ATE290217T1 - Elektrostatischer kraftmessfühler mit ausleger und abschirmung - Google Patents

Elektrostatischer kraftmessfühler mit ausleger und abschirmung

Info

Publication number
ATE290217T1
ATE290217T1 AT99956922T AT99956922T ATE290217T1 AT E290217 T1 ATE290217 T1 AT E290217T1 AT 99956922 T AT99956922 T AT 99956922T AT 99956922 T AT99956922 T AT 99956922T AT E290217 T1 ATE290217 T1 AT E290217T1
Authority
AT
Austria
Prior art keywords
electrostatic force
shield
detector
tip
cantilever arm
Prior art date
Application number
AT99956922T
Other languages
English (en)
Inventor
Toshio Uehara
Bruce T Williams
Akiyoshi Itoh
Katsuji Nakagawa
Manabu Tani
Original Assignee
Trek Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trek Inc filed Critical Trek Inc
Application granted granted Critical
Publication of ATE290217T1 publication Critical patent/ATE290217T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G01Q60/30—Scanning potential microscopy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/852—Manufacture, treatment, or detection of nanostructure with scanning probe for detection of specific nanostructure sample or nanostructure-related property
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/864—Electrostatic force probe

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Switches That Are Operated By Magnetic Or Electric Fields (AREA)
  • Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
  • Forklifts And Lifting Vehicles (AREA)
  • Jib Cranes (AREA)
  • Transmission And Conversion Of Sensor Element Output (AREA)
AT99956922T 1998-11-06 1999-11-05 Elektrostatischer kraftmessfühler mit ausleger und abschirmung ATE290217T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10740098P 1998-11-06 1998-11-06
PCT/US1999/026065 WO2000028338A1 (en) 1998-11-06 1999-11-05 Electrostatic force detector with cantilever and shield

Publications (1)

Publication Number Publication Date
ATE290217T1 true ATE290217T1 (de) 2005-03-15

Family

ID=22316467

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99956922T ATE290217T1 (de) 1998-11-06 1999-11-05 Elektrostatischer kraftmessfühler mit ausleger und abschirmung

Country Status (8)

