ATE21530T1 - Verfahren zum aetzen von hoehlen und oeffnungen in substraten. - Google Patents
Verfahren zum aetzen von hoehlen und oeffnungen in substraten.Info
- Publication number
- ATE21530T1 ATE21530T1 AT83201569T AT83201569T ATE21530T1 AT E21530 T1 ATE21530 T1 AT E21530T1 AT 83201569 T AT83201569 T AT 83201569T AT 83201569 T AT83201569 T AT 83201569T AT E21530 T1 ATE21530 T1 AT E21530T1
- Authority
- AT
- Austria
- Prior art keywords
- etching
- caves
- substrates
- openings
- apertures
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Prostheses (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Materials For Medical Uses (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Weting (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8204307A NL8204307A (nl) | 1982-11-08 | 1982-11-08 | Werkwijze voor het etsen van holten en openingen in substraten en inrichting voor het uitvoeren van deze werkwijze. |
| EP83201569A EP0108458B1 (de) | 1982-11-08 | 1983-11-02 | Verfahren zum Ätzen von Höhlen und Öffnungen in Substraten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE21530T1 true ATE21530T1 (de) | 1986-09-15 |
Family
ID=19840541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT83201569T ATE21530T1 (de) | 1982-11-08 | 1983-11-02 | Verfahren zum aetzen von hoehlen und oeffnungen in substraten. |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4448635A (de) |
| EP (1) | EP0108458B1 (de) |
| JP (1) | JPS5999724A (de) |
| AT (1) | ATE21530T1 (de) |
| AU (1) | AU557830B2 (de) |
| CA (1) | CA1230285A (de) |
| DE (1) | DE3365471D1 (de) |
| NL (1) | NL8204307A (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4746397A (en) * | 1986-01-17 | 1988-05-24 | Matsushita Electric Industrial Co., Ltd. | Treatment method for plate-shaped substrate |
| US4927784A (en) * | 1987-05-01 | 1990-05-22 | Raytheon Company | Simultaneous formation of via hole and tube structures for GaAs monolithic microwave integrated circuits |
| US4944986A (en) * | 1988-09-23 | 1990-07-31 | Zuel Company | Anti-reflective glass surface |
| US5120605A (en) * | 1988-09-23 | 1992-06-09 | Zuel Company, Inc. | Anti-reflective glass surface |
| US5746876A (en) * | 1996-06-03 | 1998-05-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Safety sampler for hot acid in semiconductor manufacturing fab |
| US7857972B2 (en) * | 2003-09-05 | 2010-12-28 | Foret Plasma Labs, Llc | Apparatus for treating liquids with wave energy from an electrical arc |
| US7422695B2 (en) * | 2003-09-05 | 2008-09-09 | Foret Plasma Labs, Llc | Treatment of fluids with wave energy from a carbon arc |
| US6929861B2 (en) | 2002-03-05 | 2005-08-16 | Zuel Company, Inc. | Anti-reflective glass surface with improved cleanability |
| CA2683165C (en) * | 2006-04-05 | 2013-06-11 | Foret Plasma Labs, Llc | System, method and apparatus for treating liquids with wave energy from plasma |
| JP5980012B2 (ja) * | 2012-06-27 | 2016-08-31 | キヤノン株式会社 | シリコンウェハの加工方法 |
| KR101665384B1 (ko) * | 2014-04-03 | 2016-10-12 | 한국지질자원연구원 | 중력계를 이용한 지하물질의 밀도변화 측정방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE143333C (de) * | ||||
| US2869266A (en) * | 1954-10-04 | 1959-01-20 | Turco Products Inc | Method for removing metal from the surface of a metal object |
| US2867929A (en) * | 1956-12-20 | 1959-01-13 | Gen Dynamics Corp | Method and apparatus for chemically boring metallic material |
| US3383255A (en) * | 1964-11-05 | 1968-05-14 | North American Rockwell | Planar etching of fused silica |
| FR1523245A (fr) * | 1967-03-02 | 1968-05-03 | Corning Glass Works | Procédé de gravure à l'acide |
| US3674579A (en) * | 1970-07-02 | 1972-07-04 | Ncr Co | Method of forming electrical conductors |
| US3730799A (en) * | 1971-07-07 | 1973-05-01 | Collins Radio Co | Method for metallic pattern definition |
| US4113549A (en) * | 1977-04-06 | 1978-09-12 | Chem-Tronics, Inc. | Chemical milling process |
-
1982
- 1982-11-08 NL NL8204307A patent/NL8204307A/nl not_active Application Discontinuation
-
1983
- 1983-02-04 US US06/463,761 patent/US4448635A/en not_active Expired - Fee Related
- 1983-11-02 DE DE8383201569T patent/DE3365471D1/de not_active Expired
- 1983-11-02 EP EP83201569A patent/EP0108458B1/de not_active Expired
- 1983-11-02 AT AT83201569T patent/ATE21530T1/de not_active IP Right Cessation
- 1983-11-03 CA CA000440408A patent/CA1230285A/en not_active Expired
- 1983-11-04 AU AU20979/83A patent/AU557830B2/en not_active Ceased
- 1983-11-08 JP JP58208448A patent/JPS5999724A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP0108458B1 (de) | 1986-08-20 |
| EP0108458A1 (de) | 1984-05-16 |
| DE3365471D1 (en) | 1986-09-25 |
| US4448635A (en) | 1984-05-15 |
| JPS5999724A (ja) | 1984-06-08 |
| AU557830B2 (en) | 1987-01-08 |
| CA1230285A (en) | 1987-12-15 |
| NL8204307A (nl) | 1984-06-01 |
| AU2097983A (en) | 1984-05-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification | ||
| REN | Ceased due to non-payment of the annual fee |