ATE153177T1 - Teilvakuumgerät und -verfahren - Google Patents

Teilvakuumgerät und -verfahren

Info

Publication number
ATE153177T1
ATE153177T1 AT90301905T AT90301905T ATE153177T1 AT E153177 T1 ATE153177 T1 AT E153177T1 AT 90301905 T AT90301905 T AT 90301905T AT 90301905 T AT90301905 T AT 90301905T AT E153177 T1 ATE153177 T1 AT E153177T1
Authority
AT
Austria
Prior art keywords
vacuum
process region
vacuum body
influx
localized
Prior art date
Application number
AT90301905T
Other languages
English (en)
Inventor
Nicholas P Economou
Nicholas Guarino
David Edwards Jr
Original Assignee
Micrion Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micrion Corp filed Critical Micrion Corp
Application granted granted Critical
Publication of ATE153177T1 publication Critical patent/ATE153177T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Drying Of Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laser Beam Processing (AREA)
  • Chemical Vapour Deposition (AREA)
  • Vacuum Packaging (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Furnace Details (AREA)
AT90301905T 1989-02-24 1990-02-22 Teilvakuumgerät und -verfahren ATE153177T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/315,732 US5103102A (en) 1989-02-24 1989-02-24 Localized vacuum apparatus and method

Publications (1)

Publication Number Publication Date
ATE153177T1 true ATE153177T1 (de) 1997-05-15

Family

ID=23225808

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90301905T ATE153177T1 (de) 1989-02-24 1990-02-22 Teilvakuumgerät und -verfahren

Country Status (5)

Country Link
US (1) US5103102A (de)
EP (1) EP0384754B1 (de)
JP (1) JPH0661445B2 (de)
AT (1) ATE153177T1 (de)
DE (1) DE69030679T2 (de)

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US6453063B1 (en) 1998-01-28 2002-09-17 Chipworks Automatic focused ion beam imaging system and method
US6105885A (en) * 1998-04-03 2000-08-22 Advanced Energy Systems, Inc. Fluid nozzle system and method in an emitted energy system for photolithography
US6065203A (en) * 1998-04-03 2000-05-23 Advanced Energy Systems, Inc. Method of manufacturing very small diameter deep passages
US6180952B1 (en) 1998-04-03 2001-01-30 Advanced Energy Systems, Inc. Holder assembly system and method in an emitted energy system for photolithography
US6194733B1 (en) 1998-04-03 2001-02-27 Advanced Energy Systems, Inc. Method and apparatus for adjustably supporting a light source for use in photolithography
EP1229573A4 (de) 1999-07-16 2006-11-08 Nikon Corp Belichtungsverfahren und -system
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP2001242300A (ja) 2000-03-02 2001-09-07 Sony Corp 電子ビーム照射装置
WO2002045125A1 (en) * 2000-12-01 2002-06-06 Yeda Research And Development Co. Ltd. Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope
JP2007019033A (ja) * 2001-01-10 2007-01-25 Ebara Corp 電子線による検査装置、検査方法、及びその検査装置を用いたデバイス製造方法
US6746566B1 (en) 2001-12-11 2004-06-08 Kla-Tencor Technologies Corporation Transverse magnetic field voltage isolator
JP2003217500A (ja) * 2002-01-21 2003-07-31 Sony Corp 走査型電子顕微鏡を用いた検査装置
WO2003104848A2 (en) 2002-06-05 2003-12-18 Quantomix Ltd. Methods for sem inspection of fluid containing samples
IL150056A0 (en) * 2002-06-05 2002-12-01 Yeda Res & Dev Low-pressure chamber for scanning electron microscopy in a wet environment
SG121818A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US20070125947A1 (en) * 2003-02-20 2007-06-07 David Sprinzak Sample enclosure for a scanning electron microscope and methods of use thereof
US6919573B2 (en) 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
US7394339B1 (en) 2004-06-30 2008-07-01 Kla-Tencor Technologies Corporation Transverse magnetic field voltage isolator
NL1026547C2 (nl) * 2004-07-01 2006-01-03 Fei Co Apparaat voor het evacueren van een sample.
KR101071136B1 (ko) * 2004-08-27 2011-10-10 엘지디스플레이 주식회사 평판표시장치의 제조를 위한 기판의 박막처리장치
KR20060077363A (ko) * 2004-12-30 2006-07-05 엘지.필립스 엘시디 주식회사 대기개방형 박막처리장치 및 이를 이용한 평판표시장치용기판의 박막처리방법
US7301157B2 (en) * 2005-09-28 2007-11-27 Fei Company Cluster tool for microscopic processing of samples
NL1030295C2 (nl) * 2005-10-28 2007-05-03 Fei Co Hermetisch afgesloten behuizing met elektrische doorvoer.
EP1816668A2 (de) * 2006-02-01 2007-08-08 FEI Company Teilchenstrahlgerät mit vrobestimmtem Arbeitsdruck
CN101461026B (zh) 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
WO2007145712A2 (en) * 2006-06-07 2007-12-21 Fei Company Slider bearing for use with an apparatus comprising a vacuum chamber
US8749753B2 (en) * 2007-04-27 2014-06-10 Nikon Corporation Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method
EP2292953A1 (de) * 2009-09-07 2011-03-09 Fei Company Hochvakuumabdichtung
EP2381310B1 (de) 2010-04-22 2015-05-06 ASML Netherlands BV Flüssigkeitshandhabungsstruktur und lithographischer Apparat
JP6309195B2 (ja) * 2013-02-18 2018-04-11 株式会社ホロン 走査型電子顕微鏡および検査装置
US9583401B2 (en) 2014-02-12 2017-02-28 International Business Machines Corporation Nano deposition and ablation for the repair and fabrication of integrated circuits
JP6219227B2 (ja) 2014-05-12 2017-10-25 東京エレクトロン株式会社 ヒータ給電機構及びステージの温度制御方法
JP7042071B2 (ja) 2016-12-20 2022-03-25 エフ・イ－・アイ・カンパニー ｅビーム操作用の局部的に排気された容積を用いる集積回路解析システムおよび方法
SE542905C2 (en) * 2018-12-07 2020-09-15 Scienta Omicron Ab Method for determining a pressure at a sample surface
SE542904C2 (en) * 2018-12-07 2020-09-15 Scienta Omicron Ab Method and arrangement for distance control between a sample and an aperture
JP7496601B2 (ja) * 2020-06-29 2024-06-07 株式会社ブイ・テクノロジー 加工装置
CN114536113B (zh) * 2022-04-27 2022-07-29 四川欧瑞特光电科技有限公司 一种负压装置及离子束抛光机

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Also Published As

Publication number Publication date
EP0384754A3 (de) 1991-05-02
DE69030679T2 (de) 1998-01-02
DE69030679D1 (de) 1997-06-19
JPH038428A (ja) 1991-01-16
JPH0661445B2 (ja) 1994-08-17
US5103102A (en) 1992-04-07
EP0384754A2 (de) 1990-08-29
EP0384754B1 (de) 1997-05-14

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