ATE175814T1 - Verfahren um eine eingerahmte arbeitsfläche aus der übrigbleibenden fläche einer folie kontrolliert zu schneiden - Google Patents

Verfahren um eine eingerahmte arbeitsfläche aus der übrigbleibenden fläche einer folie kontrolliert zu schneiden

Info

Publication number
ATE175814T1
ATE175814T1 AT92307080T AT92307080T ATE175814T1 AT E175814 T1 ATE175814 T1 AT E175814T1 AT 92307080 T AT92307080 T AT 92307080T AT 92307080 T AT92307080 T AT 92307080T AT E175814 T1 ATE175814 T1 AT E175814T1
Authority
AT
Austria
Prior art keywords
membrane
cutting
film
work surface
remaining area
Prior art date
Application number
AT92307080T
Other languages
English (en)
Inventor
Yung-Tsai Yen
Original Assignee
Yen Yung Tsai
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yen Yung Tsai filed Critical Yen Yung Tsai
Application granted granted Critical
Publication of ATE175814T1 publication Critical patent/ATE175814T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0442—Apparatus for placing on an insulating substrate, e.g. tape
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/16—Two dimensionally sectional layer
    • Y10T428/161—Two dimensionally sectional layer with frame, casing, or perimeter structure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Absorbent Articles And Supports Therefor (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • Control And Other Processes For Unpacking Of Materials (AREA)
  • Eye Examination Apparatus (AREA)
  • Laser Beam Processing (AREA)
  • Processing Of Meat And Fish (AREA)
AT92307080T 1991-08-26 1992-08-03 Verfahren um eine eingerahmte arbeitsfläche aus der übrigbleibenden fläche einer folie kontrolliert zu schneiden ATE175814T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/749,709 US5254375A (en) 1991-08-26 1991-08-26 Apparatus for controllably separating framed working area from remainder of the membrane

Publications (1)

Publication Number Publication Date
ATE175814T1 true ATE175814T1 (de) 1999-01-15

Family

ID=25014849

Family Applications (1)

Application Number Title Priority Date Filing Date
AT92307080T ATE175814T1 (de) 1991-08-26 1992-08-03 Verfahren um eine eingerahmte arbeitsfläche aus der übrigbleibenden fläche einer folie kontrolliert zu schneiden

Country Status (10)

Country Link
US (1) US5254375A (de)
EP (1) EP0529827B1 (de)
JP (1) JPH07101303B2 (de)
KR (1) KR960014052B1 (de)
AT (1) ATE175814T1 (de)
CA (1) CA2070325C (de)
DE (1) DE69228157T2 (de)
DK (1) DK0529827T3 (de)
ES (1) ES2129433T3 (de)
GR (1) GR3029526T3 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5453816A (en) * 1994-09-22 1995-09-26 Micro Lithography, Inc. Protective mask for pellicle
US5576125A (en) * 1995-07-27 1996-11-19 Micro Lithography, Inc. Method for making an optical pellicle
US5820950A (en) * 1996-10-30 1998-10-13 Micro Lithography, Inc. Optical pellicle and package
US5772817A (en) * 1997-02-10 1998-06-30 Micro Lithography, Inc. Optical pellicle mounting system
US5769984A (en) * 1997-02-10 1998-06-23 Micro Lithography, Inc. Optical pellicle adhesion system
US6841317B2 (en) 2002-08-27 2005-01-11 Micro Lithography, Inc. Vent for an optical pellicle system
US7316869B2 (en) 2003-08-26 2008-01-08 Intel Corporation Mounting a pellicle to a frame
US7264853B2 (en) * 2003-08-26 2007-09-04 Intel Corporation Attaching a pellicle frame to a reticle
US7314667B2 (en) 2004-03-12 2008-01-01 Intel Corporation Process to optimize properties of polymer pellicles and resist for lithography applications
US20070037067A1 (en) * 2005-08-15 2007-02-15 Ching-Bore Wang Optical pellicle with a filter and a vent
JP6021431B2 (ja) * 2012-05-22 2016-11-09 株式会社ディスコ 表面保護テープの貼着方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4378953A (en) * 1981-12-02 1983-04-05 Advanced Semiconductor Products Thin, optical membranes and methods and apparatus for making them
US4465759A (en) * 1983-02-14 1984-08-14 The Perkin-Elmer Corporation Method of fabricating a pellicle cover for projection printing system
EP0118623A1 (de) * 1983-02-14 1984-09-19 The Perkin-Elmer Corporation Filmabdeckung für Photomaske
US4470508A (en) * 1983-08-19 1984-09-11 Micro Lithography, Inc. Dustfree packaging container and method
US4759990A (en) * 1985-11-27 1988-07-26 Yen Yung Tsai Composite optical element including anti-reflective coating
US4737387A (en) * 1986-07-07 1988-04-12 Yen Yung Tsai Removable pellicle and method
US5008156A (en) * 1986-11-07 1991-04-16 Exion Technology, Inc. Photochemically stable mid and deep ultraviolet pellicles
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜
DE3920788C1 (de) * 1989-06-24 1990-12-13 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De

Also Published As

Publication number Publication date
KR930005112A (ko) 1993-03-23
DK0529827T3 (da) 1999-09-13
CA2070325A1 (en) 1993-02-27
CA2070325C (en) 1997-09-30
JPH07101303B2 (ja) 1995-11-01
DE69228157T2 (de) 1999-07-08
EP0529827A1 (de) 1993-03-03
US5254375A (en) 1993-10-19
DE69228157D1 (de) 1999-02-25
KR960014052B1 (ko) 1996-10-11
GR3029526T3 (en) 1999-06-30
ES2129433T3 (es) 1999-06-16
JPH05197134A (ja) 1993-08-06
EP0529827B1 (de) 1999-01-13

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee