ATE280941T1 - Verfahren und vorrichtung zum messen einer duennen schicht, insbesondere einer photoresistschicht auf einem halbleitersubstrat - Google Patents

Verfahren und vorrichtung zum messen einer duennen schicht, insbesondere einer photoresistschicht auf einem halbleitersubstrat

Info

Publication number
ATE280941T1
ATE280941T1 AT99939596T AT99939596T ATE280941T1 AT E280941 T1 ATE280941 T1 AT E280941T1 AT 99939596 T AT99939596 T AT 99939596T AT 99939596 T AT99939596 T AT 99939596T AT E280941 T1 ATE280941 T1 AT E280941T1
Authority
AT
Austria
Prior art keywords
measuring
semiconductor substrate
light
wavelength
intensity
Prior art date
Application number
AT99939596T
Other languages
English (en)
Inventor
Ofer Du-Nour
Original Assignee
Tevet Process Control Technolo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tevet Process Control Technolo filed Critical Tevet Process Control Technolo
Application granted granted Critical
Publication of ATE280941T1 publication Critical patent/ATE280941T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
AT99939596T 1998-08-27 1999-08-26 Verfahren und vorrichtung zum messen einer duennen schicht, insbesondere einer photoresistschicht auf einem halbleitersubstrat ATE280941T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL12596498A IL125964A (en) 1998-08-27 1998-08-27 Method and apparatus for measuring the thickness of a transparent film, particularly of a photoresist film on a semiconductor substrate
PCT/IL1999/000466 WO2000012958A1 (en) 1998-08-27 1999-08-26 Methods and apparatus for measuring the thickness of a film, particularly of a photoresist film on a semiconductor substrate

Publications (1)

Publication Number Publication Date
ATE280941T1 true ATE280941T1 (de) 2004-11-15

Family

ID=11071900

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99939596T ATE280941T1 (de) 1998-08-27 1999-08-26 Verfahren und vorrichtung zum messen einer duennen schicht, insbesondere einer photoresistschicht auf einem halbleitersubstrat

Country Status (13)

Country Link
US (1) US6801321B1 (de)
EP (1) EP1110054B1 (de)
JP (1) JP2002523763A (de)
KR (1) KR100694772B1 (de)
CN (1) CN1151358C (de)
AT (1) ATE280941T1 (de)
AU (1) AU5385599A (de)
CA (1) CA2341403A1 (de)
DE (1) DE69921493T2 (de)
HK (1) HK1039173A1 (de)
IL (1) IL125964A (de)
NO (1) NO20010910L (de)
WO (1) WO2000012958A1 (de)

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Also Published As

Publication number Publication date
KR100694772B1 (ko) 2007-03-13
IL125964A (en) 2003-10-31
IL125964A0 (en) 1999-04-11
DE69921493D1 (de) 2004-12-02
EP1110054A4 (de) 2001-10-31
NO20010910L (no) 2001-04-27
DE69921493T2 (de) 2006-02-02
HK1039173A1 (zh) 2002-04-12
AU5385599A (en) 2000-03-21
CN1314991A (zh) 2001-09-26
JP2002523763A (ja) 2002-07-30
EP1110054B1 (de) 2004-10-27
CN1151358C (zh) 2004-05-26
US6801321B1 (en) 2004-10-05
WO2000012958A1 (en) 2000-03-09
EP1110054A1 (de) 2001-06-27
KR20010072848A (ko) 2001-07-31
CA2341403A1 (en) 2000-03-09
NO20010910D0 (no) 2001-02-23

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