ATE252245T1 - Erzeugung von lithographischen druckplatten, die kein anfeuchtwasser erfordern - Google Patents

Erzeugung von lithographischen druckplatten, die kein anfeuchtwasser erfordern

Info

Publication number
ATE252245T1
ATE252245T1 AT97908369T AT97908369T ATE252245T1 AT E252245 T1 ATE252245 T1 AT E252245T1 AT 97908369 T AT97908369 T AT 97908369T AT 97908369 T AT97908369 T AT 97908369T AT E252245 T1 ATE252245 T1 AT E252245T1
Authority
AT
Austria
Prior art keywords
pct
carbon atoms
lower alkyl
lithographic printing
printing plates
Prior art date
Application number
AT97908369T
Other languages
English (en)
Inventor
Peter Andrew Reath Bennett
Carole-Anne Smith
Stuart Bayes
Original Assignee
Kodak Polychrome Graphics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Co filed Critical Kodak Polychrome Graphics Co
Application granted granted Critical
Publication of ATE252245T1 publication Critical patent/ATE252245T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Paper (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Wiring (AREA)
AT97908369T 1996-03-23 1997-03-19 Erzeugung von lithographischen druckplatten, die kein anfeuchtwasser erfordern ATE252245T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB9606182.5A GB9606182D0 (en) 1996-03-23 1996-03-23 Production of water-less lithographic plates
PCT/GB1997/000758 WO1997036208A1 (en) 1996-03-23 1997-03-19 Production of water-less lithographic plates

Publications (1)

Publication Number Publication Date
ATE252245T1 true ATE252245T1 (de) 2003-11-15

Family

ID=10790939

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97908369T ATE252245T1 (de) 1996-03-23 1997-03-19 Erzeugung von lithographischen druckplatten, die kein anfeuchtwasser erfordern

Country Status (10)

Country Link
US (1) US6077645A (de)
EP (1) EP0888576B1 (de)
JP (1) JP2000507889A (de)
AT (1) ATE252245T1 (de)
AU (1) AU2034997A (de)
BR (1) BR9708320A (de)
CA (1) CA2250054A1 (de)
DE (1) DE69725561D1 (de)
GB (1) GB9606182D0 (de)
WO (1) WO1997036208A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9719644D0 (en) * 1997-09-17 1997-11-19 Horsell Graphic Ind Ltd Planographic printing
JPWO2005091070A1 (ja) * 2004-03-19 2008-02-07 ダイキン工業株式会社 リソグラフィー用基板表面処理剤
JP4781123B2 (ja) * 2006-02-16 2011-09-28 株式会社Ａｄｅｋａ 光学フィルター
JP6773006B2 (ja) * 2016-11-14 2020-10-21 信越化学工業株式会社 化学増幅レジスト材料及びパターン形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57176044A (en) * 1981-04-22 1982-10-29 Hitachi Ltd Lithographic plate
JPH028848A (ja) * 1988-06-28 1990-01-12 Konica Corp 湿し水不要平版印刷版材料
JPH02173647A (ja) * 1988-12-27 1990-07-05 Hitachi Ltd パタン形成材料及びそれを用いたパタン形成方法
DD293662A5 (de) * 1990-04-11 1991-09-05 Fotochem Werke Berlin Veb Positivfotokopierlack mit verbesserteb anwendungseigenschaften
JPH08337654A (ja) * 1995-06-14 1996-12-24 Matsushita Electric Ind Co Ltd 化学吸着膜の製造方法及びこれに用いる化学吸着液

Also Published As

Publication number Publication date
JP2000507889A (ja) 2000-06-27
BR9708320A (pt) 1999-08-03
CA2250054A1 (en) 1997-10-02
GB9606182D0 (en) 1996-05-29
DE69725561D1 (de) 2003-11-20
EP0888576B1 (de) 2003-10-15
US6077645A (en) 2000-06-20
EP0888576A1 (de) 1999-01-07
WO1997036208A1 (en) 1997-10-02
AU2034997A (en) 1997-10-17

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties