ATE157196T1 - Zentrifugal-reinigungsvorrichtung für waferbehälter - Google Patents

Zentrifugal-reinigungsvorrichtung für waferbehälter

Info

Publication number
ATE157196T1
ATE157196T1 AT93915207T AT93915207T ATE157196T1 AT E157196 T1 ATE157196 T1 AT E157196T1 AT 93915207 T AT93915207 T AT 93915207T AT 93915207 T AT93915207 T AT 93915207T AT E157196 T1 ATE157196 T1 AT E157196T1
Authority
AT
Austria
Prior art keywords
rotor
processing
vessel
cleaning device
processing chamber
Prior art date
Application number
AT93915207T
Other languages
English (en)
Inventor
Raymon F Thompson
Aleksander Owczarz
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25414519&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE157196(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Semitool Inc filed Critical Semitool Inc
Application granted granted Critical
Publication of ATE157196T1 publication Critical patent/ATE157196T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Centrifugal Separators (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning By Liquid Or Steam (AREA)
AT93915207T 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter ATE157196T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/901,614 US5224503A (en) 1992-06-15 1992-06-15 Centrifugal wafer carrier cleaning apparatus

Publications (1)

Publication Number Publication Date
ATE157196T1 true ATE157196T1 (de) 1997-09-15

Family

ID=25414519

Family Applications (2)

Application Number Title Priority Date Filing Date
AT93915207T ATE157196T1 (de) 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter
AT95118115T ATE217445T1 (de) 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT95118115T ATE217445T1 (de) 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter

Country Status (8)

Country Link
US (4) US5224503A (de)
EP (4) EP0702397B1 (de)
JP (1) JP2547529B2 (de)
AT (2) ATE157196T1 (de)
AU (1) AU4527993A (de)
DE (2) DE69313277T2 (de)
HK (1) HK1002262A1 (de)
WO (1) WO1993026035A1 (de)

Families Citing this family (108)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6375741B2 (en) * 1991-03-06 2002-04-23 Timothy J. Reardon Semiconductor processing spray coating apparatus
US5658387A (en) * 1991-03-06 1997-08-19 Semitool, Inc. Semiconductor processing spray coating apparatus
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US5431178A (en) * 1994-03-30 1995-07-11 Chiu; Hsien Hsin Centrifugal type, enclosed cleaning apparatus
US5664337A (en) * 1996-03-26 1997-09-09 Semitool, Inc. Automated semiconductor processing systems
EP0757844A1 (de) * 1994-04-28 1997-02-12 Semitool, Inc. Verarbeitungssysteme für halbleiter
US5784797A (en) * 1994-04-28 1998-07-28 Semitool, Inc. Carrierless centrifugal semiconductor processing system
WO1996023606A1 (en) * 1995-02-01 1996-08-08 Jackson David P Dense fluid centrifugal separation process and apparatus
US6239038B1 (en) 1995-10-13 2001-05-29 Ziying Wen Method for chemical processing semiconductor wafers
DK173019B1 (da) * 1996-04-24 1999-11-15 Ken Maskinfabrik As Anordning til afvaskning, skylning og tørring af genstande, såsom cateringvogne til anvendelse om bord på flyvemaskiner
DE19623766A1 (de) * 1996-06-14 1997-12-18 Itt Ind Gmbh Deutsche Vorrichtung zum Trockenreinigen von staubverschmutzten Hilfsgegenständen zur Handhabung und Aufbewahrung von Halbleiterwafern
US5919386A (en) * 1996-06-18 1999-07-06 Lufran Incorporated Purge management system for gas purged immersion heaters
US6413436B1 (en) * 1999-01-27 2002-07-02 Semitool, Inc. Selective treatment of the surface of a microelectronic workpiece
US7087143B1 (en) 1996-07-15 2006-08-08 Semitool, Inc. Plating system for semiconductor materials
US5731678A (en) * 1996-07-15 1998-03-24 Semitool, Inc. Processing head for semiconductor processing machines
US6645355B2 (en) 1996-07-15 2003-11-11 Semitool, Inc. Semiconductor processing apparatus having lift and tilt mechanism
US6264752B1 (en) 1998-03-13 2001-07-24 Gary L. Curtis Reactor for processing a microelectronic workpiece
US6350319B1 (en) * 1998-03-13 2002-02-26 Semitool, Inc. Micro-environment reactor for processing a workpiece
US6091498A (en) * 1996-07-15 2000-07-18 Semitool, Inc. Semiconductor processing apparatus having lift and tilt mechanism
JPH10261687A (ja) * 1997-03-18 1998-09-29 Furontetsuku:Kk 半導体等製造装置
US6164297A (en) * 1997-06-13 2000-12-26 Tokyo Electron Limited Cleaning and drying apparatus for objects to be processed
US6334902B1 (en) 1997-09-24 2002-01-01 Interuniversitair Microelektronica Centrum (Imec) Method and apparatus for removing a liquid from a surface
US5849103A (en) * 1997-12-22 1998-12-15 Seh America, Inc. Method of monitoring fluid contamination
US6926017B2 (en) 1998-01-09 2005-08-09 Entegris, Inc. Wafer container washing apparatus
US6248177B1 (en) 1998-01-09 2001-06-19 Fluoroware, Inc. Method of cleaning a wafer carrier
US7216655B2 (en) * 1998-01-09 2007-05-15 Entegris, Inc. Wafer container washing apparatus
US6231676B1 (en) * 1998-01-27 2001-05-15 Seagate Technology Llc Cleaning process for disc drive components
US6632292B1 (en) 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces
US6423642B1 (en) 1998-03-13 2002-07-23 Semitool, Inc. Reactor for processing a semiconductor wafer
US6318385B1 (en) * 1998-03-13 2001-11-20 Semitool, Inc. Micro-environment chamber and system for rinsing and drying a semiconductor workpiece
US20050217707A1 (en) * 1998-03-13 2005-10-06 Aegerter Brian K Selective processing of microelectronic workpiece surfaces
US6062239A (en) * 1998-06-30 2000-05-16 Semitool, Inc. Cross flow centrifugal processor
US6904920B2 (en) * 1998-07-10 2005-06-14 Semitool, Inc. Method and apparatus for cleaning containers
US6432214B2 (en) 1998-07-10 2002-08-13 Semitool, Inc. Cleaning apparatus
JP3527117B2 (ja) * 1998-12-24 2004-05-17 富士電機デバイステクノロジー株式会社 半導体力学量センサの製造方法およびその製造装置
US6548411B2 (en) 1999-01-22 2003-04-15 Semitool, Inc. Apparatus and methods for processing a workpiece
US7217325B2 (en) * 1999-01-22 2007-05-15 Semitool, Inc. System for processing a workpiece
US6680253B2 (en) 1999-01-22 2004-01-20 Semitool, Inc. Apparatus for processing a workpiece
US6511914B2 (en) 1999-01-22 2003-01-28 Semitool, Inc. Reactor for processing a workpiece using sonic energy
US6492284B2 (en) 1999-01-22 2002-12-10 Semitool, Inc. Reactor for processing a workpiece using sonic energy
US7438788B2 (en) 1999-04-13 2008-10-21 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
US7264698B2 (en) 1999-04-13 2007-09-04 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
KR100695660B1 (ko) 1999-04-13 2007-03-19 세미툴 인코포레이티드 개선된 처리 유체 유동을 갖는 처리 챔버를 구비하는가공편 프로세서
US20020062792A1 (en) * 1999-07-14 2002-05-30 Seh America, Inc. Wafer support device and reactor system for epitaxial layer growth
US6632277B2 (en) 1999-07-14 2003-10-14 Seh America, Inc. Optimized silicon wafer gettering for advanced semiconductor devices
US6375749B1 (en) 1999-07-14 2002-04-23 Seh America, Inc. Susceptorless semiconductor wafer support and reactor system for epitaxial layer growth
US6395085B2 (en) 1999-07-14 2002-05-28 Seh America, Inc. Purity silicon wafer for use in advanced semiconductor devices
US6454852B2 (en) 1999-07-14 2002-09-24 Seh America, Inc. High efficiency silicon wafer optimized for advanced semiconductor devices
US6412502B1 (en) 1999-07-28 2002-07-02 Semitool, Inc. Wafer container cleaning system
US6322633B1 (en) 1999-07-28 2001-11-27 Semitool, Inc. Wafer container cleaning system
US6199298B1 (en) * 1999-10-06 2001-03-13 Semitool, Inc. Vapor assisted rotary drying method and apparatus
US6286231B1 (en) 2000-01-12 2001-09-11 Semitool, Inc. Method and apparatus for high-pressure wafer processing and drying
JP4007766B2 (ja) * 2000-02-29 2007-11-14 東京エレクトロン株式会社 液処理装置および液処理方法
US6821488B1 (en) * 2000-05-30 2004-11-23 International Business Machines Corporation Sample holding chuck for use in reactor and reactor using same
JP2004507102A (ja) * 2000-07-07 2004-03-04 セミトゥール・インコーポレイテッド 半導体ウェハコンテナ洗浄装置
US7102763B2 (en) 2000-07-08 2006-09-05 Semitool, Inc. Methods and apparatus for processing microelectronic workpieces using metrology
US20030062069A1 (en) * 2000-09-08 2003-04-03 Semitool, Inc Apparatus and methods for removing metallic contamination from wafer containers
US6725868B2 (en) * 2000-11-14 2004-04-27 Tokyo Electron Limited Liquid processing apparatus
US20050061676A1 (en) * 2001-03-12 2005-03-24 Wilson Gregory J. System for electrochemically processing a workpiece
US20020139400A1 (en) * 2001-03-27 2002-10-03 Semitool, Inc. Vertical process reactor
KR100426987B1 (ko) * 2001-07-10 2004-04-13 삼성전자주식회사 반도체 제조용 종형의 저압화학기상증착 장치
WO2003006183A2 (en) * 2001-07-12 2003-01-23 Semitool, Inc. Method and apparatus for cleaning semiconductor wafers and other flat media
WO2003018874A2 (en) * 2001-08-31 2003-03-06 Semitool, Inc. Apparatus and methods for electrochemical processing of microelectronic workpieces
JP2004066212A (ja) * 2002-06-11 2004-03-04 Dan-Takuma Technologies Inc 洗浄乾燥装置
KR20030095105A (ko) * 2002-06-11 2003-12-18 동부전자 주식회사 습식 세정 장치의 회전 건조기
US6895981B2 (en) * 2002-07-19 2005-05-24 Semitool, Inc. Cross flow processor
US6830057B2 (en) * 2002-11-01 2004-12-14 Semitool, Inc. Wafer container cleaning system
WO2005001888A2 (de) * 2003-04-11 2005-01-06 Dynamic Microsystems Semiconductor Equipment Gmbh Vorrichtung und verfahren zum reinigen von bei der herstellung von halbleitern verwendeten gegenständen, insbesondere von transport- und reinigungsbehältern für wafer
DE10317275A1 (de) * 2003-04-11 2004-11-11 Dynamic Microsystems Semiconductor Equipment Gmbh Vorrichtung und Verfahren zum Reinigen von bei der Herstellung von Halbleitern verwendeten Gegenständen
DE10347464B4 (de) * 2003-10-02 2010-05-12 Dynamic Microsystems Semiconductor Equipment Gmbh Vorrichtung und Verfahren zum Reinigen und Trocknen von Halbleitererzeugnissen oder von bei der Herstellung von Halbleitererzeugnissen verwendeten Handhabungskörben
AU2003901819A0 (en) * 2003-04-16 2003-05-01 Earl Fenton Goddard A parts washer
US7867565B2 (en) 2003-06-30 2011-01-11 Imec Method for coating substrates
US20050224103A1 (en) * 2003-10-10 2005-10-13 Dolechek Kert L Centrifugal container cleaning system
US7720558B2 (en) 2004-09-04 2010-05-18 Applied Materials, Inc. Methods and apparatus for mapping carrier contents
US7520286B2 (en) * 2005-12-05 2009-04-21 Semitool, Inc. Apparatus and method for cleaning and drying a container for semiconductor workpieces
US7644512B1 (en) * 2006-01-18 2010-01-12 Akrion, Inc. Systems and methods for drying a rotating substrate
KR100829923B1 (ko) * 2006-08-30 2008-05-16 세메스 주식회사 스핀헤드 및 이를 이용하는 기판처리방법
JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
US20080243234A1 (en) * 2007-03-27 2008-10-02 Medtronic Vascular, Inc. Magnesium Alloy Stent
KR100958793B1 (ko) * 2007-09-28 2010-05-18 주식회사 실트론 웨이퍼 쉽핑박스의 세정을 위한 박스 크리너
KR101431197B1 (ko) * 2008-01-24 2014-09-17 삼성전자주식회사 원자층 증착설비 및 그의 원자층 증착방법
US20090205220A1 (en) * 2008-02-20 2009-08-20 Dewald Iii Charles Robert Dryer and adapter having ducting system
US8429831B2 (en) * 2009-09-04 2013-04-30 Abbott Cardiovascular Systems Inc. Drug-eluting coatings applied to medical devices by spraying and drying to remove solvent
DE102009040978A1 (de) * 2009-09-11 2011-03-17 Krones Ag Magazinvorrichtung für Blasformen mit Reinigungseinrichtung
KR100987323B1 (ko) 2010-05-18 2010-10-12 (주) 디바이스이엔지 웨이퍼 보관용기 세정장치
KR101022014B1 (ko) 2010-05-18 2011-03-16 (주) 디바이스이엔지 웨이퍼 보관용기 세정장치
TWI372035B (en) * 2011-01-21 2012-09-11 Yang Yih Machinery Co Ltd Bactericidal baker for tableware
KR101220127B1 (ko) * 2011-05-26 2013-01-11 (주)네오텍 반도체 캐리어 세정장치
KR101220094B1 (ko) * 2011-05-26 2013-01-11 (주)네오텍 반도체 캐리어 세정 시스템
US9421617B2 (en) 2011-06-22 2016-08-23 Tel Nexx, Inc. Substrate holder
US8613474B2 (en) 2011-07-06 2013-12-24 Tel Nexx, Inc. Substrate loader and unloader having a Bernoulli support
KR101262182B1 (ko) * 2012-06-28 2013-05-14 배재규 부력세척용 마찰칩을 이용한 세척장치
US20160303622A1 (en) * 2013-10-23 2016-10-20 Brooks Ccs Gmbh Cleaning Systems and Methods for Semiconductor Substrate Storage Articles
US20160354813A1 (en) * 2015-06-04 2016-12-08 Arrow Pin & Products Inc. Apparatus and Method for Cleaning Devices Internally Through Their Ports
CN108296198A (zh) * 2017-12-20 2018-07-20 山西云度知识产权服务有限公司 一种新能源汽车挡风玻璃清洗器
CN108417515B (zh) * 2018-04-10 2020-04-28 宁波德深机械设备有限公司 一种硅片清洗设备
CN108672452B (zh) * 2018-05-09 2021-03-26 芜湖市诺康生物科技有限公司 一种药瓶清洗装置
CN108940996A (zh) * 2018-07-27 2018-12-07 深圳市凯尔迪光电科技有限公司 高精密集成电路离心清洗设备
KR102396369B1 (ko) * 2018-08-09 2022-05-10 주식회사 원익아이피에스 기판처리장치
CN109604246B (zh) * 2018-12-17 2020-09-29 象山维治模具有限公司 零件自动清洗装置
CN109731853A (zh) * 2019-01-02 2019-05-10 常州回天新材料有限公司 一种太阳能电池片风淋装置
CN111341699B (zh) * 2020-03-09 2023-03-31 杭州众硅电子科技有限公司 一种清洗刷预清洗系统
CN111318503A (zh) * 2020-03-20 2020-06-23 西安奕斯伟硅片技术有限公司 一种清洗装置
CN112139134B (zh) * 2020-09-22 2021-11-30 江苏汉达机械有限公司 一种带有油污过滤功能的五金部件除油装置
CN112238087A (zh) * 2020-10-10 2021-01-19 马鞍山健鼎化工有限公司 一种新型聚合硫酸铁研发自动清洗回流机构及工作方法
CN113770072A (zh) * 2021-09-10 2021-12-10 安徽富乐德科技发展股份有限公司 一种液晶面板显示器自动清洗烘干设备
CN115228867B (zh) * 2022-09-22 2023-01-13 智程半导体设备科技(昆山)有限公司 一种半导体清洗设备
CN120341144B (zh) * 2025-06-17 2025-10-10 汉轩微电子制造(江苏)有限公司 基于清洗装置的晶圆清洗装置及该清洗工艺

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US28135A (en) * 1860-05-01 Aaron williamson
US193222A (en) * 1877-07-17 Improvement in steam dish-cleaners
US910882A (en) * 1908-10-15 1909-01-26 George Truesdell Bottle-washing apparatus.
US1405243A (en) * 1920-11-16 1922-01-31 Claude E Wing Dishwashing machine
US2721566A (en) * 1952-05-08 1955-10-25 William E Brucker Parts washer
US3242934A (en) * 1964-07-22 1966-03-29 Heinricke Instr Co Combination washer and drier
US3443567A (en) * 1967-11-01 1969-05-13 Howard L Moore Automatic egg flat washer
US3514329A (en) * 1968-03-27 1970-05-26 Charles Amory Hull Solid smooth-surface article washing device
US3526237A (en) * 1968-05-08 1970-09-01 Scott E Neill Jr Filter cleaner
US3727620A (en) * 1970-03-18 1973-04-17 Fluoroware Of California Inc Rinsing and drying device
US3608567A (en) * 1970-06-26 1971-09-28 Scott E Neill Jr Filter cleaning process and apparatuses
DE2125102A1 (de) * 1971-05-19 1972-11-30 Anton Huber Gmbh & Co Kg, 8050 Freising Verfahren und Einrichtung zum Reinigen einer Anzahl kleiner Gegenstände
US3769992A (en) * 1971-12-06 1973-11-06 Fluoroware Inc Spray processing machine
US3977926A (en) * 1974-12-20 1976-08-31 Western Electric Company, Inc. Methods for treating articles
US3990462A (en) * 1975-05-19 1976-11-09 Fluoroware Systems Corporation Substrate stripping and cleaning apparatus
JPS5212576A (en) * 1975-07-21 1977-01-31 Hitachi Ltd Wafer washing drying device
US4132567A (en) * 1977-10-13 1979-01-02 Fsi Corporation Apparatus for and method of cleaning and removing static charges from substrates
US4208760A (en) * 1977-12-19 1980-06-24 Huestis Machine Corp. Apparatus and method for cleaning wafers
US4197000A (en) * 1978-05-23 1980-04-08 Fsi Corporation Positive developing method and apparatus
US4370992A (en) * 1981-09-21 1983-02-01 Abbott Laboratories Washing apparatus for small parts
US4456022A (en) * 1981-10-16 1984-06-26 Roberts Donald E Flatware washing machine
JPS6014244A (ja) * 1983-07-06 1985-01-24 Fujitsu Ltd マスク洗浄装置
US4982753A (en) * 1983-07-26 1991-01-08 National Semiconductor Corporation Wafer etching, cleaning and stripping apparatus
US4571850A (en) * 1984-05-17 1986-02-25 The Fluorocarbon Company Centrifugal wafer processor
JPS61178187U (de) * 1985-04-26 1986-11-06
US4745422A (en) * 1985-11-18 1988-05-17 Kabushiki Kaisha Toshiba Automatic developing apparatus
JPS6314434A (ja) * 1986-07-04 1988-01-21 Dainippon Screen Mfg Co Ltd 基板表面処理方法および装置
US4788994A (en) * 1986-08-13 1988-12-06 Dainippon Screen Mfg. Co. Wafer holding mechanism
US5022419A (en) * 1987-04-27 1991-06-11 Semitool, Inc. Rinser dryer system
DE3815018A1 (de) * 1987-05-06 1988-12-01 Dan Science Co Traegerreinigungs- und -trocknungsvorrichtung
JPH01111338A (ja) 1987-10-24 1989-04-28 Sony Corp 洗浄方法及び洗浄装置
AT389959B (de) * 1987-11-09 1990-02-26 Sez Semiconduct Equip Zubehoer Vorrichtung zum aetzen von scheibenfoermigen gegenstaenden, insbesondere von siliziumscheiben
JP2646611B2 (ja) * 1988-02-04 1997-08-27 ソニー株式会社 ウェハキャリア洗浄装置
JPH0264646A (ja) * 1988-08-31 1990-03-05 Toshiba Corp レジストパターンの現像方法及びこの方法に使用する現像装置
US5069236A (en) * 1990-03-07 1991-12-03 Pathway Systems, Inc. Method and apparatus for cleaning disks
US5027841A (en) * 1990-04-24 1991-07-02 Electronic Controls Design, Inc. Apparatus to clean printed circuit boards
US5038809A (en) * 1990-05-31 1991-08-13 Rodgers Finishing Tools, Inc. High pressure solventless mask washer
US5000208A (en) * 1990-06-21 1991-03-19 Micron Technology, Inc. Wafer rinser/dryer
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
JP2877216B2 (ja) * 1992-10-02 1999-03-31 東京エレクトロン株式会社 洗浄装置
JPH0912576A (ja) * 1995-06-28 1997-01-14 Santen Pharmaceut Co Ltd ベンゾチアジン誘導体の製造方法
JP3695090B2 (ja) * 1997-09-30 2005-09-14 豊田工機株式会社 工作機械における自動工具交換装置

Also Published As

Publication number Publication date
DE69331912T2 (de) 2002-09-05
EP0702397B1 (de) 2002-05-08
US5738128A (en) 1998-04-14
EP1191575A2 (de) 2002-03-27
EP0702397A3 (de) 1996-05-29
EP0776027A2 (de) 1997-05-28
JP2547529B2 (ja) 1996-10-23
DE69313277D1 (de) 1997-09-25
DE69313277T2 (de) 1998-03-26
DE69331912D1 (de) 2002-06-13
ATE217445T1 (de) 2002-05-15
JPH07505260A (ja) 1995-06-08
EP0641483A1 (de) 1995-03-08
US5562113A (en) 1996-10-08
EP0641483B1 (de) 1997-08-20
US5224503A (en) 1993-07-06
WO1993026035A1 (en) 1993-12-23
EP0776027A3 (de) 1997-08-06
AU4527993A (en) 1994-01-04
EP0702397A2 (de) 1996-03-20
US5972127A (en) 1999-10-26
EP1191575A3 (de) 2006-01-18
HK1002262A1 (en) 1998-08-07

Similar Documents

Publication Publication Date Title
ATE157196T1 (de) Zentrifugal-reinigungsvorrichtung für waferbehälter
US6395101B1 (en) Single semiconductor wafer processor
US4908095A (en) Etching device, and etching method
US4637146A (en) Spin dryer
TW200507979A (en) Substrate processing apparatus, substrate processing method, and substrate holding apparatus
DE69924040D1 (de) Vorrichtung und verfahren zum handhaben von substraten mittels eines selbstgleichsetzungs-vakuumsystems in epitaxie-induktionreaktoren
JPH05243166A (ja) 半導体基板の気相成長装置
JPH06244123A (ja) 改良された排出システムを有する単一基板式の真空処理装置
KR20220096025A (ko) 지지 유닛, 기판 처리 장치 및 방법
JPS59166675A (ja) エツチング装置
JP3559149B2 (ja) 基板処理装置
JP3401428B2 (ja) 処理装置
US20040025901A1 (en) Stationary wafer spin/spray processor
JP2585277B2 (ja) 表面処理装置
JPS6383275A (ja) 被処理体の処理方法
JP2756777B2 (ja) 基板処理装置
JP2000252350A (ja) 基板受け渡し装置
JPH0722378A (ja) 基板回転乾燥装置の排気装置
JPH03148127A (ja) 半導体湿式処理装置
JPS6233315Y2 (de)
JP3971534B2 (ja) 基板回転乾燥装置
JPS6220347A (ja) 処理装置
KR930006786Y1 (ko) 화학약품에 의한 웨이퍼 식각(etching)장치
JPH03124030A (ja) 洗浄・乾燥方法及び洗浄装置
JPH082649Y2 (ja) 液晶製造装置