Country Link
US (1) US6337478B1 (de)
EP (1) EP1135691B1 (de)
JP (1) JP5254509B2 (de)
CN (1) CN1244817C (de)
AT (1) ATE290217T1 (de)
DE (1) DE69923999T2 (de)
HK (1) HK1040770B (de)
WO (1) WO2000028338A1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020092340A1 (en) * 2000-10-30 2002-07-18 Veeco Instruments Inc. Cantilever array sensor system
US20040257561A1 (en) * 2000-11-24 2004-12-23 Takao Nakagawa Apparatus and method for sampling
US6545495B2 (en) * 2001-04-17 2003-04-08 Ut-Battelle, Llc Method and apparatus for self-calibration of capacitive sensors
JP4831484B2 (ja) * 2006-08-30 2011-12-07 セイコーインスツル株式会社 電位差検出方法及び走査型プローブ顕微鏡
JP5066258B2 (ja) * 2008-08-01 2012-11-07 株式会社日立製作所 膜厚評価装置および膜厚評価方法
KR101006248B1 (ko) * 2008-10-08 2011-01-10 한국산업기술시험원 정전전압 측정기용 교정 장치
KR101006249B1 (ko) * 2008-10-08 2011-01-07 한국산업기술시험원 정전전압 측정기용 교정 장치
CN101493397B (zh) * 2009-02-27 2010-12-29 中山大学 一种静电力显微镜及其测量方法
WO2012108258A1 (ja) * 2011-02-09 2012-08-16 独立行政法人産業技術総合研究所 静電気帯電計測方法及び装置
WO2014043632A1 (en) * 2012-09-14 2014-03-20 The University Of North Carolina At Chapel Hill Methods, systems, and computer readable media for dual resonance frequency enhanced electrostatic force microscopy
US10072927B2 (en) 2016-01-07 2018-09-11 Rarecyte, Inc. Detecting a substrate
WO2014197412A1 (en) * 2013-06-05 2014-12-11 Nanomechanics, Inc. Electrostatic force tester
KR20150107939A (ko) * 2014-03-13 2015-09-24 참엔지니어링(주) 시료 관찰 장치
CN104237652B (zh) * 2014-09-03 2016-08-24 西安交通大学 一种基于压敏原理的梁膜结构高压静电场传感器芯片
US9869696B2 (en) * 2015-02-03 2018-01-16 Fei Efa, Inc. Method for imaging a feature using a scanning probe microscope
GB2560856A (en) * 2016-04-08 2018-09-26 Trek Inc Electrostatic force detector with improved shielding and method of using an electrostatic force detector
US9616470B1 (en) * 2016-09-13 2017-04-11 International Business Machines Corporation Cleaning of nanostructures
TWI627424B (zh) * 2017-04-26 2018-06-21 廣達電腦股份有限公司 靜電偵測裝置以及方法
US10802045B2 (en) * 2018-03-26 2020-10-13 Bruker Nano, Inc. Large radius probe
CN110491819B (zh) * 2018-05-14 2021-11-12 北京北方华创微电子装备有限公司 平衡静电力的方法和静电卡盘
CN108732416B (zh) * 2018-06-04 2020-06-19 西安交通大学 一种前端数字化的mems微镜高压静电传感器
CN108828291B (zh) * 2018-06-04 2021-07-13 西安交通大学 一种用于高压静电电压直接测量的mems微镜传感器
CN112067851A (zh) * 2020-09-09 2020-12-11 四川大学 一种定量测量电场作用下有机高分子链所受电场力的方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3294662B2 (ja) * 1993-04-21 2002-06-24 株式会社リコー 表面電位計
US5440121A (en) * 1993-12-28 1995-08-08 Seiko Instruments Inc. Scanning probe microscope
JP3402512B2 (ja) * 1994-05-23 2003-05-06 セイコーインスツルメンツ株式会社 走査型プローブ顕微鏡
JPH0854403A (ja) * 1994-08-09 1996-02-27 Nissin Electric Co Ltd 複合顕微鏡の導電性カンチレバ−構造
JP3450460B2 (ja) * 1994-09-29 2003-09-22 オリンパス光学工業株式会社 走査型プローブ顕微鏡
JPH08114606A (ja) * 1994-10-14 1996-05-07 Ricoh Co Ltd 物理量測定装置
JPH08248082A (ja) * 1995-03-08 1996-09-27 Nippon Telegr & Teleph Corp <Ntt> 電位分布測定方法および走査型顕微鏡
US5929643A (en) * 1995-12-07 1999-07-27 Olympus Optical Co., Ltd. Scanning probe microscope for measuring the electrical properties of the surface of an electrically conductive sample
JPH1048224A (ja) * 1996-08-08 1998-02-20 Olympus Optical Co Ltd 走査型プローブ顕微鏡
DE19638977A1 (de) * 1996-09-23 1998-03-26 Siemens Ag Kraftmikroskopiesonde
JP3548972B2 (ja) * 1996-09-30 2004-08-04 日立建機株式会社 走査型プローブ顕微鏡の探針移動方法および移動機構
JPH10246728A (ja) * 1997-03-04 1998-09-14 Olympus Optical Co Ltd 走査型プローブ顕微鏡における部分測定方法
US5907096A (en) * 1997-06-02 1999-05-25 International Business Machines Corporation Detecting fields with a two-pass, dual-amplitude-mode scanning force microscope
EP1032828B1 (de) * 1997-10-31 2014-12-10 Trek, Inc. Elektrostatischer kraftmessfühler mit freitragenden ausleger für ein elektro- statisches kraftmikroskop

Also Published As

Publication number Publication date
HK1040770A1 (en) 2002-06-21
DE69923999D1 (de) 2005-04-07
HK1040770B (en) 2005-08-05
CN1333875A (zh) 2002-01-30
EP1135691A4 (de) 2002-03-13
JP2002529743A (ja) 2002-09-10
DE69923999T2 (de) 2006-05-11
EP1135691A1 (de) 2001-09-26
US6337478B1 (en) 2002-01-08
WO2000028338A1 (en) 2000-05-18
CN1244817C (zh) 2006-03-08
JP5254509B2 (ja) 2013-08-07
EP1135691B1 (de) 2005-03-02

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