ATE301916T1 - Keramisches heizgerät - Google Patents

Keramisches heizgerät

Info

Publication number
ATE301916T1
ATE301916T1 AT00902965T AT00902965T ATE301916T1 AT E301916 T1 ATE301916 T1 AT E301916T1 AT 00902965 T AT00902965 T AT 00902965T AT 00902965 T AT00902965 T AT 00902965T AT E301916 T1 ATE301916 T1 AT E301916T1
Authority
AT
Austria
Prior art keywords
heat generation
generation bodies
ceramic heater
level
ceramic substrate
Prior art date
Application number
AT00902965T
Other languages
English (en)
Inventor
Yasutaka Ito
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Application granted granted Critical
Publication of ATE301916T1 publication Critical patent/ATE301916T1/de

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/10Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/141Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
    • H05B3/143Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/20Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • H05B3/28Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
    • H05B3/283Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
AT00902965T 1999-11-19 2000-02-15 Keramisches heizgerät ATE301916T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33027099 1999-11-19
JP33564199 1999-11-26
PCT/JP2000/000815 WO2001039551A1 (en) 1999-11-19 2000-02-15 Ceramic heater

Publications (1)

Publication Number Publication Date
ATE301916T1 true ATE301916T1 (de) 2005-08-15

Family

ID=26573474

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00902965T ATE301916T1 (de) 1999-11-19 2000-02-15 Keramisches heizgerät

Country Status (5)

Country Link
US (2) US20020043530A1 (de)
EP (1) EP1124404B1 (de)
AT (1) ATE301916T1 (de)
DE (1) DE60021848T2 (de)
WO (1) WO2001039551A1 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000069219A1 (en) * 1999-05-07 2000-11-16 Ibiden Co., Ltd. Hot plate and method of producing the same
JP3293594B2 (ja) * 1999-06-29 2002-06-17 住友電気工業株式会社 光ファイバ融着接続部の保護部材加熱装置及び加熱方法
JP2001118662A (ja) 1999-08-09 2001-04-27 Ibiden Co Ltd セラミックヒータ
EP1120829A4 (de) * 1999-08-10 2009-05-27 Ibiden Co Ltd Keramische platte für halbleiterproduktionsanordnung
JP3381909B2 (ja) * 1999-08-10 2003-03-04 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
JP3273773B2 (ja) * 1999-08-12 2002-04-15 イビデン株式会社 半導体製造・検査装置用セラミックヒータ、半導体製造・検査装置用静電チャックおよびウエハプローバ用チャックトップ
EP1249433A4 (de) * 1999-09-06 2005-01-05 Ibiden Co Ltd Brikett und keramisches substrat aus gesintertem kohlenstoffhaltigem aluminiumnitrid zur verwendung in vorrichtungen zur herstellung und untersuchung von halbleitern
US6884972B2 (en) 1999-12-09 2005-04-26 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/inspecting apparatus
JP2001237053A (ja) * 1999-12-14 2001-08-31 Ibiden Co Ltd 半導体製造・検査装置用セラミックヒータおよび支持ピン
US20040222211A1 (en) * 1999-12-28 2004-11-11 Ibiden Co., Ltd. Carbon-containing aluminum nitride sintered body, and ceramic substrate for a semiconductor producing/examining device
US20040016746A1 (en) * 1999-12-29 2004-01-29 Ibiden Co., Ltd. Ceramic heater
JP3228924B2 (ja) * 2000-01-21 2001-11-12 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
WO2001059833A1 (en) 2000-02-08 2001-08-16 Ibiden Co., Ltd. Ceramic board for semiconductor production and inspection devices
US6861165B2 (en) * 2000-02-24 2005-03-01 Ibiden Co., Ltd. Aluminum nitride sintered compact, ceramic substrate, ceramic heater and electrostatic chuck
JP2001247382A (ja) 2000-03-06 2001-09-11 Ibiden Co Ltd セラミック基板
JP2001253777A (ja) * 2000-03-13 2001-09-18 Ibiden Co Ltd セラミック基板
WO2001078454A1 (fr) * 2000-04-07 2001-10-18 Ibiden Co., Ltd. Dispositif chauffant ceramique
EP1233651A1 (de) * 2000-04-07 2002-08-21 Ibiden Co., Ltd. Keramisches heizelement
JP2002025758A (ja) * 2000-05-02 2002-01-25 Ibiden Co Ltd ホットプレートユニット
WO2001091166A1 (en) * 2000-05-26 2001-11-29 Ibiden Co., Ltd. Semiconductor manufacturing and inspecting device
JP3516392B2 (ja) * 2000-06-16 2004-04-05 イビデン株式会社 半導体製造・検査装置用ホットプレート
US6897414B2 (en) 2000-07-03 2005-05-24 Ibiden Co., Ltd. Ceramic heater for semiconductor manufacturing/testing apparatus
EP1229572A1 (de) * 2000-07-04 2002-08-07 Ibiden Co., Ltd. Heisse platte für die verarbeitung und das testen von halbleitern
WO2002007195A1 (fr) * 2000-07-19 2002-01-24 Ibiden Co., Ltd. Dispositif chauffant ceramique pour la fabrication/verification de semi-conducteurs, son procede de fabrication, et son systeme de fabrication
US6815646B2 (en) * 2000-07-25 2004-11-09 Ibiden Co., Ltd. Ceramic substrate for semiconductor manufacture/inspection apparatus, ceramic heater, electrostatic clampless holder, and substrate for wafer prober
EP1251551A1 (de) * 2000-08-30 2002-10-23 Ibiden Co., Ltd. Keramischer heizkörper für halbleiter und inspektionsausrüstungen
JP2002160974A (ja) * 2000-11-22 2002-06-04 Ibiden Co Ltd 窒化アルミニウム焼結体、窒化アルミニウム焼結体の製造方法、セラミック基板およびセラミック基板の製造方法
JPWO2002043441A1 (ja) 2000-11-24 2004-04-02 イビデン株式会社 セラミックヒータ、および、セラミックヒータの製造方法
JPWO2002084717A1 (ja) * 2001-04-11 2004-08-05 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
WO2003015157A1 (en) 2001-08-10 2003-02-20 Ibiden Co., Ltd. Ceramic joint body
US7193180B2 (en) * 2003-05-21 2007-03-20 Lexmark International, Inc. Resistive heater comprising first and second resistive traces, a fuser subassembly including such a resistive heater and a universal heating apparatus including first and second resistive traces
JP4684222B2 (ja) * 2004-03-19 2011-05-18 株式会社クリエイティブ テクノロジー 双極型静電チャック
US7774326B2 (en) * 2004-06-25 2010-08-10 Apple Inc. Methods and systems for managing data
CN101019208B (zh) * 2004-06-28 2010-12-08 京瓷株式会社 晶片加热装置及半导体制造装置
US20060088692A1 (en) * 2004-10-22 2006-04-27 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/examining device
JP5199859B2 (ja) * 2008-12-24 2013-05-15 株式会社日本マイクロニクス プローブカード
US20120006809A1 (en) * 2010-06-23 2012-01-12 Colorado State University Research Foundation Sublimation crucible with embedded heater element
JP5915026B2 (ja) * 2011-08-26 2016-05-11 住友大阪セメント株式会社 温度測定用板状体及びそれを備えた温度測定装置
DE102013113048A1 (de) * 2013-11-26 2015-05-28 Aixtron Se Heizvorrichtung für einen Suszeptor eines CVD-Reaktors
JP5962833B2 (ja) * 2015-01-16 2016-08-03 Toto株式会社 静電チャック
KR20180011119A (ko) * 2015-05-22 2018-01-31 어플라이드 머티어리얼스, 인코포레이티드 방위방향으로 튜닝가능한 다중-구역 정전 척
KR102041208B1 (ko) * 2015-11-12 2019-11-06 쿄세라 코포레이션 히터
US20170140956A1 (en) * 2015-11-13 2017-05-18 Varian Semiconductor Equipment Associates, Inc. Single Piece Ceramic Platen
JP6758143B2 (ja) * 2016-09-29 2020-09-23 日本特殊陶業株式会社 加熱装置
US11452179B2 (en) * 2017-01-06 2022-09-20 Lg Innotek Co., Ltd. Heating rod and heater having same
US20210398829A1 (en) * 2018-11-30 2021-12-23 Lam Research Corporation Ceramic pedestal with multi-layer heater for enhanced thermal uniformity
DE102020107552A1 (de) 2020-03-19 2021-09-23 AIXTRON Ltd. Heizvorrichtung für einen Suszeptor eines CVD-Reaktors
WO2025089052A1 (ja) * 2023-10-26 2025-05-01 京セラ株式会社 ヒータ

Family Cites Families (30)

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Publication number Priority date Publication date Assignee Title
US1112582A (en) * 1913-10-07 1914-10-06 Frank R Whittlesey Electric heater.
US1436657A (en) * 1921-11-26 1922-11-28 Clarence B Ingersoll Electrical heating device
US1799168A (en) * 1930-02-05 1931-04-07 Johnson Axel Electric heating unit
US1998764A (en) * 1933-01-20 1935-04-23 Volgt & Haeffner Ag Electric hot plate
US2458251A (en) * 1937-01-13 1949-01-04 Entpr S Electr Fribourgeoises Solid electric heating plate
US2249476A (en) * 1938-09-26 1941-07-15 John A Knight Electric hot plate
JPS5769183U (de) * 1980-10-15 1982-04-26
US4449039A (en) * 1981-09-14 1984-05-15 Nippondenso Co., Ltd. Ceramic heater
JPS62167396U (de) * 1986-04-11 1987-10-23
JPS62291937A (ja) * 1986-06-12 1987-12-18 Matsushita Electric Ind Co Ltd プロ−バ
DE69130205T2 (de) * 1990-12-25 1999-03-25 Ngk Insulators, Ltd., Nagoya, Aichi Heizungsapparat für eine Halbleiterscheibe und Verfahren zum Herstellen desselben
JPH05326112A (ja) * 1992-05-21 1993-12-10 Shin Etsu Chem Co Ltd 複層セラミックスヒーター
JP2898838B2 (ja) * 1993-02-23 1999-06-02 日本碍子株式会社 加熱装置
US5750958A (en) * 1993-09-20 1998-05-12 Kyocera Corporation Ceramic glow plug
JPH07307377A (ja) * 1993-12-27 1995-11-21 Shin Etsu Chem Co Ltd 静電チャック付セラミックスヒーター
JP2647799B2 (ja) * 1994-02-04 1997-08-27 日本碍子株式会社 セラミックスヒーター及びその製造方法
JP2813148B2 (ja) * 1994-03-02 1998-10-22 日本碍子株式会社 セラミックス製品
TW444922U (en) * 1994-09-29 2001-07-01 Tokyo Electron Ltd Heating device and the processing device using the same
US6133557A (en) * 1995-01-31 2000-10-17 Kyocera Corporation Wafer holding member
US5556043A (en) * 1995-02-06 1996-09-17 Lake Superior Paper Industries Angled-rib blocking slab for pulpwood grinder
US5886863A (en) * 1995-05-09 1999-03-23 Kyocera Corporation Wafer support member
KR100280634B1 (ko) * 1996-05-05 2001-02-01 세이이치로 미야타 전기 발열체 및 이를 이용한 정전 척
JPH11204238A (ja) * 1998-01-08 1999-07-30 Ngk Insulators Ltd セラミックスヒーター
JPH11260534A (ja) * 1998-01-09 1999-09-24 Ngk Insulators Ltd 加熱装置およびその製造方法
JPH11251040A (ja) * 1998-02-27 1999-09-17 Kyocera Corp セラミックヒータ及びその製造方法
JP4028149B2 (ja) * 2000-02-03 2007-12-26 日本碍子株式会社 加熱装置
JP4156788B2 (ja) * 2000-10-23 2008-09-24 日本碍子株式会社 半導体製造装置用サセプター
JP3982674B2 (ja) * 2001-11-19 2007-09-26 日本碍子株式会社 セラミックヒーター、その製造方法および半導体製造装置用加熱装置
JP3888531B2 (ja) * 2002-03-27 2007-03-07 日本碍子株式会社 セラミックヒーター、セラミックヒーターの製造方法、および金属部材の埋設品
JP3833974B2 (ja) * 2002-08-21 2006-10-18 日本碍子株式会社 加熱装置の製造方法

Also Published As

Publication number Publication date
EP1124404A4 (de) 2003-01-29
DE60021848T2 (de) 2006-06-08
EP1124404A1 (de) 2001-08-16
EP1124404B1 (de) 2005-08-10
WO2001039551A1 (en) 2001-05-31
DE60021848D1 (de) 2005-09-15
US20020043530A1 (en) 2002-04-18
US20030015521A1 (en) 2003-01-23

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties