ATE287098T1 - Verbesserte thermohärtbare antireflexionsbeschichtungen für tiefes ultraviolett - Google Patents
Verbesserte thermohärtbare antireflexionsbeschichtungen für tiefes ultraviolettInfo
- Publication number
- ATE287098T1 ATE287098T1 AT98952017T AT98952017T ATE287098T1 AT E287098 T1 ATE287098 T1 AT E287098T1 AT 98952017 T AT98952017 T AT 98952017T AT 98952017 T AT98952017 T AT 98952017T AT E287098 T1 ATE287098 T1 AT E287098T1
- Authority
- AT
- Austria
- Prior art keywords
- improved
- thermocured
- deep ultraviolet
- reflection coatings
- copolymers
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/492—Photosoluble emulsions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/18—Introducing halogen atoms or halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/062—Copolymers with monomers not covered by C09D133/06
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/10—Copolymer characterised by the proportions of the comonomers expressed as molar percentages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/20—Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Paints Or Removers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Surface Treatment Of Glass (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/940,169 US5919599A (en) | 1997-09-30 | 1997-09-30 | Thermosetting anti-reflective coatings at deep ultraviolet |
| PCT/US1998/020672 WO1999017161A1 (en) | 1997-09-30 | 1998-09-28 | Improved thermosetting anti-reflective coatings at deep ultraviolet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE287098T1 true ATE287098T1 (de) | 2005-01-15 |
Family
ID=25474362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT98952017T ATE287098T1 (de) | 1997-09-30 | 1998-09-28 | Verbesserte thermohärtbare antireflexionsbeschichtungen für tiefes ultraviolett |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US5919599A (de) |
| EP (1) | EP1023634B1 (de) |
| JP (1) | JP4310721B2 (de) |
| KR (1) | KR100490201B1 (de) |
| CN (1) | CN100362428C (de) |
| AT (1) | ATE287098T1 (de) |
| CA (1) | CA2301020A1 (de) |
| DE (1) | DE69828630T2 (de) |
| TW (1) | TW483917B (de) |
| WO (1) | WO1999017161A1 (de) |
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| US6314834B1 (en) | 1999-01-25 | 2001-11-13 | Truvativ International Co., Ltd. | Hollow crank arm |
| US6316165B1 (en) | 1999-03-08 | 2001-11-13 | Shipley Company, L.L.C. | Planarizing antireflective coating compositions |
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| US6459701B1 (en) * | 1999-08-06 | 2002-10-01 | Emulex Corporation | Variable access fairness in a fibre channel arbitrated loop |
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| JP6404757B2 (ja) | 2015-03-27 | 2018-10-17 | 信越化学工業株式会社 | レジスト下層膜材料用重合体、レジスト下層膜材料、及びパターン形成方法 |
| JP6853716B2 (ja) | 2017-03-31 | 2021-03-31 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法 |
| JP6718406B2 (ja) | 2017-03-31 | 2020-07-08 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法 |
| WO2018230322A1 (ja) * | 2017-06-12 | 2018-12-20 | Dic株式会社 | 重合性化合物及び液晶組成物 |
| KR20200084327A (ko) | 2017-11-17 | 2020-07-10 | 디아이씨 가부시끼가이샤 | 중합성 화합물과, 그것을 사용한 액정 조성물 및 액정 표시 소자 |
| WO2019167640A1 (ja) | 2018-03-01 | 2019-09-06 | Dic株式会社 | 重合性化合物並びにそれを使用した液晶組成物及び液晶表示素子 |
| CN112368645B (zh) | 2018-06-13 | 2024-07-26 | 布鲁尔科技公司 | 用于euv光刻的粘附层 |
| US11442364B2 (en) * | 2018-06-28 | 2022-09-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Materials and methods for forming resist bottom layer |
| CN112680052B (zh) | 2020-12-23 | 2022-06-28 | 上海飞凯材料科技股份有限公司 | 一种抗反射涂料组合物及其应用 |
| JPWO2023008355A1 (de) | 2021-07-30 | 2023-02-02 | ||
| TW202337929A (zh) * | 2021-11-15 | 2023-10-01 | 日商日產化學股份有限公司 | 多環芳香族烴系光硬化性樹脂組成物 |
| CN114326304B (zh) * | 2021-12-30 | 2024-08-20 | 苏州瑞红电子化学品有限公司 | 一种耐刻蚀的正性光刻胶 |
| WO2024014330A1 (ja) | 2022-07-14 | 2024-01-18 | 三菱瓦斯化学株式会社 | レジスト補助膜組成物、及び該組成物を用いたパターンの形成方法 |
| KR20250160212A (ko) | 2023-03-24 | 2025-11-11 | 닛산 가가쿠 가부시키가이샤 | 광학 회절체 제조용 레지스트 하층막 형성용 조성물 |
| JP2026007334A (ja) | 2024-07-02 | 2026-01-16 | 信越化学工業株式会社 | レジスト下層膜形成用組成物、パターン形成方法、及びレジスト下層膜形成方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL219195A (de) * | 1956-07-27 | |||
| US4316940A (en) * | 1980-03-21 | 1982-02-23 | E. I. Du Pont De Nemours And Company | High-solids polyester and aminoplast coating composition |
| US4544691A (en) * | 1981-11-05 | 1985-10-01 | Ciba-Geigy Corporation | Compositions containing ultraviolet-absorbing stabilizing substituted by an aliphatic hydroxyl group |
| EP0112798B1 (de) * | 1982-11-25 | 1987-05-13 | Ciba-Geigy Ag | Zu Kondensations- oder Additionsreaktionen befähigte lichtempfindliche und gegebenenfalls vernetzbare Stoffgemische, daraus herstellbare Reaktionsprodukte und deren Verwendung |
| ATE110096T1 (de) * | 1989-01-31 | 1994-09-15 | Basf Corp | Hydrofobe farbstoffe enthaltende, kathodisch abscheidbare elektrotauchlackierungen. |
| WO1993002384A1 (en) * | 1991-07-19 | 1993-02-04 | E.I. Du Pont De Nemours And Company | Preparation of nonlinear optical elements |
| US6165697A (en) * | 1991-11-15 | 2000-12-26 | Shipley Company, L.L.C. | Antihalation compositions |
| US5324789A (en) * | 1991-12-30 | 1994-06-28 | Ppg Industries, Inc. | Azetidinol reaction products |
| JP2694097B2 (ja) * | 1992-03-03 | 1997-12-24 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 反射防止コーティング組成物 |
| US5294680A (en) * | 1992-07-24 | 1994-03-15 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
| US5731385A (en) * | 1993-12-16 | 1998-03-24 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
| US5607824A (en) * | 1994-07-27 | 1997-03-04 | International Business Machines Corporation | Antireflective coating for microlithography |
| US5693691A (en) * | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
| US5733714A (en) * | 1996-09-30 | 1998-03-31 | Clariant Finance (Bvi) Limited | Antireflective coating for photoresist compositions |
-
1997
- 1997-09-30 US US08/940,169 patent/US5919599A/en not_active Expired - Lifetime
-
1998
- 1998-09-28 EP EP98952017A patent/EP1023634B1/de not_active Expired - Lifetime
- 1998-09-28 CN CNB988093901A patent/CN100362428C/zh not_active Expired - Lifetime
- 1998-09-28 AT AT98952017T patent/ATE287098T1/de not_active IP Right Cessation
- 1998-09-28 WO PCT/US1998/020672 patent/WO1999017161A1/en not_active Ceased
- 1998-09-28 JP JP2000514166A patent/JP4310721B2/ja not_active Expired - Lifetime
- 1998-09-28 DE DE69828630T patent/DE69828630T2/de not_active Expired - Lifetime
- 1998-09-28 CA CA002301020A patent/CA2301020A1/en not_active Abandoned
- 1998-09-28 KR KR10-2000-7003060A patent/KR100490201B1/ko not_active Expired - Lifetime
- 1998-09-29 TW TW087116151A patent/TW483917B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US5919599A (en) | 1999-07-06 |
| JP4310721B2 (ja) | 2009-08-12 |
| KR100490201B1 (ko) | 2005-05-17 |
| WO1999017161A1 (en) | 1999-04-08 |
| EP1023634B1 (de) | 2005-01-12 |
| EP1023634A1 (de) | 2000-08-02 |
| JP2002502982A (ja) | 2002-01-29 |
| CN1302391A (zh) | 2001-07-04 |
| EP1023634A4 (de) | 2002-02-13 |
| KR20010030667A (ko) | 2001-04-16 |
| TW483917B (en) | 2002-04-21 |
| CN100362428C (zh) | 2008-01-16 |
| DE69828630T2 (de) | 2005-06-16 |
| CA2301020A1 (en) | 1999-04-08 |
| DE69828630D1 (de) | 2005-02-17 |
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| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |