ATE208509T1 - Analysierender elektronstrahl-stopper - Google Patents

Analysierender elektronstrahl-stopper

Info

Publication number
ATE208509T1
ATE208509T1 AT96901203T AT96901203T ATE208509T1 AT E208509 T1 ATE208509 T1 AT E208509T1 AT 96901203 T AT96901203 T AT 96901203T AT 96901203 T AT96901203 T AT 96901203T AT E208509 T1 ATE208509 T1 AT E208509T1
Authority
AT
Austria
Prior art keywords
measure
segments
electrons
electron beam
segment
Prior art date
Application number
AT96901203T
Other languages
English (en)
Inventor
Courtlandt B Lawrence
M Aslam Lone
John W Barnard
Dennis L Smyth
Wlodzimierz Kaszuba
Original Assignee
Ca Atomic Energy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ca Atomic Energy Ltd filed Critical Ca Atomic Energy Ltd
Application granted granted Critical
Publication of ATE208509T1 publication Critical patent/ATE208509T1/de

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F1/00—Shielding characterised by the composition of the materials
    • G21F1/02—Selection of uniform shielding materials
    • G21F1/08—Metals; Alloys; Cermets, i.e. sintered mixtures of ceramics and metals
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Ceramic Engineering (AREA)
  • Metallurgy (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Measurement Of Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Tests Of Electronic Circuits (AREA)
AT96901203T 1995-02-23 1996-02-07 Analysierender elektronstrahl-stopper ATE208509T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/392,512 US5714875A (en) 1995-02-23 1995-02-23 Electron beam stop analyzer
PCT/CA1996/000072 WO1996026454A1 (en) 1995-02-23 1996-02-07 Electron beam stop analyzer

Publications (1)

Publication Number Publication Date
ATE208509T1 true ATE208509T1 (de) 2001-11-15

Family

ID=23550893

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96901203T ATE208509T1 (de) 1995-02-23 1996-02-07 Analysierender elektronstrahl-stopper

Country Status (9)

Country Link
US (1) US5714875A (de)
EP (1) EP0811172B1 (de)
JP (1) JPH11500531A (de)
AT (1) ATE208509T1 (de)
AU (1) AU4532896A (de)
CA (1) CA2196411C (de)
DE (1) DE69616763D1 (de)
DK (1) DK0811172T3 (de)
WO (1) WO1996026454A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100389899B1 (ko) * 1997-12-18 2003-07-04 미크론 테크놀로지,인코포레이티드 핫-캐리어 효과 제한 트랜지스터 게이트 형성 및 그 트랜지스터
US6919570B2 (en) * 2002-12-19 2005-07-19 Advanced Electron Beams, Inc. Electron beam sensor
JP4914568B2 (ja) * 2004-11-11 2012-04-11 オリンパス株式会社 受光装置
US8314386B2 (en) 2010-03-26 2012-11-20 Uchicago Argonne, Llc High collection efficiency X-ray spectrometer system with integrated electron beam stop, electron detector and X-ray detector for use on electron-optical beam lines and microscopes
US10535441B1 (en) 2010-07-27 2020-01-14 Mevex Corporation Method of irradiating a target
CA2713972A1 (en) * 2010-07-27 2012-01-27 Mevex Corporation Power concentrator for electron and/or x-ray beams
CN103377864B (zh) * 2012-04-28 2015-11-18 中国科学院电子学研究所 用于真空电子器件的强流电子注能散测量系统及测量方法
US11324971B2 (en) * 2018-03-20 2022-05-10 Adam S.A. Improving safety around a linear accelerator
US10748740B2 (en) * 2018-08-21 2020-08-18 Fei Company X-ray and particle shield for improved vacuum conductivity
CN111538065A (zh) * 2020-06-15 2020-08-14 上海高鹰科技有限公司 一种辐照加速器电子束流的在线扫描参数检测系统
CN114200505A (zh) * 2021-12-27 2022-03-18 中广核达胜加速器技术有限公司 电子加速器束流强度测量装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3733546A (en) * 1971-07-21 1973-05-15 Atomic Energy Commission Beam current position, intensity and profile monitoring by resistive detection of beam image wall currents
DE2824308A1 (de) * 1978-06-02 1979-12-13 Siemens Ag Verfahren zum einpraegen einer spannung mit einem elektronenstrahl
DE2831602A1 (de) * 1978-07-19 1980-02-07 Leybold Heraeus Gmbh & Co Kg Vorrichtung zur erfassung von strahlparametern eines periodisch ueber eine zielflaeche gefuehrten, fokussierten ladungstraegerstrahls und messverfahren unter verwendung der vorrichtung
FR2441182A1 (fr) * 1978-11-07 1980-06-06 Thomson Csf Dispositif de visualisation de la repartition de la densite du courant au sein d'un faisceau de particules chargees
JPS5618422A (en) * 1979-07-23 1981-02-21 Hitachi Ltd Measuring method for diameter of electron beam
SU869473A1 (ru) * 1980-05-13 1985-06-15 Научно-Исследовательский Институт Электронной Интроскопии При Томском Ордена Октябрьской Революции И Ордена Трудового Красного Знамени Политехническом Институте Им.С.М.Кирова Способ измерени энергии электронов в пучке
GB2098793A (en) * 1981-05-18 1982-11-24 Varian Associates Method of and apparatus for deflecting an ion beam of an ion implantater onto an ion absorbing target
SU1066050A1 (ru) * 1982-09-06 1984-01-07 Московский Государственный Научно-Исследовательский Рентгено-Радиологический Институт Способ регулировани энергии в установке дл облучени объектов жестким тормозным излучением
US4629975A (en) * 1984-06-19 1986-12-16 The United States Of America As Represented By The Secretary Of The Navy Coaxial probe for measuring the current density profile of intense electron beams
US4724324A (en) * 1986-11-24 1988-02-09 Varian Associates, Inc. Method and apparatus for ion beam centroid location
US4992742A (en) * 1988-12-22 1991-02-12 Mitsubishi Denki Kabushiki Kaisha Charged-particle distribution measuring apparatus
US5138256A (en) * 1991-04-23 1992-08-11 International Business Machines Corp. Method and apparatus for determining the thickness of an interfacial polysilicon/silicon oxide film
RU2009526C1 (ru) * 1991-07-15 1994-03-15 Харьковский физико-технический институт Устройство для диагностики параметров потока электронов
US5198676A (en) * 1991-09-27 1993-03-30 Eaton Corporation Ion beam profiling method and apparatus

Also Published As

Publication number Publication date
EP0811172B1 (de) 2001-11-07
CA2196411C (en) 1999-11-30
EP0811172A1 (de) 1997-12-10
CA2196411A1 (en) 1996-08-29
JPH11500531A (ja) 1999-01-12
US5714875A (en) 1998-02-03
DE69616763D1 (de) 2001-12-13
WO1996026454A1 (en) 1996-08-29
DK0811172T3 (da) 2002-01-21
AU4532896A (en) 1996-09-11

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