ATE272852T1 - Wässrig entwickelbare, lichtempfindliche bildaufzeichnungszusammensetzung mit verbesserter haftung und entschichtung - Google Patents
Wässrig entwickelbare, lichtempfindliche bildaufzeichnungszusammensetzung mit verbesserter haftung und entschichtungInfo
- Publication number
- ATE272852T1 ATE272852T1 AT99303933T AT99303933T ATE272852T1 AT E272852 T1 ATE272852 T1 AT E272852T1 AT 99303933 T AT99303933 T AT 99303933T AT 99303933 T AT99303933 T AT 99303933T AT E272852 T1 ATE272852 T1 AT E272852T1
- Authority
- AT
- Austria
- Prior art keywords
- plus
- total weight
- decoating
- light sensitive
- improved adhesion
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- 238000003384 imaging method Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 abstract 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 238000012644 addition polymerization Methods 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 125000002843 carboxylic acid group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000005395 methacrylic acid group Chemical group 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
- Paints Or Removers (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/086,903 US5952154A (en) | 1998-05-29 | 1998-05-29 | Photoimageable composition having improved flexibility |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE272852T1 true ATE272852T1 (de) | 2004-08-15 |
Family
ID=22201653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT99303933T ATE272852T1 (de) | 1998-05-29 | 1999-05-20 | Wässrig entwickelbare, lichtempfindliche bildaufzeichnungszusammensetzung mit verbesserter haftung und entschichtung |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US5952154A (de) |
| EP (1) | EP0961170B1 (de) |
| JP (1) | JP2000003036A (de) |
| KR (1) | KR100294549B1 (de) |
| CN (1) | CN1190705C (de) |
| AT (1) | ATE272852T1 (de) |
| CA (1) | CA2266159A1 (de) |
| DE (1) | DE69919076T2 (de) |
| ES (1) | ES2224556T3 (de) |
| SG (1) | SG75170A1 (de) |
| TW (1) | TWI221212B (de) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11167203A (ja) * | 1997-12-01 | 1999-06-22 | Nichigoo Mooton Kk | 感光性樹脂組成物及びそれを用いた感光性エレメント |
| EP1008911A1 (de) * | 1998-12-11 | 2000-06-14 | Shipley Company LLC | Lichtempfindliche Bildaufzeichnungszusammensetzungen mit verbesserter Flexibilität und Entschichtung |
| EP1008910A1 (de) * | 1998-12-11 | 2000-06-14 | Shipley Company LLC | Lichtempfindliche Bildaufzeichnungszusammensetzungen mit verbesserter Entschichtung und Bildauflösung |
| JP3948505B2 (ja) * | 1999-10-27 | 2007-07-25 | 富士フイルム株式会社 | 平版印刷版用原版 |
| JP4512281B2 (ja) | 2001-02-22 | 2010-07-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版 |
| JP4266077B2 (ja) | 2001-03-26 | 2009-05-20 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
| EP1336630A3 (de) * | 2002-02-15 | 2003-12-10 | Shipley Co. L.L.C. | Funktionalisiertes Polymer |
| JP4137577B2 (ja) * | 2002-09-30 | 2008-08-20 | 富士フイルム株式会社 | 感光性組成物 |
| JP2004126050A (ja) * | 2002-09-30 | 2004-04-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| EP1857276A3 (de) * | 2002-09-30 | 2007-12-05 | FUJIFILM Corporation | Flachdruckplattenvorläufer |
| CN100590525C (zh) * | 2002-12-18 | 2010-02-17 | 富士胶片株式会社 | 可聚合组合物和平版印刷版前体 |
| JP4150261B2 (ja) * | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
| JP2004252201A (ja) * | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4048134B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4048133B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた平版印刷版原版 |
