ATE246154T1 - Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben - Google Patents

Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben

Info

Publication number
ATE246154T1
ATE246154T1 AT99901911T AT99901911T ATE246154T1 AT E246154 T1 ATE246154 T1 AT E246154T1 AT 99901911 T AT99901911 T AT 99901911T AT 99901911 T AT99901911 T AT 99901911T AT E246154 T1 ATE246154 T1 AT E246154T1
Authority
AT
Austria
Prior art keywords
producing
same
quartz glass
glass elements
synthetic optical
Prior art date
Application number
AT99901911T
Other languages
English (en)
Inventor
Yoshiaki Ikuta
Shinya Kikugawa
Akio Masui
Noriaki Shimodaira
Shuhei Yoshizawa
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12008054&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE246154(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE246154T1 publication Critical patent/ATE246154T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Polarising Elements (AREA)
AT99901911T 1998-01-30 1999-01-29 Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben ATE246154T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1975198 1998-01-30
PCT/JP1999/000383 WO1999038814A1 (fr) 1998-01-30 1999-01-29 Elements optiques en verre de silice synthetique et leur procede de production

Publications (1)

Publication Number Publication Date
ATE246154T1 true ATE246154T1 (de) 2003-08-15

Family

ID=12008054

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99901911T ATE246154T1 (de) 1998-01-30 1999-01-29 Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben

Country Status (5)

Country Link
EP (1) EP1061052B1 (de)
JP (1) JP4193358B2 (de)
AT (1) ATE246154T1 (de)
DE (1) DE69909983T2 (de)
WO (1) WO1999038814A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100667636B1 (ko) * 1999-06-10 2007-01-12 아사히 가라스 가부시키가이샤 합성석영유리와 그의 제조방법
EP1288169A1 (de) 2001-08-30 2003-03-05 Schott Glas Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper
DE10159959A1 (de) 2001-12-06 2003-06-26 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil und Verwendung desselben
DE10159962A1 (de) * 2001-12-06 2003-07-03 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
DE10159961C2 (de) 2001-12-06 2003-12-24 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
JP4104338B2 (ja) * 2002-01-31 2008-06-18 信越石英株式会社 ＡｒＦ露光装置用合成石英ガラス素材
JP4107905B2 (ja) * 2002-07-31 2008-06-25 信越石英株式会社 Ｙａｇレーザー高調波用合成石英ガラス光学材料
US7534733B2 (en) * 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage
DE112005003341B4 (de) 2004-12-30 2019-01-31 Corning Incorporated Synthetisches Siliziumdioxid mit geringer polarisationsinduzierter Doppelbrechung, Verfahren zur Herstellung selbigen Materials und Lithografiegerät, welches selbiges umfasst
US7928026B2 (en) * 2005-06-30 2011-04-19 Corning Incorporated Synthetic silica material with low fluence-dependent-transmission and method of making the same
US7994083B2 (en) 2005-09-16 2011-08-09 Corning Incorporated Fused silica glass and method for making the same
JP2008063181A (ja) * 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0825764B2 (ja) * 1990-10-30 1996-03-13 信越石英株式会社 水素分子含有シリカガラス体の製造方法
JPH0742134B2 (ja) * 1991-07-31 1995-05-10 信越石英株式会社 光学部材
JP2821074B2 (ja) * 1992-11-30 1998-11-05 信越石英株式会社 耐紫外線レーザー用光学部材の製造方法
JPH0959034A (ja) * 1995-08-22 1997-03-04 Sumitomo Metal Ind Ltd 合成石英ガラス材及びその製造方法

Also Published As

Publication number Publication date
EP1061052A4 (de) 2001-04-11
EP1061052A1 (de) 2000-12-20
EP1061052B1 (de) 2003-07-30
DE69909983T2 (de) 2004-04-15
WO1999038814A1 (fr) 1999-08-05
JP4193358B2 (ja) 2008-12-10
DE69909983D1 (de) 2003-09-04

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