ATE243119T1 - Flachdruckplattenvorstufe - Google Patents

Flachdruckplattenvorstufe

Info

Publication number
ATE243119T1
ATE243119T1 AT00126518T AT00126518T ATE243119T1 AT E243119 T1 ATE243119 T1 AT E243119T1 AT 00126518 T AT00126518 T AT 00126518T AT 00126518 T AT00126518 T AT 00126518T AT E243119 T1 ATE243119 T1 AT E243119T1
Authority
AT
Austria
Prior art keywords
substrate
aluminum alloy
flat plate
roughening
plate printer
Prior art date
Application number
AT00126518T
Other languages
English (en)
Inventor
Hirokazu Sawada
Hisashi Hotta
Akio Uesugi
Hirokazu Sakaki
Tadashi Endo
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP34988899A external-priority patent/JP2001162958A/ja
Priority claimed from JP34988799A external-priority patent/JP3745180B2/ja
Priority claimed from JP2000075486A external-priority patent/JP2001264978A/ja
Priority claimed from JP2000075873A external-priority patent/JP2001260550A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of ATE243119T1 publication Critical patent/ATE243119T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electroluminescent Light Sources (AREA)
  • Ink Jet (AREA)
  • Formation Of Insulating Films (AREA)
AT00126518T 1999-12-09 2000-12-08 Flachdruckplattenvorstufe ATE243119T1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP34988899A JP2001162958A (ja) 1999-12-09 1999-12-09 平版印刷版用支持体および平版印刷版原版
JP34988799A JP3745180B2 (ja) 1999-12-09 1999-12-09 平版印刷版原版
JP2000075486A JP2001264978A (ja) 2000-03-17 2000-03-17 感光性平版印刷版
JP2000075873A JP2001260550A (ja) 2000-03-17 2000-03-17 平版印刷版原版

Publications (1)

Publication Number Publication Date
ATE243119T1 true ATE243119T1 (de) 2003-07-15

Family

ID=27480704

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00126518T ATE243119T1 (de) 1999-12-09 2000-12-08 Flachdruckplattenvorstufe

Country Status (4)

Country Link
US (1) US6638686B2 (de)
EP (1) EP1106381B1 (de)
AT (1) ATE243119T1 (de)
DE (1) DE60003380T2 (de)

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6489078B1 (en) * 1996-07-19 2002-12-03 Agfa-Gevaert IR radiation-sensitive imaging element and a method for producing lithographic plates therewith
US7110227B2 (en) 1997-04-08 2006-09-19 X2Y Attenuators, Llc Universial energy conditioning interposer with circuit architecture
US7042703B2 (en) 2000-03-22 2006-05-09 X2Y Attenuators, Llc Energy conditioning structure
US9054094B2 (en) 1997-04-08 2015-06-09 X2Y Attenuators, Llc Energy conditioning circuit arrangement for integrated circuit
US6606011B2 (en) 1998-04-07 2003-08-12 X2Y Attenuators, Llc Energy conditioning circuit assembly
US6018448A (en) 1997-04-08 2000-01-25 X2Y Attenuators, L.L.C. Paired multi-layered dielectric independent passive component architecture resulting in differential and common mode filtering with surge protection in one integrated package
US7110235B2 (en) 1997-04-08 2006-09-19 Xzy Altenuators, Llc Arrangement for energy conditioning
US6894884B2 (en) 1997-04-08 2005-05-17 Xzy Attenuators, Llc Offset pathway arrangements for energy conditioning
US6650525B2 (en) 1997-04-08 2003-11-18 X2Y Attenuators, Llc Component carrier
US7336468B2 (en) 1997-04-08 2008-02-26 X2Y Attenuators, Llc Arrangement for energy conditioning
US7336467B2 (en) 2000-10-17 2008-02-26 X2Y Attenuators, Llc Energy pathway arrangement
US7301748B2 (en) 1997-04-08 2007-11-27 Anthony Anthony A Universal energy conditioning interposer with circuit architecture
US20030161086A1 (en) 2000-07-18 2003-08-28 X2Y Attenuators, Llc Paired multi-layered dielectric independent passive component architecture resulting in differential and common mode filtering with surge protection in one integrated package
US20020079116A1 (en) 2000-10-17 2002-06-27 X2Y Attenuators, Llc Amalgam of shielding and shielded energy pathways and other elements for single or multiple circuitries with common reference node
US6603646B2 (en) 1997-04-08 2003-08-05 X2Y Attenuators, Llc Multi-functional energy conditioner
US7274549B2 (en) 2000-12-15 2007-09-25 X2Y Attenuators, Llc Energy pathway arrangements for energy conditioning
US7321485B2 (en) 1997-04-08 2008-01-22 X2Y Attenuators, Llc Arrangement for energy conditioning
US7106570B2 (en) 1997-04-08 2006-09-12 Xzy Altenuators, Llc Pathway arrangement
US7427816B2 (en) 1998-04-07 2008-09-23 X2Y Attenuators, Llc Component carrier
DE69937677T2 (de) 1998-04-07 2008-11-20 X2Y Attenuators, L.L.C. Bauelementeträger
US7113383B2 (en) 2000-04-28 2006-09-26 X2Y Attenuators, Llc Predetermined symmetrically balanced amalgam with complementary paired portions comprising shielding electrodes and shielded electrodes and other predetermined element portions for symmetrically balanced and complementary energy portion conditioning
AU2001283565A1 (en) 2000-08-15 2002-02-25 X2Y Attenuators, L.L.C. An electrode arrangement for circuit energy conditioning
US7193831B2 (en) 2000-10-17 2007-03-20 X2Y Attenuators, Llc Energy pathway arrangement
DE60132754T2 (de) * 2000-12-20 2009-03-05 Fujifilm Corporation Lithographischer Druckplattenvorläufer
WO2002054548A1 (en) * 2000-12-28 2002-07-11 Matsushita Electric Industrial Co., Ltd. Shorter wavelength laser module and method of manufacturing the laser module
US6484637B2 (en) * 2001-01-09 2002-11-26 Presstek, Inc. Lithographic imaging with printing members having enhanced-performance imaging layers
JP2002307849A (ja) * 2001-02-09 2002-10-23 Fuji Photo Film Co Ltd 平版印刷版原版
US6846614B2 (en) * 2002-02-04 2005-01-25 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates
US7056639B2 (en) 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
SE519898C2 (sv) * 2001-09-10 2003-04-22 Obducat Ab Sätt att etsa koppar på kort samt anordning och elektrolyt för utförande av sättet
US6808864B2 (en) * 2001-09-12 2004-10-26 Fuji Photo Film Co., Ltd. Support for lithographic printing plate and presensitized plate
US7063935B2 (en) * 2002-03-26 2006-06-20 Fuji Photo Film Co., Ltd. Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate
DE50204080D1 (de) 2002-04-29 2005-10-06 Agfa Gevaert Nv Strahlungsempfindliches Gemisch, damit hergestelltes Aufzeichnungsmaterial, und Verfahren zur Herstellung einer Druckplatte
US7314699B2 (en) 2002-04-29 2008-01-01 Agfa Graphics Nv Radiation-sensitive mixture and recording material produced therewith
US20050260934A1 (en) * 2002-07-03 2005-11-24 Agfa-Gevaert Positive-working lithographic printing plate precursor
US6936384B2 (en) 2002-08-01 2005-08-30 Kodak Polychrome Graphics Llc Infrared-sensitive composition containing a metallocene derivative
EP1396348B1 (de) * 2002-09-06 2009-03-04 FUJIFILM Corporation Lithographisches Druckplattensubstrat und vorsensibilisierte Platte
US7358032B2 (en) * 2002-11-08 2008-04-15 Fujifilm Corporation Planographic printing plate precursor
JP2004230624A (ja) * 2003-01-29 2004-08-19 Fuji Photo Film Co Ltd 平版印刷版用支持体、平版印刷版原版および平版印刷版原版の処理方法
US7180718B2 (en) 2003-01-31 2007-02-20 X2Y Attenuators, Llc Shielded energy conditioner
EP1629582A2 (de) 2003-05-29 2006-03-01 X2Y Attenuators, L.L.C. Verbinderbezogene strukturen mit einer energie-aufbereitungseinrichtung
US20040264139A1 (en) * 2003-06-24 2004-12-30 Nokia Corporation Process for manufacturing a cover
US6939663B2 (en) 2003-07-08 2005-09-06 Kodak Polychrome Graphics Llc Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins
WO2005015719A2 (en) 2003-07-21 2005-02-17 X2Y Attenuators, Llc Filter assembly
JP4244309B2 (ja) * 2003-09-12 2009-03-25 富士フイルム株式会社 平版印刷版原版
EP1543898A1 (de) * 2003-12-17 2005-06-22 Fuji Photo Film B.V. Substrat aus Aluminium-Legierung für lithographische Druckplatten und Verfahren zur Herstellung
EP1543899A3 (de) * 2003-12-17 2005-12-21 Fuji Photo Film B.V. Substrat aus Aluminium-Legierung für lithographische Druckplatten und Verfahren zu seiner Herstellung
CN1890854A (zh) 2003-12-22 2007-01-03 X2Y艾泰钮埃特有限责任公司 内屏蔽式能量调节装置
US20050191503A1 (en) * 2004-02-27 2005-09-01 Jones Brian A. Polycarbosilane treatment of substrates
JP4471101B2 (ja) * 2004-07-30 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP2008537843A (ja) 2005-03-01 2008-09-25 エックストゥーワイ アテニュエイターズ，エルエルシー 内部で重なり合った調整器
WO2006093831A2 (en) 2005-03-01 2006-09-08 X2Y Attenuators, Llc Energy conditioner with tied through electrodes
WO2006099297A2 (en) 2005-03-14 2006-09-21 X2Y Attenuators, Llc Conditioner with coplanar conductors
JP2006267959A (ja) * 2005-03-25 2006-10-05 Fuji Photo Film Co Ltd 平版印刷版原版の製造方法及び平版印刷版原版の取扱方法
US20070073286A1 (en) * 2005-09-29 2007-03-29 Dorin Panescu Method and apparatus for an ocular procedure
US8377628B2 (en) 2005-10-20 2013-02-19 Agfa Graphics Nv Negative working, heat-sensitive, lithographic printing plate precursor
BRPI0617847B1 (pt) 2005-10-28 2015-09-08 Novelis Inc método de lingotar um metal, lingote de metal, método de produzir um artigo de chapa fina metálica, e, método de produzir um lingote de metal que pode ser laminado a quente sem homogeneização prévia.
WO2007103965A1 (en) 2006-03-07 2007-09-13 X2Y Attenuators, Llc Energy conditioner structures
JP5225623B2 (ja) * 2006-07-12 2013-07-03 ハイデルベルガー ドルツクマシーネン アクチエンゲゼルシヤフト 被印刷体と接触する部材を製造する方法
US20090202938A1 (en) * 2008-02-08 2009-08-13 Celin Savariar-Hauck Method of improving surface abrasion resistance of imageable elements
KR102219109B1 (ko) * 2014-01-22 2021-02-24 삼성디스플레이 주식회사 포토레지스트 조성물, 이를 이용한 패턴의 형성 방법 및 박막 트랜지스터 기판의 제조 방법
BR112018014735A2 (pt) * 2016-01-22 2018-12-11 Fujifilm Corp precursor da placa de impressão litográfica do tipo negativo e método de preparar uma placa de impressão litográfica
CN107326223A (zh) * 2017-06-09 2017-11-07 太仓东旭精密机械有限公司 一种自行车用合金材料
CN109097641B (zh) * 2018-09-19 2020-01-14 东莞市灿煜金属制品有限公司 一种适用于手机后壳及中板边框一体的高强度可镜面氧化铝的制造方法
KR102203403B1 (ko) * 2019-04-10 2021-01-15 주식회사 아이코어바이오 신규한 구조를 가지는 고분자, 이의 제조 방법, 고분자로부터 합성된 나노섬유 및 이의 제조 방법
CN110195242A (zh) * 2019-05-13 2019-09-03 赣州飞腾轻合金有限公司 一种钾冰晶石熔盐下沉阴极电解制备铝钪中间合金的方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2055895A (en) * 1979-07-20 1981-03-11 British Aluminium Co Ltd Aluminium-calcium alloys
JPS58221254A (ja) 1982-06-18 1983-12-22 Furukawa Alum Co Ltd オフセツト印刷用アルミニウム素板
DE3582263D1 (de) 1984-04-06 1991-05-02 Fuji Photo Film Co Ltd Aluminiumlegierung fuer druckplatten.
JPS6282089A (ja) * 1985-10-04 1987-04-15 Fuji Photo Film Co Ltd 平版印刷版用支持体の製造方法
US5756258A (en) * 1992-07-13 1998-05-26 Kyowa Hakko Co., Ltd. Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound
JPH10195568A (ja) * 1997-01-10 1998-07-28 Konica Corp 平版印刷版用アルミニウム合金板
JP3693485B2 (ja) 1998-03-09 2005-09-07 日本軽金属株式会社 平版印刷版用アルミニウム合金素板の製造方法
US6305283B1 (en) * 1999-03-03 2001-10-23 Agfa-Gevaert Imaging element for making lithographic printing plates with a decreased slippage in the press
US6305383B1 (en) * 1999-09-13 2001-10-23 Marlene I. Thoma Method for removing acrylic fingernails

Also Published As

Publication number Publication date
DE60003380D1 (de) 2003-07-24
EP1106381A1 (de) 2001-06-13
EP1106381B1 (de) 2003-06-18
US20010041305A1 (en) 2001-11-15
US6638686B2 (en) 2003-10-28
DE60003380T2 (de) 2004-04-29

Similar Documents

Publication Publication Date Title
DE60003380D1 (de) Flachdruckplattenvorstufe
ATE420767T1 (de) Lithographische druckplattenvorläufer
ATE289920T1 (de) Vorläufer einer lithographischen druckplatte
ATE452756T1 (de) Flachdruckplattenvorläufer
EP1399783B1 (de) Verfahren zur bearbeitung von flachdruckplattenvorläufern
US6537735B1 (en) Pattern-forming methods and radiation sensitive materials
DE60132754D1 (de) Lithographischer Druckplattenvorläufer
JPH10250255A (ja) ポジテイブ作用性印刷版の作製のための感熱性画像形成要素
EP1518672A3 (de) Flachdruckplattenvorläufer und Druckverfahren
DE60209047D1 (de) Flachdruckplattenvorläufer
ATE257081T1 (de) Flachdruckplatte
WO1999067097A3 (en) Thermal lithographic printing plate
EP0945281A3 (de) Wärmeempfindliche Zusammensetzung, Flachdruckplatte, die diese Zusammensetzung verwendet, und Verfahren zur Herstellung einer Flachdruckplatte
DE60321526D1 (de) Flachdruckplattenvorläufer
EP1602982A3 (de) Verfahren zur Herstellung einer Flachdruckplatte und Flachdruckverfahren
EP1400856A3 (de) Verfahren zur Herstellung einer Flachdruckplatte
DE60020286D1 (de) Lichtempfindliche Zusammensetzung und damit hergestellte Flachdruckplatte-Vorstufe
DE60101807D1 (de) Flachdruckformen-Vorstufe
DE60211426D1 (de) Vorsensibilisierte Platte zur Herstellung einer lithographischen Druckplatte
EP1134078B1 (de) Wärmeempfindliche lithographische Druckplatte, Träger für die Platte und Verfahren zu deren Herstellung
ZA200304581B (en) Method for obtaining a lithographic printing surface.
US6248505B1 (en) Method for producing a predetermined resist pattern
US6352814B1 (en) Method of forming a desired pattern
GB648897A (en) Improvements in and relating to the production of planographic printing plates
DE60114319D1 (de) Flachdruck-Originalplatte

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties