ATE231964T1 - Methode und vorrichtung zur eichung eines infrarot-pyrometers in einer wärmebehandlungsanlage - Google Patents

Methode und vorrichtung zur eichung eines infrarot-pyrometers in einer wärmebehandlungsanlage

Info

Publication number
ATE231964T1
ATE231964T1 AT96112107T AT96112107T ATE231964T1 AT E231964 T1 ATE231964 T1 AT E231964T1 AT 96112107 T AT96112107 T AT 96112107T AT 96112107 T AT96112107 T AT 96112107T AT E231964 T1 ATE231964 T1 AT E231964T1
Authority
AT
Austria
Prior art keywords
calibration
heat treatment
treatment plant
infrared pyrometer
temperature probe
Prior art date
Application number
AT96112107T
Other languages
English (en)
Inventor
Mark Yam
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of ATE231964T1 publication Critical patent/ATE231964T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
    • G01J5/53—Reference sources, e.g. standard lamps; Black bodies
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/80—Calibration

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Radiation Pyrometers (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)
  • Radiation-Therapy Devices (AREA)
  • Resistance Heating (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AT96112107T 1995-07-26 1996-07-26 Methode und vorrichtung zur eichung eines infrarot-pyrometers in einer wärmebehandlungsanlage ATE231964T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/506,902 US5820261A (en) 1995-07-26 1995-07-26 Method and apparatus for infrared pyrometer calibration in a rapid thermal processing system

Publications (1)

Publication Number Publication Date
ATE231964T1 true ATE231964T1 (de) 2003-02-15

Family

ID=24016396

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96112107T ATE231964T1 (de) 1995-07-26 1996-07-26 Methode und vorrichtung zur eichung eines infrarot-pyrometers in einer wärmebehandlungsanlage

Country Status (6)

Country Link
US (2) US5820261A (de)
EP (1) EP0756159B1 (de)
JP (1) JP2894999B2 (de)
KR (1) KR100450644B1 (de)
AT (1) ATE231964T1 (de)
DE (1) DE69625964T2 (de)

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US7311852B2 (en) * 2001-03-30 2007-12-25 Lam Research Corporation Method of plasma etching low-k dielectric materials
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US6987240B2 (en) * 2002-04-18 2006-01-17 Applied Materials, Inc. Thermal flux processing by scanning
US6818864B2 (en) * 2002-08-09 2004-11-16 Asm America, Inc. LED heat lamp arrays for CVD heating
US7704327B2 (en) * 2002-09-30 2010-04-27 Applied Materials, Inc. High temperature anneal with improved substrate support
US6838012B2 (en) 2002-10-31 2005-01-04 Lam Research Corporation Methods for etching dielectric materials
US6835914B2 (en) * 2002-11-05 2004-12-28 Mattson Technology, Inc. Apparatus and method for reducing stray light in substrate processing chambers
US7098141B1 (en) 2003-03-03 2006-08-29 Lam Research Corporation Use of silicon containing gas for CD and profile feature enhancements of gate and shallow trench structures
WO2005092051A2 (en) * 2004-03-22 2005-10-06 Advanced Biophotonics, Inc. Integrated black body and lens cap assembly and methods for calibration of infrared cameras using same
DE102005018124B4 (de) * 2005-04-20 2007-06-28 Barke, Woldemar, Dipl.-Phys. Ing. Verfahren und Vorrichtung zur berührungslosen gleichzeitigen Bestimmung von Temperatur und Emissionsgrad eines Meßobjekts
JP2007042958A (ja) 2005-08-05 2007-02-15 Sumitomo Electric Ind Ltd ウェハプローバ用ウェハ保持体およびそれを搭載したウェハプローバ
KR100681693B1 (ko) * 2005-10-21 2007-02-09 재단법인 포항산업과학연구원 방사온도 계측기용 광학적 외란차단 시스템 및 방법
US7517804B2 (en) * 2006-08-31 2009-04-14 Micron Technologies, Inc. Selective etch chemistries for forming high aspect ratio features and associated structures
TWI547999B (zh) * 2007-09-17 2016-09-01 Ｄｓｇｉ公司 微波退火半導體材料的系統及方法
US8452166B2 (en) * 2008-07-01 2013-05-28 Applied Materials, Inc. Apparatus and method for measuring radiation energy during thermal processing
US9449858B2 (en) * 2010-08-09 2016-09-20 Applied Materials, Inc. Transparent reflector plate for rapid thermal processing chamber
CN102928086B (zh) * 2012-10-29 2015-04-15 中钢集团邢台机械轧辊有限公司 使测温仪快速对准测温孔的对正器
CN102967623B (zh) * 2012-11-06 2015-02-11 上海卫星装备研究所 红外灯阵热流密度标定装置及标定方法
KR101389003B1 (ko) * 2013-02-05 2014-04-24 에이피시스템 주식회사 온도측정 파이로미터의 교정 장치
KR101432159B1 (ko) 2013-02-05 2014-08-20 에이피시스템 주식회사 온도측정 파이로미터의 교정 장치
TWI624903B (zh) 2013-03-15 2018-05-21 應用材料股份有限公司 在雜訊環境中之現場溫度測量
CN104089703A (zh) * 2014-07-09 2014-10-08 北京智朗芯光科技有限公司 半导体薄膜反应腔辅助温度校准装置
CN104215659A (zh) * 2014-08-20 2014-12-17 上海卫星装备研究所 真空热环境下红外灯单灯辐射特性测试系统
CN108318522A (zh) * 2018-01-09 2018-07-24 北京航天长征飞行器研究所 一种石英灯加热器辐射热场热流分布均匀性测试装置
KR102029602B1 (ko) * 2018-11-30 2019-10-07 주식회사 이너센서 온도 센서의 보정 방법
CN116504685B (zh) * 2023-06-28 2023-09-15 盛吉盛半导体科技(北京)有限公司 一种红外测温探头校准装置

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Also Published As

Publication number Publication date
DE69625964D1 (de) 2003-03-06
EP0756159B1 (de) 2003-01-29
US6086245A (en) 2000-07-11
EP0756159A1 (de) 1997-01-29
KR970006517A (ko) 1997-02-21
KR100450644B1 (ko) 2004-12-04
JP2894999B2 (ja) 1999-05-24
JPH09119868A (ja) 1997-05-06
US5820261A (en) 1998-10-13
DE69625964T2 (de) 2003-11-13

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