ATE143061T1 - Verfahren zur herstellung einer silizium- enthaltenden schicht auf ein metallisches substrat sowie anti-korrosionsbehandlung - Google Patents

Verfahren zur herstellung einer silizium- enthaltenden schicht auf ein metallisches substrat sowie anti-korrosionsbehandlung

Info

Publication number
ATE143061T1
ATE143061T1 AT93401396T AT93401396T ATE143061T1 AT E143061 T1 ATE143061 T1 AT E143061T1 AT 93401396 T AT93401396 T AT 93401396T AT 93401396 T AT93401396 T AT 93401396T AT E143061 T1 ATE143061 T1 AT E143061T1
Authority
AT
Austria
Prior art keywords
metal substrate
containing silicon
producing
layer containing
corrosion treatment
Prior art date
Application number
AT93401396T
Other languages
English (en)
Inventor
Frank Slootman
Pascal Bouard
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Application granted granted Critical
Publication of ATE143061T1 publication Critical patent/ATE143061T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
AT93401396T 1992-06-17 1993-06-02 Verfahren zur herstellung einer silizium- enthaltenden schicht auf ein metallisches substrat sowie anti-korrosionsbehandlung ATE143061T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9207377A FR2692598B1 (fr) 1992-06-17 1992-06-17 Procédé de dépôt d'un film contenant du silicium à la surface d'un substrat métallique et procédé de traitement anti-corrosion.

Publications (1)

Publication Number Publication Date
ATE143061T1 true ATE143061T1 (de) 1996-10-15

Family

ID=9430856

Family Applications (1)

Application Number Title Priority Date Filing Date
AT93401396T ATE143061T1 (de) 1992-06-17 1993-06-02 Verfahren zur herstellung einer silizium- enthaltenden schicht auf ein metallisches substrat sowie anti-korrosionsbehandlung

Country Status (9)

Country Link
US (1) US5523124A (de)
EP (1) EP0577447B1 (de)
JP (1) JP3403219B2 (de)
AT (1) ATE143061T1 (de)
AU (1) AU666546B2 (de)
CA (1) CA2098436A1 (de)
DE (1) DE69304819T2 (de)
ES (1) ES2092250T3 (de)
FR (1) FR2692598B1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2714917B1 (fr) * 1994-01-07 1996-03-01 Pechiney Recherche Bande à base d'aluminium revêtue, résistant à la corrosion et déformable, procédé d'obtention et applications.
US5900317A (en) * 1996-09-13 1999-05-04 Minnesota Mining & Manufacturing Company Flame-treating process
US6106659A (en) * 1997-07-14 2000-08-22 The University Of Tennessee Research Corporation Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials
US6083355A (en) * 1997-07-14 2000-07-04 The University Of Tennessee Research Corporation Electrodes for plasma treater systems
NL1009956C2 (nl) * 1998-08-27 2000-02-29 Tno Werkwijze voor het aanbrengen van een bekleding op een substraat.
US6054018A (en) * 1998-08-28 2000-04-25 Wisconsin Alumni Research Foundation Outside chamber sealing roller system for surface treatment gas reactors
FR2782837B1 (fr) * 1998-08-28 2000-09-29 Air Liquide Procede et dispositif de traitement de surface par plasma a pression atmospherique
US6082292A (en) * 1999-01-05 2000-07-04 Wisconsin Alumni Research Foundation Sealing roller system for surface treatment gas reactors
ATE287466T1 (de) * 2000-02-04 2005-02-15 Sca Hygiene Prod Ab Faserstruktur und absorbierender artikel mit dieser faserstruktur
KR20010088089A (ko) * 2000-03-10 2001-09-26 구자홍 플라즈마 중합처리 시스템의 친수성 향상 방법
EP1582270A1 (de) * 2004-03-31 2005-10-05 Vlaamse Instelling voor Technologisch Onderzoek Verfahren und Vorrichtung zum Beschichten eines Substrats mittels dielektrischer Sperrentladung
US20050238816A1 (en) * 2004-04-23 2005-10-27 Li Hou Method and apparatus of depositing low temperature inorganic films on plastic substrates
JP2008534317A (ja) * 2005-03-24 2008-08-28 スリーエム イノベイティブ プロパティズ カンパニー 耐食金属化フィルムおよびその製造方法
CA2601502A1 (en) * 2005-03-24 2006-09-28 3M Innovative Properties Company Metallized films and articles containing the same
DE102005028121A1 (de) * 2005-06-10 2006-12-14 Decoma (Germany) Gmbh Verfahren zum Behandeln einer Oberfläche
WO2013110963A1 (fr) 2012-01-24 2013-08-01 Arcelormittal Investigacion Y Desarrollo Sl Appareil et procédé de revêtement d'un substrat métallique en défilement

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US3655438A (en) * 1969-10-20 1972-04-11 Int Standard Electric Corp Method of forming silicon oxide coatings in an electric discharge
JPS5821814B2 (ja) * 1975-11-08 1983-05-04 松下電器産業株式会社 ケンカイガタコンデンサ
GB2104054B (en) * 1981-08-11 1984-11-14 British Petroleum Co Plc Protective silica coatings
GB2107360B (en) * 1981-10-12 1985-09-25 Central Electr Generat Board Depositing silicon on metal
EP0097334B1 (de) * 1982-06-18 1989-05-03 Elektroschmelzwerk Kempten GmbH Verfahren zum dauerhaften Aufbringen von metallischen Schichten auf eine Kunststoffolie und deren Verwendung in autoregenerativen Kondensatoren
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JPS62130503A (ja) * 1985-11-30 1987-06-12 本州製紙株式会社 メタライズドコンデンサ用の亜鉛蒸着基材ならびにその製造法
JPS62156943A (ja) * 1985-12-28 1987-07-11 東洋紡績株式会社 蒸着層内蔵型の複層ガスバリヤ−性フイルム又はシ−ト及びその製造方法
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JP2640174B2 (ja) * 1990-10-30 1997-08-13 三菱電機株式会社 半導体装置およびその製造方法
JP3206095B2 (ja) * 1991-04-12 2001-09-04 株式会社ブリヂストン 表面処理方法及びその装置
JPH04337076A (ja) * 1991-05-14 1992-11-25 Yuuha Mikakutou Seimitsu Kogaku Kenkyusho:Kk 高圧力下でのプラズマ及びラジカルｃｖｄ法による高速成膜方法
JPH05258854A (ja) * 1992-03-16 1993-10-08 Matsushita Electric Ind Co Ltd 高周波加熱装置

Also Published As

Publication number Publication date
FR2692598A1 (fr) 1993-12-24
DE69304819T2 (de) 1997-01-30
CA2098436A1 (fr) 1993-12-18
AU666546B2 (en) 1996-02-15
US5523124A (en) 1996-06-04
JPH0688240A (ja) 1994-03-29
DE69304819D1 (de) 1996-10-24
EP0577447B1 (de) 1996-09-18
JP3403219B2 (ja) 2003-05-06
EP0577447A1 (de) 1994-01-05
AU4125093A (en) 1993-12-23
FR2692598B1 (fr) 1995-02-10
ES2092250T3 (es) 1996-11-16

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee