ATE246071T1 - Verfahren und vorrichtung zur in-situ endpunktbestimmung und zur optimierung eines chemisch-mechanischen polierverfahrens mit linear poliergerät - Google Patents

Verfahren und vorrichtung zur in-situ endpunktbestimmung und zur optimierung eines chemisch-mechanischen polierverfahrens mit linear poliergerät

Info

Publication number
ATE246071T1
ATE246071T1 AT98304242T AT98304242T ATE246071T1 AT E246071 T1 ATE246071 T1 AT E246071T1 AT 98304242 T AT98304242 T AT 98304242T AT 98304242 T AT98304242 T AT 98304242T AT E246071 T1 ATE246071 T1 AT E246071T1
Authority
AT
Austria
Prior art keywords
belt
removal rate
chemical
end point
optimizing
Prior art date
Application number
AT98304242T
Other languages
English (en)
Inventor
Rahal Jairath
Jiri Pecen
Saket Chadda
Wilbur C Krussel
Jerauld J Cutini
Erik H Engdahl
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Application granted granted Critical
Publication of ATE246071T1 publication Critical patent/ATE246071T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/013—Devices or means for detecting lapping completion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
    • B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/12—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with apertures for inspecting the surface to be abraded
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • H10P74/238—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
AT98304242T 1997-05-28 1998-05-28 Verfahren und vorrichtung zur in-situ endpunktbestimmung und zur optimierung eines chemisch-mechanischen polierverfahrens mit linear poliergerät ATE246071T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/869,655 US6146248A (en) 1997-05-28 1997-05-28 Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher

Publications (1)

Publication Number Publication Date
ATE246071T1 true ATE246071T1 (de) 2003-08-15

Family

ID=25354009

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98304242T ATE246071T1 (de) 1997-05-28 1998-05-28 Verfahren und vorrichtung zur in-situ endpunktbestimmung und zur optimierung eines chemisch-mechanischen polierverfahrens mit linear poliergerät

Country Status (7)

Country Link
US (2) US6146248A (de)
EP (1) EP0893203B1 (de)
JP (1) JPH1177524A (de)
KR (1) KR19980087549A (de)
AT (1) ATE246071T1 (de)
DE (1) DE69816726T2 (de)
TW (1) TW440888B (de)

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US6261155B1 (en) 2001-07-17
DE69816726T2 (de) 2004-08-05
EP0893203A2 (de) 1999-01-27
TW440888B (en) 2001-06-16
JPH1177524A (ja) 1999-03-23
US6146248A (en) 2000-11-14
EP0893203A3 (de) 2000-01-12
DE69816726D1 (de) 2003-09-04
EP0893203B1 (de) 2003-07-30
KR19980087549A (ko) 1998-12-05

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