ATE216322T1 - Diamantmarkierverfahren - Google Patents

Diamantmarkierverfahren

Info

Publication number
ATE216322T1
ATE216322T1 AT98922948T AT98922948T ATE216322T1 AT E216322 T1 ATE216322 T1 AT E216322T1 AT 98922948 T AT98922948 T AT 98922948T AT 98922948 T AT98922948 T AT 98922948T AT E216322 T1 ATE216322 T1 AT E216322T1
Authority
AT
Austria
Prior art keywords
facet
gemstone
metal
mask
applying
Prior art date
Application number
AT98922948T
Other languages
English (en)
Inventor
James Gordon Charters Smith
Keith Barry Guy
Graham Ralph Powell
Michael Peter Gaukroger
Original Assignee
Gersan Ets
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gersan Ets filed Critical Gersan Ets
Application granted granted Critical
Publication of ATE216322T1 publication Critical patent/ATE216322T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
    • B44B7/00—Machines, apparatus or hand tools for branding, e.g. using radiant energy such as laser beams
    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C15/00—Other forms of jewellery
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Drying Of Semiconductors (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Peptides Or Proteins (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Adornments (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Chemical Vapour Deposition (AREA)
AT98922948T 1997-05-23 1998-05-22 Diamantmarkierverfahren ATE216322T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9710736A GB2325439A (en) 1997-05-23 1997-05-23 Marking diamond gemstone by plasma or ion beam etching through a laser ablated resist
PCT/GB1998/001493 WO1998052773A1 (en) 1997-05-23 1998-05-22 Marking diamond

Publications (1)

Publication Number Publication Date
ATE216322T1 true ATE216322T1 (de) 2002-05-15

Family

ID=10812995

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98922948T ATE216322T1 (de) 1997-05-23 1998-05-22 Diamantmarkierverfahren

Country Status (16)

Country Link
US (1) US6358427B1 (de)
EP (1) EP0983152B1 (de)
JP (1) JP2001526571A (de)
KR (1) KR20010012915A (de)
CN (1) CN1140421C (de)
AT (1) ATE216322T1 (de)
AU (1) AU728923B2 (de)
CA (1) CA2291042A1 (de)
DE (1) DE69804957T2 (de)
ES (1) ES2174438T3 (de)
GB (2) GB2325439A (de)
IL (1) IL124591A (de)
RU (1) RU2198099C2 (de)
TW (1) TW388736B (de)
WO (1) WO1998052773A1 (de)
ZA (1) ZA984375B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080316171A1 (en) * 2000-01-14 2008-12-25 Immersion Corporation Low-Cost Haptic Mouse Implementations
US6593543B2 (en) * 2000-07-20 2003-07-15 David Benderly Gemstone marking system and method
GB0103881D0 (en) 2001-02-16 2001-04-04 Gersan Ets E-beam marking
US6624385B2 (en) * 2001-12-21 2003-09-23 Eastman Kodak Company Method for marking gemstones with a unique micro discrete indicia
DE10310293A1 (de) * 2003-03-10 2004-09-23 Robert Bosch Gmbh Vorrichtung zum Laserbohren
WO2005061400A1 (en) * 2003-12-12 2005-07-07 Element Six Limited Method of incorporating a mark in cvd diamond
US20060144821A1 (en) * 2005-01-04 2006-07-06 Academia Sinica Method for engraving irreproducible pattern on the surface of a diamond
RU2357870C1 (ru) * 2005-08-22 2009-06-10 Интернейшнел Джемстоун Реджистри Инк. Способ и система для лазерного мечения драгоценных камней, таких как алмазы
EA016643B1 (ru) * 2007-07-27 2012-06-29 Юрий Константинович НИЗИЕНКО Способ маркировки ценных изделий
RU2427041C2 (ru) * 2009-05-08 2011-08-20 Юрий Константинович Низиенко Способ формирования идентификационной метки для маркировки ценных изделий и ценное изделие с ее использованием
CN102569506B (zh) * 2011-12-29 2014-06-18 广东爱康太阳能科技有限公司 一种采用硅烷掩膜制备太阳能电池金属电极的方法
RU2557360C2 (ru) * 2012-12-20 2015-07-20 Общество с ограниченной ответственностью "Си Эн Эл Девайсез" Формирование маски для травления алмазных пленок
SG11201509479WA (en) * 2013-05-30 2015-12-30 Goldway Technology Ltd Method of marking material and system therefore, and material marked according to same method
HK1198858A2 (en) * 2014-04-16 2015-06-12 Master Dynamic Limited Method of marking a solid state material, and solid state materials marked according to such a method
TWI814173B (zh) * 2020-12-14 2023-09-01 香港商金展科技有限公司 在多個寶石的外表面形成可識別標記的方法和系統，以及根據這種方法標記的寶石
US11886122B2 (en) 2021-06-24 2024-01-30 Fraunhofer Usa, Inc. Deep etching substrates using a bi-layer etch mask

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4018938A (en) 1975-06-30 1977-04-19 International Business Machines Corporation Fabrication of high aspect ratio masks
US4117301A (en) * 1975-07-21 1978-09-26 Rca Corporation Method of making a submicrometer aperture in a substrate
JPS5290372A (en) * 1976-01-23 1977-07-29 Okuda Kazumi Patter embossed diamond
JPS5812234B2 (ja) 1976-12-24 1983-03-07 一實 奥田 表示入りダイヤモンドの製造方法
EP0064780A1 (de) * 1981-05-07 1982-11-17 Maurice Hakoune Verfahren zur Bearbeitung eines Edelsteins und der nach diesem Verfahren bearbeitete Edelstein
US4632898A (en) 1985-04-15 1986-12-30 Eastman Kodak Company Process for fabricating glass tooling
US4675273A (en) 1986-02-10 1987-06-23 Loctite (Ireland) Limited Resists formed by vapor deposition of anionically polymerizable monomer
JPS6334927A (ja) 1986-07-29 1988-02-15 Matsushita Electric Ind Co Ltd ダイヤモンドの加工方法
US4786358A (en) 1986-08-08 1988-11-22 Semiconductor Energy Laboratory Co., Ltd. Method for forming a pattern of a film on a substrate with a laser beam
US5045150A (en) 1986-09-11 1991-09-03 National Semiconductor Corp. Plasma etching using a bilayer mask
JP2542608B2 (ja) 1987-03-09 1996-10-09 住友電気工業株式会社 ダイヤモンド半導体のエツチング方法
JPS63220525A (ja) 1987-03-09 1988-09-13 Sumitomo Electric Ind Ltd ダイヤモンド半導体のエツチング方法
JPS63237531A (ja) 1987-03-26 1988-10-04 Toshiba Corp 微細加工方法
JPH07113774B2 (ja) 1987-05-29 1995-12-06 株式会社日立製作所 パタ−ンの形成方法
US4873176A (en) 1987-08-28 1989-10-10 Shipley Company Inc. Reticulation resistant photoresist coating
US4756794A (en) 1987-08-31 1988-07-12 The United States Of America As Represented By The Secretary Of The Navy Atomic layer etching
US4780177A (en) 1988-02-05 1988-10-25 General Electric Company Excimer laser patterning of a novel resist
US4842677A (en) 1988-02-05 1989-06-27 General Electric Company Excimer laser patterning of a novel resist using masked and maskless process steps
DE3903421A1 (de) * 1989-02-06 1990-08-09 Hoechst Ag Elektrisch leitfaehige resistmasse, verfahren zu ihrer herstellung und ihre verwendung
JPH03261953A (ja) 1990-03-13 1991-11-21 Fujitsu Ltd 微細パターンの形成方法
JP2763172B2 (ja) * 1990-03-19 1998-06-11 株式会社神戸製鋼所 ダイヤモンド薄膜のエッチング方法
US5196376A (en) 1991-03-01 1993-03-23 Polycon Corporation Laser lithography for integrated circuit and integrated circuit interconnect manufacture
US5397428A (en) 1991-12-20 1995-03-14 The University Of North Carolina At Chapel Hill Nucleation enhancement for chemical vapor deposition of diamond
JP3104433B2 (ja) 1992-10-16 2000-10-30 住友電気工業株式会社 ダイヤモンドのエッチング方法
US5269890A (en) 1992-12-31 1993-12-14 The United States Of America As Represented By The Secretary Of The Navy Electrochemical process and product therefrom
JP3651025B2 (ja) 1994-08-09 2005-05-25 住友電気工業株式会社 マーク付きダイヤモンドおよびその形成方法
GB9514558D0 (en) * 1995-07-17 1995-09-13 Gersan Ets Marking diamond
US5591480A (en) 1995-08-21 1997-01-07 Motorola, Inc. Method for fabricating metallization patterns on an electronic substrate

Also Published As

Publication number Publication date
AU728923B2 (en) 2001-01-18
GB2325439A (en) 1998-11-25
HK1025544A1 (en) 2000-11-17
US6358427B1 (en) 2002-03-19
CA2291042A1 (en) 1998-11-26
ES2174438T3 (es) 2002-11-01
CN1264341A (zh) 2000-08-23
GB9710736D0 (en) 1997-07-16
GB2339726A (en) 2000-02-09
DE69804957T2 (de) 2002-10-17
RU2198099C2 (ru) 2003-02-10
KR20010012915A (ko) 2001-02-26
TW388736B (en) 2000-05-01
EP0983152A1 (de) 2000-03-08
CN1140421C (zh) 2004-03-03
WO1998052773A1 (en) 1998-11-26
JP2001526571A (ja) 2001-12-18
DE69804957D1 (de) 2002-05-23
AU7540898A (en) 1998-12-11
GB2339726B (en) 2001-09-12
GB9927676D0 (en) 2000-01-19
IL124591A (en) 2001-10-31
ZA984375B (en) 1999-11-22
IL124591A0 (en) 1998-12-06
EP0983152B1 (de) 2002-04-17

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Legal Events

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