| JP2004252285A (ja) * | 2003-02-21 | 2004-09-09 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いた平版印刷版原版 |
| JP4299639B2 (ja) * | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
| JP2005099284A (ja) * | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 感光性組成物及び平版印刷版原版 |
| JP4815871B2 (ja) * | 2004-05-21 | 2011-11-16 | 三菱瓦斯化学株式会社 | レジスト化合物およびレジスト組成物 |
| US20050271973A1 (en) * | 2004-06-04 | 2005-12-08 | Ziegler Michael J | Negative acting photoresist with improved blocking resistance |
| EP1780230A1 (de) * | 2005-10-25 | 2007-05-02 | Cytec Surface Specialties, S.A. | Polymere und Zusammensetzungen |
| CN102650826B (zh) * | 2011-02-28 | 2014-08-13 | 中山市立顺实业有限公司 | 一种含有特定粘合剂及增塑剂的干膜光阻剂 |
| CN102650825B (zh) * | 2011-02-28 | 2014-08-27 | 中山市立顺实业有限公司 | 一种含有粘着添加剂及增塑剂的干膜光阻剂 |
| TW201400981A (zh) * | 2012-06-19 | 2014-01-01 | Chi Mei Corp | 感光性樹脂組成物及其應用 |
| EP2950144B1 (de) | 2014-05-31 | 2016-12-14 | Rohm and Haas Electronic Materials LLC | Abbildungsverfahren auf substraten mit wässrigen alkalilöslichen uv-blockierenden zusammensetzungen und wasserlöslichen uv-transparenten filmen |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3953309A (en) * | 1972-12-14 | 1976-04-27 | Dynachem Corporation | Polymerization compositions and processes having polymeric binding agents |
| US4003877A (en) * | 1974-05-24 | 1977-01-18 | Dynachem Corporation | Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions |
| US4245030A (en) * | 1979-05-23 | 1981-01-13 | Hoechst Aktiengesellschaft | Photopolymerizable mixture containing improved plasticizer |
| DE3136818C2 (de) * | 1980-09-19 | 1990-08-02 | Hitachi Chemical Co., Ltd., Tokio/Tokyo | Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske |
| US4610951A (en) * | 1983-06-06 | 1986-09-09 | Dynachem Corporation | Process of using a flexible, fast processing photopolymerizable composition |
| DE3412992A1 (de) * | 1984-04-06 | 1985-10-24 | Hoechst Ag, 6230 Frankfurt | Durch strahlung polymerisierbares gemisch und verfahren zum aufbringen von markierungen auf eine loetstopresistschicht |
| US4837126A (en) * | 1985-06-07 | 1989-06-06 | W. R. Grace & Co. | Polymer composition for photoresist application |
| US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
| US5102774A (en) * | 1986-12-08 | 1992-04-07 | Armstrong World Industries, Inc. | Photoimagable coating compositions which are developable in aqueous alkaline solutions and can be used for solder mask compositions |
| US5217845A (en) * | 1988-12-22 | 1993-06-08 | Hoechst Aktiengesellschaft | Photopolymerizable mixture and photopolymerizable copying material containing same |
| JP2584672B2 (ja) * | 1989-04-28 | 1997-02-26 | 富士写真フイルム株式会社 | 感光性組成物 |
| CA2040097A1 (en) * | 1990-04-12 | 1991-10-13 | Wako Yokoyama | Urethane polymers for printing plate compositions |
| US5290663A (en) * | 1991-03-01 | 1994-03-01 | W. R. Grace & Co.-Conn. | Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates |
| DE4129284A1 (de) * | 1991-09-03 | 1993-03-04 | Agfa Gevaert Ag | Bilderzeugungselement mit einem fotopolymerisierbaren monomer |
| EP0545081B1 (de) * | 1991-11-01 | 1998-12-23 | MacDermid Imaging Technology Inc. | Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen |
| US5341799A (en) * | 1991-12-23 | 1994-08-30 | Hercules Incorporated | Urethane polymers for printing plate compositions |
| TW424172B (en) * | 1995-04-19 | 2001-03-01 | Hitachi Chemical Co Ltd | Photosensitive resin composition and photosensitive element using the same |
-
1998
- 1998-05-29 US US09/086,903 patent/US5952154A/en not_active Expired - Fee Related
-
1999
- 1999-03-16 TW TW088104047A patent/TWI221212B/zh not_active IP Right Cessation
- 1999-03-18 CA CA002266159A patent/CA2266159A1/en not_active Abandoned
- 1999-04-23 SG SG1999001939A patent/SG75170A1/en unknown
- 1999-05-10 JP JP11129218A patent/JP2000003036A/ja not_active Withdrawn
- 1999-05-20 AT AT99303933T patent/ATE272852T1/de not_active IP Right Cessation
- 1999-05-20 ES ES99303933T patent/ES2224556T3/es not_active Expired - Lifetime
- 1999-05-20 DE DE69919076T patent/DE69919076T2/de not_active Expired - Fee Related
- 1999-05-20 EP EP99303933A patent/EP0961170B1/de not_active Expired - Lifetime
- 1999-05-27 KR KR1019990019155A patent/KR100294549B1/ko not_active Expired - Fee Related
- 1999-05-31 CN CNB991071425A patent/CN1190705C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0961170B1 (de) | 2004-08-04 |
| CN1245908A (zh) | 2000-03-01 |
| TWI221212B (en) | 2004-09-21 |
| DE69919076D1 (de) | 2004-09-09 |
| KR19990088587A (ko) | 1999-12-27 |
| CA2266159A1 (en) | 1999-11-29 |
| DE69919076T2 (de) | 2004-12-09 |
| SG75170A1 (en) | 2000-09-19 |
| JP2000003036A (ja) | 2000-01-07 |
| CN1190705C (zh) | 2005-02-23 |
| ES2224556T3 (es) | 2005-03-01 |
| HK1021660A1 (en) | 2000-06-23 |
| KR100294549B1 (ko) | 2001-07-03 |
| US5952154A (en) | 1999-09-14 |
| EP0961170A1 (de) | 1999-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE272852T1 (de) | Wässrig entwickelbare, lichtempfindliche bildaufzeichnungszusammensetzung mit verbesserter haftung und entschichtung | |
| KR0144639B1 (ko) | 아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막 | |
| ATE277366T1 (de) | Wässrige photoresists auf urethanacrylat-basis | |
| KR0169207B1 (ko) | 신규의 중합체 및 이를 함유하는 광영상용 조성물 | |
| TW200502689A (en) | Photosensitive composition and use thereof | |
| EP0927911B1 (de) | Urethanoligomere enthaltende lichtempfindliche Zusammensetzungen | |
| CA2266607A1 (en) | Photoimageable composition having improved photoinitiator system | |
| US5320933A (en) | Photoimageable composition having improved adhesion promoter | |
| EP0935171A1 (de) | Fotoempfindliche Zusammensetzungen, die hydrophile Bindemittelpolymere und hydrophile Monomere enthalten | |
| CA2254797C (en) | Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizers | |
| EP0919871A1 (de) | Lichtempfindliche Bildaufzeichnungszusammensetzung mit verbesserter Flexibilität, Haftung und Entschichtung | |
| US6207347B1 (en) | Photoimageable composition having improved flexibility | |
| AU660881B1 (en) | Waterborne photoresists having binders neutralized with amino acrylates | |
| US6004725A (en) | Photoimageable compositions | |
| JPH02178663A (ja) | 放射感応性組成物の現像方法およびこれに使用する現像液 | |
| AU706730B1 (en) | Photoimageable compositions for improved adhesion and processing times | |
| EP0919872A2 (de) | Ungesättigte Isocyanat-Trimere enthaltende, negativ arbeitende lichtempfindliche Zusammensetzungen | |
| HK1005069B (en) | Waterborne photoresists having binders neutralized with amino acrylates | |
| CA2001174A1 (en) | Development of radiation sensitive compositions | |
| HK1018324A (en) | Negative-acting photoimageable compositions comprising unsaturated isocyanate trimers |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification |
Ref document number: 0961170 Country of ref document: EP |
|
| REN | Ceased due to non-payment of the annual fee |