ATE301916T1 - Keramisches heizgerät - Google Patents

Keramisches heizgerät

Info

Publication number
ATE301916T1
ATE301916T1 AT00902965T AT00902965T ATE301916T1 AT E301916 T1 ATE301916 T1 AT E301916T1 AT 00902965 T AT00902965 T AT 00902965T AT 00902965 T AT00902965 T AT 00902965T AT E301916 T1 ATE301916 T1 AT E301916T1
Authority
AT
Austria
Prior art keywords
heat generation
generation bodies
ceramic heater
level
ceramic substrate
Prior art date
Application number
AT00902965T
Other languages
English (en)
Inventor
Yasutaka Ito
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Application granted granted Critical
Publication of ATE301916T1 publication Critical patent/ATE301916T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
    • H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • H05B3/28—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
    • H05B3/283—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
AT00902965T 1999-11-19 2000-02-15 Keramisches heizgerät ATE301916T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33027099 1999-11-19
JP33564199 1999-11-26
PCT/JP2000/000815 WO2001039551A1 (en) 1999-11-19 2000-02-15 Ceramic heater

Publications (1)

Publication Number Publication Date
ATE301916T1 true ATE301916T1 (de) 2005-08-15

Family

ID=26573474

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00902965T ATE301916T1 (de) 1999-11-19 2000-02-15 Keramisches heizgerät

Country Status (5)

Country Link
US (2) US20020043530A1 (de)
EP (1) EP1124404B1 (de)
AT (1) ATE301916T1 (de)
DE (1) DE60021848T2 (de)
WO (1) WO2001039551A1 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000069219A1 (en) * 1999-05-07 2000-11-16 Ibiden Co., Ltd. Hot plate and method of producing the same
JP3293594B2 (ja) * 1999-06-29 2002-06-17 住友電気工業株式会社 光ファイバ融着接続部の保護部材加熱装置及び加熱方法
JP2001118662A (ja) 1999-08-09 2001-04-27 Ibiden Co Ltd セラミックヒータ
US6717116B1 (en) * 1999-08-10 2004-04-06 Ibiden Co., Ltd. Semiconductor production device ceramic plate
JP3381909B2 (ja) * 1999-08-10 2003-03-04 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
JP3273773B2 (ja) * 1999-08-12 2002-04-15 イビデン株式会社 半導体製造・検査装置用セラミックヒータ、半導体製造・検査装置用静電チャックおよびウエハプローバ用チャックトップ
US6900149B1 (en) * 1999-09-06 2005-05-31 Ibiden Co., Ltd. Carbon-containing aluminum nitride sintered compact and ceramic substrate for use in equipment for manufacturing or inspecting semiconductor
EP1383167A1 (de) 1999-12-09 2004-01-21 Ibiden Co., Ltd. Keramische scheibe für ein halbleitererzeugungs/inspektionsgerät
JP2001237053A (ja) * 1999-12-14 2001-08-31 Ibiden Co Ltd 半導体製造・検査装置用セラミックヒータおよび支持ピン
US20040222211A1 (en) * 1999-12-28 2004-11-11 Ibiden Co., Ltd. Carbon-containing aluminum nitride sintered body, and ceramic substrate for a semiconductor producing/examining device
US20040016746A1 (en) * 1999-12-29 2004-01-29 Ibiden Co., Ltd. Ceramic heater
JP3228924B2 (ja) * 2000-01-21 2001-11-12 イビデン株式会社 半導体製造・検査装置用セラミックヒータ
US7011874B2 (en) 2000-02-08 2006-03-14 Ibiden Co., Ltd. Ceramic substrate for semiconductor production and inspection devices
WO2001062686A1 (en) * 2000-02-24 2001-08-30 Ibiden Co., Ltd. Aluminum nitride sintered compact, ceramic substrate, ceramic heater and electrostatic chuck
JP2001247382A (ja) 2000-03-06 2001-09-11 Ibiden Co Ltd セラミック基板
JP2001253777A (ja) * 2000-03-13 2001-09-18 Ibiden Co Ltd セラミック基板
US20040149718A1 (en) * 2000-04-07 2004-08-05 Yasutaka Ito Ceramic heater
EP1233651A1 (de) * 2000-04-07 2002-08-21 Ibiden Co., Ltd. Keramisches heizelement
JP2002025758A (ja) * 2000-05-02 2002-01-25 Ibiden Co Ltd ホットプレートユニット
US7071551B2 (en) 2000-05-26 2006-07-04 Ibiden Co., Ltd. Device used to produce or examine semiconductors
JP3516392B2 (ja) * 2000-06-16 2004-04-05 イビデン株式会社 半導体製造・検査装置用ホットプレート
WO2002003434A1 (fr) 2000-07-03 2002-01-10 Ibiden Co., Ltd. Radiateur ceramique pour appareil de fabrication ou de test de semi-conducteurs
WO2002003435A1 (en) 2000-07-04 2002-01-10 Ibiden Co., Ltd. Hot plate for semiconductor manufacture and testing
US6967312B2 (en) * 2000-07-19 2005-11-22 Ibiden Co., Ltd. Semiconductor manufacturing/testing ceramic heater, production method for the ceramic heater and production system for the ceramic heater
WO2002009171A1 (en) * 2000-07-25 2002-01-31 Ibiden Co., Ltd. Ceramic substrate for semiconductor manufacture/inspection apparatus, ceramic heater, electrostatic clampless holder, and substrate for wafer prober
US6878906B2 (en) * 2000-08-30 2005-04-12 Ibiden Co., Ltd. Ceramic heater for semiconductor manufacturing and inspecting equipment
JP2002160974A (ja) * 2000-11-22 2002-06-04 Ibiden Co Ltd 窒化アルミニウム焼結体、窒化アルミニウム焼結体の製造方法、セラミック基板およびセラミック基板の製造方法
EP1345472A1 (de) 2000-11-24 2003-09-17 Ibiden Co., Ltd. Keramisches heizelement und verfahren zu seiner herstellung
US20040206747A1 (en) * 2001-04-11 2004-10-21 Yasutaka Ito Ceramic heater for semiconductor manufacturing/inspecting apparatus
WO2003015157A1 (en) 2001-08-10 2003-02-20 Ibiden Co., Ltd. Ceramic joint body
US7193180B2 (en) * 2003-05-21 2007-03-20 Lexmark International, Inc. Resistive heater comprising first and second resistive traces, a fuser subassembly including such a resistive heater and a universal heating apparatus including first and second resistive traces
US20070223173A1 (en) * 2004-03-19 2007-09-27 Hiroshi Fujisawa Bipolar Electrostatic Chuck
US7774326B2 (en) * 2004-06-25 2010-08-10 Apple Inc. Methods and systems for managing data
TWI353631B (en) * 2004-06-28 2011-12-01 Kyocera Corp Wafer heating device and semiconductor equipment
US20060088692A1 (en) * 2004-10-22 2006-04-27 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/examining device
JP5199859B2 (ja) * 2008-12-24 2013-05-15 株式会社日本マイクロニクス プローブカード
US20120006809A1 (en) * 2010-06-23 2012-01-12 Colorado State University Research Foundation Sublimation crucible with embedded heater element
JP5915026B2 (ja) * 2011-08-26 2016-05-11 住友大阪セメント株式会社 温度測定用板状体及びそれを備えた温度測定装置
DE102013113048A1 (de) * 2013-11-26 2015-05-28 Aixtron Se Heizvorrichtung für einen Suszeptor eines CVD-Reaktors
JP5962833B2 (ja) * 2015-01-16 2016-08-03 Toto株式会社 静電チャック
CN107636817B (zh) * 2015-05-22 2021-08-27 应用材料公司 方位可调整的多区域静电夹具
KR102041208B1 (ko) * 2015-11-12 2019-11-06 쿄세라 코포레이션 히터
US20170140956A1 (en) * 2015-11-13 2017-05-18 Varian Semiconductor Equipment Associates, Inc. Single Piece Ceramic Platen
JP6758143B2 (ja) * 2016-09-29 2020-09-23 日本特殊陶業株式会社 加熱装置
US11452179B2 (en) * 2017-01-06 2022-09-20 Lg Innotek Co., Ltd. Heating rod and heater having same
TWI912846B (zh) * 2018-11-30 2026-01-21 美商蘭姆研究公司 用於增進熱均勻性的具有多層加熱器之陶瓷支座
DE102020107552A1 (de) 2020-03-19 2021-09-23 AIXTRON Ltd. Heizvorrichtung für einen Suszeptor eines CVD-Reaktors
WO2025089052A1 (ja) * 2023-10-26 2025-05-01 京セラ株式会社 ヒータ

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1112582A (en) * 1913-10-07 1914-10-06 Frank R Whittlesey Electric heater.
US1436657A (en) * 1921-11-26 1922-11-28 Clarence B Ingersoll Electrical heating device
US1799168A (en) * 1930-02-05 1931-04-07 Johnson Axel Electric heating unit
US1998764A (en) * 1933-01-20 1935-04-23 Volgt & Haeffner Ag Electric hot plate
US2458251A (en) * 1937-01-13 1949-01-04 Entpr S Electr Fribourgeoises Solid electric heating plate
US2249476A (en) * 1938-09-26 1941-07-15 John A Knight Electric hot plate
JPS5769183U (de) * 1980-10-15 1982-04-26
US4449039A (en) * 1981-09-14 1984-05-15 Nippondenso Co., Ltd. Ceramic heater
JPS62167396U (de) * 1986-04-11 1987-10-23
JPS62291937A (ja) * 1986-06-12 1987-12-18 Matsushita Electric Ind Co Ltd プロ−バ
US5280156A (en) * 1990-12-25 1994-01-18 Ngk Insulators, Ltd. Wafer heating apparatus and with ceramic substrate and dielectric layer having electrostatic chucking means
JPH05326112A (ja) * 1992-05-21 1993-12-10 Shin Etsu Chem Co Ltd 複層セラミックスヒーター
JP2898838B2 (ja) * 1993-02-23 1999-06-02 日本碍子株式会社 加熱装置
US5750958A (en) * 1993-09-20 1998-05-12 Kyocera Corporation Ceramic glow plug
JPH07307377A (ja) * 1993-12-27 1995-11-21 Shin Etsu Chem Co Ltd 静電チャック付セラミックスヒーター
JP2647799B2 (ja) * 1994-02-04 1997-08-27 日本碍子株式会社 セラミックスヒーター及びその製造方法
JP2813148B2 (ja) * 1994-03-02 1998-10-22 日本碍子株式会社 セラミックス製品
TW444922U (en) * 1994-09-29 2001-07-01 Tokyo Electron Ltd Heating device and the processing device using the same
US6133557A (en) * 1995-01-31 2000-10-17 Kyocera Corporation Wafer holding member
US5556043A (en) * 1995-02-06 1996-09-17 Lake Superior Paper Industries Angled-rib blocking slab for pulpwood grinder
US5886863A (en) * 1995-05-09 1999-03-23 Kyocera Corporation Wafer support member
KR100280634B1 (ko) * 1996-05-05 2001-02-01 세이이치로 미야타 전기 발열체 및 이를 이용한 정전 척
JPH11204238A (ja) * 1998-01-08 1999-07-30 Ngk Insulators Ltd セラミックスヒーター
JPH11260534A (ja) * 1998-01-09 1999-09-24 Ngk Insulators Ltd 加熱装置およびその製造方法
JPH11251040A (ja) * 1998-02-27 1999-09-17 Kyocera Corp セラミックヒータ及びその製造方法
JP4028149B2 (ja) * 2000-02-03 2007-12-26 日本碍子株式会社 加熱装置
JP4156788B2 (ja) * 2000-10-23 2008-09-24 日本碍子株式会社 半導体製造装置用サセプター
JP3982674B2 (ja) * 2001-11-19 2007-09-26 日本碍子株式会社 セラミックヒーター、その製造方法および半導体製造装置用加熱装置
JP3888531B2 (ja) * 2002-03-27 2007-03-07 日本碍子株式会社 セラミックヒーター、セラミックヒーターの製造方法、および金属部材の埋設品
JP3833974B2 (ja) * 2002-08-21 2006-10-18 日本碍子株式会社 加熱装置の製造方法

Also Published As

Publication number Publication date
DE60021848T2 (de) 2006-06-08
EP1124404A1 (de) 2001-08-16
EP1124404A4 (de) 2003-01-29
WO2001039551A1 (en) 2001-05-31
DE60021848D1 (de) 2005-09-15
EP1124404B1 (de) 2005-08-10
US20030015521A1 (en) 2003-01-23
US20020043530A1 (en) 2002-04-18

Similar Documents

Publication Publication Date Title
DE60021848D1 (de) Keramisches heizgerät
EP1266767A3 (de) Flachdruckplattenvorläufer, Substrat dafür und hydrophiles Oberflächenmaterial
ATE219186T1 (de) Verbesserung an papiermaschinengeweben
EP0718900A3 (de) Piezoelektrisches/elektrostriktives Dünnfilmelement mit einem Membran mit mindestens einem spannungsaufnemenden Gebiet am Rande
SE9901831D0 (sv) Bärare för elektronikkomponenter
ATE333709T1 (de) Piezokeramischer biegewandler sowie verwendung des piezokeramischen biegewandlers
ATE300098T1 (de) Heisse platte
TW576180U (en) Hydrolyzable absorbent article
CN102186790B (zh) 板材以及用于制造板材的方法
FR2833256B1 (fr) Plaques vitroceramiques, plaques de cuisson les comprenant et leurs procedes de fabrication
EP0798949A3 (de) Keramisches Heizelement
EP0993233A3 (de) Induktor für ein Induktions-Kochfeld
IT1311273B1 (it) Piatra di vetro ceramica.
ATE310202T1 (de) Wärmestrahlung reflektierende schicht- poröse metaloxid-folie verbundisolierung
EP1345264A4 (de) Keramische leiterplatte des integraltyps und verfahren zu ihrer herstellung
EP1223261A3 (de) Wärmedämmplatte und deren Verwendung bei der Sanierung von Flachdächern
AU2003237683A1 (en) Cooking system comprising a directly heated glass-ceramic plate
IT1312566B1 (it) Apparecchio di cottura con fondo adatto all'adduzione di energiatermica mediante conduzione ed induzione elettromagnetica.
ATE286457T1 (de) Bauplatte
SE9602866D0 (sv) Keramisk spishäll
EP1080921A3 (de) Thermokopf
JP2009123785A5 (de)
DE69009536D1 (de) Bornitridschichten.
EP0416375A3 (en) Heat insulating plate
JPH1174068A5 (de)

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties