ATE215132T1 - Plasmaborierung - Google Patents

Plasmaborierung

Info

Publication number
ATE215132T1
ATE215132T1 AT98965249T AT98965249T ATE215132T1 AT E215132 T1 ATE215132 T1 AT E215132T1 AT 98965249 T AT98965249 T AT 98965249T AT 98965249 T AT98965249 T AT 98965249T AT E215132 T1 ATE215132 T1 AT E215132T1
Authority
AT
Austria
Prior art keywords
plasma
boardation
minimum
excited
specified
Prior art date
Application number
AT98965249T
Other languages
English (en)
Inventor
Cabeo Emilio Rodriguez
Guenther Laudien
Kyong-Tschong Rie
Swen Biemer
Original Assignee
Volkswagen Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Volkswagen Ag filed Critical Volkswagen Ag
Application granted granted Critical
Publication of ATE215132T1 publication Critical patent/ATE215132T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C23C8/38—Treatment of ferrous surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Primary Cells (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
AT98965249T 1997-12-15 1998-12-11 Plasmaborierung ATE215132T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19755595 1997-12-15
PCT/EP1998/008079 WO1999031291A2 (de) 1997-12-15 1998-12-11 Plasmaborierung

Publications (1)

Publication Number Publication Date
ATE215132T1 true ATE215132T1 (de) 2002-04-15

Family

ID=7851902

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98965249T ATE215132T1 (de) 1997-12-15 1998-12-11 Plasmaborierung

Country Status (8)

Country Link
US (1) US6783794B1 (de)
EP (2) EP1143031A3 (de)
JP (1) JP4588213B2 (de)
KR (1) KR100583262B1 (de)
CN (1) CN1198953C (de)
AT (1) ATE215132T1 (de)
DE (1) DE59803574D1 (de)
WO (1) WO1999031291A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE524493C2 (sv) * 2002-02-25 2004-08-17 Telia Ab Uppskattningsenhet och metod för att bestämma positionen för en mobil station i ett mobilt kommunikationssystem
EP1938672A4 (de) * 2005-09-22 2010-05-19 Skaffco Engineering & Mfg Inc Plasma-borierungsverfahren
CA2649525A1 (en) * 2006-04-20 2007-11-01 Habib Skaff Mechanical parts having increased wear resistance
WO2008116159A2 (en) * 2007-03-22 2008-09-25 Skaff Corporation Of America, Inc. Mechanical parts having increased wear-resistance
US8338317B2 (en) * 2011-04-06 2012-12-25 Infineon Technologies Ag Method for processing a semiconductor wafer or die, and particle deposition device
CN104233425B (zh) * 2014-09-29 2017-01-25 河海大学常州校区 微弧渗硼催化溶液和微弧渗硼溶液以及微弧渗硼方法
KR102084296B1 (ko) * 2016-12-15 2020-03-03 도쿄엘렉트론가부시키가이샤 성막 방법, 붕소 막 및 성막 장치

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677799A (en) * 1970-11-10 1972-07-18 Celanese Corp Vapor phase boron deposition by pulse discharge
JPS5118944A (ja) * 1974-08-07 1976-02-14 Suwa Seikosha Kk Kisohokaho
JPS56105627A (en) * 1980-01-28 1981-08-22 Fuji Photo Film Co Ltd Manufacture of amorphous semiconductor
DE3322341A1 (de) 1983-06-22 1985-01-03 Siegfried Dr.-Ing. 5135 Selfkant Strämke Verfahren und vorrichtung zur oberflaechenbehandlung von werkstuecken durch glimmentladung
DE3908200C1 (de) * 1989-03-14 1989-09-07 Degussa Ag, 6000 Frankfurt, De
DE4003623A1 (de) * 1990-02-07 1991-08-08 Kloeckner Ionon Verfahren zur steuerung einer anlage zur plasmabehandlung von werkstuecken
US5286534A (en) * 1991-12-23 1994-02-15 Minnesota Mining And Manufacturing Company Process for plasma deposition of a carbon rich coating
US5374456A (en) 1992-12-23 1994-12-20 Hughes Aircraft Company Surface potential control in plasma processing of materials
US5354381A (en) * 1993-05-07 1994-10-11 Varian Associates, Inc. Plasma immersion ion implantation (PI3) apparatus
FR2708624A1 (fr) * 1993-07-30 1995-02-10 Neuville Stephane Procédé de dépôt d'un revêtement protecteur à base de pseudo carbone diamant amorphe ou de carbure de silicium modifié.
JPH07286254A (ja) * 1994-04-21 1995-10-31 Sumitomo Metal Ind Ltd 耐二次加工脆性に優れた鋼板およびその製造方法
JP3050361B2 (ja) * 1994-07-19 2000-06-12 株式会社ライムズ 金属部材のイオン窒化方法
DE4427902C1 (de) * 1994-08-06 1995-03-30 Leybold Durferrit Gmbh Verfahren zum Aufkohlen von Bauteilen aus kohlungsfähigen Werkstoffen mittels einer impulsförmig betriebenen Plasmaentladung
US5578725A (en) 1995-01-30 1996-11-26 Regents Of The University Of Minnesota Delta opioid receptor antagonists
JPH0982495A (ja) * 1995-09-18 1997-03-28 Toshiba Corp プラズマ生成装置およびプラズマ生成方法
US6306225B1 (en) * 1996-01-25 2001-10-23 Bor Tec Gmbh Process for producing wear-resistant boride layers on metallic material surfaces
DE19602639A1 (de) 1996-01-25 1997-07-31 Kempten Elektroschmelz Gmbh Verfahren zur Herstellung von verschleißfesten Boridschichten auf metallischen Werkstoffoberflächen
DE19629877C1 (de) * 1996-07-24 1997-03-27 Schott Glaswerke CVD-Verfahren und Vorrichtung zur Innenbeschichtung von Hohlkörpern
US5654043A (en) * 1996-10-10 1997-08-05 Eaton Corporation Pulsed plate plasma implantation system and method
US6101971A (en) * 1998-05-13 2000-08-15 Axcelis Technologies, Inc. Ion implantation control using charge collection, optical emission spectroscopy and mass analysis
US20040016402A1 (en) * 2002-07-26 2004-01-29 Walther Steven R. Methods and apparatus for monitoring plasma parameters in plasma doping systems

Also Published As

Publication number Publication date
CN1198953C (zh) 2005-04-27
US6783794B1 (en) 2004-08-31
JP4588213B2 (ja) 2010-11-24
EP1143031A2 (de) 2001-10-10
DE59803574D1 (de) 2002-05-02
JP2002508448A (ja) 2002-03-19
EP1143031A3 (de) 2004-04-28
KR100583262B1 (ko) 2006-05-25
WO1999031291A3 (de) 1999-09-10
CN1282383A (zh) 2001-01-31
EP1044289B1 (de) 2002-03-27
EP1044289A2 (de) 2000-10-18
KR20010033075A (ko) 2001-04-25
WO1999031291A2 (de) 1999-06-24

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Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee