ATE259097T1 - Feldemissionselektronenquelle - Google Patents

Feldemissionselektronenquelle

Info

Publication number
ATE259097T1
ATE259097T1 AT99118925T AT99118925T ATE259097T1 AT E259097 T1 ATE259097 T1 AT E259097T1 AT 99118925 T AT99118925 T AT 99118925T AT 99118925 T AT99118925 T AT 99118925T AT E259097 T1 ATE259097 T1 AT E259097T1
Authority
AT
Austria
Prior art keywords
silicon substrate
type silicon
electron source
emission electron
field emission
Prior art date
Application number
AT99118925T
Other languages
English (en)
Inventor
Takuya Komoda
Tsutomu Ichihara
Koichi Aizawa
Nobuyoshi Koshida
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP27234298A external-priority patent/JP2966842B1/ja
Priority claimed from JP11570799A external-priority patent/JP3079097B1/ja
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Application granted granted Critical
Publication of ATE259097T1 publication Critical patent/ATE259097T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/304—Field-emissive cathodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/312—Cold cathodes, e.g. field-emissive cathode having an electric field perpendicular to the surface, e.g. tunnel-effect cathodes of metal-insulator-metal [MIM] type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/312—Cold cathodes having an electric field perpendicular to the surface thereof
    • H01J2201/3125—Metal-insulator-Metal [MIM] emission type cathodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/939—Electron emitter, e.g. spindt emitter tip coated with nanoparticles

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Electron Sources, Ion Sources (AREA)
AT99118925T 1998-09-25 1999-09-25 Feldemissionselektronenquelle ATE259097T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27234298A JP2966842B1 (ja) 1998-09-25 1998-09-25 電界放射型電子源
JP11570799A JP3079097B1 (ja) 1999-04-23 1999-04-23 電界放射型電子源およびその製造方法

Publications (1)

Publication Number Publication Date
ATE259097T1 true ATE259097T1 (de) 2004-02-15

Family

ID=26454174

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99118925T ATE259097T1 (de) 1998-09-25 1999-09-25 Feldemissionselektronenquelle

Country Status (10)

Country Link
US (2) US6590321B1 (de)
EP (1) EP0989577B1 (de)
KR (2) KR100338140B1 (de)
CN (1) CN1182561C (de)
AT (1) ATE259097T1 (de)
DE (1) DE69914556T2 (de)
DK (1) DK0989577T3 (de)
ES (1) ES2213320T3 (de)
SG (1) SG74751A1 (de)
TW (1) TW436836B (de)

Families Citing this family (36)

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US6794805B1 (en) 1998-05-26 2004-09-21 Matsushita Electric Works, Ltd. Field emission electron source, method of producing the same, and use of the same
KR100338140B1 (ko) * 1998-09-25 2002-05-24 이마이 기요스케 전계 방사형 전자원
TW472273B (en) * 1999-04-23 2002-01-11 Matsushita Electric Works Ltd Field emission-type electron source and manufacturing method thereof
US6765342B1 (en) * 1999-10-18 2004-07-20 Matsushita Electric Work, Ltd. Field emission-type electron source and manufacturing method thereof
JP4222707B2 (ja) * 2000-03-24 2009-02-12 東京エレクトロン株式会社 プラズマ処理装置及び方法、ガス供給リング及び誘電体
JP3806751B2 (ja) * 2000-05-23 2006-08-09 独立行政法人科学技術振興機構 量子サイズ効果型微小電子銃の製造方法
WO2002089166A1 (en) * 2001-04-24 2002-11-07 Matsushita Electric Works, Ltd. Field emission electron source and production method thereof
US6753544B2 (en) * 2001-04-30 2004-06-22 Hewlett-Packard Development Company, L.P. Silicon-based dielectric tunneling emitter
US6781146B2 (en) * 2001-04-30 2004-08-24 Hewlett-Packard Development Company, L.P. Annealed tunneling emitter
EP1276130A2 (de) * 2001-06-26 2003-01-15 Matsushita Electric Works, Ltd. Verfahren und Vorrichtung zur Herstellung einer Feldemissions-Elektronenquelle
CN1216394C (zh) * 2001-09-25 2005-08-24 松下电工株式会社 场致发射型电子源
KR20030032133A (ko) * 2001-10-10 2003-04-26 유종훈 비정질실리콘 박막층이 증착된 다공질실리콘 반도체의제조방법
KR100497292B1 (ko) * 2001-10-29 2005-06-28 마츠시다 덴코 가부시키가이샤 전계방사형 전자원 및 그 구동방법
CN100376040C (zh) * 2002-03-08 2008-03-19 松下电工株式会社 量子装置
US6787792B2 (en) 2002-04-18 2004-09-07 Hewlett-Packard Development Company, L.P. Emitter with filled zeolite emission layer
JP2004178863A (ja) * 2002-11-25 2004-06-24 Toshiba Corp 電子源装置および表示装置
KR100499136B1 (ko) * 2002-12-14 2005-07-04 삼성전자주식회사 전자 스핀의존 산란을 이용한 자성매체 및 자성매체정보재생장치 및 재생방법
US7015496B2 (en) * 2002-12-27 2006-03-21 Semiconductor Energy Laboratory Co., Ltd. Field emission device and manufacturing method thereof
US6770353B1 (en) * 2003-01-13 2004-08-03 Hewlett-Packard Development Company, L.P. Co-deposited films with nano-columnar structures and formation process
JP3868934B2 (ja) * 2003-08-01 2007-01-17 株式会社東芝 電極製造方法
JP4442203B2 (ja) * 2003-11-25 2010-03-31 パナソニック電工株式会社 電子線放射装置
EP1690264A2 (de) 2003-11-25 2006-08-16 Matsushita Electric Works, Ltd. Verfahren und vorrichtung zum modifizieren eines objekts mit als ein kathoden-elektronenemitter erzeugten elektronen
KR100659100B1 (ko) * 2005-10-12 2006-12-21 삼성에스디아이 주식회사 디스플레이 장치와 이의 제조 방법
KR100730168B1 (ko) * 2005-11-22 2007-06-19 삼성에스디아이 주식회사 디스플레이 장치 및 이의 제조 방법
KR100719580B1 (ko) * 2005-11-22 2007-05-17 삼성에스디아이 주식회사 평판 디스플레이 장치
KR100741095B1 (ko) * 2005-12-12 2007-07-20 삼성에스디아이 주식회사 표시 장치
US7825591B2 (en) * 2006-02-15 2010-11-02 Panasonic Corporation Mesh structure and field-emission electron source apparatus using the same
US20070188090A1 (en) * 2006-02-15 2007-08-16 Matsushita Toshiba Picture Display Co., Ltd. Field-emission electron source apparatus
KR100813834B1 (ko) * 2006-03-04 2008-03-17 삼성에스디아이 주식회사 산화된 다공성 실리콘 물질계 전자방출원을 구비한디스플레이 소자의 제조방법
JP5536977B2 (ja) * 2007-03-30 2014-07-02 パナソニック株式会社 面発光体
JP5129674B2 (ja) * 2008-07-09 2013-01-30 パナソニック株式会社 発光装置
JP5374432B2 (ja) 2010-03-31 2013-12-25 パナソニック株式会社 電子デバイスおよびその製造方法
RU2654522C1 (ru) * 2016-06-22 2018-05-21 Акционерное общество "Научно-исследовательский институт молекулярной электроники" (АО "НИИМЭ") Способ повышения плотности тока и деградационной стойкости автоэмиссионных катодов на кремниевых пластинах
TWI627940B (zh) * 2017-01-16 2018-07-01 華廣生技股份有限公司 Physiological parameter monitoring system
CN115911270B (zh) * 2022-11-29 2025-12-16 楚能新能源股份有限公司 一种快充型负极极片、含有该极片的电芯及电池
WO2025063944A1 (en) * 2023-09-19 2025-03-27 Julia Jean, Llc Cold cathode electron sources and methods of production

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US3665241A (en) 1970-07-13 1972-05-23 Stanford Research Inst Field ionizer and field emission cathode structures and methods of production
US5430300A (en) 1991-07-18 1995-07-04 The Texas A&M University System Oxidized porous silicon field emission devices
JPH0690018A (ja) * 1992-09-08 1994-03-29 Fujitsu Ltd 発光素子及びその製造方法
DE4231310C1 (de) 1992-09-18 1994-03-24 Siemens Ag Verfahren zur Herstellung eines Bauelementes mit porösem Silizium
JPH06338631A (ja) 1993-03-29 1994-12-06 Canon Inc 発光素子及びその製造方法
JP3243471B2 (ja) * 1994-09-16 2002-01-07 三菱電機株式会社 電子放出素子の製造方法
JP3226745B2 (ja) 1995-03-09 2001-11-05 科学技術振興事業団 半導体冷電子放出素子及びこれを用いた装置
JP3281533B2 (ja) 1996-03-26 2002-05-13 パイオニア株式会社 冷電子放出表示装置及び半導体冷電子放出素子
US5990605A (en) * 1997-03-25 1999-11-23 Pioneer Electronic Corporation Electron emission device and display device using the same
JP3537624B2 (ja) 1997-03-25 2004-06-14 パイオニア株式会社 電子放出素子
TW391022B (en) * 1997-10-29 2000-05-21 Mitsubishi Rayon Co Field emission electron source, method of producing the same, and use of the same
JP2000188057A (ja) * 1998-12-22 2000-07-04 Matsushita Electric Works Ltd 電子源
JP3084272B2 (ja) * 1998-12-22 2000-09-04 松下電工株式会社 電界放射型電子源
KR100338140B1 (ko) * 1998-09-25 2002-05-24 이마이 기요스케 전계 방사형 전자원
TW436837B (en) 1998-11-16 2001-05-28 Matsushita Electric Works Ltd Field emission-type electron source and manufacturing method thereof and display using the electron source
TW472273B (en) 1999-04-23 2002-01-11 Matsushita Electric Works Ltd Field emission-type electron source and manufacturing method thereof
EP1094484A2 (de) 1999-10-18 2001-04-25 Matsushita Electric Works, Ltd. Feldemissions-Elektronenquelle und Verfahren zu deren Herstellung

Also Published As

Publication number Publication date
US20030197457A1 (en) 2003-10-23
EP0989577B1 (de) 2004-02-04
KR100356244B1 (ko) 2002-10-12
SG74751A1 (en) 2000-08-22
US6590321B1 (en) 2003-07-08
EP0989577A2 (de) 2000-03-29
DE69914556D1 (de) 2004-03-11
US6791248B2 (en) 2004-09-14
KR100338140B1 (ko) 2002-05-24
CN1182561C (zh) 2004-12-29
KR20010101847A (ko) 2001-11-14
EP0989577A3 (de) 2000-04-05
ES2213320T3 (es) 2004-08-16
KR20000023410A (ko) 2000-04-25
DE69914556T2 (de) 2004-12-23
CN1249525A (zh) 2000-04-05
TW436836B (en) 2001-05-28
DK0989577T3 (da) 2004-03-08

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