ATE231193T1 - Flüssige cvd-vorläuferverbindung - Google Patents

Flüssige cvd-vorläuferverbindung

Info

Publication number
ATE231193T1
ATE231193T1 AT99926692T AT99926692T ATE231193T1 AT E231193 T1 ATE231193 T1 AT E231193T1 AT 99926692 T AT99926692 T AT 99926692T AT 99926692 T AT99926692 T AT 99926692T AT E231193 T1 ATE231193 T1 AT E231193T1
Authority
AT
Austria
Prior art keywords
precursor compound
cvd precursor
liquid cvd
polyfluoroalkenyl
compound
Prior art date
Application number
AT99926692T
Other languages
English (en)
Inventor
Gilles Merienne
Original Assignee
Gilles Merienne
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gilles Merienne filed Critical Gilles Merienne
Application granted granted Critical
Publication of ATE231193T1 publication Critical patent/ATE231193T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2208—Compounds having tin linked only to carbon, hydrogen and/or halogen
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Steroid Compounds (AREA)
AT99926692T 1998-07-10 1999-07-05 Flüssige cvd-vorläuferverbindung ATE231193T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11319698A 1998-07-10 1998-07-10
PCT/IB1999/001245 WO2000003063A1 (en) 1998-07-10 1999-07-05 Liquid precursor for chemical vapor deposition

Publications (1)

Publication Number Publication Date
ATE231193T1 true ATE231193T1 (de) 2003-02-15

Family

ID=22348094

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99926692T ATE231193T1 (de) 1998-07-10 1999-07-05 Flüssige cvd-vorläuferverbindung

Country Status (8)

Country Link
US (1) US6689203B2 (de)
EP (1) EP1099006B1 (de)
JP (1) JP2002520488A (de)
KR (1) KR100666521B1 (de)
AT (1) ATE231193T1 (de)
AU (1) AU4386399A (de)
DE (1) DE69904942D1 (de)
WO (1) WO2000003063A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE487604T1 (de) * 2000-05-22 2010-11-15 Seiko Epson Corp Kopfelement und verfahren zur tintenabweisenden behandlung
EP2067474A1 (de) 2007-12-05 2009-06-10 Grindeks, a joint stock company Neue medizinische Verwendung von 3-(2,2,2-Trimethylhydrazinium)propionat-Salz
TW202600573A (zh) * 2018-06-30 2026-01-01 美商應用材料股份有限公司 含錫之前驅物及沉積含錫薄膜之方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6018090B2 (ja) * 1979-10-03 1985-05-08 日本板硝子株式会社 導電薄膜の形成方法
US4705701A (en) * 1984-11-14 1987-11-10 Chronar Corporation Conductive tin oxide methods
US4590096A (en) * 1984-12-28 1986-05-20 M&T Chemicals Inc. Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass
US4547400A (en) * 1985-02-25 1985-10-15 Ford Motor Company Method of making infrared reflective glass sheet-I
AU576676B2 (en) * 1985-05-14 1988-09-01 M And T Chemicals Inc. Method of producing transparent, haze-free tin oxide coatings

Also Published As

Publication number Publication date
EP1099006B1 (de) 2003-01-15
AU4386399A (en) 2000-02-01
US6689203B2 (en) 2004-02-10
JP2002520488A (ja) 2002-07-09
WO2000003063A1 (en) 2000-01-20
DE69904942D1 (de) 2003-02-20
KR100666521B1 (ko) 2007-01-11
US20030035890A1 (en) 2003-02-20
EP1099006A1 (de) 2001-05-16
KR20010074688A (ko) 2001-08-09

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Legal Events

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