氧化锌涂层及由此制成的物件的方法
US7740901B2 (en) * 2006-09-08 2010-06-22 Pilkington Group Limited Low temperature method of making a zinc oxide coated article and the coated article made thereby
US7345414B1 (en) 2006-10-04 2008-03-18 General Electric Company Lamp for night vision system
JP4990594B2 (ja) * 2006-10-12 2012-08-01 東京エレクトロン株式会社 ガス供給装置、ガス供給方法、薄膜形成装置の洗浄方法、薄膜形成方法及び薄膜形成装置
JP5010234B2 (ja) 2006-10-23 2012-08-29 北陸成型工業株式会社 ガス放出孔部材を一体焼結したシャワープレートおよびその製造方法
JP4954734B2 (ja) * 2007-01-30 2012-06-20 東京エレクトロン株式会社 基板処理装置及びガス供給方法
US8440259B2 (en) * 2007-09-05 2013-05-14 Intermolecular, Inc. Vapor based combinatorial processing
DE102010056021B3 (de) * 2010-12-23 2012-04-19 Centrotherm Sitec Gmbh Düsenanordnung und CVD-Reaktor
US8398773B2 (en) * 2011-01-21 2013-03-19 Asm International N.V. Thermal processing furnace and liner for the same
US20130269612A1 (en) * 2012-04-16 2013-10-17 Hermes-Epitek Corporation Gas Treatment Apparatus with Surrounding Spray Curtains
US9328419B2 (en) * 2012-04-18 2016-05-03 Hermes-Epitek Corporation Gas treatment apparatus with surrounding spray curtains
US8827176B2 (en) * 2012-07-05 2014-09-09 James A. Browning HVOF torch with fuel surrounding oxidizer
US9132436B2 (en) * 2012-09-21 2015-09-15 Applied Materials, Inc. Chemical control features in wafer process equipment
US20230019430A1 (en) * 2021-07-13 2023-01-19 Changxin Memory Technologies, Inc. Gas injector and diffusion furnace device

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE488281A (de) * 1946-04-09
US2526220A (en) * 1947-07-18 1950-10-17 Daniel And Florence Guggenheim Spray nozzle
FR1089640A (fr) * 1953-09-18 1955-03-21 Phillips & Pain Vermorel Perfectionnements aux lances à jet pulvérisé pour la lutte contre l'incendie et autres applications
US3511703A (en) * 1963-09-20 1970-05-12 Motorola Inc Method for depositing mixed oxide films containing aluminum oxide
FR1518843A (fr) * 1967-02-13 1968-03-29 Radiotechnique Coprim Rtc Dispositif pour le dépôt de couches minces sur des supports semi-conducteurs
US3524590A (en) * 1968-04-01 1970-08-18 Gen Electric Nozzle for a pyrolytic coating and deposition process
GB1282866A (en) * 1968-08-16 1972-07-26 Pilkington Brothers Ltd Improvements in or relating to the production of glass having desired surface characteristics
US3642521A (en) * 1969-10-27 1972-02-15 Texas Instruments Inc Production of metal oxides
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
DD107723A1 (de) * 1973-12-03 1974-08-12
GB1516032A (en) * 1976-04-13 1978-06-28 Bfg Glassgroup Coating of glass
JPS5916106Y2 (ja) * 1978-06-20 1984-05-12 正博 武田 自給式混合装置
IT1144219B (it) * 1980-06-20 1986-10-29 Bfg Glassgroup Procedimento e dispositivo per formare un rivestimento di metallo o di un composto metallico

Also Published As

Publication number Publication date
US4508054A (en) 1985-04-02
CH640571A5 (fr) 1984-01-13
WO1982003093A1 (fr) 1982-09-16
US4476158A (en) 1984-10-09
EP0060221B1 (de) 1985-07-03
JPS58500173A (ja) 1983-02-03
DE3264486D1 (en) 1985-08-08
EP0060221A1 (de) 1982-09-15

Similar Documents

Publication Publication Date Title
ATE14145T1 (de) Verfahren zum ueberziehen eines substrates mit einem anorganischen oxid und vorrichtung zur anwendung dieses verfahrens.
GB1218403A (en) Process and apparatus for use in modifying glass and other materials
NZ332179A (en) A method for imparting hydrophobicity to a surface of a substrate with low concentration organofunctional silanes
DE68906236D1 (de) Verfahren zur beschichtung von glas.
ATA664279A (de) Verfahren und vorrichtung zum dispergieren eines gases in einer fluessigkeit
JPS6426514A (en) Method of coating granules
CN111398150A (zh) 一种模拟海洋服役环境多因素交互腐蚀实验装置及方法
DE3065241D1 (en) Anticorrosive coating composition
EP0140125A3 (de) Verfahren zur Herstellung einer Kohlenstoff enthaltenden Schicht, Kohlenstoff enthaltende Schicht, Verwendung einer Kohlenstoff enthaltenden Schicht und Vorrichtung zur Durchführung eines Verfahrens zur Herstellung einer Kohlenstoff enthaltenden Schicht
DE3874746D1 (de) Vorrichtung zur beschichtung eines substrats.
EP0176014A3 (en) Method and device for mining a liquid sample to be analysed
ATE73176T1 (de) Verfahren und vorrichtung zum abstreifen von mit schmelzfluessigem material beschichtetem blech.
DK144585A (da) Fremgangsmaade til overtraekning ved fremstilling af ikke-iriserende glasstruktur
FR2589173B1 (fr) Procede de teinture de substrats mixtes
JPS646032A (en) Prepreg sheet for flake lining and process for lining using said sheet
JPS5753730A (en) Liquid crystal display device
JPS57173833A (en) Formation of radiation resist image
JPS5274633A (en) Method for coating poroud substrate with water paint
ZA782582B (en) Method and apparatus for treating surfaces of an article with a fluid adapted to coat,clean or react chemically with the article
Brown Periphyton responses to nutrient enrichment and elevated temperatures in a low pH South Carolina stream: effects on biomass and productivity
ES359133A1 (es) Un metodo de producir vidrio recubierto transparente.
KR910015429A (ko) 장식판재의 표면 무의 형성 방법
KR950003013A (ko) 곡면 또는 굴곡면의 전사인쇄 방법
Couzis Adsorption of polymers and surfactants from solution onto the solid-liquid interface
JPS5415976A (en) Treatment for improving coating adhession to the surface of polyolefin moldings

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties